JPH0422218B2 - - Google Patents
Info
- Publication number
- JPH0422218B2 JPH0422218B2 JP58201573A JP20157383A JPH0422218B2 JP H0422218 B2 JPH0422218 B2 JP H0422218B2 JP 58201573 A JP58201573 A JP 58201573A JP 20157383 A JP20157383 A JP 20157383A JP H0422218 B2 JPH0422218 B2 JP H0422218B2
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline body
- diffraction
- sample
- optical system
- intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201573A JPS6093335A (ja) | 1983-10-27 | 1983-10-27 | 多結晶体の結晶粒子状態の検出測定装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201573A JPS6093335A (ja) | 1983-10-27 | 1983-10-27 | 多結晶体の結晶粒子状態の検出測定装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6093335A JPS6093335A (ja) | 1985-05-25 |
| JPH0422218B2 true JPH0422218B2 (fr) | 1992-04-16 |
Family
ID=16443297
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58201573A Granted JPS6093335A (ja) | 1983-10-27 | 1983-10-27 | 多結晶体の結晶粒子状態の検出測定装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6093335A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013150758A1 (fr) * | 2012-04-04 | 2013-10-10 | 信越化学工業株式会社 | Procédé d'évaluation du degré d'orientation des cristaux dans un silicium polycristallin, procédé de sélection de baguettes de silicium polycristallin, et procédé de production de silicium monocristallin |
| WO2013190829A1 (fr) * | 2012-06-18 | 2013-12-27 | 信越化学工業株式会社 | Procédé d'évaluation du degré d'orientation des cristaux d'un silicium polycristallin, procédé de sélection de barreaux de silicium polycristallin, barreau de silicium polycristallin, lingot de silicium polycristallin et procédé de réalisation de silicium polycristallin |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63139238A (ja) * | 1986-12-01 | 1988-06-11 | Natl Inst For Res In Inorg Mater | 簡易型一次元走査x線回折顕微鏡 |
| JPS63139298A (ja) * | 1986-12-01 | 1988-06-11 | 科学技術庁無機材質研究所長 | モノクロメ−タ付簡易型一次元走査x線回折顕微鏡 |
| JPH0727080B2 (ja) * | 1986-12-02 | 1995-03-29 | 科学技術庁無機材質研究所長 | 一次元走査x線回折顕微鏡 |
| JPH04164239A (ja) * | 1990-10-26 | 1992-06-09 | Natl Inst For Res In Inorg Mater | 粉末x線回折計 |
| JP2904055B2 (ja) * | 1995-05-30 | 1999-06-14 | 株式会社島津製作所 | X線回折装置 |
| NL1009012C2 (nl) | 1998-04-28 | 1999-10-29 | Stichting Tech Wetenschapp | Werkwijze voor het bepalen van celparameters van een kristalstructuur onder toepassing van diffractie. |
| CN100485373C (zh) * | 2004-07-14 | 2009-05-06 | 西南技术工程研究所 | 短波长x射线衍射测量装置和方法 |
| JP5903900B2 (ja) * | 2012-01-16 | 2016-04-13 | 住友金属鉱山株式会社 | 粒子存在比率算出方法及び粒子結晶サイズ算出方法 |
| JP5923463B2 (ja) * | 2013-06-26 | 2016-05-24 | 信越化学工業株式会社 | 多結晶シリコンの結晶粒径分布の評価方法、多結晶シリコン棒の選択方法、多結晶シリコン棒、多結晶シリコン塊、および、単結晶シリコンの製造方法 |
| EP2818851B1 (fr) * | 2013-06-26 | 2023-07-26 | Malvern Panalytical B.V. | Imagerie de diffraction |
-
1983
- 1983-10-27 JP JP58201573A patent/JPS6093335A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013150758A1 (fr) * | 2012-04-04 | 2013-10-10 | 信越化学工業株式会社 | Procédé d'évaluation du degré d'orientation des cristaux dans un silicium polycristallin, procédé de sélection de baguettes de silicium polycristallin, et procédé de production de silicium monocristallin |
| WO2013190829A1 (fr) * | 2012-06-18 | 2013-12-27 | 信越化学工業株式会社 | Procédé d'évaluation du degré d'orientation des cristaux d'un silicium polycristallin, procédé de sélection de barreaux de silicium polycristallin, barreau de silicium polycristallin, lingot de silicium polycristallin et procédé de réalisation de silicium polycristallin |
| CN104395740A (zh) * | 2012-06-18 | 2015-03-04 | 信越化学工业株式会社 | 多晶硅的晶体取向度评价方法、多晶硅棒的选择方法、多晶硅棒、多晶硅块以及单晶硅的制造方法 |
| US9274069B2 (en) | 2012-06-18 | 2016-03-01 | Shin-Etsu Chemical Co., Ltd. | Method for evaluating degree of crystalline orientation of polycrystalline silicon, method for selecting polycrystalline silicon rod, polycrystalline silicon rod, polycrystalline silicon ingot, and method for manufacturing monocrystalline silicon |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6093335A (ja) | 1985-05-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7769135B2 (en) | X-ray diffraction wafer mapping method for rhombohedral super-hetero-epitaxy | |
| He | Introduction to two-dimensional X-ray diffraction | |
| CN115598157B (zh) | 一种基于阵列探测的短波长特征x射线衍射装置和方法 | |
| Baba‐Kishi et al. | Backscatter Kikuchi diffraction in the SEM for identification of crystallographic point groups | |
| JPH0422218B2 (fr) | ||
| Guéninchault et al. | Nanox: a miniature mechanical stress rig designed for near-field X-ray diffraction imaging techniques | |
| CN1793872B (zh) | 微小区域残余应力的无损检测方法 | |
| Le Bourlot et al. | Synchrotron X-ray diffraction experiments with a prototype hybrid pixel detector | |
| Zolotov et al. | The possibility of identifying the spatial location of single dislocations by topo-tomography on laboratory setups | |
| Kovalev et al. | Application of X-ray diffraction methods to studying materials | |
| Brechbühl et al. | Measurements of residual stresses in micron regions by using synchrotron excited Kossel diffraction | |
| Zolotov et al. | X-ray diffraction tomography using laboratory sources for studying single dislocations in a low absorbing silicon single crystal | |
| JPS63139238A (ja) | 簡易型一次元走査x線回折顕微鏡 | |
| KR100936746B1 (ko) | Χ-선 토포그래피에 의한 결함의 3-차원 분포의 분석 | |
| JP2905659B2 (ja) | X線装置と該装置を用いた評価解析方法 | |
| JPH11304729A (ja) | X線測定方法及びx線測定装置 | |
| JPS63139299A (ja) | 一次元走査x線回折顕微鏡 | |
| He | Two-dimensional powder diffraction | |
| SU1497533A1 (ru) | Способ контрол структурного совершенства монокристаллов | |
| JPS649575B2 (fr) | ||
| JPS63139300A (ja) | 一次元位置検出器付走査x線回折顕微鏡 | |
| JPH02266249A (ja) | 結晶面のx線回折測定方法 | |
| JPS63139298A (ja) | モノクロメ−タ付簡易型一次元走査x線回折顕微鏡 | |
| JP3380921B2 (ja) | 結晶中のひずみの測定方法 | |
| Aubert et al. | Thin-film disorientation measurement using the single-crystal Nonius Kappa CCD diffractometer |