JPH0422283Y2 - - Google Patents

Info

Publication number
JPH0422283Y2
JPH0422283Y2 JP19924782U JP19924782U JPH0422283Y2 JP H0422283 Y2 JPH0422283 Y2 JP H0422283Y2 JP 19924782 U JP19924782 U JP 19924782U JP 19924782 U JP19924782 U JP 19924782U JP H0422283 Y2 JPH0422283 Y2 JP H0422283Y2
Authority
JP
Japan
Prior art keywords
sample
thickness
film
thin plate
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19924782U
Other languages
Japanese (ja)
Other versions
JPS59103260U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19924782U priority Critical patent/JPS59103260U/en
Publication of JPS59103260U publication Critical patent/JPS59103260U/en
Application granted granted Critical
Publication of JPH0422283Y2 publication Critical patent/JPH0422283Y2/ja
Granted legal-status Critical Current

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  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Description

【考案の詳細な説明】 本考案は、測定試料がコーテイングされたフイ
ルム又は薄板(以下試料ベースと云う。)を試料
台に装着し、前記試料に対し放射線、例えばX
線,r線を照射して当該試料が発する蛍光X線の
スペクトルより前記試料の厚みや所要成分の濃度
などを測定する放射線応用測定装置において試料
ベースを上記試料台に固定し且つ試料ベースの波
打ちを抑止するために用いる試料押えブロツクの
改良構造を提供するものである。
[Detailed description of the invention] In the present invention, a film or thin plate coated with a measurement sample (hereinafter referred to as the sample base) is mounted on a sample stage, and the sample is exposed to radiation such as X-rays.
In a radiation-applied measurement device that measures the thickness of the sample, the concentration of required components, etc. from the spectrum of fluorescent The present invention provides an improved structure of a sample holding block used to suppress

写真フイルム、プリント基板等において、此等
の表面にコーテイングされた物質の濃度や厚みを
分析する上記測定装置は公知であり、写真フイル
ムを一例として説明すると、この写真フイルムを
試料台にセツトした状態でX線を照射し、これよ
り発する蛍光X線を検知し、その蛍光X線スペク
トルよりコーテイングされている塩化銀の濃度等
を測定する。更に、この測定時、試料台にセツト
された写真フイルムの波打ちを抑止してX線被照
射面を平滑にするため、通常写真フイルムの背面
に重し材として鉄板等からなる試料押えブロツク
を重畳する工夫がなされており、X線照射時に前
記試料押えブロツクより散乱X線乃至蛍光X線が
入射することから、予め該干渉成分を測定してお
くことにより此等を除去し、精度を高めるように
している。
The above-mentioned measuring device for analyzing the concentration and thickness of substances coated on the surface of photographic film, printed circuit boards, etc. is publicly known.To explain photographic film as an example, it is possible to analyze the state in which the photographic film is set on a sample stage. irradiate with X-rays, detect the fluorescent X-rays emitted, and measure the concentration of silver chloride coated from the fluorescent X-ray spectrum. Furthermore, during this measurement, in order to prevent the photographic film set on the sample stage from waving and to smooth the X-ray irradiated surface, a sample holding block made of an iron plate or the like is usually superimposed on the back of the photographic film as a weight. During X-ray irradiation, scattered X-rays or fluorescent X-rays enter from the sample holding block, so by measuring the interference components in advance, these can be removed and accuracy can be improved. I have to.

しかるに、試料として供される写真フイルムの
フイルム厚は実際には各写真メーカーによつてば
らつきがあり、また同一メーカーでも製造誤差に
基づくばらつきがあつて一定せず、該ばらつきに
て試料押えブロツクに到達するX線量が変化して
干渉成分の増減が生じ、上記従来方式にては塩化
銀濃度の精緻な測定ができない難点があつた。加
えてフイルム厚の変化に伴いフイルム自体からの
散乱X線強度が変化し、これ又分析誤差の要因と
なつている。
However, the film thickness of the photographic film used as a sample actually varies depending on the photographic manufacturer, and even within the same manufacturer, there are variations due to manufacturing errors, so the film thickness is not constant. The amount of X-rays that arrive changes, resulting in an increase or decrease in interference components, and the conventional method described above has the disadvantage that it is not possible to accurately measure the silver chloride concentration. In addition, as the film thickness changes, the intensity of scattered X-rays from the film itself changes, which also causes analysis errors.

本考案は、このような難点を解消すべく案出さ
れたもので、試料押えブロツクを、写真フイルム
等試料ベースと同材質で、且つ試料ベース厚に対
しブロツク厚が充分に大きくとられたものから構
成することにより、分析誤差要因としての試料ベ
ース厚の変化量を、該試料ベースとブロツクとに
わたる全体の厚みに対し比率的に極めて小さなも
のとし、しかして試料コーテイング膜を通過して
きたX線等放射線に対し無限厚みの試料ベースを
使用したと略同等の作用を与えて、分析誤差を排
除することを要旨とする。
The present invention was devised to solve these difficulties.The sample holding block is made of the same material as the sample base such as photographic film, and the block thickness is sufficiently large relative to the sample base thickness. By configuring this structure, the amount of change in the sample base thickness, which is a factor of analysis error, is made extremely small in proportion to the overall thickness between the sample base and the block, and the X-rays passing through the sample coating film are The purpose of this method is to eliminate analysis errors by giving substantially the same effect as using a sample base of infinite thickness for isoradiation.

以下、本考案の詳細を図面に基づき説明する
と、試料台1は内部に試料ベース4および試料押
えブロツクの嵌着用開口部2が貫設されると共
に、該開口部2の下端部周縁に内方に向い突設す
る環状の試料位置決め用フランジ部3が設けら
れ、表面に試料4aがコーテイングされた試料ベ
ース4(例えば写真フイルム)がこのフランジ部
3に掛止してセツトされ、その上に試料押えブロ
ツク5にて重畳され、その荷重により試料ベース
4の波打ちが抑止されるようになされている。こ
の試料押えブロツク5は試料ベース4を構成する
ものと同材質(たとえばポリエチレン系樹脂)か
ら製作され、且つその厚みDが試料ベース厚dよ
りも充分に大きく(D>>d)とられている。例
えば、試料ベース厚dを200〜300μとする時、ブ
ロツク厚Dは5m/m〜数10m/mあれば好適で
ある。4aは試料ベース4にコーテイングされた
試料を示している。更に、試料台1に対応してX
線発生器6と、試料4aからの蛍光X線を検出す
るための蛍光X線検出器7、および該検出器出力
から目的とする物質(例えば塩化銀)の濃度ある
いは厚み等を計数する演算器8とが装備されてい
る。
Hereinafter, the details of the present invention will be explained based on the drawings.A sample stage 1 has an opening 2 for fitting a sample base 4 and a sample holding block inserted therein, and a lower edge of the opening 2 extends inwardly. A sample base 4 (for example, a photographic film) whose surface is coated with a sample 4a is hooked and set on this flange 3, and the sample is placed on top of the sample base 4 (for example, a photographic film). They are overlapped by a presser block 5, and the load prevents the sample base 4 from waving. This sample holding block 5 is made of the same material as that constituting the sample base 4 (for example, polyethylene resin), and its thickness D is sufficiently larger than the sample base thickness d (D >> d). . For example, when the sample base thickness d is 200 to 300 μm, the block thickness D is preferably 5 m/m to several tens of m/m. 4a shows a sample coated on the sample base 4. Furthermore, corresponding to sample stage 1,
A radiation generator 6, a fluorescent X-ray detector 7 for detecting fluorescent X-rays from the sample 4a, and a calculator that counts the concentration or thickness of a target substance (for example, silver chloride) from the output of the detector. It is equipped with 8.

かく構成されたものにおいては、X線発生器6
より照射するX線9にて、試料4aが励起され且
つ該物質に固有なエネルギの蛍光X線10や試料
4aや試料ベース4からの散乱X線(図示せず)
が発生して蛍光X線検出器7に入射すると共に、
該蛍光X線検出器出力パルスを演算器8が計数
し、試料4aの濃度や厚み等が測定される。この
際、バツクグラウンドとしての試料押えブロツク
5からの散乱X線乃至蛍光X線の干渉成分は予め
測定されており、此等干渉成分を蛍光X線検出器
7および演算器8において除外することにより上
記した目的たる試料4aの分析が可能となる。し
かるに、試料ベース4の厚みdが変化すると、試
料押えブロツク5の吸収X線量が変化すると共
に、試料ベース内部の二次励起効果の増減を生じ
るが、前記の如く試料押えブロツク厚Dが試料ベ
ース厚dよりも著しく大とされており、且つ試料
ベース厚の変化分Δdはブロツク厚Dに対し極く
わずかであるから、依然としてD>>d+Δdな
る関係は保持され、該変化分△dはDに対し比率
的に無視し得るものに収まる。同時に試料押えブ
ロツク5は試料ベース4と同材質であるから、実
際的に試料4aを通過してきたX線に対しては、
試料ベース厚dの増減にかかわらず、常に無限厚
みの試料ベースを使用したのと略同等の作用が得
られ、従つて干渉成分の増減、二次励起効果の増
減も分析誤差に成長するまでに至らず、しかして
精緻な分析結果が得られる。
In such a configuration, the X-ray generator 6
The sample 4a is excited by the X-rays 9 irradiated by the substance, and fluorescent X-rays 10 with energy specific to the substance and scattered X-rays from the sample 4a and the sample base 4 (not shown) are generated.
is generated and enters the fluorescent X-ray detector 7, and
A calculator 8 counts the output pulses of the fluorescent X-ray detector, and measures the concentration, thickness, etc. of the sample 4a. At this time, the interference components of the scattered X-rays or fluorescent X-rays from the sample holding block 5 as the background have been measured in advance, and by excluding these interference components in the fluorescent Analysis of the sample 4a, which is the objective described above, becomes possible. However, when the thickness d of the sample base 4 changes, the amount of X-rays absorbed by the sample holding block 5 changes, and the secondary excitation effect inside the sample base increases or decreases. Since the sample base thickness is significantly larger than the thickness d, and the variation Δd in the sample base thickness is extremely small with respect to the block thickness D, the relationship D>>d+Δd still holds, and the variation Δd is equal to D. Compared to this, the ratio is negligible. At the same time, since the sample holding block 5 is made of the same material as the sample base 4, in practice, for the X-rays that have passed through the sample 4a,
Regardless of the increase or decrease in the sample base thickness d, the same effect as using an infinitely thick sample base can always be obtained, and therefore the increase or decrease in interference components and the increase or decrease in secondary excitation effects can be avoided before they grow into analytical errors. However, accurate analysis results can be obtained.

尚、本考案は写真フイルムやプリント基板以外
の試料、例えばコンデンサにおけるアルミニウム
蒸着物質の分析に用いたり、メツキ厚み計に適用
できることは勿論であり、その用途が特に制限さ
れることはない。
It goes without saying that the present invention can be used to analyze samples other than photographic films and printed circuit boards, such as aluminum vapor deposited substances in capacitors, and can be applied to plating thickness gauges, and its uses are not particularly limited.

本考案は以上であり、試料厚のばらつきになん
ら阻害されず、そして該分析誤差要因排除のため
のなんらの操作や電子回路を要することなく、目
的とする物質の高精度測定を可能にできる点で、
実用上極めて有効である。
The present invention has been described above, and is capable of high-precision measurement of a target substance without being hindered by variations in sample thickness, and without requiring any operations or electronic circuits to eliminate analysis error factors. in,
It is extremely effective in practice.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本考案の一実施例を説明するためのX線
応用測定装置の模式図である。 1……試料台、2……開口部、3……フランジ
部、4……試料ベース、4a……試料、5……試
料押えブロツク、7……X線検出器、8……演算
器、9……照射X線、10……蛍光X線。
The drawing is a schematic diagram of an X-ray applied measurement device for explaining an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Sample stage, 2... Opening, 3... Flange part, 4... Sample base, 4a... Sample, 5... Sample holding block, 7... X-ray detector, 8... Computing unit, 9...Irradiation X-ray, 10...Fluorescent X-ray.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 測定試料がコーテイングされたフイルム又は薄
板を試料台に装着し、前記試料に対し放射線を照
射して当該試料が発する蛍光X線により、前記試
料の所要成分を測定する放射線応用測定装置にお
いて、上記フイルム又は薄板の上方に重畳される
試料押えブロツクを、このフイルム又は薄板と同
材質で、且つフイルム又は薄板の厚みに対しブロ
ツク厚が充分に大きくとられたものから構成し、
もつて前記試料押えブロツクを、フイルム又は薄
板の厚みの変化量に起因する分析誤差を排除する
ための部材に兼用したことを特徴とする放射線応
用測定装置。
In a radiation applied measurement device, a film or a thin plate coated with a measurement sample is mounted on a sample stage, the sample is irradiated with radiation, and necessary components of the sample are measured using fluorescent X-rays emitted by the sample. Alternatively, a sample holding block superimposed above the thin plate is made of the same material as the film or thin plate, and the block thickness is sufficiently large relative to the thickness of the film or thin plate,
A radiation applied measuring device characterized in that the sample holding block is also used as a member for eliminating analysis errors caused by changes in the thickness of the film or thin plate.
JP19924782U 1982-12-25 1982-12-25 Radiation applied measurement device Granted JPS59103260U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19924782U JPS59103260U (en) 1982-12-25 1982-12-25 Radiation applied measurement device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19924782U JPS59103260U (en) 1982-12-25 1982-12-25 Radiation applied measurement device

Publications (2)

Publication Number Publication Date
JPS59103260U JPS59103260U (en) 1984-07-11
JPH0422283Y2 true JPH0422283Y2 (en) 1992-05-21

Family

ID=30424791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19924782U Granted JPS59103260U (en) 1982-12-25 1982-12-25 Radiation applied measurement device

Country Status (1)

Country Link
JP (1) JPS59103260U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6190612B2 (en) * 2013-04-05 2017-08-30 学校法人福岡大学 Film sample sampling jig and sampling method

Also Published As

Publication number Publication date
JPS59103260U (en) 1984-07-11

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