JPH04235712A - Method for regenerating adsorbent of adsorption column - Google Patents
Method for regenerating adsorbent of adsorption columnInfo
- Publication number
- JPH04235712A JPH04235712A JP3001928A JP192891A JPH04235712A JP H04235712 A JPH04235712 A JP H04235712A JP 3001928 A JP3001928 A JP 3001928A JP 192891 A JP192891 A JP 192891A JP H04235712 A JPH04235712 A JP H04235712A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorption
- adsorbent
- regeneration
- adsorption tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Separation Of Gases By Adsorption (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、吸着操作により原料ガ
ス中の微量の不純物を吸着徐去し、被吸着成分を主成分
としたガスを連続的に製造する吸着分離技術において、
不純物の吸着で飽和した吸着剤を再生し、再度活性化す
る吸着剤の再生方法に関するものである。[Industrial Application Field] The present invention relates to an adsorption separation technology in which a trace amount of impurities in a raw material gas is adsorbed and gradually removed by an adsorption operation, and a gas containing the adsorbed component as the main component is continuously produced.
The present invention relates to an adsorbent regeneration method for regenerating and reactivating an adsorbent saturated with impurity adsorption.
【0002】0002
【従来の技術】従来の装置は、例えば特開昭58−17
775号記載のように、空気分離装置の精留塔から導出
されるアルゴンを含む酸素に富んだガスを原料ガスとし
、該ガスを吸着塔に導入し、酸素を吸着徐去し、アルゴ
ンを製造する方法がある。本方法は、先ず原料ガスのう
ち不純物である窒素を第1の吸着塔で吸着徐去し、更に
、第2の吸着塔で酸素を吸着徐去し、被吸着成分のアル
ゴンを採取するものである。また、不純物で飽和になり
活性を失った吸着剤の再生のための再生ガスとしては、
いずれの吸着塔の吸着剤にも被吸着成分を主成分とした
ガスを使用し、第1の吸着塔の吸着剤では、製品の酸素
ガスを、第2の吸着塔の吸着剤では製品アルゴンガスを
使用して、吸着剤を活性化し、連続的にアルゴンを製造
しようとするものである。[Prior Art] Conventional devices include, for example, Japanese Unexamined Patent Publication No. 58-17
As described in No. 775, an oxygen-rich gas containing argon derived from a rectification column of an air separation device is used as a raw material gas, the gas is introduced into an adsorption column, and oxygen is adsorbed and gradually removed to produce argon. There is a way to do it. In this method, first, the impurity nitrogen in the raw material gas is adsorbed and gradually removed in a first adsorption tower, and then oxygen is adsorbed and gradually removed in a second adsorption tower, and the adsorbed component argon is collected. be. In addition, as a regeneration gas for regenerating adsorbents that have become saturated with impurities and have lost their activity,
The adsorbents in both adsorption towers use a gas whose main component is the component to be adsorbed. The idea is to use this to activate the adsorbent and continuously produce argon.
【0003】0003
【発明が解決しようとする課題】上記従来技術は、不純
物の吸着で飽和になり吸着の活性を失った吸着剤を再び
活性化させる吸着剤の再生方法において、再生操作のた
めの再生ガスの種類は吸着操作において被吸着成分であ
るガス、すなわち被吸着成分を主成分とした純度の高い
ガス、あるいは製品ガスであり,再生操作のための再生
ガスはすべて該ガスで行われる。再生ガスは吸着剤と接
触して流れる際に吸着剤から離脱した不純物と混合し、
純度の低いガスとなり系外へ廃ガスとして放出される。
このため、再生ガス量が原料ガス量の例えば20%であ
れば製品として生産される被吸着成分を主成分とした高
純度のガス量は80%となる。すなわち、吸着塔で不純
物を吸着徐去し高純度化したガスの20%は廃ガスとし
て系外に放出することになり、高効率でのガス精製方法
という面で特策ではない。したがって、吸着システムに
おいて、高効率に高純度ガスを製造するためには、吸着
剤の再生操作に使用する再生ガス、すなわち、被吸着成
分を主成分としたガス、あるいは、高純度のガスの使用
量を少なくすることが不可欠である。[Problems to be Solved by the Invention] The above prior art is an adsorbent regeneration method for reactivating an adsorbent that has become saturated with impurity adsorption and has lost its adsorption activity. is a gas that is an adsorbed component in an adsorption operation, that is, a highly purified gas containing the adsorbed component as a main component, or a product gas, and all regeneration gas for the regeneration operation is performed using this gas. When the regeneration gas flows in contact with the adsorbent, it mixes with impurities released from the adsorbent,
The gas becomes a low-purity gas and is discharged outside the system as waste gas. Therefore, if the amount of regeneration gas is, for example, 20% of the amount of raw material gas, the amount of high-purity gas produced as a product whose main component is the adsorbed component will be 80%. That is, 20% of the highly purified gas that has been made highly purified by adsorption and gradual removal of impurities in the adsorption tower is discharged outside the system as waste gas, which is not a special measure in terms of a highly efficient gas purification method. Therefore, in order to produce high-purity gas with high efficiency in an adsorption system, it is necessary to use a regeneration gas used in the regeneration operation of the adsorbent, that is, a gas whose main component is the adsorbed component, or a high-purity gas. It is essential to reduce the amount.
【0004】本発明は、吸着剤の再生操作時に再生ガス
として使用する吸着塔で精製された被吸着成分を主成分
としたガス、あるいは高純度のガスの使用量を極力少な
くする吸着剤の再生方法を提供することを目的とする。[0004] The present invention aims at regenerating an adsorbent by minimizing the amount of gas used as a regeneration gas during the regeneration operation of the adsorbent, which is mainly composed of the adsorbed component purified in an adsorption tower, or a high-purity gas. The purpose is to provide a method.
【0005】[0005]
【課題を解決するための手段】上記目的を達成するため
には、吸着剤の再生時に使用する再生ガスを、吸着塔で
精製された被吸着成分を主成分としたガス、あるいは高
純度のガスと該ガス以外のガスとを組合せて使用するこ
とにより達成される。[Means for Solving the Problems] In order to achieve the above object, the regeneration gas used during regeneration of the adsorbent must be a gas whose main component is the adsorbed component purified in an adsorption tower, or a high-purity gas. This can be achieved by using a combination of and a gas other than the above gas.
【0006】本発明は、吸着剤の再生操作時において、
前記少なくとも2種類の成分のガスを使用し、先ず,吸
着剤の昇温時,あるいは吸着剤の温度が高い時期には吸
着塔における被吸着成分を主成分としたガス以外のガス
、あるいは高純度のガス以外の任意のガスを再生ガスと
して使用し、吸着剤に吸着されている不純物を該ガスと
共に系外に放出し,次いで,前記被吸着成分を主成分と
したガス、あるいは高純度のガスを再生ガスとして使用
し,吸着塔内の吸着剤の温度を低下させるとともに,吸
着剤の再生を行うことを特徴とする吸着塔の吸着剤再生
方法に関するものである。[0006] The present invention provides the following features during the regeneration operation of the adsorbent:
First, when the temperature of the adsorbent is raised or when the temperature of the adsorbent is high, a gas other than the gas containing the adsorbed component as the main component in the adsorption tower, or a high purity gas is used. Any gas other than the above gas is used as a regeneration gas, the impurities adsorbed on the adsorbent are released from the system along with the gas, and then a gas containing the adsorbed component as the main component or a high purity gas is used. The present invention relates to a method for regenerating an adsorbent in an adsorption tower, which is characterized in that the temperature of the adsorbent in the adsorption tower is lowered and the adsorbent is regenerated using the adsorbent as a regeneration gas.
【0007】[0007]
【作用】一般に、吸着剤により吸着される成分が同一で
あれば、吸着剤の吸着温度が低温になる程、吸着剤の吸
着能力は著しく向上する。例えば、微量の低級炭化水素
等は、珪藻さ製品(吸着剤)を、液体酸素等で冷却する
ことにより、ほぼ完全に吸着除去が可能である。一方、
吸着剤が高温での吸着操作、例えば200℃程度の吸着
温度では、吸着剤にはほとんどの吸着能力は無い。吸着
剤の再生は真空による再生もあるがほとんどが、この吸
着剤の温度特性を利用して行っているものである。[Operation] Generally, if the components to be adsorbed by the adsorbent are the same, the adsorption capacity of the adsorbent increases significantly as the adsorption temperature of the adsorbent becomes lower. For example, trace amounts of lower hydrocarbons can be almost completely adsorbed and removed by cooling a diatom product (adsorbent) with liquid oxygen or the like. on the other hand,
When the adsorbent is operated at high temperature, for example, at an adsorption temperature of about 200° C., the adsorbent has almost no adsorption capacity. Adsorbent regeneration can be done using vacuum, but most of the time it is done by utilizing the temperature characteristics of the adsorbent.
【0008】本発明によれば吸着剤の再生操作時におい
て、吸着剤の昇温,あるいは吸着剤の温度が高温の場合
は、吸着塔における被吸着成分を主成分としたガス以外
のガス、あるいは高純度のガス以外のガス、すなわち、
吸着操作により吸着される吸着成分を含んでいてもよい
ガスを再生ガスとして使用し、更に、吸着剤の降温,あ
るいは吸着剤の温度が低温の場合は被吸着成分を主成分
としたガス、あるいは高純度ガス、すなわち、吸着操作
により吸着される吸着成分をほとんど含まないガスを再
生ガスとして使用する。前述したごとく、吸着剤の温度
が高い場合、吸着剤の吸着能力はほとんど無い。このこ
とより吸着剤の温度が高温の場合、前述のガスすなわち
、吸着操作において吸着される吸着成分を含んでいるガ
スを再生ガスとして使用しても、被吸着成分を主成分と
したガスあるいは高純度のガスを使用した場合に比べ、
吸着剤の再生にはほとんど影響は無い。このため、吸着
剤の再生操作において、再生ガスとして、前記2種類の
ガスを使い分けることにより、外部へ放出する被吸着成
分を主成分としたガス、あるいは高純度のガスの使用量
を極力少なくすることができる。According to the present invention, during the regeneration operation of the adsorbent, if the temperature of the adsorbent is increased or the temperature of the adsorbent is high, the gas other than the gas mainly composed of the adsorbed component in the adsorption tower, or Gases other than high purity gases, i.e.
A gas that may contain adsorbed components to be adsorbed by the adsorption operation is used as a regeneration gas, and in addition, when the temperature of the adsorbent is lowered, or when the temperature of the adsorbent is low, a gas containing the adsorbed components as the main component, or A high-purity gas, that is, a gas containing almost no adsorbed components adsorbed by the adsorption operation, is used as the regeneration gas. As mentioned above, when the temperature of the adsorbent is high, the adsorbent has almost no adsorption capacity. This means that when the temperature of the adsorbent is high, even if the aforementioned gas, that is, the gas containing the adsorbed components to be adsorbed in the adsorption operation, is used as the regeneration gas, the gas containing the adsorbed components as the main component or the high Compared to using pure gas,
There is almost no effect on the regeneration of the adsorbent. Therefore, in the regeneration operation of the adsorbent, by selectively using the above two types of gas as the regeneration gas, the amount of gas mainly composed of the adsorbed component released to the outside, or the amount of high-purity gas used can be minimized. be able to.
【0009】[0009]
【実施例】以下、本発明の一実施例を図1により説明す
る。吸着剤による吸着成分を吸着し、吸着成分で飽和に
状態になった吸着剤を再び活性化する再生操作は、吸着
操作時の温度すなわち吸着温度より高い温度のガスを再
生ガスとして吸着塔に導入して吸着剤の温度を上昇させ
て吸着成分を再生ガスとともに系外に放出する方法と、
吸着操作時の圧力すなわち吸着圧力より低い圧力で吸着
塔に再生ガスを導入して被・吸着成分を再生ガスととも
に系外に放出する方法とがあるが、ここでは、前者の再
生方法を例にとり説明する。[Embodiment] An embodiment of the present invention will be explained below with reference to FIG. In the regeneration operation that adsorbs the adsorbed components by the adsorbent and reactivates the adsorbent that has become saturated with the adsorbed components, gas at a temperature higher than the temperature during the adsorption operation, that is, the adsorption temperature, is introduced into the adsorption tower as regeneration gas. a method of raising the temperature of the adsorbent and releasing the adsorbed components out of the system together with the regeneration gas;
There is a method in which regeneration gas is introduced into the adsorption tower at a pressure lower than the adsorption pressure during adsorption operation, and the adsorbed components are released from the system together with the regeneration gas.Here, we will take the former regeneration method as an example. explain.
【0010】一般に吸着塔は少なくとも2塔以上で構成
される。図1において、1a、1bが吸着塔である。本
実施例では1aの吸着塔が吸着操作を行い,1bの吸着
塔が再生操作を行う。少なくとも大気圧以上に加圧され
、吸着剤で吸着される吸着成分を含む原料ガスは導管1
00及びバルブ201を介し、導管101より吸着塔1
aに導入される。吸着塔内には、例えば合成ゼオライト
等の吸着剤が充てんされている。原料ガス中の吸着成分
つまり不純物は、吸着剤と接触することにより吸着除去
され、吸着塔出口においては、被吸着成分を主成分とし
た高純度ガスとなる。高純度に精製されたガスは弁20
2、導管103を介して、製品ガスとして系外へ導出さ
れる。[0010] Generally, the adsorption tower is composed of at least two or more towers. In FIG. 1, 1a and 1b are adsorption towers. In this embodiment, the adsorption tower 1a performs the adsorption operation, and the adsorption tower 1b performs the regeneration operation. The raw material gas, which is pressurized to at least atmospheric pressure or higher and contains adsorbed components to be adsorbed by the adsorbent, is transported through conduit 1.
00 and the adsorption tower 1 from the conduit 101 through the valve 201.
introduced into a. The adsorption tower is filled with an adsorbent such as synthetic zeolite. Adsorbed components, that is, impurities, in the raw material gas are adsorbed and removed by contact with the adsorbent, and at the outlet of the adsorption tower, a high-purity gas containing the adsorbed component as the main component is obtained. Highly purified gas is supplied with valve 20
2. It is led out of the system as a product gas through the conduit 103.
【0011】一方、吸着塔1aが吸着操作の間,吸着塔
1b内の吸着剤の再生操作は次の様に行われる。吸着塔
1b内の圧力は弁212を開にすることで、吸着操作時
の圧力より下げることができる。次に弁211及び弁2
10を開にすることで、被吸着成分を主成分にしたガス
以外のガス、いわゆる高純度ガス(本実施例では製品ガ
ス)以外のガスを吸着塔1b内に導入する。このガスは
例えば、原料ガスのー部、あるいは原料ガスを発生させ
るシステムからのガスあるいは、システム外からのガス
等が上げられる。例えば原料ガスのー部は導管107を
介し、ヒータ300で昇温された後、弁210、弁21
1を介し、導管112より吸着塔1b内に導入される。
以上の操作により、吸着塔内の吸着剤の温度はヒータ3
00で設定された温度に再生ガスの吸着塔入口から出口
へ順次昇温され、導管113、弁212を介し、導管1
14より系外へ導出される。この間に吸着剤に吸着され
ていた不純物は脱着され、再生ガスとともに系外へ放出
される。しかし、該ガスは高純度のガスではなく、多少
の不純物を含んでいるため、大部分の不純物は吸着剤よ
り脱着できるが完全には行われない。このため次の操作
を行う。先ず弁210を閉にし、原料ガスの供給を止め
、そのかわり弁213を開にして、製品ガス(高純度ガ
ス)の1部を吸着塔1bへ供給する。すなわち、製品ガ
スの1部は導管115を通り、例えば冷凍機400等の
冷却手段で低温にされた後、弁213、弁211を介し
、導管112より吸着塔1b内に導入される。該冷却手
段は冷凍機の他,液化ガス等も使用される。該ガスによ
り吸着塔内は,前記ガスとの置換が行われ,更に,吸着
剤は冷却され、吸着操作時の温度となる。吸着操作時の
温度は、−200℃〜常温の範囲である。該ガスは導管
113、弁212を介し、導管114より系外へ放出さ
れる。また、吸着塔の冷却には、ガスのみの冷却手段で
なく、吸着塔自体を冷却する冷却手段500を設置する
こともある。以上の操作を吸着塔1aと吸着塔1bを切
替えることにより、連続して被吸着成分を主成分とした
高純度ガスを製造できる。 本実施例による再生ガス
の吸着塔への切替え、つまり原料ガスのー部と製品ガス
のー部との切替え時期については、吸着除去される不純
物の成分、あるいは濃度の違いにより決定され,また,
吸着等の下部に温度計600を設置することにより,よ
り効果的な切替え時期が決定される。On the other hand, while the adsorption tower 1a is in adsorption operation, the regeneration operation of the adsorbent in the adsorption tower 1b is performed as follows. By opening the valve 212, the pressure inside the adsorption tower 1b can be lowered from the pressure during adsorption operation. Next, valve 211 and valve 2
By opening 10, a gas other than the gas containing the adsorbed component as the main component, a gas other than the so-called high-purity gas (product gas in this embodiment) is introduced into the adsorption tower 1b. This gas may be, for example, a part of the raw material gas, a gas from the system that generates the raw material gas, or a gas from outside the system. For example, a portion of the raw material gas passes through the conduit 107 and is heated by the heater 300, and then passes through the valve 210 and the valve 21.
1 into the adsorption tower 1b from a conduit 112. Through the above operations, the temperature of the adsorbent in the adsorption tower is adjusted to
The temperature of the regeneration gas is raised sequentially from the inlet to the outlet of the adsorption tower to the temperature set at
14 to the outside of the system. During this time, impurities adsorbed on the adsorbent are desorbed and released to the outside of the system together with the regenerating gas. However, since the gas is not a highly pure gas and contains some impurities, most of the impurities can be desorbed by the adsorbent, but not completely. For this purpose, perform the following operations. First, the valve 210 is closed to stop the supply of raw material gas, and instead the valve 213 is opened to supply a portion of the product gas (high purity gas) to the adsorption tower 1b. That is, a part of the product gas passes through the conduit 115 and is lowered to a low temperature by a cooling means such as a refrigerator 400, and then is introduced into the adsorption tower 1b through the conduit 112 via the valves 213 and 211. In addition to a refrigerator, liquefied gas or the like may be used as the cooling means. The gas replaces the gas in the adsorption tower, and the adsorbent is further cooled to the same temperature as the adsorption operation. The temperature during the adsorption operation is in the range of -200°C to room temperature. The gas passes through the conduit 113 and the valve 212 and is discharged from the conduit 114 to the outside of the system. Furthermore, for cooling the adsorption tower, a cooling means 500 for cooling the adsorption tower itself may be installed instead of a cooling means for only gas. By switching the above operation between the adsorption tower 1a and the adsorption tower 1b, it is possible to continuously produce a high purity gas containing the adsorbed component as the main component. According to this embodiment, the timing of switching the regeneration gas to the adsorption tower, that is, the timing of switching between one part of the raw gas and the other part of the product gas, is determined depending on the component or concentration of impurities to be adsorbed and removed.
By installing a thermometer 600 below the adsorption unit, a more effective switching timing can be determined.
【0012】次に、本発明の他の実施例を図2により説
明する。本実施例と図1の実施例との相違は、本実施例
が吸着塔内での流体が、液状であることである。以下、
図1の実施例と重複する部分の説明は省くことにする。
本実施例での流体は液化ガス(液体)を例にとり説明す
る。微量の不純物を含む液化ガスは導管100を通り吸
着塔1aに導入され、微量の不純物を吸着除去された後
、導管103を通って、高純度の液化ガスとして取出さ
れる。また、熱交換器800によりガス化され、ガス状
として導管104から取出すことも可能である。熱交換
に必要な流体は、任意であり導管900より熱交換器8
00に導入される。Next, another embodiment of the present invention will be explained with reference to FIG. The difference between this embodiment and the embodiment shown in FIG. 1 is that in this embodiment, the fluid in the adsorption tower is liquid. below,
Description of parts that overlap with the embodiment of FIG. 1 will be omitted. The fluid in this embodiment will be explained using liquefied gas (liquid) as an example. Liquefied gas containing trace amounts of impurities is introduced into the adsorption tower 1a through conduit 100, and after the trace amounts of impurities are adsorbed and removed, it is taken out through conduit 103 as high-purity liquefied gas. It is also possible to gasify it by the heat exchanger 800 and take it out from the conduit 104 in a gaseous state. The fluid necessary for heat exchange is optional and is supplied from the conduit 900 to the heat exchanger 8.
Introduced in 00.
【0013】一方、吸着塔1bの再生は次の様に行われ
る。吸着塔1b内の液化ガスは弁212を開とすること
で導管114より外部へ放出される。この時、液化ガス
が持っている寒冷は熱交換器801により回収され、ほ
ぼ常温で外部へ放出される。熱交換に必要な流体は、任
意であり導管001より熱交換器801に導入される。
次に、被吸着成分を主成分としたガス、いわゆる高純度
ガス以外のガスを吸着塔1bへ導入する。このガスは例
えば、本装置を設置するシステムからのガス、あるいは
システム外からのガス等が上げられる。該ガスは導管1
08、109を通り、ヒータ300で昇温された後、導
管112を通り吸着塔1b内へ流入し、弁212、導管
114を通り系外へ放出される。本操作により吸着剤に
吸着されていた不純物の大部分は該再生ガスとともに系
外へ放出される。次に、弁210を閉とし、弁213を
開とすることで、吸着塔1aで高純度化した液化ガスの
一部を吸着塔1b内へ流入できる。該液化ガスにより吸
着塔1b内は、前記ガスと置換され、更に液化ガスによ
り吸着剤は冷却され、吸着操作時の温度となる。なお、
必要に応じて吸着塔自体を冷却する冷却手段500を設
置することもある。なお、導管000及び001内の流
体は、本装置を設置するシステム、あるいはシステム外
からのガス、あるいは液体が使用され、熱交換の条件に
より制御される。On the other hand, the regeneration of the adsorption tower 1b is carried out as follows. The liquefied gas in the adsorption tower 1b is released to the outside through the conduit 114 by opening the valve 212. At this time, the cold contained in the liquefied gas is recovered by the heat exchanger 801 and released to the outside at approximately room temperature. Any fluid necessary for heat exchange is introduced into the heat exchanger 801 through the conduit 001. Next, a gas whose main component is a component to be adsorbed, that is, a gas other than a so-called high-purity gas, is introduced into the adsorption tower 1b. This gas may be, for example, gas from the system in which this device is installed or gas from outside the system. The gas is passed through conduit 1
08 and 109, and is heated by the heater 300, flows into the adsorption tower 1b through the conduit 112, passes through the valve 212 and the conduit 114, and is discharged to the outside of the system. By this operation, most of the impurities adsorbed on the adsorbent are discharged to the outside of the system together with the regeneration gas. Next, by closing the valve 210 and opening the valve 213, a part of the liquefied gas highly purified in the adsorption tower 1a can flow into the adsorption tower 1b. The liquefied gas replaces the gas in the adsorption tower 1b, and the liquefied gas cools the adsorbent to the temperature at which the adsorption operation is performed. In addition,
A cooling means 500 for cooling the adsorption tower itself may be installed as necessary. Note that the fluid in the conduits 000 and 001 is a gas or liquid from the system in which this device is installed or from outside the system, and is controlled according to the heat exchange conditions.
【0014】本実施例によれば、吸着操作時の流体が液
体であるため、吸着塔をよりコンパクトに出来る効果を
得る。According to this embodiment, since the fluid during the adsorption operation is liquid, the adsorption tower can be made more compact.
【0015】図3にA型ゼオライトにおける二酸化炭素
(CO2)の吸着特性を示す。本データはメーカのカタ
ログ値よりCO2濃度の分圧300mmHgを算出した
ものである。縦軸に吸着剤100g当りのCO2の吸着
量を示し、横軸に温度を示す。曲線は各温度におけるC
O2の吸着量を示している。温度が250℃以上では吸
着剤にはほとんど吸着能力は存在しないことが判る。ま
た、50℃付近では吸着量は急激に増加している。ここ
で200℃と25℃の時の吸着量を見てみると、それぞ
れ1.5、19(gCO2/100g吸着剤)である。FIG. 3 shows the adsorption characteristics of carbon dioxide (CO2) in type A zeolite. This data is based on a CO2 concentration partial pressure of 300 mmHg calculated from the manufacturer's catalog value. The vertical axis shows the adsorption amount of CO2 per 100 g of adsorbent, and the horizontal axis shows the temperature. The curve shows C at each temperature.
It shows the amount of O2 adsorbed. It can be seen that at temperatures above 250°C, the adsorbent has almost no adsorption capacity. Moreover, the amount of adsorption increases rapidly near 50°C. If we look at the adsorption amounts at 200°C and 25°C, they are 1.5 and 19 (gCO2/100g adsorbent), respectively.
【0016】本説明ではCO2を例に取上げて説明した
が、この傾向は別のガスでも同一であり、50℃〜10
0℃では吸着量は急激に増加し、逆に250℃〜300
℃での吸着量はほとんど無い。このことより、本発明の
再生ガスの被吸着成分を主成分としたガス、あるいは高
純度ガス以外のガスの温度は常温から400℃、好まし
くは50℃〜300℃であることが判る。[0016] In this explanation, CO2 was taken as an example, but this tendency is the same for other gases.
At 0℃, the amount of adsorption increases rapidly, and on the contrary, from 250℃ to 300℃
There is almost no adsorption amount at °C. From this, it can be seen that the temperature of the gas containing the adsorbed component as the main component of the regeneration gas of the present invention, or the gas other than the high-purity gas, is from room temperature to 400°C, preferably from 50°C to 300°C.
【0017】図4にはA型ゼオライトへの酸素(O2)
の吸着等圧線を示す。横軸に温度、縦軸にケージ中の分
子数つまり吸着量を示す。本データは、「ゼオライト基
礎と応用」、原伸宜編に述べられている。本データから
判る様に温度が低温になれば吸着量は増大する。吸着操
作を常温以下で行う場合は、冷媒が必要となる。例えば
冷媒を液体窒素とすると、吸着剤の温度は−196℃と
なり、この時の吸着量は0℃の時の数十倍となる。又、
設計時の条件、例えば、吸着成分の相違により冷媒を使
用しない時、すなわち、常温以上で吸着操作を行う場合
、図3で述べた様に、温度が上昇すると吸着量は低減す
る。これらのことから、吸着操作を経済的に、かつ効率
良く行うための吸着温度は−200℃〜常温であること
が判る。FIG. 4 shows oxygen (O2) to type A zeolite.
The adsorption isobars of are shown. The horizontal axis shows the temperature, and the vertical axis shows the number of molecules in the cage, that is, the amount of adsorption. This data is described in "Zeolite Basics and Applications", edited by Nobuyoshi Hara. As can be seen from this data, the amount of adsorption increases as the temperature decreases. If the adsorption operation is performed below room temperature, a refrigerant is required. For example, if the refrigerant is liquid nitrogen, the temperature of the adsorbent will be -196°C, and the amount of adsorption at this time will be several tens of times that at 0°C. or,
Under design conditions, for example, when no refrigerant is used due to differences in adsorbed components, that is, when adsorption operation is performed above room temperature, as described in FIG. 3, the amount of adsorption decreases as the temperature rises. From these facts, it can be seen that the adsorption temperature for carrying out the adsorption operation economically and efficiently is -200°C to room temperature.
【0018】[0018]
【発明の効果】本発明によれば、吸着剤の再生操作時に
、吸着塔に導入し、外部へ放出する被吸着成分を主成分
としたガス、すなわち、吸着塔で不純物を吸着除去した
高純度のガス、あるいは該吸着塔で精製した高純度のガ
ス以外の高純度のガスの使用量を極力少なくすることが
できるため、高収率の高純度ガスを製造できる効果が得
られる。[Effects of the Invention] According to the present invention, during the regeneration operation of the adsorbent, the gas containing the adsorbed component as the main component is introduced into the adsorption tower and released to the outside. Since the amount of gas used or high purity gas other than the high purity gas purified by the adsorption tower can be minimized, the effect of producing high purity gas with high yield can be obtained.
【図1】本発明の一実施例を示す吸着装置のフローシー
ト図である。FIG. 1 is a flow sheet diagram of an adsorption device showing one embodiment of the present invention.
【図2】本発明の他の実施例を示す吸着装置のフローシ
ート図である。FIG. 2 is a flow sheet diagram of an adsorption device showing another embodiment of the present invention.
【図3】A型ゼオライトのCO2吸着特性を示す特性図
である。FIG. 3 is a characteristic diagram showing the CO2 adsorption characteristics of type A zeolite.
【図4】A型ゼオライトのO2の吸着等圧線を示す特性
図である。FIG. 4 is a characteristic diagram showing O2 adsorption isobars of type A zeolite.
1a,1b…吸着塔、300…ヒータ、400,500
…冷却手段、110,115…再生ガス導管。1a, 1b...Adsorption tower, 300...Heater, 400,500
...Cooling means, 110, 115...Regeneration gas conduit.
Claims (5)
原料ガス中に含まれる微量の不純物を吸着除去し、被吸
着成分を主成分としたガスを製造する吸着塔の吸着剤再
生方法において、前記原料ガス中の微量の不純物を吸着
し、吸着能力の低下した吸着剤の活性を回復させるため
の再生操作時に、被吸着成分を主成分としたガス,ある
いは高純度のガスと、該ガス以外の任意のガスとを組合
せて、前記吸着剤の再生ガスとして使用することを特徴
とする吸着塔の吸着剤再生方法。Claim 1: Using an adsorbent such as synthetic zeolite,
In an adsorbent regeneration method for an adsorption tower, which adsorbs and removes trace amounts of impurities contained in the raw material gas and produces gas containing the adsorbed component as the main component, the adsorption capacity is During a regeneration operation to recover the reduced activity of the adsorbent, a gas containing the adsorbed component as the main component or a high-purity gas is combined with any gas other than the above-mentioned gas to regenerate the regeneration gas of the adsorbent. A method for regenerating an adsorbent in an adsorption tower, characterized in that the method is used as an adsorption tower.
分としたガス、あるいは高純度のガス以外の任意のガス
の温度が、常温から400℃の範囲、好ましくは50℃
〜300℃の範囲であることを特徴とする請求項1記載
の吸着塔の吸着剤再生方法。2. The temperature of the gas whose main component is the adsorbed component of the regeneration gas of the adsorbent or any gas other than high-purity gas is in the range of room temperature to 400°C, preferably 50°C.
2. The method for regenerating an adsorbent in an adsorption tower according to claim 1, wherein the temperature is in the range of ~300[deg.]C.
200℃〜常温であり,再生操作時の吸着塔内の圧力は
吸着圧力より低い圧力で行われることを特徴とする請求
項1、又は請求項2記載の吸着塔の吸着剤再生方法。3. The temperature during adsorption operation of the adsorption system is -
3. The method for regenerating an adsorbent in an adsorption tower according to claim 1 or 2, wherein the temperature is 200° C. to room temperature, and the pressure inside the adsorption tower during the regeneration operation is lower than the adsorption pressure.
の吸着塔への流入は,先ず被吸着成分を主成分としたガ
ス以外のガス,あるいは高純度のガス以外の任意のガス
を流入し、次に被吸着成分を主成分としたガス,あるい
は高純度のガスを流入し,吸着剤を冷却再生することを
特徴とする請求項1、又は請求項2、又は請求項3記載
の吸着塔の吸着剤再生方法。4. During regeneration operation of the adsorption system, the regeneration gas is introduced into the adsorption tower by first introducing a gas other than the gas containing the adsorbed component as a main component or any gas other than high-purity gas. The adsorption tower according to claim 1, claim 2, or claim 3, wherein a gas containing the adsorbed component as the main component or a high-purity gas is then introduced to cool and regenerate the adsorbent. Adsorbent regeneration method.
液化ガスを導入して不純物を吸着除去し、高純度の液化
ガス、あるいは高純度のガスを精製し、再生操作時に被
吸着成分を主成分としたガス、あるいは高純度のガス以
外の任意のガスを吸着塔へ導入し、次に被吸着成分を主
成分としたガス、あるいは液体、あるいは高純度のガス
、あるいは液体を流入し、吸着剤を冷却し、再生するこ
とを特徴とする請求項2、又は請求項3記載の吸着塔の
吸着剤再生方法。5. During the adsorption operation of the adsorption system, liquefied gas is introduced into the adsorption tower to remove impurities by adsorption, purify the high-purity liquefied gas or high-purity gas, and during the regeneration operation, the adsorbed components are mainly removed. Component gas or any gas other than high-purity gas is introduced into the adsorption tower, and then gas or liquid containing the component to be adsorbed as the main component, high-purity gas or liquid is introduced, and adsorption is performed. 4. The method for regenerating an adsorbent in an adsorption tower according to claim 2 or 3, wherein the adsorbent is cooled and regenerated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3001928A JPH04235712A (en) | 1991-01-11 | 1991-01-11 | Method for regenerating adsorbent of adsorption column |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3001928A JPH04235712A (en) | 1991-01-11 | 1991-01-11 | Method for regenerating adsorbent of adsorption column |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04235712A true JPH04235712A (en) | 1992-08-24 |
Family
ID=11515271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3001928A Pending JPH04235712A (en) | 1991-01-11 | 1991-01-11 | Method for regenerating adsorbent of adsorption column |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04235712A (en) |
-
1991
- 1991-01-11 JP JP3001928A patent/JPH04235712A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3103425A (en) | Adsorption apparatus and method | |
| KR930010762B1 (en) | Pre-purification method of separation air | |
| CA2999758C (en) | Adsorbent regeneration method in a combined pressure and temperature swing adsorption process | |
| JPH04219111A (en) | Manufacture of high purity gas | |
| KR100328419B1 (en) | Method and apparatus for producing clean dry air having application to air separation | |
| KR980008274A (en) | Multiple thermal pulsation pressure fluctuation adsorption method | |
| US4746332A (en) | Process for producing high purity nitrogen | |
| US9708188B1 (en) | Method for argon production via cold pressure swing adsorption | |
| KR0164231B1 (en) | Gas Purification Method and System | |
| JPH07280432A (en) | Plant for distilling air and method thereof | |
| JPS63107720A (en) | Method for separating and removing water content and carbon dioxide gas in air | |
| JP2004148315A (en) | Process and device for removing nitrous oxide from feed gas stream | |
| JPS62119104A (en) | Method for recovering high-purity argon from exhaust gas of single crystal producing furnace | |
| JPS6156009B2 (en) | ||
| US20020139246A1 (en) | Multi-bed adsorption process for air purification | |
| KR970014809A (en) | Pressure circulation adsorption air prepurifier | |
| JP2003062419A (en) | Method and apparatus for separating gas mixture | |
| JPH04235712A (en) | Method for regenerating adsorbent of adsorption column | |
| US4092131A (en) | Process and apparatus for the low-temperature separation of air | |
| EP4326421B1 (en) | Method for regenerating a pre-purification vessel | |
| JPS6129768B2 (en) | ||
| JPH01297120A (en) | How to regenerate an adsorption device for helium gas purification | |
| JPH1015331A (en) | Heat regeneration type pressure swing adsorbing apparatus | |
| JPH09122432A (en) | Gas separator using pressure swing adsorption process | |
| JP7634762B1 (en) | Neon refining apparatus and method |