JPH04236270A - Electrically conductive coating material - Google Patents
Electrically conductive coating materialInfo
- Publication number
- JPH04236270A JPH04236270A JP3018466A JP1846691A JPH04236270A JP H04236270 A JPH04236270 A JP H04236270A JP 3018466 A JP3018466 A JP 3018466A JP 1846691 A JP1846691 A JP 1846691A JP H04236270 A JPH04236270 A JP H04236270A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- weight
- coarse
- parts
- particle size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Conductive Materials (AREA)
- Paints Or Removers (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【0001】0001
【産業上の利用分野】本発明は電子回路用電極や配線導
体の形成に用いられる導電性ペーストや導電性塗料磁気
シールド塗料等に用いられる導電性コーティング材料に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to conductive coating materials used in conductive pastes, conductive paints, magnetic shield paints, etc. used in the formation of electronic circuit electrodes and wiring conductors.
【0002】0002
【従来の技術】例えばプラズマディスプレーにあっては
ガラス製のバックプレート側に電極(陰極)をプリント
形成し、カバープレート側に透明電極(陽極)を該陰極
と対向して形成し、両電極間に電圧を印加して放電・発
色させるものである。[Prior Art] For example, in a plasma display, an electrode (cathode) is printed on the glass back plate side, a transparent electrode (anode) is formed on the cover plate side facing the cathode, and a space between the two electrodes is formed. A voltage is applied to the battery to cause it to discharge and develop color.
【0003】上記電極をバックプレート側に形成するに
は金属粉末を合成樹脂溶液であるビヒクルに分散した導
電性ペーストを該バックプレート表面にスクリーン印刷
等により厚膜印刷層を形成し、乾燥した後大気中で焼成
して導電性の焼成膜とする方法が採用されている。[0003] In order to form the above-mentioned electrode on the back plate side, a thick film printing layer is formed on the surface of the back plate by screen printing or the like with a conductive paste in which metal powder is dispersed in a vehicle which is a synthetic resin solution, and after drying. A method of firing in the atmosphere to form a conductive fired film has been adopted.
【0004】従来から上記導電性ペーストにはNi 粉
末が用いられていたが、上記のように大気中で焼成する
際にNi が酸化し、該焼成膜の導電性が失われると云
う問題があり、これを防止するためにNi 粉末にB粉
末を添加した導電性ペーストが提供されている(特公昭
60−16041号)。Conventionally, Ni powder has been used in the conductive paste, but as mentioned above, there is a problem in that the Ni oxidizes during firing in the atmosphere and the fired film loses its conductivity. In order to prevent this, a conductive paste in which B powder is added to Ni powder has been provided (Japanese Patent Publication No. 16041/1986).
【0005】上記導電性ペーストによる厚膜印刷層にあ
っては大気中での焼成によりB粉末が選択的に酸化され
てB2O3となり、その結果Ni 粉末の酸化が防止さ
れるのである。[0005] In the thick film printed layer made of the conductive paste, the B powder is selectively oxidized to B2O3 by firing in the atmosphere, and as a result, oxidation of the Ni powder is prevented.
【0006】[0006]
【発明が解決しようとする課題】しかしながら上記従来
の導電性ペーストにあってはNi 粉末の粒径が大きい
と厚膜印刷層を印刷する時の印刷性が悪化するし、焼成
膜内のNi 粒子の充填密度が小さく導電性が低下する
。一方Ni 粉末の粒径が小さいと焼成膜内のNi 粒
子の充填密度は大きくなるが、Ni 粒子の総表面積が
大きくなる結果B粉末が存在するにも関わらず焼成中に
Ni 粒子が酸化され易くなる。[Problems to be Solved by the Invention] However, in the conventional conductive paste described above, if the particle size of the Ni powder is large, the printability when printing a thick film printing layer deteriorates, and the Ni particles in the fired film deteriorate. The packing density is small and the conductivity is reduced. On the other hand, when the particle size of the Ni powder is small, the packing density of the Ni particles in the fired film increases, but as a result of the increased total surface area of the Ni particles, the Ni particles are easily oxidized during firing despite the presence of the B powder. Become.
【0007】[0007]
【課題を解決するための手段】本発明は上記従来の課題
を解決するための手段として、Ni 粉末、B粉末、ガ
ラスフリット、およびビヒクルからなり、該Ni 粉末
は平均粒径3μm以上の粗粉末と平均粒径2μm以下の
微粉末との重量比率が30:70から80:20である
混合物であり、該粗粉末の10〜70重量%が平均粒径
3μm以上の箔片状粗粉末であり、該B粉末はNi 粉
末とB粉末との合計を100重量部とした場合2.0か
ら10重量部の範囲で含まれる導電性コーティング材料
を提供するものである。[Means for Solving the Problems] As a means for solving the above conventional problems, the present invention consists of Ni powder, B powder, glass frit, and a vehicle, and the Ni powder is a coarse powder with an average particle size of 3 μm or more. and fine powder with an average particle size of 2 μm or less in a weight ratio of 30:70 to 80:20, and 10 to 70% by weight of the coarse powder is flaky coarse powder with an average particle size of 3 μm or more. , the B powder is contained in a range of 2.0 to 10 parts by weight when the total of Ni powder and B powder is 100 parts by weight to provide a conductive coating material.
【0008】本発明を以下に詳細に説明する。本発明に
用いられるNi 粉末は平均粒径3μm以上の粗粉末と
平均粒径2μm以下の微粉末との混合物であり、該混合
物中の粗粉末と微粉末との混合比率は30:70から8
0:20とされ、更に該粗粉末の10〜70重量%が平
均粒径3μm以上の箔片状粗粉末である。またB粉末は
Ni 粉末とB粉末との合計を100重量部とした場合
2.0から10重量部の範囲で含まれる。The present invention will be explained in detail below. The Ni powder used in the present invention is a mixture of coarse powder with an average particle size of 3 μm or more and fine powder with an average particle size of 2 μm or less, and the mixing ratio of the coarse powder and fine powder in the mixture is 30:70 to 8.
0:20, and 10 to 70% by weight of the coarse powder is flake-like coarse powder with an average particle size of 3 μm or more. Further, the B powder is contained in an amount of 2.0 to 10 parts by weight when the total of Ni powder and B powder is 100 parts by weight.
【0009】即ちNi 粉末中に該粗粉末が30重量%
以下、即ち該微粉末が70重量%以上の割合で含まれて
いると、該Ni 粉末の総表面積が大きくなり、B粉末
存在下においても焼成中にNi 粉末の酸化が起こり易
く、一方Ni 粉末中に該粗粉末が80重量%以上、即
ち該微粉末が20重量%以下の割合で含まれていると、
導電性コーティング材料の印刷性が悪化し、また形成さ
れる厚膜印刷層中のNi 粉末の充填密度が小さくなり
良好な導電性が得られなくなる。更に該粗粉末中の平均
粒径3μm以上の箔片状粗粉末の量が10重量%以下で
あると形成される厚膜印刷層の導電性が充分でなく、ま
た該箔片状粗粉末の量が70重量%以上になると粗粉末
の全量が80重量%以下であっても良好な印刷性が得ら
れにくゝなる。That is, the coarse powder is 30% by weight in the Ni powder.
Below, if the fine powder is contained in a proportion of 70% by weight or more, the total surface area of the Ni powder becomes large, and oxidation of the Ni powder tends to occur during firing even in the presence of the B powder; When the coarse powder is contained in the proportion of 80% by weight or more, that is, the fine powder is contained in the proportion of 20% by weight or less,
The printability of the conductive coating material deteriorates, and the packing density of the Ni powder in the thick film printing layer that is formed becomes small, making it impossible to obtain good conductivity. Furthermore, if the amount of flaky coarse powder with an average particle size of 3 μm or more in the coarse powder is less than 10% by weight, the conductivity of the thick film printing layer to be formed will be insufficient, and the flaky coarse powder will not have sufficient conductivity. When the amount exceeds 70% by weight, it becomes difficult to obtain good printability even if the total amount of the coarse powder is 80% by weight or less.
【0010】またB粉末が2.0重量部以下の割合で含
まれるとB粉末によるNi 粉末の酸化防止効果が充分
でなく、一方10重量部以上含まれていると形成される
厚膜印刷層の導電性が悪化する。該B粉末は望ましくは
5重量部以下で含まれる。Furthermore, if the B powder is contained in a proportion of 2.0 parts by weight or less, the effect of preventing the oxidation of the Ni powder by the B powder will not be sufficient, while if it is contained in a proportion of 10 parts by weight or more, a thick film printed layer will be formed. conductivity deteriorates. The B powder is preferably contained in an amount of 5 parts by weight or less.
【0011】本発明に用いられるガラスフリットは55
0℃以下の軟化点を有するものが望ましい。何となれば
上記B粉末が活性化される温度は550℃からであり、
したがって厚膜印刷層の焼成温度も550℃以上とされ
るので、焼成時ガラスフリットが充分軟化するためには
ガラスフリットの軟化点は550℃以下が望ましい。し
かしガラスフリットが400℃以下の軟化点を有する場
合には焼成中のガラスフリットの軟化が著しく厚膜印刷
層の変形を惹起するおそれがあるし、また厚膜印刷層の
耐熱性も低下する。該ガラスフリットは通常Ni 粉末
とB粉末との合計を100重量部とした場合に5〜15
重量部の範囲で添加される。何となればガラスフリット
はNi 粉末のバインダーとしての役目を果たすもので
、5重量部以下の添加量ではバインダー効果が小さく、
一方15重量部以上の添加量ではNi 粉末を希釈して
導電性に悪影響を与える。The glass frit used in the present invention is 55
It is desirable to have a softening point of 0°C or lower. The reason is that the temperature at which the B powder is activated is from 550°C.
Therefore, since the firing temperature of the thick film printing layer is also set at 550°C or higher, the softening point of the glass frit is preferably 550°C or lower in order to sufficiently soften the glass frit during firing. However, if the glass frit has a softening point of 400° C. or lower, the softening of the glass frit during firing may cause significant deformation of the thick film print layer, and the heat resistance of the thick film print layer may also decrease. The glass frit usually contains 5 to 15 parts by weight when the total of Ni powder and B powder is 100 parts by weight.
It is added in a range of parts by weight. The reason is that glass frit serves as a binder for Ni powder, and if the amount added is less than 5 parts by weight, the binder effect is small.
On the other hand, if the amount added is 15 parts by weight or more, the Ni powder will be diluted and the conductivity will be adversely affected.
【0012】本発明のビヒクルは合成樹脂溶液であり、
使用される合成樹脂としてはメチルセルロース、エチル
セルロース、メトキシセルロース、エトキシセルロース
、カルボキシメチルセルロース等のセルロース誘導体、
その他アクリル樹脂、ウレタン樹脂等の焼成によりカー
ボンを厚膜印刷層中に残存させない合成樹脂を選択する
ことが望ましい。また該合成樹脂を溶解させる溶剤とし
てはエチレングリコール、プロピレングリコール、グリ
セリン、ペンタエリスリトール、テルピネオール等の水
酸基を有する還元性の高沸点有機溶剤を選択することが
望ましい。The vehicle of the present invention is a synthetic resin solution,
Synthetic resins used include cellulose derivatives such as methylcellulose, ethylcellulose, methoxycellulose, ethoxycellulose, and carboxymethylcellulose;
In addition, it is desirable to select synthetic resins such as acrylic resins and urethane resins that do not leave carbon in the thick film printing layer when fired. As the solvent for dissolving the synthetic resin, it is desirable to select a reducing high-boiling organic solvent having a hydroxyl group such as ethylene glycol, propylene glycol, glycerin, pentaerythritol, or terpineol.
【0013】本発明の導電性コーティング材料は上記成
分を三本ロールミル、ボールミル、アトライター等の混
練機により混練することによって調製され、ガラス、セ
ラミック、プラスチック等の基板にスクリーン印刷、ス
プレー等により通常10〜30μmの膜厚に塗布され、
上記したようにB粉末の活性化する550℃以上の温度
で焼成される。しかし焼成温度が650℃以上になると
B粉末存在下でもNi 粉末の酸化が起こるおそれがあ
るので望ましい焼成温度は550℃〜650℃とする。
焼成は大気中で行なう。焼成によりビヒクルを構成する
溶剤および合成樹脂は揮散し、ガラスフリットは溶融し
てNi 粉末を分散したマトリクスを形成する。そして
B粉末はB2O3となりマトリクス中に混合される。こ
のようにして基材表面に導電性かつ磁気シールド性の焼
成膜が形成される。The conductive coating material of the present invention is prepared by kneading the above components using a kneading machine such as a three-roll mill, a ball mill, or an attriter, and is usually applied to a substrate such as glass, ceramic, or plastic by screen printing, spraying, etc. It is applied to a film thickness of 10 to 30 μm,
As described above, the B powder is fired at a temperature of 550° C. or higher, which activates the B powder. However, if the firing temperature is 650°C or higher, oxidation of the Ni powder may occur even in the presence of the B powder, so the preferred firing temperature is 550°C to 650°C. Firing is performed in the atmosphere. By firing, the solvent and synthetic resin constituting the vehicle are volatilized, and the glass frit is melted to form a matrix in which Ni powder is dispersed. Then, the B powder becomes B2O3 and is mixed into the matrix. In this way, an electrically conductive and magnetically shielding fired film is formed on the surface of the base material.
【0014】[0014]
【作用】本発明の導電性コーティング材料は例えば導電
性ペーストとして基板上にスクリーン印刷により厚膜印
刷されるが、この際、Ni 粉末中の平均粒径3μm以
上の粗粉末は80重量%以下の混合比であり、更に該粗
粉末中に平均粒径3μm以上の箔片状粗粉末が70重量
%以下の混合比であるから印刷性は悪化しない。また形
成された厚膜印刷層内においてはNi 粉末中の平均粒
径が2μm以下の微粉末は70重量%以下の混合比であ
るから該Ni 粉末の総表面積は過大とならず焼成中に
Ni の酸化が起こりにくい。しかし該微粉末はNi
粉末中に20重量%以上含まれており、該微粉末は粗粉
末相互の間隙を充填し、更に該粗粉末中には該箔片状粗
粉末が10重量%以上含まれており、該箔片状粗粉末は
相互接触性が良好であり、その結果得られた導電性焼成
膜中のNi 粉末の充填密度は高くなり、良好な導電性
が得られる。[Operation] The conductive coating material of the present invention is thick-film printed on a substrate by screen printing, for example, as a conductive paste. At this time, the coarse powder with an average particle size of 3 μm or more in the Ni powder accounts for 80% by weight or less. Furthermore, since the flake-like coarse powder with an average particle diameter of 3 μm or more is contained in the coarse powder in an amount of 70% by weight or less, the printability is not deteriorated. In addition, in the formed thick film printing layer, since the fine powder with an average particle size of 2 μm or less in the Ni powder is mixed at a mixing ratio of 70% by weight or less, the total surface area of the Ni powder does not become excessive, and the Ni powder is removed during firing. oxidation is less likely to occur. However, the fine powder is Ni
The powder contains 20% by weight or more of the fine powder, and the fine powder fills the gaps between the coarse powders, and the coarse powder contains 10% by weight or more of the flaky coarse powder, and the foil The flaky coarse powder has good mutual contact, and as a result, the packing density of the Ni powder in the resulting conductive fired film becomes high, resulting in good conductivity.
【0015】一方Bは厚膜印刷層内中Ni 粉末とB粉
末との合計を100重量部とした場合、2.0重量部以
上含まれているので、該厚膜印刷層を大気中で焼成した
時選択的に酸化されてB2O3となりNi 粉末の酸化
を防止する。しかしB粉末は10重量部以下とされてい
るので得られる導電性焼成膜の導電性はB粉末により阻
害されない。On the other hand, since B is contained in an amount of 2.0 parts by weight or more when the total of Ni powder and B powder in the thick film printed layer is 100 parts by weight, the thick film printed layer is baked in the atmosphere. When this happens, it is selectively oxidized to become B2O3, which prevents the oxidation of the Ni powder. However, since the amount of B powder is 10 parts by weight or less, the conductivity of the resulting conductive fired film is not inhibited by the B powder.
【0016】ガラスフリットは焼成中に溶融してNi
粉末を被覆して空気との直接接触を阻止しNi 粉末の
酸化を防止し、また導電性焼成膜中ではNi 粉末を分
散したマトリクスを形成してNi 粉末に対するバイン
ダーとしての役目を果たす。[0016] The glass frit melts during firing and becomes Ni.
The powder is coated to prevent direct contact with air to prevent oxidation of the Ni powder, and in the conductive fired film, a matrix in which the Ni powder is dispersed is formed to serve as a binder for the Ni powder.
【0017】[0017]
【実施例】Ni 粉末中の粗粉末としてアトマイズ法に
より製造した平均粒径11.5μmの粗粉末と、該粗粉
末をアトライターにより擂潰して製造した平均粒径16
.4μmの箔片状粗粉末とを用い、微粉末として湿式還
元法で製造した平均粒径0.8μmの微粉末を用い、B
粉末として平均粒径0.7μmのアモルファスタイプの
ものを用いた。更にガラスフリットとしては軟化点44
0℃のものを用い、ビヒクルとしてはエチルセルロース
のテルピネオール溶液を用いた。[Example] A coarse powder with an average particle size of 11.5 μm produced by the atomization method as a coarse powder in Ni powder, and a coarse powder with an average particle diameter of 16 μm produced by crushing the coarse powder with an attritor.
.. Using a flaky coarse powder of 4 μm and a fine powder with an average particle size of 0.8 μm produced by a wet reduction method as a fine powder, B
An amorphous type powder with an average particle size of 0.7 μm was used. Furthermore, as a glass frit, the softening point is 44.
A temperature of 0° C. was used, and a terpineol solution of ethyl cellulose was used as the vehicle.
【0018】上記成分は表1に示す組成で混合され、三
本ロールミルにより混練して導電性ペーストサンプルN
o.1〜No.10を調製した。同様にして上記成分を
表2に示す組成で混合かつ混練して比較導電性ペースト
サンプル比No.1〜No.6を調製した。The above components were mixed in the composition shown in Table 1 and kneaded in a three-roll mill to form conductive paste sample N.
o. 1~No. 10 was prepared. In the same manner, the above components were mixed and kneaded with the composition shown in Table 2, and a comparison conductive paste sample ratio No. 1 was obtained. 1~No. 6 was prepared.
【表1】[Table 1]
【表2】[Table 2]
【0019】上記サンプルNo.1〜No.10および
比No.1〜比No.6はガラス基板表面に♯200ポ
リエステル繊維製スクリーンを用いて幅5mm、長さ2
0mmの短冊形に印刷され、200℃で乾燥した後61
0℃×10分の大気中での焼成を3回行ない、焼成のつ
ど該焼成膜の表面抵抗値(mΩ/□)を4探針法(共和
理研製抵抗測定器705RL)で測定するとともに該焼
成膜の表面状態を肉眼で判断した。なお該焼成膜の厚さ
は20μmであった。その結果を表3および表4に示す
。[0019] The above sample No. 1~No. 10 and ratio no. 1 to ratio No. 6 uses a #200 polyester fiber screen on the surface of the glass substrate with a width of 5 mm and a length of 2
61 after being printed on a 0 mm strip and drying at 200°C.
Firing was performed in the atmosphere at 0°C for 10 minutes three times, and after each firing, the surface resistance value (mΩ/□) of the fired film was measured using the four-probe method (Kyowa Riken Resistance Measuring Instrument 705RL). The surface condition of the fired film was visually judged. Note that the thickness of the fired film was 20 μm. The results are shown in Tables 3 and 4.
【表3】[Table 3]
【表4】[Table 4]
【0020】表3によれば、本発明のサンプルNo.1
〜No.10は焼成回数によらず安定して低い抵抗値を
示し、またNo.8〜No.9を比較するとB粉末の量
に対する導電性の変化は少ないが、表4において微粉末
を70重量%以上含む比1ではNi 粉末の酸化が進む
結果高抵抗値を示し、しかも焼成回数により抵抗値が大
きく変化し、粗粉末を80重量%以上含む比2では同様
に焼成回数により不安定な高抵抗値を示し、また粗粉末
中箔片状粗粉末を10重量%以下で含む比3は本発明の
サンプルNo.4と比べて抵抗値が若干高く焼成回数に
よっても抵抗値の変動が若干大きい。しかし箔片状粗粉
末を70重量%以上で含む比4では抵抗値が高くかつ焼
成膜の表面の平滑性が劣るようになる。B粉末を2重量
部以下で含む比5ではNi 粉末は殆ど酸化されて非導
電性となり、B粉末を10重量部以上で含む比6は焼成
回数により不安定な高抵抗値を示す。According to Table 3, sample No. of the present invention. 1
~No. No. 10 showed a stable low resistance value regardless of the number of firings, and No. 8~No. 9, there is little change in conductivity depending on the amount of B powder, but in Table 4, ratio 1 containing 70% by weight or more of fine powder shows a high resistance value as a result of oxidation of the Ni powder, and the resistance value increases depending on the number of firings. Ratio 2, which contains 80% by weight or more of coarse powder, similarly shows an unstable high resistance value depending on the number of firings, and Ratio 3, which contains 10% by weight or less of flaky coarse powder in the coarse powder, shows a high resistance value. Invention sample no. The resistance value is slightly higher than that of No. 4, and the resistance value fluctuates slightly depending on the number of firings. However, when ratio 4 contains 70% by weight or more of flaky coarse powder, the resistance value is high and the surface smoothness of the fired film becomes poor. In ratio 5 containing 2 parts by weight or less of B powder, most of the Ni powder is oxidized and becomes non-conductive, and in ratio 6 containing 10 parts by weight or more of B powder, a high resistance value is unstable depending on the number of firings.
【0021】[0021]
【考案の効果】したがって本発明の導電性コーティング
材料による塗膜は焼成によってもNi 粉末の酸化が防
止され、良好な導電性を示す焼成膜が得られる。また繰
り返し焼成によっても導電性の変化が少なく安定であり
、更にB粉末の添加量が2.0〜10重量部の範囲では
B粉末の添加量の変動によっても得られる焼成膜の導電
性の変化が少なくなる。このような特徴は特に繰り返し
焼成の行なわれるプラズマディスプレーの電極形成材料
として有用である。[Effects of the Invention] Therefore, in the coating film made of the conductive coating material of the present invention, oxidation of the Ni powder is prevented even when fired, and a fired film exhibiting good conductivity can be obtained. Furthermore, even after repeated firing, the conductivity is stable with little change, and furthermore, when the amount of B powder added is in the range of 2.0 to 10 parts by weight, the conductivity of the fired film obtained can be changed even by changing the amount of B powder added. becomes less. Such characteristics are particularly useful as a material for forming electrodes of plasma displays, which are subjected to repeated firing.
Claims (1)
よびビヒクルからなり、該Ni 粉末は平均粒径3μm
以上の粗粉末と平均粒径2μm以下の微粉末との重量比
率が30:70から80:20である混合物であり、該
粗粉末の10〜70重量%が平均粒径3μm以上の箔片
状粗粉末であり、該B粉末はNi 粉末とB粉末との合
計を100重量部とした場合2.0から10重量部の範
囲で含まれることを特徴とする導電性コーティング材料Claim 1: Consisting of Ni powder, B powder, glass frit, and vehicle, the Ni powder has an average particle size of 3 μm.
It is a mixture in which the weight ratio of the above coarse powder and fine powder with an average particle size of 2 μm or less is 30:70 to 80:20, and 10 to 70% by weight of the coarse powder is in the form of flakes with an average particle size of 3 μm or more. A conductive coating material which is a coarse powder, and the B powder is contained in a range of 2.0 to 10 parts by weight when the total of Ni powder and B powder is 100 parts by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3018466A JPH04236270A (en) | 1991-01-17 | 1991-01-17 | Electrically conductive coating material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3018466A JPH04236270A (en) | 1991-01-17 | 1991-01-17 | Electrically conductive coating material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04236270A true JPH04236270A (en) | 1992-08-25 |
Family
ID=11972418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3018466A Withdrawn JPH04236270A (en) | 1991-01-17 | 1991-01-17 | Electrically conductive coating material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04236270A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104356737A (en) * | 2014-10-24 | 2015-02-18 | 天津翔盛粉末涂料有限公司 | Special high-conductivity material for conductive powder coating and preparation method of special high-conductivity material |
| WO2016075743A1 (en) * | 2014-11-10 | 2016-05-19 | 大研化学工業株式会社 | Conductive paste for atmospheric firing and method for producing same |
-
1991
- 1991-01-17 JP JP3018466A patent/JPH04236270A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104356737A (en) * | 2014-10-24 | 2015-02-18 | 天津翔盛粉末涂料有限公司 | Special high-conductivity material for conductive powder coating and preparation method of special high-conductivity material |
| WO2016075743A1 (en) * | 2014-11-10 | 2016-05-19 | 大研化学工業株式会社 | Conductive paste for atmospheric firing and method for producing same |
| KR20170043595A (en) * | 2014-11-10 | 2017-04-21 | 다이켄카가쿠 코교 가부시키가이샤 | Conductive paste for atmospheric firing and method for producing same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4888135A (en) | Electrically conductive powder and electrically conductive composition using the same | |
| US4122232A (en) | Air firable base metal conductors | |
| US10403421B2 (en) | Thick film resistor and production method for same | |
| US8298449B2 (en) | Dielectric composition with reduced resistance | |
| US10446290B2 (en) | Resistive composition | |
| US5876841A (en) | Conductive paste and conductor and ceramic substrate comprising the same | |
| JPH04236269A (en) | conductive coating material | |
| JP4006814B2 (en) | Thick film resistor paste and manufacturing method thereof | |
| JP4005772B2 (en) | Conductive paste | |
| JPH1166956A (en) | Conductive paste | |
| HK99693A (en) | Conductive paste composition | |
| JPH03176905A (en) | conductive paste | |
| JP2684718B2 (en) | Conductive paste | |
| JP2841586B2 (en) | Conductive paste | |
| JP2001273816A (en) | Conductive paste | |
| KR800001624B1 (en) | Air firable base metal condoctors | |
| JPH03203965A (en) | Paste for screen printing | |
| KR800001623B1 (en) | Thick Film Electrical Conductor Forming Paste | |
| JPH02212333A (en) | Composition for resistor manufacturing | |
| JPS61203504A (en) | Conductive paste | |
| JPH04230002A (en) | Thick film conductor composition | |
| JPH03201405A (en) | Composition for resistor manufacturing | |
| JP2001267752A (en) | Multi-layered wiring board | |
| JPS61203502A (en) | Conductive paste | |
| JPS6230165A (en) | Composition capable of forming electrically conductive film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980514 |