JPH04237179A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPH04237179A JPH04237179A JP548391A JP548391A JPH04237179A JP H04237179 A JPH04237179 A JP H04237179A JP 548391 A JP548391 A JP 548391A JP 548391 A JP548391 A JP 548391A JP H04237179 A JPH04237179 A JP H04237179A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- electrode
- pellet
- heat sink
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 41
- 239000008188 pellet Substances 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 230000003071 parasitic effect Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
Landscapes
- Semiconductor Lasers (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、半導体レーザ装置に関
し、特に光通信用の高速動作に適した半導体レーザ装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor laser device, and more particularly to a semiconductor laser device suitable for high-speed operation for optical communications.
【0002】0002
【従来の技術】従来の半導体レーザ装置は、直方体状の
半導体レーザペレットの向いあう2平面に、P,N両電
極を有し、一方の電極はヒートシンクの電極にダイボン
ディングされ、もう一方の電極は、ワイヤーボンディン
グによりパッケージのリード端子等に接続される構成と
なっていた。2. Description of the Related Art A conventional semiconductor laser device has P and N electrodes on two opposing planes of a rectangular parallelepiped semiconductor laser pellet. One electrode is die-bonded to an electrode of a heat sink, and the other electrode is die-bonded to an electrode of a heat sink. The structure was such that it was connected to the lead terminals of the package through wire bonding.
【0003】従来の半導体レーザ装置を図面を用いて説
明する。図6,図7,図8は、従来の半導体レーザ装置
の半導体レーザペレットの斜視図、ヒートシンクの斜視
図およびダイマウントの後ワイヤーボンディング後の縦
断面図を示す。半導体レーザペレット1は、半導体基板
2上にエピタキシャル成長層3が形成され300μm(
W)×300μm(D)×100μm(H)程度の大き
さに加工されたもので、電極は基板側のn−(p)電極
5とエピタキシャル成長層側のp−(n)電極4が形成
されている。ヒートシンク7は、シリコンやダイヤモン
ド等の直方体状の材料の2つの面に金等のヒートシンク
電極12,14が形成され、その上に融着剤を用いて半
導体レーザペレットがダイボンディングされている。
さらにヒートシンクの下側の電極14は融着剤によって
パッケージにダイボンディングされる。半導体レーザペ
レットのn側電極5上とパッケージリード端子の間はワ
イヤーホンディングによって結線された構造になってい
る。A conventional semiconductor laser device will be explained with reference to the drawings. 6, 7, and 8 show a perspective view of a semiconductor laser pellet of a conventional semiconductor laser device, a perspective view of a heat sink, and a vertical cross-sectional view after die mounting and wire bonding. The semiconductor laser pellet 1 has an epitaxial growth layer 3 formed on a semiconductor substrate 2 with a thickness of 300 μm (
It is processed to a size of approximately W) x 300 μm (D) x 100 μm (H), and the electrodes include an n-(p) electrode 5 on the substrate side and a p-(n) electrode 4 on the epitaxial growth layer side. ing. The heat sink 7 has heat sink electrodes 12 and 14 made of gold or the like formed on two surfaces of a rectangular parallelepiped material such as silicon or diamond, and a semiconductor laser pellet is die-bonded thereon using a fusing agent. Furthermore, the electrode 14 on the lower side of the heat sink is die-bonded to the package using a fusing agent. The structure is such that the n-side electrode 5 of the semiconductor laser pellet and the package lead terminal are connected by wire bonding.
【0004】0004
【発明が解決しようとする課題】上述した従来の半導体
レーザ装置は、パッケージ内の配線がワイヤーボンディ
ングによって行われており、使用する金やアルミニウム
のワイヤーは、通常数十ミクロンと細いため、寄生イダ
クタンスが大きく応答速度を制約しやすいという問題が
あった。[Problems to be Solved by the Invention] In the conventional semiconductor laser device described above, the wiring inside the package is done by wire bonding, and the gold or aluminum wire used is usually as thin as several tens of microns. There is a problem in that the response speed is likely to be restricted due to the large value.
【0005】[0005]
【課題を解決するための手段】本発明の半導体レーザ装
置は、半導体レーザペレットのエピタキシャル層側の面
に基板に達する段差を設け、露出した基板及びエピタキ
シャル成長層表面それぞれに電極が形成されており、前
記ペレットの段差と同じ高さの段差を有するヒートシン
ク上の2つの電極パターンにペレットのP,N電極がそ
れぞれ接続されていることを特徴としている。[Means for Solving the Problems] The semiconductor laser device of the present invention has a step reaching the substrate on the surface of the epitaxial layer side of the semiconductor laser pellet, and electrodes are formed on each of the exposed surfaces of the substrate and the epitaxial growth layer. It is characterized in that the P and N electrodes of the pellet are respectively connected to two electrode patterns on a heat sink having a step having the same height as the step of the pellet.
【0006】[0006]
【実施例】次に本発明について図面を参照して説明する
。図1,図2,図3は本発明の一実施例である。図1は
半導体レーザペレットの斜視図、図2はヒートシンクの
斜視図、図3は半導体レーザペレットをヒートシンクに
ダイボンディングした後の断面図、すなわち半導体レー
ザ装置の断面図を示す。半導体レーザペレット1は、図
1に示すようにエピタキシャル層3と基板2の一部を除
去し露出した基板上に形成したn−(p)電極5とエピ
タキシャル層上に形成したp−(n)電極4を有してい
る。ヒートシンク7は、前述した半導体レーザペレット
と同じ高さの段差を有し、さらに図2に示す様に、独立
した2つのパターン電極8および9を有している。図3
は本発明の半導体レーザペレット及びヒートシンクをダ
イボンディグした後の断面図である。半導体レーザペレ
ットの2つの電極4,5が、ヒートシンクの2つの電極
8,9に独立して接続されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained with reference to the drawings. 1, 2, and 3 show an embodiment of the present invention. FIG. 1 is a perspective view of a semiconductor laser pellet, FIG. 2 is a perspective view of a heat sink, and FIG. 3 is a cross-sectional view of the semiconductor laser pellet after die bonding to the heat sink, that is, a cross-sectional view of the semiconductor laser device. As shown in FIG. 1, the semiconductor laser pellet 1 consists of an n-(p) electrode 5 formed on the exposed substrate by removing part of the epitaxial layer 3 and the substrate 2, and a p-(n) electrode 5 formed on the epitaxial layer. It has an electrode 4. The heat sink 7 has a step having the same height as the semiconductor laser pellet described above, and further has two independent pattern electrodes 8 and 9, as shown in FIG. Figure 3
FIG. 2 is a cross-sectional view of the semiconductor laser pellet and heat sink of the present invention after die bonding. Two electrodes 4, 5 of the semiconductor laser pellet are independently connected to two electrodes 8, 9 of the heat sink.
【0007】図4,図5は本発明の第2の実施例を示す
。図4は半導体レーザペレットとヒートシンクのダイボ
ンディング後の縦断面図、図5はその斜視図を示す。
本実施例では、ヒートシンク上の電極パターン8,9は
、図4に示す様に、ヒートシンク側面を経由して底面ま
でつながっている。それぞれの電極パターンはさらにパ
ッケージ上に形成されている電極パターン10および1
1に接続されるようダイボンディングされており、パッ
ケージの信号入力端子まで導かれる。本実施例の構成に
依ればワイヤーボンディング工程を経ることなくダイボ
ンディング工程によって電気的接続まで完了し製造コス
トを低くおさえることがてきるとともに、寄生インダク
タンスを低く抑えることができ、高速応答に適した半導
体レーザ装置が得られる。FIGS. 4 and 5 show a second embodiment of the present invention. FIG. 4 is a longitudinal sectional view of the semiconductor laser pellet and the heat sink after die bonding, and FIG. 5 is a perspective view thereof. In this embodiment, the electrode patterns 8 and 9 on the heat sink are connected to the bottom surface via the side surface of the heat sink, as shown in FIG. Each electrode pattern further includes electrode patterns 10 and 1 formed on the package.
1, and is led to the signal input terminal of the package. According to the configuration of this embodiment, electrical connection is completed through the die bonding process without going through the wire bonding process, making it possible to keep manufacturing costs low, as well as keeping parasitic inductance low, making it suitable for high-speed response. A semiconductor laser device can be obtained.
【0008】[0008]
【発明の効果】以上説明したように本発明は、半導体レ
ーザペレットのエピタキシャル成長層側に設けたP,N
電極とヒートシンク表面に設けた2つのパターン電極と
をソルダーで結合することにより、ワイヤーボンディン
グする必要がなくワイヤーホンディングの細いワイヤー
によって生じる寄生インダクタンスを低減し、高速動作
に適した半導体レーザを提供するものである。Effects of the Invention As explained above, the present invention provides a method for reducing the amount of P and N provided on the epitaxial growth layer side of a semiconductor laser pellet.
By bonding the electrode and two pattern electrodes provided on the surface of the heat sink with solder, there is no need for wire bonding, and the parasitic inductance caused by the thin wire of wire bonding is reduced, thereby providing a semiconductor laser suitable for high-speed operation. It is something.
【図1】本発明による半導体レーザペレットの斜視図。FIG. 1 is a perspective view of a semiconductor laser pellet according to the present invention.
【図2】本発明によるヒートシンクの斜視図。FIG. 2 is a perspective view of a heat sink according to the invention.
【図3】本発明の半導体レーザ装置の一実施例の断面図
。FIG. 3 is a sectional view of an embodiment of the semiconductor laser device of the present invention.
【図4】本発明の第2の実施例の断面図。FIG. 4 is a sectional view of a second embodiment of the invention.
【図5】本発明の第2の実施例の斜視図。FIG. 5 is a perspective view of a second embodiment of the invention.
【図6】従来の半導体レーザペレットの斜視図。FIG. 6 is a perspective view of a conventional semiconductor laser pellet.
【図7】従来のヒートシンクの斜視図。FIG. 7 is a perspective view of a conventional heat sink.
【図8】従来の半導体レーザ装置の断面図。FIG. 8 is a cross-sectional view of a conventional semiconductor laser device.
1 半導体ペレット 2 半導体基板 3 エピタキシャル成長層 4 p(n)電極 5 n(p)電極 7 ヒートシンク 8 n(p)側電極 9 p(n)側電極 10,11 パッケージ電極 12,14 ヒートシンク電極 1 Semiconductor pellet 2 Semiconductor substrate 3 Epitaxial growth layer 4 p(n) electrode 5 n(p) electrode 7 Heat sink 8 n(p) side electrode 9 p(n) side electrode 10, 11 Package electrode 12, 14 Heat sink electrode
Claims (1)
ル成長層側に基板に達する段差を設け、エピタキシャル
成長層表面及びエピタキシャル成長層側に露出した基板
面に各々P,N両電極を配置し、さらに前記段差と同じ
高さの段差を設けたヒートシンクに2つの電極パターン
を設け、該半導体レーザ及びヒートシンクの段差を合せ
て、半導体レーザペレットのP及びN電極がそれぞれヒ
ートシンクの2つの電極パターンに接続したことを特徴
とする半導体レーザ装置。1. A step reaching the substrate is provided on the epitaxial growth layer side of the semiconductor laser pellet, and both P and N electrodes are arranged on the epitaxial growth layer surface and the substrate surface exposed to the epitaxial growth layer side, and the height is the same as the step height. A semiconductor characterized in that two electrode patterns are provided on a heat sink having a step, and the P and N electrodes of the semiconductor laser pellet are connected to the two electrode patterns of the heat sink, respectively, by combining the steps of the semiconductor laser and the heat sink. laser equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP548391A JPH04237179A (en) | 1991-01-22 | 1991-01-22 | Semiconductor laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP548391A JPH04237179A (en) | 1991-01-22 | 1991-01-22 | Semiconductor laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04237179A true JPH04237179A (en) | 1992-08-25 |
Family
ID=11612494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP548391A Pending JPH04237179A (en) | 1991-01-22 | 1991-01-22 | Semiconductor laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04237179A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5869916A (en) * | 1995-05-26 | 1999-02-09 | Asmo Co., Ltd. | Electrostatic actuator with different electrode spacing |
| US7605402B2 (en) | 2003-12-26 | 2009-10-20 | Opnext Japan, Inc. | Structure of chip carrier for semiconductor optical device, optical module, and optical transmitter and receiver |
| KR100922847B1 (en) * | 2007-11-07 | 2009-10-20 | 삼성전기주식회사 | Laser diode and manufacturing method thereof |
-
1991
- 1991-01-22 JP JP548391A patent/JPH04237179A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5869916A (en) * | 1995-05-26 | 1999-02-09 | Asmo Co., Ltd. | Electrostatic actuator with different electrode spacing |
| US7605402B2 (en) | 2003-12-26 | 2009-10-20 | Opnext Japan, Inc. | Structure of chip carrier for semiconductor optical device, optical module, and optical transmitter and receiver |
| KR100922847B1 (en) * | 2007-11-07 | 2009-10-20 | 삼성전기주식회사 | Laser diode and manufacturing method thereof |
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