JPH04250643A - Arrangement substrate of fine metal ball - Google Patents
Arrangement substrate of fine metal ballInfo
- Publication number
- JPH04250643A JPH04250643A JP3025312A JP2531291A JPH04250643A JP H04250643 A JPH04250643 A JP H04250643A JP 3025312 A JP3025312 A JP 3025312A JP 2531291 A JP2531291 A JP 2531291A JP H04250643 A JPH04250643 A JP H04250643A
- Authority
- JP
- Japan
- Prior art keywords
- hole
- diameter
- bumps
- substrate
- fine metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10227—Other objects, e.g. metallic pieces
- H05K2201/10234—Metallic balls
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、ICチップの半導体素
子の実装技術の一つであるTAB(Tape Auto
mated Bonding)において、接合用のバン
プとなる微細金属球を所定の配列パターンに従って配列
してTABテープのリード先端部に転写する際に使用す
る、微細金属球の配列基板およびその製造方法に関する
。[Industrial Application Field] The present invention is directed to TAB (Tape Auto), which is one of the mounting techniques for semiconductor elements of IC chips.
The present invention relates to an array substrate of fine metal balls used for arranging fine metal balls to be bumps for bonding according to a predetermined array pattern and transferring them to the lead tips of a TAB tape in mated bonding, and a method for manufacturing the same.
【0002】0002
【従来の技術】TAB法は、ICチップの電極部へのリ
ード配線を、TABテープ上にパターン化されて形成さ
れているリードの先端部分とICチップの電極部分とを
、バンプと呼ばれる接合用の金属突起を介して接合する
方法である。バンプは予めTABテープ側のリード部か
もしくはICチップ側の電極部に取り付けられており、
TABテープとICチップの接合は、ボンディングマシ
ンを使用して加熱、加圧することによって行われている
。[Prior Art] The TAB method connects the lead wires to the electrodes of an IC chip by bonding the tips of the leads, which are patterned on a TAB tape, and the electrodes of the IC chip using bumps. This is a method of joining via metal protrusions. The bumps are attached in advance to the lead part on the TAB tape side or the electrode part on the IC chip side.
The TAB tape and the IC chip are bonded by applying heat and pressure using a bonding machine.
【0003】バンプをICチップ側でなくTABテープ
側に形成する方法(バンプ付きTAB)はバンプ形成中
にICチップを損傷する心配の無いことから、近年広く
行われるようになってきた。このバンプ付きTABの従
来の製造方法としては、リードを厚めに作った後にバン
プになる部分を残してエッチング等で削り取ることによ
って薄いリードとする方法や、予めガラス等の基板上に
メッキで形成されたバンプをリード先端部に転写する方
法等がある。しかし、これらの方法で作製されたバンプ
付きTABテープのバンプは形状が矩形に近いものとな
るため、ICチップの電極との接合にバラツキが生じ易
いという欠点があった。A method of forming bumps on the TAB tape side rather than on the IC chip side (TAB with bumps) has become widely used in recent years because there is no risk of damaging the IC chip during bump formation. Conventional methods for manufacturing TABs with bumps include making the leads thicker and then etching them off leaving the parts that will become bumps to make them thinner, or forming them in advance by plating on a substrate such as glass. There are methods such as transferring the bumps to the lead tips. However, since the bumps of the bumped TAB tape produced by these methods have a nearly rectangular shape, there is a drawback that the bonding with the electrodes of the IC chip tends to vary.
【0004】本発明者らは先に、TABテープのリード
先端部分に球形状のバンプを形成する新しい方法を特願
平1−234917号として出願した。この方法による
新しいバンプ付きTABの製作から、ICチップとの接
合に使われるまでの工程を概略的に示したのが図1であ
る。この内一次接合はバンプとなる微細金属球4を配列
基板5の貫通穴の上に吸引して仮固定した後、TABテ
ープ2の上に形成されているリード3の先端部に一括接
合する工程である。また二次接合は、一次接合でバンプ
を形成されたTABテープのリード部とICチップ1の
電極部とを接合する工程である。二次接合の方はICチ
ップの実装において行われるものであるのに対して、一
次接合はバンプ付きTABの製作のために行われる工程
である。この一次接合工程では、バンプとなる微細金属
球を定まった配列パターンに従って仮配列するための配
列基板が使用されるが、配列基板の性能はこの方法の実
用性を左右する重要な要因の一つである。The present inventors previously filed a new method for forming spherical bumps at the leading ends of TAB tapes in Japanese Patent Application No. 1-234917. FIG. 1 schematically shows the steps from manufacturing a new bumped TAB using this method to using it for bonding with an IC chip. The primary bonding is a step in which fine metal balls 4 that will become bumps are sucked onto the through holes of the array substrate 5 and temporarily fixed, and then bonded all at once to the tips of the leads 3 formed on the TAB tape 2. It is. Further, the secondary bonding is a process of bonding the lead portion of the TAB tape on which bumps have been formed in the primary bonding to the electrode portion of the IC chip 1. Secondary bonding is performed when mounting an IC chip, whereas primary bonding is a process performed for manufacturing a TAB with bumps. In this primary bonding process, an array substrate is used to temporarily arrange the fine metal balls that will become the bumps according to a fixed array pattern, but the performance of the array substrate is one of the important factors that determines the practicality of this method. It is.
【0005】[0005]
【発明が解決しようとする課題】球形状のバンプはこれ
までのガラス基板等の上にメッキで形成された矩形のバ
ンプに比べて変形しやすく、接合の点で有利なものであ
る。しかしながら、メッキによってバンプを形成する場
合には始から配列すべき所定の位置を特定して形成する
ことができるのに対して、球形状のバンプはバラバラの
状態で作製されるため、所定の位置に能率良く配列した
ものをTABテープ上のリード部に確実に接合すること
が必要である。従来この問題の解決には、例えば特願平
2−179266号や特願平2−183645号に記載
されているような、バンプを配列すべき位置に貫通穴を
設けた配列基板が用いられている。基板に貫通穴を加工
する手段としては、レーザー加工やエレクトロフォーミ
ング法や精密放電加工等の方法があるが、これらのいず
れの方法を採用しても、直径60μm程度の円形貫通穴
を形成するのが実用的な厚みの基板に対する加工の限界
であった。これらの貫通穴には、バンプとなる微細金属
球を傷をつけることなく軟らかく仮固定できることが望
ましいのは当然のことであるから、穴の周辺部に丸みを
つけるなどの細かい配慮をすべきところであるにもかか
わらず、加工法の制限から実際上は穴をあけるのが精一
杯という状況であった。SUMMARY OF THE INVENTION Spherical bumps are easier to deform than conventional rectangular bumps formed by plating on glass substrates, etc., and are advantageous in terms of bonding. However, when forming bumps by plating, it is possible to specify and form the predetermined positions from the beginning where they should be arranged, whereas spherical bumps are manufactured in pieces, so they cannot be formed at the predetermined positions. It is necessary to reliably join the leads arranged in an efficient manner to the lead portions on the TAB tape. Conventionally, to solve this problem, an array substrate having through holes provided at the positions where bumps are to be arrayed has been used, as described in Japanese Patent Application No. 2-179266 and Japanese Patent Application No. 2-183645, for example. There is. There are methods such as laser machining, electroforming, and precision electrical discharge machining to form through holes in substrates, but no matter which method is used, it is difficult to form circular through holes with a diameter of about 60 μm. was the limit of processing for substrates of practical thickness. It goes without saying that it is desirable for these through-holes to be able to temporarily fix fine metal balls that will become bumps in a soft manner without damaging them. Despite this, due to limitations in processing methods, in practice the only option was to drill holes.
【0006】一方、半導体の実装技術は高密度化を辿っ
ており、これに伴ってバンプとしての微細金属球も小さ
なものが要求されるようになってきた。すなわちリード
とリードとの間隔が狭くなってくると、大きなバンプを
使用していたのではチップとの接合時にバンプが変形し
て隣のリードのバンプとの間で短絡する虞が生じて来る
。さらにTABにおいてはインナーリードのピッチが1
00μm以下という高密度実装への対応も当然にして期
待されており、この場合にバンプとして使用される微細
金属球の直径は必然的に小さいことが要求されることに
なる。具体的には50μm以下の極微細直径のバンプを
処理することのできる精密な配列基板が求められるよう
になっている。さらにバンプのサイズが小さくなるほど
、貫通穴の周辺に残った小さなバリでも、仮固定された
バンプをTABテープのリード部に接合するための支障
になりやすい。このため、配列基板については、単に微
小な貫通穴を加工するだけでなく、穴の周辺部が滑らか
になるように加工して、できるだけバンプを傷つけない
ものが強く求められる傾向にある。[0006] On the other hand, semiconductor packaging technology is becoming more dense, and along with this, smaller fine metal balls as bumps are also required. That is, as the distance between the leads becomes narrower, if large bumps are used, there is a risk that the bumps will deform when bonded to the chip and cause a short circuit with the bumps of adjacent leads. Furthermore, in TAB, the inner lead pitch is 1
It is naturally expected that high-density packaging of 00 μm or less can be supported, and in this case, the diameter of the fine metal balls used as bumps will necessarily be required to be small. Specifically, there is a growing demand for a precisely arrayed substrate that can process bumps with extremely fine diameters of 50 μm or less. Furthermore, as the size of the bump becomes smaller, even small burrs remaining around the through hole are more likely to become an obstacle to bonding the temporarily fixed bump to the lead portion of the TAB tape. For this reason, there is a strong demand for array substrates that are not only machined with minute through-holes, but also machined so that the periphery of the hole is smooth so that the bumps are not damaged as much as possible.
【0007】本発明は上記事情に基づいてなされたもの
であり、特に高密度のTAB用に、バンプとなる微細な
金属球を配列しリード先端部分に効率良く接合させるた
めに用いる微細金属球の配列基板とその製造方法の提供
を目的とするものである。The present invention has been made based on the above-mentioned circumstances, and is a method of fine metal balls used for arranging fine metal balls to serve as bumps and efficiently bonding them to the lead tips, especially for high-density TAB. The purpose of this invention is to provide an array substrate and a method for manufacturing the same.
【0008】[0008]
【課題を解決するための手段】上記の目的を達成するた
めの本発明は、微細金属球の配列パターンに対応する貫
通穴を備え、前記貫通穴がメッキ層によりすぼめられ、
開口径が100μm以下である微細金属球の配列基板、
および基板に微細金属球の配列パターンに対応する貫通
穴を形成し、貫通穴の形成に当たっては、目標とする穴
径よりやや大きめの貫通穴とし、メッキによって穴径を
すぼめることによって目標とする穴径を得ることを特徴
とするものである。なお、前記基板の貫通穴の穴径は、
基板表面側と裏面側とで異なっていても差し支えない。[Means for Solving the Problems] To achieve the above object, the present invention includes a through hole corresponding to an arrangement pattern of fine metal balls, the through hole is narrowed by a plating layer,
An array substrate of fine metal spheres with an opening diameter of 100 μm or less,
Then, a through hole is formed in the substrate corresponding to the arrangement pattern of the fine metal balls, and when forming the through hole, the through hole is made slightly larger than the target hole diameter, and the hole diameter is reduced by plating to achieve the target. It is characterized by obtaining the hole diameter. Note that the hole diameter of the through hole in the board is
There is no problem even if the front side and back side of the board are different.
【0009】開口径が100μm以下の場合のみに限定
した理由は以下の通りである。通常、たとえばTABで
使用されるバンプサイズとしては150μm程度以下が
ほとんどであるから、使用する基板の貫通穴の開口径も
当然バンプサイズより小さい範囲となる。しかも開口径
が100μm以上のものについては現状の加工技術で特
に困難を伴わずに形成できるものである。本発明は、高
密度実装の要求に従ってますます小さなバンプの使用が
必要となる実状を配慮し、特に現状の加工で困難を伴う
貫通穴の開口径範囲として100μm以下の極微細な範
囲を対象と定めた。The reason why the opening diameter is limited to 100 μm or less is as follows. Normally, the bump size used in TAB, for example, is approximately 150 μm or less, so the opening diameter of the through hole of the substrate used is naturally within a range smaller than the bump size. Moreover, an opening having an opening diameter of 100 μm or more can be formed without any particular difficulty using current processing techniques. The present invention takes into consideration the actual situation where it is necessary to use increasingly smaller bumps in accordance with the requirements for high-density packaging, and specifically targets the extremely fine opening diameter range of 100 μm or less for through-holes, which is difficult in current processing. Established.
【0010】本発明が、図1の一次接合工程で用いられ
るバンプの配列基板5に関わるものであることは前述の
通りであるが、このような用途に使用される配列基板と
しては、■バンプの径より小さめの均一な貫通穴を有し
、■一つの貫通穴には確実に1ケだけの微細金属球が傷
つけられることなく吸引、仮固定され、■TABテープ
のリード部に微細金属球が接合された後の離脱が容易で
、■繰り返し使用に耐える耐久性をもつ、ことが要求さ
れる。As mentioned above, the present invention relates to the bump array substrate 5 used in the primary bonding process of FIG. It has uniform through-holes smaller than the diameter of , ■ Only one fine metal ball is reliably sucked and temporarily fixed in each through-hole without being damaged, and ■ Fine metal balls are attached to the lead part of the TAB tape. They are required to be easy to separate after being bonded, and have durability that can withstand repeated use.
【0011】ところで、一般に耐久性の十分な厚い基板
に対して、微細で均一な多数の貫通穴が一定のパターン
を形成するように加工するのは非常な困難を伴う。例え
ばエレクトロフォーミング法の場合、直径60μmの貫
通穴を形成できる最大板厚は30μm程度になってしま
うし、特殊な放電加工を用いても板厚100μmの基板
の場合は直径60μmほどの貫通穴を加工するのが精一
杯というのが現状である。レーザー加工法はこれらに比
べてやや小さい穴加工が可能であるが、貫通穴の真円度
を確保できる限界としては、前記の放電加工法と実質的
には大差はなくなってしまう。By the way, it is generally very difficult to process a sufficiently durable thick substrate so that a large number of fine and uniform through holes form a certain pattern. For example, in the case of electroforming, the maximum board thickness that can form a through hole of 60 μm in diameter is about 30 μm, and even if special electrical discharge machining is used, a through hole of about 60 μm in diameter can be formed in a board with a thickness of 100 μm. The current situation is that processing is the best we can do. Although the laser machining method is capable of machining holes that are slightly smaller than these methods, the limit for ensuring the roundness of the through hole is essentially the same as the electric discharge machining method described above.
【0012】本発明においては、放電加工などの方法で
予め一定のサイズの貫通穴を加工した後に、メッキによ
って穴径をすぼめられるので、従来の加工法の限界を越
えた小さな穴径の貫通穴が容易に形成される。このため
、基板板厚が同一であれば、高密度実装に耐えられる、
より小さな微細金属球の配列に使用できる小さな穴径の
貫通穴が得られる。また貫通穴径が同一のもので良い場
合には、強度の高い厚い基板を選択することができるた
め、繰り返し使用寿命を長くすることができる。[0012] In the present invention, after a through hole of a certain size is previously machined by a method such as electric discharge machining, the hole diameter is reduced by plating, so that a through hole with a small diameter that exceeds the limits of conventional machining methods can be formed. is easily formed. Therefore, if the board thickness is the same, it can withstand high-density mounting.
A through hole with a small hole diameter that can be used for arranging smaller fine metal spheres is obtained. Furthermore, if the through-hole diameters are the same, a thick substrate with high strength can be selected, and the life of repeated use can be extended.
【0013】また、従来の他の加工法であけられた貫通
穴の場合には、穴の周辺部に微小なバリができることが
多く、これが仮配列された微細金属球に傷をつけたり、
さらにはテープに接合された後の基板からの離脱を阻害
する原因になったりすることがあった。これに対して、
本発明ではメッキ層によって穴周辺のコーナー部やバリ
が丸みを帯びる結果として、微細金属球の座り並びに接
合後の離脱が極めて良好となる。またメッキ方法として
は、従来公知のニッケルなどの化学メッキが利用できる
。[0013] Furthermore, in the case of through holes drilled using other conventional processing methods, minute burrs are often formed around the hole, and these may damage the temporarily arranged fine metal spheres.
Furthermore, it may become a cause of inhibiting separation from the substrate after being bonded to the tape. On the contrary,
In the present invention, the corners and burrs around the holes are rounded by the plating layer, so that the fine metal balls sit very well and are easily separated after bonding. Further, as a plating method, conventionally known chemical plating such as nickel can be used.
【0014】さらに配列基板は、貫通穴の径を基板板厚
の途中で変更するか、2枚の異なる貫通穴径を有する基
板を重ね合わせる方法によって、表面側と裏面側とで穴
径が異なるように製作される場合がある。表面側の穴径
を微細金属球の直径より小さくして裏面側の直径を大き
く作るのは、基板の強度を補強する狙いである。逆に、
裏面側の穴径を微細金属球の直径より小さくして表面側
の穴径を微細金属球の直径より多少大きめに作るのは、
1ケの貫通穴に複数の微細金属球が集合して吸引される
のを防止する狙いである。さらには両者の効果の複合を
狙った基板、すなわち表面側と裏面側の穴径に対して基
板の中間部分の穴径が小さいケースも、必要に応じて採
用する場合がある。これらの、基板表裏面で穴径の異な
る貫通穴を有する基板に対してメッキ層を形成した場合
にも、上記の効果は同じようにもたらされるものである
から、本発明の範囲に包含される。Furthermore, the array substrate has different hole diameters on the front and back sides, either by changing the diameter of the through holes midway through the thickness of the substrate, or by stacking two substrates with different through hole diameters. It may be manufactured as such. The purpose of making the hole diameter on the front side smaller than the diameter of the fine metal sphere and making the diameter on the back side larger is to strengthen the strength of the substrate. vice versa,
Making the hole diameter on the back side smaller than the diameter of the fine metal ball and making the hole diameter on the front side slightly larger than the diameter of the fine metal ball is as follows.
The aim is to prevent multiple fine metal balls from gathering and being sucked into one through hole. Furthermore, a board that aims to combine both effects, that is, a case where the hole diameter in the middle part of the board is smaller than the hole diameter on the front side and the back side, may be adopted as necessary. Even when a plating layer is formed on a substrate having through-holes with different hole diameters on the front and back surfaces of the substrate, the above-mentioned effects are similarly brought about, and therefore it is included in the scope of the present invention. .
【0015】[0015]
【作用】配列基板の裏側を減圧することによって表面側
貫通穴部に吸引力を発生させ、バンプとなる微細金属球
を吸引することによって配列を容易に行うことができる
。本発明による基板は、レーザーや放電加工やエレクト
ロフォーミング法等によって目標とする貫通穴径よりは
多少大きめの穴をまずあけた後に、メッキを施すことに
よって穴径が目標サイズになるまで縮径されると同時に
、メッキによって穴周辺が丸みを帯びる結果として、従
来にない極微細なバンプの配列・仮固定ならびにリード
への円滑なバンプ転写接合を可能とする。[Operation] By reducing the pressure on the back side of the arrangement substrate, a suction force is generated in the through-hole portion on the front surface side, and by suctioning the fine metal balls that will become bumps, arrangement can be easily performed. In the substrate according to the present invention, a hole slightly larger than the target through hole diameter is first drilled by laser, electrical discharge machining, electroforming, etc., and then the hole diameter is reduced by plating until the hole diameter reaches the target size. At the same time, the area around the hole is rounded by the plating, making it possible to arrange and temporarily fix extremely fine bumps that were previously unheard of, as well as to smoothly transfer and bond the bumps to the leads.
【0016】[0016]
【実施例】実施例 1
四辺外周部に140μmピッチで合計200個の電極を
有するICチップの実装に使用するTABテープのリー
ド部に金バンプを接合するために、厚さ0.1mmのス
テンレス製の配列基板を用いた。用いた配列基板は2種
類あり、基板1は精密放電加工によって直径60μmの
貫通穴をチップの電極の配列パターンに合わせて200
個あけた従来タイプの基板(比較例)である。他方の本
発明の基板2は、精密放電加工によって直径65μmの
貫通穴をあけた後、化学メッキ法によってニッケルを付
着させ、貫通穴の内径が基板1と同じ60μmになるよ
うに穴径をすぼめたものである。[Example] Example 1 In order to bond a gold bump to the lead part of a TAB tape used for mounting an IC chip, which has a total of 200 electrodes at a pitch of 140 μm on the outer periphery of four sides, a stainless steel tape with a thickness of 0.1 mm was used. array substrate was used. There are two types of array substrates used.Substrate 1 has 200 through holes with a diameter of 60 μm made by precision electrical discharge machining to match the array pattern of the chip's electrodes.
This is a conventional type board (comparative example) with individual holes. The other substrate 2 of the present invention is made by drilling a through hole with a diameter of 65 μm by precision electrical discharge machining, and then applying nickel by chemical plating to reduce the hole diameter so that the inner diameter of the through hole is 60 μm, the same as that of the substrate 1. It is something that
【0017】これら2種類の基板を使い、直径80μm
の微細金属球をバンプとして、前記TABテープのリー
ド部分へのバンプの接合(一次接合)を行った。バンプ
の接合条件はいずれも、ツールの温度500°C、加圧
20g/リードとし、基板1および2の各々で10コマ
ずつの一次接合を行った。[0017] Using these two types of substrates, a diameter of 80 μm was obtained.
The bump was bonded to the lead portion of the TAB tape (primary bonding) using the fine metal sphere as a bump. The bump bonding conditions were a tool temperature of 500° C. and a pressure of 20 g/lead, and primary bonding was performed for 10 frames on each of substrates 1 and 2.
【0018】試験結果を表1に示す。一次接合状況は、
基板1と基板2のシリーズで接合率に差が生じている。
基板1のシリーズではかなりの頻度でバンプがリードに
接合しない状態が生じたが、これは基板1の貫通穴の周
辺のバリにバンプがひっかかって、うまく離脱しなかっ
た結果である。基板2のシリーズではこの種の不具合は
一切発生せず、きわめて安定した一次接合が行われた。
この結果から、本発明の基板は従来基板と同一サイズの
貫通穴に対して用いた場合でも、バンプの一次接合率が
改善されることがわかる。The test results are shown in Table 1. The primary bonding situation is
There is a difference in bonding rate between the series of substrates 1 and 2. In the board 1 series, the bumps did not bond to the leads quite often, but this was the result of the bumps getting caught in the burrs around the through holes of board 1 and not being released properly. With the substrate 2 series, this type of defect did not occur at all, and extremely stable primary bonding was achieved. From these results, it can be seen that the primary bonding rate of bumps is improved even when the substrate of the present invention is used for a through hole of the same size as the conventional substrate.
【0019】[0019]
【表1】[Table 1]
【0020】実施例 2
実施例1と同じTABテープを用い、厚さ0.1mmの
ステンレス製配列基板に放電加工法によって直径60μ
mの貫通穴をあけた後、ニッケルをメッキして貫通穴径
を50μmにすぼめた。この基板を用いて直径60μm
の微細金球を配列し、10コマのTABテープのリード
部に一次接合を行った。一次接合のバンプ接合率はすべ
て100%であった。Example 2 Using the same TAB tape as in Example 1, a stainless steel array substrate with a thickness of 0.1 mm was coated with a diameter of 60 μm by electrical discharge machining.
After drilling a through hole with a diameter of m, the diameter of the through hole was reduced to 50 μm by plating with nickel. Using this substrate, the diameter is 60 μm.
The fine gold spheres were arranged and primary bonded to the lead part of 10 pieces of TAB tape. The bump bonding rate of all primary bonding was 100%.
【0021】つぎにこの直径60μmのバンプを接合さ
れたTABテープ10コマと、先の実施例1におけるN
o.11〜20に示された直径80μmのバンプを接合
されたTABテープ10コマを用いて、ICチップとの
間の二次接合試験を行った。Next, 10 frames of TAB tape to which bumps of 60 μm in diameter were bonded and the N
o. A secondary bonding test with an IC chip was conducted using 10 pieces of TAB tape shown in Nos. 11 to 20 to which bumps with a diameter of 80 μm were bonded.
【0022】直径80μmのバンプを使用したTABテ
ープの場合には、数例ではあったが、接合時のバンプの
変形によって隣接リードとの間で短絡の生じたものが発
生した。一方の直径60μmのバンプを接合されたTA
Bテープの方では、このような不都合はまったく生じな
かった。このことは、リードピッチが特別に狭くなった
高密度のものでない場合であっても、ある程度小さなバ
ンプを使用する方が隣接リード間での短絡の心配がなく
、安定したTAB実装を行えることが示された。そして
本発明の基板は、より小さなバンプを配列するために使
用できるより小さな貫通穴を持った配列基板を提供する
点で、有効なものであることが確認された。In the case of TAB tape using bumps with a diameter of 80 μm, there were a few cases in which short circuits occurred between adjacent leads due to deformation of the bumps during bonding. TA bonded with one bump of 60μm in diameter
With tape B, no such inconvenience occurred. This means that even if the lead pitch is not particularly narrow and high-density, it is better to use somewhat small bumps to ensure stable TAB mounting without worrying about short circuits between adjacent leads. Shown. The substrate of the present invention was confirmed to be effective in providing an array substrate with smaller through holes that can be used to array smaller bumps.
【0023】実施例 3
四辺外周部に102μmピッチで合計328個の電極を
有するICチップの実装に使用するTABテープのリー
ド部に金バンプを接合するために、厚さ0.3mmの導
電性セラミックス製の配列基板を用いた。配列基板には
ステップ状の貫通穴を電極の配列パターンに合わせて加
工した。すなわち、まず裏面側から精密放電加工で直径
100μmの穴を約250μmの深さまで堀り、次に同
じ位置にレーザー加工によって直径40μmの穴をあけ
て貫通させた。この場合裏面側の直径100μmの穴は
、隣接する穴と周辺が重なるため独立した形にはならな
いが、基板表面側には直径40μmの貫通穴が形成され
た。このような二段の穴加工を行ったのは、0.3mm
という厚い基板に対して直径40μmという細い貫通穴
を直接加工するのは不可能であるが基板の強度を確保す
るために厚い基板を用いる必要があったからである。Example 3 Conductive ceramics with a thickness of 0.3 mm was used to bond gold bumps to the leads of a TAB tape used for mounting an IC chip, which has a total of 328 electrodes at a pitch of 102 μm on the outer periphery of each side. An array substrate manufactured by Kogyo Co., Ltd. was used. Step-shaped through holes were machined in the array substrate to match the electrode array pattern. That is, first, a hole with a diameter of 100 μm was drilled to a depth of about 250 μm from the back side by precision electric discharge machining, and then a hole with a diameter of 40 μm was drilled at the same position by laser machining to penetrate. In this case, a hole with a diameter of 100 μm on the back side overlapped with an adjacent hole so that it did not form an independent hole, but a through hole with a diameter of 40 μm was formed on the front side of the substrate. This kind of two-stage hole drilling was performed with a diameter of 0.3 mm.
This is because it is impossible to directly process a thin through hole with a diameter of 40 μm in such a thick substrate, but it was necessary to use a thick substrate in order to ensure the strength of the substrate.
【0024】このようにして得た基板にニッケルメッキ
を行って、表面側の穴径を35μmにすぼめた。導電性
セラミックスの場合は実施例1のステンレスの場合に比
べてレーザー加工のままでは加工面が粗くなる傾向が強
いので、メッキによって穴径を縮小する効果とともに、
穴の周辺部を円滑にしてバンプの剥離を容易にする効果
も合わせて期待した。この配列基板の裏面側を減圧し、
表面側の直径35μmの貫通穴部分に直径45μmの微
細金球を配列して、TABテープのリード部にバンプと
して接合する一次接合試験を行った。接合条件は、ツー
ル温度520°C、加圧力20g/リードとした。10
コマのTABテープに対して行った1次接合率はいずれ
も100%となった。さらにこのバンプ付きTABテー
プを用いてチップとの間で、ツール温度540°C、加
圧力60g/リードで二次接合試験を行った結果も、隣
接リード間での短絡が発生せずに100%の接合率を得
ることができた。The substrate thus obtained was plated with nickel to reduce the hole diameter on the front side to 35 μm. In the case of conductive ceramics, compared to the case of stainless steel in Example 1, there is a strong tendency for the processed surface to become rough if laser processing is performed, so in addition to the effect of reducing the hole diameter by plating,
We also hoped that it would have the effect of smoothing the area around the hole and making it easier to remove the bump. Reduce the pressure on the back side of this array board,
A primary bonding test was conducted in which fine gold spheres with a diameter of 45 μm were arranged in a through hole portion with a diameter of 35 μm on the front side and bonded to the lead portion of the TAB tape as a bump. The bonding conditions were a tool temperature of 520° C. and a pressing force of 20 g/lead. 10
The primary bonding rate performed on the TAB tape of the frame was 100% in all cases. Furthermore, a secondary bonding test was conducted using this bumped TAB tape with a chip at a tool temperature of 540°C and a pressure of 60 g/lead, and the result was 100% without any short circuit between adjacent leads. We were able to obtain a bonding rate of .
【0025】実施例 4
先の実施例3と同じ四辺外周部に102μmピッチで合
計328個の電極を有するICチップの実装に使用する
TABテープのリード部に金バンプを接合するために、
厚さ0.1mmのステンレス製の配列基板を用いた。配
列基板には、実施例3とは逆のステップ状の貫通穴を、
電極の配列パターンに合わせて加工した。すなわち、ま
ず表面側から精密放電加工で直径50μmの穴を30μ
mの深さまで堀り、次に同じ位置にレーザー加工によっ
て直径40μmの穴をあけて貫通させた。レーザー加工
によって直径40μmの穴を基板の70μmの厚さ分貫
通させるのは困難を伴ったが、絞り込んだレーザースポ
ットが繰り返し照射される状態で、レーザー光照射方向
に対して垂直な面内で基板を回転させることにより、真
円度の良い貫通穴を得た。Example 4 In order to bond gold bumps to the leads of a TAB tape used for mounting an IC chip, which has a total of 328 electrodes at a pitch of 102 μm on the outer periphery of the four sides as in Example 3,
A stainless steel array substrate with a thickness of 0.1 mm was used. The array substrate has step-shaped through holes opposite to those in Example 3.
Processed to match the electrode arrangement pattern. In other words, first, a 30 μm hole with a diameter of 50 μm was created from the surface side by precision electrical discharge machining.
A hole with a diameter of 40 μm was drilled at the same location by laser processing to penetrate the hole. It was difficult to make a hole with a diameter of 40 μm through the thickness of 70 μm of the substrate by laser processing, but with repeated irradiation with a narrowed laser spot, the hole was cut through the substrate in a plane perpendicular to the laser beam irradiation direction. By rotating the , a through hole with good roundness was obtained.
【0026】この基板に対して、表面側の直径50μm
の穴が基板の表面から30μm入ったところで直径40
μmに絞られた部分の直径が35μmになるまで、ニッ
ケルメッキを行った。このとき表面側の直径50μmの
穴も約45μmまで収縮していた。[0026] With respect to this substrate, a diameter of 50 μm on the surface side
The diameter of the hole is 40 μm when it enters 30 μm from the surface of the substrate.
Nickel plating was carried out until the diameter of the part narrowed down to μm became 35 μm. At this time, the hole with a diameter of 50 μm on the surface side had also shrunk to about 45 μm.
【0027】この配列基板を用いて直径40μmの極微
細金球をTABテープのリード部分に接合する一次接合
試験は、次のようにして行った。まず裏面側を減圧して
直径40μmの極微細金球を吸引すると、極微細金球は
表面部の直径45μmの穴に落ち込んで、直径35μm
のステップ状の部分に保持される形で仮固定された。こ
の例のような極微細金球を通常の平坦な基板で配列しよ
うとすると、1ケの穴に複数の金球が吸い寄せられてし
まうことがしばしば起こり得る。本実施例で使用した本
発明による基板には、表面側に極微細金球の直径よりや
や大きめの直径45μmの穴があることで、最初の極微
細金球がこの穴に落ち込んで、さらにその下部にある直
径35μmの穴の周辺で基板裏面側からの減圧による吸
引力によって補足されると、次に別の極微細金球が同じ
穴の近くにやってきたとしても、吸引力が作用しなくな
るため、同一の貫通穴に複数の極微細金球が配列される
ことは起こらなかった。A primary bonding test in which ultrafine gold spheres with a diameter of 40 μm were bonded to the lead portion of a TAB tape using this array substrate was conducted as follows. First, when the pressure is reduced on the back side and an ultrafine gold ball with a diameter of 40 μm is sucked, the ultrafine gold ball falls into a hole with a diameter of 45 μm on the front side and becomes 35 μm in diameter.
It was temporarily fixed by being held in the step-like part of the. When trying to arrange ultrafine gold spheres like this example on a normal flat substrate, it often happens that a plurality of gold spheres are attracted to one hole. The substrate according to the present invention used in this example has a hole on the surface side with a diameter of 45 μm, which is slightly larger than the diameter of the ultrafine gold sphere, so that the first ultrafine gold sphere falls into this hole, and then When the suction force is supplemented by the reduced pressure from the back side of the substrate around the 35 μm diameter hole at the bottom, even if another ultrafine gold ball comes near the same hole, the suction force will no longer act. Therefore, multiple ultrafine gold spheres were not arranged in the same through hole.
【0028】しかも表面側の直径45μm穴の部分の深
さは、極微細金球の直径より少し浅い30μmになって
いるので、吸引によって配列された極微細金球の頭は基
板の表面から5μmほど突き出ることになるから、TA
Bテープのリードと重ね合わせて接合する上にも何等の
支障も無かった。Moreover, the depth of the 45 μm diameter hole on the surface side is 30 μm, which is slightly shallower than the diameter of the ultrafine gold spheres, so the heads of the ultrafine gold spheres arranged by suction are 5 μm from the surface of the substrate. TA
There was no problem in overlapping and joining the lead of tape B.
【0029】以上のように、表面側の穴径を裏面側より
大きくした二段の貫通穴を有する配列基板は、極微細な
バンプを処理する場合に大変有効なものであることが確
認された。As described above, it has been confirmed that the array substrate having two stages of through-holes, in which the hole diameter on the front side is larger than that on the back side, is very effective when processing extremely fine bumps. .
【0030】[0030]
【発明の効果】微細ピッチのバンプ付きTABテープを
製造するために必要な、テープリード部へのバンプ接合
工程で使用できる実用的な微細金属球の配列基板が実現
し、従来困難だった極微細な球状バンプを利用できるよ
うになった結果として、TABの特徴である高密度実装
を接合性の良好な球径バンプによって実現できるように
なった上、基板の微細なバリ等によって基板からリード
にバンプが円滑に転写されるのを妨げられる心配がなく
なり、安定な一次接合が行えるようになった。また従来
実現されていた程度のピッチのTABに対しても、より
小さい球形バンプを使用することが可能となったため、
TABテープとICチップとの二次接合において隣接リ
ードとの短絡を生じる危険を確実に回避できるようにな
った。[Effect of the invention] A practical array substrate of fine metal spheres that can be used in the bump bonding process to the tape lead part, which is necessary to manufacture TAB tape with fine pitch bumps, has been realized, and ultra-fine metal balls, which were previously difficult to As a result of the availability of spherical bumps, it has become possible to achieve high-density mounting, which is a feature of TAB, using spherical bumps with good bonding properties. There is no need to worry about the smooth transfer of the bumps, and stable primary bonding can now be performed. In addition, it has become possible to use smaller spherical bumps for TABs with the same pitch that was conventionally achieved.
It is now possible to reliably avoid the risk of short circuiting with adjacent leads during secondary bonding between the TAB tape and the IC chip.
【図1】バンプ付きTABの接合工程を示す概略図であ
る。FIG. 1 is a schematic diagram showing a process of bonding a TAB with bumps.
1 ICチップ 2 TABテープ 3 リード 4 球形バンプ 5 配列基板 1 IC chip 2 TAB tape 3 Lead 4 Spherical bump 5 Array board
Claims (4)
貫通穴を備え、前記貫通穴がメッキ層によりすぼめられ
、開口径が100μm以下である微細金属球の配列基板
。1. An array substrate of fine metal spheres, comprising through holes corresponding to an array pattern of fine metal spheres, the through holes being narrowed by a plating layer, and having an opening diameter of 100 μm or less.
側と裏面側とで異なる請求項1記載の微細金属球の配列
基板。2. The fine metal sphere array substrate according to claim 1, wherein the diameter of the opening of the through hole is different between the front side and the back side of the substrate.
応する貫通穴を形成し、貫通穴の形成に当たっては、目
標とする穴径よりやや大きめの貫通穴とし、メッキによ
って穴径をすぼめることによって目標とする穴径を得る
ことを特徴とする微細金属球の配列基板の製造方法。[Claim 3] A through-hole is formed in the substrate corresponding to the arrangement pattern of the fine metal balls, and when the through-hole is formed, the through-hole is made slightly larger than the target hole diameter, and the hole diameter is reduced by plating. A method for manufacturing an array substrate of fine metal spheres, characterized in that a target hole diameter is obtained by:
側と裏面側とで異なる請求項3記載の微細金属球の配列
基板の製造方法。4. The method of manufacturing a fine metal sphere array substrate according to claim 3, wherein the diameter of the opening of the through hole is different between the front side and the back side of the substrate.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3025312A JP2780502B2 (en) | 1991-01-25 | 1991-01-25 | Array substrate of fine metal spheres and method of manufacturing the same |
| EP91302037A EP0447170B1 (en) | 1990-03-14 | 1991-03-12 | Method of bonding bumps to leads of tab tape and an apparatus for arranging bumps used for the same |
| MYPI91000398A MY106135A (en) | 1990-03-14 | 1991-03-12 | Method of bonding bumps to leads of tab tape and an apparatus for arranging bumps used for the same. |
| DE69132891T DE69132891T2 (en) | 1990-03-14 | 1991-03-12 | Method for connecting bumps on TAB carrier conductors and an apparatus for arranging bumps |
| US07/669,189 US5114878A (en) | 1989-09-11 | 1991-03-13 | Method of bonding bumps to leads of tab tape and an apparatus for arranging bumps used for the same |
| KR1019910004083A KR940004247B1 (en) | 1990-03-14 | 1991-03-14 | Bump arranging equipment and method for connecting bump to lead of tab tape |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3025312A JP2780502B2 (en) | 1991-01-25 | 1991-01-25 | Array substrate of fine metal spheres and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04250643A true JPH04250643A (en) | 1992-09-07 |
| JP2780502B2 JP2780502B2 (en) | 1998-07-30 |
Family
ID=12162486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3025312A Expired - Lifetime JP2780502B2 (en) | 1989-09-11 | 1991-01-25 | Array substrate of fine metal spheres and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2780502B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2256793A1 (en) | 1997-01-30 | 2010-12-01 | Nippon Steel Corporation | Ball-arranging substrate for forming bumps, ball-arranging head, ball-arranging apparatus and method for arranging balls |
-
1991
- 1991-01-25 JP JP3025312A patent/JP2780502B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2256793A1 (en) | 1997-01-30 | 2010-12-01 | Nippon Steel Corporation | Ball-arranging substrate for forming bumps, ball-arranging head, ball-arranging apparatus and method for arranging balls |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2780502B2 (en) | 1998-07-30 |
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