JPH0425337B2 - - Google Patents
Info
- Publication number
- JPH0425337B2 JPH0425337B2 JP59204345A JP20434584A JPH0425337B2 JP H0425337 B2 JPH0425337 B2 JP H0425337B2 JP 59204345 A JP59204345 A JP 59204345A JP 20434584 A JP20434584 A JP 20434584A JP H0425337 B2 JPH0425337 B2 JP H0425337B2
- Authority
- JP
- Japan
- Prior art keywords
- wire
- weight
- bonding
- ball
- strength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
Landscapes
- Wire Bonding (AREA)
Abstract
Description
〔産業上の利用分野〕
本発明は半導体素子のチツプ電極と外部リード
を接続するために用いるボンデイングワイヤーに
関する。
〔従来の技術〕
従来、トランジスター、IC、LSIなどの半導体
素子のチツプ電極と外部リードとの結線の多くに
はボンデイングワイヤーとして金細線が用いられ
ている。
一方最近のボンデイング技術の向上に伴なう高
速度化及び半導体デバイスの高集積度化などから
これに使用されるワイヤーの機械的特性やボンデ
イング特性に関する要求が年々厳しくなつてきて
いる。
ボンデイングワイヤーに要求される特性を要約
すると、
1 良好なボール形状が安定して得られること。
2 チツプ電極と金ボールとの接合性が良く且つ
安定した接合強度が得られること。
3 良好なワイヤーのループ形状が得られ、且つ
必要なループ高さが安定して得られること。
4 ボンダーの高速化に対応でき得る機械的及び
耐熱強度を有していること。
5 樹脂モールド時の樹脂の流れ及び膨張、収縮
にも充分耐えうること。
などが挙げられ、従来よりこれら要求を満たすた
めに高純度金(99.99%以上)中に他金属元素を
添加してワイヤーの機械的及び耐熱強度を向上さ
せる方法がとられている。
しかしながら現在実用されている添加元素及び
その組合せにおいては前記要求項目のすべてを満
たすワイヤーは得られていない。例えば高純度金
にCaを添加したワイヤー(例えば特開昭53−
105968号公報)においては、ワイヤーの機械的及
び耐熱強度を向上させ、ボンダーの高速化には充
分対応でき得るが、金の再結晶温度が高くなるた
めにボンデイング工程で水素炎あるいはアーク放
電によつてワイヤー先端を溶断し、ボールを形成
するときに受ける加熱温度においても結晶成長は
阻止され、その結果ワイヤーのループ高さが低く
なりシヨート不良発生の原因になるという欠点を
もつている。又、Beを高純度金に添加したワイ
ヤー(例えば特開昭53−112059号公報)において
はワイヤーの機械的強度を向上させる効果はある
が、耐熱強度向上の効果は小さくその結果ボール
形成時に受ける加熱温度において結晶成長が進
み、必要なループ高さは充分得ることができる
が、ボール直上の結晶粒の粗大化及びボールネツ
ク部のワイヤー強度の低下につながりボールネツ
ク部破断を起こし易くなるというCa添加ワイヤ
ーと相反する欠点を有している。更にCaとBeを
複合添加することにより両者の特徴を生かしたワ
イヤーの開発(例えば特開昭53−112060号公報)
もなされているが、これら複合添加においてもボ
ール形成時の加熱温度による結晶粒の粗大化及び
ボールネツク部ワイヤー強度の低下は阻止できな
い現状にある。
このような問題から従来の金合金線では充分な
ボンデイング性能が得られず、これら欠点を改良
したワイヤーの開発を強く要求されていた。
〔発明が解決しようとする問題点〕
本発明は従来の欠点を解消して、ボンダーの高
速化に充分対応し得る機械的及び耐熱強度を有
し、更にボール形成時に受ける加熱温度において
もボール直上の結晶粒粗大化及びボールネツク部
のワイヤー強度の低下を防ぎ安定したループ高さ
を維持したボンデイングワイヤーを提供せんとす
るものである。
〔問題点を解決するための手段〕
即ち、本発明のボンデイングワイヤーは、純度
99.99重量%以上の金に、カルシウムを0.0001〜
0.001重量%と、ベリリウムを0.0001〜0.001重量
%と、チタン、ジルコニウム、ハフニウム及びニ
オブからなる元素群から選ばれた少なくとも一種
を0.0005〜0.005重量%とを含有せしめた金合金
線としたものである。
〔作用〕
カルシウムの含有率が高い程ワイヤーの機械的
及び耐熱強度を向上させるが、0.001重量%を超
えるとワイヤーの再結晶温度が高くなりすぎて必
要なワイヤーのループ高さが得られなくなるので
0.001重量%以下とする必要がある。又、カルシ
ウムの含有率が0.0001重量%未満では強度向上の
効果が殆んど無いので、カルシウムの含有率は
0.0001〜0.001重量%とする必要がある。
ベリリウムの含有率が高い程ボンデイング工程
でのワイヤーループ高さを向上させるが、0.0001
重量%未満では効果がなく、0.001重量%を超え
ると結晶粒の粗大化及びボールネツク部のワイヤ
ー強度が低下するので、ベリリウムの含有率は
0.0001〜0.001重量%とする必要がある。
更にチタン、ジルコニウム、ハフニウム、及び
ニオブからなる元素群は一種ないし二種以上添加
するのが良いが、これらの元素の含有率が高い程
ボール形成時に受ける加熱の影響で起こる結晶粒
粗大化及びボールネツク部のワイヤー強度の低下
を制御できる。
しかしこれらの元素の合計で0.0005重量%未満
では効果がなく、0.005重量%を超えるとボール
変形及びチツプ電極との接合性が悪くなるので、
0.0005〜0.005重量%とする必要がある。
〔実施例〕
純度99.999重量%の高純度金を原料とし、これ
にカルシウム、ベリリウム、チタン、ジルコニウ
ム、ハフニウム、ニオブを種々の割合で添加して
第1表に示す組成の金合金を溶解鋳造し、次にス
ウエイジング加工を施した後に線引き加工で直径
0.03mmまで伸線を行なつた。次に、このワイヤー
を室温における破断伸び率が6%になるように熱
処理した後に、常温での引張り試験及び温度=
250℃、保持時間=30秒での高温引張り試験を行
なつた。また、半導体素子表面とリードフレーム
の表面とを同高とした状態でワイヤーボンダーに
てボンデイングを行ないボンデイング後のリード
フレーム表面からのワイヤーループの最高部まで
の高さと、金ボール直上の結晶粒径の測定を行な
つた。また、アーク放電により金ボールを形成
し、ボール首下を孔あきブロツクに通して引掛
け、他端を挾持し、ボール首下から挾持部に入る
部分までの長さを100mmとし孔あきブロツクを引
張り、ボールネツク部のワイヤー強度を測定し、
ボール形状を観察した。ボール径は80〜90μmで
あつた。更にチツプ電極とワイヤーとの接合強度
を測定した。これらの結果を第1表、第2表に示
した。
[Industrial Application Field] The present invention relates to a bonding wire used for connecting chip electrodes and external leads of a semiconductor device. [Prior Art] Conventionally, thin gold wires have been used as bonding wires in many connections between chip electrodes and external leads of semiconductor devices such as transistors, ICs, and LSIs. On the other hand, with the recent improvements in bonding technology resulting in higher speeds and higher integration of semiconductor devices, requirements regarding the mechanical properties and bonding properties of wires used in these devices are becoming stricter year by year. To summarize the characteristics required for bonding wire: 1. A good ball shape can be stably obtained. 2. Good bondability and stable bonding strength between the chip electrode and the gold ball. 3. A good wire loop shape can be obtained and the necessary loop height can be stably obtained. 4. Must have mechanical and heat-resistant strength that can support high-speed bonders. 5. Must be able to withstand resin flow, expansion, and contraction during resin molding. In order to meet these demands, conventional methods have been used to improve the mechanical and heat-resistant strength of wires by adding other metal elements to high-purity gold (99.99% or higher). However, with the additive elements and their combinations that are currently in practical use, it is not possible to obtain a wire that satisfies all of the above requirements. For example, a wire made of high-purity gold with Ca added (for example, JP-A-53-
105968) improves the mechanical and heat-resistant strength of the wire and can sufficiently handle the high-speed bonder, but because the recrystallization temperature of gold increases, hydrogen flame or arc discharge is not used in the bonding process. Crystal growth is inhibited even at the heating temperature applied when the tip of the wire is melted and formed into a ball, resulting in a lower wire loop height and a disadvantage in that it causes shot defects. In addition, wires in which Be is added to high-purity gold (e.g., Japanese Patent Laid-Open No. 112059/1983) have the effect of improving the mechanical strength of the wire, but the effect of improving heat resistance strength is small, and as a result, the wire is not affected during ball formation. Although crystal growth progresses at the heating temperature and the necessary loop height can be obtained sufficiently, the Ca-added wire causes coarsening of the crystal grains directly above the ball and decreases the wire strength at the ball neck, making it more likely to break at the ball neck. It has contradictory drawbacks. Furthermore, by adding a combination of Ca and Be, we developed a wire that took advantage of the characteristics of both (for example, Japanese Patent Application Laid-Open No. 112060/1983).
However, even with these combined additions, it is not possible to prevent the coarsening of crystal grains and the decrease in the wire strength of the ball neck due to the heating temperature during ball formation. Due to these problems, conventional gold alloy wires have not been able to provide sufficient bonding performance, and there has been a strong demand for the development of wires that improve these drawbacks. [Problems to be Solved by the Invention] The present invention overcomes the conventional drawbacks, has mechanical and heat-resistant strength sufficient to cope with high-speed bonders, and furthermore, can be used directly above the ball even at the heating temperature applied during ball formation. It is an object of the present invention to provide a bonding wire that maintains a stable loop height by preventing coarsening of the crystal grains and reduction in wire strength at the ball neck portion. [Means for solving the problem] That is, the bonding wire of the present invention has a purity
Gold of 99.99% by weight or more, calcium 0.0001~
The gold alloy wire contains 0.001% by weight of beryllium, 0.0001 to 0.001% by weight of beryllium, and 0.0005 to 0.005% by weight of at least one selected from the group of elements consisting of titanium, zirconium, hafnium, and niobium. . [Function] The higher the calcium content, the better the mechanical and heat resistance strength of the wire, but if it exceeds 0.001% by weight, the recrystallization temperature of the wire will become too high, making it impossible to obtain the required loop height of the wire.
It must be 0.001% by weight or less. Also, if the calcium content is less than 0.0001% by weight, there is almost no strength improvement effect, so the calcium content should be
It needs to be 0.0001 to 0.001% by weight. The higher the beryllium content, the higher the wire loop height in the bonding process, but
If it is less than 0.001% by weight, it will not be effective, and if it exceeds 0.001% by weight, the crystal grains will become coarser and the wire strength at the ball neck will decrease.
It needs to be 0.0001 to 0.001% by weight. Furthermore, it is preferable to add one or more of the elements consisting of titanium, zirconium, hafnium, and niobium; however, the higher the content of these elements, the more the coarsening of crystal grains and ball necks that occur under the influence of heating during ball formation are reduced. It is possible to control the decrease in wire strength at the end of the wire. However, if the total amount of these elements is less than 0.0005% by weight, there is no effect, and if it exceeds 0.005% by weight, ball deformation and bondability with the chip electrode will deteriorate.
It needs to be 0.0005 to 0.005% by weight. [Example] Using high-purity gold with a purity of 99.999% by weight as a raw material, calcium, beryllium, titanium, zirconium, hafnium, and niobium were added in various proportions to melt and cast a gold alloy with the composition shown in Table 1. , then swaging and then wire drawing to make the diameter
Wire drawing was carried out to 0.03mm. Next, this wire was heat treated so that the elongation at break at room temperature was 6%, and then subjected to a tensile test at room temperature and temperature =
A high temperature tensile test was conducted at 250°C and holding time = 30 seconds. In addition, bonding is performed with a wire bonder with the semiconductor element surface and the lead frame surface at the same height, and the height from the lead frame surface to the highest part of the wire loop after bonding and the crystal grain size directly above the gold ball are measured. Measurements were made. In addition, a gold ball is formed by arc discharge, the bottom of the ball neck is passed through a perforated block, the other end is held, and the length from the bottom of the ball neck to the part that enters the holding part is 100 mm, and the perforated block is set. Measure the tension and wire strength of the ball neck part,
The shape of the ball was observed. The ball diameter was 80-90 μm. Furthermore, the bonding strength between the chip electrode and the wire was measured. These results are shown in Tables 1 and 2.
【表】【table】
第1、2表から本発明のボンデイングワイヤー
は、いずれもワイヤーボンデイングの高速化に充
分耐えうる機械的及び耐熱強度を有し、更に本発
明の特徴である金ボール直上の結晶粒の粗大化及
びボールネツク部ワイヤー強度も低下することな
く、安定したループ高さが得られることが判る。
以上の結果より本発明によるボンデイングワイ
ヤーは従来のボンデイングワイヤーの欠点を解消
し、ボンデイング工程での歩留向上及び信頼性の
向上を可能とするものである。
As can be seen from Tables 1 and 2, the bonding wires of the present invention both have mechanical and heat-resistant strength sufficient to withstand high-speed wire bonding, and also have coarsening of crystal grains directly above the gold balls, which is a feature of the present invention. It can be seen that a stable loop height can be obtained without reducing the wire strength at the ball neck portion. From the above results, the bonding wire according to the present invention eliminates the drawbacks of conventional bonding wires and makes it possible to improve yield and reliability in the bonding process.
Claims (1)
リウムを0.0001〜0.001重量%と、チタン、ジル
コニウム、ハフニウム及びニオブからなる元素群
から選ばれた少なくとも一種を0.0005〜0.005重
量%とを含有することを特徴とする残部純度
99.99重量%以上の高純度金からなるボンデイン
グワイヤー。1. Containing 0.0001 to 0.001% by weight of calcium, 0.0001 to 0.001% by weight of beryllium, and 0.0005 to 0.005% by weight of at least one selected from the group of elements consisting of titanium, zirconium, hafnium, and niobium. Remaining purity
Bonding wire made of high purity gold of 99.99% by weight or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59204345A JPS6184346A (en) | 1984-09-28 | 1984-09-28 | Bonding wire |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59204345A JPS6184346A (en) | 1984-09-28 | 1984-09-28 | Bonding wire |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6184346A JPS6184346A (en) | 1986-04-28 |
| JPH0425337B2 true JPH0425337B2 (en) | 1992-04-30 |
Family
ID=16488964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59204345A Granted JPS6184346A (en) | 1984-09-28 | 1984-09-28 | Bonding wire |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6184346A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5166738B2 (en) * | 2006-03-24 | 2013-03-21 | 新日鉄住金マテリアルズ株式会社 | Gold wire for semiconductor element connection |
-
1984
- 1984-09-28 JP JP59204345A patent/JPS6184346A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6184346A (en) | 1986-04-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |