JPH0425858U - - Google Patents
Info
- Publication number
- JPH0425858U JPH0425858U JP6428190U JP6428190U JPH0425858U JP H0425858 U JPH0425858 U JP H0425858U JP 6428190 U JP6428190 U JP 6428190U JP 6428190 U JP6428190 U JP 6428190U JP H0425858 U JPH0425858 U JP H0425858U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- evaporation
- beam gun
- rotating jig
- prevention plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 7
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 238000005566 electron beam evaporation Methods 0.000 claims description 4
- 230000002265 prevention Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は、本考案に係わる電子ビーム蒸着装置
の正面断面図、第２図は、蒸着防止板１７の斜視
図、第３図は、従来の電子ビーム蒸着装置の正面
断面図である。本考案を構成している主要部分の
符号の説明は以下の通りである。
１……真空槽、２……電子ビーム銃、３……基
板、４……回転治具、１５……シヤツター、１７
……蒸着防止板、１９……蒸発穴。
FIG. 1 is a front sectional view of an electron beam evaporation apparatus according to the present invention, FIG. 2 is a perspective view of a deposition prevention plate 17, and FIG. 3 is a front sectional view of a conventional electron beam evaporation apparatus. The explanation of the symbols of the main parts constituting the present invention is as follows. 1... Vacuum chamber, 2... Electron beam gun, 3... Substrate, 4... Rotating jig, 15... Shutter, 17
... Evaporation prevention plate, 19... Evaporation hole.
Claims (1)
に回転治具が配置され、該電子ビーム銃により蒸
着材料を蒸発させて、加熱された状態で前記回転
治具に取付けられて回転している基板に対して蒸
着を行う構成の電子ビーム蒸着装置において、 前記電子ビーム銃と、該電子ビーム銃の直上に
退避可能に配置されたシヤツターとの間に蒸着防
止板が配置され、該蒸着防止板には、電子ビーム
銃に入つている蒸着材料の中心部から少なくとも
前記回転治具の外周端を望むことのできる大きさ
の蒸発穴が設けられていることを特徴とする電子
ビーム蒸着装置。[Claims for Utility Model Registration] A rotating jig is disposed above an electron beam gun installed in a vacuum chamber, and the vapor deposition material is evaporated by the electron beam gun, and is heated to the rotating jig. In an electron beam evaporation apparatus configured to perform evaporation on an attached and rotating substrate, a evaporation prevention plate is provided between the electron beam gun and a shutter that is retractably disposed directly above the electron beam gun. The evaporation prevention plate is provided with an evaporation hole of a size that allows at least the outer peripheral end of the rotating jig to be seen from the center of the evaporation material contained in the electron beam gun. Electron beam evaporation equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6428190U JPH0425858U (en) | 1990-06-18 | 1990-06-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6428190U JPH0425858U (en) | 1990-06-18 | 1990-06-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0425858U true JPH0425858U (en) | 1992-03-02 |
Family
ID=31595084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6428190U Pending JPH0425858U (en) | 1990-06-18 | 1990-06-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0425858U (en) |
-
1990
- 1990-06-18 JP JP6428190U patent/JPH0425858U/ja active Pending