JPH04287302A - Permanent magnet and its manufacture - Google Patents
Permanent magnet and its manufactureInfo
- Publication number
- JPH04287302A JPH04287302A JP3075805A JP7580591A JPH04287302A JP H04287302 A JPH04287302 A JP H04287302A JP 3075805 A JP3075805 A JP 3075805A JP 7580591 A JP7580591 A JP 7580591A JP H04287302 A JPH04287302 A JP H04287302A
- Authority
- JP
- Japan
- Prior art keywords
- permanent magnet
- film
- ferromagnetic
- magnetic flux
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 42
- 238000000576 coating method Methods 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 19
- 238000007747 plating Methods 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 20
- 238000009713 electroplating Methods 0.000 claims description 19
- 229910052759 nickel Inorganic materials 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 239000000956 alloy Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 4
- 230000005291 magnetic effect Effects 0.000 abstract description 35
- 230000004907 flux Effects 0.000 abstract description 30
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
- 238000009826 distribution Methods 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 229910021585 Nickel(II) bromide Inorganic materials 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- IPLJNQFXJUCRNH-UHFFFAOYSA-L nickel(2+);dibromide Chemical compound [Ni+2].[Br-].[Br-] IPLJNQFXJUCRNH-UHFFFAOYSA-L 0.000 description 4
- 229910052761 rare earth metal Inorganic materials 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910001122 Mischmetal Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- JZQOJFLIJNRDHK-CMDGGOBGSA-N alpha-irone Chemical compound CC1CC=C(C)C(\C=C\C(C)=O)C1(C)C JZQOJFLIJNRDHK-CMDGGOBGSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Hard Magnetic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
【0001】
【産業上の利用分野】本発明は、表面磁束密度の端部へ
の集中を抑制した永久磁石とその製造方法に関する。
【0002】
【従来の技術】高性能を有する永久磁石のうち、例えば
R−Fe−B等(RはYを含む希土類元素の1種以上)
の焼結磁石では、耐食性を向上し、防錆を図るため、永
久磁石体の表面に、必要に応じ、酸処理等の前処理を施
したのち、例えば電気めっき等により、Ni等を、成膜
している。
【0003】
【発明が解決しようとする課題】しかし、永久磁石体の
表面磁束は、中央部より端部に集中しいるので、端部と
中央部で均一な膜厚のNi被膜を設けると、表面磁束は
磁石主面の端部で大きく、中央部で小さくなってしまい
、これを、例えば、ボイス・コイル・モータ等に用いる
場合、大きな性能上の欠陥となる。
【0004】本発明の主たる目的は、永久磁石に表面処
理を施して、耐食性被膜を形成する際に、その材質と膜
厚を制御して、端部の表面磁束密度の集中を抑制した永
久磁石とその製造方法を提供することにある。
【0005】
【課題を解決するための手段】このような目的は下記(
1)〜(9)の本発明により達成される。
【0006】(1)永久磁石体表面に電気めっきによっ
て形成された強磁性体被膜を有する永久磁石において、
この永久磁石体の主面には、前記強磁性体被膜が、中央
部よりも端部にて厚い膜厚で設層されていることを特徴
とする永久磁石。
【0007】(2)前記端部の膜厚が、中央部の膜厚の
1.5〜10倍である上記(1)に記載の永久磁石。
【0008】(3)前記強磁性体被膜が、NiまたはN
i合金のめっき膜である上記(1)または(2)に記載
の永久磁石。
【0009】(4)前記永久磁石体の主面の長さは5m
m以上である上記(1)ないし(3)のいずれかに記載
の永久磁石。
【0010】(5)永久磁石体に、電気めっきにより強
磁性体被膜を形成するに際し、前記永久磁石体主表面の
端部の成膜速度を、中央部の成膜速度より大として、前
記主面上の前記強磁性体被膜の膜厚を端部が中央部より
大となるように成膜することを特徴とする永久磁石の製
造方法。
【0011】(6)前記端部の成膜速度を、前記中央部
の成膜速度の1.5〜10倍となるように成膜して、前
記端部の膜厚を前記中央部の膜厚の1.5〜10倍とす
る上記(5)に記載の永久磁石の製造方法。
【0012】(7)前記電気めっきの電流密度が0.2
A/dm2 以上である上記(5)または(6)に記載
の永久磁石の製造方法。
【0013】(8)前記主面の長さが5mm以上である
上記(5)ないし(7)のいずれかに記載の永久磁石の
製造方法。
【0014】(9)前記強磁性体被膜がNiまたはNi
合金のめっき膜である上記(5)ないし(8)のいずれ
かに記載の永久磁石の製造方法。
【0015】
【作用】本発明では、永久磁石体に成膜する耐食性被膜
の材質として、強磁性体を用い、その膜厚を厚くする程
、表面磁束密度が小さくなることを利用する。すなわち
成膜時の電着の均一性を規制し、強磁性体被膜の膜厚を
、主面の端部で厚く、中央部で薄くなるようにし、永久
磁石の端部における表面磁束密度の集中を抑える。この
ような電着の均一性を規制するには、電気めっきの際の
電流密度を制御して、端部の成膜速度を中央部より大き
くする。
【0016】
【具体的構成】以下、本発明の具体的構成について詳細
に説明する。
【0017】本発明においては、永久磁石体上への強磁
性体被膜の設層方法として、電気めっきを用いる。他の
液相めっき、あるいはスパッタ、イオンプレーティング
、真空蒸着等の各種気相めっき、浸漬塗布、刷毛塗布、
注入、溶融めっき、電着塗布等の各種の塗布法では、、
本発明のような膜厚制御を行うのは困難である。
【0018】また、被膜構成材料が強磁性体でなければ
、表面磁束の均一化を図れない。そして、電気めっきに
よる強磁性体被膜は、量産性に優れ、また単に耐食性を
改善するだけでなく、機械的強度においても補強効果を
発揮するため有用である。
【0019】図3、図2は電気めっきを、場所的に均一
な電流密度で行った場合に、磁石体1上へ成膜された強
磁性体被膜2の磁石体主面の端部3および中央部4にお
ける膜厚分布と表面磁束密度との関係を示したものであ
る。
【0020】図3に示されるように、強磁性体被膜2が
永久磁石体1表面の各部で均一な膜厚に形成されたとき
には、磁束計で表面磁束密度を測定すると、図2の曲線
bで示されるように、永久磁石素体の磁束密度には分布
が存在するので、表面磁束密度は主面の端部3で大きく
なり、中央部4で小さくなってしまう。すなわち、端部
には、中央部からxの高さをもつ磁束密度の盛り上がり
が存在する。
【0021】本発明では、図1に示されるように、この
磁石素体の不均一な表面磁束密度を矯正するために、永
久磁石体1上に形成された、強磁性体被膜2の主面端部
3の膜厚を中央部4の膜厚の、好ましくは1.5〜10
倍とする。永久磁石体1の表面磁束密度は、強磁性体被
膜2の膜厚が厚くなる程小さくなるので、端部3と中央
部4の膜厚比を上記の値(1.5〜10)とすることに
より永久磁石の端部における磁束密度の集中による盛り
上がりを、図2の曲線aで示されるように、高さyに抑
えることができる。この場合、(x−y)/xは5〜3
0%程度となり、磁束密度の集中は5〜30%抑制され
る。この結果、均一な磁束密度をもつ主面の領域も増大
する。
【0022】このような膜厚分布をもつ強磁性体被膜2
は、電気めっきの際に端部3と中央部4とで成膜速度を
変えることによって得られる。そして強磁性体被膜2の
このような膜厚比は、中央部4の成膜速度を、バレルめ
っき法では、0.065μm/min 程度以上、特に
0.08μm/min 以上とし、またラックめっき法
では、0.35μm/min 以上、特に0.4μm/
min 以上とし、端部3の成膜速度を中央部4の成膜
速度の1.5〜10倍とすることにより得られる。成膜
速度の比をこのような値とすることで端部3と中央部4
の膜厚比を前記の値とすることができる。
【0023】このように、成膜速度を端部3と中央部4
で変えるには、電気めっきの際の電流密度により、端部
3と中央部4の電界分布を制御すればよい。電流密度は
、0.2A/dm2 以上、特に、0.5A/dm2以
上とするのが好ましい。電流密度をこのような値とする
ことで、端部3と中央部4との電界分布が生じ、端部3
での強磁性体被膜2の膜厚が厚くなる。ただし、電流密
度が大きすぎると、陰極近傍での水素発生が増大し、水
素が吸蔵され、密着性が低下してくるので、電流密度は
15A/dm2 以下、特に10A/dm2 とするこ
とが好ましい。
【0024】なお、永久磁石体の主面の長さは、5mm
以上、通常は10〜100mmとすることが好ましい。
主面長を長くすることにより、端部での電解変化および
膜厚変化を大きくできるからである。
【0025】このような場合、永久磁石体の複数をバレ
ル中に収納し、バレルを回転しつつ、バレルと磁石体と
の接触を行ないながら通電を行なうバレルめっき法を用
いてもよい。ただし、ラックに磁石体を保持して通電を
行なうラックめっき法を用いる場合には、遮蔽板などを
設置して、精度よく電流密度や電解分布を制御でき、膜
厚分布を精度よく形成することができる。
【0026】このようにして成膜される強磁性体被膜の
材質としては、金属、合金、金属化合物等を用いること
ができるが、特にNiおよびNi合金を用いることが好
適である。強磁性体被膜としてNiおよびNi合金を用
いることにより、被膜の強度を高め、優れた防錆効果を
得ることができる。
【0027】このようなNiの電気めっきに用いるめっ
き浴としては、塩化ニッケル成分を含有しないワット浴
、スルファミン酸浴や、ホウフッ化浴、臭化ニッケル浴
等が挙げられる。ただし、この場合陽極の溶解が少なく
なるため、ニッケルイオンを浴に補充する必要が生じる
。このニッケルイオンは、硫酸ニッケルあるいは臭化ニ
ッケルの溶液として補充するのが好ましい。
【0028】例えば、これらのうちでは、Ni被膜がよ
り高い剥離強度を示す上で、特にスルファミン酸浴を用
いることが好ましく、以下の組成のものが挙げられる。
Ni(NH2 SO3 )2 ・4H2 O
150〜600g/リットル NiBr2
・6H2 O
0〜30g/リットル ホウ酸
30〜60g/リットル【0029】この際、浴中の
水も塩素を含有しないことが好ましく、浴中の塩素量は
100ppm 以下とすることが好ましい。このように
、めっき浴から塩素成分を除くことによって主に経時に
よるフクレの発生を防止することができる。
【0030】めっき条件は、pH3〜6、特に好ましく
は4〜5、温度20〜70℃程度とすればよい。
【0031】pHがこの範囲未満では、磁石体が溶解し
てしまい、pHがこの範囲をこえると水酸化ニッケルの
沈澱が析出し、めっき膜が脆くなってしまう。
【0032】なお、強磁性体被膜の材質として、Ni合
金を用いる場合には、Fe、Co、Zn、Mo、Cr等
の1種以上と、60wt% 以上のNiとを含む合金と
すればよい。
【0033】本発明においては、必要に応じてめっき技
術ガイドブック(東京鍍金材料共同組合発行)115ペ
ージに記載されているような自然電位の異なる公知のダ
ブルニッケルめっき、トリニッケルめっき等の耐食性向
上を目的とした多層めっきも好ましく用いることができ
る。また、銅めっき層を用い、これに別の強磁性体被膜
、例えばNiめっき層を重ねて設層してもよい。
【0034】これらの電気めっきによる強磁性体被膜の
設層に際しては磁石体の寸法・形状に応じてラックめっ
き法またはバレルめっき法を適宜適用する。
【0035】一般に、ラックめっき法で処理されるよう
な寸法の大きい磁石体では無欠陥な強磁性体を必要とす
る面積が広いため、強磁性被膜厚みを厚くする必要があ
り、電気めっきのみによる強磁性体被膜の望ましい厚み
は、中央部で20〜30μmである。
【0036】一方、バレルめっき法で大量に処理される
ような表面積が小さく、自重数十g以下の磁石体におけ
る電気めっきのみによる望ましい強磁性体被膜厚みは中
央部で10〜20μm である。
【0037】また、必要があればこれらの電気めっきに
よる強磁性体被膜の上にさらに他の手法による強磁性体
被膜、例えば無電解めっき層、各種塗布法による樹脂層
などを設層することもでき、この場合には電気めっきに
よる強磁性体被膜を薄くすることが可能である。このよ
うな強磁性体被膜を形成する際には、あらかじめ、公知
の各種前処理を行うことができる。
【0038】本発明において強磁性体被膜が表面に設層
される永久磁石体の代表例は、R(ただし、RはYを含
む希土類元素の1種以上)、FeおよびBを含有するも
のである。
【0039】R、Fe、およびBの含有量は、5.5a
t% ≦R ≦30at%
42at% ≦Fe≦90at%
2at% ≦B≦28at%
であることが好ましい。
【0040】特に、永久磁石体を焼結法により製造する
場合、下記の組成であることが好ましい。希土類元素R
としては、Nd、Pr、Ho、Tbのうち少なくとも1
種、あるいはさらに、La、Sm、Ce、Gd、Er、
Eu、Pm、Tm、Yb、Yのうち1種以上を含むもの
が好ましい。なお、Rとして2種以上の元素を用いる場
合、原料としてミッシュメタル等の混合物を用いること
もできる。
【0041】Rの含有量は、8〜30at%であること
が好ましい。8at%未満では、結晶構造がα−鉄と同
一構造の立方晶組織となるため、高い保磁力(iHc)
が得られず、30at%を超えると、Rリッチな非磁性
相が多くなり、残留磁束密度(Br)が低下する。
【0042】Feの含有量は42〜90at%であるこ
とが好ましい。Feが42at%未満であるとBrが低
下し、90at%を超えると、iHcが低下する。Bの
含有量は、2〜28at%であることが好ましい。Bが
2at%未満であると菱面体組織となるためiHcが不
十分であり、28at%をこえるとBリッチな非磁性相
が多くなるため、BRが低下する。
【0043】なお、Feの一部をCoで置換することに
より、磁気特性を損なうことなく温度特性を改善するこ
とができる。この場合、Co置換量がFeの50%を超
えると磁気特性が劣化するため、Co置換量は50%以
下とすることが好ましい。
【0044】また、R、FeおよびBの他、不可避的不
純物として、Ni、Si、Al、Cu、Caとが全体の
3at%以下含有されていてもよい。
【0045】さらに、Bの1部を、C、P、S、Cuの
うちの1種以上で置換することにより、生産性の向上お
よび低コスト化が実現できる。この場合、置換量は全体
の4at%以下であることが好ましい。また、保磁力の
向上、生産性の向上、低コスト化のために、Al、Ti
、V、Cr、Mn、Bi、Nb、Ta、Mo、W、Sb
、Ge、Sn、Zr、Ni、Si、Hf等の1種以上を
添加してもよい。この場合、添加量は総計で10at%
以下とすることが好ましい。
【0046】このような、永久磁石体は、実質的に正方
晶系の結晶構造の主相を有する。
【0047】この主相の粒径は、1〜100μm 程度
であることが好ましい。
【0048】そして、通常、体積比で1〜50%の非磁
性相を含むものである。
【0049】このような永久磁石体は、前述した特開昭
61−185910号公報等に開示されている。
【0050】上記のような永久磁石体は、以下に述べる
ような焼結法により製造されることが好ましい。
【0051】まず、所望の組成の合金を鋳造し、インゴ
ットを得る。得られたインゴットを、スタンプミル等に
より粒径10〜100μm 程度の粗粉砕し、次いで、
ボールミル等により0.5〜5μm 程度の粒径に微粉
砕する。得られた粉末を、好ましくは磁場中にて成形す
る。
この場合、磁場強度は10kOe 以上、 成形圧力ハ
1 〜5t/cm2 程度であることが好ましい。
【0052】得られた成形体を、1000〜1200℃
で0.5〜5時間焼結し、急冷する。なお、焼結雰囲気
は、Arガス等の不活性ガス雰囲気であることが好まし
い。この後、好ましくは不活性ガス雰囲気中で、500
〜900℃にて1〜5時間時効処理を行う。
【0053】その他、各種希土類磁石は、いずれも本発
明に適用可能である。
【0054】
【実施例】以下、本発明の具体的実施例を挙げ、本発明
をさらに詳細に説明する。
実施例1
粉末冶金法によって作成した14Nd−1Dy−7B−
78Fe(数字は原子比)の組成を持つ焼結体をAr雰
囲気中で600℃にて2時間時効処理を施し、56×4
0×8(mm)の大きさに加工し、さらにバレル研磨処
理により面取りを行なって永久磁石を得た。次いでこの
永久磁石10枚のサンプルを硝酸濃度:0.45Nの処
理液10リットルに、30℃で1分間浸漬して表面層を
溶解した。
【0055】上記処理済の試料をイオン交換水中で超音
波洗浄した後、下記の組成のめっき浴を用いてラック法
によりめっきを行なった。めっき電流密度は0.1A/
dm2 とし、また浴温は50℃、浴pHは4.5とし
た。
Ni(NH2 SO3 )2 ・4H2 O
600g /リットル NiBr2 ・6
H2 O 1
0g /リットル ホ
ウ酸
40g /リットル
【0056】このもののめっき膜の
膜厚は主面の端部で35μm 、中央部で25μm と
ほぼ均一な膜厚を示した。なお膜厚はセイコー電子蛍光
X線膜厚計により測定した。またこのものの表面磁束密
度を磁束計で測定したところ、端部で2700G、中央
部で1500Gで、x=1200Gであった。
【0057】これとは別に、前記と同一のめっき浴を用
い、電流密度4A/dm2 で電気めっきをおこなった
。めっき膜の成膜速度は端部で0.9μm /min、
中央部で0.45μm /min であり、その比は2
:1であった。
【0058】このもののめっき膜の膜厚は主面の端部で
50μm 、中央部で25μm となり、その比は2:
1であった。得られた試料の表面磁束密度を磁束計にて
測定したところ端部で2500G、中央部で1500G
となり、y=1000Gとなり、(x−y)/x=17
%と、磁石体の端部の表面磁束密度の集中を17%抑え
ることができる。
【0059】以上の結果から端部と中央部の膜厚比が1
.5〜10である本発明の永久磁石は、端部の表面磁束
密度の集中を改善できることがわかる。
【0060】
【発明の効果】本発明の永久磁石は主面の端部の膜厚が
中央部の1.5〜10倍である強磁性体被膜を有し、磁
石体端部の表面磁束密度の集中を5〜30%緩和するこ
とができる。Description: TECHNICAL FIELD The present invention relates to a permanent magnet in which surface magnetic flux density is suppressed from concentrating on the edges, and a method for manufacturing the same. [0002] Among permanent magnets with high performance, for example, R-Fe-B (R is one or more rare earth elements including Y)
In sintered magnets, in order to improve corrosion resistance and prevent rust, the surface of the permanent magnet body is subjected to pretreatment such as acid treatment, if necessary, and then coated with Ni, etc., by electroplating, etc. It has a membrane. [0003] However, since the surface magnetic flux of a permanent magnet body is more concentrated at the ends than at the center, if a Ni film with a uniform thickness is provided at the ends and the center, The surface magnetic flux is large at the ends of the main surface of the magnet and becomes small at the center, which causes a major performance defect when used in, for example, a voice coil motor. The main object of the present invention is to provide a permanent magnet in which surface treatment is applied to the permanent magnet to form a corrosion-resistant coating, and the material and thickness of the coating are controlled to suppress the concentration of surface magnetic flux density at the edges. and its manufacturing method. [Means for solving the problem] Such purpose is as follows (
1) to (9) are achieved by the present invention. (1) In a permanent magnet having a ferromagnetic film formed by electroplating on the surface of the permanent magnet body,
A permanent magnet characterized in that the ferromagnetic film is formed on the main surface of the permanent magnet body so that the ferromagnetic film is thicker at the ends than at the center. (2) The permanent magnet according to (1) above, wherein the film thickness at the end portion is 1.5 to 10 times the film thickness at the central portion. (3) The ferromagnetic film is made of Ni or N.
The permanent magnet according to (1) or (2) above, which is a plating film of i alloy. (4) The length of the main surface of the permanent magnet is 5 m.
The permanent magnet according to any one of (1) to (3) above, which has a diameter of m or more. (5) When forming a ferromagnetic film on a permanent magnet body by electroplating, the film formation rate at the ends of the main surface of the permanent magnet body is set higher than the film formation rate at the central part. A method for manufacturing a permanent magnet, comprising forming the ferromagnetic film on the surface so that the film thickness is greater at the edges than at the center. (6) The film is formed at a film forming rate at the end portions that is 1.5 to 10 times the film forming speed at the central portion, and the film thickness at the end portions is set to be 1.5 to 10 times the film forming rate at the central portion. The method for manufacturing a permanent magnet according to (5) above, wherein the permanent magnet is 1.5 to 10 times the thickness. (7) The current density of the electroplating is 0.2.
A/dm2 or more, the method for producing a permanent magnet according to (5) or (6) above. (8) The method for manufacturing a permanent magnet according to any one of (5) to (7) above, wherein the main surface has a length of 5 mm or more. (9) The ferromagnetic film is made of Ni or Ni
The method for producing a permanent magnet according to any one of (5) to (8) above, which is an alloy plating film. [0015] In the present invention, a ferromagnetic material is used as the material for the corrosion-resistant coating formed on the permanent magnet body, and it is utilized that the surface magnetic flux density decreases as the film thickness increases. In other words, the uniformity of electrodeposition during film formation is controlled, and the thickness of the ferromagnetic film is made thicker at the edges of the main surface and thinner at the center, thereby increasing the concentration of surface magnetic flux density at the edges of the permanent magnet. suppress. In order to regulate the uniformity of electrodeposition, the current density during electroplating is controlled so that the film formation rate at the edges is higher than that at the center. [Specific Configuration] The specific configuration of the present invention will be explained in detail below. In the present invention, electroplating is used as a method for depositing a ferromagnetic film on a permanent magnet. Other liquid phase plating, various vapor phase plating such as sputtering, ion plating, vacuum evaporation, dip coating, brush coating,
In various coating methods such as injection, hot-dip plating, and electrodeposition coating,
It is difficult to control the film thickness as in the present invention. Furthermore, unless the coating material is ferromagnetic, the surface magnetic flux cannot be made uniform. A ferromagnetic film formed by electroplating is useful because it has excellent mass productivity and not only improves corrosion resistance but also has a reinforcing effect on mechanical strength. FIGS. 3 and 2 show that the ends 3 and 2 of the main surface of the magnet body of the ferromagnetic film 2 formed on the magnet body 1 are formed when electroplating is performed at a locally uniform current density It shows the relationship between the film thickness distribution and the surface magnetic flux density in the central portion 4. As shown in FIG. 3, when the ferromagnetic film 2 is formed to have a uniform thickness on each part of the surface of the permanent magnet 1, when the surface magnetic flux density is measured with a magnetometer, the curve b in FIG. As shown in the figure, since there is a distribution in the magnetic flux density of the permanent magnet element, the surface magnetic flux density becomes large at the ends 3 of the main surface and becomes small at the central part 4. That is, at the ends, there is a swell of magnetic flux density having a height of x from the center. In the present invention, as shown in FIG. 1, in order to correct the non-uniform surface magnetic flux density of the magnet body, the main surface of the ferromagnetic coating 2 formed on the permanent magnet body 1 is The thickness of the end portion 3 is preferably 1.5 to 10 times the thickness of the center portion 4.
Double it. Since the surface magnetic flux density of the permanent magnet body 1 decreases as the thickness of the ferromagnetic coating 2 increases, the thickness ratio of the end portions 3 and the center portion 4 is set to the above value (1.5 to 10). As a result, the swelling due to the concentration of magnetic flux density at the end of the permanent magnet can be suppressed to the height y, as shown by the curve a in FIG. 2. In this case, (x-y)/x is 5 to 3
It becomes about 0%, and the concentration of magnetic flux density is suppressed by 5 to 30%. As a result, the area of the main surface having uniform magnetic flux density also increases. Ferromagnetic film 2 having such a film thickness distribution
can be obtained by changing the film formation speed between the end portion 3 and the center portion 4 during electroplating. Such a film thickness ratio of the ferromagnetic film 2 is such that the film formation rate of the central portion 4 is approximately 0.065 μm/min or more in the barrel plating method, particularly 0.08 μm/min or more in the rack plating method. 0.35μm/min or more, especially 0.4μm/min
This can be obtained by setting the film formation rate at the end portions 3 to be 1.5 to 10 times the film formation speed at the central portion 4. By setting the ratio of the film forming speed to such a value, the edges 3 and the center 4
The film thickness ratio can be set to the above value. [0023] In this way, the film formation rate is adjusted to
To change this, the electric field distribution at the end portions 3 and the center portion 4 may be controlled by the current density during electroplating. The current density is preferably 0.2 A/dm2 or more, particularly 0.5 A/dm2 or more. By setting the current density to such a value, an electric field distribution occurs between the end portion 3 and the center portion 4, and the end portion 3
The thickness of the ferromagnetic film 2 becomes thicker. However, if the current density is too large, hydrogen generation near the cathode will increase, hydrogen will be occluded, and the adhesion will decrease, so the current density is preferably 15 A/dm2 or less, especially 10 A/dm2. . [0024] The length of the main surface of the permanent magnet is 5 mm.
As mentioned above, it is usually preferable to set it as 10-100 mm. This is because by increasing the main surface length, electrolytic changes and film thickness changes at the ends can be increased. In such a case, a barrel plating method may be used, in which a plurality of permanent magnets are housed in a barrel, and the barrel is rotated and energized while the barrel and the magnets are in contact with each other. However, when using a rack plating method in which a magnet is held in a rack and energized, it is necessary to install a shielding plate, etc., to accurately control the current density and electrolytic distribution, and to form the film thickness distribution accurately. Can be done. As the material of the ferromagnetic film formed in this manner, metals, alloys, metal compounds, etc. can be used, but it is particularly preferable to use Ni and Ni alloys. By using Ni and Ni alloys as the ferromagnetic coating, the strength of the coating can be increased and an excellent antirust effect can be obtained. Examples of plating baths used for such Ni electroplating include Watt baths, sulfamic acid baths, borofluoride baths, and nickel bromide baths that do not contain a nickel chloride component. However, in this case, the dissolution of the anode is reduced, so it becomes necessary to replenish the bath with nickel ions. The nickel ions are preferably replenished as a nickel sulfate or nickel bromide solution. For example, among these, it is particularly preferable to use a sulfamic acid bath since the Ni coating exhibits higher peel strength, and examples include those having the following composition. Ni(NH2SO3)2 ・4H2O
150-600g/liter NiBr2
・6H2 O
0-30g/liter boric acid
30 to 60 g/liter [0029] At this time, the water in the bath preferably does not contain chlorine, and the amount of chlorine in the bath is preferably 100 ppm or less. In this way, by removing the chlorine component from the plating bath, it is possible to mainly prevent blisters from occurring over time. [0030] The plating conditions may be such that the pH is 3 to 6, particularly preferably 4 to 5, and the temperature is about 20 to 70°C. If the pH is below this range, the magnet will dissolve, and if the pH exceeds this range, nickel hydroxide will precipitate and the plated film will become brittle. [0032] When a Ni alloy is used as the material of the ferromagnetic film, it may be an alloy containing one or more of Fe, Co, Zn, Mo, Cr, etc. and 60 wt% or more of Ni. . [0033] In the present invention, if necessary, the corrosion resistance of known double nickel plating and tri-nickel plating with different natural potentials as described in the plating technology guidebook (published by Tokyo Plating Materials Cooperative Association), page 115, can be improved. Multilayer plating for the purpose can also be preferably used. Alternatively, a copper plating layer may be used, and another ferromagnetic film, such as a Ni plating layer, may be superimposed thereon. When depositing the ferromagnetic film by electroplating, a rack plating method or a barrel plating method is appropriately applied depending on the size and shape of the magnet body. In general, large-sized magnets processed by rack plating require a large area of defect-free ferromagnetic material, so it is necessary to increase the thickness of the ferromagnetic coating. The desirable thickness of the ferromagnetic film is 20 to 30 μm at the center. On the other hand, the desirable thickness of a ferromagnetic coating formed only by electroplating on a magnet having a small surface area and weighing several tens of grams or less, which is processed in large quantities by barrel plating, is 10 to 20 μm at the center. [0037] If necessary, a ferromagnetic film formed by other methods such as an electroless plating layer or a resin layer formed by various coating methods may be formed on top of the ferromagnetic film formed by electroplating. In this case, it is possible to make the ferromagnetic film thinner by electroplating. When forming such a ferromagnetic film, various known pretreatments can be performed in advance. [0038] In the present invention, a typical example of a permanent magnet body on which a ferromagnetic film is formed is one containing R (wherein R is one or more rare earth elements including Y), Fe, and B. be. [0039] The content of R, Fe, and B is 5.5a
It is preferable that t%≦R≦30at% 42at%≦Fe≦90at% 2at%≦B≦28at%. In particular, when the permanent magnet body is manufactured by a sintering method, it is preferable that the permanent magnet body has the following composition. Rare earth element R
is at least one of Nd, Pr, Ho, and Tb.
species, or in addition, La, Sm, Ce, Gd, Er,
Those containing one or more of Eu, Pm, Tm, Yb, and Y are preferred. In addition, when using two or more types of elements as R, a mixture such as misch metal can also be used as a raw material. [0041] The content of R is preferably 8 to 30 at%. If it is less than 8 at%, the crystal structure becomes a cubic structure that is the same as that of α-iron, resulting in a high coercive force (iHc).
is not obtained and exceeds 30 at %, the R-rich nonmagnetic phase increases and the residual magnetic flux density (Br) decreases. [0042] The content of Fe is preferably 42 to 90 at%. When Fe is less than 42 at%, Br decreases, and when it exceeds 90 at%, iHc decreases. The content of B is preferably 2 to 28 at%. If B is less than 2 at%, a rhombohedral structure is formed, resulting in insufficient iHc, and if it exceeds 28 at%, B-rich nonmagnetic phase increases, resulting in a decrease in BR. Note that by replacing a portion of Fe with Co, the temperature characteristics can be improved without impairing the magnetic characteristics. In this case, if the Co substitution amount exceeds 50% of Fe, the magnetic properties will deteriorate, so the Co substitution amount is preferably 50% or less. In addition to R, Fe, and B, Ni, Si, Al, Cu, and Ca may be contained as unavoidable impurities in an amount of 3 at % or less of the total. Furthermore, by replacing a portion of B with one or more of C, P, S, and Cu, productivity can be improved and costs can be reduced. In this case, the amount of substitution is preferably 4 at% or less of the total amount. In addition, in order to improve coercive force, improve productivity, and reduce costs, Al, Ti
, V, Cr, Mn, Bi, Nb, Ta, Mo, W, Sb
, Ge, Sn, Zr, Ni, Si, Hf, etc., may be added. In this case, the total amount added is 10 at%
The following is preferable. [0046] Such a permanent magnet body has a main phase having a substantially tetragonal crystal structure. The particle size of this main phase is preferably about 1 to 100 μm. [0048] It usually contains a non-magnetic phase of 1 to 50% by volume. [0049] Such a permanent magnet body is disclosed in the above-mentioned Japanese Patent Laid-Open Publication No. 185910/1983. [0050] The above permanent magnet body is preferably manufactured by a sintering method as described below. First, an alloy having a desired composition is cast to obtain an ingot. The obtained ingot was coarsely ground to a particle size of about 10 to 100 μm using a stamp mill or the like, and then
Pulverize to a particle size of approximately 0.5 to 5 μm using a ball mill or the like. The obtained powder is preferably compacted in a magnetic field. In this case, the magnetic field strength is preferably 10 kOe or more, and the molding pressure is preferably about 1 to 5 t/cm2. [0052] The obtained molded body was heated to 1000 to 1200°C.
Sinter for 0.5 to 5 hours and quench. Note that the sintering atmosphere is preferably an inert gas atmosphere such as Ar gas. After this, preferably in an inert gas atmosphere,
Aging treatment is performed at ~900°C for 1 to 5 hours. [0053] In addition, any of various rare earth magnets can be applied to the present invention. [Examples] The present invention will be explained in more detail below with reference to specific examples. Example 1 14Nd-1Dy-7B- produced by powder metallurgy method
A sintered body with a composition of 78Fe (numbers are atomic ratios) was aged at 600°C for 2 hours in an Ar atmosphere to form a 56×4
The magnet was processed into a size of 0x8 (mm) and chamfered by barrel polishing to obtain a permanent magnet. Next, the samples of 10 permanent magnets were immersed in 10 liters of a treatment solution with a nitric acid concentration of 0.45N at 30° C. for 1 minute to dissolve the surface layer. After the above-treated sample was ultrasonically cleaned in ion-exchanged water, plating was performed by the rack method using a plating bath having the following composition. Plating current density is 0.1A/
dm2, the bath temperature was 50°C, and the bath pH was 4.5. Ni(NH2SO3)2 ・4H2O
600g/liter NiBr2 ・6
H2O1
0g/liter boric acid
40g/liter
The thickness of the plated film of this product was 35 μm at the ends of the main surface and 25 μm at the center, showing a substantially uniform thickness. The film thickness was measured using a Seiko electronic fluorescence X-ray film thickness meter. Further, when the surface magnetic flux density of this material was measured using a magnetometer, it was found to be 2700G at the ends and 1500G at the center, and x = 1200G. Separately, electroplating was carried out at a current density of 4 A/dm 2 using the same plating bath as above. The deposition rate of the plating film was 0.9 μm/min at the edge.
It is 0.45μm/min at the center, and the ratio is 2
:1. The thickness of the plating film of this product is 50 μm at the ends of the main surface and 25 μm at the center, and the ratio is 2:
It was 1. The surface magnetic flux density of the obtained sample was measured using a magnetometer, and it was 2500G at the edges and 1500G at the center.
So, y=1000G, (x-y)/x=17
%, the concentration of surface magnetic flux density at the end of the magnet body can be suppressed by 17%. From the above results, the film thickness ratio between the edges and the center is 1.
.. It can be seen that the permanent magnet of the present invention having a magnetic flux density of 5 to 10 can improve the concentration of surface magnetic flux density at the end. [0060] The permanent magnet of the present invention has a ferromagnetic coating whose thickness at the end of the main surface is 1.5 to 10 times that at the center, and the surface magnetic flux density at the end of the magnet body is concentration can be reduced by 5 to 30%.
【図1】本発明の永久磁石を示す断面図である。FIG. 1 is a sectional view showing a permanent magnet of the present invention.
【図2】図1の永久磁石の表面磁束密度分布を示すグラ
フである。FIG. 2 is a graph showing the surface magnetic flux density distribution of the permanent magnet in FIG. 1;
【図3】従来の永久磁石を示す断面図である。FIG. 3 is a sectional view showing a conventional permanent magnet.
1 永久磁石体 2 強磁性体被膜 3 主面端部 4 主面中央部 1 Permanent magnet 2 Ferromagnetic coating 3 Main surface end 4 Central part of main surface
Claims (9)
形成された強磁性体被膜を有する永久磁石において、こ
の永久磁石体の主面には、前記強磁性体被膜が、中央部
よりも端部にて厚い膜厚で設層されていることを特徴と
する永久磁石。1. A permanent magnet having a ferromagnetic coating formed by electroplating on the surface of the permanent magnet, wherein the ferromagnetic coating is disposed on the main surface of the permanent magnet body more toward the ends than the center. A permanent magnet characterized by having a thick layer.
.5〜10倍である請求項1に記載の永久磁石。2. The film thickness at the end portion is 1 of the film thickness at the center portion.
.. The permanent magnet according to claim 1, which is 5 to 10 times larger.
合金のめっき膜である請求項1または2に記載の永久磁
石。3. The ferromagnetic film is made of Ni or Ni
The permanent magnet according to claim 1 or 2, which is a plating film of an alloy.
以上である請求項1ないし3のいずれかに記載の永久磁
石。[Claim 4] The length of the main surface of the permanent magnet body is 5 mm.
The permanent magnet according to any one of claims 1 to 3, which is the above.
性体被膜を形成するに際し、前記永久磁石体主表面の端
部の成膜速度を、中央部の成膜速度より大として、前記
主面上の前記強磁性体被膜の膜厚を端部が中央部より大
となるように成膜することを特徴とする永久磁石の製造
方法。5. When forming a ferromagnetic film on a permanent magnet body by electroplating, the film formation rate at the ends of the main surface of the permanent magnet body is set higher than the film formation rate at the center part, and A method of manufacturing a permanent magnet, characterized in that the ferromagnetic film is formed so that the thickness of the ferromagnetic film is greater at the ends than at the center.
成膜速度の1.5〜10倍となるように成膜して、前記
端部の膜厚を前記中央部の膜厚の1.5〜10倍とする
請求項5に記載の永久磁石の製造方法。6. A film is formed so that the film forming rate at the end portion is 1.5 to 10 times the film forming speed at the central portion, and the film thickness at the end portion is set to be the same as the film thickness at the central portion. 6. The method for manufacturing a permanent magnet according to claim 5, wherein the permanent magnet is 1.5 to 10 times as large as 1.5 to 10 times.
/dm2 以上である請求項5または6に記載の永久磁
石の製造方法。7. The current density of the electroplating is 0.2A.
The method for manufacturing a permanent magnet according to claim 5 or 6, wherein the permanent magnet is at least /dm2.
求項5ないし7のいずれかに記載の永久磁石の製造方法
。8. The method for manufacturing a permanent magnet according to claim 5, wherein the main surface has a length of 5 mm or more.
金のめっき膜である請求項5ないし8のいずれかに記載
の永久磁石の製造方法。9. The method for manufacturing a permanent magnet according to claim 5, wherein the ferromagnetic film is a Ni or Ni alloy plating film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3075805A JPH04287302A (en) | 1991-03-15 | 1991-03-15 | Permanent magnet and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3075805A JPH04287302A (en) | 1991-03-15 | 1991-03-15 | Permanent magnet and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04287302A true JPH04287302A (en) | 1992-10-12 |
Family
ID=13586781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3075805A Withdrawn JPH04287302A (en) | 1991-03-15 | 1991-03-15 | Permanent magnet and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04287302A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002105690A (en) * | 2000-09-28 | 2002-04-10 | Sumitomo Special Metals Co Ltd | ELECTROPLATING METHOD FOR R-Fe-B BASED PERMANENT MAGNET |
| JP2007273863A (en) * | 2006-03-31 | 2007-10-18 | Tdk Corp | Magnet member |
| JP2007273850A (en) * | 2006-03-31 | 2007-10-18 | Tdk Corp | Magnet member, and manufacturing method thereof |
| JP2012204608A (en) * | 2011-03-25 | 2012-10-22 | Tdk Corp | Magnet member |
| JP2023103065A (en) * | 2022-01-13 | 2023-07-26 | Ntn株式会社 | Magnetic encoder and wheel bearing device |
-
1991
- 1991-03-15 JP JP3075805A patent/JPH04287302A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002105690A (en) * | 2000-09-28 | 2002-04-10 | Sumitomo Special Metals Co Ltd | ELECTROPLATING METHOD FOR R-Fe-B BASED PERMANENT MAGNET |
| JP2007273863A (en) * | 2006-03-31 | 2007-10-18 | Tdk Corp | Magnet member |
| JP2007273850A (en) * | 2006-03-31 | 2007-10-18 | Tdk Corp | Magnet member, and manufacturing method thereof |
| JP2012204608A (en) * | 2011-03-25 | 2012-10-22 | Tdk Corp | Magnet member |
| US9171668B2 (en) | 2011-03-25 | 2015-10-27 | Tdk Corporation | Magnet member |
| JP2023103065A (en) * | 2022-01-13 | 2023-07-26 | Ntn株式会社 | Magnetic encoder and wheel bearing device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980514 |