JPH04296731A - Short-wavelength laser beam source - Google Patents
Short-wavelength laser beam sourceInfo
- Publication number
- JPH04296731A JPH04296731A JP3062806A JP6280691A JPH04296731A JP H04296731 A JPH04296731 A JP H04296731A JP 3062806 A JP3062806 A JP 3062806A JP 6280691 A JP6280691 A JP 6280691A JP H04296731 A JPH04296731 A JP H04296731A
- Authority
- JP
- Japan
- Prior art keywords
- light source
- laser
- optical
- crystal
- conversion element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/37—Non-linear optics for second-harmonic generation
- G02F1/377—Non-linear optics for second-harmonic generation in an optical waveguide structure
- G02F1/3775—Non-linear optics for second-harmonic generation in an optical waveguide structure with a periodic structure, e.g. domain inversion, for quasi-phase-matching [QPM]
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3544—Particular phase matching techniques
- G02F1/3548—Quasi phase matching [QPM], e.g. using a periodic domain inverted structure
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【0001】0001
【産業上の利用分野】本発明は、コヒ−レント光を利用
する光情報処理分野、あるいは光応用計測制御分野に使
用する短波長レーザ光源に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a short wavelength laser light source used in the field of optical information processing using coherent light or in the field of optical measurement and control.
【0002】0002
【従来の技術】第8図に従来の短波長レーザ光源の構成
図を示す。20は波長800nm帯の半導体レーザ、2
5は光波長変換素子、30はレンズである。光波長変換
素子25においてLiNbO3基板1に光導波路2が形
成され、さらに光導波路2には周期的に分極の反転した
層3(分極反転層)が形成され周期状分極反転構造を有
している。基本波と発生する高調波の伝搬定数の不整合
を分極反転層3の周期構造で補償することにより高効率
に高調波を出すことができる。半導体レーザ20から出
射された光P1はレンズ30により光導波路2の入射面
10に基本波P1を入射すると、光導波路2から高調波
P3が効率良く発生され、光波長変換素子として動作す
る。
このような従来の光波長変換素子は周期状分極反転構造
を基本構成要素としていた。(日経ニューマテリアル、
1990年8月20号、65ページ参照)この光波長変
換素子は波長0.8μmの基本波P1に対して、光導波
路の長さを1mm、基本波P1のパワーを1mWにした
とき高調波P3のパワー0.5nWが得られていた。基
本波が40mW入射したとすると素子長10mmで80
μWの高調波出力が可能である。この場合10mmの素
子での1W当りの変換効率は5%/W・cmである。ま
た、同様の構成でKTP(KTiOPO4)を用いた場
合80mW入力で2mWの出力が得られていた。2. Description of the Related Art FIG. 8 shows a configuration diagram of a conventional short wavelength laser light source. 20 is a semiconductor laser with a wavelength band of 800 nm, 2
5 is an optical wavelength conversion element, and 30 is a lens. In the optical wavelength conversion element 25, an optical waveguide 2 is formed on a LiNbO3 substrate 1, and a layer 3 whose polarization is periodically inverted (poling inversion layer) is further formed on the optical waveguide 2, so as to have a periodic polarization inversion structure. . By compensating for the mismatch between the propagation constants of the fundamental wave and the generated harmonics with the periodic structure of the polarization inversion layer 3, harmonics can be generated with high efficiency. When the fundamental wave P1 of the light P1 emitted from the semiconductor laser 20 is incident on the entrance surface 10 of the optical waveguide 2 through the lens 30, a harmonic wave P3 is efficiently generated from the optical waveguide 2, and the element operates as an optical wavelength conversion element. Such conventional optical wavelength conversion elements have a periodic polarization inversion structure as a basic component. (Nikkei New Material,
(Refer to August 20, 1990, page 65) This optical wavelength conversion element converts a fundamental wave P1 with a wavelength of 0.8 μm into a harmonic P3 when the length of the optical waveguide is 1 mm and the power of the fundamental wave P1 is 1 mW. A power of 0.5 nW was obtained. If the fundamental wave is incident at 40 mW, the element length is 10 mm and the
A harmonic output of μW is possible. In this case, the conversion efficiency per 1 W in a 10 mm element is 5%/W·cm. Furthermore, when KTP (KTiOPO4) was used in a similar configuration, an output of 2 mW was obtained with an input of 80 mW.
【0003】次に第2の従来例である短波長レーザ光源
について説明する。図9にその構成図を示す。この短波
長レーザ光源は半導体レーザ20と固体レーザ結晶21
および非線形光学結晶であるKNbO3による光波長変
換素子25より基本的に構成されている。(日経ニュー
マテリアル、1990年8月20号32ページ参照)半
導体レーザ20より出た光P1をレンズ30にて集光し
、固体レーザ結晶であるYAG21を励起する。22は
全反射ミラーで波長947nmの光を99%全反射し8
00nm帯の光は透過する。また、23も全反射ミラー
で波長947nmの光を99%全反射し400nm帯の
光は透過する。これにより947nmの発振を生じさせ
る。
この全反射ミラー22および23で構成される共振器の
なかに光波長変換素子25を入れることで高調波の出力
を高めている。これは、共振器の内部のパワーは1W以
上に達するため高調波への変換が増大するからである。
500mWの半導体レーザより1mWの高調波が得られ
ていた。Next, a short wavelength laser light source, which is a second conventional example, will be explained. FIG. 9 shows its configuration diagram. This short wavelength laser light source includes a semiconductor laser 20 and a solid laser crystal 21.
and a light wavelength conversion element 25 made of KNbO3, which is a nonlinear optical crystal. (Refer to Nikkei New Materials, August 20, 1990, page 32) Light P1 emitted from the semiconductor laser 20 is focused by a lens 30 to excite YAG 21, which is a solid laser crystal. 22 is a total reflection mirror that totally reflects 99% of the light with a wavelength of 947 nm.
Light in the 00 nm band is transmitted. Further, 23 is also a total reflection mirror, which totally reflects 99% of light with a wavelength of 947 nm and transmits light with a wavelength of 400 nm. This causes 947 nm oscillation. By inserting the optical wavelength conversion element 25 into the resonator formed by the total reflection mirrors 22 and 23, the harmonic output is increased. This is because the power inside the resonator reaches 1 W or more, so conversion into harmonics increases. A harmonic of 1 mW was obtained from a 500 mW semiconductor laser.
【0004】0004
【発明が解決しようとする課題】上記のような分極反転
層を基本とした光波長変換素子と半導体レーザを組み合
わせた短波長レーザ光源では半導体レーザからの基本波
の波長に対する光波長変換素子の許容度が小さく、例え
ば素子長5mmのときレーザの波長に対する許容度が狭
く半値幅で0.4nmしかない。そのため光波長変換素
子と半導体レーザと組み合わせた場合、半導体レーザが
温度変化のため波長変動を生じ高調波がでなくなる、ま
たは大きく高調波の出力が変動するといった問題があっ
た。具体的に半導体レーザが1℃温度変化すると、波長
は0.3nm変化するため、2℃の変化で出力がでなく
なるという問題が生じていた。また、使用できる半導体
レーザは光導波路とのカップリングを考えるとサブミク
ロンオーダーの集光が必要なため、幅8μm以下の活性
層を持つシングルストライプに限られる。そのため、最
大100mW程度の出力を持つ半導体レーザしか使えな
いという問題もあった。[Problem to be solved by the invention] In a short wavelength laser light source that combines an optical wavelength conversion element based on a polarization inversion layer and a semiconductor laser as described above, the tolerance of the optical wavelength conversion element to the wavelength of the fundamental wave from the semiconductor laser is For example, when the element length is 5 mm, the tolerance to the laser wavelength is narrow and the half width is only 0.4 nm. Therefore, when an optical wavelength conversion element and a semiconductor laser are combined, there is a problem that the semiconductor laser fluctuates in wavelength due to temperature changes, and harmonics are no longer produced, or the harmonic output fluctuates significantly. Specifically, when the temperature of a semiconductor laser changes by 1° C., the wavelength changes by 0.3 nm, so a problem arises in that a change of 2° C. causes the output to stop. In addition, the usable semiconductor laser is limited to a single stripe having an active layer with a width of 8 μm or less, since it is necessary to condense light on the submicron order when coupling with an optical waveguide is considered. Therefore, there was a problem in that only semiconductor lasers with a maximum output of about 100 mW could be used.
【0005】一方、KNbO3を内部共振器として用い
た短波長レーザ光源ではKNbO3の温度許容度が0.
2℃と小さく超精密温度制御が必要なため実用化は困難
であった。また、共振器の長さが1cm以上となり縦モ
ードが立つため光波長変換素子の変換効率が変化しノイ
ズが発生することも問題であった。On the other hand, in a short wavelength laser light source using KNbO3 as an internal resonator, the temperature tolerance of KNbO3 is 0.
It was difficult to put it into practical use because it was small at 2°C and required ultra-precise temperature control. Further, since the length of the resonator is 1 cm or more and a longitudinal mode is established, the conversion efficiency of the optical wavelength conversion element changes and noise is generated, which is another problem.
【0006】[0006]
【課題を解決するための手段】本発明は、上記問題点を
解決するため、半導体レーザと、固体レーザ結晶と、非
線形光学結晶で形成された光波長変換素子と、前記半導
体レーザと前記固体レーザ結晶との間に設置した第1の
全反射ミラーと、前記固体レーザ結晶に対して基本光の
出射側に設置した第2の全反射ミラーとを備え、前記光
波長変換素子には周期的分極反転構造が形成され、前記
固体レーザからの基本光の波長を変換し、高調波を出力
することを特徴とする短波長レーザ光源とするものであ
る。。[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention provides a semiconductor laser, a solid-state laser crystal, an optical wavelength conversion element formed of a nonlinear optical crystal, and a semiconductor laser and a solid-state laser crystal. A first total reflection mirror installed between the solid-state laser crystal and a second total reflection mirror installed on the fundamental light emission side with respect to the solid-state laser crystal, and the optical wavelength conversion element has periodic polarization. The short wavelength laser light source is characterized in that an inverted structure is formed, the wavelength of fundamental light from the solid-state laser is converted, and harmonics are output. .
【0007】[0007]
【作用】本発明の短波長レーザ光源によれば、固体レー
ザ結晶を半導体レーザと光波長変換素子の間に介するこ
とにより、半導体レーザの波長が変化しても固体レーザ
結晶の発振波長は変わることなく常に一定であり、その
ため最高の高調波出力が得られる。また、使用する半導
体レーザはマルチストライプや活性層が100μm以上
もあるワイドストライプが使用でき、最大1Wの励起パ
ワーが使用できる。そのため、固体レーザ結晶よりの基
本波も250mW程度まで使用可能となり高調波への変
換効率も大幅にアップする。[Operation] According to the short wavelength laser light source of the present invention, by interposing the solid-state laser crystal between the semiconductor laser and the optical wavelength conversion element, even if the wavelength of the semiconductor laser changes, the oscillation wavelength of the solid-state laser crystal changes. The maximum harmonic output is therefore obtained. Further, the semiconductor laser used can be a multi-stripe type or a wide stripe type with an active layer of 100 μm or more, and a maximum excitation power of 1 W can be used. Therefore, the fundamental wave from the solid-state laser crystal can be used up to about 250 mW, and the conversion efficiency to harmonics can be greatly increased.
【0008】また、本発明の短波長レーザ光源では分極
反転構造を持つ光波長変換素子を基本としているため温
度に対する許容度は広く、簡単な温度制御により実用に
耐えるものが製造可能となる。Furthermore, since the short wavelength laser light source of the present invention is based on an optical wavelength conversion element having a polarization inversion structure, it has a wide tolerance with respect to temperature, and can be produced for practical use by simple temperature control.
【0009】[0009]
【実施例】実施例の一つとして本発明の短波長レーザ光
源の構成を図を用いて説明する。まず、本発明による短
波長レーザ光源の第1の実施例の構造図を図1に示す。
図1で1は−Z板(Z軸と垂直に切り出された基板の−
側)のLiTaO3基板、2は形成された光導波路、3
は分極反転層、10は基本波P2の入射部、12は高調
波P3の出射部である。DESCRIPTION OF THE PREFERRED EMBODIMENTS As one of the embodiments, the structure of a short wavelength laser light source of the present invention will be explained with reference to the drawings. First, FIG. 1 shows a structural diagram of a first embodiment of a short wavelength laser light source according to the present invention. In Figure 1, 1 is a -Z board (a board cut out perpendicular to the Z axis).
side) LiTaO3 substrate, 2 is a formed optical waveguide, 3
10 is a polarization inversion layer, 10 is an entrance part for the fundamental wave P2, and 12 is an output part for the harmonic wave P3.
【0010】以下、その動作を述べる。半導体レーザ2
0より出た光P1はレンズ30で集光され固体レーザ結
晶であるYAG21を励起する。YAG21には947
nmの光を99パーセント反射する全反射ミラー22お
よび同じく97パーセント反射する23が形成されてお
り波長947nmでレーザ発振し、基本波P2が全反射
ミラー23側より放射される。基本波P2はレンズ31
により集光され光波長変換素子25により基本波P2は
高調波P3へと変換される。この実施例では周期構造が
形成された周期状分極反転構造を持つ光波長変換素子と
してLiTaO3基板1中にプロトン交換を用いて作製
した光導波路2を用いたものである。光導波路2に入っ
た基本波P2は位相整合長Lの長さを持った分極反転層
で高調波P3に変換され、次の同じくLの長さを持った
非分極反転層4で高調波パワーは増す事になる。このよ
うにして光導波路2内でパワーを増した高調波P3は出
射部12より放射される。The operation will be described below. Semiconductor laser 2
The light P1 emitted from the laser beam P1 is focused by the lens 30 and excites the YAG 21, which is a solid laser crystal. 947 for YAG21
A total reflection mirror 22 that reflects 99% of nm light and a total reflection mirror 23 that also reflects 97% are formed, and a laser oscillates at a wavelength of 947 nm, and a fundamental wave P2 is emitted from the total reflection mirror 23 side. The fundamental wave P2 is the lens 31
The fundamental wave P2 is focused by the optical wavelength conversion element 25 and converted into a harmonic wave P3. In this example, an optical waveguide 2 fabricated using proton exchange in a LiTaO3 substrate 1 is used as an optical wavelength conversion element having a periodic polarization inversion structure in which a periodic structure is formed. The fundamental wave P2 that has entered the optical waveguide 2 is converted into a harmonic wave P3 in a polarization inversion layer having a phase matching length L, and then converted to harmonic power P3 in the next non-polation inversion layer 4, which also has a length L. will increase. The harmonic wave P3 whose power has been increased in the optical waveguide 2 in this manner is radiated from the output section 12.
【0011】次にこの光波長変換素子25の製造方法に
ついて図を使って簡単に説明する。図2(a)でまずL
iTaO3基板1に通常のフォトプロセスとドライエッ
チングを用いてTa6aをパターニングする。次に同図
(b)でTa6aが形成されたLiTaO3基板1に2
60℃、50分プロトン交換を行う。その後同図(c)
で580℃、5分間熱処理を行いプロトン交換層5に厚
み2.7μmの分極反転層3を形成する。プロトン交換
層5は基板1に比べてLiが減少しておりキュリー温度
が低下するためプロトン交換層5のキュリー温度以上で
基板のキュリー温度以下の580℃で熱処理することに
よって部分的に分極反転ができる。分極反転層3の長さ
Lは2.7μmである。その後HF:HNF3の1:1
混合液にて20分間エッチングしTa6aを除去する。
次に同図(d)で上記分極反転層3中にプロトン交換を
用いて光導波路2を形成する。光導波路2用マスクとし
てTaをストライプ状にパターニングを行った後、Ta
マスクに幅6μm、長さ10mmのスリットが形成され
たものに260℃、16分間プロトン交換を行った。次
にマスクを除去した後380℃で10分間アニールを行
った。プロトン交換された保護マスクのスリット直下の
領域は屈折率が0.01程度上昇した高屈折率層2とな
る。光は高屈折率層2を伝搬し、これが光導波路2とな
る。この光導波路2の厚みdは2μmであり分極反転層
3の厚み2.7μmに比べ小さく導波する光は有効に波
長変換される。分極反転層3の周期Λは5.5μmであ
り波長947nmに対して動作する。光導波路2に垂直
な面を光学研磨し入射部10および出射部12を形成し
た。このようにして図1に示される光波長変換素子25
が製造できる。Next, a method for manufacturing the optical wavelength conversion element 25 will be briefly explained using the drawings. In Figure 2(a), first L
Ta6a is patterned on the iTaO3 substrate 1 using a normal photo process and dry etching. Next, in the same figure (b), 2
Perform proton exchange at 60°C for 50 minutes. Then the same figure (c)
A heat treatment is performed at 580° C. for 5 minutes to form a polarization inversion layer 3 with a thickness of 2.7 μm on the proton exchange layer 5. The proton exchange layer 5 has a reduced Li content compared to the substrate 1, and its Curie temperature is lowered. Therefore, by heat treatment at 580°C, which is higher than the Curie temperature of the proton exchange layer 5 and lower than the Curie temperature of the substrate, polarization can be partially inverted. can. The length L of the polarization inversion layer 3 is 2.7 μm. Then HF:HNF3 1:1
Etching was performed for 20 minutes using the mixed solution to remove Ta6a. Next, as shown in FIG. 3(d), an optical waveguide 2 is formed in the polarization inversion layer 3 using proton exchange. After patterning Ta into stripes as a mask for the optical waveguide 2,
Proton exchange was performed at 260° C. for 16 minutes using a mask in which a slit of 6 μm in width and 10 mm in length was formed. Next, after removing the mask, annealing was performed at 380° C. for 10 minutes. The region directly under the slit of the protective mask where protons have been exchanged becomes a high refractive index layer 2 whose refractive index has increased by about 0.01. The light propagates through the high refractive index layer 2, which becomes the optical waveguide 2. The thickness d of this optical waveguide 2 is 2 μm, which is smaller than the thickness 2.7 μm of the polarization inversion layer 3, and the wavelength of the guided light is effectively converted. The period Λ of the polarization inversion layer 3 is 5.5 μm, and it operates at a wavelength of 947 nm. A surface perpendicular to the optical waveguide 2 was optically polished to form an input section 10 and an output section 12. In this way, the optical wavelength conversion element 25 shown in FIG.
can be manufactured.
【0012】また、この素子の長さは10mmである。
図1で基本波P2として波長947nmを入射部10よ
り導波させたところシングルモード伝搬し、波長473
nmの高調波P3が出射部12より基板外部に取り出さ
れた。光導波路2の伝搬損失は1dB/cmと小さく高
調波P3が有効に取り出された。半導体レーザ20の出
力光P1が400mWでYAG21より80mWの波長
947nmの光が発生した。基本波P2が40mWの入
力で2mWの高調波P3を得た。この場合の変換効率は
5%である。また、半導体レーザ20の出力光P1が1
Wの時250mWの基本波P2が得られ。光波長変換素
子25の光導波路2には120mWが入射した。発生し
た高調波P2は20mWであった。光波長変換素子の波
長に対する許容度は0.4nmである。波長が0.4n
mずれても固体レーザの発振波長は一定であり、高調波
出力は安定していた。[0012] Furthermore, the length of this element is 10 mm. In Fig. 1, when a fundamental wave P2 with a wavelength of 947 nm is guided from the input section 10, single mode propagation occurs, and the wavelength is 473 nm.
The harmonic P3 of nm was taken out from the output section 12 to the outside of the substrate. The propagation loss of the optical waveguide 2 was as small as 1 dB/cm, and the harmonic P3 was effectively extracted. The output light P1 of the semiconductor laser 20 was 400 mW, and the YAG 21 generated 80 mW of light with a wavelength of 947 nm. When the fundamental wave P2 was inputted at 40 mW, a harmonic wave P3 of 2 mW was obtained. The conversion efficiency in this case is 5%. Further, the output light P1 of the semiconductor laser 20 is 1
When the power is W, a fundamental wave P2 of 250 mW is obtained. 120 mW was incident on the optical waveguide 2 of the optical wavelength conversion element 25. The generated harmonic P2 was 20 mW. The wavelength tolerance of the optical wavelength conversion element is 0.4 nm. Wavelength is 0.4n
Even with a shift of m, the oscillation wavelength of the solid-state laser remained constant, and the harmonic output was stable.
【0013】図3に従来のKNbO3を用いた短波長レ
ーザ光源と本発明の短波長レーザ光源の光波長変換素子
の温度特性の比較を示す。従来の短波長レーザ光源に用
いていた光波長変換素子は温度に対する許容半値幅がわ
ずかに0.2℃であるのに対して、本発明の短波長レー
ザ光源に用いていた光波長変換素子では4.5℃と大幅
に広く、簡単な温度制御により広い温度範囲にわたって
高調波出力を安定にできる。また、本発明で用いた非線
形光学結晶であるLiTaO3は大型結晶が入手でき光
ICプロセスを用いた光波長変換素子の量産化も容易で
あるという特徴もある。高調波出力の安定度は従来の光
波長変換素子に比べ大幅に改善され実用性が増した。半
導体レーザは環境温度が20℃程度変化しても高調波出
力は安定に得られた。なお基本波に対してマルチモード
伝搬では高調波の出力が不安定で実用的ではなくシング
ルモードが有効である。FIG. 3 shows a comparison of the temperature characteristics of the optical wavelength conversion element of the conventional short wavelength laser light source using KNbO3 and the short wavelength laser light source of the present invention. The optical wavelength conversion element used in the conventional short wavelength laser light source has a permissible half width of only 0.2°C with respect to temperature, whereas the optical wavelength conversion element used in the short wavelength laser light source of the present invention has a permissible half width of only 0.2°C. The temperature is significantly wider at 4.5°C, and harmonic output can be stabilized over a wide temperature range by simple temperature control. Furthermore, LiTaO3, which is the nonlinear optical crystal used in the present invention, has the characteristics that large crystals are available and it is easy to mass-produce optical wavelength conversion elements using an optical IC process. The stability of harmonic output has been greatly improved compared to conventional optical wavelength conversion elements, making it more practical. The semiconductor laser was able to stably obtain harmonic output even when the environmental temperature changed by about 20°C. In contrast to the fundamental wave, in multimode propagation, the output of harmonics is unstable and is not practical, so single mode is effective.
【0014】次に本発明の短波長レーザ光源の第2の実
施例を説明する。図4に第2の実施例の短波長レーザ光
源の構成図を示す。本実施例の短波長レーザ光源は基本
的には半導体レーザ20と光波長変換素子25により構
成される。半導体レーザ20から出射された光P1はY
AG21を励起する。これにより得られた基本波P2は
光波長変換素子25に導入され高調波P3へと変換され
る。本実施例ではLiTaO3基板全面に周期的に分極
反転層3を持つ分極反転構造が形成されている。947
nmの波長で55℃が動作点である。ヒーターを使用す
るため室温に対して高温側に動作点をとる必要があり、
室温が40℃まで上昇する場合を考えると特に50℃以
上が望ましい。全反射ミラー22および23の間に光波
長変換素子は置かれており内部パワーが高いため高効率
で変換できる。半導体レーザの波長変動に対しても固体
レーザの発振波長は一定で光波長変換素子22の高調波
出力は安定化される。高調波への変換効率は光P1が4
0mWにたいし2%であり、30℃程度の範囲にわたっ
て出力も非常に安定していた。Next, a second embodiment of the short wavelength laser light source of the present invention will be described. FIG. 4 shows a configuration diagram of a short wavelength laser light source according to the second embodiment. The short wavelength laser light source of this embodiment basically consists of a semiconductor laser 20 and an optical wavelength conversion element 25. The light P1 emitted from the semiconductor laser 20 is Y
Excite AG21. The fundamental wave P2 thus obtained is introduced into the optical wavelength conversion element 25 and converted into a harmonic wave P3. In this embodiment, a polarization inversion structure having polarization inversion layers 3 periodically formed over the entire surface of the LiTaO3 substrate. 947
The operating point is 55° C. at a wavelength of nm. Since a heater is used, the operating point must be set on the high temperature side relative to room temperature.
Considering the case where the room temperature rises to 40°C, a temperature of 50°C or higher is particularly desirable. The optical wavelength conversion element is placed between the total reflection mirrors 22 and 23 and has high internal power, so it can convert with high efficiency. Even when the wavelength of the semiconductor laser changes, the oscillation wavelength of the solid-state laser remains constant, and the harmonic output of the optical wavelength conversion element 22 is stabilized. The conversion efficiency to harmonics is 4 for light P1
It was 2% of 0 mW, and the output was also very stable over a range of about 30°C.
【0015】本発明の第3の実施例について図面を用い
て説明する。図5に実施例の短波長レーザ光源の構成図
を示す。波長806nmの半導体レーザ20より出た光
P1はレンズ30により集光され光波長変換素子25に
入る。光波長変換素子25の材料は希土類であるNdが
ドープされたLiTaO3であり、周期Λ5.6μmの
分極反転構造が形成されている。Ndのドープ量は1m
ol/%である。22は全反射ミラーで波長947nm
の光を99%全反射し800nm帯の光は透過する。ま
た、23も全反射ミラーで波長947nmの光を99%
全反射し400nm帯の光は透過する。Ndは半導体レ
ーザ20より励起された947nmの波長で発振し、さ
らに周期状分極反転構造により高調波P3に変換され外
部に出射される。光P1が200mWにて10mWの高
調波が得られた。この実施例の短波長レーザ光源の長さ
は20mmであり、光波長変換素子に希土類をドープす
ると非常にコンパクトにできる。A third embodiment of the present invention will be described with reference to the drawings. FIG. 5 shows a configuration diagram of a short wavelength laser light source according to an embodiment. Light P1 emitted from the semiconductor laser 20 with a wavelength of 806 nm is focused by the lens 30 and enters the optical wavelength conversion element 25. The material of the optical wavelength conversion element 25 is LiTaO3 doped with Nd, which is a rare earth element, and a polarization inversion structure with a period Λ5.6 μm is formed. The amount of Nd doped is 1m
It is ol/%. 22 is a total reflection mirror with a wavelength of 947 nm.
It completely reflects 99% of the light and transmits light in the 800 nm band. In addition, 23 is a total reflection mirror that absorbs 99% of the light with a wavelength of 947 nm.
It undergoes total reflection and transmits light in the 400 nm band. Nd is excited by the semiconductor laser 20 and oscillates at a wavelength of 947 nm, and is further converted into a harmonic P3 by the periodic polarization inversion structure and emitted to the outside. When the light P1 was 200 mW, harmonics of 10 mW were obtained. The length of the short wavelength laser light source in this embodiment is 20 mm, and it can be made very compact by doping the optical wavelength conversion element with a rare earth element.
【0016】なお実施例では非線形光学結晶としてLi
NbO3、LiTaO3を用いたがKNbO3、KTP
等の強誘電体、MNA等の有機材料およびそれらの材料
に希土類をドープしたものにも適用可能である。また、
希土類は実施例で用いたNdだけでなくErやTlも有
望である。In the example, Li was used as the nonlinear optical crystal.
NbO3, LiTaO3 were used, but KNbO3, KTP
It is also applicable to ferroelectric materials such as ferroelectric materials, organic materials such as MNA, and materials doped with rare earth elements. Also,
As rare earth elements, not only Nd used in the embodiment but also Er and Tl are promising.
【0017】次に本発明の短波長レーザ光源の第4の実
施例を説明する。光波長変換素子の構成は実施例2と同
様である。本実施例ではLiTaO3基板の代わりにL
iNbO3を基板として用いた。LiNbO3基板は非
線形性が大きいという特徴がある。分極反転の周期は3
μm、素子長は7mmである。この実施例での変換効率
は200mW入力で10%である。光損傷はなく高調波
出力は非常に安定していた。Next, a fourth embodiment of the short wavelength laser light source of the present invention will be described. The configuration of the optical wavelength conversion element is the same as in the second embodiment. In this example, instead of the LiTaO3 substrate, L
iNbO3 was used as a substrate. A LiNbO3 substrate is characterized by high nonlinearity. The period of polarization reversal is 3
μm, and the element length is 7 mm. The conversion efficiency in this example is 10% at 200 mW input. There was no optical damage and the harmonic output was very stable.
【0018】最後に、本発明第5の実施例について説明
する。この実施例では短波長レーザ光源に変調機能を加
えている。図6に本実施例の短波長レーザ光源の構成図
を示す。実施例1と同様の構成であり、それに加えて光
波長変換素子25の光導波路2の上部にAl膜による変
調用電極が形成されている。従来のKNbO3を用いた
光波長変換素子では図7(a)に示すように変調された
電気信号が半導体レーザ20に入った場合、半導体レー
ザ20よりの光P1も同様に変調され出力される。しか
しながら固体レーザ結晶であるYAG21に入射すると
YAG21の応答時間がμSオーダーのため基本波P2
はMHZオーダーの変調は困難となる。そのためKNb
O3より変換される高調波P3も一定状態の変調されて
いない光となる。それに対して本実施例では変調された
電気信号を変調用電極28に加えることにより、一定の
基本波P2に対し変調された高調波P3を取り出すこと
ができる。これはLiTaO3による光波長変換素子に
電界を加えることでLiTaO3の電気光学効果を利用
し光導波路2の屈折率を変化させ位相整合条件からずら
すことを用いている。図7(b)に示すように電気信号
と同じ変調された高調波出力を発生できた。
この方法は半導体レーザ20の変調周波数が1GHZま
でであるのに対し20GHZ程度まで可能であり特に効
果がある。Finally, a fifth embodiment of the present invention will be explained. In this embodiment, a modulation function is added to the short wavelength laser light source. FIG. 6 shows a configuration diagram of the short wavelength laser light source of this embodiment. The configuration is similar to that of Example 1, and in addition, a modulation electrode made of an Al film is formed above the optical waveguide 2 of the optical wavelength conversion element 25. In the conventional optical wavelength conversion element using KNbO3, when a modulated electrical signal enters the semiconductor laser 20 as shown in FIG. 7(a), the light P1 from the semiconductor laser 20 is similarly modulated and output. However, when it enters YAG21, which is a solid-state laser crystal, the response time of YAG21 is on the order of μS, so the fundamental wave P2
It becomes difficult to modulate the MHZ order. Therefore KNb
The harmonic P3 converted from O3 also becomes unmodulated light in a constant state. In contrast, in this embodiment, by applying a modulated electrical signal to the modulating electrode 28, it is possible to extract a harmonic P3 modulated with respect to a constant fundamental wave P2. This utilizes the electro-optic effect of LiTaO3 by applying an electric field to an optical wavelength conversion element made of LiTaO3 to change the refractive index of the optical waveguide 2 and deviate from the phase matching condition. As shown in FIG. 7(b), the same modulated harmonic output as the electrical signal could be generated. This method is particularly effective since the modulation frequency of the semiconductor laser 20 is up to 1 GHz, but can be up to about 20 GHz.
【0019】なおYAG結晶には1064nmの発振波
長もあり、本発明によるグリーン光(532nm)の発
生も効果がある。また、固体レーザ結晶としてYAGを
用いたが他にYLF,YVO4等の結晶も効果がある。Note that the YAG crystal also has an oscillation wavelength of 1064 nm, and the generation of green light (532 nm) according to the present invention is also effective. Furthermore, although YAG was used as the solid-state laser crystal, other crystals such as YLF and YVO4 are also effective.
【0020】[0020]
【発明の効果】以上説明したように本発明の短波長レー
ザ光源によれば、半導体レーザの波長変動を固体レーザ
を用いて安定化することにより従来の短波長レーザ光源
に比べて大幅に出力の安定化を図ることができる。また
、マルチストライプやワイドストライプの高出力半導体
レーザを用いることができ高出力の高調波を得ることが
できる。[Effects of the Invention] As explained above, according to the short wavelength laser light source of the present invention, by stabilizing the wavelength fluctuation of the semiconductor laser using a solid-state laser, the output can be significantly increased compared to the conventional short wavelength laser light source. Stabilization can be achieved. Further, a multi-stripe or wide-stripe high-output semiconductor laser can be used, and high-output harmonics can be obtained.
【0021】また、本発明の短波長レーザ光源によれば
従来のKNbO3を用いた短波長レーザ光源に比べ大幅
に温度特性の改善が図れる。さらに、光波長変換素子上
に電極を設け、変調機能をもたせることをできる。Furthermore, according to the short wavelength laser light source of the present invention, the temperature characteristics can be significantly improved compared to the conventional short wavelength laser light source using KNbO3. Furthermore, an electrode can be provided on the optical wavelength conversion element to provide a modulation function.
【0022】このように本発明の短波長レーザ光源によ
れば出力および温度特性ともに実用性のあるものを提供
でき、その効果は極めて大きい。As described above, the short wavelength laser light source of the present invention can provide practical output and temperature characteristics, and its effects are extremely large.
【図1】本発明の短波長レーザ光源の第1の実施例の構
造図である。FIG. 1 is a structural diagram of a first embodiment of a short wavelength laser light source of the present invention.
【図2】本発明の短波長レーザ光源における光波長変換
素子の製造工程図である。FIG. 2 is a manufacturing process diagram of the optical wavelength conversion element in the short wavelength laser light source of the present invention.
【図3】従来の短波長レーザ光源と本発明の短波長レー
ザ光源に使用する光波長変換素子の温度特性を示す特性
図である。FIG. 3 is a characteristic diagram showing the temperature characteristics of a conventional short wavelength laser light source and an optical wavelength conversion element used in the short wavelength laser light source of the present invention.
【図4】本発明の第2の実施例の短波長レーザ光源の構
成図である。FIG. 4 is a configuration diagram of a short wavelength laser light source according to a second embodiment of the present invention.
【図5】本発明の第3の実施例の短波長レーザ光源の構
成図である。FIG. 5 is a configuration diagram of a short wavelength laser light source according to a third embodiment of the present invention.
【図6】本発明第5の実施例の短波長レーザ光源の構成
図である。FIG. 6 is a configuration diagram of a short wavelength laser light source according to a fifth embodiment of the present invention.
【図7】本発明と従来例の短波長レーザ光源の変調曲線
図である。FIG. 7 is a modulation curve diagram of a short wavelength laser light source according to the present invention and a conventional example.
【図8】従来の短波長レーザ光源の構成図である。FIG. 8 is a configuration diagram of a conventional short wavelength laser light source.
【図9】第2の従来の短波長レーザ光源の構成図である
。FIG. 9 is a configuration diagram of a second conventional short wavelength laser light source.
1 LiTaO3基板 2 光導波路 3 分極反転層 20 半導体レーザ 21 固体レーザ結晶 25 光波長変換素子 P1 光 P2 基本波 P3 高調波 1 LiTaO3 substrate 2 Optical waveguide 3 Polarization inversion layer 20 Semiconductor laser 21 Solid state laser crystal 25 Optical wavelength conversion element P1 Light P2 Fundamental wave P3 harmonic
Claims (6)
非線形光学結晶で形成された光波長変換素子と、前記半
導体レーザと前記固体レーザ結晶との間に設置した第1
の全反射ミラーと、前記固体レーザ結晶に対して基本波
の出射側に設置した第2の全反射ミラーとを備え、前記
光波長変換素子には周期的分極反転構造が形成され、前
記固体レーザからの基本波の波長を変換し、高調波を出
力することを特徴とする短波長レーザ光源。[Claim 1] A semiconductor laser, a solid-state laser crystal,
an optical wavelength conversion element formed of a nonlinear optical crystal; and a first optical wavelength conversion element installed between the semiconductor laser and the solid-state laser crystal.
and a second total reflection mirror installed on the fundamental wave emission side with respect to the solid-state laser crystal, a periodic polarization inversion structure is formed in the optical wavelength conversion element, and the solid-state laser A short wavelength laser light source that converts the wavelength of the fundamental wave from the source and outputs harmonics.
レーザ光の入射側表面、第2の反射ミラーが固体レーザ
結晶のレーザ光の出射側表面にそれぞれ形成されている
ことを特徴とする請求項1記載の短波長レーザ光源。2. A claim characterized in that the first reflecting mirror is formed on the laser beam incident side surface of the solid laser crystal, and the second reflecting mirror is formed on the laser beam output side surface of the solid laser crystal. Item 1. Short wavelength laser light source.
で形成された光波長変換素子を用いることを特徴とする
請求項1または2記載の短波長レーザ光源。3. The short wavelength laser light source according to claim 1, wherein an optical wavelength conversion element formed of a nonlinear optical crystal doped with rare earth elements is used.
成することを特徴とする請求項1または2記載の短波長
レーザ光源。4. The short wavelength laser light source according to claim 1, wherein an optical waveguide is formed in the nonlinear optical element crystal.
xO3(0≦X≦1)基板である請求項1または2記載
の短波長レーザ光源。5. The nonlinear optical crystal is LiNbxTa1-
The short wavelength laser light source according to claim 1 or 2, which is an xO3 (0≦X≦1) substrate.
1記載の短波長レーザ光源。6. The short wavelength laser light source according to claim 1, wherein the solid laser crystal is YAG.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3062806A JPH04296731A (en) | 1991-03-27 | 1991-03-27 | Short-wavelength laser beam source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3062806A JPH04296731A (en) | 1991-03-27 | 1991-03-27 | Short-wavelength laser beam source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04296731A true JPH04296731A (en) | 1992-10-21 |
Family
ID=13210950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3062806A Pending JPH04296731A (en) | 1991-03-27 | 1991-03-27 | Short-wavelength laser beam source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04296731A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996038757A1 (en) * | 1995-06-02 | 1996-12-05 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| WO1997015863A1 (en) * | 1995-10-26 | 1997-05-01 | Mitsubishi Cable Industries, Ltd. | Optical device |
| JP2010020285A (en) * | 2008-03-28 | 2010-01-28 | Panasonic Corp | Laser light source, image display device and processing apparatus |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52143047A (en) * | 1976-05-25 | 1977-11-29 | Nippon Telegr & Teleph Corp <Ntt> | Second harmonic optical switch |
| JPH0263026A (en) * | 1988-08-30 | 1990-03-02 | Nec Corp | Waveguide type wavelength converting element |
| JPH0277181A (en) * | 1988-09-13 | 1990-03-16 | Fuji Photo Film Co Ltd | Laser diode pomping solid laser |
| JPH02210310A (en) * | 1989-02-09 | 1990-08-21 | Matsushita Electric Ind Co Ltd | Method for manufacturing optical waveguide, optical wavelength conversion element, and short wavelength laser light source |
| JPH02282232A (en) * | 1989-04-24 | 1990-11-19 | Nec Corp | Waveguide type wavelength converting element |
| JPH0315832A (en) * | 1989-06-14 | 1991-01-24 | Toshiba Corp | Harmonic producer |
-
1991
- 1991-03-27 JP JP3062806A patent/JPH04296731A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52143047A (en) * | 1976-05-25 | 1977-11-29 | Nippon Telegr & Teleph Corp <Ntt> | Second harmonic optical switch |
| JPH0263026A (en) * | 1988-08-30 | 1990-03-02 | Nec Corp | Waveguide type wavelength converting element |
| JPH0277181A (en) * | 1988-09-13 | 1990-03-16 | Fuji Photo Film Co Ltd | Laser diode pomping solid laser |
| JPH02210310A (en) * | 1989-02-09 | 1990-08-21 | Matsushita Electric Ind Co Ltd | Method for manufacturing optical waveguide, optical wavelength conversion element, and short wavelength laser light source |
| JPH02282232A (en) * | 1989-04-24 | 1990-11-19 | Nec Corp | Waveguide type wavelength converting element |
| JPH0315832A (en) * | 1989-06-14 | 1991-01-24 | Toshiba Corp | Harmonic producer |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1305184C (en) * | 1995-06-02 | 2007-03-14 | 松下电器产业株式会社 | Optical element, laser light source, laser device and method for mfg. optical element |
| US7295583B2 (en) | 1995-06-02 | 2007-11-13 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| US7623559B2 (en) | 1995-06-02 | 2009-11-24 | Panasonic Corporation | Optical device, laser beam source, laser apparatus and method of producing optical device |
| US6333943B1 (en) | 1995-06-02 | 2001-12-25 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| US6914918B2 (en) | 1995-06-02 | 2005-07-05 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| US7101723B2 (en) | 1995-06-02 | 2006-09-05 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| CN1304877C (en) * | 1995-06-02 | 2007-03-14 | 松下电器产业株式会社 | Optical element, laser light source, laser device and method for mfg. optical element |
| CN1305183C (en) * | 1995-06-02 | 2007-03-14 | 松下电器产业株式会社 | Optical element, laser light source, laser device and method for mfg. optical element |
| US7570677B2 (en) | 1995-06-02 | 2009-08-04 | Panasonic Corporation | Optical device, laser beam source, laser apparatus and method of producing optical device |
| CN100351670C (en) * | 1995-06-02 | 2007-11-28 | 松下电器产业株式会社 | Optical element, laser light source, laser device and method for mfg. optical element |
| WO1996038757A1 (en) * | 1995-06-02 | 1996-12-05 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| US7339960B2 (en) | 1995-06-02 | 2008-03-04 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| US7382811B2 (en) | 1995-06-02 | 2008-06-03 | Matsushita Electric Industrial Co., Ltd. | Optical device, laser beam source, laser apparatus and method of producing optical device |
| WO1997015863A1 (en) * | 1995-10-26 | 1997-05-01 | Mitsubishi Cable Industries, Ltd. | Optical device |
| JPH09127567A (en) * | 1995-10-26 | 1997-05-16 | Hiromasa Ito | Optical device |
| JP2010020285A (en) * | 2008-03-28 | 2010-01-28 | Panasonic Corp | Laser light source, image display device and processing apparatus |
| US8571076B2 (en) | 2008-03-28 | 2013-10-29 | Panasonic Corporation | Laser light source, image display apparatus, and processing apparatus |
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