JPH0430169A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPH0430169A JPH0430169A JP13541690A JP13541690A JPH0430169A JP H0430169 A JPH0430169 A JP H0430169A JP 13541690 A JP13541690 A JP 13541690A JP 13541690 A JP13541690 A JP 13541690A JP H0430169 A JPH0430169 A JP H0430169A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- general formula
- formulas
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 claims abstract description 197
- 239000011347 resin Substances 0.000 claims abstract description 197
- -1 cyclic acid anhydrides Chemical class 0.000 claims abstract description 89
- 239000011230 binding agent Substances 0.000 claims abstract description 35
- 229920001577 copolymer Polymers 0.000 claims abstract description 19
- 229920001400 block copolymer Polymers 0.000 claims abstract description 14
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 8
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 7
- 229920000728 polyester Polymers 0.000 claims abstract description 7
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 11
- 229920000642 polymer Polymers 0.000 claims description 53
- 125000004432 carbon atom Chemical group C* 0.000 claims description 45
- 230000002378 acidificating effect Effects 0.000 claims description 40
- 108091008695 photoreceptors Proteins 0.000 claims description 39
- 239000000463 material Substances 0.000 claims description 35
- 150000002430 hydrocarbons Chemical group 0.000 claims description 29
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 27
- 229910052799 carbon Inorganic materials 0.000 claims description 20
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 17
- 125000001931 aliphatic group Chemical group 0.000 claims description 15
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 229910052801 chlorine Inorganic materials 0.000 claims description 11
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 10
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 10
- 125000005843 halogen group Chemical group 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 239000004215 Carbon black (E152) Substances 0.000 claims description 7
- 229930195733 hydrocarbon Natural products 0.000 claims description 7
- 125000005647 linker group Chemical group 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 5
- 125000004429 atom Chemical group 0.000 claims description 4
- 238000007639 printing Methods 0.000 abstract description 19
- 239000002253 acid Substances 0.000 abstract description 9
- 229910052736 halogen Inorganic materials 0.000 abstract description 2
- 150000002367 halogens Chemical class 0.000 abstract description 2
- 229910018828 PO3H2 Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 52
- 238000000034 method Methods 0.000 description 38
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 37
- 230000015572 biosynthetic process Effects 0.000 description 37
- 238000003786 synthesis reaction Methods 0.000 description 35
- 239000000975 dye Substances 0.000 description 33
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 30
- 239000000203 mixture Substances 0.000 description 25
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 125000000217 alkyl group Chemical group 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 18
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 17
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 16
- 238000006116 polymerization reaction Methods 0.000 description 16
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 14
- 125000001424 substituent group Chemical group 0.000 description 14
- 238000003384 imaging method Methods 0.000 description 13
- 238000007334 copolymerization reaction Methods 0.000 description 12
- 230000002829 reductive effect Effects 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 11
- 230000007613 environmental effect Effects 0.000 description 10
- 239000011259 mixed solution Substances 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 10
- 239000000123 paper Substances 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 8
- 206010034972 Photosensitivity reaction Diseases 0.000 description 8
- 230000003993 interaction Effects 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- 230000036211 photosensitivity Effects 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 239000011787 zinc oxide Substances 0.000 description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 7
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 230000014759 maintenance of location Effects 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 125000001624 naphthyl group Chemical group 0.000 description 6
- 230000001235 sensitizing effect Effects 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- 125000003944 tolyl group Chemical group 0.000 description 6
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 5
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 5
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 5
- 150000008064 anhydrides Chemical class 0.000 description 5
- 150000001735 carboxylic acids Chemical class 0.000 description 5
- 125000000068 chlorophenyl group Chemical group 0.000 description 5
- 239000003431 cross linking reagent Substances 0.000 description 5
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 125000001153 fluoro group Chemical group F* 0.000 description 5
- 229920000578 graft copolymer Polymers 0.000 description 5
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 125000004799 bromophenyl group Chemical group 0.000 description 4
- 125000004803 chlorobenzyl group Chemical group 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000000586 desensitisation Methods 0.000 description 4
- 125000004188 dichlorophenyl group Chemical group 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 125000006178 methyl benzyl group Chemical group 0.000 description 4
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 3
- 238000012661 block copolymerization Methods 0.000 description 3
- 125000006278 bromobenzyl group Chemical group 0.000 description 3
- 239000012986 chain transfer agent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 238000010908 decantation Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000012690 ionic polymerization Methods 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000003208 petroleum Substances 0.000 description 3
- LGRFSURHDFAFJT-UHFFFAOYSA-N phthalic anhydride Chemical group C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- 125000006239 protecting group Chemical group 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 238000012552 review Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 125000005023 xylyl group Chemical group 0.000 description 3
- ULQISTXYYBZJSJ-UHFFFAOYSA-N 12-hydroxyoctadecanoic acid Chemical compound CCCCCCC(O)CCCCCCCCCCC(O)=O ULQISTXYYBZJSJ-UHFFFAOYSA-N 0.000 description 2
- 125000005999 2-bromoethyl group Chemical group 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- QSECPQCFCWVBKM-UHFFFAOYSA-N 2-iodoethanol Chemical compound OCCI QSECPQCFCWVBKM-UHFFFAOYSA-N 0.000 description 2
- 125000004924 2-naphthylethyl group Chemical group C1=C(C=CC2=CC=CC=C12)CC* 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- 206010034960 Photophobia Diseases 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 229950005228 bromoform Drugs 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N chloroform Substances ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
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- 229920006026 co-polymeric resin Polymers 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
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- 125000004802 cyanophenyl group Chemical group 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 125000006286 dichlorobenzyl group Chemical group 0.000 description 2
- 125000006182 dimethyl benzyl group Chemical group 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
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- 239000003822 epoxy resin Substances 0.000 description 2
- DZGCGKFAPXFTNM-UHFFFAOYSA-N ethanol;hydron;chloride Chemical compound Cl.CCO DZGCGKFAPXFTNM-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 208000013469 light sensitivity Diseases 0.000 description 2
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 2
- 238000010550 living polymerization reaction Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
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- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical group C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 238000007327 hydrogenolysis reaction Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- JDNTWHVOXJZDSN-UHFFFAOYSA-N iodoacetic acid Chemical compound OC(=O)CI JDNTWHVOXJZDSN-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- KXNASDIZDONYKA-UHFFFAOYSA-N lithium;hexane Chemical compound [Li+].CCCC[CH-]C KXNASDIZDONYKA-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical group O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- CCRCUPLGCSFEDV-UHFFFAOYSA-N methyl cinnamate Chemical compound COC(=O)C=CC1=CC=CC=C1 CCRCUPLGCSFEDV-UHFFFAOYSA-N 0.000 description 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 1
- 150000004682 monohydrates Chemical class 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OKDQKPLMQBXTNH-UHFFFAOYSA-N n,n-dimethyl-2h-pyridin-1-amine Chemical compound CN(C)N1CC=CC=C1 OKDQKPLMQBXTNH-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- JNXLTSSPACJLEG-UHFFFAOYSA-N n-methyl-3-phenylprop-2-enamide Chemical compound CNC(=O)C=CC1=CC=CC=C1 JNXLTSSPACJLEG-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- CASUWPDYGGAUQV-UHFFFAOYSA-M potassium;methanol;hydroxide Chemical compound [OH-].[K+].OC CASUWPDYGGAUQV-UHFFFAOYSA-M 0.000 description 1
- UHDJLJWVPNZJJO-UHFFFAOYSA-N prop-1-enyl 2-methylprop-2-enoate Chemical compound CC=COC(=O)C(C)=C UHDJLJWVPNZJJO-UHFFFAOYSA-N 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- FIDKFEIEZJGDBE-UHFFFAOYSA-N thieno[2,3-c]furan-4,6-dione Chemical group S1C=CC2=C1C(=O)OC2=O FIDKFEIEZJGDBE-UHFFFAOYSA-N 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- YIYBQIKDCADOSF-ONEGZZNKSA-N trans-pent-2-enoic acid Chemical compound CC\C=C\C(O)=O YIYBQIKDCADOSF-ONEGZZNKSA-N 0.000 description 1
- PTVDYMGQGCNETM-UHFFFAOYSA-N trityl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(OC(=O)C(=C)C)C1=CC=CC=C1 PTVDYMGQGCNETM-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 229940075420 xanthine Drugs 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は電子写真感光体に関し、詳しくは静電特性及び
耐湿性に優れた電子写真感光体に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an electrophotographic photoreceptor, and more particularly to an electrophotographic photoreceptor having excellent electrostatic properties and moisture resistance.
特にcpcg光体として性能の優れたものに関する。In particular, it relates to a CPCG light body with excellent performance.
(従来の技術)
電子写真感光体は、所定の特性を得るため、あるいは適
用される電子写真プロセスの種類に応して、種々の構成
をとる。(Prior Art) Electrophotographic photoreceptors have various configurations in order to obtain predetermined characteristics or depending on the type of electrophotographic process to which they are applied.
電子写真感光体の代表的なものとして、支持体上に光導
電層が形成されている感光体及び表面に絶縁層を備えた
感光体があり、広く用いられてい支持体と少なくとも1
つの光導電層から構成される感光体は、最も一般的な電
子写真プロセスによる、即ち帯電、画像露光及び現像、
更に必要に応じて転写による画像形成に用いられる。Typical electrophotographic photoreceptors include photoreceptors with a photoconductive layer formed on a support and photoreceptors with an insulating layer on the surface.
A photoreceptor consisting of two photoconductive layers can be produced by the most common electrophotographic processes, namely charging, image exposure and development.
Furthermore, it is used for image formation by transfer, if necessary.
更には、ダイレクト製版用のオフセット原版として電子
写真感光体を用いる方法が広く実用されている。特に近
年、ダイレクト電子写真平版は数百枚から数十枚程度の
印刷枚数で高画質の印刷物を印刷する方式として重要と
なってきている。Furthermore, a method of using an electrophotographic photoreceptor as an offset original plate for direct plate making is widely used. Particularly in recent years, direct electrophotographic lithography has become important as a method for printing high-quality printed matter with a print count of several hundred to several dozen sheets.
電子写真感光体の光導電層を形成するために使用する結
着樹脂は、それ自体の成膜性および光導電性粉体の結着
樹脂への分散能力が優れるとともに、形成された記録体
層の基材に対する接着性が良好であり、しかも記録体層
の光導電層は帯電能力に優れ、暗減衰が小さ(、光減衰
が大きく、前露光疲労が少なく、且つ、撮影時の湿度の
変化によってこれら特性を安定に保持していることが必
要である等の各種の静電特性および優れた撮像性を具備
する必要がある。The binder resin used to form the photoconductive layer of the electrophotographic photoreceptor has excellent film-forming properties itself and ability to disperse photoconductive powder into the binder resin. The photoconductive layer of the recording layer has good adhesion to the substrate, and the photoconductive layer of the recording layer has excellent charging ability, and has low dark decay (high light decay, little pre-exposure fatigue, and can withstand changes in humidity during photographing. Therefore, it is necessary to have various electrostatic properties such as the need to stably maintain these properties and excellent imaging performance.
更に、電子写真感光体を用いた平版印刷用原版の研究が
鋭意行なわれており、電子写真感光体としての静電特性
と印刷原版としての印刷特性を両立させた光導電層用の
結着樹脂が必要である。Furthermore, research is being carried out on lithographic printing original plates using electrophotographic photoreceptors, and a binder resin for the photoconductive layer that has both the electrostatic properties of an electrophotographic photoreceptor and the printing properties of a printing original plate has been developed. is necessary.
しかしながら従来公知の結着樹脂には、特に帯電性、暗
電荷保持性、光感度の如き静電特性、光導電層の平滑性
等に多くの問題があった。However, conventionally known binder resins have many problems, particularly in electrostatic properties such as chargeability, dark charge retention, photosensitivity, and smoothness of the photoconductive layer.
これらの問題を解決するために、結着樹脂として酸性基
を重合体の側鎖に含有する共重合体成分を0.05〜1
0重量%含有する低分子量の樹脂又は酸性基を重合体主
鎖の末端に結合する低分子量の樹脂(FrwlO’〜1
04)を用いることにより、光導電層の平滑性及び静電
特性を良好にし、しかも地汚れのない画質を得ることが
それぞれ特開昭63217354号及び特開昭64−7
0761号及び特開平267563号に記載されている
。In order to solve these problems, a copolymer component containing an acidic group in the side chain of the polymer was used as a binder resin in an amount of 0.05 to 1.
A low molecular weight resin containing 0% by weight or a low molecular weight resin that binds an acidic group to the end of the polymer main chain (FrwlO'~1
04), the smoothness and electrostatic properties of the photoconductive layer are improved, and image quality without background smear is obtained, as disclosed in JP-A-63217-354 and JP-A-64-7, respectively.
No. 0761 and JP-A No. 267563.
また、結着樹脂として、酸性基を共重合体の側鎖に含有
し、又は重合体主鎖の末端に結合し、且つ熱及び/又は
光硬化性官能基を含有する重合成分を含有する樹脂を用
いる技術が特開平1−100554号、特願昭63−3
9690号に、酸性基を共重合体の側鎖に含有し、又は
重合体主鎖の末端に結合する樹脂を架橋側と併用する技
術が特開平1−102573号、同2−874号にそれ
ぞれ開示され、更に該樹脂の低分子量体(重量平均分子
量103〜104)を高分子量(重量平均分子量lO4
以上)の樹脂と組合せて用いる技術が特開昭64−56
4号、同63−220149号、同6’3−22014
8号、特開平1−280761号、同1−116643
号及び同1−169455号に、かかる低分子量体を熱
及び/又は光硬化性樹脂と組合せて用いる技術が特開平
1−211766号及び同2−34859号に、かかる
低分子量体をクシ型ポリマーと組合せて用いる技術が特
開平2−53064号、同2−56558号及び特願昭
63254786号にそれぞれ開示されている。これら
の技術により、側鎖又は末端に酸性基を含有する樹脂を
用いたことkよる上記特性を阻害せずにさらに光導電層
の膜強度を充分ならしめ、機械的強度が増大されること
が記載されている。In addition, as a binder resin, a resin containing a polymeric component containing an acidic group in the side chain of the copolymer, or bonded to the end of the main chain of the polymer, and containing a thermally and/or photocurable functional group. The technique using this is disclosed in Japanese Patent Application Laid-open No. 1-100554 and Japanese Patent Application No. 1983-3.
9690, and JP-A-1-102573 and JP-A-2-874 disclose a technique in which a resin containing an acidic group in the side chain of the copolymer or bonded to the end of the main chain of the polymer is used in combination with a crosslinking side. Furthermore, the low molecular weight substance (weight average molecular weight 103 to 104) of the resin is converted into a high molecular weight substance (weight average molecular weight 1O4).
The technology used in combination with the above resins was disclosed in Japanese Patent Application Laid-open No. 64-56.
No. 4, No. 63-220149, No. 6'3-22014
No. 8, JP-A No. 1-280761, JP-A No. 1-116643
JP-A No. 1-211766 and JP-A No. 2-34859 disclose a technique for using such a low molecular weight material in combination with a heat-curable and/or photo-curable resin. Techniques used in combination with this are disclosed in Japanese Patent Application Laid-open No. 2-53064, Japanese Patent Application No. 2-56558, and Japanese Patent Application No. 63254786, respectively. With these techniques, the film strength of the photoconductive layer can be made sufficient and the mechanical strength can be increased without impairing the above-mentioned properties due to the use of a resin containing an acidic group in the side chain or terminal. Are listed.
(発明が解決しようとする課B)
しかしながら、これらの樹脂を用いても、環境が高温・
高温から低温・低湿まで著しく変動した場合における安
定した性能の維持においてはいまだ不充分であることが
判った。特に半導体レーザー光を用いたスキャニング露
光方式では、従来の可視光による全面同時露光方式に比
べ、露光時間が長くなり、また露光強度にも制約がある
ことから、静電特性、特に暗電荷保持特性、光感度に対
して、より高い性能が要求される。(Problem B that the invention attempts to solve) However, even if these resins are used, the environment is high temperature and
It has been found that it is still insufficient to maintain stable performance when the temperature fluctuates significantly from high temperature to low temperature and low humidity. In particular, scanning exposure methods using semiconductor laser light require longer exposure times than conventional simultaneous exposure methods using visible light across the entire surface, and there are restrictions on exposure intensity. , higher performance is required in terms of photosensitivity.
更には、電子写真式平版印刷用原版において、半導体レ
ーザー光を用いたスキャニング露光方式を採用した場合
、従来の感光体で実際に試験してみると、上記の静電特
性が不満足であるとともに、特にEl/□とEl/l。Furthermore, when a scanning exposure method using semiconductor laser light is adopted in an electrophotographic lithographic printing original plate, actual tests using a conventional photoreceptor show that the electrostatic properties described above are unsatisfactory. Especially El/□ and El/l.
との差が大きく複写画像の階調が軟調となり、更には露
光後の残留電位を小さくするのが困難となり、複写画像
のカブリが顕著となってしまい、又、オフセットマスタ
ーとして印刷しても、印刷物に印刷原稿の貼り込み跡が
出てしまう等の重大な問題となって現れた。The large difference between the gradation and the gradation of the copied image becomes soft, and furthermore, it becomes difficult to reduce the residual potential after exposure, resulting in noticeable fogging of the copied image.Also, even when printed as an offset master, This has resulted in serious problems such as the appearance of pasted marks from printed manuscripts on printed matter.
本発明は、以上の様な従来の電子写真感光体の有する課
題を改良するものである。The present invention is intended to improve the problems of conventional electrophotographic photoreceptors as described above.
本発明の目的は、複写画像形成時の環境が低温低湿ある
いは高温高湿の如く変動した場合でも、安定して良好な
静電特性を維持し、鮮明で良質な画像を有する電子写真
感光体を提供することである。An object of the present invention is to provide an electrophotographic photoreceptor that stably maintains good electrostatic properties and produces clear, high-quality images even when the environment during copy image formation changes such as low temperature and low humidity or high temperature and high humidity. It is to provide.
本発明の他の目的は、静電特性に優れ且つ環境依存性の
小さいCPC電子写真感光体を提供することである。Another object of the present invention is to provide a CPC electrophotographic photoreceptor with excellent electrostatic properties and low environmental dependence.
本発明の他の目的は、半導体レーザー光を用いたスキャ
ニング露光方式に有効な電子写真感光体を提供すること
である。Another object of the present invention is to provide an electrophotographic photoreceptor that is effective in a scanning exposure method using semiconductor laser light.
本発明の更なる目的は、電子写真式平版印刷原版として
、静電特性(特に暗電荷保持性及び光感度)に優れ、原
画に対して忠実な複写画像を再現し、且つ、印刷物の全
面一様な地汚れはもちろん点状の地汚れをも発生させず
、また耐剛性の優れた平版印刷原版を提供することであ
る。A further object of the present invention is to use an electrophotographic lithographic printing original plate that has excellent electrostatic properties (particularly dark charge retention and photosensitivity), reproduces a copy image that is faithful to the original image, and is capable of reproducing the entire surface of a printed matter. It is an object of the present invention to provide a lithographic printing original plate which does not generate not only such background stains but also dotted background stains and which has excellent rigidity resistance.
(!II題を解決するための手段)
上記目的は無機光導電体及び結着樹脂を少なくとも含有
する光導電層を有する電子写真感光体において、該結着
樹脂が、下記に示される樹脂〔A〕の少なくとも1種と
樹脂〔B〕の少なくとも1種とを含有して成る事を特徴
とする電子写真感光体により達成されることが見出され
た。(Means for Solving Problem !II) The above object is to provide an electrophotographic photoreceptor having a photoconductive layer containing at least an inorganic photoconductor and a binder resin, wherein the binder resin is a resin [A] shown below. ] and at least one resin [B].
樹脂〔A〕 ;
1×103〜2XlO’の平均分子量を有し、・PO,
H,基、−COOH基、−SO3H基、フェノール性響
(R’は炭化水素基)を示す)及び環状酸無水物含有基
から選択される少なくとも1つの酸性基を含有する少な
くとも1つの重合体成分がら成るAブロックと下記一般
式(1)で示される重合体成分を少なくとも含有するB
ブロックとから構成されるABブロック共重合体を含有
して成る樹脂。Resin [A]; has an average molecular weight of 1x103 to 2XlO', ・PO,
At least one polymer containing at least one acidic group selected from H, a -COOH group, a -SOH group, a phenolic group (R' is a hydrocarbon group), and a cyclic acid anhydride-containing group. A block consisting of components and B containing at least a polymer component represented by the following general formula (1)
A resin comprising an AB block copolymer composed of blocks.
一般式(り Coo −R。General formula (ri) Coo-R.
(式(1)中、R+は炭化水素基を表わす。)結着樹脂
〔B〕 :
下記一般式(I[la)及び一般式(I[[b)で示さ
れる、重量平均分子量1×103〜1.5 XIO’の
ポリエステル型マクロ千ツマ−のうちの少なくとも1つ
を少なくとも重合体成分として含有する重量平均分子量
3X10’〜lXl0”の共重合体。(In formula (1), R+ represents a hydrocarbon group.) Binder resin [B]: Represented by the following general formulas (I[la) and (I[[b)], weight average molecular weight 1 x 103 A copolymer having a weight average molecular weight of 3X10' to 1X10'' and containing at least one polyester-type macromolecule of 1.5 XIO' as at least a polymer component.
一般式(Illa)
H−C
At −at −coo +n+−oco−nt−co
o−)−R61一般式(I[lb)
O−C
At B! COO+D3 COO+Riz式[
1[1alおよび[[lb]中、〔〕内は繰り返し単位
を表わす。General formula (Illa) H-C At -at -coo +n+-oco-nt-co
o-)-R61 General formula (I[lb) O-C At B! COO+D3 COO+Riz formula [
In 1[1al and [[lb], the characters in brackets represent repeating units.
f、及びf2は、互いに同じでも異なってもよく、各々
水素原子、ハロゲン原子、シアノ基、炭素数1〜8の炭
化水素基、−Coo−T、又は炭素数1〜8の炭化水素
基を介したーC00−Tz (T+およびT2は各々炭
素数1〜18の炭化水素基を表わす)を表わす。f and f2 may be the same or different, and each represents a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group having 1 to 8 carbon atoms, -Coo-T, or a hydrocarbon group having 1 to 8 carbon atoms. -C00-Tz (T+ and T2 each represent a hydrocarbon group having 1 to 18 carbon atoms).
^、は、単結合もしくは−coo−−oc。^, is a single bond or -coo--oc.
+CH2CH2ローC00−1+z胎−0CO−(u
+ + u zは1〜3の整数を表わす) 、−CON
−(d、は水素原子又は炭素数1〜12の炭化水素基を
表わす)、又は−SO,−を表わす。+CH2CH2low C00-1+z-0CO-(u
+ + u z represents an integer from 1 to 3), -CON
-(d represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms), or -SO,-.
B1は、Atと−000−とを連結する基を表わす。B1 represents a group connecting At and -000-.
D、及びD2は、互いに同じでも異なってもよく、各々
二価の脂肪族基、二価の芳香族基(各々の二(d□は水
素原子又は炭素数1〜12の炭化水素基をを表わす)、
Sow COO0CO−CONHCO
−NHCONH−
CON Cdsはd2と同一
の内容を表わす)、 SOJ (daはd2と同一の
内dコ
1つの結合基を介在させてもよい)又はこれら残基の組
合せにより構成された有機残基を表わす。D and D2 may be the same or different, and each represents a divalent aliphatic group or a divalent aromatic group (each 2 (d□ represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms). ),
Sow COO0CO-CONHCO -NHCONH- CON Cds represents the same content as d2), SOJ (da is the same as d2, but d may include one bonding group), or a combination of these residues. represents an organic residue.
R1−よ水素原子又は炭化水素基を表わす。R1- represents a hydrogen atom or a hydrocarbon group.
一般式(nib)におけるfl、f6、A2、B2及び
Ratは各々一般式(I[[a)におけるfl、f2、
A3、B、及びれ、と同一の内容を表わす。fl, f6, A2, B2 and Rat in the general formula (nib) are respectively fl, f2,
Represents the same content as A3, B, and Re.
D、は二価の脂肪族残基を表わす。D represents a divalent aliphatic residue.
本発明に供される結着樹脂は、上記特定の酸性基含有成
分を含有するAブロックと上記式(1)で示される重合
体成分を含有するBブロックとのABブロック共重合体
(A)と、上記一般式(I[Ia)および(I[lb)
で示されるマクロモノマー(MB)のうちの少なくとも
1種を含有する高分子量のグラフト共重合体の樹脂CB
)とから少なくとも構成される。The binder resin used in the present invention is an AB block copolymer (A) of an A block containing the above-mentioned specific acidic group-containing component and a B block containing the polymer component represented by the above formula (1). and the above general formulas (I[Ia) and (I[lb)
Resin CB of a high molecular weight graft copolymer containing at least one kind of macromonomer (MB) represented by
).
更には、低分子量の樹脂〔A〕としては、下記一般式(
Ia)及び一般式(I b)で示される、2位に、及び
/又は2位と6位に特定の置換基を有するベンゼン環又
は無置換のナフタレン環を含有する、特定の置換基をも
つメタクリレート成分と酸性基成分とを含有する樹脂[
A] (以降この低分子量体をとくに樹脂〔A′〕と称
する)であることが好ましい。Furthermore, as the low molecular weight resin [A], the following general formula (
Ia) and general formula (Ib) having a specific substituent containing a benzene ring or an unsubstituted naphthalene ring having a specific substituent at the 2-position and/or the 2-position and the 6-position Resin containing a methacrylate component and an acidic group component [
A] (hereinafter, this low-molecular-weight substance is particularly referred to as resin [A']) is preferable.
一般式(Ia)
Hs
t
一般式(I b)
Hs
〔式(Ia)又は(Ib)中、XI及びX2は互いに独
立に、それぞれ水素原子、炭素数1〜10の炭化水素基
、塩素原子、臭素原子、−COZt又は−CC00L(
zは各々炭素数1〜10の炭化水素基を示す)を表わす
。但し、xlと×2がともに水素原子を表わすことはな
い。General formula (Ia) Hs t General formula (I b) Hs [In formula (Ia) or (Ib), XI and X2 are each independently a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a chlorine atom, Bromine atom, -COZt or -CC00L (
Each z represents a hydrocarbon group having 1 to 10 carbon atoms. However, both xl and x2 do not represent hydrogen atoms.
Ll及びL2はそれぞれ−COO−とベンゼン環を結合
する、単結合又は連結原子数1〜4個の連結基を表わす
。〕
本発明に用いられる樹脂(A)は、ABブロック共重合
体であり、Aブロックは、前記した特定の酸性基から選
ばれる少なくとも1種を含有する少なくとも1つの重合
成分から構成され、Bブロックは、式(1)で示される
メタクリレート成分を少なくとも1種含有する重合体成
分を含有することから成り、且つ重量平均分子量がlX
IO3〜2×104である事を特徴とする。Ll and L2 each represent a single bond or a linking group having 1 to 4 linking atoms that connects -COO- to the benzene ring. ] The resin (A) used in the present invention is an AB block copolymer, where the A block is composed of at least one polymeric component containing at least one kind selected from the above-mentioned specific acidic groups, and the B block comprises a polymer component containing at least one methacrylate component represented by formula (1), and has a weight average molecular weight of lX
It is characterized by IO3 to 2×104.
前述の光導電層の平滑性及び静電特性を良化させるとし
て公知の酸性基含有結着樹脂の中で低分子量体を用いる
ものは、酸性基含有重合成分が重合体主鎖にランダムに
存在する樹脂あるいは、重合体主鎖の片末端にのみ酸性
基を結合して成る樹脂であった。Among the acidic group-containing binder resins known to improve the smoothness and electrostatic properties of the photoconductive layer, those using low molecular weight polymers have acidic group-containing polymeric components randomly present in the polymer main chain. or resins with an acidic group bonded only to one end of the polymer main chain.
これに対し、本発明の結着樹脂で用いられる樹脂〔A)
は、樹脂中に含有される酸性基が重合体主鎖中にランダ
ムに存在するものでも重合体主鎖の末端にのみ結合して
いるものでもなく、重合体主鎖中にブロックで存在する
様に、更に特定化された共重合体である。On the other hand, the resin [A] used in the binder resin of the present invention
The acidic groups contained in the resin are not randomly present in the polymer main chain or bonded only to the ends of the polymer main chain, but are present in blocks in the polymer main chain. This is a more specific copolymer.
本発明に従う共重合体は、重合体の主鎖のいずれか一方
の片側部分に偏在化された酸性基の部分の領域が無機光
導電体の化学量論的な欠陥に充分に吸着するとともに、
重合体主鎖を構成する他のブロック部分は、光導電体の
表面をゆるやかに且つ充分に被覆していると推定される
。その作用機構により、本発明に従う共重合体は無機光
導電体の化学量論的な欠陥部が多少変動しても、充分な
吸着領域をもつ事から常に安定した無機光導電体と樹脂
(A)との相互作用が保たれると推論され、本発明に従
えば従来公知の酸性基含有樹脂に比べて一段と良好に光
導電体のトラップを充分に補償すると共に湿度特性を向
上させる一方、光導電体の分散が充分に行なわれ、凝集
を抑制することを見出した。In the copolymer according to the present invention, the region of acidic groups unevenly distributed on one side of the main chain of the polymer sufficiently adsorbs to the stoichiometric defects of the inorganic photoconductor, and
It is presumed that the other block portions constituting the polymer main chain loosely and sufficiently cover the surface of the photoconductor. Due to its mechanism of action, the copolymer according to the present invention has a sufficient adsorption area even if the stoichiometric defect portion of the inorganic photoconductor changes, so that the inorganic photoconductor and resin (A It is inferred that the interaction with It has been found that the conductor is sufficiently dispersed and agglomeration is suppressed.
そして樹脂〔B〕は、樹脂(A)を用いたことによる電
子写真特性の高性能を全く阻害せずに、樹脂(A)のみ
では不充分な光導電層の機械的強度を充分ならしめると
ともに前記の如き環境が変動したり、低出力のレーザー
光を用いたりした場合でも十分に良好な撮像性を得るこ
とができることが判った。Resin [B] does not impede the high performance of electrophotographic properties due to the use of resin (A), and provides sufficient mechanical strength to the photoconductive layer, which is insufficient with resin (A) alone. It has been found that sufficiently good imaging performance can be obtained even when the environment changes as described above or when a low-output laser beam is used.
これは、無機光導電体の結着樹脂として、樹脂(A)と
樹脂CB)を各々樹脂の重量平均分子量並びに樹脂中の
酸性基の含有量及び結合位置等を特定化することで、無
機光導電体と樹脂との相互作用の強さを適度に変えるこ
とができたことによると推定される。即ち、相互作用の
より強い樹脂(A)が選択的に無機光導電体に適切に吸
着し、一方で樹脂(A)に比べて相互作用の弱い樹脂(
B〕においては、電子写真特性を阻害しない程度に無機
光導電体とゆるやかに相互作用することで、上記した如
←電子写真特性及び機械的強度をともに著しく向上させ
ることができたと推定されまた、樹脂〔A′〕を用いる
と樹脂(A)の場・合よりも、より一層電子写真特性(
特に■1゜、D、R,R、El/10)の向上が達成で
きる。This is achieved by specifying the weight average molecular weight of the resin (A) and resin CB) as the binder resin of the inorganic photoconductor, as well as the content and bonding position of acidic groups in the resin. This is presumed to be due to the ability to appropriately change the strength of the interaction between the conductor and the resin. That is, the resin (A) with stronger interaction is selectively and appropriately adsorbed to the inorganic photoconductor, while the resin (A) with weaker interaction than resin (A) is selectively and appropriately adsorbed to the inorganic photoconductor.
In B], it is presumed that by interacting gently with the inorganic photoconductor to the extent that the electrophotographic properties are not inhibited, both the electrophotographic properties and the mechanical strength can be significantly improved as described above. When resin [A'] is used, the electrophotographic properties (
In particular, improvements in (1°, D, R, R, El/10) can be achieved.
この事の理由は不明であるが、1つの理由として、メタ
クリレートのエステル成分である、オルト位に置換基を
有する平面性のベンゼン環、又はナフタレン環の効果に
より、膜中の酸化亜鉛界面でのこれらポリマー分子鎖の
配列が適切に行なわれることによるものと考えられる。The reason for this is unknown, but one reason is that the effect of the planar benzene ring or naphthalene ring with a substituent at the ortho position, which is the ester component of methacrylate, is due to the effect of the zinc oxide interface in the film. This is thought to be due to proper arrangement of these polymer molecular chains.
また、本発明では光導電層表面の平滑性が滑らかとなる
。一方、電子写真式平版印刷原版として光導電層表面の
平滑性の粗らい感光体を用いると、光導電体である酸化
亜鉛粒子と結着樹脂の分散状態が適切でなく、凝集物が
存在する状態で光導電層が形成されるため、不感脂化処
理液による不感脂化処理をしても非画像部の親水化が均
一に充分に行なわれず、印刷時に印刷インキの付着を引
き起こし、結果として印刷物の非画像部の地汚れが生じ
てしまう。Further, in the present invention, the surface of the photoconductive layer has smoothness. On the other hand, when a photoreceptor with a rough surface of the photoconductive layer is used as an electrophotographic lithographic printing original plate, the dispersion state of the zinc oxide particles that are the photoconductor and the binder resin is not appropriate, resulting in the presence of aggregates. Since a photoconductive layer is formed in the dry state, even if desensitization treatment is performed using a desensitization treatment liquid, the non-image areas cannot be made uniformly and sufficiently hydrophilic, causing printing ink to adhere during printing, resulting in Background stains occur in non-image areas of printed matter.
本発明の樹脂を用いた場合に、光導電体と結着樹脂の吸
着・被覆の相互作用が適切に行なわれ、且つ光導電層の
膜強度が保持されるものである。When the resin of the present invention is used, the adsorption/covering interaction between the photoconductor and the binder resin is properly performed, and the film strength of the photoconductive layer is maintained.
本発明における低分子量体の樹脂(A)のみを結着樹脂
として用いる場合にも、光導電体と結着樹脂が充分に吸
着し、粒子表面を被覆し得るため、光導電層の平滑性及
び静電特性においても良好で、しかも地汚れのない画質
が得られ、更に、CPC感光体あるいは数十枚の印刷枚
数のオフセント原版としては充分な膜強度が保有される
。しかし、ここで本発明の如く樹脂〔B〕を共存させる
ことで、樹脂〔A〕の機能を何ら疎外することなく樹脂
[A]のみではいまだ不充分な光導電層の機械的強度を
より向上させることができた。従って、本発明の感光体
は、環境条件が変動しても優れた静電特性を有し且つ、
膜強度も充分であり、過酷な印刷条件下(例えば、大型
印刷機で印圧が強くなる場合など)でも1万枚以上の印
刷枚数が可能となった。Even when only the low molecular weight resin (A) in the present invention is used as the binder resin, the photoconductor and the binder resin can be sufficiently adsorbed and coat the particle surface, which improves the smoothness of the photoconductive layer. It has good electrostatic properties, provides image quality without background smearing, and has sufficient film strength for use as a CPC photoreceptor or as an offset original plate for printing several tens of sheets. However, by coexisting resin [B] as in the present invention, the mechanical strength of the photoconductive layer, which is still insufficient with resin [A] alone, is further improved without alienating the function of resin [A]. I was able to do it. Therefore, the photoreceptor of the present invention has excellent electrostatic properties even when environmental conditions vary, and
The film strength is also sufficient, making it possible to print more than 10,000 sheets even under harsh printing conditions (for example, when printing pressure is high with a large printing machine).
更に、高分子量の樹脂〔B〕は、上記マクロモノマー(
MB)のうちの少なくとも1種を含み且つ重合体主鎖の
末端に−PO2H1基、 SOJ基、H
の内容を表わす)および環状ジカルボン酸無水物含有基
から選ばれる少なくとも1つの極性基を結合して成るグ
ラフト型共重合体(以降この高分子量体をとくに樹脂[
B′〕とする)であることが好ましい。Furthermore, the high molecular weight resin [B] contains the above macromonomer (
MB), and at least one polar group selected from -PO2H1 group, SOJ group, H2 group) and a cyclic dicarboxylic anhydride-containing group is bonded to the end of the polymer main chain. A graft type copolymer consisting of
B']) is preferable.
特に樹脂〔B〕の一般式(I[Ia)及び/又は(I[
lb)のマクロモノマ−MBにおいて、R61又はR1
が炭化水素基を表わす場合には、重合体主鎖に該極性基
を結合した樹脂であることが特に好ましい。In particular, the general formula (I[Ia) and/or (I[
In the macromonomer MB of lb), R61 or R1
When represents a hydrocarbon group, it is particularly preferable to use a resin in which the polar group is bonded to the main chain of the polymer.
樹脂〔B′〕を用いると、静電特性、特に[1,R。When resin [B'] is used, electrostatic properties, especially [1,R.
R1及びEl/I11がより良好となり、樹脂(A)を
用いたことによる優れた特性を全く妨げず、その効果は
特に高温・高温・低温・低湿等の如き環境変化において
も変動が殆んどなく好ましい。更に、膜強度もより良好
となり、耐剛性が向上する。R1 and El/I11 are better, and the excellent properties achieved by using resin (A) are not affected at all, and the effect hardly changes even under environmental changes such as high temperature, high temperature, low temperature, low humidity, etc. Very preferable. Furthermore, the film strength is also improved, and rigidity resistance is improved.
通常可視光〜赤外光域に光感度を保有させるために用い
る分光増感色素は、光導電体に吸着することでその分光
増感作用が充分機能するものであることから、本発明の
共重合体を含有する結@樹脂は、分光増感色素の吸着を
阻害しないで光導電体と適切に相互作用するものと推定
される。この作用は、近赤外〜赤外光の分光増感用色素
として特に有効なシアニン色素あるいはフタロシアニン
系顔料で特に顕著な効果を示した。The spectral sensitizing dye, which is normally used to maintain photosensitivity in the visible to infrared light range, fully functions its spectral sensitizing action when adsorbed to the photoconductor. It is assumed that the polymer-containing binding resin interacts appropriately with the photoconductor without inhibiting adsorption of the spectral sensitizing dye. This effect was particularly remarkable with cyanine dyes or phthalocyanine pigments, which are particularly effective as dyes for spectral sensitization of near-infrared to infrared light.
ブロック共重合体(A)における、特定の酸性基含有成
分の重合体成分量は、共重合体(A)100重量部当り
好ましくは0.5〜20重量部、より好ましくは3〜1
5重量部の割合で含有される。The amount of the specific acidic group-containing component in the block copolymer (A) is preferably 0.5 to 20 parts by weight, more preferably 3 to 1 part by weight per 100 parts by weight of the copolymer (A).
It is contained in a proportion of 5 parts by weight.
一般式(1)で示されるメタクリレート成分を含有する
ブロック部分(Bブロック)における式(1)で示され
るメタクリレート成分量は、そのブロック全重量中、好
ましくは30重量%〜100重量%、より好ましくは5
0〜100重量%である。共重合体(A)の重量平均分
子量はlXl0”〜2×104、好ましくは3X103
〜1×103である。The amount of the methacrylate component represented by formula (1) in the block portion (B block) containing the methacrylate component represented by general formula (1) is preferably 30% to 100% by weight, more preferably 30% to 100% by weight based on the total weight of the block. is 5
It is 0 to 100% by weight. The weight average molecular weight of the copolymer (A) is 1X10" to 2x104, preferably 3x103
~1×103.
樹脂(A)の分子量が1×103より小さくなると、皮
膜形成能が低下し充分な膜強度が保てず、また分子量が
2×104より大きくなると本発明の樹脂(A)の効果
が少なくなり、従来公知の樹脂と同程度の電子特性にな
ってしまう。When the molecular weight of the resin (A) is smaller than 1 x 103, the film forming ability is reduced and sufficient film strength cannot be maintained, and when the molecular weight is larger than 2 x 104, the effect of the resin (A) of the present invention is reduced. However, the electronic properties are comparable to those of conventionally known resins.
結着樹脂(A)における酸性基含有量が0.5重量%よ
り少ないと、初期電位が低くて充分な画像濃度を得るこ
とができず、該酸性基含有量が20重量%よりも多いと
、分散性が低下し、膜平滑度及び電子写真特性の高温特
性が低下し、更にオフセットマスターとして用いるとき
に地汚れが増大するため、好ましくない。If the acidic group content in the binder resin (A) is less than 0.5% by weight, the initial potential will be low and sufficient image density cannot be obtained; if the acidic group content is more than 20% by weight, This is not preferable because the dispersibility is lowered, the film smoothness and the high-temperature electrophotographic properties are lowered, and furthermore, when used as an offset master, background smudge is increased.
該樹脂(A)のガラス転移点は、−10°C〜100℃
の範囲のものが好ましいが、より好ましくは5℃〜85
°Cである。The glass transition point of the resin (A) is -10°C to 100°C
The temperature range is preferably 5°C to 85°C, more preferably 5°C to 85°C.
It is °C.
本発明のABブロック共重合体(樹脂〔A〕)のAブロ
ックを構成する特定の酸性基を含有する重合成分につい
て、更に具体的に説明する。The polymerization component containing a specific acidic group constituting the A block of the AB block copolymer (resin [A]) of the present invention will be explained in more detail.
酸性基としては、−POJz基、−COOH基、−5O
,H基、は−OR’基(R’は炭化水素基)を示す)及
び環状酸無水物含有基が挙げられ、好ましくは、−C0
OH基、−5O3H基、フェノール性OH基、及び基(
R’は炭化水素基を表わす)を表わし、R及びR′は好
ましくは炭素数1〜22の脂肪族基(例えば、メチル基
、エチル基、プロピル基、ブチル基、ヘキシル基、オク
チル基、デシル基、ドデシル基、オクタデシル基、2−
クロロエチル基、2−メトキシエチル基、3−エトキシ
プロピル基、アリル基、クロトニル基、ブテニル基、シ
クロヘキシル基、ベンジル基、フェネチル基、3−フェ
ニルプロピル基、メチルヘンシル基、クロロベンジル基
、フロロヘンシル基、メトキシヘンシル基等)、又は置
換されてもよいアリール基(例えば、フェニル基、トリ
ル基、エチルフェニル基、プロピルフェニル基、クロロ
フェニル基、フロロフェニル基、ブロモフェニル基、ク
ロロ−メチル−フェニル基、′ジクロロフェニル基、メ
トキシフェニル基、シアノフェニル基、アセトアミドフ
ェニル基、アセチルフェニル基、ブトキシフェニル基等
)等を表わす。As acidic groups, -POJz group, -COOH group, -5O
, H group, -OR' group (R' is a hydrocarbon group) and a cyclic acid anhydride-containing group, preferably -C0
OH group, -5O3H group, phenolic OH group, and group (
R' represents a hydrocarbon group), and R and R' preferably represent an aliphatic group having 1 to 22 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group). group, dodecyl group, octadecyl group, 2-
Chloroethyl group, 2-methoxyethyl group, 3-ethoxypropyl group, allyl group, crotonyl group, butenyl group, cyclohexyl group, benzyl group, phenethyl group, 3-phenylpropyl group, methylhensyl group, chlorobenzyl group, fluorohensyl group, methoxy Hensyl group, etc.), or an optionally substituted aryl group (e.g., phenyl group, tolyl group, ethylphenyl group, propylphenyl group, chlorophenyl group, fluorophenyl group, bromophenyl group, chloro-methyl-phenyl group, (dichlorophenyl group, methoxyphenyl group, cyanophenyl group, acetamidophenyl group, acetylphenyl group, butoxyphenyl group, etc.).
フェノール性OH基としては、ヒドロキシフェノール又
はヒドロキシフェニル基を置換基として含有するメタク
リル酸エステルもしくはアミド類を例として挙げること
ができる。Examples of the phenolic OH group include methacrylic acid esters or amides containing hydroxyphenol or hydroxyphenyl as a substituent.
また、環状酸無水物含有基とは、少なくとも1つの環状
酸無水物を含有する基であり、含有される環状酸無水物
としては、脂肪族ジカルボン酸無水物、芳香族ジカルボ
ン酸無水物が挙げられる。In addition, the cyclic acid anhydride-containing group is a group containing at least one cyclic acid anhydride, and examples of the cyclic acid anhydride include aliphatic dicarboxylic acid anhydride and aromatic dicarboxylic acid anhydride. It will be done.
脂肪族ジカルボン酸無水物の例としては、コハク酸無水
物環、グルタコン酸無水物環、マレイン酸無水物環、シ
クロペンタン−1,2−ジカルボン酸無水物環、シクロ
ヘキサン−1,2−ジカルボン酸無水物環、シクロヘキ
セン−1,2−ジカルボン酸無水物環、2,3−ビシク
ロC2,2,2)オクタンジカルボン酸無水物環等が挙
げられ、これらの環は、例えは塩素原子、臭素原子等の
ハロゲン原子、メチル基、エチル基、ブチル基、ヘキシ
ル基等のアルキル基等が置換されていてもよい。Examples of aliphatic dicarboxylic anhydrides include succinic anhydride ring, glutaconic anhydride ring, maleic anhydride ring, cyclopentane-1,2-dicarboxylic anhydride ring, and cyclohexane-1,2-dicarboxylic acid anhydride ring. Examples include anhydride ring, cyclohexene-1,2-dicarboxylic anhydride ring, 2,3-bicycloC2,2,2)octanedicarboxylic anhydride ring, and these rings include, for example, chlorine atom, bromine atom halogen atoms such as, alkyl groups such as methyl group, ethyl group, butyl group, hexyl group, etc. may be substituted.
又、芳香族ジカルボン酸無水物の例としては、フタル酸
無水物環、ナフタレン−ジカルボン酸無水物環、ピリジ
ン−ジカルボン酸無水物環、チオフェン−ジカルボン酸
無水物環等が挙げられ、これらの環は、例えば、塩素原
子、臭素原子等のハロゲン原子、メチル基、エチル基、
プロピル基、ブチル基等のアルキル基、ヒドロキシル基
、シアノ基、ニトロ基、アルコキシカルボニル基(アル
コキシ基としては、例えば、メトキシ基、エトキシ基等
)等が置換されていてもよい。Examples of aromatic dicarboxylic anhydrides include phthalic anhydride rings, naphthalene-dicarboxylic anhydride rings, pyridine-dicarboxylic anhydride rings, thiophene-dicarboxylic anhydride rings, etc. For example, halogen atoms such as chlorine atom and bromine atom, methyl group, ethyl group,
It may be substituted with an alkyl group such as a propyl group or a butyl group, a hydroxyl group, a cyano group, a nitro group, an alkoxycarbonyl group (for example, a methoxy group, an ethoxy group, etc.).
以上の如き「特定の酸性基を含有する重合体成分」とし
ては、例えば、本発明の樹脂(A)においてBブロック
成分を構成する重合体成分、即ち一般式(1)で示され
るメタクリレート成分等の如き相当するビニル系化合物
と共重合する、該酸性基を含有するビニル系化合物であ
ればいずれでも用いることができる。Examples of the above-mentioned "polymer component containing a specific acidic group" include the polymer component constituting the B block component in the resin (A) of the present invention, that is, the methacrylate component represented by general formula (1), etc. Any vinyl compound containing the acidic group can be used as long as it copolymerizes with a corresponding vinyl compound such as.
例えば、高分子データ「高分子データ・ハンドブック〔
基11編〕」培風館(1986刊)等に記載されている
ビニル系化合物を用いることができ、具体的には、アク
リル酸、α及び/又はβ置換アクリル酸(例えばα−ア
セトキシ体、α−アセトキシメチル体、α−(2−アミ
ノ)メチル体、αクロロ体、α−ブロモ体、α−フロロ
体、α−トリブチルシリル体、α−シアノ体、β−クロ
ロ体、β−ブロモ体、α−クロロ−β−メトキシ体、α
。For example, see the Polymer Data Handbook [Polymer Data Handbook]
Vinyl compounds described in Baifukan (1986), etc., can be used. Specifically, vinyl compounds described in acrylic acid, α- and/or β-substituted acrylic acid (e.g. α-acetoxy compound, α- Acetoxymethyl form, α-(2-amino)methyl form, α-chloro form, α-bromo form, α-fluoro form, α-tributylsilyl form, α-cyano form, β-chloro form, β-bromo form, α -Chloro-β-methoxy form, α
.
β−ジクロロ体等)、メタクリル酸、イタコン酸、イタ
コン酸半エステル類、イタコン酸半アミド類、クロトン
酸、2−アルケニルカルボン酸If(例えば2−ペンテ
ン酸、2−メチル−2−ヘキセン酸、2−オクテン酸、
4−メチル−2−ヘキセン酸、4−エチル−2−オクテ
ン酸等)、マレイン酸、マレイン酸半エステル類、マレ
イン酸半アミド類、ビニルベンゼンカルボン酸、ビニル
ベンゼンスルホン酸、ビニルスルホン酸、ビニルホスホ
酸、ジカルボン酸類のビニル基又はアリル基の半エステ
ル誘導体、及びこれらのカルボン酸又はスルホン酸のエ
ステル誘導体、アミド誘導体の置換基中に該酸性基を含
有する化合物が挙げられる。β-dichloro form, etc.), methacrylic acid, itaconic acid, itaconic acid half esters, itaconic acid half amides, crotonic acid, 2-alkenylcarboxylic acids If (e.g. 2-pentenoic acid, 2-methyl-2-hexenoic acid, 2-octenoic acid,
4-methyl-2-hexenoic acid, 4-ethyl-2-octenoic acid, etc.), maleic acid, maleic acid half esters, maleic acid half amides, vinylbenzenecarboxylic acid, vinylbenzenesulfonic acid, vinylsulfonic acid, vinylphosphoric acid Examples include half-ester derivatives of vinyl or allyl groups of acids and dicarboxylic acids, and ester derivatives and amide derivatives of these carboxylic acids or sulfonic acids, and compounds containing the acidic group in a substituent thereof.
これらの化合物の具体例として以下のものを挙げること
ができる。但し、以下の各側において、aは−H,−C
)13、−CI、 −Br 、−CN−1−C)IZC
OOCH3又は−CH,C0OHを示し、bは一■又は
−CH,を示し、nは2〜18の整数を示し、mは1〜
12の整数を示し、lは1〜4の整数を示す。Specific examples of these compounds include the following. However, on each side below, a is -H, -C
)13, -CI, -Br, -CN-1-C) IZC
represents OOCH3 or -CH,C0OH, b represents 1 or -CH, n represents an integer of 2 to 18, m represents 1 to
It represents an integer of 12, and l represents an integer of 1 to 4.
(a−1)
OOH
ool
(a−3)
(a−4)
CH2=C
Coo(CHz)ncOOII
(a−5)
OH2
C0NH((Jlz)ncOOH
(a−6)
テ
C00(CHz)noco(CHt)scOOH(a−
7)
〒
(a−8)
〒
CONH(CHz)nOcO(CHz)scOOH(a
−9)
r
(a
C0NIC0NH(CHz) ncOOH(a−11)
〒
0NHCH
C1,C00H
(a
(a
COO(CHz)mNHcO(CHzCoo(CHz)
は同じでも異なってもよい)
(a
CHz=CHCHzOCO(C)It)IIcOOH(
a
C1h=CH+CH−rCOOH
(a
C00CHzCHCHz00C(CHz)■C00H(
a
CH2=c
Coo(CHz)nocOH
H
0OH
(a
(a−20)
(a−21)
(a−22)
(a−23)
(a−24)
(a−25)
H
H
(a−26)
(a−27)
(a−29)
H
(a−30)
(a−31)
(a−35)
C1,=C
C0N(CHzCHzCOOll)z
(a−37)
C00(CHz)1cON(CHzCHiCOOH)z
(a−38)
SO,H
(a−39)
(a−40)
OOH
(a−45)
上記の如き特定の酸性基を含有する重合成分は該Aブロ
ック中に2種以上含有されていてもよく、その場合にお
ける該2種以上の酸性基含有成分は該Aブロック中にお
いてランダム共重合又はブロック共重合のいずれの態様
で含有されていてもよい。(a-1) OOH ool (a-3) (a-4) CH2=C Coo(CHz)ncOOII (a-5) OH2 C0NH((Jlz)ncOOH (a-6) TeC00(CHz)noco(CHt )scOOH(a-
7) 〒 (a-8) 〒 CONH(CHz)nOcO(CHz)scOOH(a
-9) r (a C0NIC0NH(CHz) ncOOH(a-11) 0NHCH C1,C00H (a (a COO(CHz)mNHcO(CHzCoo(CHz)
may be the same or different) (a CHz=CHCHzOCO(C)It)IIcOOH(
a C1h=CH+CH-rCOOH (a C00CHzCHCHz00C(CHz)■C00H(
a CH2=c Coo(CHz)nocOH H 0OH (a (a-20) (a-21) (a-22) (a-23) (a-24) (a-25) H H (a-26) (a-27) (a-29) H (a-30) (a-31) (a-35) C1,=C C0N(CHzCHzCOOll)z (a-37) C00(CHz)1cON(CHzCHiCOOH)z
(a-38) SO,H (a-39) (a-40) OOH (a-45) Even if two or more types of polymerization components containing the above-mentioned specific acidic groups are contained in the A block, In that case, the two or more acidic group-containing components may be contained in the A block in either random copolymerization or block copolymerization.
また、該酸性基を含有しない成分がAブロック中に含ま
れていてもよく、該成分の例としては一般式(1)又は
後記一般式(I[)で示される成分等があげられる。か
かる酸性基非含有成分の含有量はAブロック中好ましく
は0〜50重量%、より好ましくは0〜20重量%であ
り、最も好ましくは、かかる酸性基非含有成分はAブロ
ック中に含まれない。Further, a component not containing the acidic group may be included in the A block, and examples of the component include a component represented by the general formula (1) or the general formula (I[) described below. The content of such acidic group-free components is preferably 0 to 50% by weight, more preferably 0 to 20% by weight in A block, and most preferably, such acidic group-free components are not included in A block. .
次にABブロック共重合体(’A)において、Bブロッ
ク成分を構成する重合成分について詳しく説明する。Next, the polymer components constituting the B block component in the AB block copolymer ('A) will be explained in detail.
Bブロック成分は、少なくとも一般式(1)で示される
メタクリレート成分を含有し、該式(1)のメタクリレ
ート成分は好ましくはBブロック成分中、30〜100
重量%、より好ましくは50〜100重量%含有される
。The B block component contains at least a methacrylate component represented by the general formula (1), and the methacrylate component of the formula (1) preferably accounts for 30 to 100% of the B block component.
It is contained in an amount of 50 to 100% by weight, preferably 50 to 100% by weight.
一般式(1)で示される繰り返し単位において、R1の
炭化水素基は置換されていてもよい。In the repeating unit represented by general formula (1), the hydrocarbon group of R1 may be substituted.
R1は好ましくは炭素数1〜18の置換されていてもよ
い炭化水素基を表わす。置換基としては上記該ABブロ
ック共重合体のAブロックを構成する重合成分に含有さ
れる前記酸性基以外の置換基であればいずれでもよく、
例えば、ハロゲン原子(例えば、フッ素原子、塩素原子
、臭素原子等)−〇−Z、、−Coo−Zl、−0CO
−Z、、(Z、は、炭素数1〜22のアルキル基を表わ
し、例えばメチル基、エチル基、プロピル基、ブチル基
、ヘキシル基、オクチル基、デシル基、ドデシル基、ヘ
キサデシル基、オクタデシル基等である)等の置換基が
挙げられる。好ましい炭化水素基としては、炭素数1〜
18の置換されてもよいアルキル基(例えば、メチル基
、エチル基、プロピル基、ブチル基、ヘプチル基、ヘキ
シル基、オクチル基、デシル基、ドデシル基、ヘキサデ
シル基、オクタデシル基、2クロロエチル基、2−ブロ
モエチル基、2−シアノエチル基、2−メトキシカルボ
ニルエチル基、2−メトキシエチル基、3−ブロモプロ
ピル基等)、炭素数4〜18の置換されてもよいアルケ
ニル基(例えば、2−メチル−1−プロペニル基、2−
ブテニル基、2−ペンテニル基、3−メチル2−ペンテ
ニル基、l−ペンテニル基、1−へキセニル基、2−へ
キセニル基、4−メチル−2−へキセニル基等)、炭素
数7〜12の置換されてもよいアラルキル基(例えば、
ベンジル基、フェネチル基、3−フェニルプロピル基、
ナフチルメチル基、2−ナフチルエチル基、クロロベン
ジル基、ブロモベンジル基、メチルベンジル基、エチル
ベンジル基、メトキシベンジル基、ジメチルベンジル基
、ジメトキシベンジル基等)1、炭素数5〜Bの置換さ
れてもよい脂環式基(例えば、シクロヘキシル基、2−
シクロヘキシルエチル基、2−シクロペンチルエチル基
等)又は炭素数6〜12の置換されてもよい芳香族基(
例えば、フェニル基、ナフチル基、トリル基、キシリル
基、プロピルフェニル基、ブチルフェニル基、オクチル
フェニル基、ドデシルフェニル基、メトキシフェニル基
、エトキシフェニル基、ブトキシフェニル基、デシルオ
キシフェニル基、クロロフェニル基、ジクロロフェニル
基、ブロモフェニル基、シアノフェニル基、アセチルフ
ェニル基、メトキシカルボニルフェニル基、エトキシカ
ルボニルフェニル基、ブトキシカルボニルフェニル基、
アセトアミドフェニル基、プロピオアミドフェニル基、
ドブシロイルアミドフェニル基等)等があげられる。R1 preferably represents an optionally substituted hydrocarbon group having 1 to 18 carbon atoms. The substituent may be any substituent other than the acidic group contained in the polymerization component constituting the A block of the AB block copolymer,
For example, halogen atoms (e.g. fluorine atom, chlorine atom, bromine atom, etc.) -〇-Z, , -Coo-Zl, -0CO
-Z, , (Z represents an alkyl group having 1 to 22 carbon atoms, such as methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group, dodecyl group, hexadecyl group, octadecyl group etc.). A preferable hydrocarbon group has 1 to 1 carbon atoms.
18 optionally substituted alkyl groups (for example, methyl group, ethyl group, propyl group, butyl group, heptyl group, hexyl group, octyl group, decyl group, dodecyl group, hexadecyl group, octadecyl group, 2chloroethyl group, 2 -bromoethyl group, 2-cyanoethyl group, 2-methoxycarbonylethyl group, 2-methoxyethyl group, 3-bromopropyl group, etc.), optionally substituted alkenyl groups having 4 to 18 carbon atoms (e.g., 2-methyl- 1-propenyl group, 2-
butenyl group, 2-pentenyl group, 3-methyl 2-pentenyl group, l-pentenyl group, 1-hexenyl group, 2-hexenyl group, 4-methyl-2-hexenyl group, etc.), carbon number 7 to 12 an optionally substituted aralkyl group (for example,
benzyl group, phenethyl group, 3-phenylpropyl group,
Naphthylmethyl group, 2-naphthylethyl group, chlorobenzyl group, bromobenzyl group, methylbenzyl group, ethylbenzyl group, methoxybenzyl group, dimethylbenzyl group, dimethoxybenzyl group, etc.) 1, substituted with 5 to B carbon atoms alicyclic groups (e.g. cyclohexyl group, 2-
cyclohexylethyl group, 2-cyclopentylethyl group, etc.) or an optionally substituted aromatic group having 6 to 12 carbon atoms (
For example, phenyl group, naphthyl group, tolyl group, xylyl group, propylphenyl group, butylphenyl group, octylphenyl group, dodecylphenyl group, methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, decyloxyphenyl group, chlorophenyl group, Dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, butoxycarbonylphenyl group,
acetamidophenyl group, propioamidophenyl group,
dobcyroylamide phenyl group, etc.).
R,の炭化水素基において、R1が脂肪族基の場合には
好ましくは、炭素数1〜5の炭化水素基を式(1)で表
わされる成分中の60重量%以上含有することが好まし
い。In the hydrocarbon group R, when R1 is an aliphatic group, it is preferable that the component represented by formula (1) contains 60% by weight or more of a hydrocarbon group having 1 to 5 carbon atoms.
更に、該樹脂(A)において、Bブロック成分を構成す
る一般式(1)で示される繰り返し単位の一部又は全部
が下記一般式(Ia)及び/又は(I b)で示される
繰り返し単位であることが好ましい、従ってBブロック
成分中下記−1式(1a)及び(I b)から選択され
る少な(とも1つの繰り返し単位が該他のブロック中3
0重量%以上、特に50〜100重量%含有されること
が好ましい。Furthermore, in the resin (A), some or all of the repeating units represented by the general formula (1) constituting the B block component are repeating units represented by the following general formula (Ia) and/or (Ib). It is preferred that there be at least one repeating unit selected from the following -1 formulas (1a) and (Ib) in the B block component, and therefore one repeating unit in the other block.
It is preferably contained in an amount of 0% by weight or more, particularly 50 to 100% by weight.
−1式(Ia)
CH3
λニ
一般式(I b)
l13
〔式(Ia)又は(Ib)中、X、及びX、は互イニ独
立に、それぞれ水素原子、炭素数1〜10の炭化水素基
、塩素原子、臭素原子−COZz又は−cooz、z(
2gは各々炭素数1〜10の炭化水素基を示す)を表わ
す、但し、X、とX2がともに水素原子を表わすことは
ない。-1 Formula (Ia) CH3 λ General Formula (I b) l13 [In Formula (Ia) or (Ib), X and X each independently represent a hydrogen atom or a hydrocarbon having 1 to 10 carbon atoms; group, chlorine atom, bromine atom -COZz or -cooz, z(
2g each represents a hydrocarbon group having 1 to 10 carbon atoms), provided that X and X2 do not both represent a hydrogen atom.
Ll及びL2はそれぞれ−COO−とベンゼン環を結合
する、単結合又は連結原子数1〜4個の連結基を表わす
。〕
該式(I a)及び/又は(I b)で示される繰り返
し単位を酸性基を含有しないBブロック中に含有させる
ことにより、より一層電子写真特性(特ニv1o 、D
、R,R、El/10 )の向上が達成できる。Ll and L2 each represent a single bond or a linking group having 1 to 4 linking atoms that connects -COO- to the benzene ring. ] By incorporating the repeating unit represented by the formula (I a) and/or (I b) into the B block that does not contain an acidic group, electrophotographic properties (specially V1O, D
, R, R, El/10 ) can be achieved.
この事の理由は不明であるが、1つの理由として、メタ
クリレートのエステル成分である、オルト位に置換基を
有する平面性のベンゼン環、又はナフタレン環の効果に
より、膜中の酸化亜鉛界面でのこれらポリマー分子鎖の
配列が適切に行なわれることによるものと考えられる。The reason for this is unknown, but one reason is that the effect of the planar benzene ring or naphthalene ring with a substituent at the ortho position, which is the ester component of methacrylate, is due to the effect of the zinc oxide interface in the film. This is thought to be due to proper arrangement of these polymer molecular chains.
式(Ia)において、好ましい×1及びxiとしてそれ
ぞれ、水素原子、塩素原子及び臭素原子のほかに、好ま
しい炭化水素基として、炭素数1〜4のアルキル基(例
えばメチル基、エチル基、プロピル基、ブチル基等)、
炭素数7〜9のアラルキル基(例えばベンジル基、フェ
ネチル基、3−フェニルプロピル基、クロロヘンシル基
、ジクロロベンジル基、ブロモベンジル基、メチルベン
ジル基、メトキシベンジル基、クロロ−メチル−ベンジ
ル基等)及びアリール基(例えばフェニル基、トリル基
、シリル基、ブロモフェニル基、メトキシフェニル基、
クロロフェニル基、ジクロロフェニル基等)、並びに−
COZz及び−COOh (好ましいZ2としては上
記好ましい炭化水素基として記載したものを挙げること
ができる)を挙げることができる。但し、xlとXtが
ともに水素原子を表わすことはない。In formula (Ia), preferred x1 and xi are hydrogen, chlorine, and bromine, respectively, and preferred hydrocarbon groups include alkyl groups having 1 to 4 carbon atoms (e.g., methyl, ethyl, propyl). , butyl group, etc.),
Aralkyl groups having 7 to 9 carbon atoms (e.g. benzyl group, phenethyl group, 3-phenylpropyl group, chlorohensyl group, dichlorobenzyl group, bromobenzyl group, methylbenzyl group, methoxybenzyl group, chloro-methyl-benzyl group, etc.); Aryl groups (e.g. phenyl group, tolyl group, silyl group, bromophenyl group, methoxyphenyl group,
chlorophenyl group, dichlorophenyl group, etc.), and -
COZz and -COOh (preferred examples of Z2 include those described above as preferred hydrocarbon groups). However, both xl and Xt do not represent hydrogen atoms.
式(I a)において、Llは−COO−とベンゼン環
を結合する、直接結合又は 千0H!+−rr−(nl
は1〜3の整数を表わす) 、CHgCHg0CO−1
(C)120)、□(n□は1又は2の整数を表わす)
、CHgCHzO等の如き連結原子数1〜4個の連結
基を表わす。In formula (Ia), Ll is a direct bond or 100H! that connects -COO- and the benzene ring. +-rr-(nl
represents an integer from 1 to 3), CHgCHg0CO-1
(C) 120), □ (n□ represents an integer of 1 or 2)
, CHgCHzO, etc. represents a linking group having 1 to 4 linking atoms.
式(lb)におけるし、はし、と同一の内容を表わす。They represent the same content as ``shi'' and ``shi'' in formula (lb).
本発明の樹脂(A)のBブロックにおいて好ましく用い
られる、式(Ia)又は(Ib)で示される繰り返し単
位の具体例を以下に挙げる。Specific examples of the repeating unit represented by formula (Ia) or (Ib) that are preferably used in the B block of the resin (A) of the present invention are listed below.
しかし、 本 発明の範囲は、 これらに限定されるものではない。but, Book The scope of the invention is It is not limited to these.
(b CH3 (b CH3 (b CH。(b CH3 (b CH3 (b CH.
(b−4) CH。(b-4) CH.
し4Hq (b −5) (b (b −8) CH3 CH。Shi4Hq (b-5) (b (b-8) CH3 CH.
(b し! (b (b (b−15) CH。(b death! (b (b (b-15) CH.
l3 CB。l3 C.B.
(b (b (b (b CH3 CI(。(b (b (b (b CH3 CI(.
CI CH3 CH1 (b (b −22) (b −23) <b −24) CH3 CH8 r しl CH3 (b −26) (b −28) CH3 CH3 lr しH3 (b −29) CH。C.I. CH3 CH1 (b (b-22) (b-23) <b-24) CH3 CH8 r Shil CH3 (b-26) (b-28) CH3 CH3 lr ShiH3 (b-29) CH.
(b −30) CH。(b-30) CH.
一+CHt C→− (b−31) CH3 (b −32) Hs (b CH3 (b −34) CH3 (b CH。1+CHt C→- (b-31) CH3 (b-32) Hs (b CH3 (b-34) CH3 (b CH.
(b −36) CH。(b-36) CH.
(b−37) (b (b (b −40) H3 CI。(b-37) (b (b (b-40) H3 C.I.
H3
前記の特定の酸性基を含有する重合成分から成るAブロ
ックとは別に構成される該Bブロックにおいて、前記式
(I)(好ましくは(Ia)又は(I b) 1で示さ
れる繰り返し単位は2種以上含有されていてもよく、更
にこれら以外の他の重合成分を含有していてもよい。酸
性基を含有しないBブロックにおいて2種以上の重合成
分が含有される場合には、該ABブロック共重合成分は
該Bブロック中においてランダム共重合又はブロック共
重合のいずれの態様で含有されていてもよいが、ランダ
ムに含有されることが好ましい。H3 In the B block constituted separately from the A block consisting of the polymerization component containing the specific acidic group, the repeating unit represented by the formula (I) (preferably (Ia) or (Ib) 1) is Two or more types of polymerization components may be contained, and may further contain other polymerization components other than these.When two or more types of polymerization components are contained in the B block that does not contain an acidic group, the AB The block copolymerization component may be contained in the B block in either random copolymerization or block copolymerization, but it is preferably contained randomly.
前記した式(1)、(Ia)及び/又は(Ib)で示さ
れる繰り返し単位から選ばれた重合成分とともにBブロ
ック中に含有され得る他の重合成分は、これらと共重合
する成分であればいずれでもよい。Other polymeric components that can be contained in the B block together with the polymeric components selected from the repeating units represented by the above formulas (1), (Ia) and/or (Ib) are components that copolymerize with these components. Either is fine.
例えば下記−1式(II)で示される繰り返し単位が挙
げられる。For example, a repeating unit represented by the following formula-1 (II) can be mentioned.
一般式(n) a、 aZ −←CH−C→− −R2 〔式(It)中、Tは−COO −OCO−。General formula (n) a, aZ −←CH−C→− -R2 [In formula (It), T is -COO -OCO-.
+CHr−)−、+OC0
”++ 112 は、各々1〜2の整数を表わし、R
1は、式(1)中のR1と同一の内容を表わす、 Rf
fiは式(+)中のR,と同一の内容を表わす。+CHr-)-, +OC0''++112 each represent an integer from 1 to 2, and R
1 represents the same content as R1 in formula (1), Rf
fi represents the same content as R in formula (+).
a、及びR2は、互いに同じでも異なってもよく、各々
水素原子、ハロゲン原子、シアノ基、炭素数1〜8の炭
化水素基、−Coo−Z3又は炭素数1〜8の炭化水素
基を介したー〇〇〇−Zs (Zsは炭素数1〜18の
炭化水素基を表わす)を表わす、〕より好ましくは、a
l+ axは、互いに同じでも異なってもよ(、水素原
子、炭素数1〜3のアルキル基(例えば、メチル基、エ
チル基、プロピル基等)、Coo−Z3又は−CHzC
OO−Zs (Z3はより好ましくは炭素数1〜18の
アルキル基又はアルケニル基を表わし、例えば、メチル
基、エチル基、プロピル基、ブチル基、ヘキシル基、オ
クチル基、デシル基、ドテシル基、トリデシル基、テト
ラデシル基、ヘキサデシル基、オクタデシル基、ペンテ
ニル基、ヘキセニル基、オクテニル基、デセニル基等が
挙げられ、これらアルキル基、アルケニル基は前記R1
で示したと同様の置換基を有していてもよい)を表わす
。a and R2 may be the same or different, and each represents a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group having 1 to 8 carbon atoms, -Coo-Z3, or a hydrocarbon group having 1 to 8 carbon atoms. More preferably a
l+ ax may be the same or different from each other (, hydrogen atom, alkyl group having 1 to 3 carbon atoms (e.g., methyl group, ethyl group, propyl group, etc.), Coo-Z3 or -CHzC
OO-Zs (Z3 more preferably represents an alkyl group or alkenyl group having 1 to 18 carbon atoms, such as methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group, dotecyl group, tridecyl group) group, tetradecyl group, hexadecyl group, octadecyl group, pentenyl group, hexenyl group, octenyl group, decenyl group, etc., and these alkyl groups and alkenyl groups are
may have the same substituents as shown in ).
これら以外の繰り返し単位を構成する単量体として、更
にスチレンI!(例えばスチレン、ビニルトルエン、ク
ロロスチレン、ブロモスチレン、ジクロロスチレン、ビ
ニルフェノール、メトキシスチレン、クロロメチルスチ
レン、メトキシメチルスチレン、アセトキシスチレン、
メトキシカルボニルスチレン、メチルカルバモイルスチ
レン、等)、アクリロニトリル、メタクリロニトリル、
アクロレイン、メタクロレイン、ビニル基含有複素環化
合物(例えばN−ビニルピロリドン、ビニルピリジン、
ビニルイミダゾール、ビニルチオフェン等)アクリロア
ミド、メタクリロアミド等が例として挙げられるが、こ
れらの他の共重合成分はこれらに限定されるものではな
い。As monomers constituting repeating units other than these, styrene I! (e.g. styrene, vinyltoluene, chlorostyrene, bromostyrene, dichlorostyrene, vinylphenol, methoxystyrene, chloromethylstyrene, methoxymethylstyrene, acetoxystyrene,
methoxycarbonylstyrene, methylcarbamoylstyrene, etc.), acrylonitrile, methacrylonitrile,
Acrolein, methacrolein, vinyl group-containing heterocyclic compounds (e.g. N-vinylpyrrolidone, vinylpyridine,
Examples include vinylimidazole, vinylthiophene, etc.) acrylamide, methacrylamide, etc., but other copolymerizable components are not limited thereto.
本発明のABブロック共重合体(A)は、従来公知の重
合反応法によって製造することができる。The AB block copolymer (A) of the present invention can be produced by a conventionally known polymerization reaction method.
具体的には、該特定の酸性基を含有する重合体成分に相
当する単量体において該酸性基を予め保護した官能基と
しておき、有機金属化合物(例えばアルキルリチウム類
、リチウムジイソプロピルアミド、アルキルマグネシウ
ムハライド類等)あるいはヨウ化水素/ヨウ素系等によ
るイオン重合反応、ポルフィリン金属錯体を触媒とする
光重合反応あるいはグループ移動重合反応等の公知のい
わゆるリビング重合反応でABブロック共重合体を合成
した後、酸性基を保護した官能基を加水分解反応、加水
素分解反応、酸化分解反応あるいは、光分解反応等によ
って脱保護反応を行ない、酸性基を形成させる方法が挙
げられる。その1つの例を下記の反応スキーム(1)に
示した。Specifically, in the monomer corresponding to the polymer component containing the specific acidic group, the acidic group is previously protected as a functional group, and an organometallic compound (for example, alkyl lithiums, lithium diisopropylamide, alkyl magnesium After synthesizing an AB block copolymer using known so-called living polymerization reactions such as halides, etc.) or ionic polymerization reactions using hydrogen iodide/iodine systems, photopolymerization reactions using porphyrin metal complexes as catalysts, or group transfer polymerization reactions. Examples include a method in which a functional group with a protected acidic group is deprotected by a hydrolysis reaction, a hydrogenolysis reaction, an oxidative decomposition reaction, a photolysis reaction, etc. to form an acidic group. One example is shown in reaction scheme (1) below.
例えば、P、 Lutz+ P、 Masson et
al、 Polym、 Bull。For example, P, Lutz+ P, Masson et
al, Polym, Bull.
12、、79 (1984)、 B、 C,^nder
son、 G、 D、^ndrewsetal、 M
acromolecules、 14+ 1601
(1981)、 K。12,,79 (1984), B, C,^nder
son, G, D, ^ndrewsetal, M
acromolecules, 14+ 1601
(1981), K.
Hatada、 K、 Ute、 etal、 P
olym、 J、 17.977 (1985)lfi
、 1037 (1986)、 右手浩−1畑田耕−
1高分子加工、共、 366 (1987)、東村敏延
、沢本光男、高分子論文集、川、 189 (1989
)、M、 Kuroki、 ?。Hatada, K., Ute, etal, P.
olym, J, 17.977 (1985) lfi
, 1037 (1986), Hiroshi Miguchi-1 Ko Hatada-
1 Polymer Processing, Co., 366 (1987), Toshinobu Higashimura, Mitsuo Sawamoto, Collection of Polymer Papers, Kawa, 189 (1989)
), M, Kuroki, ? .
^ida、 J、 As、 Chew、 So
c、 1flf% 4737 (1987)、
相田卓三、井上祥平、有機合成化学、村、 300 (
1985)、D、 Y、 Sogah、 L R,He
rtler etal、 Macromolecule
s。^ida, J, As, Chew, So
c, 1flf% 4737 (1987),
Takuzo Aida, Shohei Inoue, Organic Synthetic Chemistry, Mura, 300 (
1985), D, Y, Sogah, L R, He
rtler etal, Macromolecule
s.
、fi、 1473 (1987)等に記載の合成方法
に従って容易に合成することができる。, fi, 1473 (1987).
更に、ABブロック共重合体(A)は、酸性基を保護し
ないままの単量体を用い、ジシオカーバメント化合物を
開始剤とした光イニファーター重合法によって合成する
こともできる0例えば、大津随行、高分子、釘、 24
B (1988)、 檜森俊−大津隆一、Polym、
Rep、 Jap、、iL、 350B (1988
)、特開昭64−111号、特開昭64−26619号
等に記載の合成方法に従って合成することができる。Furthermore, the AB block copolymer (A) can also be synthesized by a photoiniferter polymerization method using a monomer with its acidic group left unprotected and a dithiocarbament compound as an initiator. accompanying, polymer, nail, 24
B (1988), Shun Himori-Ryuichi Otsu, Polym.
Rep, Jap, iL, 350B (1988
), JP-A-64-111, JP-A-64-26619, and the like.
又、本発明の特定の酸性基を保護する保護基及びその保
護基の脱離(脱保護反応)については、従来公知の知見
を利用して容易に行なうことができる。例えば前記した
引用文献にも種々記載されており、更には、岩倉義勇、
栗田恵輔、「反応性高分子」輛講談社刊(1977年)
、T、 W、 GreenerProtective
Groups in Organic 5ynthe
sis」John Wiley & 5ons (
1981年)、 J、 F、 W、 McOmie’P
rotective Groups in Organ
ic ChemistryJPlenum Pres
s+ (1973年)等の総説に詳細に記載されている
方法を適宜選択して行なうことができる。Further, the protecting group that protects the specific acidic group of the present invention and the removal (deprotection reaction) of the protecting group can be easily carried out using conventionally known knowledge. For example, it is variously described in the cited documents mentioned above, and furthermore, Yoshiyu Iwakura,
Keisuke Kurita, “Reactive Polymer” Published by Kodansha (1977)
, T.W., GreenerProtective
Groups in Organic 5ynthe
sis” John Wiley & 5ons (
(1981), J., F., W., McOmie'P.
Protective Groups in Organ
ic ChemistryJPlenum Pres
The method described in detail in reviews such as s+ (1973) can be appropriately selected and carried out.
樹脂(A)において、ABブロック共重合体中における
該特定の酸性基を含有する重合体成分の存在量は、樹脂
(A)100重量部中、0.5〜20重置%で、好まし
くは3〜15重量%である。樹脂(A)の重量平均分子
量は好ましくは3X10”〜1×103である。In the resin (A), the amount of the polymer component containing the specific acidic group in the AB block copolymer is 0.5 to 20% by weight based on 100 parts by weight of the resin (A), preferably It is 3 to 15% by weight. The weight average molecular weight of the resin (A) is preferably 3 x 10'' to 1 x 103.
一方樹脂CB)の重量平均分子量3X10’〜IX 1
0’、好ましくは5X10’〜5X10’である。On the other hand, the weight average molecular weight of resin CB) is 3X10' to IX1
0', preferably 5X10' to 5X10'.
−1式(I[[a)及び/又は(Illb)で示される
マクロモノマーの重合体中における存在割合は、0.5
〜80重量%であることが好ましく、特に−1式(I[
1a)及び(I[lb)において、R61又はRb2が
水素原子の場合のマクロモノマーの場合にはその存在割
合は、0.5〜30重量%であることが好ましい。-1 The abundance ratio of the macromonomer represented by formula (I [[a) and/or (Illb) in the polymer] is 0.5
It is preferable that it is ~80% by weight, especially -1 formula (I[
In 1a) and (I[lb), in the case of a macromonomer in which R61 or Rb2 is a hydrogen atom, the proportion thereof is preferably 0.5 to 30% by weight.
樹脂CB)のガラス転移点は、好ましくは0℃〜110
℃、より好ましくは、20″〜90℃である。The glass transition point of resin CB) is preferably 0°C to 110°C.
℃, more preferably 20'' to 90℃.
又、結着樹脂〔B〕の分子量が3X10’より小さくな
ると、膜強度が充分に保てず、一方分子量が106より
大きくなると、分散性が低下し膜平滑度が劣下し、複写
画像の画質(特に、細線・文字の再現性が悪くなる)が
悪化し、更にオフセットマスターとして用いる時に地汚
れが著しくなってしまう。Furthermore, if the molecular weight of the binder resin [B] is smaller than 3X10', the film strength cannot be maintained sufficiently, while if the molecular weight is larger than 106, the dispersibility decreases and the film smoothness deteriorates, resulting in poor quality of the copied image. The image quality (particularly the reproducibility of fine lines and characters deteriorates) deteriorates, and furthermore, when used as an offset master, background stains become significant.
結着樹脂CB)におけるマクロ七ツマー含有量が0.5
重量%より少ないと電子写真特性(特に暗減衰律、光感
度)が低下し、又環境条件での電子写真特性の変動が特
に近赤外〜赤外光分光増感色素との組み合わせにおいて
、大きくなる。これはグラフト部となるマクロモノマー
が微かとなることで結果として従来のホモポリマーある
いはランダム共重合体と殆んど同じ組成になってしまう
ことによると考えられる。Macro 7mer content in binder resin CB) is 0.5
If it is less than % by weight, the electrophotographic properties (especially dark decay law, photosensitivity) will deteriorate, and the electrophotographic properties will fluctuate significantly under environmental conditions, especially in combination with near-infrared to infrared spectral sensitizing dyes. Become. This is thought to be due to the fact that the amount of the macromonomer that forms the graft portion is small, resulting in a composition that is almost the same as that of conventional homopolymers or random copolymers.
一方マクロ七ツマーの含有量が80%を越えると、他の
共重合成分に相当する単量体と本発明に従うマクロモノ
マーとの共重合性が充分でなくなり、結着樹脂として用
いても充分な電子写真特性が得られなくなってしまう。On the other hand, if the content of the macromonomer exceeds 80%, the copolymerizability of the macromonomer according to the present invention with monomers corresponding to other copolymerization components will not be sufficient, and even when used as a binder resin, the copolymerizability will be insufficient. Electrophotographic characteristics cannot be obtained.
さらに、−1式(I[la)および(Illb)におけ
るR1又はし、が水素原子の場合のマクロモノマーが3
0重量%を越えると分散性が低下し、膜平滑度が劣化し
、複写画像の画像の悪化及びオフセットマスターとして
用いた時の印刷物の地汚れ増加を生ずる。この事は、マ
クロモノマーが含有する− COOH基が多くなり、分
散性に無機光導電体との相互作用が強くなり、無機光導
電体の凝集を引き起こしてしまうためと考えられる。Furthermore, when R1 or R in Formulas -1 (I[la) and (Illb) is a hydrogen atom, the macromonomer is 3
If it exceeds 0% by weight, the dispersibility decreases, the film smoothness deteriorates, the image quality of the copied image deteriorates, and the background smudge of the printed matter increases when used as an offset master. This is thought to be because the macromonomer contains more --COOH groups, which strengthens the interaction with the inorganic photoconductor due to its dispersibility, causing aggregation of the inorganic photoconductor.
樹脂〔B′〕における前記特定の極性基含有の場合の結
合成分の存在量は、樹脂CB’1100重量部当たり0
.1〜10重量%であり、好ましくは0゜5〜5重量%
である。When the resin [B'] contains the specific polar group, the amount of the bonding component present is 0 per 1100 parts by weight of the resin CB'.
.. 1 to 10% by weight, preferably 0°5 to 5% by weight
It is.
極性基含量が0.1%より少ないと光導電層の膜強度向
上の効果が小さくなってしまい、また10%を越えると
無機導電体の分散物の凝集が発生してしまう。If the polar group content is less than 0.1%, the effect of improving the film strength of the photoconductive layer will be reduced, and if it exceeds 10%, agglomeration of the inorganic conductor dispersion will occur.
本発明の樹脂〔B〕は、式(I[[a)及び/又は式(
I[b)で示される重量平均分子量1.0X10’〜1
.5 X 10’のマクロモノマー(MB)を共重合成
分として含有する、重量平均分子量3X10’〜1×1
0hのグラフト共重合体であり、好ましくは、更に、該
グラフト共重合体の重合体主鎖の末端に−PO3H。The resin [B] of the present invention has the formula (I [[a) and/or the formula (
Weight average molecular weight represented by I[b) 1.0X10' to 1
.. Contains 5 x 10' macromonomer (MB) as a copolymerization component, weight average molecular weight 3 x 10' to 1 x 1
0h graft copolymer, preferably further including -PO3H at the end of the polymer main chain of the graft copolymer.
(R,はRと同一の内容を表わす、)および環状酸無水
物含有基から選ばれる少な(とも1種の極性基を結合し
て成る高分子量の樹脂〔B′〕である。(R represents the same content as R) and a cyclic acid anhydride-containing group (both are high molecular weight resins [B'] formed by bonding one type of polar group).
かかる極性基としては前記樹脂(A)にて述べたものと
同様のものを挙げることができる。また、0)1基につ
いては、前記樹脂(A)にて述べたフェノール性OH基
の他にビニル基又はアリル基含有のアルコール類(例え
ばアリルアルコール、メタクリル酸エステル、アクリル
アミド等のエステル置換基、N−置換基中に、−OR基
を含有する化合物等)を挙げることができる。As such polar groups, the same ones as those mentioned for the resin (A) can be mentioned. Regarding 0) 1 group, in addition to the phenolic OH group mentioned in the resin (A), vinyl group- or allyl group-containing alcohols (for example, allyl alcohol, methacrylic acid ester, ester substituent such as acrylamide, etc.), Examples include compounds containing an -OR group in the N-substituent.
υH
基としては、炭素数1〜18の脂肪族基又は炭素数6〜
12の芳香族基を挙げることができる。具体的には、炭
素数1〜18の置換されてもよいアルキル基(例えばメ
チル基、エチル基、プロピル基、ブチル基、ヘプチル基
、ヘキシル基、オクチル基、デシル基、ドデシル基、ト
リデシル基、ヘキサデシル基、オクタデシル基、2−ク
ロロエチル基、2−ブロモエチル基、2−ヒドロキシル
エチル基、2−メトキシエチル基、2−エトキシエチル
基、2−シアノエチル基、3−クロロプロピル基、2−
(トリメトキシシリル)エチル基、2−テトラヒドロフ
リル基、2−チエニルエチル基、2−N。The υH group is an aliphatic group having 1 to 18 carbon atoms or an aliphatic group having 6 to 18 carbon atoms.
Twelve aromatic groups may be mentioned. Specifically, an optionally substituted alkyl group having 1 to 18 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a heptyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, a tridecyl group, Hexadecyl group, octadecyl group, 2-chloroethyl group, 2-bromoethyl group, 2-hydroxylethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-cyanoethyl group, 3-chloropropyl group, 2-
(trimethoxysilyl)ethyl group, 2-tetrahydrofuryl group, 2-thienylethyl group, 2-N.
N−ジメチルアミノエチル基、2−N、N−ジエチルア
ミノエチル基等)、炭素数5〜8のシクロアルキル基(
例えばシクロヘプチル基、シクロヘキシル基、シクロオ
クチル基等)、炭素数7〜12の置換されてもよいアラ
ルキル基(例えば、ベンジル基、フェネチル基、3−フ
ェニルプロピル基、ナフチルメチル基、2−ナフチルエ
チル基、クロロベンジル基、ブロモベンジル基、ジクロ
ロベンジル基、メチルベンジル基、クロロ−メチル−ベ
ンジル基、ジメチルベンジル基、トリメチルベンジル基
、メトキシベンジル基等)等の脂肪族基、更に炭素数6
〜12の置換されてもよいアリール基(例えば、フェニ
ル基、トリル基、キシリル基、クロロフェニル基、ブロ
モフェニル基、ジクロロフェニル基、クロロ−メチル−
フェニル基、メトキシフェニル基、メトキシカルボニル
フェニル基、ナフチル基、クロロナフチル基等)等の芳
香族基が挙げられる。N-dimethylaminoethyl group, 2-N,N-diethylaminoethyl group, etc.), cycloalkyl group having 5 to 8 carbon atoms (
For example, cycloheptyl group, cyclohexyl group, cyclooctyl group), optionally substituted aralkyl group having 7 to 12 carbon atoms (for example, benzyl group, phenethyl group, 3-phenylpropyl group, naphthylmethyl group, 2-naphthylethyl group) aliphatic groups such as chlorobenzyl group, bromobenzyl group, dichlorobenzyl group, methylbenzyl group, chloro-methyl-benzyl group, dimethylbenzyl group, trimethylbenzyl group, methoxybenzyl group, etc.), and furthermore, an aliphatic group having 6 carbon atoms.
~12 optionally substituted aryl groups (e.g., phenyl group, tolyl group, xylyl group, chlorophenyl group, bromophenyl group, dichlorophenyl group, chloro-methyl-
Examples include aromatic groups such as phenyl group, methoxyphenyl group, methoxycarbonylphenyl group, naphthyl group, chloronaphthyl group, etc.
樹脂〔B〕の共重合成分として供せられる、−方の末端
に重合性二重結合基を、他の末端にカルボキシル基を各
々結合した、ポリエステル構造ををするマクロモノマー
(MB)について、更に具体的に説明する。Regarding the macromonomer (MB) having a polyester structure and having a polymerizable double bond group bonded to one end and a carboxyl group bonded to the other end, which is provided as a copolymerization component of resin [B], I will explain in detail.
一般式(Illa)及び(I[[b)において、〔〕内
は、式(I[Ia)及び/又は(111b)のマクロモ
ノマー(MB)の重量平均分子量を1×103〜1.5
X 10’とするに十分な、繰り返し単位を表わす。In the general formulas (Illa) and (I[[b)], [] indicates the weight average molecular weight of the macromonomer (MB) of the formula (I[Ia) and/or (111b) from 1 x 103 to 1.5
Represents enough repeating units to make X 10'.
−1式(nla)のマクロモノマー(MB)において、
好ましくは、f、及びbは、互いに同じでも異なっても
よく、各々水素原子、ハロゲン原子(例えば塩素原子、
臭素原子、フッ素原子)、シアノ基、炭素数1〜3のア
ルキル基(例えばメチル基、エチル基、プロピル基等)
、−COOT、又は−GHzCOOTx(1,および
Tよは各々炭素数1〜8のアルキル基(例えばメチル基
、エチル基、プロピル基、ブチル基、ペンチル基、ヘキ
シル基、オクチル基等)、炭素数7〜9のアラルキル基
(例えばベンジル基、フェネチル基、3−フェニルプロ
ピル基等)又は置換されてもよいフェニル基(例えばフ
ェニル基、トリル基、キシリル基、メトキシフェニル基
等)を表わす)を表わす。-1 In the macromonomer (MB) of formula (nla),
Preferably, f and b may be the same or different, and each represents a hydrogen atom, a halogen atom (for example, a chlorine atom,
bromine atom, fluorine atom), cyano group, alkyl group having 1 to 3 carbon atoms (e.g. methyl group, ethyl group, propyl group, etc.)
, -COOT, or -GHzCOOTx (1, and T are each an alkyl group having 1 to 8 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, octyl group, etc.), carbon number 7-9 aralkyl group (e.g. benzyl group, phenethyl group, 3-phenylpropyl group, etc.) or optionally substituted phenyl group (e.g. phenyl group, tolyl group, xylyl group, methoxyphenyl group, etc.) .
より好ましくは、fl及びf2のうちのいずれか一方が
水素原子を表わす。More preferably, either fl or f2 represents a hydrogen atom.
A1は、好ましくは、−COO−1−OCO−1−CH
,COO−2−co、oco−1−CONH−1−CO
NHCONH−1−CONHCOO−又はまた、dlは
、水素原子又は炭素数1〜12の炭化水素基(例えばメ
チル基、エチル基、プロピル基、ブチル基、ヘキシル基
、オクチル基、デシル基、ドデシル基、2−メトキシエ
チル基、2−クロロエチル基、2−シアノエチル基、ベ
ンジル基、メチルベンジル基、クロロベンジル基、メト
キシベンジル基、フェネチル基、フェニル基、トリル基
、クロロフェニル基、メトキシフェニル基、ブチルフェ
ニル基等)を表わす。A1 is preferably -COO-1-OCO-1-CH
, COO-2-co, oco-1-CONH-1-CO
NHCONH-1-CONHCOO- or dl is a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, 2-methoxyethyl group, 2-chloroethyl group, 2-cyanoethyl group, benzyl group, methylbenzyl group, chlorobenzyl group, methoxybenzyl group, phenethyl group, phenyl group, tolyl group, chlorophenyl group, methoxyphenyl group, butylphenyl group etc.).
B、は、AIと−000−とを連結する基を表わし、単
結合又は連結する基を表わす、連結する基として具体的
には
択される連結基又はこれらの連結基の組合せによって形
成される結合基を表わす(ここで、e、〜e4は各々同
じでも異なってもよく、水素原子、ハロゲン原子(好ま
しくは、例えば、フッ素原子、塩素原子、臭素原子等)
又は炭素数1〜7の炭化水素基(好ましくは、例えば、
メチル基、エチル基、プロピル基、ブチル基、2−クロ
ロエチル基、2−メトキシエチル基、2−メトキシカル
ボニルエチル基、ベンジル基、メトキシベンジル基、フ
ェニル基、メトキシフェニル基、メトキシカルボニルフ
ェニル基等)を表わし、e、〜e、は上記のdlの内容
と同一のものを表わす)。B represents a group connecting AI and -000-, represents a single bond or a connecting group, is formed by a connecting group specifically selected as the connecting group, or a combination of these connecting groups Represents a bonding group (where e and ~e4 may be the same or different, and include a hydrogen atom, a halogen atom (preferably, for example, a fluorine atom, a chlorine atom, a bromine atom, etc.)
or a hydrocarbon group having 1 to 7 carbon atoms (preferably, for example,
methyl group, ethyl group, propyl group, butyl group, 2-chloroethyl group, 2-methoxyethyl group, 2-methoxycarbonylethyl group, benzyl group, methoxybenzyl group, phenyl group, methoxyphenyl group, methoxycarbonylphenyl group) , and e, to e represent the same contents as the above dl).
D、及びD8は互いに同しでも異なってもよく、各々二
価の有機残基を表わし、−0−
−S
d意
N−−8O−1−5O□−−COO−−0CO−−CO
NHCO−1ばれた結合基を介在させてもよい、二価の
脂肪族基もしくは二価の芳香族基、又はこれらの二価の
残基の組合せにより構成された有機残基を表わす。D and D8 may be the same or different and each represents a divalent organic residue, -0- -S d -N--8O-1-5O□--COO--0CO--CO
NHCO-1 represents an organic residue composed of a divalent aliphatic group, a divalent aromatic group, or a combination of these divalent residues, which may have an open bonding group therebetween.
ここで、d8〜d4はd、と同一の内容を表わす。Here, d8 to d4 represent the same content as d.
二価の脂肪族基として、例えば
が挙げられる(e、及びe、は、互いに同じでも異なっ
てもよく、各々水素原子、ハロゲン原子(例えばフッ素
原子、塩素原子、臭素原子等)又は炭素数1〜12のア
ルキル基(例えばメチル基、エチル基、プロピル基、ク
ロロメチル基、ブロモメチル基、ブチル基、ヘキシル基
、オクチル基、ノニル基、デシル基等)を表わす、Qは
一〇−−S−又は−NRis−を表わし、R&3は炭素
数1〜4のアルキル基、−CIICZ又は−CHJrを
表わす)。Examples of divalent aliphatic groups include (e and e may be the same or different, each having a hydrogen atom, a halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, etc.) or a carbon number of 1 ~12 alkyl groups (e.g. methyl group, ethyl group, propyl group, chloromethyl group, bromomethyl group, butyl group, hexyl group, octyl group, nonyl group, decyl group, etc.), Q is 10--S- or -NRis-, and R&3 represents an alkyl group having 1 to 4 carbon atoms, -CIICZ or -CHJr).
二価の芳香族基としては、例えばベンゼン環基、ナフタ
レン環基及び5又は6員の複素環基(複素環を構成する
ヘテロ原子として、酸素原子、イオウ原子、窒素原子か
ら選ばれたヘテロ原子を少なくとも1種含有する)が挙
げられる。これらの芳香族基は置換基を有していてもよ
く、例えばハロゲン原子(例えばフッ素原子、塩素原子
、臭素原子等)、炭素数1〜8のアルキル基(例えばメ
チル基、エチル基、プロピル基、ブチル基、ヘキシル基
、オクチル基等)、炭素数1〜6のアルコキシ基(例え
ばメトキシ基、エトキシ基、プロピオキシ基、ブトキシ
基等)が置換基の例として挙げられる。Examples of divalent aromatic groups include benzene ring groups, naphthalene ring groups, and 5- or 6-membered heterocyclic groups (hetero atoms constituting the heterocycle include an oxygen atom, a sulfur atom, and a nitrogen atom). (containing at least one kind of). These aromatic groups may have a substituent, such as a halogen atom (e.g. fluorine atom, chlorine atom, bromine atom, etc.), an alkyl group having 1 to 8 carbon atoms (e.g. methyl group, ethyl group, propyl group). , butyl group, hexyl group, octyl group, etc.), and an alkoxy group having 1 to 6 carbon atoms (eg, methoxy group, ethoxy group, propoxy group, butoxy group, etc.) as examples of the substituent.
複素環基としては、例えばフラン環、チオフェン環、ピ
リジン環、ピラジン環、ピペラジン環、テトラヒドロフ
ラン環、ピロール環、テトラヒドロピラン環、1.3−
オキサゾリン環等が挙げられる。Examples of the heterocyclic group include furan ring, thiophene ring, pyridine ring, pyrazine ring, piperazine ring, tetrahydrofuran ring, pyrrole ring, tetrahydropyran ring, 1.3-
Examples include oxazoline rings.
R&lは好ましくは水素原子又は炭素数1〜8の炭化水
素基を表わし、炭化水素基の具体例としてはfl、f2
にて前記したと同様のものを挙げることができる。R&l preferably represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, and specific examples of the hydrocarbon group include fl, f2
The same examples as those mentioned above can be mentioned.
式(I[lb)において、好ましいfl、f4、A2、
B2及びれ2は式(I[[a)のfls fz、A1、
B1及びR61にて好ましいと記載したものと各々同一
の内容を表わす。In the formula (I[lb), preferable fl, f4, A2,
B2 and E2 are the formula (I[[a) fls fz, A1,
Each represents the same contents as those described as preferable in B1 and R61.
0、は、二価の脂肪族残基を表わし、具体的には+CU
X→。(p+は2〜18の整数)、1゛
z
ル基、エチル基、プロピル基等のアルキル基を表わし、
glと82のいずれもが水素原子を表わす事はない)
、−cH+cuz→T’! (gsは炭素数1〜8の
アルキル基(例えばメチル基、エチル基、プロピル基、
ブチル基、ヘキシル基、オクチル基等)を表わし、R2
は1〜16の整数を表わす)等が挙げられる。0 represents a divalent aliphatic residue, specifically +CU
X→. (p+ is an integer of 2 to 18), represents an alkyl group such as a 1゛z group, an ethyl group, a propyl group,
Neither gl nor 82 represents a hydrogen atom)
, -cH+cuz→T'! (gs is an alkyl group having 1 to 8 carbon atoms (e.g. methyl group, ethyl group, propyl group,
butyl group, hexyl group, octyl group, etc.), and R2
represents an integer from 1 to 16).
一般式(nla)及び−1式(Dub)におけるマクロ
七ツマ−(MB)における
で表わされる部分の具体例として各々次のものが挙げら
れるが、これらに限定されるものではない。Specific examples of the portions represented by in the macro numerals (MB) in the general formula (nla) and -1 formula (Dub) include, but are not limited to, the following.
但し、以下の各偶において、Q、は−H,−CH3、C
HxCOOCHs、−Ct、−Br又は−CNを示し、
Q2は−H又は−CI(3を示し、nは2〜12の整数
を示し、mは1〜12の整数を示す。However, in each of the following cases, Q is -H, -CH3, C
HxCOOCHs, -Ct, -Br or -CN;
Q2 represents -H or -CI(3, n represents an integer of 2 to 12, and m represents an integer of 1 to 12.
(以下余白) (B−1) Q+ CHl−C (B−2) CH。(Margin below) (B-1) Q+ CHl-C (B-2) CH.
CH−C
(ト4)
CONH(CHg)−−
(B−6)
l1t−C
C0NHCONtl(CHI) 、 −(B−7)
CH3
CHl=C
C0NHCOO(CHり、−
(B−8)
Q冨
CHl−C
COO(CHz)−0CO(CHz)−−(B−9)
Q!
CI寡IC
C0NH(C[(t)−0CO(CHz)−−(B−1
0)
(B−11)
Q寞
CHffi−C
0CO(Ch)−−
(B−12)
Q。CH-C (T4) CONH(CHg)-- (B-6) l1t-C C0NHCONtl(CHI), -(B-7) CH3 CHl=C C0NHCOO(CHri, - (B-8) QtomiCHl -C COO(CHz)-0CO(CHz)--(B-9) Q! CI low IC C0NH(C[(t)-0CO(CHz)--(B-1
0) (B-11) Q寞CHffi-C 0CO(Ch) -- (B-12) Q.
CH1=C
C00(CHz)nOcOcH=cH−I
CH1鴛C11
CH,−
(B−15)
CHt猷CI CIbCHx−
(B−16)
CB、−CI Cut C00(CHx)、0CO
(CHt)−−(B−17)
Q!
CHl−C
C00(CHt)、5OINH(C1h)、−(B−1
8)
Q寞
ut−c
Coo(CHt) 5NHcOo(CHz) −(B−
19)
Q。CH1=C C00(CHz)nOcOcH=cH-I CH1雛C11 CH,- (B-15) CHt猷CI CIbCHx- (B-16) CB, -CI Cut C00(CHx), 0CO
(CHt) --(B-17) Q! CHl-C C00(CHt), 5OINH(C1h), -(B-1
8) Q寞ut-c Coo(CHt) 5NHcOo(CHz) -(B-
19) Q.
CU、−C
Coo(CIり3NH−
(B−22)
Q言
C1l!−C
C00CIItCHCHfOOC(CHl)、−R
(II−23)
Cam−CB CHgOCO(CHt)−−(B−2
6)
Q2
(B−27)
(B−28)
l
D、及びD2の具体的な例として、各々以下の有機残基
が挙げられるが、
本発明はこれらに限定され
るものではない、但し、以下の各側において、Rh4は
炭素数1〜4のアルキル基、−CHICZ又は−CHJ
rを示し、れ、は炭素数1〜8のアルキル基、→CHa
「0Rha (Rh4は上記の意味を表わし、lは2〜
8の整数を表わす) 、−CIICZ又は−CHJrを
示し、Rh6は一■又は−CB、を示し、R&?は炭素
数1〜4のアルキル基を示し、Qは一〇−2−3−又は
−HRha(Roは上記の意味を表わす)を示し、Pは
1〜26の整数を示し、qは0又は1〜4の整数を示し
、rは1〜10の整数を示し、jは0又は1〜4の整数
を示し、kは2〜6の整数を示す。CU, -C Coo(CIri3NH- (B-22) Q word C1l! -C C00CIItCHCHfOOC(CHl), -R (II-23) Cam-CB CHgOCO(CHt)--(B-2
6) Q2 (B-27) (B-28) l Specific examples of D and D2 include the following organic residues, but the present invention is not limited thereto, however, On each side below, Rh4 is an alkyl group having 1 to 4 carbon atoms, -CHICZ or -CHJ
r represents an alkyl group having 1 to 8 carbon atoms, →CHa
"0Rha (Rh4 represents the above meaning, l is 2~
represents an integer of 8), -CIICZ or -CHJr, Rh6 represents 1 or -CB, R&? represents an alkyl group having 1 to 4 carbon atoms, Q represents 10-2-3- or -HRha (Ro represents the above meaning), P represents an integer from 1 to 26, and q represents 0 or r represents an integer of 1 to 10, j represents 0 or an integer of 1 to 4, and k represents an integer of 2 to 6.
(D−1) →CH,→1−
(D−2) −CH−CB−
(D−3) −C−C−
Rh4
(D−5)
CH−
Rh4
(D−8)
CHz CCut
Rh4
(れ、
は同じでも異なってもよい)
(R6,は同じでも異なってもよい)
(1)−H)
+ C4hCHzOCHzCHz→Tイ0CHzCHz
七−(D
十CHtCHiS CHzCHz±−
(D
+CHzCIbSCHgC1hOCHzCHz→7−(
D−23)
CHtC−CCHt−
(D−24)
(D−25)
(D−26)
(D−27)
(D−28)
CHt CH=CHCHz−
CHzOCHzClh−
CHtCHzCHzOCHzCHzCHz−f−CH!
−)−i−3O□十C1h世+CH2+−8−8十CH
−「
一般式(I[[a)で示されるマクロ七ツマ−(MB)
は、高分子学会線、「高分子データハンドブック〔基[
01) J (1986年刊)培風館 等に例示され
る、ジオール類とジカルボン酸類、ジカルボン酸無水物
又はジカルボン酸エステル類との重縮合反応によって合
成された、重量平均分子量1×103〜1.5×101
のポリエステルオリゴマーの片末端のヒドロキシル基に
おいてのみ、高分子反応により、重合性二重結合基を導
入する方法で容易に製造する事ができる。(D-1) →CH, →1- (D-2) -CH-CB- (D-3) -C-C- Rh4 (D-5) CH- Rh4 (D-8) CHz CCut Rh4 (Re , may be the same or different) (R6, may be the same or different) (1)-H) + C4hCHzOCHzCHz→Ti0CHzCHz
7-(D 10CHtCHiS CHzCHz±- (D +CHzCIbSCHgC1hOCHzCHz→7-(
D-23) CHtC-CCHt- (D-24) (D-25) (D-26) (D-27) (D-28) CHt CH=CHCHz- CHzOCHzClh- CHtCHzCHzOCHzCHzCHz-f-CH!
-)-i-3O□10C1h+CH2+-8-80CH
- "Macro 7-mer (MB) represented by the general formula (I [[a)]
The Polymer Science Society of Japan, ``Polymer Data Handbook
01) Synthesized by polycondensation reaction of diols and dicarboxylic acids, dicarboxylic acid anhydrides, or dicarboxylic acid esters, as exemplified by J (published in 1986) Baifukan et al., weight average molecular weight 1 x 103 to 1.5 x 101
It can be easily produced by a method of introducing a polymerizable double bond group through a polymer reaction only in the hydroxyl group at one end of the polyester oligomer.
ポリエステルの合成法は、従来公知の重縮合反応によっ
て合成されるが、具体的には、滝山栄−部「ポリエステ
ル樹脂ハンドブック」日刊工業新聞社(1986年刊)
、高分子学会績r重縮合と重付加」共立出版(1980
年刊) 、1.Goodman rEncyclop
edia of Polymer 5cienc
e and EngineeringVOI 12
J pi、 John Wiley L 5ons
(1985年刊)等に記載の方法に従って合成すること
ができる。Polyester is synthesized by a conventionally known polycondensation reaction, but specifically, Eibe Takiyama, "Polyester Resin Handbook," Nikkan Kogyo Shimbunsha (published in 1986)
, “Reports of the Polymer Science Society of Japan: Polycondensation and Polyaddition” (Kyoritsu Shuppan, 1980)
Annual), 1. Goodman rEncyclop
edia of Polymer 5cienc
e and Engineering VOI 12
J pi, John Wiley L 5ons
(published in 1985) and others.
ポリエステルオリゴマーの片末端のヒドロキシル基のみ
に重合性二重合基を導入する方法は、従来公知の低分子
化合物におけるアルコール類からエステル化する反応あ
るいはアルコール類からウレタン化する反応を用いる事
で合成することができる。A method for introducing a polymerizable double group only into the hydroxyl group at one end of a polyester oligomer is to synthesize it by using a conventionally known reaction of esterifying an alcohol from a low-molecular compound or a reaction of converting an alcohol into a urethane. I can do it.
即ち、分子内に重合性二重結合基を含有するカルボン酸
類、カルボン酸エステル類、カルボン酸ハライド類又は
カルボン酸無水物類との反応でエステル化し、マクロモ
ノマーを合成する方法あるいは、分子内に重合性二重結
合基を含有するモノイソシアナート類との反応でウレタ
ン化し、マクロモノマーを合成する方法によって達せら
れる。That is, a method in which a macromonomer is synthesized by esterification by reaction with carboxylic acids, carboxylic acid esters, carboxylic acid halides, or carboxylic acid anhydrides containing a polymerizable double bond group in the molecule; This can be achieved by a method in which a macromonomer is synthesized by reacting with a monoisocyanate containing a polymerizable double bond group to form a urethane.
具体的には、日本化学余線「新実験化学講座■。Specifically, Nippon Kagaku Yoshin's ``New Experimental Chemistry Course ■''.
有機化合物の合成と反応(II)J、第5章、丸善■、
(197?年刊)、「同、有機化合物の合成と反応〔■
〕、第1652頁、九善■(1978年刊)等に詳細に
記載された方法を用いて合成することができる。Synthesis and Reactions of Organic Compounds (II) J, Chapter 5, Maruzen ■,
(published in 197?), “Synthesis and Reaction of Organic Compounds [■
], p. 1652, Kuzen ■ (published in 1978).
一般式(Illb)で示されるマクロモノマー(MB)
は、分子内にヒドロキシル基を含有するカルボン酸類を
自己重縮合反応によりポリエステルオリゴマーを合成し
た後、一般式(1[a)のマクロモノマー合成と同様の
高分子反応でマクロモノマーを合成する方法は、重合性
二重結合基含有のカルボン酸類とラクトン類のリビング
重合反応で合成する方法によって、製造する事ができる
。具体的には、T、Yasuda、 T、Aida a
nd S、Inoue+ J、Macrosol、Sc
i。Macromonomer (MB) represented by general formula (Illb)
is a method in which a polyester oligomer is synthesized by a self-polycondensation reaction of carboxylic acids containing hydroxyl groups in the molecule, and then a macromonomer is synthesized by a polymer reaction similar to the macromonomer synthesis of general formula (1 [a)]. , can be produced by a method of synthesis by living polymerization reaction of carboxylic acids containing a polymerizable double bond group and lactones. Specifically, T, Yasuda, T, Aida a
nd S, Inoue+ J, Macrosol, Sc.
i.
Chew、+ A+ 11. 1035 (19
84L T、Yasuda、 T、Aidaan
d S、Inoue、 Macromlecule
s+ 、ll+ 2217 (1984)+S、
Sosnowski、 S、Stomkowski a
nd S、Penczek、 Makromol、
Che+s、 1旦旦、 1347 (19B?
)、 Y、Gnanou andP、Re5pp、
、 Makroaol、Chem、l8旦、2267
(19B?)。Chew, + A+ 11. 1035 (19
84L T, Yasuda, T, Aidan
d S, Inoue, Macromlecule
s+, ll+ 2217 (1984)+S,
Sosnowski, S., Stomkowski a.
nd S., Penczek, Makromol,
Che+s, 1dandan, 1347 (19B?
), Y, Gnanou and P, Re5pp,
, Makroaol, Chem, 18th, 2267
(19B?).
T、5hiota and Y、Goto、 J
、Appl、Polym、Sci、、ll。T, 5hiota and Y, Goto, J
, Appl, Polym, Sci,, ll.
753 (1967)等に記載の方法によって製造する
ことができる。753 (1967) and the like.
以下に本発明に用いることのできる式(Ia)又は(W
b)で表わされるマクロモノマー(MB)の具体例を以
下に示す、但し、以下の各偶において、〔〕内はマクロ
モノマーの重量平均分子量を1×103〜1.5 XI
O’とするに十分な繰り返し単位を示し、Q+は上記と
同様の内容を示し、Q、は−H又は−cnsを示し、R
6,及びれ、は同じでも異なってもよく各々−CH5又
は−CJsを示し、R1゜及びR’l+は同じでも異な
ってもよく各々−CI、−Br、−CH,CI又はCH
Jrを示し、Sは1〜25の整数を示し、tは2〜12
の整数を示し、Uは2〜12の整数を示し、Xは2〜4
の整数を示し、yは2〜6の整数を示し、2は1〜4の
整数を示す。The formula (Ia) or (W
Specific examples of the macromonomer (MB) represented by b) are shown below. However, in each case below, the weight average molecular weight of the macromonomer is 1 x 103 to 1.5 XI
indicates a repeating unit sufficient to form O', Q+ indicates the same content as above, Q indicates -H or -cns, R
6, and may be the same or different and each represents -CH5 or -CJs, and R1゜ and R'l+ may be the same or different and each represents -CI, -Br, -CH, CI or CH
Jr, S represents an integer from 1 to 25, and t represents 2 to 12.
, U represents an integer from 2 to 12, and X represents an integer from 2 to 4.
, y represents an integer of 2 to 6, and 2 represents an integer of 1 to 4.
(Mu−1) Q。(Mu-1) Q.
(MB−2) (MB−3) (MB−4) (MB−5) (MB−6) C)I。(MB-2) (MB-3) (MB-4) (MB-5) (MB-6) C)I.
し器3 (MB−9) Ql (MB−10) (MB−11) (Mu−12) Q。pot 3 (MB-9) Ql (MB-10) (MB-11) (Mu-12) Q.
(MB−13) Q。(MB-13) Q.
(MB44) Q+ (MB−15) (MB−16) (MB−17) (MB−19) (MB−20) (MB−21) (MB−22) Q。(MB44) Q+ (MB-15) (MB-16) (MB-17) (MB-19) (MB-20) (MB-21) (MB-22) Q.
(MB−23) Q。(MB-23) Q.
(MB−24) (MB−25) Q。(MB-24) (MB-25) Q.
(MB−26)
本発明の結着樹脂に用いられる樹脂CB)は、前記した
一般式(lla)及び(IOb)から選択される少なく
とも1つのマクロモノマーを少なくとも共重合成分とす
るグラフト共重合体であり、他の共重合成分としては、
前記した結着樹脂の物性を満足し、且つ該マクロモノマ
ーとラジカル共重合し得る単量体であればいずれでもよ
い。(MB-26) Resin CB used in the binder resin of the present invention is a graft copolymer containing at least one macromonomer selected from the general formulas (lla) and (IOb) as a copolymerization component. And other copolymerization components are:
Any monomer may be used as long as it satisfies the physical properties of the binder resin described above and can be radically copolymerized with the macromonomer.
好ましくは、樹脂(A)にて示した一般式(If)で示
される共重合成分に相当する単量体を共重合成分として
共重合体中30重量%〜99.5重量%含有する。Preferably, the copolymer contains 30% to 99.5% by weight of a monomer corresponding to the copolymerization component represented by the general formula (If) shown in the resin (A) as a copolymerization component.
樹脂CB)においては、一般式(It)で示される共重
合成分以外の他の共重合成分を含有してもよく、具体的
には、樹脂(A)で説明した他の共重合成分に相当する
各単量体等が挙げられる。Resin CB) may contain other copolymerization components other than the copolymerization component represented by general formula (It), and specifically corresponds to the other copolymerization components described for resin (A). Examples include each monomer.
これら他の単量体が共重合成分として存在する割合は、
樹脂〔B〕の全重合体成分中多くても30重量%を越え
ない方が好ましく、より好ましくは20重量%以下であ
る。The proportion of these other monomers as copolymer components is
It is preferable that the amount does not exceed at most 30% by weight, and more preferably 20% by weight or less in the total polymer components of resin [B].
重合体主鎖の片末端にのみ特定の極性基を結合して成る
本発明の樹脂〔B′〕は、従来公知のアニオン重合ある
いはカチオン重合によって得られるリビングポリマーの
末端に種々の試薬を反応させる方法(イオン重合法によ
る方法)、分子中に特定の極性基を含有した重合開始剤
及び/又は連鎖移動剤を用いてラジカル重合させる方法
(ラジカル重合法による方法)、あるいは以上の如きイ
オン重合法もしくはラジカル重合法によって得られた末
端に反応性基(例えばアミノ基、ハロゲン原子、エポキ
シ基、酸ハライド基等)含有の重合体を高分子反応によ
って本発明の特定の極性基に変換する方法等の合成法に
よって容易に製造することができる。The resin [B'] of the present invention, which has a specific polar group bonded only to one end of the polymer main chain, can be obtained by reacting various reagents at the end of a living polymer obtained by conventionally known anionic or cationic polymerization. method (ionic polymerization method), radical polymerization method using a polymerization initiator and/or chain transfer agent containing a specific polar group in the molecule (radical polymerization method), or the above ionic polymerization method Alternatively, a method in which a polymer containing a reactive group (for example, an amino group, a halogen atom, an epoxy group, an acid halide group, etc.) at the end obtained by a radical polymerization method is converted into the specific polar group of the present invention by a polymer reaction, etc. It can be easily produced by the following synthesis method.
具体的には、P、Dreyfuss 、 R9P、
QuirkEncycl 、Po1y+n、 Sci
、 Eng、 7.551(1987)、中條善樹
、山下雄也「染料と薬品」、■、232 (1985)
、上田明、永井進「科学と工業」■、57 (1986
)等の総説及びそれに引用の文献等に記載の方法によっ
て製造することができる。Specifically, P, Dreyfuss, R9P,
QuirkEncycl, Po1y+n, Sci
, Eng, 7.551 (1987), Yoshiki Nakajo, Yuya Yamashita "Dye and Medicine", ■, 232 (1985)
, Akira Ueda, Susumu Nagai "Science and Industry" ■, 57 (1986
), etc., and the literature cited therein.
具体的には、用いる連鎖移動剤としては、例えば、該極
性基あるいは、上記反応性基(即ち該極性基に誘導しう
る基)を含有するメルカプト化合物(例えばチオグリコ
ール酸、チオリンゴ酸、チオサリチル酸、2−メルカプ
トプロピオン酸、3メルカプトプロピオン酸、3−メル
カプト酪酸、N−(2−メルカプトプロピオニル)グリ
シン、2−メルカプトニコチン酸、3− (N (2−
メルカプトエチル)カルバモイル〕プロピオン酸、3−
(N−(2−メルカプトエチル)アミノコプロピオン
酸、N−(3−メルカプトプロピオニル)アラニン、2
−メルカプトエタンスルホン酸、3メルカプトプロパン
スルホン酸、4−メルカプトブタンスルホン酸、2−メ
ルカプトエタノール、3−メルカプト−1,2−プロパ
ンジオール、1−メルカプト−2−プロパツール、3−
メルカプト2−ブタノール、メルカプトフェノール2−
メルカプトエチルアミン、2−メルカプトイミダゾール
、2−メルカプト−3ビリジノール、4−(2メルカプ
トエチルオキシカルボニル)フタル酸無水物、2−メル
カプトエチルホスホノ酸、2メルカプトエチルホスホノ
酸モノメチルエステル等)、あるいは上記極性基又は置
換基を含有するヨード化アルキル化合物(例えばヨード
酢酸、ヨードプロピオン酸、2−ヨードエタノール、2
ヨードエタンスルホン酸、3−ヨードプロパンスルホン
酸等)が挙げられる。好ましくはメルカプト化合物が挙
げられる。Specifically, the chain transfer agent used is, for example, a mercapto compound containing the polar group or the above-mentioned reactive group (i.e., a group that can be induced into the polar group) (e.g., thioglycolic acid, thiomalic acid, thiosalicylic acid). , 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N-(2-mercaptopropionyl)glycine, 2-mercaptonicotinic acid, 3- (N (2-
Mercaptoethyl)carbamoyl]propionic acid, 3-
(N-(2-mercaptoethyl)aminocopropionic acid, N-(3-mercaptopropionyl)alanine, 2
-Mercaptoethanesulfonic acid, 3mercaptopropanesulfonic acid, 4-mercaptobutanesulfonic acid, 2-mercaptoethanol, 3-mercapto-1,2-propanediol, 1-mercapto-2-propanediol, 3-
Mercapto 2-butanol, mercaptophenol 2-
mercaptoethylamine, 2-mercaptoimidazole, 2-mercapto-3-viridinol, 4-(2mercaptoethyloxycarbonyl)phthalic anhydride, 2-mercaptoethylphosphonoic acid, 2mercaptoethylphosphonoic acid monomethyl ester, etc.), or the above Iodized alkyl compounds containing polar groups or substituents (e.g. iodoacetic acid, iodopropionic acid, 2-iodoethanol, 2-iodoethanol,
iodoethanesulfonic acid, 3-iodopropanesulfonic acid, etc.). Preferred are mercapto compounds.
該極性基あるいは、特定の反応性基を含有する重合開始
剤としては、具体的には、4,4゛−アゾビス(4−シ
アノ吉草酸) 、4.4°−アゾビス(4−シアノ吉草
酸クロライド) 、2.2’−アゾビス(2−シアツブ
ロバノール) 、2.2’−アゾビス(2シアノペンタ
ノール) 、2.2’−アゾビス〔2−メチル−N−(
2−ヒドロキシエチル)−プロピオアミド) 、2.2
’−アゾビス(2−メチル−N(1,1−ビス(ヒドロ
キシメチル)−2−ヒドロキシエチル〕プロピオアミド
) 、2,2”−アゾビス(2−(1−(2−ヒドロキ
シエチル)−2−イミダシリン−2−イル〕プロパン)
、2.2’−アゾビス(2−(2イミダシリン−2−
イル)プロパン〕2,2°−アゾビス[2−(4,5,
6,7−テトラヒドロ−18−1,3−ジアゾピン−2
−イル)プロパン]等が挙げられる。Examples of the polymerization initiator containing the polar group or a specific reactive group include 4,4'-azobis(4-cyanovaleric acid), 4.4'-azobis(4-cyanovaleric acid), and 4.4'-azobis(4-cyanovaleric acid). chloride), 2.2'-azobis(2-cyatuburobanol), 2.2'-azobis(2cyanopentanol), 2.2'-azobis[2-methyl-N-(
2-hydroxyethyl)-propioamide), 2.2
'-azobis(2-methyl-N(1,1-bis(hydroxymethyl)-2-hydroxyethyl)propioamide), 2,2''-azobis(2-(1-(2-hydroxyethyl)-2-imidacyline) -2-yl]propane)
, 2,2'-azobis(2-(2imidacillin-2-
propane]2,2°-azobis[2-(4,5,
6,7-tetrahydro-18-1,3-diazopine-2
-yl)propane] and the like.
これらの連鎖移動剤あるいは重合開始剤は、各々全単量
体100重量部に対して、0.05〜10重量部であり
、好ましくは0.5〜5重量部である。The amount of each of these chain transfer agents or polymerization initiators is 0.05 to 10 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of the total monomers.
本発明では、本発明に従う樹脂(A)((A’ )も含
む)及び樹脂〔B〕([B’ )も含む)の他に他の樹
脂を併用させることもできる。それらの樹脂としては、
例えば、アルキッド樹脂、ポリブチラール樹脂、ポリオ
レフィン類、エチレン−酢ビ共重合体、スチレン樹脂、
スチレン−ブタジェン樹脂、アクリレートブタジェン樹
脂、アルカン酸ビニル樹脂等が挙げられる。In the present invention, other resins may be used in combination with the resin (A) (including (A')) and resin [B] (also including [B')) according to the present invention. These resins include:
For example, alkyd resin, polybutyral resin, polyolefins, ethylene-vinyl acetate copolymer, styrene resin,
Examples include styrene-butadiene resin, acrylate butadiene resin, vinyl alkanoate resin, and the like.
上記他の樹脂は、本発明の樹脂を用いた全結着樹脂量の
30%(重量比)を越えると本発明の効果(特に静電特
性の向上)が失われる。If the above-mentioned other resin exceeds 30% (weight ratio) of the total binder resin amount using the resin of the present invention, the effects of the present invention (especially improvement in electrostatic properties) will be lost.
さらに、本発明の電子写真感光体においてその優れた電
子写真特性を保持しつつ、より大きな機械的強度が望ま
れる場合がある。この目的の為には、樹脂(A)及び/
又は樹脂〔B〕において、グラフト型共重合体の主鎖に
、熱及び/又は光硬化性官能基を導入する手法が適用で
きる。Further, in some cases, the electrophotographic photoreceptor of the present invention is desired to have greater mechanical strength while maintaining its excellent electrophotographic properties. For this purpose, resin (A) and/or
Alternatively, in resin [B], a method of introducing a thermally and/or photocurable functional group into the main chain of the graft copolymer can be applied.
かかる熱及び/又は光硬化性官能基が適宜ポリマー間を
架橋させることでポリマーの間の相互作用を強固に、膜
としての強度を向上させるものである。従って、かかる
熱及び/又は光硬化性官能基を更に含有する本発明の樹
脂は、酸化亜鉛粒子表面と結着樹脂の適切な吸着・被覆
を疎外することなく、結着樹脂間の相互作用を強め、そ
の結果、皮膜強度がより向上する効果を有するものであ
る。Such heat-curable and/or photo-curable functional groups suitably crosslink the polymers, thereby strengthening the interaction between the polymers and improving the strength of the film. Therefore, the resin of the present invention further containing such a heat-curable and/or photo-curable functional group can prevent the interaction between the binder resin and the zinc oxide particle surface without hindering the adsorption and coating of the binder resin. This has the effect of further improving the film strength.
本発明の樹脂(A)及び/又は〔B〕が該熱硬化性官能
基を含有する場合には、感光層膜中での架橋反応を促進
させるために、必要に応して反応促進剤を添加してもよ
い、官能基間の化学結合を形成する反応様式の場合には
、例えば有機酸(酢酸、プロピオン酸、酪酸、ベンゼン
スルホン酸、p−)ルエンスルホン酸等)、架橋剤等が
挙げられる。When the resin (A) and/or [B] of the present invention contains the thermosetting functional group, a reaction accelerator may be added as necessary to promote the crosslinking reaction in the photosensitive layer. In the case of a reaction mode that forms a chemical bond between functional groups that may be added, for example, organic acids (acetic acid, propionic acid, butyric acid, benzenesulfonic acid, p-)luenesulfonic acid, etc.), crosslinking agents, etc. Can be mentioned.
架橋剤としては、具体的には、山下晋三、金子東助編「
架橋剤ハンドブック」大成社刊(1981年)等に記載
されている化合物等を用いることができる0例えば、通
常用いられる有機シラン、ポリウレタン、ポリイソシア
ナートの如き架橋剤、エポキシ樹脂、メラミン樹脂の如
き硬化剤等を用いることができる。As a crosslinking agent, specifically, Shinzo Yamashita and Tosuke Kaneko ed.
Compounds described in "Crosslinking Agent Handbook" published by Taiseisha (1981) etc. can be used. For example, commonly used crosslinking agents such as organic silane, polyurethane, polyisocyanate, epoxy resin, melamine resin, etc. A curing agent or the like can be used.
重合性反応様式の場合には、重合開始剤(過酸化物、ア
ゾビス系化合物等が挙げられ、好ましくは、アゾビス系
重合開始剤である)、多官能重合性基含有の単量体(例
えばビニルメタクリレート、アリルメタクリレート、エ
チレングリコールジアクリレート、ポリエチレングリコ
ールジアクリレート、ジビニルコハク酸エステル、ジビ
ニルアジピン酸エステル、ジアリルコハク酸エステル、
2メチルビニルメタクリレート、ジビニルヘンゼン等)
等が挙げられる。In the case of a polymerizable reaction mode, a polymerization initiator (peroxide, azobis-based compound, etc., preferably an azobis-based polymerization initiator), a monomer containing a polyfunctional polymerizable group (for example, vinyl Methacrylate, allyl methacrylate, ethylene glycol diacrylate, polyethylene glycol diacrylate, divinyl succinate, divinyl adipate, diallyl succinate,
2-methylvinyl methacrylate, divinylhenzen, etc.)
etc.
また、本発明において、かかる熱硬化性官能基を含有す
る結着樹脂を用いる場合には熱硬化処理が行われる。こ
の熱硬化処理は従来の感光体作製時の乾燥条件を厳しく
することにより行うことができる0例えば、60℃〜1
20℃で5分〜120分間処理すればよい、上述の反応
促進剤を併用すると、より穏やかな条件で処理すること
が可能となる。Further, in the present invention, when using a binder resin containing such a thermosetting functional group, a thermosetting treatment is performed. This heat curing treatment can be carried out by tightening the drying conditions during conventional photoreceptor production. For example, from 60°C to 1
The treatment can be carried out at 20° C. for 5 to 120 minutes, and when the above-mentioned reaction accelerator is used in combination, the treatment can be carried out under milder conditions.
本発明に用いる樹脂(A)((A’ )も含む)と樹脂
〔B〕((B’ )も含む)の使用量の割合は、使用す
る無機光導電材料の種類、粒径、表面状態によって異な
るが一般に樹脂(A)と樹脂〔B〕の用いる割合は5〜
60対95〜40(重量比)であり、好ましくは10〜
40対90〜60(重量比)である。The ratio of the amount of resin (A) (including (A')) and resin [B] (including (B')) used in the present invention depends on the type, particle size, and surface condition of the inorganic photoconductive material used. Generally speaking, the ratio of resin (A) and resin [B] used is 5 to 5, although it varies depending on the
60:95-40 (weight ratio), preferably 10-40
The ratio is 40 to 90 to 60 (weight ratio).
本発明に使用する無機光導電材料としては、酸化亜鉛、
酸化チタン、硫化亜鉛、硫化カドミウム、炭酸カドミウ
ム、セレン化亜鉛、セレン化カドミウム、セレン化テル
ル、硫化鉛、等が挙げられる。Inorganic photoconductive materials used in the present invention include zinc oxide,
Examples include titanium oxide, zinc sulfide, cadmium sulfide, cadmium carbonate, zinc selenide, cadmium selenide, tellurium selenide, lead sulfide, and the like.
無機光導電材料に対して用いる結着樹脂の総量は、光導
電体100重量部に対して、結着樹脂を10〜100重
量部なる割合、好ましくは15〜50重量部なる割合で
使用する。The total amount of binder resin used for the inorganic photoconductive material is 10 to 100 parts by weight, preferably 15 to 50 parts by weight, per 100 parts by weight of the photoconductor.
本発明では、必要に応じて各種の色素を分光増感剤とし
て併用することができる0例えば、宮本晴視−武井秀彦
、イメージング、19i(lb8)第12頁、C,J、
Young等、 RCA Reviewl、)、 46
9 (1954)。In the present invention, various dyes can be used together as spectral sensitizers if necessary. For example, Harumi Miyamoto-Hidehiko Takei, Imaging, 19i (lb8) p. 12, C, J.
Young et al., RCA Review, ), 46
9 (1954).
清田航平等、電気通信学会論文誌1fl二C(No、2
)。Wataru Kiyota, Journal of the Institute of Electrical Communication Engineers 1fl2C (No, 2
).
97 (1980) 、原崎勇次等、工業化学雑誌匡
78及び188 (1963)、谷忠昭1日本写真学
会誌剥。97 (1980), Yuji Harasaki et al., Industrial Chemistry Magazine Tadashi
78 and 188 (1963), published by Tadaaki Tani, Journal of the Photographic Society of Japan.
20B (1972)等の総説引例のカーボニウム系
色素、ジフェニルメタン色素、トリフェニルメタン色素
、キサンチン系色素、フタレイン系色素、ポリメチン色
素(例えば、オキソノール色素、メロシアニン色素、シ
アニン色素、ロダシアニン色素、スチリル色素等)、フ
タロシアニン色素(金属含有してもよい)等が挙げられ
る。Carbonium dyes, diphenylmethane dyes, triphenylmethane dyes, xanthine dyes, phthalein dyes, polymethine dyes (e.g., oxonol dyes, merocyanine dyes, cyanine dyes, rhodacyanine dyes, styryl dyes, etc.) cited in reviews such as 20B (1972), etc. , phthalocyanine dyes (which may contain metal), and the like.
更ニ具体的には、カーボニウム系色素、トリフェニルメ
タン色素、キサンチン系色素、フタレイン系色素を中心
に用いたものとしては、特公昭51452号、特開昭5
0−90334号、特開昭50−114227号、特開
昭53−39130号、特開昭53−82353号、米
国特許第3,052,540号、米国特許第4.054
.450号、特開昭57−16456号等に記載のもの
が挙げられる。More specifically, examples of carbonium dyes, triphenylmethane dyes, xanthine dyes, and phthalein dyes are disclosed in Japanese Patent Publication No. 51452 and Japanese Patent Application Laid-open No. 5
0-90334, JP 50-114227, JP 53-39130, JP 53-82353, U.S. Patent No. 3,052,540, U.S. Patent No. 4.054
.. 450, JP-A-57-16456, and the like.
オキソノール色素、メロシアニン色素、シアニン色素、
ログシアニン色素等のポリメチン色素としては、P、’
M、Hars+mar rThe Cyanine
Dyes andRelated Compounds
J等に記載の色素類が使用可能であり、更に具体的に
は、米国特許第3.047,384号、米国特許第3.
110.591号、米国特許第3,121゜008号、
米国特許第3.125,447号、米国特許第3、12
8.179号、米国特許第3,132,942号、米国
特許第3.622,317号、英国特許第1,226.
892号、英国特許第1.309.274号、英国特許
第1,405.898号、特公昭48−7814号、特
公昭55−18892号等に記載の色素が挙げられる。oxonol dye, merocyanine dye, cyanine dye,
Polymethine dyes such as logcyanine dyes include P, '
M, Hars+mar The Cyanine
Dyes and Related Compounds
J. et al., and more specifically, U.S. Pat. No. 3,047,384, U.S. Pat.
No. 110.591, U.S. Patent No. 3,121°008;
U.S. Patent No. 3,125,447, U.S. Patent No. 3,12
8.179, U.S. Patent No. 3,132,942, U.S. Patent No. 3,622,317, British Patent No. 1,226.
892, British Patent No. 1.309.274, British Patent No. 1,405.898, Japanese Patent Publication No. 48-7814, Japanese Patent Publication No. 55-18892, and the like.
更に、700ns以上の長波長の近赤外〜赤外光域を分
光増感するポリメチン色素として、特開昭47840号
、特開昭47−44180号、特公昭51−41061
号、特開昭49−5034号、特開昭49−45122
号、特開昭5746245号、特開昭56−35141
号、特開昭57457254号、特開昭61−2604
4号、特開昭61−27551号、米国特許第3,61
9,154号、米国特許第4,175,956号、rR
esearch Disclosure J 1982
年、216、第117〜118頁等に記載のものが挙げ
られる0本発明の感光体は種々の増感色素を併用させて
も、その性能が増感色素により変動しにくい点において
優れている。更には、必要に応じて、化学増悪剤等の従
来知られている電子写真感光層用各種添加剤を併用する
こともできる0例えば、前記した総説:イメージングm
(Nf18)第12頁等の総説引例の電子受容性化合物
(例えば、ハロゲン、ベンゾキノン、クロラニル、酸無
水物、有機カルボン酸等)小門宏等、「最近の光導電材
料と感光体の開発・実用化」第4章〜第6章二日本科学
情報(株)出版部(1986年)の総説引例のポリアリ
ールアルカン化合物、ヒンダードフェノール化合物、p
−フェニレンジアミン化合物等が挙げられる。Furthermore, as a polymethine dye that spectrally sensitizes the near-infrared to infrared light region with a long wavelength of 700 ns or more, JP-A-47840, JP-A-47-44180, and JP-B-Sho 51-41061 are used.
No., JP-A-49-5034, JP-A-49-45122
No., JP-A-5746245, JP-A-56-35141
No., JP 57457254, JP 61-2604
No. 4, JP-A No. 61-27551, U.S. Patent No. 3,61
No. 9,154, U.S. Pat. No. 4,175,956, rR
search Disclosure J 1982
The photoreceptor of the present invention is excellent in that its performance does not easily vary depending on the sensitizing dye, even when various sensitizing dyes are used together. . Furthermore, if necessary, various conventionally known additives for electrophotographic photosensitive layers, such as chemical aggravating agents, may be used in combination.
(Nf18) Electron-accepting compounds (e.g., halogens, benzoquinones, chloranil, acid anhydrides, organic carboxylic acids, etc.) cited in the review on page 12, etc. Hiroshi Komon et al., “Recent developments in photoconductive materials and photoreceptors. "Practical Application" Chapters 4 to 6 2 Nippon Kagaku Information Co., Ltd. Publishing Department (1986) References to Polyarylalkane Compounds and Hindered Phenol Compounds, p.
-phenylenediamine compounds and the like.
これら各種添加剤の添加量は、特に限定的ではないが、
通常光導電体100重量部に対して0.0001〜2.
0重量部である。The amount of these various additives added is not particularly limited, but
Usually 0.0001 to 2.0 parts per 100 parts by weight of photoconductor.
It is 0 parts by weight.
光導電層の厚さは1〜100μ、特には10〜50μが
好適である。The thickness of the photoconductive layer is preferably 1 to 100 microns, particularly 10 to 50 microns.
また、電荷発生層と電荷輸送層の積層型感光体の電荷発
生層として光導電層を使用する場合は電荷発生層の厚さ
は0.01〜1μ、特には0.05〜0.5μが好適で
ある。In addition, when a photoconductive layer is used as a charge generation layer in a laminated photoreceptor consisting of a charge generation layer and a charge transport layer, the thickness of the charge generation layer is 0.01 to 1μ, particularly 0.05 to 0.5μ. suitable.
感光体の保護および耐久性、暗減衰特性の改善等を主目
的として絶縁層を付設させる場合もある。In some cases, an insulating layer is added mainly for the purpose of protecting the photoreceptor, improving its durability, dark decay characteristics, etc.
この時は絶縁層は比較的薄く設定され、感光体を特定の
電子写真プロセスに用いる場合に設けられる絶縁層は比
較的厚く設定される。At this time, the insulating layer is set to be relatively thin, and when the photoreceptor is used for a specific electrophotographic process, the insulating layer provided is set to be relatively thick.
後者の場合、絶縁層の厚さは、5〜70μ、特には、1
0〜50μに設定される。In the latter case, the thickness of the insulating layer is between 5 and 70μ, in particular 1
It is set to 0 to 50μ.
積層型感光体の電荷輸送材料としてはポリビニルカルバ
ゾール、オキサゾール系色素、ピラゾリン系色素、トリ
フェニルメタン系色素などがある。Charge transport materials for the laminated photoreceptor include polyvinylcarbazole, oxazole dyes, pyrazoline dyes, triphenylmethane dyes, and the like.
電荷輸送層の厚さとしては5〜40μ、特には10〜3
0μが好適である。The thickness of the charge transport layer is 5 to 40 μm, particularly 10 to 3 μm.
0μ is suitable.
絶縁層あるいは電荷輸送層の形成に用いる樹脂としては
、代表的なものは、ポリスチレン樹脂、ポリエステル樹
脂、セルロース樹脂、ポリエーテル樹脂、塩化ビニル樹
脂、酢酸ビニル樹脂、塩ビ酸ビ共重合体樹脂、ポリアク
リル樹脂、ポリオレフィン樹脂、ウレタン樹脂、エポキ
シ樹脂、メラミン樹脂、シリコン樹脂の熱可塑性樹脂及
び硬化性樹脂が適宜用いられる。Typical resins used to form the insulating layer or charge transport layer include polystyrene resin, polyester resin, cellulose resin, polyether resin, vinyl chloride resin, vinyl acetate resin, vinyl chloride copolymer resin, and polyvinyl chloride copolymer resin. Thermoplastic resins and curable resins such as acrylic resins, polyolefin resins, urethane resins, epoxy resins, melamine resins, and silicone resins are used as appropriate.
本発明による光導電層は、従来公知の支持体上に設ける
ことができる。一般に云って電子写真感光層の支持体は
、導電性であることが好ましく、導電性支持体としては
、従来と全く同様、例えば、金属、紙、プラスチックシ
ート等の基体に低抵抗性物質を含浸させるなどして導電
処理したもの、基体の裏面(感光層を設ける面と反対面
)に導電性を付与し、更にはカール防止を図る等の目的
で少なくとも1層以上をコートしたもの、前記支持体の
表面に耐水性接着層を設けたもの、前記支持体の表面層
に必要に応じて少なくとも1層以上のプレコート層が設
けられたもの、At等を蒸着した基体導電化プラスチッ
クを紙にラミネートしたもの等が使用できる。The photoconductive layer according to the invention can be provided on a conventionally known support. Generally speaking, the support for the electrophotographic photosensitive layer is preferably electrically conductive.As the electrically conductive support, for example, a base material such as metal, paper, or plastic sheet impregnated with a low-resistance substance is used in the same manner as in the past. those that have been subjected to conductive treatment, such as those that have been coated with at least one layer for the purpose of imparting conductivity to the back surface of the substrate (the surface opposite to the surface on which the photosensitive layer is provided) and also to prevent curling, and those that have been coated with at least one layer for the purpose of preventing curling, etc. Those with a water-resistant adhesive layer on the surface of the body, those with at least one pre-coat layer provided as necessary on the surface layer of the support, and those with a conductive plastic base coated with At or the like vapor-deposited on paper. You can use the ones that have been prepared.
具体的に、導電性基体あるいは導電化材料の例として、
坂本幸男、電子写真、14、(Nal)、p2〜11
(1975) 、森賀弘之、「入門特殊紙の化学」高分
子刊行会(1975) 、M、 F、 Hoover、
J。Specifically, examples of conductive substrates or conductive materials include:
Yukio Sakamoto, Electrophotography, 14, (Nal), p2-11
(1975), Hiroyuki Moriga, “Introductory Chemistry of Special Papers”, Kobunshi Publishing (1975), M, F, Hoover,
J.
Macromol、 Sci、 Chem、A −
4(6) 、 第1327〜1417頁(1970
)等に記載されているもの等を用いる。Macromol, Sci, Chem, A-
4(6), pp. 1327-1417 (1970
), etc. are used.
(実施例)
以下に本発明の実施例を例示するが、本発明の内容がこ
れらに限定されるものではない。(Example) Examples of the present invention are illustrated below, but the content of the present invention is not limited thereto.
樹脂(A)の合成例1:(A−1)
エチルメタクリレート95g及びテトラヒドロフラン2
00gの混合溶液を窒素気流下に充分に脱気し、20℃
に冷却した。1.1−ジフェニルブチルリチウム1.5
gを加え12時間反応した。更に、この混合溶液に、ト
リフェニルメチルメタクリレート5g及びテトラヒドロ
フラン5gの混合溶液を窒素気流下に充分に脱気した後
添加し、更に8時間反応した。この混合物を0℃にした
後、メタノール10m1を加え30分間反応し、重合を
停止させた。得られた重合体溶液を攪拌下にて温度30
℃とし、これに30%塩化水素エタノール溶液3I11
を加え1時間攪拌した6次に、減圧下に反応混合物を全
体量が半分になるまで溶媒を留去した後、石油エーテル
IIl中に再沈した。Synthesis Example 1 of Resin (A): (A-1) 95 g of ethyl methacrylate and 2 of tetrahydrofuran
00g of the mixed solution was thoroughly degassed under a nitrogen stream and heated to 20°C.
It was cooled to 1.1-diphenylbutyllithium 1.5
g was added and reacted for 12 hours. Further, a mixed solution of 5 g of triphenylmethyl methacrylate and 5 g of tetrahydrofuran was added to this mixed solution after being sufficiently degassed under a nitrogen stream, and the mixture was further reacted for 8 hours. After the mixture was cooled to 0° C., 10 ml of methanol was added and reacted for 30 minutes to terminate the polymerization. The obtained polymer solution was heated to a temperature of 30°C while stirring.
℃, and add 30% hydrogen chloride ethanol solution 3I11 to this.
was added and stirred for 1 hour.Next, the solvent was distilled off from the reaction mixture under reduced pressure until the total volume became half, and then reprecipitated into petroleum ether III.
沈澱物を捕集し、減圧乾燥して得られた重合体は、Pk
48.5X10’で収量70gであった。The polymer obtained by collecting the precipitate and drying it under reduced pressure has a Pk
The yield was 70 g at 48.5 x 10'.
(A−1)
(重量比)
bニブロック結合を示す(以下間*)
樹脂(A)の合成例1(A−23
n−ブチルメタクリレート46g、(テトラフェニルポ
ルフィナート)アルミニウムメチル0.5g及び塩化メ
チレン60gの混合溶液を窒素気流下にて温度30℃と
した。これに300W−キセノンランプ光をガラスフィ
ルターを通して25c+wの距離から光照射し、12時
間反応した。この混合物に更に、ベンジルメタクリレー
ト4gを加え、同様に8時間光照射した後、この反応混
合物にメタノール3gを加えて30分間攪拌し反応を停
止させた0次にこの反応混合物にPd−Cを加え、温度
25“Cで1時間接触還元反応を行なった。(A-1) (Weight ratio) b Indicates a niblock bond (Below *) Synthesis example 1 of resin (A) (A-23 46 g of n-butyl methacrylate, 0.5 g of aluminum methyl (tetraphenylporphinate) and A mixed solution of 60 g of methylene chloride was brought to a temperature of 30° C. under a nitrogen stream. This was irradiated with light from a 300 W xenon lamp from a distance of 25 c + w through a glass filter, and reacted for 12 hours. In addition, 4 g of benzyl methacrylate was added to this mixture. After 8 hours of light irradiation, 3 g of methanol was added to the reaction mixture and stirred for 30 minutes to stop the reaction.Next, Pd-C was added to the reaction mixture and the mixture was heated at 25"C for 1 hour. A catalytic reduction reaction was performed.
不溶物を濾別した後石油エーテル5001d中に再沈し
、沈澱物を捕集し乾燥した。得られた重合体は収量33
gでPS119.3X10”であった。After filtering out insoluble matters, the mixture was reprecipitated in petroleum ether 5001d, and the precipitate was collected and dried. The obtained polymer had a yield of 33
g and PS119.3×10”.
(A−2)
しりυし4n雫(n) しυυn樹脂(A)
の合成例1(A−3)
2−クロロ−6−メチルフェニルメタクリレート90g
及びトルエン200gの混合溶液を窒素気流下に充分に
脱気し0℃に冷却した0次いで1.1−ジフェニル−3
−メチルペンチルリチウム2.5gを加え、6時間攪拌
した。更にこの混合物に4−ビニルフェニルオキシトリ
メチルシラン10gを加え6時間攪拌した後、メタノー
ル3gを加えて30分間撹拌した。(A-2) Shiri υshi 4n drops (n) Shiri υυn resin (A)
Synthesis Example 1 (A-3) 90 g of 2-chloro-6-methylphenyl methacrylate
A mixed solution of 200 g of toluene was thoroughly degassed under a nitrogen stream and cooled to 0°C.
- 2.5 g of methylpentyl lithium was added and stirred for 6 hours. Further, 10 g of 4-vinylphenyloxytrimethylsilane was added to this mixture and stirred for 6 hours, and then 3 g of methanol was added and stirred for 30 minutes.
次にこの反応混合物に30%塩化水素エタノール溶液1
0gを加え25℃で1時間攪拌した後、石油エーテルl
l中に再沈し捕集した沈澱物をジエチルエーテル300
mで2回洗浄し乾燥した。得られた重合体ハ、収量58
g i’Uw 7.8 X 10’ i” アラた。Next, add 1 part of 30% hydrogen chloride ethanol solution to this reaction mixture.
After adding 0 g of petroleum ether and stirring at 25°C for 1 hour,
The precipitate reprecipitated and collected in 300 g of diethyl ether
Washed twice with m and dried. Obtained polymer C, yield 58
g i'Uw 7.8 X 10' i” Arata.
(A−3)
樹脂(A)の合成例4:(A−4)
フェニルメタクリレート95g1ヘンシルN、 Nジエ
チルジチオカーバメート4.8gの混合物を、窒素気流
下に容器に密閉し、温度60°Cに加温した。(A-3) Synthesis Example 4 of Resin (A): (A-4) A mixture of 95 g of phenyl methacrylate and 4.8 g of Hensyl N, N diethyldithiocarbamate was sealed in a container under a nitrogen stream and heated to a temperature of 60°C. Warmed.
これに、400−の高圧水銀灯で10ci+の距離から
ガラスフィルターを通して、10時間光照射し光重合し
た。This was irradiated with light for 10 hours through a glass filter from a distance of 10 ci+ using a 400 - high pressure mercury lamp for photopolymerization.
これにアクリル酸5g及びメチルエチルケトン180g
を加えた後窒素置換し、再び10時間光照射した。Add to this 5 g of acrylic acid and 180 g of methyl ethyl ketone.
After adding , the atmosphere was replaced with nitrogen, and light was irradiated again for 10 hours.
得られた反応物をヘキサン1.51に再沈、捕集し乾燥
した。得られた重合体は、68gで〜9.5×103で
あった。The obtained reaction product was reprecipitated in 1.5 ml of hexane, collected and dried. The resulting polymer was 68 g and ˜9.5×10 3 .
(A−4)
樹脂(A)の合成例5〜16
前記樹脂(A)の合成例と同様にして下記表−1に示す
樹脂(A)を合成した。(A-4) Synthesis Examples 5 to 16 of Resin (A) Resin (A) shown in Table 1 below was synthesized in the same manner as in the synthesis example of Resin (A).
表 CH。table CH.
各樹脂(A)の〜は6X10’ 〜9.5X10’ であ うた。~ of each resin (A) is 6X10' ~9.5X10' And Song.
(以下余白)
樹脂(A)の合成例19〜23
前記樹脂(A)の合成例〔4〕と同様にして下記表−2
に示す樹脂(A)を合成した。各樹脂の〜は8X10”
〜1×103であった。(The following is a blank space) Synthesis Examples 19 to 23 of Resin (A) The following Table 2 was prepared in the same manner as in Synthesis Example [4] of Resin (A).
Resin (A) shown in was synthesized. Each resin is 8X10”
~1×103.
(以下余白)
マクロモノマーの合成例1:M−1
1.4−ブタンジオール90.1g、無水コハク酸10
5.1g、p−)ルエンスルホン酸1水和物1.6g及
びトルエン200gの混合物を、Dean−StarR
還流装置を付したフラスコ中で攪拌しながら還流下に4
時間加熱した。トルエン溶媒とともに共沸で留去された
水の量は17.5 gであった。(Left below) Macromonomer synthesis example 1: M-1 90.1 g of 1,4-butanediol, 10 succinic anhydride
A mixture of 1.6 g of p-)luenesulfonic acid monohydrate and 200 g of toluene was added to a Dean-Star®
4 hours under reflux with stirring in a flask equipped with a reflux device.
heated for an hour. The amount of water distilled off azeotropically with the toluene solvent was 17.5 g.
次に、アクリル酸17.2g及びトルエン150gの混
合溶液とt−ブチルハイドロキノン1.0gを上記反応
物に加えた後、更に攪拌しながら還流下に4時間反応し
た。室温に冷却後、メタノール21中に再沈し、析出し
た固形物を濾集し、減圧乾燥した。Next, a mixed solution of 17.2 g of acrylic acid and 150 g of toluene and 1.0 g of t-butylhydroquinone were added to the above reaction mixture, and the mixture was further reacted under reflux for 4 hours with stirring. After cooling to room temperature, it was reprecipitated into methanol 21, and the precipitated solid was collected by filtration and dried under reduced pressure.
収量は135gで、得られたマクロモノマーの(M−1
)重量平均分子量は6.8 XIO”であった。The yield was 135 g, and the obtained macromonomer (M-1
) The weight average molecular weight was 6.8 XIO''.
(M−1)
Cut−CH−Coo廿CHz÷「OCO−(CH*テ
rcOo)Hマクロモノマーの合成例2:M−2
1,6−ヘキサンジオール120g、無水ゲルタン酸1
14.1g、、P )ルエンスルホン酸l水和物3.
0g及びトルエン250gの混合物を、マクロモノマー
の合成例1と同様の条件で反応した。共沸で留去した水
の量は17.5gであった。(M-1) Cut-CH-Coo−CHz÷“OCO-(CH*tercOo)H Macromonomer synthesis example 2: M-2 1,6-hexanediol 120 g, geltanic anhydride 1
14.1 g,, P ) Luenesulfonic acid l hydrate 3.
A mixture of 0 g and 250 g of toluene was reacted under the same conditions as in Macromonomer Synthesis Example 1. The amount of water distilled off azeotropically was 17.5 g.
室温に冷却後n−ヘキサン21中に再沈し、液状物をデ
カント後補集し、減圧下に乾燥した。After cooling to room temperature, it was reprecipitated into n-hexane 21, and the liquid was collected after being decanted, and dried under reduced pressure.
上記反応性成物をトルエンに溶解し、0.IN水酸化カ
リウムメタノール溶液で中和滴定する方法によりカルボ
キシル基含量を測定したところ、500μ驕o1/gr
、 となったφ
上記固形物100g、メタクリル酸8.6g、 t−ブ
チルハイドロキノン1.0g及び塩化メチレン200g
の混合物を、室温で攪拌下に溶解した。The above reactive components were dissolved in toluene and 0. When the carboxyl group content was measured by neutralization titration with IN potassium hydroxide methanol solution, it was found to be 500μ o1/gr.
, φ became 100 g of the above solid, 8.6 g of methacrylic acid, 1.0 g of t-butylhydroquinone, and 200 g of methylene chloride.
The mixture was dissolved under stirring at room temperature.
ジシクロへキシルカルボジイミド(D、C,C)20.
3g。Dicyclohexylcarbodiimide (D, C, C) 20.
3g.
4−(N、N−ジメチル)アミノピリジン0.5g及び
塩化メチレン100gの混合溶液を、攪拌下に上記混合
物に1時間で滴定した。更にそのまま4時間攪拌した。A mixed solution of 0.5 g of 4-(N,N-dimethyl)aminopyridine and 100 g of methylene chloride was titrated into the above mixture for 1 hour while stirring. The mixture was further stirred for 4 hours.
D、C,C溶液を滴下するにつれ、不溶の結晶が析出し
た0反応混合物を200メツシユのナイロン布を通して
不溶物を濾別した。As the solutions D, C, and C were added dropwise, insoluble crystals were precipitated from the reaction mixture, and the insoluble matter was filtered through a 200 mesh nylon cloth.
濾液をヘキサン2!中に再沈し、粉末を濾集した。これ
にアセトン500mを加え1時間攪拌した後、不溶解舒
を濾紙を用いて自然濾過した。濾液を全体量が乙になる
まで減圧濃縮した後、この溶液をエーテルll中に加え
1時間攪拌した。析出した固形物を濾集し、減圧乾燥し
た。2 hexane for the filtrate! The powder was collected by filtration. After adding 500 ml of acetone and stirring for 1 hour, the undissolved soybean was filtered by gravity using a filter paper. After the filtrate was concentrated under reduced pressure until the total volume was 2, the solution was added to 1 liter of ether and stirred for 1 hour. The precipitated solid was collected by filtration and dried under reduced pressure.
収量53gで得られたマクロモノマー(M−2)の重量
平均分子量は8.2X103であった。The weight average molecular weight of the macromonomer (M-2) obtained in a yield of 53 g was 8.2×10 3 .
(M−2)
マクロモノマーの合成例3:M−3
12−ヒドロキシステアリン酸500gを、外温150
℃の油浴中で、10〜15smHHの減圧下、生成する
水を留去しながら10時間攪拌した。(M-2) Macromonomer synthesis example 3: M-3 500 g of 12-hydroxystearic acid was heated at an external temperature of 150 g.
The mixture was stirred in an oil bath at 10° C. under reduced pressure of 10 to 15 smHH for 10 hours while distilling off the water produced.
得られた液状物のカルボキシル基含量は600μmol
/grであった。上記液状物100g、メタクリル酸=
水物ts、sg 、 t−ブチルハイドロキノン1.
5g及びテトラヒドロフラン200gの混合溶液を、温
度40〜45℃で6時間撹拌した。反応混合物を水1!
中に、攪拌下に1時間で滴下し、更に1時間攪拌した。The carboxyl group content of the obtained liquid was 600 μmol.
/gr. 100g of the above liquid, methacrylic acid =
Water ts, sg, t-butylhydroquinone 1.
A mixed solution of 5 g and 200 g of tetrahydrofuran was stirred at a temperature of 40 to 45°C for 6 hours. Add 1 part water to the reaction mixture!
The solution was added dropwise to the solution over 1 hour while stirring, and the mixture was further stirred for 1 hour.
静置して、沈降した液状物をデカンテーションで取り出
し、 THF 200gに溶解し、メタノールll中に
再沈した。沈降した液状物をデカンテーションで取り出
し、減圧乾燥した。The precipitated liquid was taken out by decantation, dissolved in 200 g of THF, and reprecipitated in 1 liter of methanol. The precipitated liquid was taken out by decantation and dried under reduced pressure.
収162gでマクロモノマー(M−3)の重量平均分子
量は6.7 XIO″であった。The yield was 162 g, and the weight average molecular weight of the macromonomer (M-3) was 6.7 XIO''.
(M−3)
マクロモノマーの合成例4:M−4
S、Penczek et al、 Makro
mol、Chem、 188. 1347(1987
)に記載の合成法に従って、下記構造のマクロモノマー
(M−4)を合成した。(M-3) Macromonomer synthesis example 4: M-4 S, Penczek et al, Makro
mol, Chem, 188. 1347 (1987
), a macromonomer (M-4) having the following structure was synthesized.
重量平均分子量: ?、3X10’ マクロモノマーの合成例5:M−5 マクロ七ツマ−(M−4) 50g、メタノール3g。Weight average molecular weight: ? , 3X10' Macromonomer synthesis example 5: M-5 Macro Nanatsuma (M-4) 50g, methanol 3g.
L−ブチルハイドロキノン0.5g及び塩化メチレン1
50gの混合溶液に、D、C,C,6g 、 4−N、
N−ジメチルアミノピリジン0.1g及び塩化メチレン
10gの混合溶液を温度20〜25°Cで攪拌下に30
分間で滴下し、そのまま更に4時間攪拌した。この反応
混合物にギ酸5gを加えて1時間攪拌した後、析出した
不溶物を濾別した。濾液をメタノールll中に再沈し、
溶媒をデカンテーションで取り除き沈澱物を補集し減圧
乾燥した。得られた粘稠物は、収量28gで〜は7.5
X 103であった。L-butylhydroquinone 0.5g and methylene chloride 1
To 50 g of mixed solution, D, C, C, 6 g, 4-N,
A mixed solution of 0.1 g of N-dimethylaminopyridine and 10 g of methylene chloride was stirred at a temperature of 20 to 25°C for 30 minutes.
The mixture was added dropwise over a period of minutes, and the mixture was further stirred for 4 hours. After adding 5 g of formic acid to this reaction mixture and stirring for 1 hour, the precipitated insoluble matter was filtered off. The filtrate was reprecipitated into 1 liter of methanol,
The solvent was removed by decantation, and the precipitate was collected and dried under reduced pressure. The obtained viscous substance has a yield of 28 g and a ~7.5
It was X 103.
(M−5)
CHl
本発明の樹脂〔B〕合成例1 : [B−1]エチルメ
タクリレ−)85g、マクロモノマーの合成例1の化合
物(M−1) 15g及びトルエン200gの混合物を
窒素気流下に温度75℃に加温した。(M-5) CHl Resin of the present invention [B] Synthesis Example 1: A mixture of 85 g of [B-1] ethyl methacrylate), 15 g of the macromonomer compound (M-1) of Synthesis Example 1, and 200 g of toluene was heated with nitrogen. The mixture was heated to a temperature of 75° C. under air flow.
11’−アゾビス(シクロヘキサン−1−カルボニトリ
ル)(略称A、B、C,C,)0.6 gを加え4時間
攪拌した。更に、A、B、C,C,0,3gを加え3時
間、その後更にA、B、C,C,0,2gを加え4時間
攪拌した。得られた共重合体の〜は9. I X 10
’であった。0.6 g of 11'-azobis(cyclohexane-1-carbonitrile) (abbreviated as A, B, C, C,) was added and stirred for 4 hours. Further, 0.3 g of A, B, C, and C were added for 3 hours, and then 0.2 g of A, B, C, and C were added and stirred for 4 hours. ~ of the obtained copolymer is 9. I x 10
'Met.
CB−1)
CHff CH3
本発明の樹脂〔B〕の合成例2 : [B−2]ベンジ
ルメタクリレ一ト95g1マクロモノマーの合成例4の
化合物(M−4) 5g、 )ルエン200gの混合
物を、窒素気流下に温度75°Cに加温した。4゜4゛
−アゾビス(2−シアノ吉草酸)(略称: A、C,V
、)0.6gを加え、4時間攪拌した0次に、A、C,
V、0.3gを加え3時間、更にその後A、CJ、0.
2gを加え、3時間攪拌した。得られた共重合体の重量
平均分子量は1.2×104であった。CB-1) CHff CH3 Synthesis Example 2 of the resin [B] of the present invention: [B-2] 95 g of benzyl methacrylate 1 5 g of the compound (M-4) of Synthesis Example 4 of the macromonomer, 200 g of toluene , and heated to a temperature of 75°C under a nitrogen stream. 4゜4゛-azobis(2-cyanovaleric acid) (abbreviation: A, C, V
, ) 0.6g was added and stirred for 4 hours. Next, A, C,
V, 0.3g was added for 3 hours, and then A, CJ, 0.
2 g was added and stirred for 3 hours. The weight average molecular weight of the obtained copolymer was 1.2 x 104.
(B−2)
本発明の樹脂〔B〕の合成例3〜13 : [B−3〜
[8−13]樹脂〔B〕の合成例1と同様の重合条件で
、下記表−3の各樹脂と各々合成した。(B-2) Synthesis examples 3 to 13 of resin [B] of the present invention: [B-3 to
[8-13] Each resin in Table 3 below was synthesized under the same polymerization conditions as in Synthesis Example 1 of Resin [B].
(以下余白)
本発明の樹脂〔B〕の合成例14〜23: [B−14
1〜[B−23]
樹脂〔B〕の合成例1において、連鎖移動剤として下記
メルカプト化合物を用いて、同様の重合条件で、表−4
の樹脂CB)を各々製造した。(Hereinafter, blank spaces) Synthesis Examples 14 to 23 of the resin [B] of the present invention: [B-14
1 to [B-23] In Synthesis Example 1 of Resin [B], using the following mercapto compound as a chain transfer agent and under the same polymerization conditions, Table-4
Resins CB) were produced.
(以下余白)
本発明の樹脂〔B〕の合成例24〜31: [B−24
]〜[B−311
樹脂CB)の合成例2において、アゾビス化合物として
、A、C,V、の代わりに他のアゾビス化合物に代えて
、同様の重合条件で表−5の樹脂(B3を各々製造した
。各樹脂〔B〕の〜は8.OXIO’〜2×104であ
った。(Hereinafter, blank space) Synthesis examples 24 to 31 of resin [B] of the present invention: [B-24
] ~ [B-311 In Synthesis Example 2 of Resin CB), A, C, and V were replaced with other azobis compounds, and the resins in Table 5 (B3 were each treated under the same polymerization conditions). Each resin [B] had ~8.OXIO'~2x104.
(以下余白)
本発明の樹脂〔B〕の合成例32〜41: [B−32
]〜[8−41]樹脂〔B〕の合成例1における、重合
条件と同様にして、下記表−6の各樹脂〔B〕を合成し
た。(Hereinafter, blank spaces) Synthesis examples 32 to 41 of resin [B] of the present invention: [B-32
] to [8-41] Each resin [B] in Table 6 below was synthesized under the same polymerization conditions as in Synthesis Example 1 of Resin [B].
得られた共重合体の〜は9.OXIO’〜1.2 XI
O’であった。~ of the obtained copolymer is 9. OXIO'~1.2 XI
It was O'.
(以下余白)
樹脂(B−423の合成例: [B−42)ベンジルメ
タクリレート80g、マクロモノマーの合成例5の化合
物(M〜5)20g、トルエン200gの混合物を、樹
脂(B−2)の合成例と同様の重合条件で反応し、樹脂
(B−42)を合成した。得られた共重合体の重量平均
分子量は9.8X10’であった。(Blank below) Synthesis example of resin (B-423): [B-42] A mixture of 80 g of benzyl methacrylate, 20 g of the compound (M to 5) of macromonomer synthesis example 5, and 200 g of toluene was added to the resin (B-2). The reaction was carried out under the same polymerization conditions as in the synthesis example to synthesize resin (B-42). The weight average molecular weight of the obtained copolymer was 9.8×10′.
(B−42)
(以下余白)
1〜2 び A−B
樹脂(A−18) 6 g (固形分量として)、樹脂
(B−1)34g(固形分量として)、下記構造のシア
ニン色素[1) 0.018g及びトルエン300gの
混合物をボールミル中で4時間分散して、感光層形成物
を調製し、これを導電処理した紙に、乾燥付着量が25
g/rdとなる様に、ワイヤーバーで塗布し、110°
Cで30秒間乾燥し、ついで暗所で20″C65%RH
の条件下で24時間放置することにより、電子写真感光
材料を作製した。(B-42) (blank below) 1-2 A-B Resin (A-18) 6 g (as solid content), Resin (B-1) 34 g (as solid content), Cyanine dye with the following structure [1 ) A mixture of 0.018 g and 300 g of toluene was dispersed in a ball mill for 4 hours to prepare a photosensitive layer-forming product, and this was applied to conductive-treated paper with a dry adhesion weight of 25.
Apply with a wire bar so that g/rd is 110°
Dry for 30 seconds at C, then dry at 20"C 65% RH in the dark.
An electrophotographic light-sensitive material was produced by leaving it for 24 hours under the following conditions.
シアニン色素(1)
実施例2
実施例1において、樹脂(A−18) 6 gの代わり
に、樹脂(A−5)6g(固形分量として)を用いた他
は、実施例1と同様に操作して、電子写真感光写真材料
を作製した。Cyanine dye (1) Example 2 The procedure was the same as in Example 1, except that 6 g of resin (A-5) (as solid content) was used instead of 6 g of resin (A-18). In this way, an electrophotographic photosensitive photographic material was produced.
此ILへ二
実施例1において、樹脂[A−18] 6 gノ代わり
に下記構造の樹脂(R−1)6gを用いた他は、実施例
1と同様に操作して電子写真感光材料を作製した。An electrophotographic photosensitive material was prepared in the same manner as in Example 1, except that 6 g of resin (R-1) having the following structure was used instead of 6 g of resin [A-18] in Example 1. Created.
比較用樹脂(R−1)
CH3CH3
fw 6X10” (ランダム共重合体)此Jfd
Li:
実施例1において、樹脂(A−18)6gの代わりに下
記構造の樹脂(R−2)6gとした他は、実施例1と同
様に操作して電子写真感光材料を作製した。Comparative resin (R-1) CH3CH3 fw 6X10” (Random copolymer) This Jfd
Li: An electrophotographic light-sensitive material was prepared in the same manner as in Example 1, except that 6 g of resin (R-2) having the following structure was used instead of 6 g of resin (A-18).
(R−2) CH。(R-2) CH.
HOOC−CHz−3−(CHt−C)−CC00CH
xCJ
sFr 8.0xlO’
これらの感光材料について、静電特性、撮像性及ヒ環境
条件<2o℃、 65%RH)及ヒ(30”C,80%
RH)とした時の撮像性を調べた。HOOC-CHz-3-(CHt-C)-CC00CH
x CJ sFr 8.0
RH) was investigated.
以上の結果をまとめて表−7に示す。The above results are summarized in Table-7.
(以下余白)
表−7に示した評価項目の実施の態様は以下の通りであ
る。(Left space below) The implementation of the evaluation items shown in Table 7 is as follows.
注1)静電特性:
温度20℃、65%R11の暗室中で、各感光材料にペ
ーパーアナライザー(川口1tl!■製ペーパーアナラ
イザー5P−428型)を用イア −6kV テ20秒
間コロナ放電させた後、10秒間放置し、この時の表面
電位v1゜を測定した。次いでそのまま暗中で90秒間
静置させた後の電位v1゜。を測定し、90秒間暗減衰
させた後の電位の保持性、即ち、暗減衰保持率(DRR
(χ)〕を(V+*a/V+o) X100(%)で求
めた。Note 1) Electrostatic properties: In a dark room at a temperature of 20°C and 65% R11, corona discharge was applied to each photosensitive material using a paper analyzer (Paper Analyzer 5P-428 model manufactured by Kawaguchi 1TL! ■) for 20 seconds at -6 kV. After that, it was left to stand for 10 seconds, and the surface potential v1° at this time was measured. Then, the potential was v1° after being allowed to stand still in the dark for 90 seconds. The retention of the potential after dark decaying for 90 seconds, that is, the dark decay retention rate (DRR)
(χ)] was calculated as (V+*a/V+o)X100(%).
又コロナ放電により光導電層表面を−400Vに帯電さ
せた後、該光導電層表面をガリウムーアルミニウムーヒ
素半導体レーザー(発振波長7B0nm)光で照射し、
表面電位(V、。)が1/10に減衰するまでの時間を
求め、これから露光量E、/1゜(erg/d)を算出
する。又、同様に表面電位(V+。)が1 /100に
減衰するまでの時間を求め、これから露光量El/+6
゜(6rg/cd)を算出する。測定時の環境条件は、
20℃、65%RH(1)と30℃、80%RH(It
)で行なった。Further, after charging the surface of the photoconductive layer to -400 V by corona discharge, the surface of the photoconductive layer is irradiated with gallium-aluminum-arsenic semiconductor laser (oscillation wavelength 7B0 nm) light,
The time required for the surface potential (V,.) to attenuate to 1/10 is determined, and the exposure amount E,/1° (erg/d) is calculated from this time. Similarly, find the time until the surface potential (V+) attenuates to 1/100, and calculate the exposure amount El/+6 from this.
Calculate °(6rg/cd). The environmental conditions at the time of measurement are:
20°C, 65% RH (1) and 30°C, 80% RH (It
).
注2)撮像性:
各感光材料を以下の環境条件で1昼夜放置した後、各感
光材料を一6kVで帯電し、光源として2.8mW出力
のガリウムーアルミニウムーヒ素、半導体レーザー(発
振波長780nm )を用いて、感光材料表面上で64
erg/c1iの照射量下、ピッチ254及びスキャニ
ング速度300m/secのスピード露光後液体現像剤
として、ELP−T (富士写真フィルム■製)を用い
て現像し、定着することで得られた複写画像(カブリ、
画像の画質)を目視評価した。Note 2) Imaging performance: After leaving each photosensitive material for one day and night under the following environmental conditions, each photosensitive material was charged at -6 kV, and a gallium-aluminum-arsenic semiconductor laser (oscillation wavelength 780 nm) with a 2.8 mW output was used as a light source. ) on the surface of the photosensitive material.
Copied image obtained by developing and fixing using ELP-T (manufactured by Fuji Photo Film ■) as a liquid developer after exposure at a pitch of 254 and a scanning speed of 300 m/sec under an irradiation dose of erg/c1i (Kabri,
Image quality) was visually evaluated.
撮像時の環境条件は20℃65%RH(1)と30°C
80%RH(It)で実施した。Environmental conditions during imaging were 20°C, 65% RH (1) and 30°C.
It was carried out at 80% RH (It).
表−7に示す様に、本発明の感光材料は、静電特性が良
好で、実際の複写画像も地力プリがなく複写画質も鮮明
であった。一方比較例A、Bは、帯電電位(V+O)の
低下あるいは、光感度(El/I。及びE1/1゜。)
の低下が生じ、実際の複写画像でも画像の濃度(D、)
の低下、それによる細線・文字等のカスレ、地力プリの
発生が生じてしまった。As shown in Table 7, the photosensitive material of the present invention had good electrostatic properties, and the actual copied images had no ground force and the quality of the copied images was clear. On the other hand, in Comparative Examples A and B, the charging potential (V+O) decreased or the photosensitivity (El/I. and E1/1°.)
There is a decrease in image density (D,) even in actual copied images.
As a result, fine lines, letters, etc. became blurred, and the appearance of smudges occurred.
特に、本発明の感光体と比較例の感光体とではEl/1
0゜値が大きく異なる。E171゜。値は、実際の撮像
性において、露光後、非画像部(既に露光された部位)
にどれだけの電位が残っているかを示すものであり、こ
の値が小さい程現像後の非画像部の地汚れが生しなくな
る事を示す。In particular, in the photoreceptor of the present invention and the photoreceptor of the comparative example, El/1
The 0° values are significantly different. E171°. The value is the non-image area (already exposed area) after exposure in actual imaging performance.
This shows how much potential remains in the image, and the smaller this value is, the less background smear will occur in the non-image area after development.
具体的には一10V以下の残留電位にすることが必要と
なり、即ち実際にはVR−10V以下とするために、ど
れだけ露光量が必要となるかということで、半導体レー
ザー光によるスキャンニング露光方式では、小さい露光
量で■、を−1Ov以下にすることは、複写機の光学系
の設計上(装置のコスト、光学系光路の精度等)非常に
重要なことである。Specifically, it is necessary to make the residual potential below -10V, that is, how much exposure is required to actually make it below VR-10V?Scanning exposure using semiconductor laser light In this method, it is very important to reduce (1) to -1 Ov or less with a small exposure amount in terms of the design of the optical system of the copying machine (device cost, precision of the optical system optical path, etc.).
以上のことより、本発明の樹脂を用いた場合にのみ静電
特性を満足する電子写真感光体が得られる。From the above, an electrophotographic photoreceptor that satisfies electrostatic properties can be obtained only when the resin of the present invention is used.
更に、本発明の樹脂を用いた場合においても、特定の置
換基を有するメタクリレート成分を含有する樹脂〔A〕
から成る実施例2の方が実施例1に比べてより静電特性
が向上し、特に半導体装置ザー光スキャニング露光方式
の感光体システムに優位になることが明らかとなった。Furthermore, even when the resin of the present invention is used, the resin [A] containing a methacrylate component having a specific substituent
It has become clear that Example 2, consisting of the following, has better electrostatic properties than Example 1, and is especially advantageous for photoreceptor systems using laser beam scanning exposure methods for semiconductor devices.
実施例3
合成例で製造した樹脂(A−3)6.5g(固形分量と
して)、下記構造の樹脂(B −3) 33.5g、酸
化亜鉛200g、下記構造のシアニン色素(If)0.
018g、無水フタル酸0.30g及びトルエン300
gの混合物をボールミル中で4時間分散した。これを導
電処理した紙に、乾燥付着量が25g/ rdとなる様
に、ワイヤーバーで塗布し、100℃で30秒間乾燥し
た。Example 3 6.5 g (as solid content) of the resin (A-3) produced in the synthesis example, 33.5 g of the resin (B-3) having the following structure, 200 g of zinc oxide, and 0.0 g of the cyanine dye (If) having the following structure.
018g, phthalic anhydride 0.30g and toluene 300g
The mixture of g was dispersed in a ball mill for 4 hours. This was applied to electrically conductive treated paper using a wire bar so that the dry adhesion amount was 25 g/rd, and dried at 100°C for 30 seconds.
ついで暗所で20℃、65%RHの条件下で24時間放
置することにより、電子写真感光材料を作製した。Then, an electrophotographic light-sensitive material was prepared by leaving it in a dark place for 24 hours at 20° C. and 65% RH.
シアニン色素(II)
この感光材料の皮膜性(表面の平滑度)、静電特性、撮
像性、印刷性及び環境条件を30℃、80%RHとした
時の静電特性、撮像性及び印刷性を調べた。Cyanine dye (II) Film properties (surface smoothness), electrostatic properties, imaging properties, printability of this photosensitive material, and electrostatic properties, imaging properties, and printability when the environmental conditions are 30°C and 80% RH. I looked into it.
表
表−8に示した評価項目の実施の態様は以下の通りであ
る。The implementation of the evaluation items shown in Table 8 is as follows.
注3)表面層の平滑性:
得られた感光材料は、ベック平滑度試験機(熊谷理工■
製)を用い、空気容量1ccの条件にて、その平滑度(
sec/cc)を測定した。Note 3) Smoothness of surface layer: The obtained photosensitive material was tested using a Beck smoothness tester (Kumagai Riko ■
The smoothness (
sec/cc) was measured.
注4)水との接触角:
各感光材料を不感脂化処理液EPL−EX (富士写真
フィルム■製)を蒸留水で2倍に希釈した溶液を用いて
、エツチングプロセッサーに1回通して光導電層面を不
感脂化処理した後、これに蒸留水2.1の水滴を乗せ、
形成された水との接触角をゴニオメータ−で測定する。Note 4) Contact angle with water: Each photosensitive material is exposed to light by passing it through an etching processor once using a solution prepared by diluting the desensitizing liquid EPL-EX (manufactured by Fuji Photo Film) twice with distilled water. After desensitizing the conductive layer surface, place 2.1 drops of distilled water on it,
The formed contact angle with water is measured with a goniometer.
注5)耐刷性:
前記性2)の撮像性と同条件にして、製版して、トナー
画像を形成し、上記性4)と同条件で不感脂化処理し、
これをオフセットマスターとして、オフセット印刷機(
桜井製作所■製オリバー52型)にかけ、印刷物の非画
像部の地汚れ及び画像部の画質に問題が生じないで印刷
できる枚数を示す(印刷枚数が多い程、耐剛性が良好な
ことを表わす)。Note 5) Printing durability: A toner image is formed by making a plate under the same conditions as the imaging performance in property 2) above, and is desensitized under the same conditions as property 4) above.
Use this as an offset master on an offset printing machine (
This indicates the number of sheets that can be printed without causing problems with background stains in the non-image areas of the printed matter and image quality in the image areas (the higher the number of prints, the better the rigidity resistance). .
表−8に示す様に、本発明の感光材料は、光導電層の平
滑性膜の機械的強度及び静電特性が良好で、実際の複写
画像も地力ブリがなく複写画質も鮮明であった。このこ
とは光導電体と結着樹脂が充分に吸着し、且つ、粒子表
面を被覆していることによるものと推定される。同様の
理由で、オフセントマスター原版として用いた場合でも
不感脂化処理液による不感脂化処理が充分に進行し、非
画像部の水との接触角が10度以下と小さく、充分に親
水化されていることが判る。実際に印刷して印刷物の地
汚れを観察しても地汚れは全く認められず、鮮明な画質
の印刷物が9000枚得られた。As shown in Table 8, in the photosensitive material of the present invention, the smooth film of the photoconductive layer had good mechanical strength and electrostatic properties, and the actual copied images had no blurring and the quality of the copied images was clear. . This is presumed to be due to the photoconductor and the binder resin being sufficiently adsorbed and covering the particle surface. For the same reason, even when used as an offset master original, the desensitization treatment with the desensitization treatment liquid progresses sufficiently, and the contact angle with water in the non-image area is as small as 10 degrees or less, making it sufficiently hydrophilic. It can be seen that it has been done. Even when the printed matter was actually printed and the background smear was observed, no background smudge was observed, and 9000 printed matter with clear image quality were obtained.
以上の事は、樹脂(A)の作用を疎外することなく、樹
脂〔B〕あるいは樹脂CB)と架橋剤の働きによって、
膜の強度を著しく向上させていることを示すものである
。The above can be achieved by the action of resin [B] or resin CB) and crosslinking agent without alienating the action of resin (A).
This shows that the strength of the film has been significantly improved.
裏隻班土二廿
実施例1において、樹脂(A−18)及び樹脂(B−1
)に代えて、下記表−9の各樹脂(A〕及び各樹脂〔B
〕に代えた他は、実施例1と同様に操作して、各電子写
真感光体を作製した。In Example 1, resin (A-18) and resin (B-1
) in place of each resin (A) and each resin [B] in Table 9 below.
] Each electrophotographic photoreceptor was produced in the same manner as in Example 1, except that
実施例1と同様にして静電特性を測定した。結果を表−
9に示す。Electrostatic properties were measured in the same manner as in Example 1. Display the results -
9.
表
静電特性慰
(30℃、(資)%R11)条件下での測定値又、オフ
セットマスター原版として用いて、実施例1と同様にし
て印刷した所、いずれも1万枚以上印刷することができ
た。Measured values under conditions of surface electrostatic properties (30°C, %R11). Also, when used as an offset master master plate and printed in the same manner as in Example 1, 10,000 or more copies were printed in each case. was completed.
以上から、本発明の各感光材料は光導電層の平滑性、膜
強度、静電特性及び印刷性の全ての点において良好なも
のであった。From the above, each of the photosensitive materials of the present invention was good in all respects of the smoothness of the photoconductive layer, film strength, electrostatic properties, and printability.
さらに、樹脂(A′〕を用いることにより静電特性がさ
らに向上することが判った。Furthermore, it was found that the electrostatic properties were further improved by using resin (A').
裏旌■別二益
実施例1において用いた結着樹脂を下記表−1Oの樹脂
(A)6g及び樹脂〔B〕34gに代え、又、シアニン
色素(1) 0.02gの代わりに下記構造の色素(I
I) 0.019gに代えた他は、実施例1と同様の
条件で電子写真感光材料を作製した。The binder resin used in Example 1 was replaced with 6 g of resin (A) and 34 g of resin [B] in Table 1O below, and the following structure was used instead of 0.02 g of cyanine dye (1). The dye (I
I) An electrophotographic light-sensitive material was produced under the same conditions as in Example 1, except that the amount was changed to 0.019 g.
色素(III)
(C)Is) asOs”
表
本発明の感光材料は、いずれも帯電性、暗電荷保持率、
光感度に優れ、実際の複写画像も高温・高湿の(30℃
、80%RH)の過酷な条件においても、地力プリの発
生のない、鮮明な画像を与えた。Dye (III) (C)Is) asOs'' Table All of the photosensitive materials of the present invention have chargeability, dark charge retention,
It has excellent light sensitivity, and the actual copied images can be used even in high temperature and high humidity conditions (30℃).
, 80% RH), it provided clear images without any distortion.
更に、これをオフセットマスターの原版として用いて印
刷した所、地力ブリのない鮮明な画質の印刷物を1万枚
以上印刷できた。Furthermore, when this was used as an original plate for an offset master, more than 10,000 copies of clear image quality prints with no background blur were printed.
び l に C
樹脂(A−19) (実施例30)又は樹脂(A−21
:1(実施例31)のいずれか6.5g、樹脂(B−4
2)33.5g、酸化亜鉛200g、ウラニン0.02
g、下記構造のメチン色素CD ) 0.03g 、下
記構造のメチン色素[E]0.03g、p−ヒドロキシ
安息香酸0.18g 及びトルエン300 gの混合物
をボールミル中で3時間分散して感光層形成物を調整し
、これを導電処理した紙に、乾燥付着量が25g/ r
rfとなる様にワイヤーバーで塗布し、110″Cで2
0秒間乾燥した0次いで暗所で20℃、65%RHの条
件下で24時間放置することにより各電子写真感光体を
作製した。Resin (A-19) (Example 30) or Resin (A-21)
: 6.5 g of any of 1 (Example 31), resin (B-4
2) 33.5g, zinc oxide 200g, uranine 0.02
A mixture of 0.03 g of methine dye CD having the following structure, 0.03 g of methine dye [E] having the following structure, 0.18 g of p-hydroxybenzoic acid, and 300 g of toluene was dispersed in a ball mill for 3 hours to form a photosensitive layer. The formed product was prepared, and the dry adhesion amount was 25 g/r on conductive-treated paper.
Apply it with a wire bar so that it becomes rf, and
Each electrophotographic photoreceptor was prepared by drying for 0 seconds and then leaving it in a dark place under conditions of 20° C. and 65% RH for 24 hours.
メチン色素(D)
メチン色素(E)
実施例30において、樹脂(A−19) 6.5gの代
わりに、前記樹脂(R−2)6.5gを用いた他は、実
施例30と同様にして、感光材料を作製した。Methine dye (D) Methine dye (E) The same procedure as in Example 30 was used except that 6.5 g of the resin (R-2) was used instead of 6.5 g of the resin (A-19). A photosensitive material was prepared.
実施例1と同様に、各感光材料の各特性を調べた。その
結果を下記表−11にまとめた。In the same manner as in Example 1, the characteristics of each photosensitive material were investigated. The results are summarized in Table 11 below.
上記の測定において、静電特性及び撮像性については下
記の操作に従った他は、実施例1と同様の操作で行なっ
た。In the above measurements, the electrostatic properties and imaging properties were performed in the same manner as in Example 1, except that the following operations were followed.
注7)静電特性のE、71゜及びEl/+611の測定
方法コロナ放電により光導電層表面を一400■に帯電
させた後、該光導電層表面を照度2.0ルツクスの可視
光で照射し、表面電位(ν1゜)が1/10又はE、/
、。。に減衰するまでの時間を求め、これから露光量E
、/、。又はE171゜。(ルックス・秒)を算出する
。Note 7) Method for measuring electrostatic properties E, 71° and El/+611 After the surface of the photoconductive layer was charged to -400 μ by corona discharge, the surface of the photoconductive layer was exposed to visible light at an illuminance of 2.0 lux. irradiated, the surface potential (ν1°) is 1/10 or E, /
,. . Find the time it takes for the light to attenuate, and from this calculate the exposure amount E
,/,. Or E171°. Calculate (looks/seconds).
注8)撮像性
各感光材料を以下の環境条件で1昼夜放置した後、全自
動製版機EPL−404V (富士写真フィルム■製)
でEPL、Tをトナーとして用いて製版して得られた複
写画像(カプリ、画像の画質)を目視評価した。撮像時
の環境条件は、20℃65%R11(1)と30℃80
%R[1(II)で実施した。但し、複写用の原稿(即
ち、版下原稿)には、ほかの原稿を切り抜いて、貼り込
みを行なって作成したものを用いた。Note 8) Imaging properties After leaving each photosensitive material for one day and night under the following environmental conditions, use a fully automatic plate making machine EPL-404V (manufactured by Fuji Photo Film ■).
A copy image (capri, image quality) obtained by plate making using EPL, T as a toner was visually evaluated. The environmental conditions during imaging were 20°C 65% R11 (1) and 30°C 80°C.
%R [1 (II). However, the manuscript for copying (ie, the draft manuscript) was created by cutting out and pasting other manuscripts.
各感光材料において、光導電層の平滑性及び強度におい
て、その差は認められなかった。しかし、静電特性にお
いて、比較例Cは、特に光感度El/l。。の値が大き
く、これは高温、高温になるとより一層助長され、劣化
してしまった。本発明の感光材料の静電特性は良好であ
り、更に、特定の置換基を有する樹脂(A)を用いた実
施例29は、非常に良好であり、特にE1/1゜。の値
が小さくなった。No difference was observed in the smoothness and strength of the photoconductive layer among the photosensitive materials. However, in terms of electrostatic properties, Comparative Example C has a particularly high photosensitivity El/l. . The value of was large, and this was further exacerbated at high temperatures, resulting in deterioration. The electrostatic properties of the photosensitive material of the present invention are good, and Example 29 using the resin (A) having a specific substituent group is very good, especially E1/1°. The value of has become smaller.
実際の撮像性を調べて見ると、比較例Cは、複写画像と
して原稿以外に、切り抜いて貼り込んだ部分の枠(即ち
、貼り込み跡)が非画像部の地汚れとして認められた。When examining the actual imaging performance, in Comparative Example C, in addition to the original as a copy image, the frame of the cut out and pasted portion (that is, pasting trace) was observed as background stains in the non-image area.
しかし、本発明のものは、いずれも、地汚れのない、鮮
明な画像のものが得られた。However, in all cases of the present invention, clear images without background stains were obtained.
更に、これらをオフセット印刷用原版として不感脂化処
理して印刷した所、本発明のものはいずれも地汚れのな
い鮮明な画質の印刷物が1万枚得られた。しかし、比較
例Cは、上記の貼り込み跡が、不感脂化処理でも除去さ
れず、刷り出しの印刷物から発生してしまった。Furthermore, when these were desensitized and printed as offset printing original plates, 10,000 prints with clear image quality and no background smudge were obtained for all of the products of the present invention. However, in Comparative Example C, the above-mentioned pasting marks were not removed even with the desensitizing treatment and were generated from the printed matter.
以上のことより、本発明の感光材料のみが、良好な特性
を与えることができた。From the above, only the photosensitive material of the present invention was able to provide good characteristics.
裏l桝刹二U
実施例30において、樹脂(A−19) 6.5g及
び樹脂(B −42333,5gの代わりに、下記表−
12の樹脂(A)6.5g及び樹脂CB)33.5gを
用いた他は、実施例30と同様にして各感光材料を作製
した。In Example 30, instead of 6.5 g of resin (A-19) and 5 g of resin (B-42333, the following table-
Each photosensitive material was produced in the same manner as in Example 30, except that 6.5 g of Resin (A) and 33.5 g of Resin CB of No. 12 were used.
表−12
本発明の感光材料はいずれも帯電性、暗電荷保持率、光
感度に優れ、実際の複写画像も高温高温(30°C18
0%RH)の過酷な条件においても地力ブリの発生や細
線飛びの発生等のない鮮明な画像を与えた。Table 12 All of the photosensitive materials of the present invention have excellent chargeability, dark charge retention, and photosensitivity, and the actual reproduced images are produced at high temperatures (30°C, 18°C).
Even under the harsh conditions of 0% RH), clear images were produced without any occurrence of ground blur or fine line skipping.
更にオフセントマスター原版として印刷した所、1万枚
印刷しても地汚れの発生のない鮮明な画質の印刷物が得
られた。Furthermore, when printed as an off-cent master original plate, clear prints with no background smearing were obtained even after printing 10,000 sheets.
裏隻[44
下記構造の樹脂(A−24)8g及び樹脂〔B2O)2
8g、酸化亜鉛200g、ウラニン0.02g、ローズ
ベンガル0.04 g 、ブロムフェノールブルー0.
03 g 、無水フタル酸0.40 g及びトルエン3
00 gの混合物を、ボールミル中で4時間分散し、更
に、1、3−キシリレンジイソシアナート3,5gを加
え、更に5分間分散した。Urasen [44 8 g of resin (A-24) and 2 resin [B2O] with the following structure
8g, zinc oxide 200g, uranine 0.02g, rose bengal 0.04g, bromophenol blue 0.
03 g, phthalic anhydride 0.40 g and toluene 3
00 g of the mixture was dispersed in a ball mill for 4 hours, then 3.5 g of 1,3-xylylene diisocyanate was added and further dispersed for 5 minutes.
これを導電処理した紙に、乾燥付着量が18g/rrf
となる様にワイヤーバーで塗布し、110℃で30秒間
加熱し、後、120℃で2時間加熱した0次いで暗所で
20℃、65%I?Hの条件下で24時間放置すること
により各電子写真感光材料を作製した。The dry adhesion amount was 18g/rrf on conductive-treated paper.
It was applied with a wire bar and heated at 110°C for 30 seconds, then heated at 120°C for 2 hours. Each electrophotographic light-sensitive material was prepared by leaving it for 24 hours under H conditions.
樹脂(A−24)
一二9.5 XIO’
本発明の感光材料は、いずれも帯電性、暗電荷保持率、
光感度に優れ、実際の複写画像も高温・高湿の(30℃
、80%RH)の過酷な条件においても、地力ブリの発
生のない、鮮明な画像を与えた。Resin (A-24) 129.5 XIO' The photosensitive material of the present invention has chargeability, dark charge retention,
It has excellent light sensitivity, and the actual copied images can be used even in high temperature and high humidity conditions (30℃).
, 80% RH), it provided clear images with no soil blurring.
更に、これをオフセットマスターの原版として用いて印
刷した所、1万枚の所でも鮮明な画質の印刷物を得た。Furthermore, when this was used as an original plate for an offset master, prints with clear image quality were obtained even after printing 10,000 copies.
(発明の効果)
本発明によれば、静電特性(とくに厳しい条件下での静
電特性)に優れた、鮮明で良質な画像を有し、更に優れ
た機械的強度を有する電子写真感光体を得ることができ
る。特に、半導体レーザー光を用いたスキャンニング露
光方式に有効である。(Effects of the Invention) According to the present invention, an electrophotographic photoreceptor has excellent electrostatic properties (especially electrostatic properties under harsh conditions), has clear and high-quality images, and has excellent mechanical strength. can be obtained. It is particularly effective for scanning exposure methods using semiconductor laser light.
式(Ia)又は(I b)で示される特定のメタクリレ
ート成分を含有する繰り返し単位を本発明の樹脂に用い
ることにより、更に静電特性が向上する。By using a repeating unit containing a specific methacrylate component represented by formula (Ia) or (Ib) in the resin of the present invention, the electrostatic properties are further improved.
Claims (3)
る光導電層を有する電子写真感光体において、該結着樹
脂が、下記に示される樹脂〔A〕の少なくとも1種と樹
脂〔B〕の少なくとも1種とを含有して成る事を特徴と
する電子写真感光体。 樹脂〔A〕; 1×10^3〜2×10^4の重量平均分子量を有し、
−PO_3H_2基、−COOH基、−SO_3H基、
フェノール性OH基、▲数式、化学式、表等があります
▼基{Rは炭化水素基又は−OR′基(R′は炭化水素
基)を示す}及び環状酸無水物含有基から選択される少
なくとも1つの酸性基を含有する少なくとも1つの重合
体成分から成るAブロックと下記一般式( I )で示さ
れる重合体成分を少なくとも含有するBブロックとから
構成されるABブロック共重合体を含有して成る樹脂。 一般式( I ) ▲数式、化学式、表等があります▼ (式( I )中、R_1は炭化水素基を表わす。)結着
樹脂〔B〕; 下記一般式(IIIa)及び一般式(IIIb)で示される重
量平均分子量1×10^3〜1.5×10^4のポリエ
ステル型マクロモノマー(MB)のうちの少なくとも1
つを少なくとも重合体成分として含有する重量平均分子
量3×10^4〜1×10^6の共重合体。 一般式(IIIa) 一般式(IIIb) 式〔IIIa〕および〔IIIb〕中、〔 〕内は繰り返し単
位を表わす。 f_1及びf_2は、互いに同じでも異なってもよく、
各々水素原子、ハロゲン原子、シアノ基、炭素数1〜8
の炭化水素基、−COO−T_1又は炭素数1〜8の炭
化水素基を介した−COO−T_2(T_1およびT_
2は各々炭素数1〜18の炭化水素基を表わす)を表わ
す。 A_1は、単結合もしくは−COO−、−OCO−、▲
数式、化学式、表等があります▼、▲数式、化学式、表
等があります▼(u_1、u_2は 1〜3の整数を表わす)、▲数式、化学式、表等があり
ます▼(d_1は水素原子又は炭素数1〜12の炭化水
素基を表わす)、−CONHCONH−、−CONHC
OO−、−O−、▲数式、化学式、表等があります▼又
は−SO_2−を表わす。 B_1は、A_1と−COO−とを連結する基を表わす
。 D_1及びD_2は、互いに同じでも異なってもよく、
各々二価の脂肪族基、二価の芳香族基{各々の二価の有
機残基の結合中に−O−、−S−、▲数式、化学式、表
等があります▼(d_2は水素原子又は炭素数1〜12
の炭化水素基を表わす)、−SO_2−、−COO−、
−OCO−、−CONHCO−、−NHCONH−、▲
数式、化学式、表等があります▼(d_3はd_2と同
一の内容を表わす)、▲数式、化学式、表等があります
▼(d_4はd_2と同一の内容を表わす)及び▲数式
、化学式、表等があります▼から選ばれた少なくとも1
つの結合基を介在させてもよい}又はこれら残基の組合
せにより構成された有機残基を表わす。 R_6_1は水素原子、又は炭化水素基を表わす。 一般式(IIIb)におけるf_3、f_4、A_2、B
_2及びR_6_2は各々一般式(IIIa)におけるf
_1、f_2、A_1、B_1及びR_6_1と同一の
内容を表わす。 D_3は二価の脂肪族基を表わす。(1) In an electrophotographic photoreceptor having a photoconductive layer containing at least an inorganic photoconductive material and a binder resin, the binder resin includes at least one of the following resins [A] and resin [B]. An electrophotographic photoreceptor comprising at least one of the following. Resin [A]; has a weight average molecular weight of 1 x 10^3 to 2 x 10^4,
-PO_3H_2 group, -COOH group, -SO_3H group,
At least one selected from phenolic OH group, ▲mathematical formula, chemical formula, table, etc.▼ group {R represents a hydrocarbon group or -OR' group (R' is a hydrocarbon group)}, and a cyclic acid anhydride-containing group. Contains an AB block copolymer consisting of an A block consisting of at least one polymer component containing one acidic group and a B block containing at least a polymer component represented by the following general formula (I). Made of resin. General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In formula (I), R_1 represents a hydrocarbon group.) Binder resin [B]; General formula (IIIa) and general formula (IIIb) below At least one of the polyester macromonomers (MB) having a weight average molecular weight of 1 x 10^3 to 1.5 x 10^4 represented by
A copolymer having a weight average molecular weight of 3 x 10^4 to 1 x 10^6, which contains at least one of these as a polymer component. General formula (IIIa) General formula (IIIb) In formulas [IIIa] and [IIIb], the characters in brackets represent repeating units. f_1 and f_2 may be the same or different from each other,
Each hydrogen atom, halogen atom, cyano group, carbon number 1-8
hydrocarbon group, -COO-T_1 or -COO-T_2 (T_1 and T_
2 each represents a hydrocarbon group having 1 to 18 carbon atoms. A_1 is a single bond or -COO-, -OCO-, ▲
There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (u_1, u_2 represent integers from 1 to 3), ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (d_1 is a hydrogen atom or (represents a hydrocarbon group having 1 to 12 carbon atoms), -CONHCONH-, -CONHC
Represents OO-, -O-, ▲mathematical formulas, chemical formulas, tables, etc.▼ or -SO_2-. B_1 represents a group connecting A_1 and -COO-. D_1 and D_2 may be the same or different from each other,
Each divalent aliphatic group, divalent aromatic group {-O-, -S-, ▲mathematical formula, chemical formula, table, etc. are present in the bond of each divalent organic residue▼(d_2 is a hydrogen atom or carbon number 1-12
represents a hydrocarbon group), -SO_2-, -COO-,
-OCO-, -CONHCO-, -NHCONH-, ▲
There are mathematical formulas, chemical formulas, tables, etc. ▼ (d_3 represents the same content as d_2), ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (d_4 represents the same content as d_2) and ▲ Mathematical formulas, chemical formulas, tables, etc. There is at least one selected from ▼
} or a combination of these residues. R_6_1 represents a hydrogen atom or a hydrocarbon group. f_3, f_4, A_2, B in general formula (IIIb)
_2 and R_6_2 are each f in general formula (IIIa)
It represents the same content as _1, f_2, A_1, B_1 and R_6_1. D_3 represents a divalent aliphatic group.
記一般式( I a)及び一般式( I b)から選択される
少なくとも1つの繰り返し単位を30重量%以上含有す
る事を特徴とする請求項(1)記載の電子写真感光体。 一般式( I a) 一般式( I b) 〔式( I a)又は( I b)中、X_1、及びX_2、
は互いに独立に、それぞれ水素原子、炭素数1〜10の
炭化水素基、塩素原子、臭素原子、−COZ_2又は−
COOZ_2(Z_2は各々炭素数1〜10の炭化水素
基を示す)を表わす。但し、X_1とX_2がともに水
素原子を表わすことはない。 L_1及びL_2はそれぞれ−COO−とベンゼン環を
結合する、単結合又は連結原子数1〜4個の連結基を表
わす。〕(2) A claim characterized in that the B block in the AB block copolymer contains 30% by weight or more of at least one repeating unit selected from the following general formulas (Ia) and (Ib): (1) The electrophotographic photoreceptor described above. General formula (I a) General formula (I b) [In formula (I a) or (I b), X_1 and X_2,
are each independently a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a chlorine atom, a bromine atom, -COZ_2 or -
COOZ_2 (Z_2 each represents a hydrocarbon group having 1 to 10 carbon atoms). However, both X_1 and X_2 do not represent hydrogen atoms. L_1 and L_2 each represent a single bond or a linking group having 1 to 4 linking atoms that connects -COO- to the benzene ring. ]
3H基、−COOH基、−OH基、▲数式、化学式、表
等があります▼基(R_0はRと同一の内容を表わす)
および環状酸無水物含有基から選択される少なくとも1
種の極性基を該共重合体の重合体主鎖部の末端に結合し
て成る樹脂である請求項(1)又は(2)記載の電子写
真感光体。(3) The resin [B] has -PO_3H_2 groups, -SO_
There are 3H groups, -COOH groups, -OH groups, ▲mathematical formulas, chemical formulas, tables, etc.▼ groups (R_0 represents the same content as R)
and at least one selected from cyclic acid anhydride-containing groups
The electrophotographic photoreceptor according to claim 1 or 2, which is a resin in which a polar group of a species is bonded to the end of the polymer main chain portion of the copolymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13541690A JPH0430169A (en) | 1990-05-28 | 1990-05-28 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13541690A JPH0430169A (en) | 1990-05-28 | 1990-05-28 | Electrophotographic sensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0430169A true JPH0430169A (en) | 1992-02-03 |
Family
ID=15151224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13541690A Pending JPH0430169A (en) | 1990-05-28 | 1990-05-28 | Electrophotographic sensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0430169A (en) |
-
1990
- 1990-05-28 JP JP13541690A patent/JPH0430169A/en active Pending
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