JPH04306224A - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JPH04306224A JPH04306224A JP3070859A JP7085991A JPH04306224A JP H04306224 A JPH04306224 A JP H04306224A JP 3070859 A JP3070859 A JP 3070859A JP 7085991 A JP7085991 A JP 7085991A JP H04306224 A JPH04306224 A JP H04306224A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- curing agent
- weight
- resin composition
- epoxypropoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 61
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 61
- 239000000203 mixture Substances 0.000 title claims abstract description 21
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 27
- 239000004793 Polystyrene Substances 0.000 claims abstract description 23
- 229920002223 polystyrene Polymers 0.000 claims abstract description 23
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229920001400 block copolymer Polymers 0.000 claims abstract description 21
- 239000011256 inorganic filler Substances 0.000 claims abstract description 14
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 14
- 150000002989 phenols Chemical class 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- -1 2,3-epoxypropoxy groups Chemical group 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 239000011342 resin composition Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 28
- 238000005476 soldering Methods 0.000 abstract description 23
- 229920005989 resin Polymers 0.000 abstract description 18
- 239000011347 resin Substances 0.000 abstract description 18
- 229920003986 novolac Polymers 0.000 abstract description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 239000005350 fused silica glass Substances 0.000 abstract description 3
- KLWDDBHWNBBEBZ-UHFFFAOYSA-N 2-[[5-(oxiran-2-ylmethoxy)naphthalen-1-yl]oxymethyl]oxirane Chemical compound C1OC1COC(C1=CC=C2)=CC=CC1=C2OCC1CO1 KLWDDBHWNBBEBZ-UHFFFAOYSA-N 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- 229910000679 solder Inorganic materials 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 229920001971 elastomer Polymers 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 239000005011 phenolic resin Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- 239000005060 rubber Substances 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 150000001993 dienes Chemical class 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- LJBWJFWNFUKAGS-UHFFFAOYSA-N 2-[bis(2-hydroxyphenyl)methyl]phenol Chemical compound OC1=CC=CC=C1C(C=1C(=CC=CC=1)O)C1=CC=CC=C1O LJBWJFWNFUKAGS-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 229920000359 diblock copolymer Polymers 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 150000004668 long chain fatty acids Chemical class 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 229920001195 polyisoprene Polymers 0.000 description 3
- 229920000428 triblock copolymer Polymers 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- HRSLYNJTMYIRHM-UHFFFAOYSA-N 2-[[4-[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]-2,6-dimethylphenoxy]methyl]oxirane Chemical group CC1=CC(C=2C=C(C)C(OCC3OC3)=C(C)C=2)=CC(C)=C1OCC1CO1 HRSLYNJTMYIRHM-UHFFFAOYSA-N 0.000 description 2
- MEVBAGCIOOTPLF-UHFFFAOYSA-N 2-[[5-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C1OC1COC(C=C1C=CC=2)=CC=C1C=2OCC1CO1 MEVBAGCIOOTPLF-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- RKGBFWIXGAFCRF-UHFFFAOYSA-N 2-[[2,6-dibutyl-4-[3,5-dibutyl-4-(oxiran-2-ylmethoxy)phenyl]phenoxy]methyl]oxirane Chemical group CCCCC1=CC(C=2C=C(CCCC)C(OCC3OC3)=C(CCCC)C=2)=CC(CCCC)=C1OCC1CO1 RKGBFWIXGAFCRF-UHFFFAOYSA-N 0.000 description 1
- HQKWFIJWOUGBLD-UHFFFAOYSA-N 2-[[2-bromo-6-(oxiran-2-ylmethoxy)naphthalen-1-yl]oxymethyl]oxirane Chemical compound C1=CC2=C(OCC3OC3)C(Br)=CC=C2C=C1OCC1CO1 HQKWFIJWOUGBLD-UHFFFAOYSA-N 0.000 description 1
- AGFPGBFMEYCKBT-UHFFFAOYSA-N 2-[[2-methyl-6-(oxiran-2-ylmethoxy)naphthalen-1-yl]oxymethyl]oxirane Chemical compound C1=CC2=C(OCC3OC3)C(C)=CC=C2C=C1OCC1CO1 AGFPGBFMEYCKBT-UHFFFAOYSA-N 0.000 description 1
- VDPMCLYSJRGNHS-UHFFFAOYSA-N 2-[[3-bromo-4-[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]-2,6-dimethylphenoxy]methyl]oxirane Chemical group CC1=CC(C=2C(=C(C)C(OCC3OC3)=C(C)C=2)Br)=CC(C)=C1OCC1CO1 VDPMCLYSJRGNHS-UHFFFAOYSA-N 0.000 description 1
- RPYOYWIJJIXWJO-UHFFFAOYSA-N 2-[[3-chloro-4-[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]-2,6-dimethylphenoxy]methyl]oxirane Chemical group CC1=CC(C=2C(=C(C)C(OCC3OC3)=C(C)C=2)Cl)=CC(C)=C1OCC1CO1 RPYOYWIJJIXWJO-UHFFFAOYSA-N 0.000 description 1
- JDCYLIOFUORGKO-UHFFFAOYSA-N 2-[[3-methyl-5-(oxiran-2-ylmethoxy)naphthalen-1-yl]oxymethyl]oxirane Chemical compound C=12C=CC=C(OCC3OC3)C2=CC(C)=CC=1OCC1CO1 JDCYLIOFUORGKO-UHFFFAOYSA-N 0.000 description 1
- BZMVOFIUXVIUBU-UHFFFAOYSA-N 2-[[4,8-dimethyl-5-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C12=C(C)C=C(OCC3OC3)C=C2C(C)=CC=C1OCC1CO1 BZMVOFIUXVIUBU-UHFFFAOYSA-N 0.000 description 1
- FKYRZJJIKCRKRV-UHFFFAOYSA-N 2-[[4-[3,5-diethyl-4-(oxiran-2-ylmethoxy)phenyl]-2,6-diethylphenoxy]methyl]oxirane Chemical group CCC1=CC(C=2C=C(CC)C(OCC3OC3)=C(CC)C=2)=CC(CC)=C1OCC1CO1 FKYRZJJIKCRKRV-UHFFFAOYSA-N 0.000 description 1
- OZRVXYJWUUMVOW-UHFFFAOYSA-N 2-[[4-[4-(oxiran-2-ylmethoxy)phenyl]phenoxy]methyl]oxirane Chemical group C1OC1COC(C=C1)=CC=C1C(C=C1)=CC=C1OCC1CO1 OZRVXYJWUUMVOW-UHFFFAOYSA-N 0.000 description 1
- OKUFYOFSPDWEBG-UHFFFAOYSA-N 2-[[4-bromo-5-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C=1C2=CC=CC(OCC3OC3)=C2C(Br)=CC=1OCC1CO1 OKUFYOFSPDWEBG-UHFFFAOYSA-N 0.000 description 1
- BGNNKDQMHAGVBD-UHFFFAOYSA-N 2-[[4-methyl-5-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C=1C2=CC=CC(OCC3OC3)=C2C(C)=CC=1OCC1CO1 BGNNKDQMHAGVBD-UHFFFAOYSA-N 0.000 description 1
- ASNAZMDOXQFMNI-UHFFFAOYSA-N 2-[[7-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C1OC1COC(C=C1C=2)=CC=C1C=CC=2OCC1CO1 ASNAZMDOXQFMNI-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- 150000004941 2-phenylimidazoles Chemical class 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- BVURNMLGDQYNAF-UHFFFAOYSA-N dimethyl(1-phenylethyl)amine Chemical compound CN(C)C(C)C1=CC=CC=C1 BVURNMLGDQYNAF-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 239000012772 electrical insulation material Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- IUURMAINMLIZMX-UHFFFAOYSA-N tris(2-nonylphenyl)phosphane Chemical compound CCCCCCCCCC1=CC=CC=C1P(C=1C(=CC=CC=1)CCCCCCCCC)C1=CC=CC=C1CCCCCCCCC IUURMAINMLIZMX-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、半田付け工程で生じる
パッケージクラックの問題を解消する、すなわち半田耐
熱性に優れると共に、耐湿信頼性、成形性にも優れるエ
ポキシ樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition that eliminates the problem of package cracks occurring during the soldering process, that is, has excellent solder heat resistance, moisture resistance reliability, and moldability.
【0002】0002
【従来の技術】エポキシ樹脂は耐熱性、耐湿性、電気特
性、接着性などに優れており、さらに配合処方により種
々の特性が付与できるため、塗料、接着剤、電気絶縁材
料など工業材料として利用されている。たとえば、半導
体装置などの電子回路部品の封止方法として従来より金
属やセラミックスによるハーメチックシールとフェノー
ル樹脂、シリコーン樹脂、エポキシ樹脂などによる樹脂
封止が提案されている。しかし、経済性、生産性、物性
のバランスの点からエポキシ樹脂による樹脂封止が中心
になっている。[Prior art] Epoxy resins have excellent heat resistance, moisture resistance, electrical properties, adhesive properties, etc., and can be given various properties depending on the formulation, so they are used as industrial materials such as paints, adhesives, and electrical insulation materials. has been done. For example, as methods for sealing electronic circuit components such as semiconductor devices, hermetic seals using metals or ceramics, and resin sealing using phenol resins, silicone resins, epoxy resins, and the like have been proposed. However, from the viewpoint of economy, productivity, and balance of physical properties, resin sealing using epoxy resin has become the main method.
【0003】一方、最近はプリント基板への部品実装に
おいても高密度化、自動化が進められており、従来のリ
ードピンを基板の穴に挿入する“挿入実装方式”に代り
、基板表面に部品を半田付けする“表面実装方式”が盛
んになってきた。それに伴いパッケージも従来のDIP
(デュアル・インライン・パッケージ)から高密度実装
、表面実装に適した薄型のFPP(フラット・プラスチ
ック・パッケージ)に移行しつつある。On the other hand, recently, the mounting density and automation of components on printed circuit boards have been increasing, and instead of the conventional "insertion mounting method" in which lead pins are inserted into holes in the board, components are soldered onto the surface of the board. The "surface mount method" for attaching devices has become popular. Along with this, the packaging is also conventional DIP.
(dual in-line package) to thin FPP (flat plastic package) suitable for high-density mounting and surface mounting.
【0004】表面実装方式への移行に伴い、従来あまり
問題にならなかった半田付け工程が大きな問題になって
きた。従来のピン挿入実装方式では半田付け工程はリー
ド部が部分的に加熱されるだけであったが、表面実装方
式ではパッケージ全体が熱媒に浸され加熱される。表面
実装方式における半田付け方法としては半田浴浸漬、不
活性ガスの飽和蒸気や赤外線によって加熱する半田リフ
ロー法などが用いられるが、いずれの方法でもパッケー
ジ全体が210〜270℃の高温に加熱されることにな
る。そのため従来の封止樹脂で封止したパッケージは、
半田付け時に樹脂部分にクラックが発生し、信頼性が低
下して製品として使用できないという問題がおきていた
。[0004] With the shift to the surface mounting method, the soldering process, which did not pose much of a problem in the past, has become a major problem. In the conventional pin insertion mounting method, only the leads are partially heated during the soldering process, but in the surface mounting method, the entire package is immersed in a heating medium and heated. Soldering methods used in surface mounting methods include immersion in a solder bath, solder reflow method that heats with saturated steam of inert gas, and infrared rays, but in either method, the entire package is heated to a high temperature of 210 to 270 degrees Celsius. It turns out. Therefore, packages sealed with conventional sealing resin,
There was a problem that cracks occurred in the resin part during soldering, reducing reliability and making it unusable as a product.
【0005】半田付け工程におけるクラックの発生は、
後硬化してから実装工程の間までに吸湿した水分が半田
付け加熱時に爆発的に水蒸気化、膨脹することに起因す
るといわれており、その対策として封止用樹脂の改良が
種々検討されている。[0005] The occurrence of cracks in the soldering process is
This is said to be caused by moisture absorbed between post-curing and the mounting process that explosively turns into water vapor and expands during soldering heat, and various improvements to the sealing resin are being considered as countermeasures. .
【0006】従来はエポキシ樹脂にオルソクレゾールノ
ボラック型エポキシ樹脂、硬化剤にフェノールノボラッ
ク樹脂が用いられるのが一般的であったが、表面実装時
に半田によりクラックが発生する問題を回避できなかっ
た。そこで、エポキシ樹脂にトリス(ヒドロキシフェニ
ル)メタンのトリグリシジルエーテル型エポキシ樹脂を
用い、硬化剤にトリス(ヒドロキシフェニル)メタン型
フェノール樹脂を用いる方法(特開平1−171232
号公報)、エポキシ樹脂にトリス(ヒドロキシフェニル
)メタンのトリグリシジルエーテル型エポキシ樹脂を用
い、硬化剤にジシクロペンタジエン変性フェノール樹脂
を用いる方法(特開平1−268713号公報)、硬化
剤に平均フェノール性水酸基当量が2〜4meq./g
であり両末端にフェノール性水酸基を有する線状フェノ
ール樹脂を用いる方法(特開平1−259075号公報
)などが提案されている。Conventionally, orthocresol novolac type epoxy resin was used as the epoxy resin and phenol novolac resin was used as the curing agent, but this did not avoid the problem of cracks occurring due to solder during surface mounting. Therefore, a method using a triglycidyl ether type epoxy resin of tris(hydroxyphenyl)methane as the epoxy resin and a tris(hydroxyphenyl)methane type phenol resin as the curing agent (Japanese Patent Laid-Open No. 1-171232)
(Japanese Unexamined Patent Publication No. 1-268713), a method using a triglycidyl ether type epoxy resin of tris(hydroxyphenyl)methane as the epoxy resin and a dicyclopentadiene-modified phenol resin as the curing agent (Japanese Patent Application Laid-open No. 1-268713), a method using an average phenol as the curing agent. hydroxyl group equivalent is 2 to 4 meq. /g
A method using a linear phenol resin having phenolic hydroxyl groups at both ends (Japanese Unexamined Patent Publication No. 1-259075) has been proposed.
【0007】[0007]
【発明が解決しようとする課題】しかし、これら種々の
方法で改良された樹脂も、それぞれ半田付け時のクラッ
クに対してある程度効果をあげてきているが、まだ十分
ではなく、他の特性に悪影響を及ぼすことも多い。硬化
剤にトリス(ヒドロキシフェニル)メタン型フェノール
樹脂を用いる方法では、樹脂の架橋密度が高くなるため
に樹脂のガラス転移温度は高くなるものの吸水率が増大
する問題や、樹脂自体が脆くなる問題が生じている。ま
た、硬化剤に平均フェノール性水酸基当量が2〜4me
q./gである両末端にフェノール性水酸基を有する線
状フェノール樹脂を用いる方法では、樹脂のガラス転移
温度が大幅に低下する問題や硬化剤の分子量が大きいた
めに流動性が低下し成形性が低下するという問題を生じ
ている。[Problem to be Solved by the Invention] However, although these resins improved by various methods have been effective to some extent against cracks during soldering, they are still not sufficient and have adverse effects on other properties. It often causes In the method of using tris(hydroxyphenyl)methane type phenolic resin as a curing agent, the glass transition temperature of the resin increases due to the high crosslinking density of the resin, but there are problems of increased water absorption and problems of the resin itself becoming brittle. It is occurring. In addition, the curing agent has an average phenolic hydroxyl equivalent of 2 to 4 me.
q. /g, which uses a linear phenolic resin with phenolic hydroxyl groups at both ends, has the problem of a significant drop in the glass transition temperature of the resin, and the large molecular weight of the curing agent, which reduces fluidity and reduces moldability. This is causing a problem.
【0008】さらに最近のパッケージは高密度実装、表
面実装に適した薄型になるとともにチップサイズが大型
化し、多ピン化する傾向にあり、成形時に流動性が不足
すると樹脂が金型キャビティー内を充填できず、未充填
が発生するという問題があった。Furthermore, recent packages have become thinner and more suitable for high-density mounting and surface mounting, as well as larger chip sizes and more pins.If fluidity is insufficient during molding, resin may flow inside the mold cavity. There was a problem in that it could not be filled and unfilled parts occurred.
【0009】本発明の目的は、かかる半田付け工程で生
じるクラックの問題を解消し、耐湿信頼性が良好である
と共に、成形時の流動性も良好で未充填が発生しない、
すなわち半田耐熱性および耐湿信頼性、成形性に共に優
れるエポキシ樹脂組成物を提供することにある。The object of the present invention is to solve the problem of cracks that occur in the soldering process, to have good moisture resistance reliability, and to have good fluidity during molding so that no unfilling occurs.
That is, the object of the present invention is to provide an epoxy resin composition that has excellent solder heat resistance, moisture resistance reliability, and moldability.
【0010】0010
【課題を解決するための手段】本発明者らは、特定の硬
化剤、特定のブロック共重合体に特定の割合の無機充填
材を添加することにより、上記の課題を解決し、目的に
合致したエポキシ樹脂組成物が得られることを見出し本
発明に到達した。[Means for Solving the Problems] The present inventors have solved the above problems and met the objectives by adding a specific curing agent and a specific proportion of inorganic filler to a specific block copolymer. The inventors have discovered that an epoxy resin composition can be obtained, and have arrived at the present invention.
【0011】すなわち本発明は、エポキシ樹脂(A)、
フェノール系硬化剤(B)、無機充填材(C)、ポリス
チレン系ブロック共重合体(D)とを必須成分として含
有してなる樹脂組成物であって、前記フェノール系硬化
剤(B)が次の一般式(I)[0011] That is, the present invention provides an epoxy resin (A),
A resin composition comprising a phenolic curing agent (B), an inorganic filler (C), and a polystyrene block copolymer (D) as essential components, the phenolic curing agent (B) comprising: General formula (I) of
【0012】0012
【化4】[C4]
【0013】(ただし、R1 〜R4 は水素原子、C
1 〜C4 の低級アルキル基を示す。)で表されるフ
ェノール系化合物(b)を硬化剤中に50重量%以上含
有し、かつ前記無機充填材(C)の割合が全体の75〜
87重量%であるエポキシ樹脂組成物であって、さらに
前記エポキシ樹脂(A)が次の一般式(II)(However, R1 to R4 are hydrogen atoms, C
It represents a 1 to C4 lower alkyl group. ) The curing agent contains 50% by weight or more of the phenolic compound (b) represented by
87% by weight of the epoxy resin composition, wherein the epoxy resin (A) has the following general formula (II):
【0014】[0014]
【化5】[C5]
【0015】(ただし、R1 〜R8 は水素原子、C
1 〜C4 の低級アルキル基またはハロゲン原子を示
す。)で表されるエポキシ樹脂(a1 )、および、次
の一般式(III)(However, R1 to R8 are hydrogen atoms, C
It represents a 1 to C4 lower alkyl group or a halogen atom. ) and the following general formula (III):
【0016】[0016]
【化6】[C6]
【0017】(ただし、R1 〜R8 のうち2つは2
,3−エポキシプロポキシ基であり、残りは水素原子、
C1 〜C4の低級アルキル基またはハロゲン原子を示
す。)で表されるエポキシ樹脂(a2 )の一方または
両方を必須成分として含有することがさらに好ましいエ
ポキシ樹脂組成物である。(However, two of R1 to R8 are 2
, 3-epoxypropoxy group, the rest are hydrogen atoms,
Represents a C1 to C4 lower alkyl group or halogen atom. It is more preferable that the epoxy resin composition contains one or both of the epoxy resins (a2) represented by (a2) as essential components.
【0018】以下、本発明の構成を詳述する。The configuration of the present invention will be explained in detail below.
【0019】本発明におけるエポキシ樹脂(A)は、一
分子中に2個以上のエポキシ基を含有する多官能エポキ
シ樹脂であれば特に制限を加えるものではないが通常は
多官能フェノールのポリグリシジルエーテル型エポキシ
樹脂が用いられる。多官能フェノールのポリグリシジル
エーテル型エポキシ樹脂の具体例としてはクレゾールノ
ボラック型エポキシ樹脂、フェノ−ルノボラック型エポ
キシ樹脂などの各種ノボラック型エポキシ樹脂、ビスフ
ェノ−ルA型エポキシ樹脂、ビスフェノールF型エポキ
シ樹脂などが例示できる。これらのエポキシ樹脂におい
ては、特に耐湿性、耐熱性および生産性のバランスから
通常クレゾールノボラック型エポキシ樹脂が好ましく用
いられる。The epoxy resin (A) in the present invention is not particularly limited as long as it is a polyfunctional epoxy resin containing two or more epoxy groups in one molecule, but it is usually a polyglycidyl ether of a polyfunctional phenol. Type epoxy resin is used. Specific examples of polyglycidyl ether type epoxy resins of polyfunctional phenols include various novolac type epoxy resins such as cresol novolak type epoxy resins, phenol novolac type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, etc. I can give an example. Among these epoxy resins, cresol novolac type epoxy resins are usually preferably used from the viewpoint of the balance of moisture resistance, heat resistance, and productivity.
【0020】本発明においてはこれら多官能フェノール
のポリグリシジルエーテルは難燃性を付与する目的でハ
ロゲン化されたものでもかまわない。In the present invention, the polyglycidyl ether of these polyfunctional phenols may be halogenated for the purpose of imparting flame retardance.
【0021】また、本発明においてはエポキシ樹脂(A
)として次の一般式(II)Furthermore, in the present invention, epoxy resin (A
) as the following general formula (II)
【0022】[0022]
【化7】[Chemical 7]
【0023】(ただし、R1 〜R8 は水素原子、C
1 〜C4 の低級アルキル基またはハロゲン原子を示
す。)で表されるエポキシ樹脂(a1 )、および、次
の一般式(III)(However, R1 to R8 are hydrogen atoms, C
It represents a 1 to C4 lower alkyl group or a halogen atom. ) and the following general formula (III):
【0024】[0024]
【化8】[Chemical formula 8]
【0025】(ただし、R1 〜R8 のうち2つは2
,3−エポキシプロポキシ基であり、残りは水素原子、
C1 〜C4の低級アルキル基またはハロゲン原子を示
す。)で表されるエポキシ樹脂(a2 )の一方または
両方を必須成分として含有することがさらに好ましい。
エポキシ樹脂(a1 )や、(a2 )のような2官能
で耐熱性の非常に高い骨格構造を持つエポキシ樹脂を含
有することによって半田付け工程におけるクラックの発
生防止効果はより一段と向上する。(However, two of R1 to R8 are 2
, 3-epoxypropoxy group, the rest are hydrogen atoms,
Represents a C1 to C4 lower alkyl group or halogen atom. It is further preferable to contain one or both of the epoxy resins (a2) represented by (a2) as essential components. By containing an epoxy resin such as epoxy resin (a1) or (a2) which is bifunctional and has a skeleton structure with very high heat resistance, the effect of preventing cracks in the soldering process is further improved.
【0026】本発明におけるエポキシ樹脂(a1 )の
好ましい具体例としては、4,4´−ビス(2,3−エ
ポキシプロポキシ)ビフェニル、4,4´−ビス(2,
3−エポキシプロポキシ)−3,3´,5,5´−テト
ラメチルビフェニル、4、4´−ビス(2,3−エポキ
シプロポキシ)−3,3´,5,5´−テトラメチル−
2−クロロビフェニル、4,4´−ビス(2,3−エポ
キシプロポキシ)−3,3´,5,5´−テトラメチル
−2−ブロモビフェニル、4、4´−ビス(2,3−エ
ポキシプロポキシ)−3,3´,5,5´−テトラエチ
ルビフェニル、4,4´−ビス(2,3−エポキシプロ
ポキシ)−3,3´,5,5´−テトラブチルビフェニ
ルなどがあげられ、4,4´−ビス(2,3−エポキシ
プロポキシ)ビフェニル、4,4´−ビス(2,3−エ
ポキシプロポキシ)−3,3´,5,5´−テトラメチ
ルビフェニルが特に好ましい。Preferred specific examples of the epoxy resin (a1) in the present invention include 4,4'-bis(2,3-epoxypropoxy)biphenyl, 4,4'-bis(2,
3-epoxypropoxy)-3,3',5,5'-tetramethylbiphenyl, 4,4'-bis(2,3-epoxypropoxy)-3,3',5,5'-tetramethyl-
2-chlorobiphenyl, 4,4'-bis(2,3-epoxypropoxy)-3,3',5,5'-tetramethyl-2-bromobiphenyl, 4,4'-bis(2,3-epoxy propoxy)-3,3',5,5'-tetraethylbiphenyl, 4,4'-bis(2,3-epoxypropoxy)-3,3',5,5'-tetrabutylbiphenyl, etc. , 4'-bis(2,3-epoxypropoxy)biphenyl, and 4,4'-bis(2,3-epoxypropoxy)-3,3',5,5'-tetramethylbiphenyl are particularly preferred.
【0027】また、本発明におけるエポキシ樹脂(a2
)の好ましい具体例としては、1,5−ジ(2,3−
エポキシプロポキシ)ナフタレン、1,5−ジ(2,3
−エポキシプロポキシ)−7−メチルナフタレン、1,
6−ジ(2,3−エポキシプロポキシ)ナフタレン、1
,6−ジ(2,3−エポキシプロポキシ)−2−メチル
ナフタレン、1,6−ジ(2,3−エポキシプロポキシ
)−8−メチルナフタレン、1,6−ジ(2,3−エポ
キシプロポキシ)−4,8−ジメチルナフタレン、2−
ブロム−1,6−ジ(2,3−エポキシプロポキシ)ナ
フタレン、8−ブロム−1,6−ジ(2,3−エポキシ
プロポキシ)ナフタレン、2,7−ジ(2,3−エポキ
シプロポキシ)ナフタレンなどがあげられ、1,5−ジ
(2,3−エポキシプロポキシ)ナフタレン、1,6−
ジ(2,3−エポキシプロポキシ)ナフタレン、2,7
−ジ(2,3−エポキシプロポキシ)ナフタレンが特に
好ましい。[0027] Furthermore, the epoxy resin (a2
) is a preferable specific example of 1,5-di(2,3-
epoxypropoxy) naphthalene, 1,5-di(2,3
-epoxypropoxy)-7-methylnaphthalene, 1,
6-di(2,3-epoxypropoxy)naphthalene, 1
, 6-di(2,3-epoxypropoxy)-2-methylnaphthalene, 1,6-di(2,3-epoxypropoxy)-8-methylnaphthalene, 1,6-di(2,3-epoxypropoxy) -4,8-dimethylnaphthalene, 2-
Bromo-1,6-di(2,3-epoxypropoxy)naphthalene, 8-bromo-1,6-di(2,3-epoxypropoxy)naphthalene, 2,7-di(2,3-epoxypropoxy)naphthalene 1,5-di(2,3-epoxypropoxy)naphthalene, 1,6-
Di(2,3-epoxypropoxy)naphthalene, 2,7
-di(2,3-epoxypropoxy)naphthalene is particularly preferred.
【0028】エポキシ樹脂(A)中に含有されるエポキ
シ樹脂(a1 )、(a2 )の割合に関しては特に制
限はないが、より十分な効果を発揮させるためには、エ
ポキシ樹脂(a1 )、(a2 )をエポキシ樹脂(A
)中に30重量%以上含有せしめることが好ましい。There is no particular restriction on the ratio of the epoxy resins (a1) and (a2) contained in the epoxy resin (A), but in order to exhibit a more sufficient effect, it is necessary to a2) to epoxy resin (A
) is preferably contained in an amount of 30% by weight or more.
【0029】また、本発明において、エポキシ樹脂(A
)の配合量は通常4〜20重量%、好ましくは5〜15
重量%である。In addition, in the present invention, epoxy resin (A
) is usually 4 to 20% by weight, preferably 5 to 15% by weight.
Weight%.
【0030】本発明におけるフェノール系硬化剤(B)
は次の一般式(I)[0030] Phenolic curing agent (B) in the present invention
is the following general formula (I)
【0031】[0031]
【化9】[Chemical formula 9]
【0032】(ただし、R1 〜R4 は水素原子、C
1 〜C4 の低級アルキル基を示す。)で表されるフ
ェノール系化合物(b)を硬化剤中に50重量%以上含
有する必要がある。2官能で低分子量のフェノール系化
合物(b)を硬化剤中に50重量%以上含有させること
によって、エポキシ樹脂硬化物の架橋密度が適度に低下
してエポキシ樹脂硬化物の欠点である脆さが緩和され半
田付け工程におけるクラックの発生が抑えられると共に
、樹脂組成物の溶融粘度が低下して成形時の流動性が向
上する。硬化剤中でのフェノール系化合物(b)の含有
量が50重量%より少ない場合は半田付け工程における
クラックの発生防止効果や成形時の流動性が十分に得ら
れない。例えば、従来から半導体封止樹脂に使用されて
いるフェノールノボラック樹脂には次の一般式(I)(However, R1 to R4 are hydrogen atoms, C
It represents a 1 to C4 lower alkyl group. It is necessary to contain 50% by weight or more of the phenolic compound (b) represented by ) in the curing agent. By containing 50% by weight or more of the bifunctional, low molecular weight phenolic compound (b) in the curing agent, the crosslinking density of the cured epoxy resin material is moderately reduced and the brittleness, which is a drawback of the cured epoxy resin product, is reduced. As a result, the occurrence of cracks in the soldering process is suppressed, and the melt viscosity of the resin composition is reduced, improving fluidity during molding. If the content of the phenolic compound (b) in the curing agent is less than 50% by weight, a sufficient effect of preventing the occurrence of cracks in the soldering process and fluidity during molding cannot be obtained. For example, the phenol novolac resin conventionally used for semiconductor encapsulation resin has the following general formula (I).
【
0033】[
0033
【化10】[Chemical formula 10]
【0034】(ただし、R1 〜R4 は水素原子を示
す。)で表される2核体成分が少量含まれているが、軟
化点83℃のフェノールノボラック樹脂では15重量%
前後、軟化点95℃のフェノールノボラック樹脂では1
0重量%前後しか含まれておらず、この程度の含有量で
は半田付け工程におけるクラックの発生防止効果や成形
時の流動性が十分に得られない。(However, R1 to R4 represent hydrogen atoms.) Contains a small amount of dinuclear component represented by the formula (R1 to R4 represent hydrogen atoms), but in the case of phenol novolac resin with a softening point of 83°C, it is 15% by weight.
1 for phenol novolak resin with a softening point of 95°C.
The content is only around 0% by weight, and with this level of content, it is not possible to obtain a sufficient effect of preventing the generation of cracks in the soldering process and fluidity during molding.
【0035】本発明におけるフェノール系化合物(b)
の好ましい具体例としてはフェノールノボラック樹脂の
2核体成分、ビスフェノールF、テトラメチルビスフェ
ノールFなどがあげられ、その合計が50重量%以上で
あれば2種以上の物を同時に用いてもかまわない。Phenolic compound (b) in the present invention
Preferred specific examples include the binuclear component of phenol novolak resin, bisphenol F, and tetramethylbisphenol F, and two or more of them may be used at the same time as long as the total amount is 50% by weight or more.
【0036】また、本発明におけるフェノール系硬化剤
(B)は、上記フェノール系化合物(b)を硬化剤中に
50重量%以上含有していれば残りはエポキシ樹脂(A
)と反応して硬化させるものであれば特に限定されない
が、好ましい具体例としてはたとえばフェノールノボラ
ック樹脂、クレゾールノボラック樹脂、ビスフェノ−ル
Aやレゾルシンから合成される各種ノボラック樹脂、次
の一般式(IV)In addition, the phenolic curing agent (B) in the present invention can contain the above-mentioned phenolic compound (b) in an amount of 50% by weight or more, with the remainder being an epoxy resin (A).
), but preferred specific examples include phenol novolak resins, cresol novolak resins, various novolak resins synthesized from bisphenol A and resorcinol, and compounds of the following general formula (IV )
【0037】[0037]
【化11】[Chemical formula 11]
【0038】(ただし、Rは水素原子またはC1 〜C
4 の低級アルキル基を示し、すべてが同一である必要
はなく、mは0以上の整数を示す。)や次の一般式(V
)(However, R is a hydrogen atom or C1 to C
4 represents a lower alkyl group, all of which do not need to be the same, and m represents an integer of 0 or more. ) or the following general formula (V
)
【0039】[0039]
【化12】[Chemical formula 12]
【0040】(ただし、Rは水素原子またはC1 〜C
4 の低級アルキル基を示し、すべてが同一である必要
はなく、nは0以上の整数を示す。)で表される各種フ
ェノール樹脂などがあげられる。(However, R is a hydrogen atom or C1 to C
4 represents a lower alkyl group, all of which do not need to be the same, and n represents an integer of 0 or more. ) and various phenolic resins.
【0041】本発明において、フェノール系硬化剤(B
)の配合量は通常2〜10重量%、好ましくは3〜8重
量%である。さらには、エポキシ樹脂(A)とフェノー
ル系硬化剤(B)の配合比は、機械的性質および耐湿性
の点から(A)に対する(B)の化学当量比が0.7〜
1.3、特に0.8〜1.2の範囲にあることが好まし
い。In the present invention, a phenolic curing agent (B
) is usually 2 to 10% by weight, preferably 3 to 8% by weight. Furthermore, the compounding ratio of the epoxy resin (A) and the phenolic curing agent (B) is such that the chemical equivalent ratio of (B) to (A) is from 0.7 to 0.7 from the viewpoint of mechanical properties and moisture resistance.
It is preferably in the range of 1.3, particularly 0.8 to 1.2.
【0042】また、本発明においてエポキシ樹脂(A)
とフェノール系硬化剤(B)の硬化反応を促進するため
硬化触媒を用いてもよい。硬化触媒は硬化反応を促進す
るものならば特に限定されず、たとえば2−メチルイミ
ダゾール、2−フェニルイミダゾール、2−フェニル−
4−メチルイミダゾール、2−ヘプタデシルイミダゾー
ルなどのイミダゾール化合物、トリエチルアミン、ベン
ジルジメチルアミン、α−メチルベンジルジメチルアミ
ン、1,8−ジアザビシクロ(5,4,0)ウンデセン
−7などの3級アミン化合物、トリフェニルホスフィン
、トリブチルホスフィン、トリ(p−メチルフェニル)
ホスフィン、トリ(ノニルフェニル)ホスフィン、トリ
フェニルホスフィン・トリフェニルボレート、テトラフ
ェニルホスフィン・テトラフェニルボレートなどの有機
ホスフィン化合物があげられる。なかでも耐湿性の点か
ら、有機ホスフィン化合物が好ましく、トリフェニルホ
スフィンが特に好ましく用いられる。[0042] Furthermore, in the present invention, epoxy resin (A)
A curing catalyst may be used to promote the curing reaction of the phenolic curing agent (B) and the phenolic curing agent (B). The curing catalyst is not particularly limited as long as it promotes the curing reaction, and examples thereof include 2-methylimidazole, 2-phenylimidazole, and 2-phenyl-
Imidazole compounds such as 4-methylimidazole and 2-heptadecylimidazole, tertiary amine compounds such as triethylamine, benzyldimethylamine, α-methylbenzyldimethylamine, 1,8-diazabicyclo(5,4,0)undecene-7, Triphenylphosphine, tributylphosphine, tri(p-methylphenyl)
Examples include organic phosphine compounds such as phosphine, tri(nonylphenyl)phosphine, triphenylphosphine/triphenylborate, and tetraphenylphosphine/tetraphenylborate. Among them, from the viewpoint of moisture resistance, organic phosphine compounds are preferred, and triphenylphosphine is particularly preferably used.
【0043】これらの硬化触媒は用途によっては二種以
上を併用してもよく、その添加量はエポキシ樹脂(A)
100重量部に対して0.5〜5重量部の範囲が好まし
い。本発明における無機充填材(C)の好ましい具体例
としては溶融シリカ、結晶性シリカ、アルミナ、マグネ
シア、タルク、各種セラミックスなどがあげられ、特に
溶融シリカが好ましく用いられる。[0043] Two or more of these curing catalysts may be used in combination depending on the application, and the amount added is determined by the amount of the epoxy resin (A).
The range of 0.5 to 5 parts by weight per 100 parts by weight is preferred. Preferred specific examples of the inorganic filler (C) in the present invention include fused silica, crystalline silica, alumina, magnesia, talc, and various ceramics, with fused silica being particularly preferably used.
【0044】また、これらの無機充填材は用途によって
は二種以上を併用しても良い。[0044] Furthermore, two or more of these inorganic fillers may be used in combination depending on the purpose.
【0045】本発明における無機充填材(C)は、エポ
キシ樹脂組成物全体に占める割合が75〜87重量%で
あり、さらに好ましくは75〜85重量%である。無機
充填材(C)が75重量%未満では半田耐熱性が不十分
であり、87重量%を越えると流動性が不十分である。The proportion of the inorganic filler (C) in the present invention in the entire epoxy resin composition is 75 to 87% by weight, more preferably 75 to 85% by weight. If the inorganic filler (C) is less than 75% by weight, the soldering heat resistance will be insufficient, and if it exceeds 87% by weight, the fluidity will be insufficient.
【0046】本発明において、無機充填材(C)をシラ
ンカップリング剤、チタネートカップリング剤などのカ
ップリング剤であらかじめ表面処理することが信頼性の
点で好ましい。カップリング剤としてエポキシシラン、
アミノシラン、メルカプトシランなどのシランカップリ
ング剤が好ましく用いられる。In the present invention, it is preferable from the viewpoint of reliability that the inorganic filler (C) is previously surface-treated with a coupling agent such as a silane coupling agent or a titanate coupling agent. Epoxysilane as a coupling agent,
Silane coupling agents such as aminosilane and mercaptosilane are preferably used.
【0047】また、本発明においてはポリスチレン系ブ
ロック共重合体(D)を必須成分として含有させること
が重要である。Furthermore, in the present invention, it is important to contain the polystyrene block copolymer (D) as an essential component.
【0048】ポリスチレン系ブロック共重合体(D)に
は、ガラス転移温度が25℃以上、好ましくは50℃以
上の芳香族ビニル炭化水素重合体ブロックとガラス転移
温度が0℃以下、好ましくは−25℃以下の共役ジエン
重合体ブロックからなる線状、放射状、分枝状のブロッ
ク共重合体が含まれる。The polystyrene block copolymer (D) contains an aromatic vinyl hydrocarbon polymer block having a glass transition temperature of 25°C or higher, preferably 50°C or higher, and a glass transition temperature of 0°C or lower, preferably -25°C. Includes linear, radial, and branched block copolymers consisting of conjugated diene polymer blocks having a temperature of 0.degree. C. or less.
【0049】前記の共役ジエンとしては、ブタジエン(
1,3−ブタジエン)、イソプレン(2−メチル−1,
3−ブタジエン)、メチルイソプレン(2,3−ジメチ
ル−1,3−ブタジエン)、1,3−ペンタジエンなど
があり、中でもブタジエン、イソプレンが好ましく用い
られる。As the conjugated diene, butadiene (
1,3-butadiene), isoprene (2-methyl-1,
Among them, butadiene and isoprene are preferably used.
【0050】ポリスチレン系ブロック共重合体(D)中
に占めるガラス相ブロックである芳香族ビニル炭化水素
重合体ブロックの割合は10〜50重量%、ゴム相ブロ
ックである共役ジエン重合体ブロックの割合は90〜5
0重量%が好ましい。The proportion of the aromatic vinyl hydrocarbon polymer block, which is the glass phase block, in the polystyrene block copolymer (D) is 10 to 50% by weight, and the proportion of the conjugated diene polymer block, which is the rubber phase block, is 10 to 50% by weight. 90-5
0% by weight is preferred.
【0051】ガラス相ブロックとゴム相ブロックとの組
み合わせは多数あり、そのいずれでもよいが、ガラス相
ブロックとゴム相ブロックとが一つずつ結合したジブロ
ック共重合体、ゴム相ブロックの両端にガラス相ブロッ
クが結合したトリブロック共重合体が特に好ましい。こ
の場合のガラス相ブロックの数平均分子量は好ましくは
1,000〜100,000、特に好ましくは2,00
0〜50,000であり、ゴム相ブロックの数平均分子
量は好ましくは5,000〜200,000、特に好ま
しくは10,000〜100,000である。There are many combinations of a glass phase block and a rubber phase block, and any of them may be used. For example, a diblock copolymer in which one glass phase block and one rubber phase block are bonded, and a diblock copolymer in which one glass phase block and one rubber phase block are combined, Particularly preferred are triblock copolymers in which phase blocks are combined. The number average molecular weight of the glass phase block in this case is preferably 1,000 to 100,000, particularly preferably 2,000.
The number average molecular weight of the rubber phase block is preferably 5,000 to 200,000, particularly preferably 10,000 to 100,000.
【0052】ポリスチレン系ブロック共重合体(D)に
は上記のブロック共重合体の不飽和結合の一部が水素添
加により還元された水添ブロック共重合体も含まれる。The polystyrene block copolymer (D) also includes a hydrogenated block copolymer in which some of the unsaturated bonds of the above block copolymer are reduced by hydrogenation.
【0053】ここで、芳香族ビニル炭化水素重合体ブロ
ックの芳香族二重結合の25%以下および共役ジエン重
合体ブロックの脂肪族二重結合の80%以上が水添され
ていることが好ましい。Here, it is preferable that 25% or less of the aromatic double bonds in the aromatic vinyl hydrocarbon polymer block and 80% or more of the aliphatic double bonds in the conjugated diene polymer block are hydrogenated.
【0054】ポリスチレン系ブロック共重合体(D)の
好ましい具体例としては、ポリスチレン/ポリブタジエ
ン/ポリスチレントリブロック共重合体(SBS)、ポ
リスチレン/ポリイソプレン/ポリスチレントリブロッ
ク共重合体(SIS)、SBSの水添共重合体(SEB
S)、SISの水添共重合体、ポリスチレン/ポリイソ
プレンジブロック共重合体、ポリスチレン/ポリイソプ
レンジブロック共重合体の水添共重合体(SEP)など
があげられる。Preferred specific examples of the polystyrene block copolymer (D) include polystyrene/polybutadiene/polystyrene triblock copolymer (SBS), polystyrene/polyisoprene/polystyrene triblock copolymer (SIS), and SBS. Hydrogenated copolymer (SEB
S), a hydrogenated copolymer of SIS, a polystyrene/polyisoprene diblock copolymer, a hydrogenated copolymer of polystyrene/polyisoprene diblock copolymer (SEP), and the like.
【0055】本発明においてポリスチレン系ブロック共
重合体(D)の配合量は通常0.2〜10重量%、好ま
しくは0.5〜5重量%である。0.2重量%未満では
半田耐熱性、耐湿信頼性に対する向上効果がほとんど現
れず、10重量%を越えると流動性が低下するため成形
が困難になり実用的ではない。In the present invention, the blending amount of the polystyrene block copolymer (D) is usually 0.2 to 10% by weight, preferably 0.5 to 5% by weight. If it is less than 0.2% by weight, there will be little improvement in soldering heat resistance and moisture resistance reliability, and if it exceeds 10% by weight, the fluidity will decrease, making molding difficult and impractical.
【0056】本発明において、ポリスチレン系ブロック
共重合体(D)が半田耐熱性や耐湿信頼性の向上に寄与
する理由はまだ明らかではないが、ポリスチレン系ブロ
ック共重合体がエポキシ樹脂硬化物を疎水化することと
、ポリスチレン系ブロック共重合体中の共役ジエン重合
体ブロックが広い温度範囲にわたって半導体チップとエ
ポキシ樹脂硬化物との間に発生する内部応力を低減させ
ることの二つの効果の相乗作用によるものと推定され、
本発明のエポキシ樹脂組成物ではこのポリスチレン系ブ
ロック共重合体による作用と先に述べたフェノール系化
合物(b)の作用、無機充填材(C)の高充填による低
吸水作用の三つの作用の相乗効果により各々単独の寄与
からは予想し得ないほどの優れた半田耐熱性を示したも
のと推定される。In the present invention, it is not yet clear why the polystyrene block copolymer (D) contributes to improving soldering heat resistance and moisture resistance reliability, but the polystyrene block copolymer makes the cured epoxy resin hydrophobic. This is due to the synergistic effect of two effects: the conjugated diene polymer block in the polystyrene block copolymer reduces the internal stress generated between the semiconductor chip and the cured epoxy resin over a wide temperature range. It is estimated that
In the epoxy resin composition of the present invention, the effect of this polystyrene block copolymer, the effect of the phenolic compound (b) mentioned above, and the low water absorption effect due to high loading of the inorganic filler (C) are synergistic. It is presumed that these effects showed excellent soldering heat resistance that could not have been expected from each individual contribution.
【0057】本発明のエポキシ樹脂組成物にはハロゲン
化エポキシ樹脂などのハロゲン化合物、リン化合物など
の難燃剤、三酸化アンチモンなどの難燃助剤、カーボン
ブラックなどの着色剤、シリコーンゴム、変性ニトリル
ゴム、変性ポリブタジエンゴムなどのエラストマー、ポ
リエチレンなどの熱可塑性樹脂、長鎖脂肪酸、長鎖脂肪
酸の金属塩、長鎖脂肪酸のエステル、長鎖脂肪酸のアミ
ド、パラフィンワックスなどの離型剤を任意に添加する
ことができる。The epoxy resin composition of the present invention contains halogen compounds such as halogenated epoxy resins, flame retardants such as phosphorus compounds, flame retardant aids such as antimony trioxide, colorants such as carbon black, silicone rubber, and modified nitrile. Optionally add release agents such as rubber, elastomers such as modified polybutadiene rubber, thermoplastic resins such as polyethylene, long chain fatty acids, metal salts of long chain fatty acids, esters of long chain fatty acids, amides of long chain fatty acids, paraffin wax, etc. can do.
【0058】本発明のエポキシ樹脂組成物は溶融混練す
ることが好ましく、たとえばニーダー、ロール、単軸も
しくは二軸の押出機およびコニーダーなどの公知の混練
方法を用いて溶融混練することにより、製造される。The epoxy resin composition of the present invention is preferably melt-kneaded, and can be produced by melt-kneading using a known kneading method such as a kneader, roll, single-screw or twin-screw extruder, or co-kneader. Ru.
【0059】[0059]
【実施例】以下、実施例により本発明を具体的に説明す
る。[Examples] The present invention will be specifically explained below with reference to Examples.
【0060】実施例1〜9、比較例1〜5表1に示した
配合物および表2に示したポリスチレン系ブロック共重
合体を、各々表3および表4に示した組成比でミキサ−
を用いてドライブレンドした。これを、バレル設定温度
90℃の二軸の押出機を用いて溶融混練後、冷却・粉砕
してエポキシ樹脂組成物を製造した。Examples 1 to 9, Comparative Examples 1 to 5 The formulations shown in Table 1 and the polystyrene block copolymers shown in Table 2 were mixed in a mixer at the composition ratios shown in Tables 3 and 4, respectively.
Dry blended using. This was melt-kneaded using a twin-screw extruder with a barrel set temperature of 90°C, and then cooled and pulverized to produce an epoxy resin composition.
【0061】[0061]
【表1】[Table 1]
【0062】[0062]
【表2】[Table 2]
【0063】[0063]
【表3】[Table 3]
【0064】[0064]
【表4】[Table 4]
【0065】この組成物を用い、以下に示した半田耐熱
性試験、耐湿信頼性試験、成形性の確認を行った。Using this composition, the following soldering heat resistance test, moisture resistance reliability test, and moldability were confirmed.
【0066】半田耐熱性試験:80pinQFPデバイ
ス(パッケージサイズ:17×17×1.7mm、チッ
プサイズ:9×9×0.5mm)を、低圧トランスファ
ー成形機を用いて175℃×120秒の条件で成形し、
175℃で12時間硬化させた。このテストデバイス1
6個を、85℃/85%RHで所定の時間加湿させた後
、260℃に加熱した半田浴に10秒間浸漬してクラッ
クの発生したデバイスを不良とした。また、24時間加
湿後、半田浴に浸漬したデバイスのうちクラックの発生
しなかったデバイスを超音波探傷装置により内部観察し
、チップとの剥離の有無を調べた。Solder heat resistance test: An 80-pin QFP device (package size: 17 x 17 x 1.7 mm, chip size: 9 x 9 x 0.5 mm) was heated at 175°C for 120 seconds using a low-pressure transfer molding machine. Molded,
It was cured at 175°C for 12 hours. This test device 1
After humidifying the six devices at 85° C./85% RH for a predetermined time, they were immersed in a solder bath heated to 260° C. for 10 seconds, and devices with cracks were judged as defective. Further, after 24 hours of humidification, among the devices immersed in the solder bath, the devices in which no cracks occurred were internally observed using an ultrasonic flaw detector to check for peeling from the chip.
【0067】耐湿信頼性試験:80pinQFPデバイ
スにアルミ配線を施した模擬素子を搭載し、低圧トラン
スファー成形機を用いて175℃×120秒の条件で成
形、175℃で12時間硬化させた。このテストデバイ
スを85℃/85%RHで所定の時間加湿させた後、2
60℃に加熱した半田浴に10秒間浸漬した。半田浸漬
後のテストデバイスをクラックの発生の有無にかかわら
ず143℃/100%RHの条件でPCTを行い、ワイ
ブル分布における特性寿命を求めた。Moisture resistance reliability test: A simulated element with aluminum wiring was mounted on an 80-pin QFP device, molded using a low-pressure transfer molding machine at 175° C. for 120 seconds, and cured at 175° C. for 12 hours. After humidifying this test device at 85°C/85%RH for a predetermined time,
It was immersed in a solder bath heated to 60°C for 10 seconds. PCT was performed on the test device after being immersed in solder under the conditions of 143° C./100% RH regardless of the occurrence of cracks, and the characteristic life in Weibull distribution was determined.
【0068】成形性(充填性):半田耐熱性試験に用い
る80pinQFPデバイスを、成形後に目視および顕
微鏡を用いて観察し、未充填の有無を調べた。Moldability (Fillability): After molding, the 80-pin QFP device used in the solder heat resistance test was observed visually and using a microscope to check for any unfilled parts.
【0069】表5にみられるように、本発明のエポキシ
樹脂組成物(実施例1〜9)は半田耐熱性および耐湿信
頼性、成形性に優れている。これに対してフェノール系
化合物(b)の含有量が本発明の範囲を外れる比較例1
および比較例4ではそれぞれ半田耐熱性が悪く、成形性
にも問題がある。また、ポリスチレン系ブロック共重合
体(D)を含有しない比較例2および比較例3では耐湿
信頼性が非常に悪く、半田耐熱性も劣っており、チップ
面の剥離も発生している。また、無機充填材の含有量が
本発明の範囲を外れる比較例5では半田耐熱性、耐湿信
頼性がともに悪い。As seen in Table 5, the epoxy resin compositions of the present invention (Examples 1 to 9) are excellent in soldering heat resistance, moisture resistance reliability, and moldability. On the other hand, Comparative Example 1 in which the content of the phenolic compound (b) is outside the range of the present invention
In Comparative Example 4, the soldering heat resistance was poor, and there were also problems in moldability. Furthermore, in Comparative Examples 2 and 3, which did not contain the polystyrene block copolymer (D), the moisture resistance reliability was very poor, the soldering heat resistance was also poor, and peeling occurred on the chip surface. Furthermore, in Comparative Example 5 in which the content of the inorganic filler was outside the range of the present invention, both solder heat resistance and moisture resistance reliability were poor.
【0070】[0070]
【表5】[Table 5]
【0071】[0071]
【発明の効果】本発明のエポキシ樹脂組成物は、特定の
硬化剤、特定の割合の無機充填材、ポリスチレン系ブロ
ック共重合体を配合したために、半田耐熱性、耐湿信頼
性および成形性に優れている。Effects of the Invention The epoxy resin composition of the present invention has excellent soldering heat resistance, moisture resistance reliability, and moldability because it contains a specific curing agent, a specific proportion of inorganic filler, and a polystyrene block copolymer. ing.
Claims (2)
化剤(B)、無機充填材(C)、ポリスチレン系ブロッ
ク共重合体(D)とを必須成分として含有してなる樹脂
組成物であって、前記フェノール系硬化剤(B)が次の
一般式(I) 【化1】 (ただし、R1 〜R4 は水素原子、C1 〜C4
の低級アルキル基を示す。)で表されるフェノール系化
合物(b)を硬化剤中に50重量%以上含有し、かつ前
記無機充填材(C)の割合が全体の75〜87重量%で
あるエポキシ樹脂組成物。1. A resin composition comprising an epoxy resin (A), a phenolic curing agent (B), an inorganic filler (C), and a polystyrene block copolymer (D) as essential components. , the phenolic curing agent (B) has the following general formula (I) [Formula 1] (wherein R1 to R4 are hydrogen atoms, C1 to C4
represents a lower alkyl group. ) An epoxy resin composition containing 50% by weight or more of a phenolic compound (b) represented by (b) in a curing agent, and in which the proportion of the inorganic filler (C) is 75 to 87% by weight.
(II) 【化2】 (ただし、R1 〜R8 は水素原子、C1 〜C4
の低級アルキル基またはハロゲン原子を示す。)で表さ
れるエポキシ樹脂(a1 )、および、次の一般式(I
II)【化3】 (ただし、R1 〜R8 のうち2つは2,3−エポキ
シプロポキシ基であり、残りは水素原子、C1 〜C4
の低級アルキル基またはハロゲン原子を示す。)で表
されるエポキシ樹脂(a2 )の一方または両方を必須
成分として含有する請求項1記載のエポキシ樹脂組成物
。2. The epoxy resin (A) has the following general formula (II): (wherein R1 to R8 are hydrogen atoms, C1 to C4
represents a lower alkyl group or a halogen atom. ) and the following general formula (I
II) [Chemical formula 3] (However, two of R1 to R8 are 2,3-epoxypropoxy groups, and the rest are hydrogen atoms, C1 to C4
represents a lower alkyl group or a halogen atom. 2. The epoxy resin composition according to claim 1, which contains one or both of the epoxy resins (a2) represented by (a2) as essential components.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3070859A JPH04306224A (en) | 1991-04-03 | 1991-04-03 | Epoxy resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3070859A JPH04306224A (en) | 1991-04-03 | 1991-04-03 | Epoxy resin composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04306224A true JPH04306224A (en) | 1992-10-29 |
Family
ID=13443710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3070859A Pending JPH04306224A (en) | 1991-04-03 | 1991-04-03 | Epoxy resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04306224A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08325357A (en) * | 1995-03-28 | 1996-12-10 | Toray Ind Inc | Epoxy resin composition for semiconductor sealing use and semiconductor device |
| JP2002527551A (en) * | 1998-10-13 | 2002-08-27 | スリーエム イノベイティブ プロパティズ カンパニー | High strength epoxy adhesive and its use |
| JP2006527278A (en) * | 2003-06-06 | 2006-11-30 | ダウ グローバル テクノロジーズ インコーポレイティド | Curable flame retardant epoxy resin composition |
| JP2020152775A (en) * | 2019-03-19 | 2020-09-24 | 株式会社カネカ | Epoxy resin composition and adhesive |
-
1991
- 1991-04-03 JP JP3070859A patent/JPH04306224A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08325357A (en) * | 1995-03-28 | 1996-12-10 | Toray Ind Inc | Epoxy resin composition for semiconductor sealing use and semiconductor device |
| JP2002527551A (en) * | 1998-10-13 | 2002-08-27 | スリーエム イノベイティブ プロパティズ カンパニー | High strength epoxy adhesive and its use |
| JP2006527278A (en) * | 2003-06-06 | 2006-11-30 | ダウ グローバル テクノロジーズ インコーポレイティド | Curable flame retardant epoxy resin composition |
| JP2020152775A (en) * | 2019-03-19 | 2020-09-24 | 株式会社カネカ | Epoxy resin composition and adhesive |
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