JPH0431034B2 - - Google Patents

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Publication number
JPH0431034B2
JPH0431034B2 JP1688387A JP1688387A JPH0431034B2 JP H0431034 B2 JPH0431034 B2 JP H0431034B2 JP 1688387 A JP1688387 A JP 1688387A JP 1688387 A JP1688387 A JP 1688387A JP H0431034 B2 JPH0431034 B2 JP H0431034B2
Authority
JP
Japan
Prior art keywords
copper
ions
bath
plating
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1688387A
Other languages
Japanese (ja)
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JPS63186893A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP1688387A priority Critical patent/JPS63186893A/en
Publication of JPS63186893A publication Critical patent/JPS63186893A/en
Publication of JPH0431034B2 publication Critical patent/JPH0431034B2/ja
Granted legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

(イ) 産業上の利用分野 本発明は薄膜磁気ヘツドなどの電磁変換素子の
構成体である微細な導電体コイルを電気めつきで
形成する方法に関する。 (ロ) 従来技術 薄膜磁気ヘツドなどの電磁変換素子は通常、磁
気回路と導電体コイルとで構成されており、この
導電体コイルは半導体リソグラフイー技術を用い
て形成した巾数μmという微細なパターン上に硫
酸銅浴の電気めつき法で形成されることが多い。 このめつき法は、スパツタリング法などと比較
して、常温で処理できるため基板の温度上昇を回
避できるほか、処理時間が短いという特長を有す
る。また、硫酸銅浴を用いて銅めつきを行うこと
は、シアン化銅浴やピロリン酸浴を用いる場合と
比較して廃液処理の負担が軽減できる点で有利で
ある。 硫酸銅浴で銅めつきを行う方法については、
「めつき技術便覧」(日刊工業新聞社昭和46年7月
刊)、「実用電気めつき」(日刊工業新聞社昭和55
年7月刊)などの刊行物に明らかなように、硫酸
銅めつき浴の組成は硫酸銅と硫酸並びに微量の塩
素イオン(C-)が不可欠といわれており、め
つき膜の光沢化及び均一電着性改善のためにめつ
き浴添加剤として少量の界面活性剤(ノニオン系
ポリマー)及びイオウ系有機化合物が通常添加さ
れている。 (ハ) 発明が解決しようとする問題点 しかしながら、発明者らの経験によれば、リソ
グラフイー技術を用いて有機ポリマーでパターニ
ングした2〜8μmの巾の微細な溝に銅めつきする
際の現象として、有機物の添加剤が含まれている
場合には、導電体コイルの断面形状が山形となつ
てしまうことがわかつた。すなわち、第2図に示
すようにセラミツク基板2上に設けられた電磁変
換素子1において、下部磁性膜3の上部にギヤツ
プ4を介して銅めつきで形成する導電体5の断面
形状が山形となり、次の工程で導電体コイル上に
形成される上部磁性膜7は通常の段差解消の手段
によつても磁性膜を平担にすることができず波う
ち状態となり、この形状に起因する残留応力が働
き、磁性膜の磁気特性が劣化するという問題があ
つた。 (ニ) 問題点を解決するための手段、作用 そこで、本発明者らは導電体の上面が平坦であ
ることが性能の良い磁電変換素子を得る上で極め
て重要であるとの観点から検討の結果、前述のよ
うな有機系添加剤を加えないで、前記塩素イオン
のかわりに臭素イオンまたは沃素イオンを添加し
ためつき浴とすれば上面が平坦なめつき膜が得ら
れることを知見して本発明を完成するに至つた。 第1図は本発明の方法を用いて銅めつきを行つ
た導電体コイルを有する磁気ヘツドを示す断面図
であつて、電磁変換素子1の下部磁性膜3の上部
に形成された導電体コイル5の上面は総て平坦で
あり、したがつて、コイル上方に形成される上部
磁性膜7も波うち状態のない平坦な断面形状を有
している。 第1表は従来用いられている一般的な銅めつき
浴と本発明の方法に使用されるめつき浴組成を示
したものである。
(a) Field of Industrial Application The present invention relates to a method for forming a fine conductor coil, which is a component of an electromagnetic transducer such as a thin film magnetic head, by electroplating. (b) Prior art Electromagnetic transducers such as thin-film magnetic heads are usually composed of a magnetic circuit and a conductive coil, and this conductive coil is formed using a fine pattern several μm in width formed using semiconductor lithography technology. It is often formed by electroplating in a copper sulfate bath. Compared to sputtering methods and the like, this plating method has the advantage that it can be processed at room temperature, thereby avoiding an increase in the temperature of the substrate, and that the processing time is short. Further, performing copper plating using a copper sulfate bath is advantageous in that the burden of waste liquid treatment can be reduced compared to using a copper cyanide bath or a pyrophosphoric acid bath. For information on how to perform copper plating in a copper sulfate bath,
"Metting Technology Handbook" (published by Nikkan Kogyo Shimbun, July 1973), "Practical Electrical Mitsuki" (Nikkan Kogyo Shimbun, published in 1972)
As is clear from publications such as ``Copper Sulfate Plating Bath'', copper sulfate, sulfuric acid, and a small amount of chlorine ion (C - ) are said to be essential in the composition of the copper sulfate plating bath, which makes the plated film glossy and uniform. Small amounts of surfactants (nonionic polymers) and sulfur-based organic compounds are usually added as plating bath additives to improve electrodeposition properties. (c) Problems to be solved by the invention However, according to the experience of the inventors, a phenomenon occurs when copper plating is applied to fine grooves with a width of 2 to 8 μm patterned with organic polymer using lithography technology. It was found that when an organic additive is included, the cross-sectional shape of the conductor coil becomes mountain-shaped. That is, as shown in FIG. 2, in the electromagnetic transducer 1 provided on the ceramic substrate 2, the cross-sectional shape of the conductor 5 formed by copper plating on the upper part of the lower magnetic film 3 through the gap 4 is chevron-shaped. In the next step, the upper magnetic film 7 formed on the conductive coil cannot be made flat even by normal means for eliminating steps, resulting in a wavy state. There was a problem in that the magnetic properties of the magnetic film deteriorated due to stress. (d) Means and action for solving the problem Therefore, the present inventors conducted studies from the viewpoint that it is extremely important for the top surface of the conductor to be flat in order to obtain a magnetoelectric transducer with good performance. As a result, we discovered that a matting bath with bromide ions or iodide ions added instead of the chlorine ions without adding the above-mentioned organic additives could yield a smooth plated film with a flat top surface. The invention was completed. FIG. 1 is a sectional view showing a magnetic head having a conductive coil plated with copper using the method of the present invention, in which the conductive coil is formed on the upper part of the lower magnetic film 3 of the electromagnetic transducer 1. The upper surfaces of the coils 5 are all flat, and therefore the upper magnetic film 7 formed above the coil also has a flat cross-sectional shape without any undulations. Table 1 shows the compositions of conventionally used general copper plating baths and the plating bath used in the method of the present invention.

【表】【table】

【表】 一般に硫酸銅濃度(例えば0.8モル)に対する
硫酸濃度(例えば0.5モル)の比率が低いめつき
浴よりもこの比率が高いめつき浴の方が均一電着
性(凹凸に対する応答性)がよいといわれてお
り、本発明の場合には硫酸濃度が硫酸銅濃度より
も高い範囲、好ましくはこれらの比率が3〜8の
ものが使用される。硫酸銅濃度が上表の範囲をこ
えるとめつき浴の耐久性に問題が生じるからであ
る。 従来の硫酸銅めつき浴ではめつき表面の光沢性
やレベリングをよくするために表面活性剤とイオ
ウを含む有機化合物がミリモルオーダーで添加さ
れており、このような浴組成で形成される銅めつ
き膜は形状が山形となつてしまう。これはリソグ
ラフイーパターンの素材であるレジストにめつき
浴中の前記有機物が壁面吸着し、めつき金属であ
る銅の析出に悪影響をおよぼすのではないかと想
定される。 また、従来のめつき浴にはごく少量の塩素イオ
ンの存在が不可欠であり、前掲の「実用電気めつ
き」にも「ごく少量のC-イオンは銅めつきの
レベリングに対して効果がある」と述べられてお
り、これはC-イオンがアノード溶解反応やカ
ソード反応の中間体に作用し光沢性、レベリング
に寄与すると考えられている。しかしながら、発
明者らの実験によれば、硫酸銅と硫酸並びにC
イオンからなるめつき浴を用いて微細パターン
に銅めつきを行つたところ、銅めつき膜の表面の
凹凸が甚しく実用に供し得なかつた。 したがつて、本発明の方法では硫酸濃度を硫酸
銅濃度よりも高く、好ましくは濃度比を3〜8と
し、前述のような有機系の添加剤を加えないで、
-イオンのかわりにBr-イオンまたはI-イオ
ンを加えた浴組成とするものである。添加される
イオンは夫々単独もしくは組合せて使用すること
ができ、そのイオン濃度が0.1ミリモル未満では
所望の効果が得られず、一方2ミリモルを超えて
添加すると浴の耐久性が悪くなるので添加すべき
Br-イオンまたはI-イオン濃度の範囲を0.1〜2ミ
リモルと定めた。 本発明の方法で銅めつきを行うと、第3図に示
すように、パターニングされたレジストフレーム
8の間にめつきされる銅めつき膜5の上面の平坦
性が確保される上に、高アスペクト比(縦横比が
大きい)のコイルを形成できるので電磁変換効率
を高めることが可能である。またコイル巻数を増
すために複数の層にコイルを形成する場合には極
めて効果的である。したがつて、本発明の方法は
磁気ヘツドは勿論、これ以外の微細なコイルや配
線などの作成に応用できることは当業者にとつて
明らかであろう。 次に、実施例により本発明をさらに説明する。 実施例 磁気ヘツド用磁電変換素子を調製する目的で、
レジスト上にリソグラフイーにより約5μm巾の微
細な溝をパターニングしたのち、第2表に示すよ
うなめつき浴組成を用いて銅めつきを行つた。
[Table] In general, plating baths with a high ratio of sulfuric acid concentration (for example, 0.5 mol) to copper sulfate concentration (for example, 0.8 mol) have better uniform electrodeposition (responsiveness to unevenness). In the present invention, the sulfuric acid concentration is higher than the copper sulfate concentration, preferably a ratio of 3 to 8 is used. This is because if the copper sulfate concentration exceeds the range shown in the table above, problems will arise in the durability of the plating bath. In conventional copper sulfate plating baths, surfactants and organic compounds containing sulfur are added in millimole order to improve the gloss and leveling of the plated surface. The attached film becomes chevron-shaped. It is assumed that this is because the organic substances in the plating bath are adsorbed on the walls of the resist, which is the material of the lithographic pattern, and have an adverse effect on the deposition of copper, which is the plating metal. In addition, the presence of a very small amount of chlorine ions is essential in conventional plating baths, and the aforementioned ``Practical Electroplating'' also states that ``a very small amount of C - ions is effective in leveling copper plating.'' It is believed that this is because C - ions act on intermediates of anode dissolution reactions and cathode reactions, contributing to glossiness and leveling. However, according to the inventors' experiments, copper sulfate, sulfuric acid and C
- When copper plating was performed on a fine pattern using a plating bath consisting of ions, the surface of the copper plating film was so uneven that it could not be put to practical use. Therefore, in the method of the present invention, the sulfuric acid concentration is higher than the copper sulfate concentration, preferably at a concentration ratio of 3 to 8, and without adding the above-mentioned organic additives.
The bath composition is such that Br - ions or I - ions are added instead of C - ions. The ions to be added can be used alone or in combination, and if the ion concentration is less than 0.1 mmol, the desired effect will not be obtained, while if it is added in excess of 2 mmol, the durability of the bath will deteriorate, so they should not be added. should
The range of Br - or I - ion concentration was determined to be 0.1-2 mmol. When copper plating is performed by the method of the present invention, as shown in FIG. 3, the flatness of the upper surface of the copper plating film 5 plated between the patterned resist frames 8 is ensured, and Since a coil with a high aspect ratio (large aspect ratio) can be formed, electromagnetic conversion efficiency can be increased. It is also extremely effective when forming a coil in multiple layers to increase the number of coil turns. Therefore, it will be obvious to those skilled in the art that the method of the present invention can be applied not only to magnetic heads but also to the production of other fine coils, wiring, etc. Next, the present invention will be further explained by examples. Example For the purpose of preparing a magnetoelectric transducer for a magnetic head,
After patterning fine grooves approximately 5 μm wide on the resist by lithography, copper plating was performed using the plating bath composition shown in Table 2.

【表】 得られた銅めつき膜の上面は総て平坦で、第3
図に示したような断面構造を有するものであつ
た。 なお、添加イオンを沃素イオンにかえて同様に
銅めつきを試みたが臭素イオンの場合と同様な結
果が得られた。 発明の効果 以上述べた如く、本発明によれば上面が平坦な
導電体コイルが得られる他に、高アスペクト比を
有するめつき膜が形成可能であるから電磁変換効
率を高めることができる。第4図に磁気変換素子
の周波数特性を示す。したがつて、従来の方法に
比して極めて効果的な銅めつき方法を提供するこ
ととなる。
[Table] The upper surface of the obtained copper-plated film was flat, and the third
It had a cross-sectional structure as shown in the figure. Note that copper plating was similarly attempted by changing the additive ions to iodide ions, but the same results as in the case of bromide ions were obtained. Effects of the Invention As described above, according to the present invention, in addition to obtaining a conductive coil with a flat top surface, it is also possible to form a plated film having a high aspect ratio, thereby increasing electromagnetic conversion efficiency. FIG. 4 shows the frequency characteristics of the magnetic transducer. Therefore, a copper plating method is provided that is extremely effective compared to conventional methods.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の方法で銅めつきした導電体コ
イルを有する磁気ヘツドの模式断面図、第2図は
従来の硫酸銅めつき浴を用いた場合の磁気ヘツド
の模式断面図である。第3図は本発明の方法で得
られた銅めつき膜を説明する断面図である。第4
図は本発明の方法および従来の方法で得られた磁
気変換素子の周波数特性を示す図である。 1……磁気ヘツド、2……セラミツク基板、3
……下部磁性膜、4……ギヤツプ、5……銅めつ
き導電体、6……レジスト、7……上部磁性膜、
8……レジストフレーム。
FIG. 1 is a schematic sectional view of a magnetic head having a conductive coil plated with copper by the method of the present invention, and FIG. 2 is a schematic sectional view of a magnetic head using a conventional copper sulfate plating bath. FIG. 3 is a cross-sectional view illustrating a copper-plated film obtained by the method of the present invention. Fourth
The figure is a diagram showing the frequency characteristics of magnetic transducer elements obtained by the method of the present invention and the conventional method. 1... Magnetic head, 2... Ceramic substrate, 3
... lower magnetic film, 4 ... gap, 5 ... copper-plated conductor, 6 ... resist, 7 ... upper magnetic film,
8...Regist frame.

Claims (1)

【特許請求の範囲】 1 セラミツク基板上に導電体と磁性膜とを設け
てなる電磁変換素子において、前記導電体は臭素
及びヨウ素の少なくとも1種を含む銅からなるこ
とを特徴とする電磁変換素子。 2 セラミツク基板上に電磁変換素子の導電体を
めつきで形成するための銅めつき浴において、該
銅めつき浴は、臭素イオン及びヨウ素イオンの少
なくとも1種を含む硫酸銅浴からなることを特徴
とする電磁変換素子の導電体作製用銅めつき浴。 3 前記臭素イオン及びヨウ素イオンの少なくと
も1種のイオン濃度が0.12ミリモルの範囲である
特許請求の範囲第2項記載の電磁変換素子の導電
体作製用銅めつき浴。
[Scope of Claims] 1. An electromagnetic transducer comprising a conductor and a magnetic film provided on a ceramic substrate, wherein the conductor is made of copper containing at least one of bromine and iodine. . 2. In a copper plating bath for forming a conductor of an electromagnetic conversion element on a ceramic substrate by plating, the copper plating bath is made of a copper sulfate bath containing at least one of bromine ions and iodine ions. Copper plating bath for producing conductors for electromagnetic conversion elements. 3. The copper plating bath for producing a conductor of an electromagnetic conversion element according to claim 2, wherein the ion concentration of at least one of the bromine ions and iodine ions is in the range of 0.12 mmol.
JP1688387A 1987-01-27 1987-01-27 Copper plating method for electric conductor coil for electromagnetic transducing device Granted JPS63186893A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1688387A JPS63186893A (en) 1987-01-27 1987-01-27 Copper plating method for electric conductor coil for electromagnetic transducing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1688387A JPS63186893A (en) 1987-01-27 1987-01-27 Copper plating method for electric conductor coil for electromagnetic transducing device

Publications (2)

Publication Number Publication Date
JPS63186893A JPS63186893A (en) 1988-08-02
JPH0431034B2 true JPH0431034B2 (en) 1992-05-25

Family

ID=11928570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1688387A Granted JPS63186893A (en) 1987-01-27 1987-01-27 Copper plating method for electric conductor coil for electromagnetic transducing device

Country Status (1)

Country Link
JP (1) JPS63186893A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3498306B2 (en) * 1999-09-16 2004-02-16 石原薬品株式会社 Void-free copper plating method
JP2009041097A (en) 2007-08-10 2009-02-26 Rohm & Haas Electronic Materials Llc Copper plating method
JP5442188B2 (en) 2007-08-10 2014-03-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. Copper plating solution composition
KR101385760B1 (en) * 2010-07-01 2014-04-17 미쓰이금속광업주식회사 Electrodeposited copper foil and process for production thereof

Also Published As

Publication number Publication date
JPS63186893A (en) 1988-08-02

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