JPH04318345A - Production of magneto-optical recording medium - Google Patents
Production of magneto-optical recording mediumInfo
- Publication number
- JPH04318345A JPH04318345A JP10969291A JP10969291A JPH04318345A JP H04318345 A JPH04318345 A JP H04318345A JP 10969291 A JP10969291 A JP 10969291A JP 10969291 A JP10969291 A JP 10969291A JP H04318345 A JPH04318345 A JP H04318345A
- Authority
- JP
- Japan
- Prior art keywords
- magneto
- optical recording
- magnetic film
- magnetic
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、光磁気記録媒体の製造
方法に係り、特に、基板と基板の片面に形成される磁性
膜の加熱処理に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magneto-optical recording medium, and more particularly to a heat treatment of a substrate and a magnetic film formed on one side of the substrate.
【0002】0002
【従来の技術】光磁気記録媒体は、高密度、非接触、不
揮発、書き換え可能なことを特徴とする情報記録媒体で
あって、そのうち光磁気ディスクは、次世代の情報記録
媒体として実用化されつつある。現在のところ、この光
磁気ディスクに設けられる情報記録膜としては、成膜時
に熱処理を必要としない磁性膜、特に希土類−遷移金属
系の非晶質合金からなる垂直磁化膜が主流となっている
。[Prior Art] Magneto-optical recording media are information recording media that are characterized by high density, non-contact, non-volatile, and rewritable properties. Among them, magneto-optical disks are being put into practical use as next-generation information recording media. It's coming. At present, the mainstream information recording film provided on magneto-optical disks is a magnetic film that does not require heat treatment during film formation, especially a perpendicularly magnetized film made of an amorphous rare earth-transition metal alloy. .
【0003】しかしながら、希土類−遷移金属系の非晶
質合金は、基板を高温に加熱しながら成膜するガーネッ
ト系酸化物などとは異なり、例えば日本応用磁気学会誌
、Vol.9、No.2(1985)、第97頁〜第1
00頁に記載されているように、高温に加熱されたとき
に磁気特性、例えば保磁力や垂直磁気異方性エネルギー
が変化しやすく、情報の記録・消去を繰り返しているう
ちに再生出力が低下するという欠点が指摘されている。However, rare earth-transition metal-based amorphous alloys are different from garnet-based oxides, which are formed into films while heating the substrate to high temperatures; 9, No. 2 (1985), pp. 97-1
As described on page 00, magnetic properties such as coercive force and perpendicular magnetic anisotropy energy tend to change when heated to high temperatures, and the reproduction output decreases as information is repeatedly recorded and erased. The shortcomings of doing so have been pointed out.
【0004】かかる再生出力低下の主たる原因は、高温
にさらされることによって磁性膜の構造が緩和されるた
めであり、磁性膜の成膜時あるいは成膜後に熱処理を施
して当初より磁性膜の構造をある程度緩和しておけば、
磁性膜を熱力学的な安定状態にすることができ、再生出
力の低下といった問題を改善することができる。The main cause of such a reduction in reproduction output is that the structure of the magnetic film is relaxed by exposure to high temperatures, and heat treatment is performed during or after the formation of the magnetic film to improve the structure of the magnetic film from the beginning. If you relax it to some extent,
The magnetic film can be brought into a thermodynamically stable state, and problems such as a decrease in reproduction output can be improved.
【0005】従来より、かかる知見に基づく再生出力の
低下防止方法として、例えば特開昭62−298046
号公報に記載されているように、磁性膜をキュリー温度
近傍まで加熱処理するといった光磁気記録媒体の製造方
法が提案されている。Conventionally, as a method for preventing a decrease in reproduction output based on this knowledge, for example, Japanese Patent Application Laid-Open No. 62-298046
As described in the above publication, a method for manufacturing a magneto-optical recording medium has been proposed in which a magnetic film is heat-treated to near the Curie temperature.
【0006】[0006]
【発明が解決しようとする課題】ところが、現在用いら
れている光磁気記録用の磁性膜の多くは、キュリー温度
が200℃前後あり、加熱方法を工夫したとしてもこの
温度まで加熱すると、基板の熱変形を防止することが難
しい。特に、基板として耐熱温度が低いプラスチック基
板を用いた場合、およびガラス基板の片面に光硬化性樹
脂製のレプリカ層が設けられたものを用いた場合には、
案内溝などのプリフォーマットパターンの変形が著しく
、所望のトラッキング特性を得ることができないといっ
た問題を生じる。However, many of the magnetic films currently used for magneto-optical recording have a Curie temperature of around 200°C, and even if the heating method is devised, heating to this temperature will cause the substrate to deteriorate. It is difficult to prevent thermal deformation. In particular, when a plastic substrate with a low heat resistance temperature is used as the substrate, or when a glass substrate with a photocurable resin replica layer provided on one side is used,
This causes a problem in that the preformat pattern such as the guide groove is significantly deformed, making it impossible to obtain desired tracking characteristics.
【0007】本発明は、前記した従来技術の欠点を解消
するためになされたものであって、基板の変形が少なく
、かつ記録・消去の繰り返しによる再生出力の低下が少
ない光磁気記録媒体の熱処理方法を提供することを目的
とする。The present invention has been made in order to eliminate the drawbacks of the prior art described above, and is a heat treatment method for magneto-optical recording media that causes less deformation of the substrate and less decrease in reproduction output due to repeated recording and erasing. The purpose is to provide a method.
【0008】[0008]
【課題を解決するための手段】本発明は、前記の目的を
達成するため、まず第1に、片面に光硬化性樹脂製のプ
リフォーマットパターンのレプリカ層が設けられたガラ
ス基板の信号面に、少なくとも磁性膜を含む光磁気記録
層を成膜する工程を含む光磁気記録媒体の製造方法にお
いて、前記磁性膜の成膜中もしくは成膜後に、前記ガラ
ス基板と前記磁性膜との積層体を、前記レプリカ層を構
成する光硬化性樹脂材料のガラス転移温度以下で、かつ
前記磁性膜に最大50%の磁気特性変化を生じさせる温
度条件および時間条件で加熱処理するといった熱処理方
法をとる。[Means for Solving the Problems] In order to achieve the above-mentioned objects, the present invention first provides a signal surface of a glass substrate having a replica layer of a preformat pattern made of a photocurable resin on one side. , in a method for manufacturing a magneto-optical recording medium including a step of forming a magneto-optical recording layer including at least a magnetic film, a laminate of the glass substrate and the magnetic film is formed during or after the formation of the magnetic film. A heat treatment method is used in which heat treatment is performed at a temperature below the glass transition temperature of the photocurable resin material constituting the replica layer and under temperature and time conditions that cause a maximum change in magnetic properties of 50% in the magnetic film.
【0009】また、第2に、片面にプリフォーマットパ
ターンが直接形成されたプラスチック基板の信号面に、
少なくとも磁性膜を含む光磁気記録層を成膜する工程を
含む光磁気記録媒体の製造方法において、前記磁性膜の
成膜中もしくは成膜後に、前記プラスチック基板と前記
磁性膜との積層体を、前記プラスチック基板を構成する
プラスチック材料のガラス転移温度以下で、かつ前記磁
性膜に最大50%の磁気特性変化を生じさせる温度条件
および時間条件のもとで加熱処理するといった熱処理方
法をとる。Second, on the signal surface of a plastic substrate on which a preformat pattern is directly formed,
In a method for manufacturing a magneto-optical recording medium including a step of forming a magneto-optical recording layer including at least a magnetic film, during or after forming the magnetic film, a laminate of the plastic substrate and the magnetic film is formed, A heat treatment method is used in which heat treatment is performed at a temperature below the glass transition temperature of the plastic material constituting the plastic substrate and under temperature and time conditions that cause the magnetic film to change its magnetic properties by up to 50%.
【0010】さらに、第3に、片面にプリフォーマット
パターンが直接カッティングされたガラス基板の信号面
に、少なくとも磁性膜を含む光磁気記録層を成膜する工
程を含む光磁気記録媒体の製造方法において、前記磁性
膜の成膜中もしくは成膜後に、前記ガラス基板と前記磁
性膜との積層体を、前記ガラス基板を構成するガラス材
料のガラス転移温度以下で、かつ前記磁性膜に最大50
%の磁気特性変化を生じさせる温度条件および時間条件
のもとで加熱処理するといった熱処理方法をとる。Furthermore, thirdly, a method for manufacturing a magneto-optical recording medium including the step of forming a magneto-optical recording layer containing at least a magnetic film on the signal surface of a glass substrate having a preformat pattern directly cut on one side. During or after the formation of the magnetic film, the laminate of the glass substrate and the magnetic film is heated at a temperature below the glass transition temperature of the glass material constituting the glass substrate, and at a temperature of up to 50% on the magnetic film.
A heat treatment method is used in which heat treatment is performed under temperature and time conditions that cause a change in magnetic properties of %.
【0011】前記の加熱処理は、磁性膜の酸化を防止す
るため、不活性ガス雰囲気中もしくは真空中で行うこと
が好ましい。そして、前記の加熱処理を真空中で行う場
合には、処理槽内の真空度を1/102 〔Torr〕
以下に調整することが特に好ましい。また、前記の加熱
処理を行う際の温度条件および時間条件の基礎となる磁
性膜の磁気特性としては、保磁力あるいは垂直磁気異方
性エネルギーを用いることができる。[0011] The above heat treatment is preferably carried out in an inert gas atmosphere or in vacuum in order to prevent oxidation of the magnetic film. When the above heat treatment is performed in a vacuum, the degree of vacuum in the treatment tank is reduced to 1/102 [Torr].
It is particularly preferable to adjust as follows. Furthermore, coercive force or perpendicular magnetic anisotropy energy can be used as the magnetic properties of the magnetic film that are the basis of the temperature and time conditions when performing the heat treatment.
【0012】なお、成膜時に熱処理を必要としない磁性
膜を備えたすべての光磁気記録媒体が本発明の対象にな
るが、特に、〔テルビウム、ガドリニウム、ネオジム、
ジスプロシウム、ホルミウム、プラセオジム〕元素群か
ら選択された少なくとも1種類の元素と、〔鉄、コバル
ト〕元素群から選択された少なくとも1種類の元素と、
〔ニオブ、タンタル、チタン、クロム、白金、ロジウム
、パラジウム〕元素群から選択された少なくとも1種類
の元素とを主成分とする合金(特に、非晶質合金)から
なる垂直磁化膜を備えた光磁気記録媒体に応用した場合
に顕著な効果がある。[0012] The present invention applies to all magneto-optical recording media having a magnetic film that does not require heat treatment during film formation, but in particular [terbium, gadolinium, neodymium,
at least one element selected from the element group [dysprosium, holmium, praseodymium]; at least one element selected from the [iron, cobalt] element group;
[Niobium, tantalum, titanium, chromium, platinum, rhodium, palladium] A light source equipped with a perpendicularly magnetized film made of an alloy (especially an amorphous alloy) containing at least one element selected from the element group It has a remarkable effect when applied to magnetic recording media.
【0013】[0013]
【作用】前記のように、加熱温度を基板材料のガラス転
移温度以下に押えると、トラッキング特性に影響を与え
るような大きな基板変形やプリフォーマットパターンの
変形を防止することができる。[Operation] As mentioned above, by keeping the heating temperature below the glass transition temperature of the substrate material, it is possible to prevent large deformation of the substrate and deformation of the preformat pattern that would affect the tracking characteristics.
【0014】また、磁性膜の磁気特性の変化を基準とし
て加熱処理の温度条件と時間条件とを設定すると、情報
の記録に悪影響を与えない最大限の範囲で磁性膜の構造
を緩和することができる。実験によると、加熱処理を施
さない磁性膜に対して、保磁力や垂直磁気異方性エネル
ギーが50%まで低下するような加熱処理を施した場合
にも、情報の記録に悪影響がないことが判った。[0014] Furthermore, by setting the temperature and time conditions of the heat treatment based on changes in the magnetic properties of the magnetic film, it is possible to relax the structure of the magnetic film to the maximum extent that does not adversely affect information recording. can. Experiments have shown that there is no adverse effect on information recording even when heat treatment is applied to a magnetic film that has not been subjected to heat treatment, such that the coercive force and perpendicular magnetic anisotropy energy are reduced by up to 50%. understood.
【0015】よって、前記のような加熱処理方法をとる
ことによって、基板の変形が少なく、かつ記録・消去の
繰り返しによる再生出力の低下が少ない光磁気記録媒体
を作製することができる。Therefore, by employing the heat treatment method as described above, it is possible to produce a magneto-optical recording medium in which the substrate is less deformed and the reproduction output is less reduced due to repeated recording and erasing.
【0016】[0016]
【実施例】以下、本発明の実施例を、図を参照しつつ説
明する。
〈第1実施例〉図1は本例に係る光磁気記録媒体の製造
方法を実行する真空成膜装置の説明図であって、1は第
1スパッタ室、2は第2スパッタ室、3は第3スパッタ
室、4は熱処理室、5は第4スパッタ室、6は各室1〜
5に備えられた基板ホルダ、7は基板ホルダ6に取り付
けられた基板、8a,8b,8c,8dは各スパッタ室
1,2,3,5にそれぞれ備えられたターゲット、9は
熱処理室4に備えられた赤外線ランプである。Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings. <First Example> FIG. 1 is an explanatory diagram of a vacuum film forming apparatus for carrying out the method for manufacturing a magneto-optical recording medium according to this example, in which 1 is a first sputtering chamber, 2 is a second sputtering chamber, and 3 is a 3rd sputtering chamber, 4 heat treatment chamber, 5 4th sputtering chamber, 6 each chamber 1-
5 is a substrate holder provided, 7 is a substrate attached to the substrate holder 6, 8a, 8b, 8c, 8d are targets provided in each sputtering chamber 1, 2, 3, 5, and 9 is a heat treatment chamber 4. It is equipped with an infrared lamp.
【0017】基板7としては、片面に光硬化性樹脂製の
プリフォーマットパターンのレプリカ層が設けられたガ
ラス基板を用いた。これらの基板7は、信号面をターゲ
ット8a〜8dに向けるようにして、基板ホルダ6に取
り付けられる。As the substrate 7, a glass substrate was used, on one side of which a replica layer of a preformat pattern made of photocurable resin was provided. These substrates 7 are attached to the substrate holder 6 with the signal surfaces facing the targets 8a to 8d.
【0018】ターゲット8aおよび8cは、基板7上ま
たは第2スパッタ室2で成膜された磁性膜上に、例えば
SiNなどの無機誘電体膜を成膜する材料からなり、タ
ーゲット8bは、第1スパッタ室1で成膜された無機誘
電体膜上に磁性膜、例えば〔テルビウム、ガドリニウム
、ネオジム、ジスプロシウム、ホルミウム、プラセオジ
ム〕元素群から選択された少なくとも1種類の元素と、
〔鉄、コバルト〕元素群から選択された少なくとも1種
類の元素と、〔ニオブ、タンタル、チタン、クロム、白
金、ロジウム、パラジウム〕元素群から選択された少な
くとも1種類の元素とを主成分とする合金膜を成膜する
材料からなる。また、ターゲット8dは、第3スパッタ
室3で成膜された無機誘電体膜上に、例えばAlTiな
どの金属反射膜を成膜する材料からなる。The targets 8a and 8c are made of a material for forming an inorganic dielectric film, such as SiN, on the substrate 7 or on the magnetic film formed in the second sputtering chamber 2, and the target 8b is A magnetic film, for example, at least one element selected from the element group [terbium, gadolinium, neodymium, dysprosium, holmium, praseodymium] on the inorganic dielectric film formed in the sputtering chamber 1;
The main component is at least one element selected from the [iron, cobalt] element group and at least one element selected from the [niobium, tantalum, titanium, chromium, platinum, rhodium, palladium] element group. It consists of a material that forms an alloy film. Further, the target 8d is made of a material for forming a metal reflective film, such as AlTi, on the inorganic dielectric film formed in the third sputtering chamber 3.
【0019】以下、上記の真空成膜装置を用いた光磁気
ディスクの製造方法について説明する。A method of manufacturing a magneto-optical disk using the above-mentioned vacuum film forming apparatus will be explained below.
【0020】まず、基板ホルダ6に1ないし複数個のデ
ィスク状基板7を取り付けて第1スパッタ室1に収納し
、所定の真空条件下で、基板7の信号面に第1の無機誘
電体膜を成膜する。次に、第1の無機誘電体膜が成膜さ
れた基板7を基板ホルダ6と共に第2スパッタ室2に移
送し、所定の真空条件下で、前記第1の無機誘電体膜上
に光磁気記録層である磁性膜、例えば希土類−遷移金属
系の非晶質合金からなる垂直磁化膜を成膜する。次に、
磁性膜が成膜された基板7を基板ホルダ6と共に第3ス
パッタ室3に移送し、所定の真空条件下で、前記磁性膜
上に第2の無機誘電体膜を成膜する。次に、第2の無機
誘電体膜が成膜された基板7を基板ホルダ6と共に熱処
理室4に移送し、不活性ガス雰囲気中または真空中(好
ましくは真空度が1/102Torr以下)で、赤外線
ランプ9を点灯して、磁性膜に加熱処理をほどこす。加
熱条件は、前記レプリカ層を構成する光硬化性樹脂材料
のガラス転移温度以下で、かつ前記磁性膜に20%の磁
気特性変化を生じさせる温度条件および時間条件とする
。First, one or more disk-shaped substrates 7 are attached to the substrate holder 6 and housed in the first sputtering chamber 1, and a first inorganic dielectric film is formed on the signal surface of the substrate 7 under predetermined vacuum conditions. Deposit a film. Next, the substrate 7 on which the first inorganic dielectric film has been formed is transferred to the second sputtering chamber 2 together with the substrate holder 6, and under predetermined vacuum conditions, a magneto-optical film is formed on the first inorganic dielectric film. A magnetic film serving as a recording layer, for example, a perpendicular magnetization film made of an amorphous rare earth-transition metal alloy is formed. next,
The substrate 7 on which the magnetic film has been formed is transferred together with the substrate holder 6 to the third sputtering chamber 3, and a second inorganic dielectric film is formed on the magnetic film under predetermined vacuum conditions. Next, the substrate 7 on which the second inorganic dielectric film has been formed is transferred to the heat treatment chamber 4 together with the substrate holder 6, and in an inert gas atmosphere or in vacuum (preferably the degree of vacuum is 1/102 Torr or less). The infrared lamp 9 is turned on to heat the magnetic film. The heating conditions are temperature and time conditions that are below the glass transition temperature of the photocurable resin material constituting the replica layer and that cause a 20% change in magnetic properties in the magnetic film.
【0021】なお、加熱処理に際しては、図3に示すよ
うに、磁性膜の磁気特性の変化(図3では垂直磁気異方
性エネルギーが例示されている)と、加熱温度と、加熱
時間との関係を実測しておき、このグラフ図を参考にし
て実際の加熱条件を設定する。すなわち、図3のグラフ
図より、本例にあっては磁性膜を200℃で30秒間加
熱する。しかる後に、基板と各膜との熱膨張率差に起因
するストレスによって基板から膜が剥離するのを防止す
るため、徐冷した。During the heat treatment, as shown in FIG. 3, changes in the magnetic properties of the magnetic film (perpendicular magnetic anisotropy energy is illustrated in FIG. 3), heating temperature, and heating time are considered. Measure the relationship and set the actual heating conditions using this graph as a reference. That is, from the graph of FIG. 3, in this example, the magnetic film is heated at 200° C. for 30 seconds. Thereafter, the film was slowly cooled to prevent the film from peeling off from the substrate due to stress caused by the difference in coefficient of thermal expansion between the substrate and each film.
【0022】次に、所定の加熱処理が施された基板7を
基板ホルダ6と共に第4スパッタ室5に移送し、所定の
真空条件下で、前記第2の無機誘電体膜上に金属反射膜
を積層して、図2の膜構造を有する光磁気ディスクを作
製した。なお、図2において、11は第1の無機誘電体
膜、12は磁性膜、13は第2の無機誘電体膜、14は
金属反射膜を示している。Next, the substrate 7 that has been subjected to a predetermined heat treatment is transferred to the fourth sputtering chamber 5 together with the substrate holder 6, and a metal reflective film is formed on the second inorganic dielectric film under a predetermined vacuum condition. A magneto-optical disk having the film structure shown in FIG. 2 was manufactured by laminating the following layers. In FIG. 2, 11 is a first inorganic dielectric film, 12 is a magnetic film, 13 is a second inorganic dielectric film, and 14 is a metal reflective film.
【0023】最後に、この光磁気ディスクを各膜11〜
14を内側にして熱硬化性樹脂により貼り合せ、両面記
録形の光磁気ディスクを作製した。Finally, this magneto-optical disk is coated with each film 11 to
They were bonded together with thermosetting resin with No. 14 facing inside to produce a double-sided recording type magneto-optical disk.
【0024】〈第2実施例〉基板として、片面にプリフ
ォーマットパターンが直接形成されたプラスチック基板
を用い、前記第1実施例と同様の方法で各膜の成膜と加
熱処理とを行った。加熱条件は、基板プラスチック材料
のガラス転移温度以下で、かつ前記磁性膜に10%の磁
気特性変化を生じさせる温度条件および時間条件とする
。具体的には、図3のグラフ図より、120℃で30分
間とした。Second Example A plastic substrate with a preformat pattern directly formed on one side was used as the substrate, and each film was formed and heat treated in the same manner as in the first example. The heating conditions are temperature and time conditions that are below the glass transition temperature of the substrate plastic material and cause a 10% change in magnetic properties in the magnetic film. Specifically, according to the graph of FIG. 3, the temperature was 120° C. for 30 minutes.
【0025】〈第3実施例〉図1に示した真空成膜装置
を用いて、ポリカーボネート基板の信号面に、ZrO製
の第1の無機誘電体膜と、NdTbFeCo製の磁性膜
と、ZrO製の第2の無機誘電体膜と、AlCr製の反
射膜とを順次積層した。ただし、この成膜過程において
は、加熱処理を行わなかった。<Third Example> Using the vacuum film forming apparatus shown in FIG. A second inorganic dielectric film and a reflective film made of AlCr were sequentially laminated. However, no heat treatment was performed during this film formation process.
【0026】成膜終了後、同一構造の2枚の光磁気ディ
スクを各膜を内側にして熱硬化性樹脂により貼り合せ、
1000組の両面記録形の光磁気ディスクを作製した。After film formation, two magneto-optical disks with the same structure are bonded together with a thermosetting resin, with each film on the inside.
One thousand sets of double-sided recording type magneto-optical disks were manufactured.
【0027】次に、これら1000組の両面記録形の光
磁気ディスクをヒータ加熱形の乾燥機内に同時に格納し
、乾燥機内を不活性ガス雰囲気または真空(好ましくは
真空度が1/102 Torr以下)に調節した後、ポ
リカーボネート樹脂のガラス転移温度(145℃)以下
で、かつ前記磁性膜に20%の磁気特性変化を生じさせ
る温度条件および時間条件にて加熱処理を行った。Next, these 1000 sets of double-sided recording type magneto-optical disks are stored simultaneously in a heater-heated dryer, and the inside of the dryer is kept in an inert gas atmosphere or vacuum (preferably the degree of vacuum is 1/102 Torr or less). After adjusting the temperature, heat treatment was performed at a temperature below the glass transition temperature (145° C.) of the polycarbonate resin and under temperature and time conditions that caused a 20% change in magnetic properties in the magnetic film.
【0028】加熱条件は、第1実施例と同様に図3のグ
ラフ図を参考にし、加熱温度を130℃、加熱時間を5
時間と設定した。As with the first embodiment, the heating conditions were as follows: the heating temperature was 130°C, and the heating time was 55°C.
I set the time.
【0029】〈第4実施例〉図1に示した真空成膜装置
を用いて、片面にプリフォーマットパターンが直接カッ
ティングされたガラス基板の信号面に、SiNx製の第
1の無機誘電体膜と、TbFeCoPtNb製の磁性膜
と、SiNx製の第2の無機誘電体膜と、Ti製の反射
膜とを順次積層した。ただし、この成膜過程においては
、加熱処理を行わなかった。<Fourth Example> Using the vacuum film forming apparatus shown in FIG. 1, a first inorganic dielectric film made of SiNx and a first inorganic dielectric film made of SiN , a magnetic film made of TbFeCoPtNb, a second inorganic dielectric film made of SiNx, and a reflective film made of Ti were sequentially laminated. However, no heat treatment was performed during this film formation process.
【0030】成膜終了後、この光磁気ディスクを熱処理
槽に格納し、熱処理槽内を不活性ガス雰囲気または真空
(好ましくは真空度が1/102 Torr以下)に調
節した後、図4に示すようにガラス基板7側から赤外線
ランプ9の赤外線を照射し、TbFeCoPtNb製の
磁性膜12を基板ガラスのガラス転移温度以下で、かつ
前記磁化膜に20%の磁気特性変化を生じさせる温度条
件および時間条件にて加熱処理した。After the film formation is completed, this magneto-optical disk is stored in a heat treatment tank, and the inside of the heat treatment tank is adjusted to an inert gas atmosphere or a vacuum (preferably the degree of vacuum is 1/102 Torr or less), as shown in FIG. Infrared rays from an infrared lamp 9 are irradiated from the glass substrate 7 side as shown in FIG. Heat treatment was performed under the following conditions.
【0031】加熱条件は、第1実施例と同様に図3のグ
ラフ図を参考にし、加熱温度を250℃、加熱時間を5
秒間と設定した。As with the first embodiment, the heating conditions were as follows: the heating temperature was 250°C, and the heating time was 55°C.
It was set to seconds.
【0032】最後に、同一構造の2枚の光磁気ディスク
を各膜を内側にして熱硬化性樹脂により貼り合せ、両面
記録形の光磁気ディスクを作製した。Finally, two magneto-optical disks having the same structure were bonded together with a thermosetting resin with each film facing inside to produce a double-sided recording type magneto-optical disk.
【0033】図5に、前記第1〜第3実施例に係る光磁
気ディスクの同一記録領域に繰り返し記録・消去を行っ
たときの再生CN比の変化と、成膜後加熱処理を行わな
かった光磁気ディスクの同一記録領域に繰り返し記録・
消去を行ったときの再生CN比の変化とを示す。また、
図6に、前記第1〜第3実施例に係る光磁気ディスクの
外部磁場依存性と、成膜後加熱処理を行わなかった光磁
気ディスクの外部磁場依存性とを示す。なお、測定に当
たっては、厳格を期すため、通常の記録・消去時のレー
ザパワーよりも20%増のレーザパワーで情報の記録・
消去を行った。FIG. 5 shows the change in reproduction CN ratio when repeatedly recording and erasing was performed on the same recording area of the magneto-optical disks according to the first to third embodiments, and the changes in the reproduction CN ratio when no heat treatment was performed after film formation. Repeated recording and recording in the same recording area of a magneto-optical disk
3 shows a change in reproduction CN ratio when erasing is performed. Also,
FIG. 6 shows the external magnetic field dependence of the magneto-optical disks according to the first to third embodiments and the external magnetic field dependence of the magneto-optical disk which was not subjected to post-film-forming heat treatment. In addition, in order to ensure strict measurement, information was recorded and erased using a laser power 20% higher than the laser power used for normal recording and erasing.
I deleted it.
【0034】図5に示すように、前記第1および第4実
施例の光磁気ディスクは、108 回以上情報の記録・
消去を繰り返しても再生CN比は全く低下しない。一方
、前記第2および第3実施例の光磁気ディスクは、10
6 回を経過したあたりからやや再生CN比が低下する
が、加熱処理を行わなかった光磁気ディスク(グラフ中
に未処理と表示されたもの)に比べて低下の程度が格段
に小さく、108 回以上情報の記録・消去を繰り返し
ても約47〔dB〕以上の再生CN比を得ることができ
る。As shown in FIG. 5, the magneto-optical disks of the first and fourth embodiments can be used to record information 108 times or more.
Even if erasing is repeated, the reproduced CN ratio does not decrease at all. On the other hand, the magneto-optical disks of the second and third embodiments have 10
The reproduction CN ratio decreases slightly after 6 cycles, but the degree of decline is much smaller than that of magneto-optical discs that were not heat-treated (displayed as untreated in the graph), and after 108 cycles. Even if the recording and erasing of information is repeated as described above, a reproduction CN ratio of about 47 [dB] or more can be obtained.
【0035】また、図6に示すように、前記第1ないし
第4実施例の光磁気ディスクは、いずれも未処理の光磁
気ディスクに比べて外部磁場依存性が高くなっており、
±100〔Oe〕程度の外部磁界で情報の記録・消去を
行うことができる。Furthermore, as shown in FIG. 6, the magneto-optical disks of the first to fourth embodiments all have higher dependence on external magnetic fields than untreated magneto-optical disks.
Information can be recorded and erased using an external magnetic field of about ±100 [Oe].
【0036】もちろん、前記第1ないし第4実施例の光
磁気ディスクは、記録・消去動作中にレーザビームスポ
ットのトラックオフやプリピット信号の読み出しエラー
を全く起さず、プリフォーマットパターンの変形防止に
も効果があることが判った。Of course, the magneto-optical disks of the first to fourth embodiments do not cause any laser beam spot track-off or pre-pit signal read error during recording/erasing operations, and prevent deformation of the preformat pattern. was also found to be effective.
【0037】なお、これらの効果は、磁性膜に最大50
%の磁気特性変化を生じさせる温度条件および時間条件
で加熱処理した場合にも得られた。また、図2に示した
膜構造の光磁気ディスクのみならず、図7に示すように
基板7上に磁性膜12のみが形成された光磁気ディスク
、図8に示すように基板7上に誘電体層11を介して磁
性膜12が形成された光磁気ディスク、さらには図9に
示すように基板7上に組成が異なる3層の磁性膜12a
,12b,12cが順次積層されて記録層12が形成さ
れた光磁気ディスクについても同様の結果が得られた。[0037] These effects can be obtained by applying a maximum of 50% to the magnetic film.
It was also obtained when heat-treated under temperature and time conditions that caused a change in magnetic properties of %. In addition to the magneto-optical disk having the film structure shown in FIG. 2, there is also a magneto-optical disk in which only the magnetic film 12 is formed on the substrate 7 as shown in FIG. A magneto-optical disk on which a magnetic film 12 is formed via a body layer 11, and furthermore, as shown in FIG. 9, three layers of magnetic films 12a having different compositions are formed on a substrate 7.
, 12b, 12c were sequentially laminated to form the recording layer 12, similar results were obtained.
【0038】[0038]
【発明の効果】以上説明したように、本発明によると、
加熱温度を基板材料のガラス転移温度以下に押えたので
、トラッキング特性に影響を与えるような大きな基板変
形やプリフォーマットパターンの変形を防止することが
でき、また、磁性膜の磁気特性の変化を基準として加熱
処理の温度条件と時間条件とを設定したので、情報の記
録に悪影響を与えない最大限の範囲で磁性膜の構造を緩
和することができる。よって、基板の変形が少なく、か
つ記録・消去の繰り返しによる再生出力の低下が少ない
光磁気記録媒体を作製することができる。[Effects of the Invention] As explained above, according to the present invention,
Since the heating temperature is kept below the glass transition temperature of the substrate material, it is possible to prevent large substrate deformation and deformation of the preformat pattern that would affect tracking characteristics, and it is also possible to prevent changes in the magnetic properties of the magnetic film. Since the temperature and time conditions for the heat treatment are set as follows, the structure of the magnetic film can be relaxed to the maximum extent that does not adversely affect information recording. Therefore, it is possible to produce a magneto-optical recording medium in which the substrate is less deformed and the reproduction output is less reduced due to repeated recording and erasing.
【図1】真空成膜装置の説明図である。FIG. 1 is an explanatory diagram of a vacuum film forming apparatus.
【図2】光磁気ディスクの膜構造の一例を示す断面図で
ある。FIG. 2 is a cross-sectional view showing an example of a film structure of a magneto-optical disk.
【図3】加熱温度と加熱時間と垂直磁気異方性エネルギ
ーの関係を示すグラフ図である。FIG. 3 is a graph showing the relationship between heating temperature, heating time, and perpendicular magnetic anisotropy energy.
【図4】加熱方法の他の例を示す説明図である。FIG. 4 is an explanatory diagram showing another example of a heating method.
【図5】記録・消去の繰り返し回数と再生CN比との関
係を示すグラフ図である。FIG. 5 is a graph diagram showing the relationship between the number of repetitions of recording/erasing and the reproduction CN ratio.
【図6】再生CNレベルの外部磁場依存性を示すグラフ
図である。FIG. 6 is a graph diagram showing the dependence of the reproduced CN level on an external magnetic field.
【図7】光磁気ディスクの膜構造の他の例を示す断面図
である。FIG. 7 is a cross-sectional view showing another example of the film structure of a magneto-optical disk.
【図8】光磁気ディスクの膜構造のさらに他の例を示す
断面図である。FIG. 8 is a cross-sectional view showing still another example of the film structure of a magneto-optical disk.
【図9】光磁気ディスクの膜構造のさらに他の例を示す
断面図である。FIG. 9 is a cross-sectional view showing still another example of the film structure of a magneto-optical disk.
1 第1スパッタ室 2 第2スパッタ室 3 第3スパッタ室 4 熱処理室 5 第4スパッタ室 6 基板ホルダ 7 基板 8a〜8d ターゲット 9 赤外線ランプ 11 第1の無機誘電体層 12 磁性膜 13 第2の無機誘電体層 14 反射層 1 First sputtering chamber 2 Second sputtering chamber 3 Third sputtering chamber 4 Heat treatment chamber 5 Fourth sputtering chamber 6 Board holder 7 Board 8a-8d Target 9 Infrared lamp 11 First inorganic dielectric layer 12 Magnetic film 13 Second inorganic dielectric layer 14 Reflection layer
Claims (8)
ットパターンのレプリカ層が設けられたガラス基板の信
号面に、少なくとも磁性膜を含む光磁気記録層を成膜す
る工程を含む光磁気記録媒体の製造方法において、前記
磁性膜の成膜中もしくは成膜後に、前記ガラス基板と前
記磁性膜との積層体を、前記レプリカ層を構成する光硬
化性樹脂材料のガラス転移温度以下で、かつ前記磁性膜
に最大50%の磁気特性変化を生じさせる温度条件およ
び時間条件で加熱処理することを特徴とする光磁気記録
媒体の製造方法。1. A magneto-optical recording medium comprising the step of depositing a magneto-optical recording layer containing at least a magnetic film on the signal surface of a glass substrate provided with a replica layer of a preformat pattern made of a photocurable resin on one side. In the manufacturing method, during or after the formation of the magnetic film, the laminate of the glass substrate and the magnetic film is heated at a temperature equal to or lower than the glass transition temperature of the photocurable resin material constituting the replica layer, and 1. A method for manufacturing a magneto-optical recording medium, which comprises heat-treating a magnetic film under temperature and time conditions that cause a change in magnetic properties of up to 50%.
接形成されたプラスチック基板の信号面に、少なくとも
磁性膜を含む光磁気記録層を成膜する工程を含む光磁気
記録媒体の製造方法において、前記磁性膜の成膜中もし
くは成膜後に、前記プラスチック基板と前記磁性膜との
積層体を、前記プラスチック基板を構成するプラスチッ
ク材料のガラス転移温度以下で、かつ前記磁性膜に最大
50%の磁気特性変化を生じさせる温度条件および時間
条件のもとで加熱処理することを特徴とする光磁気記録
媒体の製造方法。2. A method for manufacturing a magneto-optical recording medium, comprising the step of forming a magneto-optical recording layer containing at least a magnetic film on the signal surface of a plastic substrate on which a preformat pattern is directly formed. During or after film formation, the laminate of the plastic substrate and the magnetic film is heated at a temperature below the glass transition temperature of the plastic material constituting the plastic substrate, and the magnetic properties of the magnetic film are changed by up to 50%. 1. A method for manufacturing a magneto-optical recording medium, which comprises performing heat treatment under temperature and time conditions that cause the formation of the temperature and time conditions.
接カッティングされたガラス基板の信号面に、少なくと
も磁性膜を含む光磁気記録層を成膜する工程を含む光磁
気記録媒体の製造方法において、前記磁性膜の成膜中も
しくは成膜後に、前記ガラス基板と前記磁性膜との積層
体を、前記ガラス基板を構成するガラス材料のガラス転
移温度以下で、かつ前記磁性膜に最大50%の磁気特性
変化を生じさせる温度条件および時間条件のもとで加熱
処理することを特徴とする光磁気記録媒体の製造方法。3. A method for manufacturing a magneto-optical recording medium, comprising the step of forming a magneto-optical recording layer containing at least a magnetic film on the signal surface of a glass substrate having a preformat pattern directly cut on one side, wherein the magnetic film During or after film formation, the laminate of the glass substrate and the magnetic film is heated at a temperature below the glass transition temperature of the glass material constituting the glass substrate, and the magnetic properties of the magnetic film are changed by up to 50%. 1. A method for manufacturing a magneto-optical recording medium, which comprises performing heat treatment under temperature and time conditions that cause the formation of the temperature and time conditions.
、前記加熱処理を不活性ガス雰囲気中もしくは真空中で
行うことを特徴とする光磁気記録媒体の製造方法。4. The method for manufacturing a magneto-optical recording medium according to claim 1, wherein the heat treatment is performed in an inert gas atmosphere or in vacuum.
を真空中で行う際、処理槽内の真空度を1/102 〔
Torr〕以下に調整することを特徴とする光磁気記録
媒体の製造方法。5. In claim 4, when the heat treatment is performed in a vacuum, the degree of vacuum in the treatment tank is reduced to 1/102.
Torr] or less.
、前記磁性膜の磁気特性が、保磁力あるいは垂直磁気異
方性エネルギーであることを特徴とする光磁気記録媒体
の製造方法。6. The method of manufacturing a magneto-optical recording medium according to claim 1, wherein the magnetic property of the magnetic film is coercive force or perpendicular magnetic anisotropy energy.
、前記磁性膜が、〔テルビウム、ガドリニウム、ネオジ
ム、ジスプロシウム、ホルミウム、プラセオジム〕元素
群から選択された少なくとも1種類の元素と、〔鉄、コ
バルト〕元素群から選択された少なくとも1種類の元素
と、〔ニオブ、タンタル、チタン、クロム、白金、ロジ
ウム、パラジウム〕元素群から選択された少なくとも1
種類の元素とを主成分とする合金にて形成されているこ
とを特徴とする光磁気記録媒体の製造方法。7. In any one of claims 1 to 3, the magnetic film comprises at least one element selected from the group of elements [terbium, gadolinium, neodymium, dysprosium, holmium, praseodymium], and [iron, At least one element selected from the element group [cobalt] and at least one element selected from the element group [niobium, tantalum, titanium, chromium, platinum, rhodium, palladium]
1. A method for manufacturing a magneto-optical recording medium, characterized in that the medium is formed of an alloy whose main components are:
晶質合金であることを特徴とする光磁気記録媒体の製造
方法。8. The method of manufacturing a magneto-optical recording medium according to claim 7, wherein the alloy is an amorphous alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10969291A JPH04318345A (en) | 1991-04-16 | 1991-04-16 | Production of magneto-optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10969291A JPH04318345A (en) | 1991-04-16 | 1991-04-16 | Production of magneto-optical recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04318345A true JPH04318345A (en) | 1992-11-09 |
Family
ID=14516779
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10969291A Pending JPH04318345A (en) | 1991-04-16 | 1991-04-16 | Production of magneto-optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04318345A (en) |
-
1991
- 1991-04-16 JP JP10969291A patent/JPH04318345A/en active Pending
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