JPH0432525U - - Google Patents
Info
- Publication number
- JPH0432525U JPH0432525U JP7537090U JP7537090U JPH0432525U JP H0432525 U JPH0432525 U JP H0432525U JP 7537090 U JP7537090 U JP 7537090U JP 7537090 U JP7537090 U JP 7537090U JP H0432525 U JPH0432525 U JP H0432525U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- ion exchange
- cleaning solution
- exchange resin
- cleaning device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は本考案に係る洗浄装置の一実施例を示
す図、第２図はイオン交換槽を示す概念図、第３
図は洗浄工程のフローチヤート、第４図は従来の
洗浄装置の一例図である。
５……半導体基板、６……洗浄液、７……イオ
ン交換樹脂、７ａ……イオン交換槽。
Fig. 1 is a diagram showing an embodiment of the cleaning device according to the present invention, Fig. 2 is a conceptual diagram showing an ion exchange tank, and Fig. 3 is a conceptual diagram showing an ion exchange tank.
The figure is a flowchart of the cleaning process, and FIG. 4 is an example of a conventional cleaning device. 5... Semiconductor substrate, 6... Cleaning liquid, 7... Ion exchange resin, 7a... Ion exchange tank.
Claims (1)
おいて、洗浄槽に満たされた洗浄液を循環する経
路途上に、イオン交換樹脂を備えたイオン交換槽
を配設し、前記イオン交換樹脂に洗浄液を接触さ
せることを特徴とする半導体基板用洗浄液の清浄
化装置。 In a cleaning device that cleans a substrate by immersing it in a cleaning solution, an ion exchange tank equipped with an ion exchange resin is disposed in the path through which the cleaning solution filled in the cleaning tank is circulated, and the cleaning solution is brought into contact with the ion exchange resin. A cleaning device for cleaning liquid for semiconductor substrates, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7537090U JPH0432525U (en) | 1990-07-16 | 1990-07-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7537090U JPH0432525U (en) | 1990-07-16 | 1990-07-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0432525U true JPH0432525U (en) | 1992-03-17 |
Family
ID=31615895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7537090U Pending JPH0432525U (en) | 1990-07-16 | 1990-07-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0432525U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0263586A (en) * | 1988-08-27 | 1990-03-02 | Nec Corp | Cleaning device |
-
1990
- 1990-07-16 JP JP7537090U patent/JPH0432525U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0263586A (en) * | 1988-08-27 | 1990-03-02 | Nec Corp | Cleaning device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0432525U (en) | ||
| JPS58138340U (en) | Carrier for cleaning and etching wafers | |
| JPH0335U (en) | ||
| JPS63127126U (en) | ||
| JPS6183032U (en) | ||
| JPS6426836U (en) | ||
| JPS6052622U (en) | semiconductor manufacturing equipment | |
| JPH0245632U (en) | ||
| JPH02102725U (en) | ||
| JPH01104024U (en) | ||
| JPS58110997U (en) | Cleaning liquid heating device | |
| JPS6276534U (en) | ||
| JPH0195278U (en) | ||
| JPH0160532U (en) | ||
| JPS5984839U (en) | semiconductor manufacturing equipment | |
| JPS62120341U (en) | ||
| JPH01104026U (en) | ||
| JPS62101230U (en) | ||
| JPS6332689U (en) | ||
| JPH0247031U (en) | ||
| JPH0314064U (en) | ||
| JPS617030U (en) | semiconductor manufacturing equipment | |
| JPH0468524U (en) | ||
| JPS62184857U (en) | ||
| JPH0350329U (en) |