JPH0432782B2 - - Google Patents

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Publication number
JPH0432782B2
JPH0432782B2 JP19950987A JP19950987A JPH0432782B2 JP H0432782 B2 JPH0432782 B2 JP H0432782B2 JP 19950987 A JP19950987 A JP 19950987A JP 19950987 A JP19950987 A JP 19950987A JP H0432782 B2 JPH0432782 B2 JP H0432782B2
Authority
JP
Japan
Prior art keywords
weight
parts
glaze
frit
firing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19950987A
Other languages
Japanese (ja)
Other versions
JPS6442342A (en
Inventor
Kimiki Hatanaka
Tooru Oonuki
Takaaki Toki
Takashi Matsubara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inax Corp
Original Assignee
Inax Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inax Corp filed Critical Inax Corp
Priority to JP19950987A priority Critical patent/JPS6442342A/en
Priority to DE8888307217T priority patent/DE3877278T2/en
Priority to ES198888307217T priority patent/ES2037836T3/en
Priority to EP88307217A priority patent/EP0303402B1/en
Priority to KR1019880010166A priority patent/KR910003251B1/en
Publication of JPS6442342A publication Critical patent/JPS6442342A/en
Publication of JPH0432782B2 publication Critical patent/JPH0432782B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

[産業上の利用分野] 本発明はタイル用釉薬に係り、特に内装用タイ
ルを1回の焼成のみで製造する、所謂一度焼きに
用いるタイル用釉薬に関する。 [従来の技術] 従来より、内装用タイルは2回焼成過程を経
る、所謂二度焼きにより製造されている。即ち、
従来の内装用タイルは、坏土の成形及び乾燥の
後、第1回目の焼成(素焼き)を行ない、冷却
後、この素焼きタイルに釉掛けし、第2回目の焼
成を行うことにより製造されている。 このように内装用タイルの場合に二度焼きする
理由は次の通りである。外装用タイルに比べ、内
装用タイルは厚く釉掛けする必要があるのである
が、仮に一度焼きするために坏土成形体(圧粉
体)に厚く釉掛けすると、焼成過程において坏土
から発生するガスが釉層を通過しにくくなり、半
溶融ないしは溶融状態にある釉層を突き破り、釉
層にクレータ状のガス噴出穴や気泡、ピンホー
ル、亀裂等の泡吹き現象と称される事態が生じて
しまうのである。 即ち、坏土成形体(素地)を焼成するプロセス
においては、該坏土中に含まれる炭酸塩系鉱物の
熱分解や有機物質の燃焼に伴つてガスが発生す
る。このガス発生は、極めてゆつくりと昇温する
場合には700〜800℃程度で完了するのであるが、
ローラーハースキルン等を採用する高生産効率製
造法の下では昇温速度が大であり、上記ガス発生
反応は遅延し、周囲温度が1000℃を超える領域に
までずれ込むようになる。殊に、成形体内部にお
いては該成形体表面に比べ昇温が遅れるから周囲
温度が1100℃になつてもガス発生反応が継続して
いる場合すらある。 従来のタイル用釉薬においては、1000℃前後程
度から急速に軟化を開始し、溶融状態となつてタ
イル素地表面を覆うようになるのであるが、この
ように溶けた釉が表面を覆つた後でも前記の如く
素地内部からガスが発生してくることになると前
記の泡吹き現象が生じてしまうのである。 二度焼き方式によれば、素地は素焼品となつて
おり、2度目の焼成時には素地からのガス発生は
無く、厚く釉掛けしても泡吹き現象が発生せず、
光沢に富み奇麗な平坦施釉面を有する内装用タイ
ルが製造される。 [発明が解決しようとする問題点] 叙上の如く、従来の釉薬を用いて内装用タイル
を一度焼き方式にて製造しようとすると、泡吹き
現象が生じ、およそ製品とするには適わない釉面
となつてしまつていた。 そのため、従来では、内装用タイルは二度焼き
によらざるを得ず、それだけ焼成燃料コストが高
く、焼成の手間等も嵩み、生産性が低いものとな
つていた。 [問題点を解決するための手段] 本発明は、一度焼きにて内装用タイルを製造す
ることを可能とするタイル用釉薬を提供するもの
であり、このタイル用釉薬は下記〜の成分
100重量部に対して0〜15重量部の顔料を含むも
のである。 SiO2 55〜65重量% Al2O3 10〜18重量% CaO 18〜25重量% アルカリ金属の酸化物 0.5〜4重量% ZrO2 0〜10重量% B2O3 0〜2重量% MgO、BaO、SrO及びZnOの1種又は2種以
上 合計で0〜10重量% を含むフリツト:50〜90重量部 長石:8〜25重量部 粘土:0.5〜10重量部 ジルコン:0〜20重量部 珪砂:0〜10重量部 アルミナ:0〜5重量部 酸化チタン:0〜10重量部 炭酸バリウム:0〜10重量部 酸化亜鉛:0〜5重量部 [作用] かかる本発明のタイル用釉薬に含まれるフリツ
トは、アルカリ金属の酸化物及びB2O3成分が微
量であり、軟化開始点よりも高い温度に加熱して
も粘性低下が緩慢であり、軟化開始温度よりも相
当高温にならないと素地表面を全面的に、所謂べ
たつと覆うようにはならない。また、フリツト以
外の成分も同様である。そのため、素地内部から
ガスが発生しても、このガスはフリツト粒子の間
を通り抜けて外部に容易に抜け出すことができる
ようになり、泡吹き現象が防止される。 以下、本発明のタイル用釉薬の各成分の作用を
その好ましい態様と共に詳細に説明する。 まず、本発明のタイル用釉薬に含まれるフリ
ツトの成分について説明する。 本発明のフリツトにおいて、SiO2、Al2O3は高
軟化点フリツトを構成する主成分であり、アルミ
ノシリケート系ガラスの骨格部分を構成する。 また、CaOとアルカリ金属の酸化物(以下、
R2Oと略)とは、それぞれ上記アルミノシリケー
トのネツトワークを部分的に断ち切り、そのガラ
ス化を促進し、軟化開始温度を低下させる作用を
有する。 本発明において、フリツトの組成は、SiO2
55〜65重量%(以下%と略)Al2O3が10〜18%、
CaOが18〜25%、R2Oが0.5〜4%であることが
好適であり、それぞれ上記範囲を逸脱するとフリ
ツトの軟化温度が過度に低くなつて泡吹き現象を
もたらしたり、逆に軟化温度が過度に高くなつて
素地焼成後においても釉が十分には溶けない事態
が生じる。特に好ましい範囲は、SiO2は60〜64
%、Al2O3は12〜16%、CaOは19〜23%、R2Oは
1〜3%である。なお、Li2Oはなくてもよいが、
二度焼に準ずる釉面の平滑性を得るためには添加
するのが好ましい。このLi2Oの含有%は0.5〜1.5
%の範囲が好ましい。0.5%未満では平滑性の改
善効果が少なく、1.5%を超えると釉面にピンホ
ールが出易くなる。 本発明のフリツトは、B2O3、MgO、ZnO、
SrO及びBaOを含んでも良い。これらの酸化物を
必要に応じ含有させることにより、フリツトの軟
化点を低下させることができる。これらの酸化物
は、過度に多く含有するとフリツトの軟化点が過
度に低下し、また軟化開始後急速にフリツトの粘
性を低下させるようになるので、B2O3は2%以
下とりわけ1%以下、MgOは5%以下とりわけ
3%以下、ZnOは5%以下とりわけ3%以下、
SrOは5%以下とりわけ3%以下、BaOは5%以
下とりわけ3%以下とするのが好ましい。なお、
MgO、BaO、SrO及びZnOは合量でも10%以下
とする。 本発明のフリツトは、素地の隠蔽力を付与する
ZrO2を10%以下含有していても良い。 本発明のフリツトは、さらに必要に応じ他の
BaO等の酸化物や塩化物、硫酸塩等の化合物を
含んでも良いが、それらは合量でも3%以下とり
わけ1%以下とするのが好ましい。 本発明に用いるフリツトは常法に従い、通常の
フリツト用原料を調合及び溶融後、冷却し、次い
で粉砕することにより製造することができる。 長石、粘土は、釉薬の融点を上げる作用を
有する。本発明において釉薬の好適な融点を得る
ために、長石を8〜25重量部、好ましくは15〜21
重量部、カオリン、蛙目等の粘土を0.5〜10重量
部好ましくは2〜4重量部とする。 ジルコン(珪酸ジルコニウム)は隠蔽力を付
与する成分であつて、その配合量は0〜20重量
部、好ましくは10〜15重量部とする。 珪砂、アルミナ、酸化チタン、炭酸バ
リウム、酸化亜鉛は、釉薬の融点の調節、並び
に、表面の光沢の調整を行なう成分であつて、そ
れぞれ配合量は、珪砂0〜10重量部、アルミナ0
〜5重量部、酸化チタン0〜10重量部、炭酸バリ
ウム0〜10重量部、酸化亜鉛0〜5重量部とす
る。 顔料は、タイルの施釉面の意匠性の向上の目的
で、必要に応じて配合される。顔料としてはタイ
ル用に用いられる顔料であればいずれも使用する
ことができあ、この配合量は、上記〜の成分
100重量部に対して、0〜15重量部とする。 本発明のタイル用釉薬は、上記〜の成分及
び必要に応じて顔料、その他の成分を所定割合と
なるように、水、アルコールその他適宜の液体に
必要に応じ分散剤を用い分散させて調製される。 [実施例] 以下、本発明を実施例及び比較例に基いてさら
に詳細に説明する。 なお、以下の実施例及び比較例において、タイ
ル用の坏土成形体としては次のものを用いた。即
ち、ろう石45重量部、粘土40重量部、石灰石10重
量部及びシヤモツト5重量部をボールミルで粉砕
し、混合し、水分を加え、350Kg/cm2で成形し、
これを乾燥したものである。この成形体(素地)
の大きさは10cm×10cm×0.5cmである。 また、この成形体を焼成するには全長25mのロ
ーラーハースキルンを用い、走行速度1.0m/分、
焼成帯最高温度1190℃とした。 実施例 1 原料として長石、珪石、石灰石を採用し、これ
らを乾燥、粉砕、篩分けした後調合し、るつぼ中
で1400℃にて1時間溶融した後急冷し、フリツト
とした。このフリツト化学組成を第1表に示す。 このフリツト70重量部に対し長石15重量部、粘
土2重量部、ジルコン13重量部を加え、ボールミ
ルにて混合した。これに水33重量部とカルボン酸
系分散剤0.2重量部を加え、さらにボールミル中
で混合し、泥漿釉とした。 この泥漿釉を幕掛け法により前記成形体表面に
乾燥後の厚さが0.6mm程度となるように塗付し、
乾燥後焼成した。 焼成後、タイルを観察したところ、釉面は泡吹
きは全くなく、平坦で光沢を帯び、厚い釉薬層を
有する高級感に富む内装用タイルであることが認
められた。 実施例 2〜8 実施例1において原料の配合比を変更すること
により、また原料としてさらにジルコン、ホウ
砂、マグネシア、酸化亜鉛を付加すること以外は
同様にして第1表に示す組成のフリツトを製造し
た。そして、これらのフリツトを用い、実施例1
と同様にして泥漿釉とし、成形体に塗付し乾燥及
び焼成を行なつた。 その結果いずれも実施例1と同様に優れた表面
性状を有する内装用タイルが製造された。 比較例 1、2、3、4 組成を第1表に示す通りとしたこと以外は上記
実施例と同様にしてフリツトを製造し、同様に泥
漿釉とし、成形体に塗付し乾燥及び焼成を行なつ
た。その結果、いずれも釉薬層に泡吹きが生じ
た。 比較例 5 長石43重量部、珪砂65重量部、粘土4.0重量部、
石灰13.0重量部を調合することにより第1表に示
す組成の釉薬(生釉)を製造した。これを泥漿に
して成形体に塗付し、乾燥及び焼成を行なつたと
ころ、釉薬層に泡吹きが生じた。
[Industrial Application Field] The present invention relates to a tile glaze, and more particularly to a tile glaze used for so-called one-time firing, in which interior tiles are manufactured by only one firing. [Prior Art] Traditionally, interior tiles have been manufactured by undergoing a two-time firing process, so-called double firing. That is,
Conventional interior tiles are manufactured by first firing (unglazed) after molding and drying the clay, then after cooling, glazing the unglazed tile and firing for a second time. There is. The reason why interior tiles are fired twice is as follows. Compared to exterior tiles, interior tiles need to be glazed thickly, but if you apply a thick glaze to the clay molded body (powder compact) for firing once, glazes will be generated from the clay during the firing process. It becomes difficult for gas to pass through the glaze layer, and it breaks through the glaze layer, which is in a semi-molten or molten state, causing a phenomenon called bubble blowing, such as crater-shaped gas ejection holes, bubbles, pinholes, and cracks in the glaze layer. That's what happens. That is, in the process of firing a clay molded body (base material), gas is generated as a result of thermal decomposition of carbonate minerals and combustion of organic substances contained in the clay. This gas generation is completed at around 700 to 800 degrees Celsius when the temperature rises extremely slowly.
Under a highly productive manufacturing method that employs a roller hearth kiln or the like, the rate of temperature rise is high, and the above gas generation reaction is delayed, causing the ambient temperature to exceed 1000°C. In particular, since the temperature rise inside the molded body is delayed compared to the surface of the molded body, the gas generation reaction may even continue even when the ambient temperature reaches 1100°C. Conventional tile glazes begin to soften rapidly at around 1,000℃, becoming molten and covering the surface of the tile base, but even after the molten glaze covers the surface, As mentioned above, when gas is generated from inside the substrate, the above-mentioned bubbling phenomenon occurs. According to the twice-fired method, the base material is unglazed, and there is no gas generation from the base material during the second firing, and no bubble-blowing phenomenon occurs even when glazed thickly.
Interior tiles with a glossy and beautiful flat glazed surface are manufactured. [Problems to be Solved by the Invention] As mentioned above, when attempting to manufacture interior tiles using a one-time firing method using conventional glazes, a bubbling phenomenon occurs and the glaze becomes unsuitable for use as a product. It had become a face. Therefore, conventionally, tiles for interior use had to be fired twice, which increased the cost of firing fuel, increased the labor involved in firing, and resulted in low productivity. [Means for Solving the Problems] The present invention provides a glaze for tiles that makes it possible to manufacture interior tiles by firing once, and this glaze for tiles contains the following ingredients.
It contains 0 to 15 parts by weight of pigment per 100 parts by weight. SiO 2 55-65% by weight Al 2 O 3 10-18% by weight CaO 18-25% by weight Alkali metal oxides 0.5-4% by weight ZrO 2 0-10% by weight B 2 O 3 0-2% by weight MgO, Fritz containing one or more of BaO, SrO and ZnO in a total of 0 to 10 parts by weight: 50 to 90 parts by weight Feldspar: 8 to 25 parts by weight Clay: 0.5 to 10 parts by weight Zircon: 0 to 20 parts by weight Silica sand : 0 to 10 parts by weight Alumina: 0 to 5 parts by weight Titanium oxide: 0 to 10 parts by weight Barium carbonate: 0 to 10 parts by weight Zinc oxide: 0 to 5 parts by weight [Function] Contained in the tile glaze of the present invention Frit contains trace amounts of alkali metal oxides and B 2 O 3 components, and its viscosity decreases slowly even when heated to a temperature higher than the softening start point. It does not cover the entire area in a so-called sticky manner. The same applies to components other than the frit. Therefore, even if gas is generated from inside the base, this gas can easily escape to the outside through the spaces between the frit particles, thereby preventing the bubble blowing phenomenon. Hereinafter, the action of each component of the tile glaze of the present invention will be explained in detail together with its preferred embodiments. First, the components of the frit contained in the tile glaze of the present invention will be explained. In the frit of the present invention, SiO 2 and Al 2 O 3 are the main components constituting the high softening point frit and constitute the skeleton of the aluminosilicate glass. In addition, CaO and alkali metal oxides (hereinafter referred to as
R 2 O (abbreviated as R 2 O) has the effect of partially cutting off the network of the aluminosilicate, promoting its vitrification, and lowering the softening start temperature. In the present invention, the composition of the frit is SiO 2
55-65% by weight (hereinafter abbreviated as %) Al 2 O 3 10-18%,
It is preferable that CaO is 18 to 25% and R 2 O is 0.5 to 4%. If the above ranges are exceeded, the softening temperature of the frit may become excessively low, resulting in a bubbling phenomenon, or conversely, the softening temperature A situation may occur where the glaze becomes too high and the glaze does not melt sufficiently even after firing the base. Particularly preferred range is SiO 2 from 60 to 64
%, Al2O3 is 12-16%, CaO is 19-23%, and R2O is 1-3%. Note that Li 2 O may be omitted, but
It is preferable to add it in order to obtain the smoothness of the glaze surface equivalent to twice-baked. The content% of this Li 2 O is 0.5 to 1.5
A range of % is preferred. If it is less than 0.5%, the effect of improving smoothness is small, and if it exceeds 1.5%, pinholes are likely to appear on the glaze surface. The frit of the present invention contains B 2 O 3 , MgO, ZnO,
It may also contain SrO and BaO. By including these oxides as necessary, the softening point of the frit can be lowered. If these oxides are contained in an excessively large amount, the softening point of the frit will be excessively lowered, and the viscosity of the frit will be rapidly lowered after softening begins, so the B 2 O 3 content should be 2% or less, especially 1% or less. , MgO is 5% or less, especially 3% or less, ZnO is 5% or less, especially 3% or less,
SrO is preferably 5% or less, especially 3% or less, and BaO is preferably 5% or less, especially 3% or less. In addition,
The total amount of MgO, BaO, SrO and ZnO shall be 10% or less. The frit of the present invention imparts hiding power to the substrate.
It may contain 10% or less of ZrO 2 . The frit of the present invention may be further modified with other materials as necessary.
Although it may contain compounds such as oxides such as BaO, chlorides, and sulfates, the total amount thereof is preferably 3% or less, especially 1% or less. The frit used in the present invention can be manufactured in accordance with a conventional method by mixing and melting ordinary raw materials for frits, cooling them, and then pulverizing them. Feldspar and clay have the effect of raising the melting point of the glaze. In order to obtain a suitable melting point of the glaze in the present invention, 8 to 25 parts by weight of feldspar is added, preferably 15 to 21 parts by weight.
The amount of clay, such as kaolin and frog's eye clay, is 0.5 to 10 parts by weight, preferably 2 to 4 parts by weight. Zircon (zirconium silicate) is a component that imparts hiding power, and its amount is 0 to 20 parts by weight, preferably 10 to 15 parts by weight. Silica sand, alumina, titanium oxide, barium carbonate, and zinc oxide are components that adjust the melting point of the glaze and the gloss of the surface, and their respective blending amounts are 0 to 10 parts by weight of silica sand, 0 parts by weight of alumina, and 0 to 10 parts by weight of silica sand.
-5 parts by weight, titanium oxide 0-10 parts by weight, barium carbonate 0-10 parts by weight, and zinc oxide 0-5 parts by weight. The pigment is added as necessary for the purpose of improving the design of the glazed surface of the tile. As the pigment, any pigment used for tiles can be used.
The amount is 0 to 15 parts by weight per 100 parts by weight. The glaze for tiles of the present invention is prepared by dispersing the above ingredients, pigments, and other ingredients as necessary in water, alcohol, or other appropriate liquid using a dispersant as necessary, in a predetermined ratio. Ru. [Examples] Hereinafter, the present invention will be explained in more detail based on Examples and Comparative Examples. In addition, in the following examples and comparative examples, the following clay molded bodies for tiles were used. That is, 45 parts by weight of waxite, 40 parts by weight of clay, 10 parts by weight of limestone, and 5 parts by weight of Syamoto were ground in a ball mill, mixed, added with moisture, and molded at 350 kg/cm 2 .
This is dried. This molded body (base material)
The size is 10cm x 10cm x 0.5cm. In addition, a roller hearth kiln with a total length of 25 m was used to fire this molded body, and the running speed was 1.0 m/min.
The maximum temperature of the firing zone was 1190°C. Example 1 Feldspar, silica, and limestone were used as raw materials, and these were dried, crushed, and sieved, then blended, melted in a crucible at 1400°C for 1 hour, and then rapidly cooled to form a frit. The chemical composition of this frit is shown in Table 1. To 70 parts by weight of this frit, 15 parts by weight of feldspar, 2 parts by weight of clay, and 13 parts by weight of zircon were added and mixed in a ball mill. To this, 33 parts by weight of water and 0.2 parts by weight of a carboxylic acid dispersant were added and further mixed in a ball mill to form a slurry glaze. This slurry glaze is applied to the surface of the molded body using the curtain method so that the thickness after drying is approximately 0.6 mm,
After drying, it was fired. When the tile was observed after firing, it was found that the glazed surface had no bubbles at all, was flat and glossy, and had a thick glaze layer, making it a high-class interior tile. Examples 2 to 8 Frits having the composition shown in Table 1 were produced in the same manner as in Example 1, except that the blending ratio of the raw materials was changed and zircon, borax, magnesia, and zinc oxide were further added as raw materials. Manufactured. Using these frits, Example 1
A slurry glaze was prepared in the same manner as above, and the slurry glaze was applied to a molded body, dried and fired. As a result, interior tiles having excellent surface properties similar to those of Example 1 were manufactured. Comparative Examples 1, 2, 3, 4 A frit was manufactured in the same manner as in the above example except that the composition was as shown in Table 1, and a slurry glaze was applied in the same manner to a molded body, followed by drying and firing. I did it. As a result, bubbling occurred in the glaze layer in all cases. Comparative Example 5 43 parts by weight of feldspar, 65 parts by weight of silica sand, 4.0 parts by weight of clay,
A glaze (raw glaze) having the composition shown in Table 1 was produced by mixing 13.0 parts by weight of lime. When this slurry was applied to a molded body, dried and fired, bubbles appeared in the glaze layer.

【表】 なお、実施例1の釉及び比較例4で調合した生
釉を圧力10Kg/cm2で直径0.2cm、高さ0.3cmの円柱
体(以下、ボタンという。)に成形し、これらを
昇温速度10℃/minにて空気雰囲気下で常温から
1200℃まで加熱し、ボタンの高さの経時変化をマ
イクロスコープにて測定した。その結果を第1図
に示す。 第1図より、生釉は1040℃位から急速に軟化を
開始し、その後の粘性低下も急であることが認め
られる。これに対し、実施例1の釉は、約900℃
位で軟化を開始するものの、その後の粘性低下は
極めて緩慢であり、1100℃〜1150℃の高温域にお
いても相当の高粘性であることが認められる。な
お、図中、横軸は温度である。縦軸は、ボタンの
高さ(焼成前の高さを100とした時の各温度での
ボタンの高さ)を示している。 このように本発明に用いられているフリツトは
高温域でも高粘性であるため、焼成時に成形体か
ら発生するガスがフリツト粒子同志の間を容易に
通過するようになり、釉薬層の泡吹き現象が確実
に防止されることが裏付けられた。なお、本発明
の釉薬のフリツトは、成形体からのガス発生が終
了する焼成帯の最高温度付近においては十分に軟
化し、素地の表面を均一に覆うようになる。 実施例9〜14、比較例6〜9 第1表に示す組成のフイツトNo.1〜3のうちの
いずれかを用い、フリツト、長石、粘土、ジルコ
ン、その他を第2表に示す割合で配合したこと以
外は、実施例1と同様にして釉を調製し、得られ
た釉を成形体表面に塗付、乾燥、焼成した。 焼成後、タイルを観察したところ実施例9〜14
のものはいずれも釉面に泡吹きは全くなく、平坦
で光沢を帯び、厚い釉薬層を有する高級感に富む
内装用タイルであることが認められ。 一方、比較例6〜9のうち、比較例6〜8は焼
成中に泡が吹き、比較例9のものは光沢が不足
し、いずれも製品には不適であることが確認され
た。
[Table] The glaze of Example 1 and the raw glaze prepared in Comparative Example 4 were molded into a cylindrical body (hereinafter referred to as a button) with a diameter of 0.2 cm and a height of 0.3 cm at a pressure of 10 kg/cm 2 . From room temperature in an air atmosphere at a heating rate of 10℃/min
The button was heated to 1200°C and changes in button height over time were measured using a microscope. The results are shown in FIG. From Figure 1, it can be seen that the raw glaze begins to soften rapidly at around 1040°C, and the viscosity decreases rapidly thereafter. In contrast, the glaze of Example 1 was heated to approximately 900°C.
Although it starts to soften at about 100°C, the viscosity declines thereafter is extremely slow, and it is recognized that the viscosity is considerably high even in the high temperature range of 1100°C to 1150°C. In addition, in the figure, the horizontal axis is temperature. The vertical axis indicates the height of the button (the height of the button at each temperature when the height before firing is set as 100). As described above, the frit used in the present invention has a high viscosity even in a high temperature range, so the gas generated from the molded body during firing easily passes between the frit particles, resulting in the bubbling phenomenon of the glaze layer. It was confirmed that this can be reliably prevented. The glaze frit of the present invention is sufficiently softened near the maximum temperature of the firing zone at which gas generation from the molded body ends, and it comes to uniformly cover the surface of the base. Examples 9 to 14, Comparative Examples 6 to 9 Using any of Fitts No. 1 to 3 having the composition shown in Table 1, frit, feldspar, clay, zircon, and others were mixed in the proportions shown in Table 2. Except for the above, a glaze was prepared in the same manner as in Example 1, and the obtained glaze was applied to the surface of the molded body, dried, and fired. After firing, the tiles were observed and found Examples 9 to 14.
All of them were recognized as interior tiles with a high-quality feel, with no bubbles on the glaze surface, flat and glossy, and a thick glaze layer. On the other hand, among Comparative Examples 6 to 9, bubbles were blown in Comparative Examples 6 to 8 during firing, and Comparative Example 9 lacked gloss, and it was confirmed that all of them were unsuitable for use as products.

【表】 [効果] 以上の実施例及び比較例からも明らかな通り、
本発明のタイル用釉薬を用いることにより美麗な
厚掛けした釉薬層を有するタイルが一度焼きにし
て製造される。従つて、本発明のタイル用釉薬を
採用することにより内装用タイルの製造コストが
大幅に低減される。
[Table] [Effect] As is clear from the above examples and comparative examples,
By using the tile glaze of the present invention, tiles having a beautiful thick glaze layer can be produced by firing once. Therefore, by employing the tile glaze of the present invention, the manufacturing cost of interior tiles can be significantly reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は実施例における測定結果を示すグラフ
である。
FIG. 1 is a graph showing measurement results in Examples.

Claims (1)

【特許請求の範囲】 1 合計で100重量部の下記〜、即ち、 SiO2 55〜65重量% Al2O3 10〜18重量% CaO 18〜25重量% アルカリ金属の酸化物 0.5〜4重量% ZrO2 0〜10重量% B2O3 0〜2重量% MgO、BaO、SrO及びZnOの1種又は2種以
上 合計で0〜10重量% を含むフリツト:50〜90重量部 長石:8〜25重量部 粘土:0.5〜10重量部 ジルコン:0〜20重量部 珪砂:0〜10重量部 アルミナ:0〜5重量部 酸化チタン:0〜10重量部 炭酸バリウム:0〜10重量部 酸化亜鉛:0〜5重量部 を含み、さらにこの100重量部に対して0〜15重
量部の顔料を含むタイル用釉薬。
[Scope of Claims] 1 A total of 100 parts by weight of the following: SiO 2 55-65% by weight Al 2 O 3 10-18% by weight CaO 18-25% by weight Alkali metal oxides 0.5-4% by weight ZrO 2 0-10% by weight B 2 O 3 0-2% by weight Fritz containing 0-10% by weight of one or more of MgO, BaO, SrO and ZnO: 50-90 parts by weight Feldspar: 8- 25 parts by weight Clay: 0.5-10 parts by weight Zircon: 0-20 parts by weight Silica sand: 0-10 parts by weight Alumina: 0-5 parts by weight Titanium oxide: 0-10 parts by weight Barium carbonate: 0-10 parts by weight Zinc oxide: A glaze for tiles containing 0 to 5 parts by weight, and further containing 0 to 15 parts by weight of pigment per 100 parts by weight.
JP19950987A 1987-08-10 1987-08-10 Glaze for tile Granted JPS6442342A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP19950987A JPS6442342A (en) 1987-08-10 1987-08-10 Glaze for tile
DE8888307217T DE3877278T2 (en) 1987-08-10 1988-08-04 METHOD FOR PRODUCING TILES WITH A SINGLE COMBUSTION.
ES198888307217T ES2037836T3 (en) 1987-08-10 1988-08-04 TILE PRODUCTION METHOD.
EP88307217A EP0303402B1 (en) 1987-08-10 1988-08-04 Method of producing tiles by single firing
KR1019880010166A KR910003251B1 (en) 1987-08-10 1988-08-10 Frit for tile glaze

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19950987A JPS6442342A (en) 1987-08-10 1987-08-10 Glaze for tile

Publications (2)

Publication Number Publication Date
JPS6442342A JPS6442342A (en) 1989-02-14
JPH0432782B2 true JPH0432782B2 (en) 1992-06-01

Family

ID=16408999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19950987A Granted JPS6442342A (en) 1987-08-10 1987-08-10 Glaze for tile

Country Status (1)

Country Link
JP (1) JPS6442342A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04349144A (en) * 1991-05-24 1992-12-03 Inax Corp Ultra-glossy glaze
KR101238264B1 (en) * 2010-12-21 2013-03-04 명지대학교 산학협력단 Tialite based gray pigments and preparation method thereof
JP6205751B2 (en) * 2013-02-28 2017-10-04 Toto株式会社 Glaze composition capable of forming a highly diffuse and reflective antifouling glaze layer and member having a glaze layer formed thereby
CN112408793B (en) * 2020-11-24 2022-09-06 清远市简一陶瓷有限公司 High-light-transmission wear-resistant frit, preparation method thereof, glaze and marble ceramic tile
CN113336443B (en) * 2021-06-21 2022-12-27 广东家美陶瓷有限公司 Digital transparent glaze applied to production of deep black full-polished ceramic tiles

Also Published As

Publication number Publication date
JPS6442342A (en) 1989-02-14

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