JPH04336470A - Manufacture of semiconductor pressure detection device - Google Patents

Manufacture of semiconductor pressure detection device

Info

Publication number
JPH04336470A
JPH04336470A JP13816791A JP13816791A JPH04336470A JP H04336470 A JPH04336470 A JP H04336470A JP 13816791 A JP13816791 A JP 13816791A JP 13816791 A JP13816791 A JP 13816791A JP H04336470 A JPH04336470 A JP H04336470A
Authority
JP
Japan
Prior art keywords
semiconductor pressure
wafer
detection device
pressure detection
glass pedestal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13816791A
Other languages
Japanese (ja)
Inventor
Takanobu Takeuchi
孝信 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13816791A priority Critical patent/JPH04336470A/en
Publication of JPH04336470A publication Critical patent/JPH04336470A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Abstract

PURPOSE:To prevent a joint portion between a sensor chip and a glass pedestal from being deviated and water, etc., from being gathered in a semiconductor pressure detection device. CONSTITUTION:A sensor chip is etched after a pedestal and a sensor chip are joined. A rear surface treatment process for etching a wafer 2 is eliminated and at the same time a deviation between a glass pedestal 4 and a pressure- introduction hole 5 is eliminated.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、半導体圧力検出装置
の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a semiconductor pressure detection device.

【0002】0002

【従来の技術】図2は半導体圧力検出装置の組立フロー
の一部を示すもので、図2aにおいて、1は半導体圧力
検出素子、2はこの半導体圧力検出素子1を構成するウ
エハ、3は半導体圧力検出素子1の裏面に形成され圧力
感度を向上させるためのダイヤフラム、4は外部からの
応力が半導体圧力検出素子1に加わるのを緩和するガラ
ス台座、5はこのガラス台座4に設けられた圧力導入孔
である。
2. Description of the Related Art FIG. 2 shows a part of the assembly flow of a semiconductor pressure sensing device. In FIG. 2a, 1 is a semiconductor pressure sensing element, 2 is a wafer forming this semiconductor pressure sensing element 1, and 3 is a semiconductor A diaphragm formed on the back surface of the pressure sensing element 1 to improve pressure sensitivity; 4 a glass pedestal that relieves external stress from being applied to the semiconductor pressure sensing element 1; 5 a pressure provided on the glass pedestal 4; This is the introduction hole.

【0003】以上のようなウエハ2とガラス台座4を同
図bのように接合し、さらにチップ毎にダイシングを行
い、同図cに示すものを得る。
The wafer 2 and the glass pedestal 4 as described above are bonded together as shown in FIG. 2B, and then diced into chips to obtain the product shown in FIG.

【0004】0004

【発明が解決しようとする課題】従来の半導体圧力検出
装置の製造は以上のように行っているので、ダイヤフラ
ム3と圧力導入孔5のズレが生じ易く、またダイヤフラ
ム3を形成する場合、ウエハの裏面処理工程が必要とな
るなどの問題点があった。
[Problems to be Solved by the Invention] Since the conventional semiconductor pressure detection device is manufactured as described above, misalignment between the diaphragm 3 and the pressure introduction hole 5 tends to occur, and when the diaphragm 3 is formed, the wafer There were problems such as the need for a backside treatment process.

【0005】この発明は上記のような問題点を解消する
ためになされたもので、ダイヤフラムと圧力導入孔との
ズレがなく、かつウエハの裏面処理工程を削除できる製
造方法を提供することを目的とする。
The present invention has been made to solve the above-mentioned problems, and aims to provide a manufacturing method that eliminates misalignment between the diaphragm and the pressure introduction hole and eliminates the wafer backside processing step. shall be.

【0006】[0006]

【課題を解決するための手段】この発明に係る半導体圧
力検出装置の製造方法は、半導体圧力検出素子のウエハ
とガラス台座の接合を行ってから、ウエハのエッチング
を行うようにしたものである。
[Means for Solving the Problems] A method of manufacturing a semiconductor pressure sensing device according to the present invention is such that the wafer of the semiconductor pressure sensing element and the glass pedestal are bonded together, and then the wafer is etched.

【0007】[0007]

【作用】この発明における半導体圧力検出装置の製造方
法は、ウエハとガラス台座の接合する第1工程と、ウエ
ハのエッチングを行う第2工程によりウエハにダイヤフ
ラムを形成するので、ダイヤフラムと圧力導入孔のズレ
が生じず、又ウエハの裏面処理も不要となる。
[Operation] In the method of manufacturing a semiconductor pressure detection device according to the present invention, a diaphragm is formed on the wafer through the first step of bonding the wafer and the glass pedestal and the second step of etching the wafer. No misalignment occurs, and backside processing of the wafer is not required.

【0008】[0008]

【実施例】図1はこの発明の一実施例による半導体圧力
検出装置の組立フローを示すものであり、まず最初に圧
力検出素子1の構成されたウエハ2と、圧力導入孔5の
形成されたガラス台座4を接合する。この状態を図1b
に示す。次に、ウエハ2とガラス台座4の接合された状
態で、エッチングを行いダイヤフラム3を形成する。こ
の状態を図1cに示す。
[Embodiment] FIG. 1 shows the assembly flow of a semiconductor pressure detection device according to an embodiment of the present invention. First, a wafer 2 on which a pressure detection element 1 is formed and a wafer 2 on which a pressure introduction hole 5 is formed are shown. The glass pedestal 4 is joined. This state is shown in Figure 1b.
Shown below. Next, with the wafer 2 and the glass pedestal 4 bonded together, etching is performed to form the diaphragm 3. This situation is shown in Figure 1c.

【0009】[0009]

【発明の効果】以上のようにこの発明によれば、ウエハ
とガラス台座を接合したあとにエッチングしているので
、ダイヤフラムと圧力導入孔のズレがなくなり、また、
エッチングの際の裏面処理工程が削除されるので、装置
が安価にでき、また精度の高いものが得られる効果があ
る。
[Effects of the Invention] As described above, according to the present invention, since the wafer and the glass pedestal are etched after being bonded, there is no misalignment between the diaphragm and the pressure introduction hole, and
Since the back surface treatment step during etching is omitted, the device can be made at a lower cost, and it is also possible to obtain a product with high precision.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】この発明の一実施例による半導体圧力検出装置
のフローを示す図である。
FIG. 1 is a diagram showing the flow of a semiconductor pressure detection device according to an embodiment of the present invention.

【図2】従来の半導体圧力検出装置のフローを示す図で
ある。
FIG. 2 is a diagram showing the flow of a conventional semiconductor pressure detection device.

【符号の説明】[Explanation of symbols]

1      半導体圧力検出素子 2      ウエハ 3      ダイヤフラム 4      ガラス台座 5      圧力導入孔 1 Semiconductor pressure detection element 2 Wafer 3 Diaphragm 4 Glass pedestal 5 Pressure introduction hole

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  半導体圧力検出素子のウエハと、上記
半導体圧力検出素子に外部から加わる応力を緩和するた
めに取付けられ、圧力を導入する貫通孔が配設されたガ
ラス台座とを接合するものにおいて、上記半導体圧力検
出素子のウエハとガラス台座を接合後、ウエハ裏面にエ
ッチングを行いダイヤフラムを形成するようにしたこと
を特徴とする半導体圧力検出装置の製造方法。
1. A device for bonding a wafer of a semiconductor pressure sensing element and a glass pedestal that is attached to relieve stress applied to the semiconductor pressure sensing element from the outside and is provided with a through hole for introducing pressure. . A method for manufacturing a semiconductor pressure sensing device, characterized in that after the wafer of the semiconductor pressure sensing element and the glass pedestal are bonded, the back surface of the wafer is etched to form a diaphragm.
JP13816791A 1991-05-13 1991-05-13 Manufacture of semiconductor pressure detection device Pending JPH04336470A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13816791A JPH04336470A (en) 1991-05-13 1991-05-13 Manufacture of semiconductor pressure detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13816791A JPH04336470A (en) 1991-05-13 1991-05-13 Manufacture of semiconductor pressure detection device

Publications (1)

Publication Number Publication Date
JPH04336470A true JPH04336470A (en) 1992-11-24

Family

ID=15215599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13816791A Pending JPH04336470A (en) 1991-05-13 1991-05-13 Manufacture of semiconductor pressure detection device

Country Status (1)

Country Link
JP (1) JPH04336470A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005043351A (en) * 2003-07-04 2005-02-17 Robert Bosch Gmbh Micro machining type pressure sensor

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145873A (en) * 1987-12-02 1989-06-07 Yokogawa Electric Corp Manufacture of semiconductor pressure sensor
JPH01145872A (en) * 1987-12-02 1989-06-07 Yokogawa Electric Corp Manufacture of semiconductor pressure sensor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145873A (en) * 1987-12-02 1989-06-07 Yokogawa Electric Corp Manufacture of semiconductor pressure sensor
JPH01145872A (en) * 1987-12-02 1989-06-07 Yokogawa Electric Corp Manufacture of semiconductor pressure sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005043351A (en) * 2003-07-04 2005-02-17 Robert Bosch Gmbh Micro machining type pressure sensor

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