JPH0433651U - - Google Patents

Info

Publication number
JPH0433651U
JPH0433651U JP7413390U JP7413390U JPH0433651U JP H0433651 U JPH0433651 U JP H0433651U JP 7413390 U JP7413390 U JP 7413390U JP 7413390 U JP7413390 U JP 7413390U JP H0433651 U JPH0433651 U JP H0433651U
Authority
JP
Japan
Prior art keywords
flow path
coolant flow
ion implantation
cooling element
embedded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7413390U
Other languages
Japanese (ja)
Other versions
JPH0740520Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990074133U priority Critical patent/JPH0740520Y2/en
Publication of JPH0433651U publication Critical patent/JPH0433651U/ja
Application granted granted Critical
Publication of JPH0740520Y2 publication Critical patent/JPH0740520Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の一実施例のイオン注入用プ
ラテンの概略構造図、第2図は従来のイオン注入
用プラテンの概略構造図である。 1……イオン注入用プラテン、2……電子冷却
素子、6……冷媒流路。
FIG. 1 is a schematic structural diagram of an ion implantation platen according to an embodiment of this invention, and FIG. 2 is a schematic structural diagram of a conventional ion implantation platen. 1... platen for ion implantation, 2... electronic cooling element, 6... coolant channel.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 冷媒流路を設けたイオン注入用プラテンにおい
て、放熱部が冷媒流路内に露呈し吸熱部が表面近
傍に位置する電子冷却素子を埋設したことを特徴
とするイオン注入用プラテン。
1. An ion implantation platen provided with a coolant flow path, characterized in that an electronic cooling element having a heat radiation part exposed in the coolant flow path and a heat absorption part located near the surface is embedded.
JP1990074133U 1990-07-11 1990-07-11 Platen for ion implantation Expired - Lifetime JPH0740520Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990074133U JPH0740520Y2 (en) 1990-07-11 1990-07-11 Platen for ion implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990074133U JPH0740520Y2 (en) 1990-07-11 1990-07-11 Platen for ion implantation

Publications (2)

Publication Number Publication Date
JPH0433651U true JPH0433651U (en) 1992-03-19
JPH0740520Y2 JPH0740520Y2 (en) 1995-09-20

Family

ID=31613562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990074133U Expired - Lifetime JPH0740520Y2 (en) 1990-07-11 1990-07-11 Platen for ion implantation

Country Status (1)

Country Link
JP (1) JPH0740520Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6434752U (en) * 1987-08-26 1989-03-02

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6434752U (en) * 1987-08-26 1989-03-02

Also Published As

Publication number Publication date
JPH0740520Y2 (en) 1995-09-20

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