JPH04337085A - Member coated with carbon hard film - Google Patents

Abstract

PURPOSE:To obtain scuffing resistance equal to that of a carbon hard film on a sintered hard material by providing the space between a base material having relatively low hardness and an intermediate layer with a coating layer of a hard film having specified Vickers hardness. CONSTITUTION:In a member obtd. by coating a base material 1 having a relatively low hardness such as stainless and copper alloy with a carbon hard film 4 via an intermediate layer 3, a coating layer constituted of a hard film 2 having >=1000Hv Vickers hardness in interposed between the base material 1 and the intermediate layer 3.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a member having a hard carbon film coated on a base material via an intermediate layer, and more particularly to a member having a hard carbon film coated with an excellent scratch resistance.

0002

[Prior Art] A carbon hard film is an amorphous carbon film bonded with hydrogen, which is formed by plasma CVD treatment in a hydrocarbon gas atmosphere, and has a hardness second only to diamond, high thermal conductivity, and a coefficient of friction. is known for being extremely small.

Conventionally, members having a hard carbon film coated on a base material have been produced by directly covering a super hard material such as tungsten carbide as a base material with a hard carbon film. Further, since the carbon hard film does not directly adhere to the surface of a base material made of a material other than cemented carbide such as stainless steel or copper alloy, an intermediate layer must be interposed in the case of a material other than cemented carbide.

0004

[Problems to be Solved by the Invention] However, although these members coated with carbon hard films are functionally satisfactory when the base material is a superhard material, the material itself is very expensive and has poor workability. is very bad.

[0005] Furthermore, in parts where a carbon hard film is coated on a relatively low hardness base material such as stainless steel or copper alloy through an intermediate layer, the carbon hard film itself has high hardness, so wear resistance is poor. However, since the base material itself has a relatively low hardness, if scratched with a sharp object, the base material along with the carbon hard film will become dented and scratched, resulting in a lack of scratch resistance.

An object of the present invention is to solve the above problems and provide a member coated with a carbon hard film, which has scratch resistance equivalent to that of a carbon hard film on a superhard material, is inexpensive, and has excellent workability. It is something.

[0007]

[Means for Solving the Problems] The present invention provides stainless steel,
In a member in which a carbon hard film is coated on a relatively low hardness base material such as a copper alloy through an intermediate layer, a coating layer made of a hard film with a Vickers hardness of 1000 Hv or more is placed between the base material and the intermediate layer. It is characterized by the fact that it is interposed.

Preferably, the intermediate layer is made of at least one of silicon, silicon oxide, germanium, and nitride, carbide, nitride carbonate, and nitride carbonate of elements of groups 4a, 5a, and 6a of the periodic table.

Further, the hard film having a Vickers hardness of 1000 Hv or more may be made of at least one of nitrides, carbides, nitride carbonates, and nitride carbonates of elements of groups 4a, 5a, and 6a of the periodic table.

0010

DESCRIPTION OF THE PREFERRED EMBODIMENTS Examples of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a sectional view of a main part of a member covered with a carbon hard film showing an example.

[0011] The base material 1 is a brass material processed as a watch case and nickel-palladium plating is applied as the base plating, and a hard film 2 with a Vickers hardness of 1000 Hv or more, an intermediate layer 3, and a carbon hard film 4 are formed in this order. do.

After cleaning the substrate 1, it is placed in a vacuum chamber of a dry plating apparatus. The case of the hard film 2 will be explained using, for example, an ion plating method among dry plating methods.

The inside of the vacuum chamber was evacuated to a degree of vacuum of 1×10 −5 Torr or less, and argon gas was introduced to sufficiently clean the surface of the substrate 1 , and the argon plasma was maintained at a cathode potential. ion bombardment.

Next, nitrogen gas and ethylene gas are introduced into the vacuum chamber, and a mixed gas with argon gas is maintained at 1 to 5×10 −3 Torr as a reaction gas. Then, an electron beam generated at an appropriate accelerating voltage is irradiated onto the metal titanium of the evaporation source, and the generated titanium vapor, nitrogen gas, and ethylene gas are ionized in the plasma to form a 2-3 μm thick layer of elements from group 4a of the periodic table. A hard film 2 of titanium carbonitride, which is a nitride carbide, is formed.

The intermediate layer 3 is similarly formed on the base material 1 on which the hard film 2 is formed. This case will also be explained using an example of the ion plating method.

[0016] Ethylene gas is introduced into the vacuum chamber, and a mixed gas with argon gas is used as a reaction gas at a temperature of 1 to 5 x 10-3T.
Hold in orr. Then, an electron beam generated at an appropriate accelerating voltage is irradiated onto the titanium metal evaporation source, and the titanium vapor and ethylene gas generated are ionized in the plasma to form a 0.5-1 μm thick layer of Group 4a elements in the periodic table. An intermediate layer 3 of titanium carbide, which is a carbide, is formed. In this case, titanium carbide containing more carbon is preferable than stoichiometric titanium carbide in terms of adhesion.

Thereafter, a carbon hard film 4 is formed on the hard film 2 and intermediate layer 3 formed on the base material 1. For example, when using the plasma CVD method, a base material 1 having a hard film 2 and an intermediate layer 3 formed on a cathode electrode connected to a high frequency power source via a matching box is set in a vacuum chamber.

After the vacuum chamber is evacuated, methane gas, which is a hydrocarbon gas, is introduced from the gas inlet to generate plasma and form a hard carbon film 4 with a thickness of 1 μm. The film forming conditions were a vacuum of 0.1 Torr, a high frequency of 13.56 MHz,
The test was conducted using a high frequency power of 300W.

Even when the member coated with the carbon hard film thus formed was scratched with a sharp object, no scratches were caused. In addition, a film having a hardness of less than 1000 Hv in Vickers hardness is interposed between the base material 1 and the intermediate layer 3,
A sample without the hard film 2 was also tested for comparison, but both resulted in scratches. Therefore, the hard film 2 needs to have a Vickers hardness of 1000 Hv or more.

In the above embodiments, the hard film 2 and the intermediate layer 3 are formed by ion plating, but instead of this, vacuum evaporation, sputtering, or a combination thereof may be used. In addition to titanium carbonitride, the hard film 2 may be made of at least one of nitrides, carbides, nitride carbides, and nitride carbonates of elements in groups 4a, 5a, and 6a of the periodic table.

In addition to titanium carbide, the intermediate layer 3 may also contain silicon, silicon oxide, germanium, periodic table 4a, 5
It may be made of at least one of nitrides, carbides, nitride carbides, and nitride carbonates of group a and 6a elements.

[0022] Considering adhesion, it is preferable that the hard film 2, intermediate layer 3, and carbon hard film 4 be formed by the same device if possible. Of course, it goes without saying that they may each be formed using separate devices.

[0023]

Effects of the Invention As is clear from the above description, according to the present invention, carbon is coated on a base material of relatively low hardness such as stainless steel or copper alloy through a hard film having a Vickers hardness of 1000 Hv or more and an intermediate layer. By coating with a hard film, it is possible to obtain a scratch resistance equivalent to that of a carbon hard film on a superhard material, and it is possible to provide a member coated with a carbon hard film that is inexpensive and has excellent workability.

[Brief explanation of drawings]

FIG. 1 is a sectional view of a main part of a member coated with a carbon hard film showing an embodiment of the present invention.

[Explanation of symbols]

1 Base material 2 Hard membrane 3 Middle class 4 Carbon hard film

Claims (3)

[Claims] 1. In a member in which a carbon hard film is coated on a relatively low hardness base material such as stainless steel or copper alloy through an intermediate layer, the base material is coated with a hard film having a Vickers hardness of 1000 Hv or more. and an intermediate layer. 2. The intermediate layer is made of at least one of silicon, silicon oxide, germanium, nitride, carbide, nitride, and nitride carbonate of elements of groups 4a, 5a, and 6a of the periodic table. A member coated with the carbon hard film according to claim 1. 3. A claim characterized in that the hard film having a Vickers hardness of 1000 Hv or more is made of at least one of nitrides, carbides, nitride carbides, and nitride carbonates of elements in groups 4a, 5a, and 6a of the periodic table. A member coated with the carbon hard film described in 1.