JPH0435871A - Cleaning device for abrasive cloth in polishing device - Google Patents

Abstract

PURPOSE:To remove swept abrasive chips without their being left, by arranging a driving means which migrates a plate and brush so as to arrange them fore and aft each other in the peripheral direction of an abrasive cloth to the position located on the abrasive cloth from a standby position at the cleaning time of the abrasive cloth. CONSTITUTION:The abrasive chips of abrasive clothes 8, 9 are swept by the action of a brush 12, when surface plates 2, 3 are driven with their rotations and also a brush 12 and plate 13 are migrated onto the abrasive cloth face by driving means 14, 15 and the abrasive chips swept by the brush 12 are removed by the action of the plate 13. The abrasive chips in swept state are not left on the abrasive cloth parts 8, 9 where both of the brush 12 and plate 13 are pass through and they are cleaned clearly. And yet the abrasive chips accompanied by the plate 13 are migrated to the side of the plate 13 with the plate 13 being inclined at the specific angle for the radial directions of the surface plates 2, 3 and are swept away to the side part from this side.

Description

DETAILED DESCRIPTION OF THE INVENTION A polishing cloth cleaning device in a polishing apparatus which is equipped with a polishing surface plate to which a polishing cloth is attached, and which holds a workpiece pressed against the polishing cloth and polishes the workpiece. The surface plate is rotatably supported around its own axis, and a scraping brush scrapes out polishing debris from the polishing cloth, and a scraping brush scrapes off polishing debris scraped onto the surface of the polishing cloth toward the side. A polishing debris removal plate inclined at a predetermined angle with respect to the radial direction of the polishing plate is placed in standby at a side position of the polishing plate, and when cleaning the polishing cloth, the plate and the brush are removed. ,
A cleaning device for a polishing cloth in a polishing apparatus, characterized in that the cleaning device for a polishing cloth in a polishing apparatus is provided with driving means for moving from the standby position to a position on the polishing cloth in a manner that they are arranged one after the other in the circumferential direction of the polishing cloth.

3. Detailed Description of the Invention Field of Industrial Application The present invention relates to a polishing cloth cleaning device in a polishing apparatus equipped with a polishing cloth for polishing a work such as an aluminum substrate for a magnetic disk.

2. Description of the Related Art Conventionally, as a polishing apparatus for polishing, for example, an aluminum substrate for a magnetic disk, an apparatus (5) as shown in FIG.
1) is used. The polishing device (51) in the figure is rotatably held and has a donut-shaped polishing cloth (
52) is attached to the lower surface plate (53), and the lower surface plate (52) is attached to the lower surface plate (53).
53) An upper surface plate which is disposed coaxially with the surface plate (53) at an upper position, is rotatably driven and movable up and down, and has a donut-shaped polishing cloth (54) attached to its lower surface. (55), a sun gear (57) arranged between each polishing cloth (52) and (54) at the axial center position of the polishing cloth, and a sun gear (57) arranged concentrically at a position radially outward of the sun gear (57). The lower surface plate (53) is meshed with both the internal gear (59) and the sun gear (57).
) is placed on the polishing cloth (52) of both gears (57).
) (59) and a work carrier (58) with external gears arranged between them.

In this polishing device (51), the magnetic disk substrate (A) is placed in the holding hole (BO) of the work carrier (56) with the upper surface plate (55) positioned at the upper standby position, and the upper The surface plate (55) is lowered and both sides of the magnetic disk substrate (A) are covered with upper and lower polishing cloths (52) (
54) causes the pressing to be caught in the state. Then, while supplying a predetermined amount of polishing liquid, the sun gear (57) is rotated, so that the work carrier (5B) is rotated and revolved around the sun gear (57).
3) (55) is also rotated and the magnetic disk substrate (A
) is polished on both sides.

By the way, in the polishing bag ffi (51), the workpiece (
While repeating the polishing process in A), polishing cloths (52) (54
), abrasive debris accumulates on the surface layer, which tends to reduce polishing performance. Therefore, remove this abrasive debris and use a polishing cloth (
52) Is it necessary to clean (54)?

Conventionally, this cleaning has been carried out by an operator pressing a nylon brush (62) as shown in FIG. 7 against the surface layer of the polishing cloth (52) and rotating the surface plate (53), or by This was done by an operator pressing a stainless steel plate (64) as shown in FIG. 8 against the surface of the polishing cloth (52) and rotating the surface plate (53).

Problem to be Solved by the Invention However, while the method shown in FIG. 7 using the brush (62) can effectively scrape off the abrasive debris from the surface layer of the polishing cloth (54), There is a drawback that most of the abrasive debris left on the passage of the brush (62) is difficult to remove.

On the other hand, in the method shown in FIG. 8 using a plate (64), by strongly pressing the plate (64) against the polishing cloth (52), polishing debris on the surface layer of the polishing cloth (52) can be removed. On the other hand, it is possible to remove the abrasive debris by moving the scraped abrasive debris along with the plate and not leaving much of the abrasive debris on the path through which the plate (64) passes. In this case, as described above, it is necessary to forcefully press the plate (64) against the polishing cloth (52), which may cause damage to the polishing cloth (52).

This invention solves the conventional problems as described above, and provides a polishing method that scrapes out the abrasive debris accumulated on the surface layer of the polishing cloth without damaging it, and can easily remove the scraped abrasive debris. An object of the present invention is to provide a cleaning device for polishing cloth in an apparatus.

Means for Solving the Problems To achieve the above object, the present invention provides a polishing method that includes a polishing surface plate to which a polishing cloth is attached, and polishes the workpiece by holding the workpiece against the polishing cloth. An abrasive cloth cleaning device in an apparatus, which is rotatably supported around its own axis by the surface plate, and includes a scraping brush that scrapes out abrasive debris from the abrasive cloth, and a cleaning brush that scrapes out abrasive debris from the abrasive cloth; A polishing debris removal plate, which is inclined at a predetermined angle with respect to the radial direction of the polishing plate so as to remove debris to the side, is placed on standby at a side position of the polishing plate, and is used to clean the polishing cloth. When the plate and the brush are
Abstract: A cleaning device for a polishing cloth in a polishing apparatus, characterized in that the cleaning device for a polishing cloth in a polishing machine is provided with driving means for moving from the standby position to a position above the polishing cloth in a manner arranged one after another in the circumferential direction of the polishing cloth. shall be.

In the above invention, when cleaning the polishing cloth, a drive device that moves at least the scraping brush and the polishing debris removing plate forward and backward in the radial direction of the polishing cloth at a predetermined speed. is provided, and when the plate for removing polishing debris is moved back and forth in the radial direction, the polishing debris is removed to the front side in the direction of movement of the plate. Preferably, a mechanism for tilting at a predetermined angle with respect to the direction is provided.

Function In the above configuration, when the surface plate is rotationally driven and the brush and plate are transferred onto the surface of the polishing cloth by the driving means, the polishing debris on the polishing cloth is scraped out by the action of the brush; The ejected polishing debris is removed by the action of the plate. As a result, the portion of the polishing cloth through which both the brush and the plate have passed is cleanly cleaned without any scraped-out polishing debris remaining.

Moreover, since the plate is inclined at a predetermined angle with respect to the radial direction of the surface plate, polishing debris accompanying the plate is transferred to the side of the plate and is swept away from the side. .

Therefore, the amount of polishing debris accompanying the plate does not increase beyond a certain level, so that the effect of removing polishing debris by the plate does not deteriorate.

EXAMPLE Hereinafter, an example in which the present invention is applied to an apparatus for polishing an aluminum substrate for a magnetic disk will be described based on the drawings.

In the polishing tool M (1) shown in Figures 1 (a) and (b), (2) is the lower surface plate, (3) is the upper surface plate, (4) is the sun gear, and (5) is the internal gear. , (6) is a work carrier,
And (7) is a polishing cloth cleaning device.

The lower surface plate (2) has a donut-shaped polishing cloth (8
) is attached, and is driven to rotate around its own axis and move up and down by a drive device (not shown).

The upper surface plate (3) is disposed coaxially opposite the lower surface plate (2), and a donut-shaped polishing cloth (9) is placed below the polishing cloth (8) of the lower surface plate (2). ) is attached so as to face it. And this upper surface plate (
3) is also configured to rotate around its own axis and move in the vertical direction by a drive device (not shown).

The sun gear (4) is arranged between the upper and lower surface plates (2) and (3) at the axis of the polishing cloths (8) and (9), and is driven to rotate around its own axis by a drive device (not shown). It is considered a thing.

The internal gear (5) is arranged concentrically at a position radially outward of the sun gear (4) with a donut-shaped space between the internal gear (5) and the sun gear (4).

The work carrier (6) is formed by a thin plate-shaped external gear, and one (11 or a plurality of them) are arranged in an annular space between the sun gear (4) and the internal gear (5).
It meshes with both internal gears (4) and (5). The work carrier (6) is provided with one or more circular holding holes (10) that follow the outer circumferential shape of the magnetic disk substrate (A) at positions eccentric from its center position. Further, the thickness of this work carrier (6) is formed to be thinner than the thickness of the magnetic disk substrate (A), and when the magnetic disk substrate (A) is placed in the holding hole (10), The surface of the holding hole (10) can protrude outward from the holding hole (10).

Then, the polishing cloth cleaning device W (7) has both upper and lower surface plates (2) (
3) is placed in a lateral position.

In this abrasive cloth cleaning device (7), (12) is a brush for scraping off abrasive debris, (13) is a plate for removing abrasive debris,
(14) (15) is a forward/backward actuating device as a driving means.

The brush (12) for scraping out abrasive debris has bristles made of nylon or the like on both its upper and lower parts.

The plate (13) for removing polishing debris is made of a material such as stainless steel and has a rectangular plate shape, and both upper and lower edges thereof are processed to have an arc-shaped cross section.

The advancing/retracting actuating devices (14) and (15) are gear devices or the like, and are arranged adjacent to each other on the side of the polishing device (1). Said brush (12), play) (13
) are the advancing/retracting actuating devices (14) and (15), respectively.
The upper and lower surface plates (2) and (3) are moved from the side positions of the upper and lower surface plates (2) and (3) in a mutually adjacent state by the operation of the forward and backward movement actuators (14) and (15), which are attached to the tips of the respective operating rods.
2) The abrasive cloth (8) and (9) of (3) are horizontally moved forward and backward in the radial direction of the surface plate at a predetermined speed.

The brush (12) and the plate (13) are arranged in a relationship such that the upper and lower edges of the plate (13) are located inward from the bristles of the brush (12). The bristles of the plate (12) strongly hit the polishing cloths (8) and (9), while the upper and lower edges of the plate (13) hit the polishing cloths (8) and (9).
) is applied as lightly as possible to remove polishing debris without damaging the surface.

In addition, the polishing debris removal plate (13) is held rotatably in a horizontal plane by a vertical pin (16) at the central portion in its longitudinal direction, and is held by a rotation movement device (not shown) such that the pin (16) can rotate freely in a horizontal plane. 16), and the angle is changed to be inclined with respect to the radial direction of the surface plates (2) and (3).

In addition, as this rotation movement device, for example, a plate (
13), a pair of cylinder devices are arranged opposite to each other with the side edges on the advance/retreat actuating device (15) side in between, and the plate (13) is rotated around the pin (16) by the operation of the cylinder device. or a plate (1
3), a protruding piece is provided on the side edge on the side of the advance/retreat actuator (15), and this protruding piece is embedded in the notch recess formed in the peripheral end of the disc member, so that the disc is aligned with its vertical axis. A device in which the plate is rotated around the pin (16) by controlling the rotation around the pin (16) is adopted.

Next, the operation of the polishing apparatus (1) and the polishing cloth cleaning device (7) in the apparatus will be explained together with a method of controlling the apparatus.

During the polishing process, the lower surface plate (2) has a height that allows it to hold the work carrier (6) in mesh with the sun gear (4) and the internal gear (5), as shown in Figure 1. and is held at that height during the polishing process. Then, the magnetic disk substrate (A) is placed in the holding hole (10) of the work carrier (6) with the upper surface plate (3) waiting at the upper standby position.

After the placement of the substrate (A) is completed, the upper surface plate (3) is lowered, so that both the upper and lower polishing cloths (8) and (9) come into contact with both surfaces of the substrate (A), and pressurization (not shown) is applied. A pressurized state is applied by the device. Then, while the polishing liquid is being supplied, the sun gear (4) and the upper and lower surface plates (2) ('3) are driven to rotate, and as a result, the work carrier (6) revolves around the sun gear (4) while rotating. Then, the magnetic disk substrate (A) slides on the surfaces of the polishing cloths (8) and (9) to remove the magnetic disk substrate (A).
) is polished.

When the substrate (A) has been polished by a predetermined amount, the rotation of the sun gear (4) etc. is stopped and the upper surface plate (3)
is operated to rise, and the substrate (
A) is taken out.

After that, the new substrate (A) is placed on the work carrier (6) again.
), and the same operation as above is repeated to polish the substrate (A).

As this polishing process is repeated, the upper and lower polishing cloths (
8) If polishing debris accumulates on (9) and it becomes necessary to clean the polishing cloths (8) and (9), clean the substrate (A) and carrier (6).
) is taken out, the upper and lower surface plates (2) (3
) is the cleaning device (7) as shown in Figure 2 (a).
The bristles of the brush (12) are at a predetermined height position suitable for cleaning the abrasive cloths (8) and (9).
) (9) and is moved in the vertical direction so that it is located at a height such that the upper and lower edges of the plate (13) lightly contact the polishing cloth.

The upper and lower surface plates (2) and (3) are both moved in the direction of the arrow in Fig. 2 (b), that is, the polishing debris from the polishing cloths (8) and (9) reaches the brush (12) before the plate (13). The surface plate (2) ( The brush (3) is tilted at a predetermined angle with respect to the radial direction of the brush (3).
12) and plate (13) are moved from the standby position on the sides of the surface plates (2) and (3) to the polishing cloth (8
) (9) Advancement into the Cabinet.

During the advancing process of the brush (12) and plate (13), the brush (12) scrapes out the polishing debris from the surface layer of the upper and lower polishing cloths (8) and (9), and immediately after that, the plate (13) The scraped out polishing debris is transferred along with it. Thereby, the brush (12) and plate (1
Polishing debris is cleanly removed from the polishing cloths (8) and (9) through which both the polishing cloths (3) and (3) have passed.

Furthermore, since the plate (13) is tilted as described above, the polishing debris transferred along with the plate (13) can be removed as shown in FIGS.
Polishing cloth (8) (9) from the side on the center side
8) It is swept away inward from (9). Therefore, a large amount of polishing debris does not accumulate on the upper and lower edges of the plate (13) over time, and therefore, the polishing debris removal effect of the plate (13) is maintained properly at all times during cleaning. drooping

Then, as the brush (12) and plate (13) move inward of the polishing cloths (8) and (9), the brush (12) moves further inward in the radial direction of the polishing cloths (8) and (9). The accumulated abrasive debris is scraped out, and the plate (13) collects the scraped out abrasive debris together with the aforementioned inwardly swept abrasive debris.
The polishing cloths (8) and (9) are further swept away inward. Then, the brush (12) and plate (13) are attached to the polishing cloth (8).
) (9), the plate (13) discharges the polishing debris out of the polishing cloths (8) and (9).

Note that polishing debris on the surface of the polishing cloth (9) on the upper surface plate (3) is scraped off by the brush (12) and then falls partially due to its own weight and is deposited on the lower polishing cloth (8) on the plate. (
13), some of them remain attached to the upper polishing cloth (9), and these attached polishing debris are removed by the plate (13) on the upper polishing cloth (9).

Along with this removal, the polishing debris either partially falls down, or the polishing debris that does not fall is swept away by the plate (13) toward the inside of the polishing cloth (9), and finally the polishing debris (9) is discharged outside.

After that, as shown in Figure 3 (a) and (b),
The plate (13) is moved to the surface plate (2) by the operation of the rotational movement device.
) (3) are rotated in an outwardly inclined state with respect to the radial direction, and the advance/retreat actuating devices (14) (15
), the brush (12) and plate (13) are moved in the exit direction. As a result, the polishing debris that was not scraped out during the advance operation or scraped out from the polishing cloths (8) and (9) is transferred to the plate (13) without being accompanied by it. The polishing cloth is swept away from the outer side of the plate (13) to the outer side. The brush (12) and the plate (13) are attached to the polishing cloths (8) and (9).
Contrary to the above, as it exits outwards,
The brush (12) further scrapes out the abrasive debris accumulated in the outer area, and the plate (13) collects the scraped abrasive debris together with the abrasive cloths (8) and (9). Brush (12) further outward.
, when the plate (13) exceeds the outer periphery of the polishing cloths (8) and (9), the plate (13) discharges the polishing debris to the outside of the polishing cloths (8) and (9). cloth(
8) The cleanliness of (9) is achieved.

Thereafter, the substrate (A) is held by the work carrier (6) again, and the upper and lower surface plates (2) and (3) are moved up and down to a height suitable for polishing, and the polishing process is restarted.

The cleaning of the polishing cloths (8) and (9) depends on the properties of the polishing cloth, the amount of accumulated polishing debris, etc., using the brush (12),
The plate (13) may be reciprocated multiple times, and the polishing cloths (8) and (9) may be controlled to be cleaned only during the advancing operation or only during the retracting operation. Good too.

In addition, the brush (12) and the plate (13) are integrally combined as a brush (20) with a plate, as shown in FIG. A configuration that can be rotated by an operating device (I7) may be adopted.

Moreover, even if the brush (12) and the plate (13) are not arranged adjacently as described above, the brush (12) and the plate (13) are
They may be arranged at positions with different phases.

On the other hand, the embodiment device shown in FIG.
, the plate (13) is formed to have a length such that it is disposed over the entire radius of the polishing cloths (8) and (9), and the brush (20) with the plate is placed on the surface plate (2).
) (3) A position change device (21) is provided for changing the position between two positions: a position inside the cabinet and a position outside the surface plate (2) and (3). In such a device, the brush (12)
The abrasive debris scraped out is carried by the plate (13),
It is transferred to one side along both the upper and lower edges of the plate (13), and is discharged from the side to the outside of the polishing cloths (8) and (9).

In this case, the plated brush (20) is fixedly attached to the position changing device (21) while being inclined at a predetermined angle with respect to the radial direction of the surface plates (2) and (3). Alternatively, if necessary, the rotation may be controlled in the same manner as in the above embodiment.

In addition, in such a two-position change type configuration, the plate (13
) may have a horizontal cross-sectional shape that is convex toward the brush (12).

In this case, the abrasive debris scraped out by the brush is simultaneously removed from both sides of the polishing cloth by the plate (13).

Effects of the Invention As described above, in the polishing cloth cleaning device in the polishing apparatus of the present invention, the surface plate to which the polishing cloth is attached is supported so as to be rotatable around its own axis, and the scraping brush and the removing brush are provided. A plate is arranged in a standby state at a side position of the polishing plate, and when cleaning the polishing cloth, the plate and the brush are moved from the standby position to a position on the polishing cloth one after another in the circumferential direction of the polishing cloth. Since the brush and the plate are provided with a driving means for moving the brush and the plate in the manner in which they are arranged, when the brush and plate are moved from the side standby position onto the polishing cloth while the surface plate is rotationally driven, the polishing of the polishing cloth is The debris is scraped out by the action of the brush, and the scraped polishing debris remaining on the surface of the polishing cloth is removed by the action of the plate. Therefore, it is possible to effectively scrape out the abrasive debris accumulated on the surface layer of the abrasive cloth, and also to remove the scraped abrasive debris without leaving any residue behind, making it possible to efficiently clean the abrasive cloth. be able to.

Moreover, the plate does not scrape out abrasive debris as in the conventional case, but functions to remove abrasive debris scraped out by a brush, so the contact pressure between the plate and the polishing cloth is small. Therefore, there is no possibility of damaging the polishing cloth.

Further, since the plate is inclined at a predetermined angle with respect to the radial direction of the surface plate in such a manner that the abrasive debris is removed to the side, the abrasive debris is successively removed to the side of the plate, The amount of abrasive debris accompanying the plate does not increase beyond a certain level, so that the removal effect of the abrasive debris by the plate can be maintained at an appropriate level at all times during cleaning.

[Brief explanation of drawings]

1 to 5 show embodiments of this invention,
Figure 1 (a) is a vertical sectional view of an embodiment of the device, and the same figure (b)
Figure 2 (a) is a vertical cross-sectional view showing the state in which the purifier is in the middle of advancing operation, and figure (b) is a view taken along the line 1-1 in the same figure (a).
is a view taken along the line ■-■ in Figure (A), Figure (C) is a perspective view showing the state of the removal action of polishing debris by the plate, and Figure 3 (
A) is a vertical sectional view showing a state in which the purifier is in the middle of an evacuation operation, FIG. 4 is a view taken along the line ■-■ in FIG. FIG. 5(a) is a vertical cross-sectional view of a device according to another embodiment, and FIG.
It is a VV line arrow view of. FIG. 6 is a perspective view of a conventional polishing apparatus, and FIGS. 7 and 8 are perspective views each showing a conventional method for cleaning a polishing cloth. (1)...polishing device, (2)(3)...polishing surface plate, (7)...polishing cloth cleaning device, (8)(9)...polishing cloth, (12)... ...Brush for scraping, (13)...
Plate for removing polishing debris, (14) (15) Advance/retreat actuator (drive means), (21) Position change device (drive means). Above (b) Figure 3 Figure 4

Claims (1)

[Scope of Claims] A polishing cloth cleaning device in a polishing apparatus, which is equipped with a polishing surface plate to which a polishing cloth is attached, and polishes the workpiece by holding the workpiece pressed against the polishing cloth. The surface plate is supported so as to be rotatable around its own axis, and a scraping brush for scraping out polishing debris from the polishing cloth and a scraping brush for scraping polishing debris scraped off the surface of the polishing cloth are removed from the side. A polishing debris removal plate inclined at a predetermined angle with respect to the radial direction of the polishing plate is placed in a standby state at a side position of the polishing plate, and when cleaning the polishing cloth, the plate and the brush are removed.
A cleaning device for a polishing cloth in a polishing apparatus, characterized in that the cleaning device for a polishing cloth in a polishing apparatus is provided with driving means for moving from the standby position to a position on the polishing cloth in a manner that they are arranged one after the other in the circumferential direction of the polishing cloth.