JPH0438764B2 - - Google Patents
Info
- Publication number
- JPH0438764B2 JPH0438764B2 JP7259583A JP7259583A JPH0438764B2 JP H0438764 B2 JPH0438764 B2 JP H0438764B2 JP 7259583 A JP7259583 A JP 7259583A JP 7259583 A JP7259583 A JP 7259583A JP H0438764 B2 JPH0438764 B2 JP H0438764B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- dicarboxylic acid
- formula
- diol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 halogenated sulfonyl compound Chemical class 0.000 claims description 20
- 125000003118 aryl group Chemical group 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 238000006068 polycondensation reaction Methods 0.000 claims description 13
- 229920000728 polyester Polymers 0.000 claims description 13
- 150000002009 diols Chemical class 0.000 claims description 12
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 11
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 150000003839 salts Chemical group 0.000 claims description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 26
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 16
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 8
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 150000001991 dicarboxylic acids Chemical class 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 3
- XWKFPIODWVPXLX-UHFFFAOYSA-N 2-methyl-5-methylpyridine Natural products CC1=CC=C(C)N=C1 XWKFPIODWVPXLX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 125000006267 biphenyl group Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- HPYNZHMRTTWQTB-UHFFFAOYSA-N 2,3-dimethylpyridine Chemical compound CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 2
- BWZVCCNYKMEVEX-UHFFFAOYSA-N 2,4,6-Trimethylpyridine Chemical compound CC1=CC(C)=NC(C)=C1 BWZVCCNYKMEVEX-UHFFFAOYSA-N 0.000 description 2
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- NURQLCJSMXZBPC-UHFFFAOYSA-N 3,4-dimethylpyridine Chemical compound CC1=CC=NC=C1C NURQLCJSMXZBPC-UHFFFAOYSA-N 0.000 description 2
- HWWYDZCSSYKIAD-UHFFFAOYSA-N 3,5-dimethylpyridine Chemical compound CC1=CN=CC(C)=C1 HWWYDZCSSYKIAD-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- FZERHIULMFGESH-UHFFFAOYSA-N N-phenylacetamide Chemical compound CC(=O)NC1=CC=CC=C1 FZERHIULMFGESH-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 150000005165 hydroxybenzoic acids Chemical class 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- XDUKPUDGTQCPFY-UHFFFAOYSA-N (2,5-dihydroxyphenyl) acetate Chemical compound CC(=O)OC1=CC(O)=CC=C1O XDUKPUDGTQCPFY-UHFFFAOYSA-N 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N 1,3,5-Me3C6H3 Natural products CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- WLDWSGZHNBANIO-UHFFFAOYSA-N 2',5'-Dihydroxyacetophenone Chemical compound CC(=O)C1=CC(O)=CC=C1O WLDWSGZHNBANIO-UHFFFAOYSA-N 0.000 description 1
- PVJZBZSCGJAWNG-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonyl chloride Chemical compound CC1=CC(C)=C(S(Cl)(=O)=O)C(C)=C1 PVJZBZSCGJAWNG-UHFFFAOYSA-N 0.000 description 1
- WPZJSWWEEJJSIZ-UHFFFAOYSA-N 2,6-dibromo-4-[(3,5-dibromo-4-hydroxyphenyl)methyl]phenol Chemical compound C1=C(Br)C(O)=C(Br)C=C1CC1=CC(Br)=C(O)C(Br)=C1 WPZJSWWEEJJSIZ-UHFFFAOYSA-N 0.000 description 1
- TXYQFJWVHVYIHB-UHFFFAOYSA-N 2,6-dichloro-4-(3,5-dichloro-4-hydroxyphenoxy)phenol Chemical compound C1=C(Cl)C(O)=C(Cl)C=C1OC1=CC(Cl)=C(O)C(Cl)=C1 TXYQFJWVHVYIHB-UHFFFAOYSA-N 0.000 description 1
- WIFDRXSVRSCMMY-UHFFFAOYSA-N 2,6-dichloro-4-[(3,5-dichloro-4-hydroxyphenyl)methyl]phenol Chemical compound C1=C(Cl)C(O)=C(Cl)C=C1CC1=CC(Cl)=C(O)C(Cl)=C1 WIFDRXSVRSCMMY-UHFFFAOYSA-N 0.000 description 1
- WJOVLMLBLLKYKD-UHFFFAOYSA-N 2,6-dichloro-4-hydroxybenzoic acid Chemical compound OC(=O)C1=C(Cl)C=C(O)C=C1Cl WJOVLMLBLLKYKD-UHFFFAOYSA-N 0.000 description 1
- NFIQGYBXSJQLSR-UHFFFAOYSA-N 2,6-difluoro-4-hydroxybenzoic acid Chemical compound OC(=O)C1=C(F)C=C(O)C=C1F NFIQGYBXSJQLSR-UHFFFAOYSA-N 0.000 description 1
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical compound OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 1
- UWUNWZJAUUXNBQ-UHFFFAOYSA-N 2-(dimethylamino)benzene-1,4-diol Chemical compound CN(C)C1=CC(O)=CC=C1O UWUNWZJAUUXNBQ-UHFFFAOYSA-N 0.000 description 1
- GDYYIJNDPMFMTB-UHFFFAOYSA-N 2-[3-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=CC(CC(O)=O)=C1 GDYYIJNDPMFMTB-UHFFFAOYSA-N 0.000 description 1
- DNUYOWCKBJFOGS-UHFFFAOYSA-N 2-[[10-(2,2-dicarboxyethyl)anthracen-9-yl]methyl]propanedioic acid Chemical compound C1=CC=C2C(CC(C(=O)O)C(O)=O)=C(C=CC=C3)C3=C(CC(C(O)=O)C(O)=O)C2=C1 DNUYOWCKBJFOGS-UHFFFAOYSA-N 0.000 description 1
- BAYSHFQWTRUCAD-UHFFFAOYSA-N 2-chloro-4-(3-chloro-4-hydroxyphenyl)sulfanylphenol Chemical compound C1=C(Cl)C(O)=CC=C1SC1=CC=C(O)C(Cl)=C1 BAYSHFQWTRUCAD-UHFFFAOYSA-N 0.000 description 1
- WIPYZRZPNMUSER-UHFFFAOYSA-N 2-chloro-4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1Cl WIPYZRZPNMUSER-UHFFFAOYSA-N 0.000 description 1
- AIDLAEPHWROGFI-UHFFFAOYSA-N 2-methylbenzene-1,3-dicarboxylic acid Chemical compound CC1=C(C(O)=O)C=CC=C1C(O)=O AIDLAEPHWROGFI-UHFFFAOYSA-N 0.000 description 1
- UFMBOFGKHIXOTA-UHFFFAOYSA-N 2-methylterephthalic acid Chemical compound CC1=CC(C(O)=O)=CC=C1C(O)=O UFMBOFGKHIXOTA-UHFFFAOYSA-N 0.000 description 1
- VIIYYMZOGKODQG-UHFFFAOYSA-N 2-nitrobenzene-1,4-diol Chemical compound OC1=CC=C(O)C([N+]([O-])=O)=C1 VIIYYMZOGKODQG-UHFFFAOYSA-N 0.000 description 1
- FUFICVIKVDNNTM-UHFFFAOYSA-N 2h-naphthalene-1,1,4-triol Chemical compound C1=CC=C2C(O)=CCC(O)(O)C2=C1 FUFICVIKVDNNTM-UHFFFAOYSA-N 0.000 description 1
- BLBSJXNUYKZSAC-UHFFFAOYSA-N 2h-naphthalene-1,1,5-triol Chemical compound C1=CCC(O)(O)C2=C1C(O)=CC=C2 BLBSJXNUYKZSAC-UHFFFAOYSA-N 0.000 description 1
- YMYRKEMVUVQYTN-UHFFFAOYSA-N 2h-naphthalene-1,1,6-triol Chemical compound C1=CCC(O)(O)C=2C1=CC(O)=CC=2 YMYRKEMVUVQYTN-UHFFFAOYSA-N 0.000 description 1
- OINWZUJVEXUHCC-UHFFFAOYSA-N 3-chlorobenzenesulfonyl chloride Chemical compound ClC1=CC=CC(S(Cl)(=O)=O)=C1 OINWZUJVEXUHCC-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 description 1
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 1
- JTGCXYYDAVPSFD-UHFFFAOYSA-N 4-(4-hydroxyphenyl)benzoic acid Chemical group C1=CC(C(=O)O)=CC=C1C1=CC=C(O)C=C1 JTGCXYYDAVPSFD-UHFFFAOYSA-N 0.000 description 1
- CZGCEKJOLUNIFY-UHFFFAOYSA-N 4-Chloronitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(Cl)C=C1 CZGCEKJOLUNIFY-UHFFFAOYSA-N 0.000 description 1
- AZZWZMUXHALBCQ-UHFFFAOYSA-N 4-[(4-hydroxy-3,5-dimethylphenyl)methyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(CC=2C=C(C)C(O)=C(C)C=2)=C1 AZZWZMUXHALBCQ-UHFFFAOYSA-N 0.000 description 1
- GDBUZIKSJGRBJP-UHFFFAOYSA-N 4-acetoxy benzoic acid Chemical class CC(=O)OC1=CC=C(C(O)=O)C=C1 GDBUZIKSJGRBJP-UHFFFAOYSA-N 0.000 description 1
- KMMHZIBWCXYAAH-UHFFFAOYSA-N 4-bromobenzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=C(Br)C=C1 KMMHZIBWCXYAAH-UHFFFAOYSA-N 0.000 description 1
- ZLYBFBAHAQEEQQ-UHFFFAOYSA-N 4-chlorobenzenesulfonyl chloride Chemical compound ClC1=CC=C(S(Cl)(=O)=O)C=C1 ZLYBFBAHAQEEQQ-UHFFFAOYSA-N 0.000 description 1
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- IZZYABADQVQHLC-UHFFFAOYSA-N 4-methylbenzenesulfonyl fluoride Chemical compound CC1=CC=C(S(F)(=O)=O)C=C1 IZZYABADQVQHLC-UHFFFAOYSA-N 0.000 description 1
- YDZYREHHCRHTRZ-UHFFFAOYSA-N 4-methylbenzenesulfonyl iodide Chemical compound CC1=CC=C(S(I)(=O)=O)C=C1 YDZYREHHCRHTRZ-UHFFFAOYSA-N 0.000 description 1
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 238000012696 Interfacial polycondensation Methods 0.000 description 1
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- 229960001413 acetanilide Drugs 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001508 alkali metal halide Inorganic materials 0.000 description 1
- 229910001615 alkaline earth metal halide Inorganic materials 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- CSKNSYBAZOQPLR-UHFFFAOYSA-N benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1 CSKNSYBAZOQPLR-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- CNASVLXXMGAQGK-UHFFFAOYSA-N bis(3,5-dichloro-4-hydroxyphenyl)methanone Chemical compound C1=C(Cl)C(O)=C(Cl)C=C1C(=O)C1=CC(Cl)=C(O)C(Cl)=C1 CNASVLXXMGAQGK-UHFFFAOYSA-N 0.000 description 1
- JWAPUVVSOVJCJB-UHFFFAOYSA-N bis(4-hydroxy-3,5-dimethylphenyl)methanone Chemical compound CC1=C(O)C(C)=CC(C(=O)C=2C=C(C)C(O)=C(C)C=2)=C1 JWAPUVVSOVJCJB-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- RLMGYIOTPQVQJR-UHFFFAOYSA-N cyclohexane-1,3-diol Chemical compound OC1CCCC(O)C1 RLMGYIOTPQVQJR-UHFFFAOYSA-N 0.000 description 1
- FRYHCSODNHYDPU-UHFFFAOYSA-N ethanesulfonyl chloride Chemical compound CCS(Cl)(=O)=O FRYHCSODNHYDPU-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- IJFXRHURBJZNAO-UHFFFAOYSA-N meta--hydroxybenzoic acid Natural products OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 1
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- NZMAJUHVSZBJHL-UHFFFAOYSA-N n,n-dibutylformamide Chemical compound CCCCN(C=O)CCCC NZMAJUHVSZBJHL-UHFFFAOYSA-N 0.000 description 1
- DCNUQRBLZWSGAV-UHFFFAOYSA-N n,n-diphenylformamide Chemical compound C=1C=CC=CC=1N(C=O)C1=CC=CC=C1 DCNUQRBLZWSGAV-UHFFFAOYSA-N 0.000 description 1
- DISPOJHKKXSCLS-UHFFFAOYSA-N n-diaminophosphorylmethanamine Chemical compound CNP(N)(N)=O DISPOJHKKXSCLS-UHFFFAOYSA-N 0.000 description 1
- NCCHARWOCKOHIH-UHFFFAOYSA-N n-methylbenzamide Chemical compound CNC(=O)C1=CC=CC=C1 NCCHARWOCKOHIH-UHFFFAOYSA-N 0.000 description 1
- OOXKLHIOLJWGPI-UHFFFAOYSA-N naphthalene-1,2,6-triol Chemical compound OC1=C(O)C=CC2=CC(O)=CC=C21 OOXKLHIOLJWGPI-UHFFFAOYSA-N 0.000 description 1
- CZVGDZHOGCQXOY-UHFFFAOYSA-N naphthalene-1,2,7-triol Chemical compound C1=CC(O)=C(O)C2=CC(O)=CC=C21 CZVGDZHOGCQXOY-UHFFFAOYSA-N 0.000 description 1
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- GJLNWLVPAHNBQN-UHFFFAOYSA-N phenyl 4-hydroxybenzoate Chemical class C1=CC(O)=CC=C1C(=O)OC1=CC=CC=C1 GJLNWLVPAHNBQN-UHFFFAOYSA-N 0.000 description 1
- OAHKWDDSKCRNFE-UHFFFAOYSA-N phenylmethanesulfonyl chloride Chemical compound ClS(=O)(=O)CC1=CC=CC=C1 OAHKWDDSKCRNFE-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- YQUVCSBJEUQKSH-UHFFFAOYSA-N protochatechuic acid Natural products OC(=O)C1=CC=C(O)C(O)=C1 YQUVCSBJEUQKSH-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- GFYHSKONPJXCDE-UHFFFAOYSA-N sym-collidine Natural products CC1=CN=C(C)C(C)=C1 GFYHSKONPJXCDE-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- WKOLLVMJNQIZCI-UHFFFAOYSA-N vanillic acid Chemical compound COC1=CC(C(O)=O)=CC=C1O WKOLLVMJNQIZCI-UHFFFAOYSA-N 0.000 description 1
- TUUBOHWZSQXCSW-UHFFFAOYSA-N vanillic acid Natural products COC1=CC(O)=CC(C(O)=O)=C1 TUUBOHWZSQXCSW-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Polyesters Or Polycarbonates (AREA)
Description
本発明はポリエステルの製造法に関する。詳し
くはポリエステル特に芳香族ポリエステルの直接
的な製造法に関する。
ポリエステル特に芳香族ポリエステルは、ジフ
エノール類とジカルボン酸ジハライドとの界面重
縮合ないし溶液重縮合、ジフエノール類のジアセ
テートとジカルボン酸との溶融重縮合、ジフエノ
ール類とジカルボン酸ジフエニルエステルとの溶
融重縮合、p−アセトキシ安息香酸類の溶融重縮
合、p−ヒドロキシ安息香酸フエニルエステル類
の溶融重縮合は知られているが、ジフエノール類
とジカルボン酸とを直接反応させてポリエステル
を製造することは一般に困難であることが知られ
ている。
本発明者は鋭意検討の結果、ジフエノール類と
ジカルボン酸を直接反応させることにより、およ
びヒドロキシ安息香酸類を直接反応させることに
よりポリエステル、特に芳香族ポリエステルを製
造する方法を見出した。
また、本発明者はこの方法ではジフエノール以
外のジオール類を用いてポリエステルを製造する
ことも可能であり、さらにジオール、ジカルボン
酸およびベンゼン環にフエノール性水酸基とカル
ボキシル基を有するオキシ酸との重縮合によつて
もポリエステルが製造出来ることを見出した。
すなわち本発明の要旨はジカルボン酸とジオー
ルとの重縮合、ベンゼン環にフエノール性水酸基
とカルボキシル基を有するオキシ酸の重縮合また
は該オキシ酸とジオールとジカルボン酸との重縮
合反応において一般式()
(式中R1,R2およびR3は水素原子、アルキル
基、アリール基、アラルキル基またはシクロアル
キル基を示す)で表わされるアミド化合物と一般
式()
R4−SO2X1 ……()
(式中R4はアルキル基、アリール基、アラル
キル基またはシクロヘキシル基を示し、X1はハ
ロゲン原子を示す)で表わされるハロゲン化スル
ホニル化合物との反応により生成する一般式
()
(式中R5,R6およびR7は水素原子、アルキル
基、アリール基、アラルキル基またはシクロアル
キル基を示し、R8はアルキル基、アリール基、
アラルキル基またはシクロヘキシル基を示し、
X2はハロゲン原子を示す)で表わされる第四級
塩を存在させることを特徴とするポリエステルの
製造法に存する。
本発明を詳細に説明するに本発明において使用
されるジカルボン酸としては一般式()
HOOC−R9−COOH ……()
(式中R9は2価の芳香族基、−R10−X3−R11−
基、
The present invention relates to a method for producing polyester. In particular, it relates to the direct production of polyesters, particularly aromatic polyesters. Polyesters, especially aromatic polyesters, can be produced by interfacial polycondensation or solution polycondensation between diphenols and dicarboxylic acid dihalides, melt polycondensation between diacetates of diphenols and dicarboxylic acids, and melt polycondensation between diphenols and dicarboxylic acid diphenyl esters. , melt polycondensation of p-acetoxybenzoic acids, and melt polycondensation of p-hydroxybenzoic acid phenyl esters are known, but it is generally difficult to produce polyester by directly reacting diphenols and dicarboxylic acids. It is known that As a result of extensive studies, the present inventors have discovered a method for producing polyesters, particularly aromatic polyesters, by directly reacting diphenols with dicarboxylic acids and directly reacting hydroxybenzoic acids. In addition, the present inventor has found that it is also possible to produce polyester using diols other than diphenol with this method, and furthermore, polycondensation of diol, dicarboxylic acid, and oxyacid having a phenolic hydroxyl group and a carboxyl group in the benzene ring. It has been discovered that polyester can also be produced by That is, the gist of the present invention is that in the polycondensation reaction of a dicarboxylic acid and a diol, the polycondensation reaction of an oxyacid having a phenolic hydroxyl group and a carboxyl group in the benzene ring, or the polycondensation reaction of the oxyacid, a diol, and a dicarboxylic acid, the general formula () (In the formula, R 1 , R 2 and R 3 represent a hydrogen atom, an alkyl group, an aryl group, an aralkyl group or a cycloalkyl group) and the general formula () R 4 −SO 2 X 1 ……( ) (In the formula, R 4 represents an alkyl group, aryl group, aralkyl group, or cyclohexyl group, and X 1 represents a halogen atom) General formula () produced by reaction with a halogenated sulfonyl compound represented by (In the formula, R 5 , R 6 and R 7 represent a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, or a cycloalkyl group, and R 8 represents an alkyl group, an aryl group,
represents an aralkyl group or a cyclohexyl group,
The method of producing a polyester is characterized by the presence of a quaternary salt represented by (X 2 represents a halogen atom). To explain the present invention in detail, the dicarboxylic acid used in the present invention has the general formula () HOOC-R 9 -COOH ... () (wherein R 9 is a divalent aromatic group, -R 10 -X 3 −R 11 −
basis,
【式】基、2価の脂肪
族基を示す)
で表わされる化合物が挙げられる。ここでR10お
よびR11は2価の芳香族基であり、X3は酸素原
子、硫黄原子、スルホニル基、カルボニル基、ア
ルキレン基またはアルキリデン基を示す。2価の
芳香族基としては[Formula] represents a divalent aliphatic group). Here, R 10 and R 11 are divalent aromatic groups, and X 3 represents an oxygen atom, a sulfur atom, a sulfonyl group, a carbonyl group, an alkylene group, or an alkylidene group. As a divalent aromatic group
【式】基(ここでY5〜
Y8は水素原子、ハロゲン原子またはアルキル基
を示す)が挙げられる。また、
[Formula] groups (where Y 5 to Y 8 represent a hydrogen atom, a halogen atom, or an alkyl group) are exemplified. Also,
【式】基においてY1〜Y4は
水素原子、ハロゲン原子、またはアルキル基を示
す。
具体例としてはテレフタル酸、イソフタル酸、
ナフタリン−2,6−ジカルボン酸、ナフタリン
−1,5−ジカルボン酸、ジフエニル−4,4′−
ジカルボン酸、メチルテレフタル酸、メチルイソ
フタル酸、ジフエニルエーテル−4,4′−ジカル
ボン酸、ジフエニルチオエーテル−4,4′−ジカ
ルボン酸、ジフエニルスルホン−4,4′−ジカル
ボン酸、ジフエニルケトン−4,4′−ジカルボン
酸、2,2−ジフエニルプロパン−4,4′−ジカ
ルボン酸のような芳香族基ジカルボン酸、1,4
−キシリレンジカルボン酸、1,3−キシリレン
ジカルボン酸のようなアラルキレン系ジカルボン
酸、マロン酸、コハク酸、グルタル酸、アジピン
酸、ピメリン酸、スベリン酸、アゼライン酸のよ
うな鎖状脂肪族ジカルボン酸、1,4シクロヘキ
シルジカルボン酸、1,3シクロヘキシルジカル
ボン酸、1,2シクロヘキシルジカルボン酸、
1,3シクロペンチルジカルボン酸、1,2シク
ロヘキシルジカルボン酸等の環状脂肪族ジカルボ
ン酸が挙げられるが必ずしもこれらに限定される
ものではない。またこれらは混合物としても使用
してもよい。
ジオールとしては一般式()
HO−R12−OH ……()
(式中R12は2価の芳香族基、2価の脂肪族
基、In the group [Formula], Y 1 to Y 4 represent a hydrogen atom, a halogen atom, or an alkyl group. Specific examples include terephthalic acid, isophthalic acid,
naphthalene-2,6-dicarboxylic acid, naphthalene-1,5-dicarboxylic acid, diphenyl-4,4'-
Dicarboxylic acid, methyl terephthalic acid, methyl isophthalic acid, diphenyl ether-4,4'-dicarboxylic acid, diphenyl thioether-4,4'-dicarboxylic acid, diphenyl sulfone-4,4'-dicarboxylic acid, diphenyl ketone-4 , 4'-dicarboxylic acid, 2,2-diphenylpropane-4,4'-dicarboxylic acid, 1,4
-Aralkylene dicarboxylic acids such as xylylene dicarboxylic acid and 1,3-xylylene dicarboxylic acid; chain aliphatic dicarboxylic acids such as malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, and azelaic acid; acid, 1,4 cyclohexyl dicarboxylic acid, 1,3 cyclohexyl dicarboxylic acid, 1,2 cyclohexyl dicarboxylic acid,
Examples include, but are not limited to, cycloaliphatic dicarboxylic acids such as 1,3 cyclopentyl dicarboxylic acid and 1,2 cyclohexyl dicarboxylic acid. Moreover, these may be used as a mixture. The diol has the general formula () HO−R 12 −OH ... () (in the formula, R 12 is a divalent aromatic group, a divalent aliphatic group,
【式】基、または−
R13−X4−R14−基を示す)で表わされる化合物
が挙げられる。R13およびR14は前記R10および
R11と同意義を表わし、X4は前記X3と同意義、
Y9〜Y12は前記Y1〜Y4と同意義を表わす。具体
例としてはハイドロキノン、レゾルシン、メチル
ハイドロキノン、クロロハイドロキノン、アセチ
ルハイドロキノン、アセトキシハイドロキノン、
ニトロハイドロキノン、ジメチルアミノハイドロ
キノン、1,4−ジヒドロキシナフトール、1,
5−ジヒドロキシナフトール、1,6−ジヒドロ
キシナフトール、2,6−ジヒドロキシナフトー
ル、2,7−ジヒドロキシナフトール、2,2′−
ビス(4−ヒドロキシフエニル)プロパン、2,
2′−ビス(4−ヒドロキシ−3,5−ジメチルフ
エニル)プロパン、2,2′−ビス(4−ヒドロキ
シ3,5−ジクロロフエニル)−プロパン、2,
2′−ビス(4−ヒドロキシ−3−メチルフエニ
ル)−プロパン、2,2′−ビス(4−ヒドロキシ
−3−クロロフエニル)プロパン、ビス(4−ヒ
ドロキシフエニル)−メタン、ビス(4−ヒドロ
キシ−3,5−ジメチルフエニル)−メタン、ビ
ス(4−ヒドロキシ−3,5−ジクロロフエニ
ル)−メタン、ビス(4−ヒドロキシ−3,5−
ジブロモフエニル)−メタン、1,1−ビス(4
−ヒドロキシフエニル)シクロヘキサン、4,
4′−ジヒドロキシジフエニルビス(4−ヒドロキ
シフエニル)−ケトン、ビス(4−ヒドロキシ−
3,5−ジメチルフエニル)−ケトン、ビス(4
−ヒドロキシ−3,5−ジクロロフエニル)−ケ
トン、ビス(4−ヒドロキシフエニル)スルフイ
ド、ビス(4−ヒドロキシ−3−クロロフエニ
ル)スルフイド、ビス(4−ヒドロキシフエニ
ル)スルホン、ビス(4−ヒドロキシ−3,5−
ジクロロフエニル)エーテル、1,4−ブタンジ
オール、1,4−シクロヘキサンジオール、1,
6−ヘキサメチレンジオール、1,4−シクロヘ
キサンジメタノール、キシリデン−1,4−ジオ
ール、1,3−シクロヘキサンジオール等が挙げ
られるが、必ずしもこれらに限定されるものでは
ない。またこれらは混合物として使用してもよ
い。
ベンゼン環にフエノール性水酸基とカルボキシ
ル基を有するオキシ酸としては、一般式
[Formula] group or -R 13 -X 4 -R 14 - group) is mentioned. R 13 and R 14 are the above R 10 and
R represents the same meaning as 11 , X 4 represents the same meaning as X 3 above,
Y 9 to Y 12 have the same meanings as Y 1 to Y 4 above. Specific examples include hydroquinone, resorcinol, methylhydroquinone, chlorohydroquinone, acetylhydroquinone, acetoxyhydroquinone,
Nitrohydroquinone, dimethylaminohydroquinone, 1,4-dihydroxynaphthol, 1,
5-dihydroxynaphthol, 1,6-dihydroxynaphthol, 2,6-dihydroxynaphthol, 2,7-dihydroxynaphthol, 2,2'-
Bis(4-hydroxyphenyl)propane, 2,
2'-bis(4-hydroxy-3,5-dimethylphenyl)propane, 2,2'-bis(4-hydroxy3,5-dichlorophenyl)-propane, 2,
2'-bis(4-hydroxy-3-methylphenyl)-propane, 2,2'-bis(4-hydroxy-3-chlorophenyl)propane, bis(4-hydroxyphenyl)-methane, bis(4-hydroxy- 3,5-dimethylphenyl)-methane, bis(4-hydroxy-3,5-dichlorophenyl)-methane, bis(4-hydroxy-3,5-
dibromophenyl)-methane, 1,1-bis(4
-hydroxyphenyl)cyclohexane, 4,
4'-dihydroxydiphenylbis(4-hydroxyphenyl)-ketone, bis(4-hydroxy-
3,5-dimethylphenyl)-ketone, bis(4
-hydroxy-3,5-dichlorophenyl)-ketone, bis(4-hydroxyphenyl) sulfide, bis(4-hydroxy-3-chlorophenyl) sulfide, bis(4-hydroxyphenyl) sulfone, bis(4- Hydroxy-3,5-
dichlorophenyl) ether, 1,4-butanediol, 1,4-cyclohexanediol, 1,
Examples include, but are not limited to, 6-hexamethylene diol, 1,4-cyclohexanedimethanol, xylidene-1,4-diol, 1,3-cyclohexanediol, and the like. Moreover, these may be used as a mixture. As an oxyacid having a phenolic hydroxyl group and a carboxyl group in the benzene ring, the general formula
【式】(式中、Z1〜Z4は水素
原子、ハロゲン原子、アルキル基またはアルコキ
シ基を示す)で表わされる化合物が使用しうる。
具体例としてはp−ヒドロキシ安息香酸、m−ヒ
ドロキシ安息香酸、シユリンガ−酸、バニリン
酸、4−ヒドロキシ−4′−カルボキシジフエニル
エーテル、4−ヒドロキシ−4′−カルボキシビフ
エニル、2,6−ジクロロ−p−ヒドロキシ安息
香酸、2−クロロ−p−ヒドロキシ安息香酸、
2,6−ジフルオロ−p−ヒドロキシ安息香酸等
のヒドロキシ安息香酸類が挙げられる。これらは
混合物であつてもよい。
本発明で用いられるアミド化合物としては、前
示一般式()で表わされるものはいずれも使用
可能であるが、N,N−ジメチルホルムアミド、
N,N−ジエチルホルムアミド、N,N−ジブチ
ルホルムアミド、N−メチルホルムアミド、ホル
ムアミド、N,N−ジメチルアセトアミド、N,
N−ジエチルアセトアミド、N−メチルアセトア
ミド、アセトアニリド、N,N−ジフエニルホル
ムアミド、ベンゾイルアミド、N,N−ジメチル
ベンゾイルアミド、N−メチルベンゾイルアミ
ド、N,N−ジエチルアセトアミドのように前示
一般式()においてR1,R2およびR3が水素原
子、アルキル基およびアリール基のものが特に好
ましい。
本発明で用いられるスルホニル化合物として
は、一般式()で表わされるものはいずれも使
用可能であるが、p−トルエンスルホニルクロリ
ド、フエニルスルホニルクロリド、p−ブロモフ
エニルスルホニルクロリド、p−ニトロフエニル
スルホニルクロリド、p−クロロフエニルスルホ
ニルクロリド、m−クロロフエニルスルホニルク
ロリド、2,4,6−トリメチルフエニルスルホ
ニルクロリド、2,4,6−トリイソプロピルス
ルホニルクロリド、メタンスルホニルクロリド、
エタンスルホニルクロリド、p−トルエンスルホ
ニウムブロマイド、p−トルエンスルホニルイオ
ダイド、p−トルエンスルホニルフルオダイド、
ベンジルスルホニルクロリドのように前示一般式
()においてR4がアリール基、アルキル基およ
びベンジル基のものが特に好ましい。
アミド化合物の使用量はジオール又はオキシ酸
1モルに対して1/50モル以上用いることが必要で
あり、スルホニル化合物の使用量はジオールまた
はオキシ酸1モルに対し2〜4倍モル、好ましく
は2〜3倍モル用いることが必要である。
重合に際しては塩基単独あるいは塩基と溶媒中
でアミド化合物とスルホニル化合物を予め反応さ
せて、前記()式の化合物を系内中で生成(そ
の生成量はジオール又はオキシ酸1モルに対し1/
50モル以上)させた後に前記モノマー(ジカルボ
ン酸とジオール、あるいは/およびオキシ酸)を
混合加媒する方法が適当であり、反応温度は通常
0〜50℃程度、好ましくは室温程度がよい。この
目的のために使用される塩基としてはピリジン、
α−ピコリン、β−ピコリン、γ−ピコリン、
3,5−ルチジン、3,4−ルチジン、2,4−
ルチジン、2,6−ルチジン、2,3−ルチジ
ン、2,5−ルチジン、2,4,6−コリジン、
キノリン、イソキノリン、ジメチルアニリン等が
挙げられるが、第三級アミンであればいずれも使
用可能である。
また溶媒としては、クロルベンゼン、O−ジク
ロルベンゼン、四塩化炭素、ジクロルメタン、テ
トラクロルエタンのような塩素系溶媒、ジメチル
ホルムアミド、ジメチルアセトアミド、N−メチ
ルピロリド、γ−ブチロラクトン、ジメチルスル
ホキシド、スルホラン、ヘキサメチルホスホルア
ミドのような極性溶媒、ベンゼン、トルエン、キ
シレンのような芳香族基炭化水素が挙げられる。
重縮合温度は溶媒により異なるが、通常80〜200
℃程度、好ましくは100〜120℃程度がよい。
なお本発明では重合中に生成するポリマーの溶
解性や膨潤性を調節するための添加剤として、お
よび重合度を上昇させるための助剤として用いら
れるLiCl、CaCl2、MgCl2、LiBrなどのようなア
ルカリまたはアルカリ土類金属のハロゲン化物の
添加なしに高重合度で分子量分布の非常に狭いポ
リエステルが容易に得られる。
重合中の系は、均一系、析出系、ゲル様系と使
用するモノマーの組合せおよび溶媒、添加剤の種
類等により種々であるが、重合体の単離は低級ア
ルコール、低級ケトンのような有機溶媒中への再
沈、または水のみによる再沈、洗浄などによつて
行なうことができる。
以下本発明を実施例により詳細に説明する。な
お以下の実施例におけるすべての粘度(ηinh)は
フエノール/sym−テトラクロロエタン(60/
40、重量比)中、0.5wt%ポリマー溶液、30℃で
測定したものである。
実施例 1
p−トルエンスルホン酸クロリド(13ミリモ
ル)のピリジン(10ml)溶液にN,N−ジメチル
ホルムアミド(10ミリモル)を加え室温で30分間
撹拌、反応させた後、イソフタル酸(2.5ミリモ
ル)とテレフタル酸(2.5ミリモル)のピリジン
(10ml)溶液を加え10分間反応させた。この反応
混合物をさらに120℃の油浴中で10分間加温し、
この溶液にピリジン(10ml)に溶解したビスフエ
ノールA(5ミリモル)を20分間で滴下し、さら
に120℃の油浴中で3時間反応させた。反応液を
ピリジンで希釈した後メタノール中に注入してポ
リマーを分離し、ほぼ定量的収率でポリマーを得
た。ポリマーの粘度(ηinh)は1.15dl/gであつ
た。
実施例2〜7、比較例1
N,N−ジメチルホルムアミド(DMF)の量
を変えたこと以外は実施例1と同様にして表−1
に示すような結果をえた。A compound represented by the formula: (wherein Z 1 to Z 4 represent a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group) can be used.
Specific examples include p-hydroxybenzoic acid, m-hydroxybenzoic acid, Schuringer's acid, vanillic acid, 4-hydroxy-4'-carboxydiphenyl ether, 4-hydroxy-4'-carboxybiphenyl, 2,6- dichloro-p-hydroxybenzoic acid, 2-chloro-p-hydroxybenzoic acid,
Examples include hydroxybenzoic acids such as 2,6-difluoro-p-hydroxybenzoic acid. These may be a mixture. As the amide compound used in the present invention, any of those represented by the general formula () above can be used, but N,N-dimethylformamide,
N,N-diethylformamide, N,N-dibutylformamide, N-methylformamide, formamide, N,N-dimethylacetamide, N,
N-diethylacetamide, N-methylacetamide, acetanilide, N,N-diphenylformamide, benzoylamide, N,N-dimethylbenzoylamide, N-methylbenzoylamide, N,N-diethylacetamide and other general formulas In (), R 1 , R 2 and R 3 are particularly preferably hydrogen atoms, alkyl groups and aryl groups. As the sulfonyl compound used in the present invention, any compound represented by the general formula () can be used, but p-toluenesulfonyl chloride, phenylsulfonyl chloride, p-bromophenylsulfonyl chloride, p-nitrophenyl chloride, enylsulfonyl chloride, p-chlorophenylsulfonyl chloride, m-chlorophenylsulfonyl chloride, 2,4,6-trimethylphenylsulfonyl chloride, 2,4,6-triisopropylsulfonyl chloride, methanesulfonyl chloride,
ethanesulfonyl chloride, p-toluenesulfonium bromide, p-toluenesulfonyl iodide, p-toluenesulfonyl fluoride,
Particularly preferred are those in the general formula () in which R 4 is an aryl group, an alkyl group, or a benzyl group, such as benzylsulfonyl chloride. The amount of the amide compound to be used is 1/50 mole or more per mole of diol or oxyacid, and the amount of the sulfonyl compound to be used is 2 to 4 times the mole, preferably 2 to 4 times the mole of diol or oxyacid. It is necessary to use ~3 times the molar amount. During polymerization, the amide compound and sulfonyl compound are reacted in advance with a base alone or in a base and a solvent to produce the compound of formula () in the system (the amount produced is 1/1 per mole of diol or oxyacid).
A suitable method is to mix and add the monomers (dicarboxylic acid and diol or/and oxyacid) after 50 mol or more, and the reaction temperature is usually about 0 to 50°C, preferably about room temperature. Bases used for this purpose include pyridine,
α-picoline, β-picoline, γ-picoline,
3,5-lutidine, 3,4-lutidine, 2,4-
Lutidine, 2,6-lutidine, 2,3-lutidine, 2,5-lutidine, 2,4,6-collidine,
Examples include quinoline, isoquinoline, dimethylaniline, etc., but any tertiary amine can be used. Examples of solvents include chlorinated solvents such as chlorobenzene, O-dichlorobenzene, carbon tetrachloride, dichloromethane, and tetrachloroethane, dimethylformamide, dimethylacetamide, N-methylpyrrolid, γ-butyrolactone, dimethylsulfoxide, sulfolane, and hexane. Examples include polar solvents such as methylphosphoramide, and aromatic hydrocarbons such as benzene, toluene, and xylene.
Polycondensation temperature varies depending on the solvent, but is usually 80 to 200
The temperature is preferably about 100 to 120°C. In the present invention, additives such as LiCl, CaCl 2 , MgCl 2 , LiBr, etc., which are used as additives to adjust the solubility and swelling properties of the polymer produced during polymerization, and as auxiliary agents to increase the degree of polymerization, are used. Polyesters with a high degree of polymerization and a very narrow molecular weight distribution can be easily obtained without the addition of alkali or alkaline earth metal halides. The system during polymerization varies depending on the combination of monomers, solvents, and additives used, such as homogeneous, precipitation, and gel-like systems. This can be carried out by reprecipitation in a solvent, reprecipitation with water alone, washing, and the like. The present invention will be explained in detail below with reference to Examples. All viscosities (ηinh) in the following examples are phenol/sym-tetrachloroethane (60/
40, weight ratio), a 0.5 wt% polymer solution was measured at 30°C. Example 1 N,N-dimethylformamide (10 mmol) was added to a solution of p-toluenesulfonic acid chloride (13 mmol) in pyridine (10 ml), stirred at room temperature for 30 minutes, and reacted, followed by isophthalic acid (2.5 mmol). A solution of terephthalic acid (2.5 mmol) in pyridine (10 ml) was added and reacted for 10 minutes. The reaction mixture was further heated in an oil bath at 120°C for 10 minutes,
Bisphenol A (5 mmol) dissolved in pyridine (10 ml) was added dropwise to this solution over 20 minutes, and the mixture was further reacted in an oil bath at 120°C for 3 hours. The reaction solution was diluted with pyridine and then poured into methanol to separate the polymer, yielding a polymer in almost quantitative yield. The viscosity (ηinh) of the polymer was 1.15 dl/g. Examples 2 to 7, Comparative Example 1 Table 1 was prepared in the same manner as in Example 1 except that the amount of N,N-dimethylformamide (DMF) was changed.
The results shown are obtained.
【表】【table】
【表】
実施例 8〜16
DMFの量を3ミリモル、ビスフエノールの滴
下時間を10分とし、ジカルボン酸とジオールを下
記に示すように変えた以外は実施例1と同様に操
作して表−2に示すような結果を得た。[Table] Examples 8 to 16 The procedure was repeated in the same manner as in Example 1 except that the amount of DMF was 3 mmol, the dropping time of bisphenol was 10 minutes, and the dicarboxylic acid and diol were changed as shown below. The results shown in 2 were obtained.
【表】
実施例 17〜19
DMFの代わりに下記に示すようなアミド化合
物を3ミリモル用いたこと以外は実施例1と同様
に操作して下記の結果を得た。[Table] Examples 17 to 19 The following results were obtained in the same manner as in Example 1, except that 3 mmol of the amide compound shown below was used instead of DMF.
【表】
実施例 20〜23
p−トルエンスルホニルクロリドの代わりに下
記に示すようなハロゲン化スルホニル化合物を用
いたこと、及びDMFの量を3ミリモルとしたこ
と以外は実施例1と同様に操作して下記の結果を
得た。[Table] Examples 20 to 23 The procedure was carried out in the same manner as in Example 1, except that a halogenated sulfonyl compound as shown below was used instead of p-toluenesulfonyl chloride, and the amount of DMF was 3 mmol. The following results were obtained.
【表】
実施例 24
p−トルエンスルホニルクロリド(13ミリモ
ル)をピリジン(10ml)に溶解させた後20分放置
し、これにDMF(20ミリモル)を加えさらに室温
で30分撹拌下に放置する。この溶液をp−オキシ
−安息香酸(5ミリモル)とシユリンガー酸(5
ミリモル)を溶解し、120℃の油浴中で加温した
ピリジン(10ml)とDMF(10ml)の混合溶液に加
え、120℃の油浴中で3時間反応させた。ポリマ
ーの分離は実施例1と同様に操作して定量的収率
で2.0dl/gのηinh(p−クロロフエノール中、50
℃で測定)を有するポリマーを得た。
実施例 25〜28
モノマーのオキシ酸を溶解させるDMFとピリ
ジンの混合割合を変化させたこと以外は上記実施
例24と同様に操作して下記の結果をえた。[Table] Example 24 After dissolving p-toluenesulfonyl chloride (13 mmol) in pyridine (10 ml), let it stand for 20 minutes, add DMF (20 mmol) and leave it under stirring at room temperature for 30 minutes. This solution was combined with p-oxy-benzoic acid (5 mmol) and Schulinger's acid (5 mmol).
mmol) was dissolved, added to a mixed solution of pyridine (10 ml) and DMF (10 ml) heated in a 120°C oil bath, and reacted for 3 hours in a 120°C oil bath. The separation of the polymer was carried out in the same manner as in Example 1, with a quantitative yield of 2.0 dl/g of ηinh (in p-chlorophenol, 50
A polymer was obtained having a temperature of 100° C.). Examples 25 to 28 The following results were obtained in the same manner as in Example 24, except that the mixing ratio of DMF and pyridine for dissolving the monomer oxyacid was changed.
Claims (1)
ン環にフエノール性水酸基とカルボキシル基を有
するオキシ酸の重縮合または該オキシ酸とジカル
ボン酸とジオールとの重縮合反応において、一般
式() (式中R1,R2およびR3は水素原子、アルキル
基、アリール基、アラルキル基またはシクロアル
キル基を示す)で表わされるアミド化合物と一般
式() R4−SO2X1 ……() (式中R4はアルキル基、アリール基、アラル
キル基またはシクロヘキシル基を示し、X1はハ
ロゲン原子を示す)で表わされるハロゲン化スル
ホニル化合物との反応により生成する一般式
() (式中R5,R6およびR7は水素原子、アルキル
基、アリール基、アラルキル基またはシクロアル
キル基を示し、R8はアルキル基、アリール基、
アラルキル基またはシクロヘキシル基を示し、
X2はハロゲン原子を示す)で表わされる第四級
塩を存在させることを特徴とするポリエステルの
製造法。[Scope of Claims] 1 In the polycondensation reaction of a dicarboxylic acid and a diol, the polycondensation reaction of an oxyacid having a phenolic hydroxyl group and a carboxyl group in the benzene ring, or the polycondensation reaction of the oxyacid, a dicarboxylic acid, and a diol, the general formula () (In the formula, R 1 , R 2 and R 3 represent a hydrogen atom, an alkyl group, an aryl group, an aralkyl group or a cycloalkyl group) and the general formula () R 4 −SO 2 X 1 ……( ) (In the formula, R 4 represents an alkyl group, aryl group, aralkyl group, or cyclohexyl group, and X 1 represents a halogen atom) General formula () produced by reaction with a halogenated sulfonyl compound represented by (In the formula, R 5 , R 6 and R 7 represent a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, or a cycloalkyl group, and R 8 represents an alkyl group, an aryl group,
represents an aralkyl group or a cyclohexyl group,
A method for producing polyester, characterized by the presence of a quaternary salt represented by (X 2 represents a halogen atom).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7259583A JPS59197423A (en) | 1983-04-25 | 1983-04-25 | Polyester manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7259583A JPS59197423A (en) | 1983-04-25 | 1983-04-25 | Polyester manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59197423A JPS59197423A (en) | 1984-11-09 |
| JPH0438764B2 true JPH0438764B2 (en) | 1992-06-25 |
Family
ID=13493908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7259583A Granted JPS59197423A (en) | 1983-04-25 | 1983-04-25 | Polyester manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59197423A (en) |
-
1983
- 1983-04-25 JP JP7259583A patent/JPS59197423A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59197423A (en) | 1984-11-09 |
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