JPH04400A - Plating and production of alumite - Google Patents

Plating and production of alumite

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Publication number
JPH04400A
JPH04400A JP9769490A JP9769490A JPH04400A JP H04400 A JPH04400 A JP H04400A JP 9769490 A JP9769490 A JP 9769490A JP 9769490 A JP9769490 A JP 9769490A JP H04400 A JPH04400 A JP H04400A
Authority
JP
Japan
Prior art keywords
alumite
plating
heat
heat pump
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9769490A
Other languages
Japanese (ja)
Inventor
Tatsuaki Omasa
龍晋 大政
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO KAGAKU SOCHI KK
Original Assignee
TOKYO KAGAKU SOCHI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO KAGAKU SOCHI KK filed Critical TOKYO KAGAKU SOCHI KK
Priority to JP9769490A priority Critical patent/JPH04400A/en
Publication of JPH04400A publication Critical patent/JPH04400A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enhance thermal economy and quality and to enhance treatment efficiency by utilizing a heat pump as a heat exchange means for heating and cooling and performing aeration agitation of liquid by a fine porous diffusion cylinder in the case of plating and producing alumite. CONSTITUTION:In plating or production of alumite, a heat pump is used as a heat exchange means for performing heating and cooling in at least one stage such as sulfuric acid degreasing, caustic etching, dyeing and electrolysis. As this heat pump, a type is utilized which discharges hot air or hot water. Thereby heat balance is improved without using a boiler and a refrigerator and less energy consumption is contrived. Aeration agitation is performed for the liquid in the above-mentioned stages by utilizing a fine porous diffusion cylinder made of high-temp. roasted ceramics. The blowout hole of micro bubbles in this diffusion cylinder is preferably regulated to about 50-60mum diameter. Thereby the liquid is extremely homogeneously agitated and treatment time is shortened and also quality of the product is enhanced.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、めっき処理(電解めっきまたは無電解めっき
の両者を包含する 処理、およびアルマイト製造方法の
改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to improvements in plating processes (including both electrolytic plating and electroless plating) and alumite manufacturing methods.

従来の技術 めっきおよびアルマイトの製造は周知の技術であり、現
在著しく発達しているか、なお改善すべき点も多く、特
に、製品の品質向上、不良品発生防止、および熱エネル
ギーおよび電気エネルギーの節減、製造所要時間の短縮
に関してなお一層の改善が強く望まれている。
Conventional technology The production of plating and anodizing is a well-known technology, which is currently significantly developed, but there are still many improvements to be made, especially in improving the quality of products, preventing the occurrence of defective products, and saving thermal and electrical energy. Further improvements in reducing the manufacturing time are strongly desired.

発明が解決しようとする問題点 本発明はめっきおよびアルマイト製造の改良について種
々研究を行い、ヒートポンプを使用することによってめ
っきやアルマイト製造の際の熱バランスが著しく改善で
き、さらにまた、撹拌のときのエアレーションを、高温
焼成セラミック質の微孔質散気筒を使用することによっ
て、液の撹拌が非常に均質に実施でき、これらの2つの
新たな手段の併用によって、製品の品質かよくなり、エ
ネルギーがかなり大きく節減でき、かつ、操作時間もか
なり短くなることを見出した。
Problems to be Solved by the Invention The present invention has conducted various studies on improvements in plating and alumite production, and has found that by using a heat pump, the heat balance during plating and alumite production can be significantly improved. By using a microporous aeration cylinder made of high-temperature fired ceramic, the liquid can be stirred very homogeneously, and the combination of these two new methods improves the quality of the product and saves energy. It has been found that considerable savings can be made and the operating time is considerably shortened.

発明の構成 本発明は、めっきまたはアルマイト製造方法において、
その中の1以上の工程で加熱および冷却を行うときの熱
交換手段としてヒートポンプを使用し、さらにまた、前
記工程の際に液に対して、高温燃成セラミック質の微孔
質散気筒を用いるエアレーション撹拌を行うことを特徴
とするめつきまたはアルマイト製造方法に関するもので
ある。
Structure of the Invention The present invention provides a method for producing plating or alumite,
A heat pump is used as a heat exchange means when performing heating and cooling in one or more of the steps, and a microporous aeration tube made of high-temperature combustion ceramic is used for the liquid during the above steps. The present invention relates to a plating or alumite manufacturing method characterized by performing aeration stirring.

好ましい実施態様の記述 本発明の好ましい実施態様について説明する。Description of preferred embodiments A preferred embodiment of the present invention will be described.

本発明方法では、冷凍機の代わりにヒートポンプ、好ま
しくは特殊ヒートポンプ(冷却熱が湯として排出)を使
用し、冷却熱を比較的温度の低い加熱部(硫酸脱脂、苛
性エツチング及び染′色槽なと)に全面的に利用し省エ
ネルギー化を計る。
In the method of the present invention, a heat pump, preferably a special heat pump (cooling heat is discharged as hot water) is used instead of a refrigerator, and the cooling heat is transferred to a relatively low-temperature heating section (sulfuric acid degreasing, caustic etching, dye bath, etc.). ) to save energy.

電解槽には従来の気泡の大きなエヤー撹拌をやめ、セラ
ミ、り質高温焼成の多孔質磁器の散気筒を使用し60μ
〜80μのミクロの気泡を連続的に製品に接触させるこ
とによって従来より、めつきにおいて3割以上、アルマ
イト製造において3倍以上早く製品を得る方法である。
For the electrolytic cell, instead of using the conventional air agitation with large bubbles, we use a porous porcelain tube made of ceramic or lithium fired at high temperature.
This is a method to obtain a product more than 30% faster in plating and more than 3 times faster in alumite production than conventional methods by bringing microbubbles of ~80μ into continuous contact with the product.

同時に染色槽及び水洗槽にもミクロ撹拌を行い、ンミ、
汚れなどの不良品のない方法でもある。用途は、特にア
ルマイト製造法及びプリント基板用メツキ法等であるが
、洗浄におい゛ても有効である。
At the same time, micro-agitation is also carried out in the dyeing tank and washing tank.
It is also a method that eliminates defects such as dirt. Applications include alumite manufacturing methods and printed circuit board plating methods, but it is also effective in cleaning.

例として、アルマイトの製造方法について述へる。−船
釣なアルマイト法では次の操作か行われる。
As an example, a method for manufacturing alumite will be described. -The following operations are performed in the boat-based alumite method.

ローティング−硫酸脱脂−水洗−苛性エノチングー水化
学研摩−水洗一中和一水洗一電解(陽極酸化)−水一染
色一水洗封孔一水洗一乾燥−アンローティング ■ 冷却 電解・・・・・・・・ 冷凍機染色    
  40°C 封孔      95・C 従来の方法では冷却、加熱は次のごとく行われ、電解(
陽極酸化)槽を適切な能力の冷凍機にて約20’C位に
冷却する。うばった熱はクーリングタワーにて放熱する
Loading - Sulfuric acid degreasing - Water washing - Caustic enoting - Water Chemical polishing - Water washing - Neutralization - Water washing - Electrolysis (anodizing) - Water - Dyeing - Water washing - Sealing - Water washing - Drying - Unloading ■ Cooling Electrolysis...・・・ Freezer dyeing
40°C Sealing 95・C In the conventional method, cooling and heating are performed as follows, and electrolysis (
The anodizing bath is cooled to about 20'C using a refrigerator of appropriate capacity. The absorbed heat is dissipated in a cooling tower.

又硫酸脱脂、苛性エツチング、化学研摩、染色及び封孔
はそれぞれの必要温度になる様ヒーターあるいはボイラ
ーに゛よる加熱を行う。
For sulfuric acid degreasing, caustic etching, chemical polishing, dyeing, and sealing, heating is performed using a heater or boiler to reach the required temperature.

エヤー撹拌について述べると、電解槽、染色槽はエヤー
撹拌を必要とするが通常直径20m/m〜25m/mの
パイプに一定間隔をおいてドリルで1+n/、m位の穴
を多数あけて使用する。
Regarding air agitation, electrolytic cells and dyeing tanks require air agitation, but it is usually used by drilling a number of holes of about 1+n/m at regular intervals in a pipe with a diameter of 20m/m to 25m/m. do.

操作条件の一例を示す。電流密度0.8〜1.2A/d
m’、膜厚15μ、電解時間40分、電流密度IA/d
m’、温度20’C0 一般法は次の欠点を有する。
An example of operating conditions is shown below. Current density 0.8-1.2A/d
m', film thickness 15μ, electrolysis time 40 minutes, current density IA/d
m', temperature 20'C0 The general method has the following drawbacks.

■ 冷却に必要な能力の冷凍機を使い又加熱には、別途
ボイラーなどの加熱源により加熱していた。冷却でうば
った熱は外部に利用されることなく放出し熱工不ルキー
の無駄が多い。
■ A refrigerator with the necessary capacity was used for cooling, and a separate heat source such as a boiler was used for heating. The heat lost during cooling is released without being used externally, resulting in a lot of waste in heat engineering.

■ 電流密度が、せいぜい0.8〜1.2A/dm’位
しか出せず、そのため長時間の電解が必要である。
(2) The current density can only be about 0.8 to 1.2 A/dm' at most, and therefore a long time is required for electrolysis.

■ 低電流部と高電流部の差が多く、これによる膜厚の
バラツキが20%〜30%ある。
(2) There is a large difference between the low current part and the high current part, and this causes a variation in film thickness of 20% to 30%.

■ 染色時間か15〜20分と長い。又皮膜の不均一に
より染色性が悪い。
■ Dyeing time is long, about 15 to 20 minutes. Also, dyeing properties are poor due to non-uniformity of the film.

■ 処理温度は20°C以下にしなければヤケ、コゲな
どの不良が発生する。温度管理がきびしい。
■ If the processing temperature is not lower than 20°C, defects such as burning and burning will occur. Temperature control is strict.

本発明方法の好ましい態様によれば、次の操作が行われ
る。
According to a preferred embodiment of the method of the invention, the following operations are carried out.

1、立上がり時にはボイラーを使用してもよく必要な個
所すべてに熱源を供給する。
1. When starting up, a boiler can be used to supply a heat source to all necessary locations.

2、立上がりと同時に電解槽の発熱があるのでこの発生
熱を特定の加熱槽に供給する。ボイラーによる加熱は停
止し、ヒートポンプに切換える。
2. Since the electrolytic cell generates heat at the same time as the start-up, this generated heat is supplied to a specific heating tank. Heating by the boiler will be stopped and switched to the heat pump.

3、従来のヒートポンプは冷却熱をエヤーとして排出し
ているので高温加熱(50°C〜60’C)は困難であ
る。冷却熱を60°C〜65°Cの湯として排出する型
のヒートポンプは、熱交換効率か良いので、問題な(使
用出来る。
3. Since conventional heat pumps discharge cooling heat as air, high-temperature heating (50°C to 60'C) is difficult. Heat pumps that discharge cooling heat as hot water at 60°C to 65°C have a good heat exchange efficiency, so they can be used.

4、最初の立上がり時にホイラーなとの加熱源を使用す
ると、ヒートポンプの熱源としてのエヤー及び水などが
不必要になる。又水を熱源とする場合はその水が必要に
なるが、この実施態様の場合にはほとんといらないなど
のメリットかでてく る。
4. If a heating source such as a wheeler is used during the initial start-up, air and water as a heat source for the heat pump are unnecessary. Also, if water is used as a heat source, water will be required, but this embodiment has the advantage that it is hardly needed.

ヒートボンフトミクロエヤーレーションとの組合せによ
り省エネルギー上画期的な効果がある。
Combined with Heat Bonft Micro Aeration, it has an epoch-making effect in terms of energy saving.

第1図は、本発明の好ましい態様に係るアルマイト製造
方法における加熱冷却用配管系を示す略式管系図である
。製造操作の開始時(立上り時)には、地下井戸(31
)または水道からの水をヒートポンプ(31)に供給す
る。ヒートポンプ(31)は湯を排出する型のたとえば
308Pのアクアヒートポンプである。前記の水は管(
43)を経て排出され、温水として適宜利用される。電
解槽の冷却水は冷水ポンプ(29)、冷水クツションタ
ンク(13)および冷水ポンプ(27)を経て電解槽用
熱交換器(23)に供給される。熱交換器(23)0′
)。
FIG. 1 is a schematic pipe system diagram showing a heating and cooling piping system in an alumite manufacturing method according to a preferred embodiment of the present invention. At the start of production operations (start-up), underground wells (31
) or water from the tap is supplied to the heat pump (31). The heat pump (31) is, for example, a 308P aqua heat pump that discharges hot water. The water mentioned above is piped (
43) and used as hot water as appropriate. Cooling water for the electrolytic cell is supplied to the electrolytic cell heat exchanger (23) through a cold water pump (29), a cold water cushion tank (13), and a cold water pump (27). Heat exchanger (23) 0'
).

高目の温度の排水は再びヒートポンプ(11)に戻り、
加熱源として利用される。酸性脱脂槽用熱交換器(17
)、苛性エツチング用熱交換器(19)および染色槽用
熱交換器(21)に供給される温水は、ヒートポンプ(
11)から温水ポンプ(30) 、温水クツ/フンタン
ク(15)および温水ポンプ(25)を経て前記熱交換
器’(17)、(19)および(21)に送られる。
The high temperature wastewater returns to the heat pump (11) again.
Used as a heating source. Heat exchanger for acidic degreasing tank (17
), the hot water supplied to the caustic etching heat exchanger (19) and the dyeing tank heat exchanger (21) is supplied to the heat pump (
11), is sent to the heat exchangers (17), (19), and (21) via the hot water pump (30), hot water shoe/dung tank (15), and hot water pump (25).

電解液の撹拌について述べる。Let's talk about stirring the electrolyte.

■ 一般法のエヤー撹拌では、整流器を定電圧にし電流
を流したところ800Aの電流か流れた。
■ In the general method of air stirring, when the rectifier was set to a constant voltage and a current was passed, a current of 800 A flowed.

故にIA/dm’の電流密度で40分電解を行う。Therefore, electrolysis is carried out for 40 minutes at a current density of IA/dm'.

2 本発明に従った微孔質散気筒を用いるミクロ曝気法
について述べる。多孔質の気孔径50μ〜60μのセラ
ミック製散気管でエヤー撹拌を行い、上記同様15Vの
定電圧で電流を流したところ、200OAの電流が流れ
た。故に2.5A / dm’の電流密度で40分電解
を行う。
2 A micro aeration method using a microporous aeration cylinder according to the present invention will be described. Air stirring was performed using a porous ceramic diffuser tube with a pore diameter of 50 μm to 60 μm, and when a current was applied at a constant voltage of 15 V as described above, a current of 200 OA flowed. Therefore, conduct electrolysis for 40 minutes at a current density of 2.5 A/dm'.

3 結果は次の通りであった。3 The results were as follows.

第1表 ても一般法では約20’C位にしているが、本発明に従
ったミクロエヤーレーション方式によると28℃〜31
°C位の高温でも良く約8°C〜10°Cの省エネルギ
ー効果がある。
In Table 1, the temperature is about 20°C in the general method, but according to the microaeration method according to the present invention, it is 28°C to 31°C.
It can be used at a high temperature of about 8°C to 10°C and has an energy saving effect of about 8°C to 10°C.

実験データの一例を示す。An example of experimental data is shown.

第2表 4、本発明に従ったミクロ撹拌法ではアルマイト製品表
に連続的にミクロ的な気泡かとりまきジュール熱を連続
的に除去することにより電気抵抗を下げることか出来、
2.5倍の電流密度が得られた。その結果、同じ膜厚を
得るには一般法に比較して、1/2以下の電解時間でよ
く、又膜厚のバラツキも非常に少なかった。
Table 2 4: In the micro-stirring method according to the present invention, electrical resistance can be lowered by continuously removing Joule heat by continuously surrounding the surface of the alumite product with microscopic bubbles.
A current density 2.5 times higher was obtained. As a result, in order to obtain the same film thickness, less than half the electrolysis time was required compared to the general method, and the variation in film thickness was also very small.

染色性についても、均一な多孔質の膜が得られるため染
色性も良く一般法に比べはるかに短い時間で良好な製品
が得られた。同じ膜厚を得るのに比較的低い電圧で短時
間処理で良いので、その時の電気使用量は、15%〜3
0%減り省エネルギー効果か犬であった。又冷却工不ル
キーについ上述の微孔質散気筒はセラミ・ツク、金属類
、合成樹脂等から製造できるが、多孔質、耐熱性および
耐食性を考えればセラミック製が一般に適当であろう。
As for dyeability, since a uniform porous membrane was obtained, the dyeability was also good, and a good product was obtained in a much shorter time than with the conventional method. To obtain the same film thickness, a relatively low voltage and short time treatment is sufficient, so the amount of electricity used at that time is 15% to 3.
The energy saving effect was reduced by 0%. Regarding the cooling process, the above-mentioned microporous aeration tube can be manufactured from ceramics, metals, synthetic resins, etc., but in view of its porous nature, heat resistance, and corrosion resistance, ceramics are generally suitable.

好ましくは、気孔率は25−50%、気孔径は5−50
μである。
Preferably, the porosity is 25-50% and the pore size is 5-50%.
μ.

微孔質散気筒の一例を第2図に示す。該図に記載の散気
筒(76)は円筒形であって、アランタム質の砥粒を骨
材とした高温焼成セラミック体である。散気筒(76)
の片方の末端部に表蓋(81)を取り付け、他方の末端
部に裏蓋(83)を取り付ける。裏蓋(83)には空気
(または他の所望物質)供給用導管(85)を取り付け
る。表蓋(81)および裏蓋(83)はシャフト(87
)に固定する。散気筒(26)の4種の具体例A、B、
CおよびDの寸法および物理的特性を第3表に示す。し
かしなから、当業者には明らかなように散気筒(26)
の形状、寸法および特性は所望に応じて種々変えること
ができる。
An example of a microporous aeration cylinder is shown in FIG. The aeration cylinder (76) shown in the figure has a cylindrical shape and is a high-temperature fired ceramic body made of arantum abrasive grains as an aggregate. Diffusion cylinder (76)
A front cover (81) is attached to one end of the cover, and a back cover (83) is attached to the other end. An air (or other desired substance) supply conduit (85) is attached to the back cover (83). The front cover (81) and the back cover (83) are connected to the shaft (87
). Four specific examples of the aeration pipe (26) A, B,
The dimensions and physical properties of C and D are shown in Table 3. However, as is clear to those skilled in the art, the aeration pipe (26)
The shape, dimensions, and characteristics of can vary as desired.

アルマイト法に関する実施例を示す。An example regarding the alumite method will be shown.

実施例 1 イ 作業条件は次の通りであった。Example 1 B. The working conditions were as follows.

電解液組成   HtSO415V/V%アルミニウム
  4g/ρ 浴温      25°C±1℃ 浴電圧      18V 浴電流     200OA 電解槽数     5槽 口 電解槽、発生熱合計・約190.000 kcaL
’ Hrハ 加熱個所、及び条件は次の通りであった。
Electrolyte composition HtSO415V/V% aluminum 4g/ρ Bath temperature 25°C±1°C Bath voltage 18V Bath current 200OA Number of electrolytic cells 5 tank ports Total heat generated by electrolytic cell: approx. 190.000 kcaL
'Hrc The heating locations and conditions were as follows.

硫酸脱脂    3,200(60℃  1槽苛性エツ
チング 3,000g55℃  1槽染 色(A )3
.0OOQ40°C1槽染  色(B )  3.00
0Q50℃  3槽化学研摩    3,0OOC10
0°C1槽封   孔      5,50012  
 95°C2槽二 必要な空気量は次の通りであった。
Sulfuric acid degreasing 3,200 (60°C, 1 tank Caustic etching 3,000g 55°C, 1 tank Dyeing (A) 3
.. 0OOQ 40°C 1 tank staining (B) 3.00
0Q50℃ 3 tank chemical polishing 3,0OOC10
0°C1 tank sealing hole 5,50012
95°C 2 tanks 2 The required amount of air was as follows.

立上り時2728.7kg/Hr(1,766、879
kca12/Hr)稼  働  時  801.4kg
/Hr(41,7,972kca12/Hr)ホ 硫酸
脱脂、苛性エツチング、染色の合計所要熱量は約10万
kcaσ/Hrである。1日8時間稼働とすれば、 lO万kca(!/ HrX 8 Hr= 80万kc
aQ/日となり、前記の加熱工程では1日80万kca
ρの熱量の節減となる。また、発生熱の残りとしての9
0、000kca(!/ Hは化学研摩および封孔なと
の予熱として再利用するので、190.000kca1
2 X8 H= 1.520.000kca(!/日の
節減となる。
2728.7kg/Hr (1,766, 879
kca12/Hr) 801.4 kg during operation
/Hr (41,7,972kca12/Hr) The total amount of heat required for sulfuric acid degreasing, caustic etching, and dyeing is approximately 100,000 kcaσ/Hr. If the operation is 8 hours a day, 100,000 kca (!/ HrX 8 Hr = 800,000 kc
aQ/day, and the heating process described above produces 800,000 kca per day.
This results in a reduction in the amount of heat ρ. In addition, 9 as the remainder of the generated heat
0,000kca (!/ H is reused as preheating for chemical polishing and sealing, so 190,000kca1
2 X8 H= 1.520.000kca (!/day savings.

実施例 2 本件の作業条件は次の通りであった。Example 2 The working conditions for this case were as follows.

電解液組成   H,5o416V/V%アルミニウム
  4g/Q 浴温      25°C±1℃ 時間      40分 浴電圧     15V 液量      3.500Q 被処理体材質  1100 全表面積    802dm’
Electrolyte composition H,5o416V/V% Aluminum 4g/Q Bath temperature 25°C±1°C Time 40 minutes Bath voltage 15V Liquid volume 3.500Q Object material to be treated 1100 Total surface area 802dm'

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の好ましい態様のアルマイト製造方法
における加熱冷却用配管系を示す略式管系図である。 第2図は、本発明に使用される微孔質散気筒の縦断面図
である。 11・・ヒートポンプ:13・・・冷水クツションタン
ク:15・温水クツションタンク:17・・酸性脱脂槽
用熱交換器:19・・・苛性エツチング槽用熱交換器;
21・染色槽用熱交換器:23・・・電解槽用熱交換器
;25・・・温水ポンプ 27および29・・・冷水ポ
ンプ:31・・地下井戸:33・・・排水部;76・・
・微孔質散気筒;81・・・表蓋:83・・・裏蓋:8
5・・・導管、87・−シャフト。
FIG. 1 is a schematic pipe system diagram showing a heating and cooling piping system in a preferred embodiment of the alumite manufacturing method of the present invention. FIG. 2 is a longitudinal sectional view of a microporous aeration cylinder used in the present invention. 11... Heat pump: 13... Cold water cushion tank: 15... Hot water cushion tank: 17... Heat exchanger for acidic degreasing tank: 19... Heat exchanger for caustic etching tank;
21. Heat exchanger for dyeing tank: 23... Heat exchanger for electrolytic tank; 25... Hot water pump 27 and 29... Cold water pump: 31.. Underground well: 33... Drainage section; 76.・
・Microporous diffuser cylinder; 81...Front cover: 83...Back cover: 8
5... Conduit, 87... Shaft.

Claims (4)

【特許請求の範囲】[Claims] (1)めっきまたはアルマイト製造方法において、その
中の1以上の工程で加熱および冷却を行うときに熱交換
手段としてヒートポンプを使用し、さらにまた、前記工
程の際に液に対して、高温焼成セラミック質の微孔質散
気筒を用いるエアレーション撹拌を行うことを特徴とす
るめっきおよびアルマイト製造方法。
(1) In the plating or alumite manufacturing method, a heat pump is used as a heat exchange means when performing heating and cooling in one or more of the steps, and furthermore, a high temperature fired ceramic is used for the liquid during the above steps. A plating and alumite production method characterized by performing aeration stirring using a high-quality microporous aeration cylinder.
(2)ヒートポンプが、熱い空気を排出する型のもので
ある請求項1に記載のめっきおよびアルマイト製造方法
(2) The method for producing plating and alumite according to claim 1, wherein the heat pump is of a type that discharges hot air.
(3)ヒートポンプが、湯を排出する型のものである請
求項1又は2に記載のめっきおよびアルマイト製造方法
(3) The method for producing plating and alumite according to claim 1 or 2, wherein the heat pump is of a type that discharges hot water.
(4)高温焼成セラミック質の微孔質散気筒のミクロ気
泡の噴出孔の直径が約50ないし60ミクロである請求
項1又は2又は3に記載のめっきおよびアルマイト製造
方法。
(4) The method for producing plating and alumite according to claim 1, 2 or 3, wherein the diameter of the microbubble ejection holes of the microporous atomization cylinder made of high temperature fired ceramic is about 50 to 60 microns.
JP9769490A 1990-04-16 1990-04-16 Plating and production of alumite Pending JPH04400A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9769490A JPH04400A (en) 1990-04-16 1990-04-16 Plating and production of alumite

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9769490A JPH04400A (en) 1990-04-16 1990-04-16 Plating and production of alumite

Publications (1)

Publication Number Publication Date
JPH04400A true JPH04400A (en) 1992-01-06

Family

ID=14199052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9769490A Pending JPH04400A (en) 1990-04-16 1990-04-16 Plating and production of alumite

Country Status (1)

Country Link
JP (1) JPH04400A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7867368B2 (en) 2004-06-16 2011-01-11 Honda Motor Co., Ltd. Plating apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5399046A (en) * 1977-02-12 1978-08-30 Ngk Insulators Ltd Method of making thickness of metal film precipitating at cathode uniform in electroplating
JPS5713674B2 (en) * 1972-06-19 1982-03-18
JPS5983794A (en) * 1982-11-04 1984-05-15 Nissan Motor Co Ltd Electrodeposition coating method
JPS59226200A (en) * 1983-06-04 1984-12-19 Toshio Yamaoka Heat control system in metallic surface treating stage

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5713674B2 (en) * 1972-06-19 1982-03-18
JPS5399046A (en) * 1977-02-12 1978-08-30 Ngk Insulators Ltd Method of making thickness of metal film precipitating at cathode uniform in electroplating
JPS5983794A (en) * 1982-11-04 1984-05-15 Nissan Motor Co Ltd Electrodeposition coating method
JPS59226200A (en) * 1983-06-04 1984-12-19 Toshio Yamaoka Heat control system in metallic surface treating stage

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7867368B2 (en) 2004-06-16 2011-01-11 Honda Motor Co., Ltd. Plating apparatus

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