JPH0440761B2 - - Google Patents

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Publication number
JPH0440761B2
JPH0440761B2 JP11484581A JP11484581A JPH0440761B2 JP H0440761 B2 JPH0440761 B2 JP H0440761B2 JP 11484581 A JP11484581 A JP 11484581A JP 11484581 A JP11484581 A JP 11484581A JP H0440761 B2 JPH0440761 B2 JP H0440761B2
Authority
JP
Japan
Prior art keywords
track
magnetic field
bit
light
moved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11484581A
Other languages
Japanese (ja)
Other versions
JPS5817505A (en
Inventor
Masahiko Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP11484581A priority Critical patent/JPS5817505A/en
Publication of JPS5817505A publication Critical patent/JPS5817505A/en
Publication of JPH0440761B2 publication Critical patent/JPH0440761B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing

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  • Recording Or Reproducing By Magnetic Means (AREA)

Description

【発明の詳細な説明】 本発明は、光熱磁気トラツク移動方法に関する
ものであり、更に詳細には、光熱磁気記録された
ビツト情報が並んでいるトラツクを光照射によつ
て移動させて、特にビツト情報の消去、選択的読
み出し、情報の書き換えなどの多様な操作を可能
にする極めて有用な技術に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for moving a photothermal magnetic track, and more particularly to a method for moving a photothermal magnetic track on which bit information recorded photothermally and magnetically is arranged is moved by irradiating light. This technology relates to extremely useful technology that enables various operations such as erasing information, selective reading, and rewriting information.

従来の光熱磁気記録はすべて大きな抗磁力を利
用してビツト情報の保持・安定化を得ているの
で、一旦書き込まれたビツト情報を移動させるこ
とは抗磁力が大きいために不可能であつた。
All conventional photothermal magnetic recording utilizes a large coercive force to retain and stabilize bit information, so it has been impossible to move the bit information once written due to the large coercive force.

ところが、本発明者によつて、十分に小さな抗
磁力を有する磁性材料を用いて作成した磁性薄膜
にビツト情報が安定して保持されることが見出さ
れた結果、従来までの技術では不可能であつたビ
ツト情報のトラツクを選択的に移動する方法が完
成された。
However, as a result of the inventor's discovery that bit information can be stably retained in a magnetic thin film made using a magnetic material with sufficiently small coercive force, it has been found that bit information can be stably retained using conventional techniques. A method for selectively moving tracks of bit information has been completed.

したがつて、本発明は、光熱磁気記録されたビ
ツト情報が並んでいるトラツクを光照射によつて
選択的に移動させる方法を提供するものである。
Accordingly, the present invention provides a method for selectively moving tracks on which photothermomagnetically recorded bit information is lined up by irradiating light.

本発明に使用できる磁性材料は、その磁壁抗磁
力がビツト情報の記録のときに印加されるバイア
ス磁界よりも充分に小さく、その磁性薄膜の膜面
に垂直な方向に強い一軸磁気異方性を有しかつそ
の膜面に磁化容易軸を有する軟磁性の材料であつ
て、いわゆる軟磁性膜面垂直容易磁化膜を形成し
うるものである。またその軟磁性の温度にして
も、この軟磁性膜面垂直容易磁化膜を磁気記録媒
体として適用した場合に、そこに書き込まれるビ
ツトの径が実質的には印加するバイアス磁界のみ
で決定される程度であるのが好ましい。そのた
め、使用する磁性材料の抗磁力は約3Oe以下であ
るのが好ましく、約1Oe以下であるのがさらに好
ましい。かかる磁性薄膜は、軟磁性ガリウムカー
ネツト(GGG)などのような希土類ガリウムガ
ーネツトなどの結晶基板上にYSmCaFeGe系ガー
ネツトなどの結晶を液相エピタキシヤル法
(LPE)によつて成長させて形成するのが好まし
い。
The magnetic material that can be used in the present invention has a domain wall coercive force that is sufficiently smaller than the bias magnetic field applied when recording bit information, and has strong uniaxial magnetic anisotropy in the direction perpendicular to the film surface of the magnetic thin film. It is a soft magnetic material having an easy axis of magnetization on its film surface, and can form a so-called soft magnetic film with easy magnetization perpendicular to its film surface. Furthermore, even at the temperature of the soft magnetism, when this soft magnetic easily magnetized film perpendicular to the surface of the film is applied as a magnetic recording medium, the diameter of the bit written thereon is determined essentially only by the applied bias magnetic field. It is preferable that the amount is within a certain range. Therefore, the coercive force of the magnetic material used is preferably about 3 Oe or less, more preferably about 1 Oe or less. Such magnetic thin films are formed by growing crystals such as YSmCaFeGe based garnet on a crystal substrate of rare earth gallium garnet such as soft magnetic gallium carnet (GGG) by liquid phase epitaxial method (LPE). is preferable.

前述したようにして得られた軟磁性膜面垂直容
易磁化膜には、所定強度のバイアス磁界を印加す
ることによつて、その膜の全面に亘つて、その膜
面に対して垂直方向にかつ印加しているバイアス
磁界の磁化方向と同じ方向に磁化を有する単磁区
が形成される。この単磁区に光パルスを照射する
と、印加しているバイアス磁界とは逆方向であつ
て膜面に対しては垂直な磁化を有する円筒磁区と
してビツトが形成される。このビツトを形成する
際に印加されるバイアス磁界は、ランアウト磁界
H2とコラプス磁界H0との間である。この範囲
は、使用する磁性材料によつて多少異なるのは当
然であるが、例えば前述したYSmCaFeGe系ガー
ネツトの1種である(YSmCa)3(FeGe)5O12LPE
膜においては、57Oeと73Oeとの間である。
By applying a bias magnetic field of a predetermined intensity to the soft magnetic easily magnetized film perpendicular to the film surface obtained as described above, the magnetic field is easily magnetized over the entire surface of the film in the direction perpendicular to the film surface. A single magnetic domain having magnetization in the same direction as the magnetization direction of the applied bias magnetic field is formed. When this single magnetic domain is irradiated with a light pulse, a bit is formed as a cylindrical magnetic domain having magnetization in the direction opposite to the applied bias magnetic field and perpendicular to the film surface. The bias magnetic field applied when forming this bit is the runout magnetic field.
H 2 and the collapse field H 0 . Naturally, this range varies somewhat depending on the magnetic material used, but for example, one type of YSmCaFeGe garnet mentioned above (YSmCa) 3 (FeGe) 5 O 12 LPE
In membranes it is between 57 Oe and 73 Oe.

前述したようにして形成されたビツトが並んで
いるトラツクから所望のビツトを移動させるに
は、ランアウト磁界とコラプス磁界との範囲内の
バイアス磁界を印加しながら、実質的な連続光を
そのトラツクから所定距離ずらして照射し、その
連続光に伴つているビツトが、その光入射によつ
て形成される温度勾配によつて近寄つてきた移動
すべきビツトを反撥力によつてトラツクの外側に
はね飛ばすことによつて行なわれる。
To move a desired bit from the track of bits formed as described above, a substantially continuous beam of light is moved from the track while applying a bias field within the range of the runout and collapse fields. Irradiation is performed at a predetermined distance, and the bits accompanying the continuous light repel the bits that are to be moved, which are approaching due to the temperature gradient formed by the incident light, to the outside of the track due to the repulsive force. It is done by flying.

本発明において使用される実質的な連続光と
は、通常の連続光の他に、光が入射しても記録が
残らない程度の断続光をも包含するものと理解さ
れるべきであつて、ビームのパルス繰り返しが磁
性薄膜とビームとの相対速度に比べて十分速けれ
ば任意でよい。この実質的な連続光は1個のビツ
トを常に伴つていることを要し、その強度は、そ
の光入射によつて形成される温度勾配によつて引
き寄せられる移動すべきビツトを引き込まずに反
撥力によつて所定距離はね飛ばすことができる程
度であるのが好ましい。なお、その実質的な連続
光の強度が大きくても、移動させるトラツクから
の光入射の距離を調節することによつて、ビツト
同士の反撥力を生じるように調節可能である。
Substantially continuous light used in the present invention should be understood to include not only normal continuous light but also intermittent light to the extent that no record is left even if the light is incident. Any pulse repetition rate of the beam may be used as long as it is sufficiently faster than the relative speed between the magnetic thin film and the beam. This essentially continuous light requires one bit to be accompanied at all times, and its intensity is such that it repels rather than entrains the bit to be moved, which is attracted by the temperature gradient formed by its incidence. It is preferable that the force be such that it can be thrown a predetermined distance. Note that even if the substantial intensity of the continuous light is high, it can be adjusted to generate a repulsive force between the bits by adjusting the distance of light incidence from the moving track.

本発明において、トラツク移動の際のバイアス
磁界は、ビツト情報の記録の際のバイアス磁界の
印加方向を変えることなく印加され続けるので、
その実質的な連続光の入射に伴つてくるビツト
は、記録されているビツトの磁化方向と同じ磁化
方向を有している。したがつて、両ビツトは同一
磁化方向を有するところから、一定距離まで近寄
つたときに、その反撥力が引き寄せたビツトを吸
収する力よりも大きければ移動させるビツトをは
ね飛ばしてしまうことができる。この反撥力はビ
ツト径が大きい程大きくなり、そのビツト径はバ
イアス磁界が小さい程大きくなる。したがつて、
ビツト情報を移動させるための光入射は、ランア
ウト磁界とコラプス磁界の範囲内であつて、でき
るだけ小さいバイアス磁界を印加して行なうこと
が好ましい。例えば、(Y1.92Sm6.1Ca0.98)(Fe4.02
Ge0.98)O12ガーネツトの場合には、48Oeと56Oe
との範囲内のバイアス磁界を印加することによつ
て可能である。
In the present invention, the bias magnetic field during track movement continues to be applied without changing the direction of application of the bias magnetic field during recording of bit information.
The bits resulting from the incidence of the substantially continuous light have the same magnetization direction as the recorded bits. Therefore, since both bits have the same magnetization direction, when they get close to a certain distance, if the repulsive force is greater than the force that absorbs the attracted bit, the bit being moved can be repelled. . This repulsive force increases as the bit diameter increases, and the bit diameter increases as the bias magnetic field decreases. Therefore,
It is preferable that the light incident for moving bit information be performed by applying a bias magnetic field as small as possible within the range of the runout magnetic field and the collapse magnetic field. For example, (Y 1.92 Sm 6.1 Ca 0.98 ) (Fe 4.02
Ge 0.98 ) O 12 Garnet case 48Oe and 56Oe
This is possible by applying a bias magnetic field within the range of .

他方、トラツク移動をさせるために照射される
実質的な連続光によつて生ずる温度勾配によりビ
ツトが引き寄せられる力は次式で表わすことがで
きる。
On the other hand, the force by which the bit is attracted by the temperature gradient caused by the substantially continuous light irradiated to cause track movement can be expressed by the following equation.

8/π Hc/4πMs+2|Vd|/μw4πMs=CM△Ms/Ms−
C〓△σw/σw μw:易動度 CM、C〓:物理定数で決まる正の整数 Vd:ビツトの移動速度 Ms:磁化 σw:磁壁エネルギー △Ms:ビツト径両端における磁化Msの勾配 △σw:ビツト径両端における磁壁エネルギーの
勾配 ここにおいて、一般に、σwの温度係数は負で
あつて、その絶対値はMsの温度係数より大きい
ので、ビツトの移動方向は、上式における右辺の
第2項によつて支配され、σwの小さい方、すな
わち温度の高い方向である。また、上式から分か
るように、ビツトを光ビームに追随させるには抗
磁力(Hc)が十分に小さいことが必要である。
8/π Hc/4πMs+2|Vd|/μ w 4πMs=C M △Ms/Ms−
C〓△σ ww μ w : Mobility C M , C〓: Positive integer determined by physical constants Vd: Bit moving speed Ms: Magnetization σ w : Domain wall energy △ Ms: Magnetization Ms at both ends of the bit diameter Gradient △σ w : Gradient of domain wall energy at both ends of the bit diameter Here, the temperature coefficient of σ w is generally negative and its absolute value is larger than the temperature coefficient of Ms, so the direction of movement of the bit can be calculated using the above equation. is dominated by the second term on the right-hand side of , and is the direction where σ w is smaller, that is, the direction where the temperature is higher. Furthermore, as can be seen from the above equation, the coercive force (Hc) must be sufficiently small to make the bit follow the light beam.

したがつて、前述した如く、ビツト同士の反撥
力が、光入射に伴なう熱磁気効果による温度勾配
によつてビツトを引き寄せる力よりも大きくなる
ように調節することによつて所望の態様でビツト
情報のトラツク移動を可能にしている。
Therefore, as mentioned above, by adjusting the repulsive force between the bits to be greater than the force that attracts the bits due to the temperature gradient caused by the thermomagnetic effect accompanying light incidence, the desired mode can be achieved. It enables the movement of tracks of bit information.

本発明に係る方法によつて、所望のビツト情報
を選択的にそのトラツクから移動させることがで
き、必要な所定のビツト情報だけを読み出した
り、また他のビツト情報と組合せて利用すること
などが可能である。また、実質的な連続光の入射
位置によつて、所望のビツト情報をそのトラツク
の右側でも左側でも選択的に移動させることがで
き、この移動操作は、操作途中においても可能で
あり実用上極めて便利である。例えば、まず連続
光をトラツクの左側の所定位置に入射し続けてビ
ツト情報をトラツクの右方に移動させ、次いでそ
の連続光をそのトラツクの右側の所定位置に移動
させ入射を続けると今度はビツト情報をそのトラ
ツクの左方に移動させることができる。また、移
動させる必要のないビツト情報が同一トラツク中
にあれば、連続光を一旦遠くに離してその温度勾
配の影響が及ばない位置に移動させることによつ
てビツト情報を選択的に移動させることもでき
る。更に、本発明の方法によれば、同様にして、
移動させたビツト情報の外側にかかる連続光を入
射することによつてそのビツト情報をトラツクの
元の位置に戻すこともできる。
By the method according to the present invention, desired bit information can be selectively moved from the track, and it is possible to read out only the necessary predetermined bit information, or to use it in combination with other bit information. It is possible. Furthermore, depending on the incident position of the continuous light, desired bit information can be selectively moved to either the right or left side of the track, and this movement operation is possible even during the operation, making it extremely practical in practice. It's convenient. For example, if you first make continuous light enter a predetermined position on the left side of the track and move the bit information to the right of the track, then move the continuous light to a predetermined position on the right side of that track and continue to make the bit information enter the track. Information can be moved to the left of the track. Additionally, if there is bit information in the same track that does not need to be moved, the bit information can be selectively moved by moving the continuous light farther away and moving it to a position where it is not affected by the temperature gradient. You can also do it. Furthermore, according to the method of the present invention, similarly,
It is also possible to return the bit information to its original position on the track by injecting continuous light on the outside of the moved bit information.

なお、入射する実質的な連続光の入射位置や入
射光量などを一定にすれば、ビツトの移動量を一
定にすることができる。この場合、トラツキング
サーボと称せられる方法を用いれば任意のビツト
を任意の方向に正確に移動させることができる。
このように一定の移動量をもつて移動させられた
ビツト情報のトラツクは新たなトラツクを形成
し、これだけで必要な情報の読み出しも可能であ
る。したがつて、このように移動させた新しいト
ラツクも、元のトラツクも読み出しに使用するこ
とができ、いずれのトラツクに沿つて、488nm
の波長であればビツトに影響を与えない程度の弱
い光または吸収の弱い長波長の光を入射させて読
み出しをすることができる。この場合、移動させ
て形成させた新らしいトラツクでは、移動させな
かつたビツト情報が消去されたことになるし、ま
た元のトラツクでは、移動させたビツト情報が消
去されたことになる。また前述したような操作を
選択的に組合せて実施することにより、情報を選
別して情報の書き換えが可能である。更に、移動
させたビツト情報の跡に新たなビツト情報を記録
させることもできるので、1つのトラツクに多様
な情報を記録させることもでき極めて有用であ
る。
Note that if the incident position and the amount of incident light of the incident continuous light are made constant, the amount of movement of the bit can be made constant. In this case, if a method called tracking servo is used, any bit can be accurately moved in any direction.
The track of bit information that has been moved by a certain amount of movement in this way forms a new track, and it is possible to read out the necessary information using only this track. Therefore, both the new track moved in this way and the original track can be used for readout, and along either track, the 488 nm
If the wavelength is , reading can be performed by inputting weak light that does not affect the bits or long wavelength light with weak absorption. In this case, the bit information that was not moved will be erased in the new track created by moving, and the bit information that was moved will be erased in the original track. Further, by selectively combining and performing the operations described above, it is possible to select information and rewrite the information. Furthermore, since new bit information can be recorded in the trace of the moved bit information, it is extremely useful to be able to record a variety of information on one track.

以上述べたように、本発明に係る光熱磁気トラ
ツク移動方法によつて、ビツト情報の消去、選択
的読み出し、情報の書き換えなどの多種多様の操
作が可能である。
As described above, the photothermal magnetic track moving method according to the present invention enables a wide variety of operations such as erasing bit information, selective reading, and rewriting information.

以下、本発明を実施例によつて説明する。 Hereinafter, the present invention will be explained with reference to Examples.

実施例 1 試料として、厚み0.5mmのGd3Ga5O12基板上に
液相エピタキシヤル法(LPE)によつて成長さ
せた(Y1.92Sm0.1Ca0.98)(Fe4.02Ge0.98)O12ガー
ネツトの厚み4.6μmの薄膜を用いた。この薄膜の
飽和磁化4πMs=142G、磁壁抗磁力Hc=0.5Oe、
コラプス磁界H0=62.7Oeであつた。
Example 1 As a sample, (Y 1.92 Sm 0.1 Ca 0.98 ) (Fe 4.02 Ge 0.98 ) O 12 garnet was grown by liquid phase epitaxial method (LPE) on a 0.5 mm thick Gd 3 Ga 5 O 12 substrate. A thin film with a thickness of 4.6 μm was used. Saturation magnetization of this thin film 4πMs = 142G, domain wall coercive force Hc = 0.5Oe,
The collapse magnetic field H 0 was 62.7 Oe.

この薄膜を用いて、第1図に示すような熱磁気
光記録読み出し装置1を形成した。この装置は、
前述した(YSmCa)3(FeGe)5O12ガーネツトなど
の磁性薄膜1aを希土類ガリウムガーネツトの結
晶基板1bに液相エピタキシヤル法で成長させて
得た薄膜に、無反射コーテイング層1cをその結
晶基板の磁性薄膜を設けた反対側にそして例えば
厚み0.3μmのアルミニウム蒸着膜からなる反射膜
1dおよびその外側に例えば厚み0.5μmの二酸化
ケイ素からなる保護膜1eを被着させた構成にな
つている。このような構成からなる熱磁気記録読
み出し装置1を、第2図に示すように、永久磁石
などのバイアス磁界発生装置2に、たとえば着脱
自在に被着させて固定させ常時バイアス磁界が印
加されるように配置する。この熱磁気光記録読み
出し装置は、モータ3などによつて移動できるよ
うに構成することができる。また、その装置の周
辺には補助バイアス用コイル4を配置して、必要
に応じて、バイアス磁界を増加させることもでき
る。
Using this thin film, a thermomagnetic optical recording/reading device 1 as shown in FIG. 1 was formed. This device is
A non-reflective coating layer 1c is formed on a thin film obtained by growing a magnetic thin film 1a such as the aforementioned (YSmCa) 3 (FeGe) 5 O 12 garnet on a rare earth gallium garnet crystal substrate 1b by a liquid phase epitaxial method. On the opposite side of the substrate from which the magnetic thin film is provided, a reflective film 1d made of, for example, a 0.3 μm thick aluminum vapor-deposited film, and on the outside thereof a protective film 1e made of silicon dioxide, for example, 0.5 μm thick. . As shown in FIG. 2, the thermomagnetic recording readout device 1 having such a configuration is fixed, for example, removably attached to a bias magnetic field generating device 2 such as a permanent magnet, and a bias magnetic field is constantly applied thereto. Place it like this. This thermomagnetic optical recording/reading device can be configured to be movable by a motor 3 or the like. Further, an auxiliary bias coil 4 may be placed around the device to increase the bias magnetic field as required.

このような構成を有する装置1に対して、光発
生装置5から発生させた例えば波長488nmのア
ルゴンレーザを光変調器6に導入してパルス光と
して取り出し、そのパルス光を偏光子7およびハ
ーフミラー8を介してレンズ9によつて入射させ
てビツトを形成させた。この場合における入射光
量Pは15mW、パルス幅は50μs、繰り返し周波数
は1Hzおよびバイアス磁界は51Oeであつた。上
述した条件下でパルス光を照射しながら、装置1
を一定速度で一方向に移動させて間隔約27μmで
一直線にビツトが並んだトラツクが形成された。
In the apparatus 1 having such a configuration, an argon laser with a wavelength of 488 nm, for example, generated from the light generator 5 is introduced into the optical modulator 6 and extracted as pulsed light, and the pulsed light is transmitted to the polarizer 7 and the half mirror. The beam was incident on lens 9 through lens 9 to form a bit. In this case, the incident light amount P was 15 mW, the pulse width was 50 μs, the repetition frequency was 1 Hz, and the bias magnetic field was 51 Oe. While irradiating pulsed light under the conditions described above, the device 1
By moving the bits in one direction at a constant speed, a track was formed in which bits were lined up in a straight line with an interval of about 27 μm.

次に、光の強度および幅を変えずに繰り返し周
波数100Hzにしかつバイアス磁界も変えずに書き
込みの際の装置移動方向とは逆方向にトラツクか
らビツト径のほぼ半分程離して光を照射した。そ
の結果、ビツトは、100Hzのパルス光を照射した
反対側にほぼビツト径程度離れた位置に移動して
新しいトラツクを形成していることが判明した。
Next, light was irradiated at a repetition rate of 100 Hz without changing the intensity and width of the light, and without changing the bias magnetic field, at a distance of about half the bit diameter from the track in the opposite direction to the direction of movement of the device during writing. As a result, it was found that the bit moved to a position approximately the diameter of the bit on the opposite side to which the 100 Hz pulsed light was irradiated, forming a new track.

本発明における実質的な連続光の照射位置は、
モータ3に取付けた回転検出機構11によつて決
められ、そのトラツキングの移動は、それに連動
するように設けられている駆動ギヤ12によつて
移動シヤーシ13によつてモータの位置を移動さ
せることによつて行なうことができる。
The substantial continuous light irradiation position in the present invention is
The tracking movement is determined by a rotation detection mechanism 11 attached to the motor 3, and the position of the motor is moved by a movable chassis 13 by a drive gear 12 provided in conjunction with the rotation detection mechanism 11. You can do it by leaning.

この熱磁気光記録読み出し装置1に記録された
ビツト情報の読み出しは、この装置の反射膜1d
での偏光された反射光を検出子15に導入し、そ
の光を光電子増倍管16に送り、その出力をオシ
ロスコープ17などで観察するようにしてもよ
い。なお、透過光によつて記録読み出しを行う場
合には、その読み出し装置1から反射膜1dを除
き、バイアス磁界発生装置2をその装置の下部で
はなく周辺部に置き特にフアラデー効果で直線偏
光された透過光によつて読み出しをすればよい。
Reading of bit information recorded in this thermomagneto-optical recording/reading device 1 is performed using a reflective film 1d of this device.
The polarized reflected light may be introduced into the detector 15, sent to the photomultiplier tube 16, and its output may be observed with an oscilloscope 17 or the like. In addition, when recording and reading is performed using transmitted light, the reflective film 1d is removed from the reading device 1, and the bias magnetic field generating device 2 is placed not at the bottom of the device but at the periphery, so that the light is linearly polarized due to the Faraday effect. Reading may be performed using transmitted light.

実施例 2 実施例1と同じ試料および条件によつて記録し
たビツトのトラツクを実施例1と同様にしてその
トラツクを移動させた。この場合の入射量および
バイアス磁界は変えずに、試料移動速度vを29μ
m/秒にかつ絞り込み対物レンズ×20を使用して
トラツク移動状態を調べた。その結果を第3図に
示す。図中において、曲線Aの右方領域では、近
付いてきたビツトは光に吸収されて消滅してしま
い、曲線Bの下方領域ではビツトは光ビームに追
随していかず取り残されてしまい移動できない。
したがつて、ビツト情報のトラツクを移動できる
領域は、曲線Aの左側領域と、曲線Bの上側領域
である。
Example 2 A bit track recorded using the same sample and under the same conditions as in Example 1 was moved in the same manner as in Example 1. In this case, the sample moving speed v was set to 29μ without changing the incident amount and bias magnetic field.
The track movement state was investigated at m/sec using a 20x aperture objective lens. The results are shown in FIG. In the figure, in the area to the right of curve A, the approaching bit is absorbed by the light and disappears, and in the area below curve B, the bit does not follow the light beam and is left behind and cannot move.
Therefore, the areas in which the bit information track can be moved are the area to the left of curve A and the area above curve B.

実施例 3 実施例1と同じ試料および条件によつて記録し
たビツトのトラツクを実施例1と同様にしてその
トラツクの移動をさせた。なお、トラツク移動に
使用した光の入射光量を11.3mM、パルス幅を
50μs、バイアス磁界を56Oeにして、第3図の曲
線Bに対応してビツトが光ビームについていく臨
界光パルス周波数ν(Hz)を試料移動速度v(μ
m/秒)の関数として求めた。その結果を第4図
に示す。第4図から、臨界光パルス周波数νと試
料移動速度vとは比例することが判明した。この
結果から、v/ν、すなわち光パルス間のビツト
の移動量がある値(第4図においては9.5μm)を
越すとビツトが光ビームについていけないことが
示された。なお、第4図において、直線の上側領
域がトラツク移動可能領域である。
Example 3 A bit track recorded using the same sample and under the same conditions as in Example 1 was moved in the same manner as in Example 1. In addition, the incident light intensity of the light used for track movement was 11.3 mm, and the pulse width was
50μs, and the bias magnetic field is 56Oe, the critical light pulse frequency ν (Hz) at which the bit follows the light beam is determined by the specimen moving speed v (μ
m/sec). The results are shown in FIG. From FIG. 4, it has been found that the critical light pulse frequency ν and the sample moving speed v are proportional. This result shows that when v/ν, that is, the amount of bit movement between light pulses, exceeds a certain value (9.5 μm in FIG. 4), the bits cannot keep up with the light beam. In FIG. 4, the area above the straight line is the area where the track can be moved.

実施例 4 実施例3で使用したのと同様の試料および条件
を用いてトラツク移動を行つた。なお、トラツク
移動に使用した光はパルス幅が50μsであつて、バ
イアス磁界を56Oeにして試料を29μm/秒で移動
させて臨界光パルス周波数νを変えて入射光量P
の関数として光パルス間試料移動量v/ν(μm)
を求めた。その結果を第5図に示す。第5図おい
て、曲線の上側領域がトラツク移動可能領域であ
る。
Example 4 Tracking was performed using the same samples and conditions as used in Example 3. The light used for track movement has a pulse width of 50 μs, the sample is moved at 29 μm/s with a bias magnetic field of 56 Oe, and the critical light pulse frequency ν is changed to adjust the incident light intensity P.
Sample movement between light pulses v/ν (μm) as a function of
I asked for The results are shown in FIG. In FIG. 5, the area above the curve is the area where the track can be moved.

なお、第3図ないし第5図においてトラツク移
動可能領域では、実施例1においても示されたよ
うに、トラツク移動が行われるために次のような
必要な条件が同時に満たされている。すなわち、
トラツク移動のために入射される光ビームに伴つ
ているビツトと、近付いてくる他のビツトとの間
に生ずる反撓力が、光ビームの入射によつて形成
される温度勾配によつて他のビツトを引きつける
力よりも強く、かつ、光ビームは他のビツトが存
在しないところでも常に1個のビツトを伴つてい
て、トラツク移動に使用される繰り返し光ビーム
の位置とそのビツト間隔が光の切れている間に離
れていても次のパルスで再び他のビツトを引き寄
せることができるものである。
As shown in the first embodiment, in the area where the track can be moved in FIGS. 3 to 5, the following necessary conditions are simultaneously satisfied in order for the track to move. That is,
The repulsive force generated between the bit accompanying the incident light beam for track movement and other approaching bits is caused by the temperature gradient formed by the incident light beam. It is stronger than the force that attracts the bits, and the light beam always accompanies one bit even where no other bits are present, and the position of the repeated light beam used for track movement and its bit interval are Even if the bit is separated during the break, the next pulse can attract other bits again.

また、第3図ないし第5図において、各曲線お
よび直線で示される境界線ぎりぎりの領域でも原
理的にはトラツク移動ができるけれども、トラツ
ク移動のために入射させる光ビームに他のビツト
が近づいてきて光ビーム内のビツトに反撥されて
はじかれるときに、反作用によつて光ビームに伴
つているビツトも光ビームからはじかれて飛び出
してしまうから、トラツク移動させる際には境界
線ぎりぎりの領域の光ビームは使用しない方が実
用的には好ましく、入射光量などの条件に余裕を
もたせるなどの借置を講ずるのが望ましい。更に
かかる境界線ぎりぎりの領域の条件下では、試料
の物性などが不均一であつたときには誤動作を行
なうことも考えられるので、かかる条件は避ける
のが好ましい。
In addition, in Figures 3 to 5, although track movement is theoretically possible even in the areas on the edge of the boundaries indicated by the curves and straight lines, other bits may come close to the incident light beam for track movement. When the light beam is repelled by the bits in the light beam, the bits accompanying the light beam are also repelled and thrown out by the reaction, so when moving the track, it is necessary to It is practically preferable not to use a light beam, and it is desirable to take measures such as allowing some leeway in conditions such as the amount of incident light. Furthermore, under such conditions on the edge of the boundary line, malfunctions may occur if the physical properties of the sample are non-uniform, so it is preferable to avoid such conditions.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に使用される熱磁気光記録読み
出し装置を示す断面図、第2図は本発明を実施す
るための装置の1例の概略を示すブロツク図、お
よび第3〜第5図はトラツク移動の特性を示すグ
ラフである。 なお図面に用いられている符号において、1…
…磁気光記録読み出し装置、1a……磁性薄膜、
1b……結晶基板、2……バイアス磁界発生装
置、11……回転検出機構、13……移動シヤー
シである。
FIG. 1 is a sectional view showing a thermomagneto-optical recording/reading device used in the present invention, FIG. 2 is a block diagram schematically showing an example of a device for carrying out the present invention, and FIGS. 3 to 5 is a graph showing the characteristics of track movement. In addition, in the symbols used in the drawings, 1...
...Magneto-optical recording and reading device, 1a...Magnetic thin film,
1b...Crystal substrate, 2...Bias magnetic field generator, 11...Rotation detection mechanism, 13...Moving chassis.

Claims (1)

【特許請求の範囲】[Claims] 1 磁壁抗磁力が印加するバイアス磁界よりも充
分に小さな磁性材料からなる磁性薄膜に、印加し
ているバイアス磁界の方向とは逆向きの磁化方向
を有する円筒磁区として記録されているビツト情
報を、そのバイアス磁界をその方向を変えずかつ
そのバイアス磁界の強さをランアウト磁界とコラ
プス磁界との間にして、実質的な連続光を前記ビ
ツト情報のトラツクから所定距離離して照射しそ
の光照射に伴なうビツトとの反撥力によつて前記
トラツクから移動させることを特徴とする光熱磁
気トラツク移動方法。
1 Bit information recorded as a cylindrical magnetic domain with a magnetization direction opposite to the direction of the applied bias magnetic field in a magnetic thin film made of a magnetic material whose domain wall coercive force is sufficiently smaller than the applied bias magnetic field, The direction of the bias magnetic field is not changed and the strength of the bias magnetic field is between the runout magnetic field and the collapse magnetic field, and substantially continuous light is irradiated at a predetermined distance from the track of the bit information. A method for moving a photothermal magnetic track, characterized in that the track is moved from the track by a repulsive force with an accompanying bit.
JP11484581A 1981-07-22 1981-07-22 Photothermomagnetic track moving method Granted JPS5817505A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11484581A JPS5817505A (en) 1981-07-22 1981-07-22 Photothermomagnetic track moving method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11484581A JPS5817505A (en) 1981-07-22 1981-07-22 Photothermomagnetic track moving method

Publications (2)

Publication Number Publication Date
JPS5817505A JPS5817505A (en) 1983-02-01
JPH0440761B2 true JPH0440761B2 (en) 1992-07-06

Family

ID=14648140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11484581A Granted JPS5817505A (en) 1981-07-22 1981-07-22 Photothermomagnetic track moving method

Country Status (1)

Country Link
JP (1) JPS5817505A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0139021B1 (en) * 1983-03-31 1990-11-28 Sony Corporation Thermomagnetic optical recording method
JPH06105507B2 (en) * 1984-10-26 1994-12-21 日本電気株式会社 Magneto-optical recording / reproducing device
JP2647877B2 (en) * 1987-12-26 1997-08-27 シャープ株式会社 Magneto-optical card recording / reproducing device

Also Published As

Publication number Publication date
JPS5817505A (en) 1983-02-01

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