JPH0444202B2 - - Google Patents
Info
- Publication number
- JPH0444202B2 JPH0444202B2 JP31349486A JP31349486A JPH0444202B2 JP H0444202 B2 JPH0444202 B2 JP H0444202B2 JP 31349486 A JP31349486 A JP 31349486A JP 31349486 A JP31349486 A JP 31349486A JP H0444202 B2 JPH0444202 B2 JP H0444202B2
- Authority
- JP
- Japan
- Prior art keywords
- measured
- image sensor
- film thickness
- light
- reset
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、光の干渉を利用して膜厚を測定す
る装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an apparatus for measuring film thickness using optical interference.
[従来の技術]
光の干渉を利用して被測定対象の膜厚を測定す
るには、被測定対象に光源よりも光を投入し、そ
の透過光または反射光を分光して干渉縞を検出器
で検出し、被測定対象の膜厚を測定している。[Prior art] To measure the film thickness of an object to be measured using light interference, light is applied to the object to be measured from a light source, and the transmitted or reflected light is separated to detect interference fringes. The film thickness of the object to be measured is measured.
[この発明が解決しようとする問題点]
しかしながら、被測定対象の測定スポツト内で
屈折率、膜厚等にわずかのバラツキ等があると、
膜厚等の相違に応じて干渉縞のパターンが異な
り、これが同時に重なり合つて合成されると、第
4図で示すように、うなりを生じたり、コントラ
ストが弱くなり、測定が困難となることがある。[Problems to be Solved by the Invention] However, if there are slight variations in the refractive index, film thickness, etc. within the measurement spot of the object to be measured,
The pattern of interference fringes differs depending on the difference in film thickness, etc., and when these are overlapped and synthesized at the same time, as shown in Figure 4, it can cause beats and weaken the contrast, making measurement difficult. be.
また、検出器に、電荷蓄積型撮像装置CCDの
ようなイメージセンサを用いて、高分子フイルム
等の連続して流れている被測定対象を測定する場
合、電荷蓄積の一走査周期内に長い距離の部分を
測定すると、分光してイメージセンサに投影され
る干渉縞パターンは、被測定対象の膜厚の相違に
応じて異るものとなり、これが合成されて、第3
図で示すようなうなりを生じたり、平均化されて
コントラストが弱くなり、測定が困難になること
がある。 In addition, when measuring a continuously flowing object such as a polymer film using an image sensor such as a charge accumulation type imaging device CCD as a detector, it is necessary to cover a long distance within one scanning period of charge accumulation. When measuring the part, the interference fringe pattern that is spectrally separated and projected onto the image sensor differs depending on the difference in the film thickness of the object to be measured.
Beating as shown in the figure may occur, or the contrast may be weakened due to averaging, making measurement difficult.
この発明の目的は、以上の点に鑑み、連続的な
測定であつても、十分高精度な測定を可能とした
膜厚測定装置を提供することである。 In view of the above points, an object of the present invention is to provide a film thickness measuring device that enables measurement with sufficiently high accuracy even in continuous measurement.
[問題点を解決するための手段]
この発明は、光源からの光を被測定対象に投光
し、その透過光または反射光を分光して干渉縞を
イメージセンサで検出し、被測定対象の膜厚を測
定する装置において、イメージセンサのリセツト
時間を変化させるリセツト手段を設けるようにし
た膜厚測定装置である。[Means for Solving the Problems] This invention projects light from a light source onto an object to be measured, separates the transmitted light or reflected light, and detects interference fringes with an image sensor. This film thickness measuring device is provided with a reset means for changing the reset time of an image sensor.
[実施例]
第1図は、この発明の一実施例を示す構成説明
図である。[Embodiment] FIG. 1 is a configuration explanatory diagram showing an embodiment of the present invention.
図において、1は光源で、光源1からの光は、
レンズ2によりハーフミラー3を介してフイルム
のような被測定対象4に投光され、被測定対象4
を透過または反射した光は、この図ではハーフミ
ラー3、レンズ5、しぼり7、レンズ8を介して
回析格子等の分光手段9で分光され、レンズ10
を介して一次元CCDのようなリセツト機能を有
するイメージセンサ11に入射する。このイメー
ジセンサ11の各素子には分光手段9で分光され
た各波長に対応した光が入射し、干渉縞パターン
の強度が検出される。イメージセンサ11の出力
は増幅器12で増幅され、メモリ等を含む演算手
段13で所定の演算がなされ、被測定対象4の膜
厚dが演算される。また、イメージセンサ11に
リセツトパルスを発生してリセツトを行うリセツ
ト手段6が設けられている。 In the figure, 1 is a light source, and the light from light source 1 is
A lens 2 projects light onto an object to be measured 4 such as a film through a half mirror 3.
In this figure, the light transmitted or reflected is separated by a spectroscopic means 9 such as a diffraction grating via a half mirror 3, a lens 5, an aperture 7, and a lens 8.
The light enters an image sensor 11 having a reset function, such as a one-dimensional CCD. Light corresponding to each wavelength separated by the spectrometer 9 is incident on each element of the image sensor 11, and the intensity of the interference fringe pattern is detected. The output of the image sensor 11 is amplified by an amplifier 12, and a predetermined calculation is performed by a calculation means 13 including a memory, etc., to calculate the film thickness d of the object to be measured 4. Further, a reset means 6 is provided for generating a reset pulse to the image sensor 11 to reset it.
第2図で示すように、光源からの平行光線L1,
L2は、膜厚(厚さ)d、屈折率nの被測定対象
4の表面および裏面で反射し、両光線L1,L2は、
光学的光路差2nd/cosθ′をもち、この光路差が光
の波長の整数倍のとき干渉して第4図のような干
渉縞を形成する。 As shown in Fig. 2, parallel rays L 1 from the light source,
L 2 is reflected on the front and back surfaces of the object to be measured 4 having a film thickness (thickness) d and a refractive index n, and both rays L 1 and L 2 are
They have an optical path difference 2nd/cos θ', and when this optical path difference is an integral multiple of the wavelength of light, they interfere to form interference fringes as shown in FIG.
第4図で示すような干渉縞パターンが得られた
とし、測定領域の極値を与える最小波長λ1、最大
波長λ2について、干渉の各次数をm+N、mと
し、次式が成り立つ。 Assuming that an interference fringe pattern as shown in FIG. 4 is obtained, and for the minimum wavelength λ 1 and maximum wavelength λ 2 that give the extreme values of the measurement region, the following equation holds, assuming that the orders of interference are m+N and m.
(m+N)λ1=2nd/cosθ′ (1)
mλ2=2nd/cosθ′ (2)
(2)式よりmを求め(1)式に代入して整理すると
d=Ncosθ′/2n λ1λ2/λ2−λ1 (3)
となる。被測定対象4に垂直に投光するθ′=0の
ときはcosθ′=1で(3)式は
d=N/2n λ1λ2/λ2−λ1 (4)
となる。このように、波長λ1、λ2、極値の次数差
N、既知の屈折率nから、被測定対象4の膜厚が
(3)、(4)式より求まる。 (m+N)λ 1 = 2nd/cosθ' (1) mλ 2 = 2nd/cosθ' (2) Obtaining m from equation (2) and substituting it into equation (1), we get d=Ncosθ'/2n λ 1 λ 2 /λ 2 −λ 1 (3). When θ'=0 and the light is projected perpendicularly to the object to be measured 4, cos θ'=1 and equation (3) becomes d=N/2n λ 1 λ 2 /λ 2 −λ 1 (4). In this way, the film thickness of the object to be measured 4 can be determined from the wavelengths λ 1 and λ 2 , the order difference N between the extreme values, and the known refractive index n.
It can be found from equations (3) and (4).
つまり、あらかじめ、分光手段9によりイメー
ジセンサ11の各素子に入射する波長は決まつて
いるので、イメージセンサ11の各素子番号と波
長との関係を演算手段13のメモリに記憶してお
く。 That is, since the wavelength incident on each element of the image sensor 11 is determined in advance by the spectroscopic means 9, the relationship between each element number of the image sensor 11 and the wavelength is stored in the memory of the calculation means 13.
そして、測定時、イメージセンサ11の各素子
の出力を順次読み出し、第4図で示すように、測
定範囲内で極値を与えうる素子番号からメモリを
利用して波長λ1,λ2を求め、極値の数の差から次
数差Nを求め、メモリ等に格納された屈折率nを
用い、(3)、(4)式のような演算を行つて被測定対象
4の膜厚dを求める。 Then, during measurement, the output of each element of the image sensor 11 is sequentially read out, and as shown in FIG. 4, the wavelengths λ 1 and λ 2 are determined using memory from the element number that can give an extreme value within the measurement range. , calculate the order difference N from the difference in the number of extreme values, use the refractive index n stored in a memory, etc., and calculate the film thickness d of the object to be measured 4 by performing calculations such as equations (3) and (4). demand.
ところで、第4図A,Bで示すように、被測定
対象4の膜厚のバラツキにより干渉縞パターンが
ずれて重なり、弱い部分が生じることがある。こ
れを避けるため、極大値と極小値との差が所定の
値以上のときの極値についての出力から上記のよ
うに膜厚を測定するようにする。このことによ
り、不確実で、弱い干渉縞を拾うことなく、強い
確実な干渉縞から被測定対象4の膜厚dを測定で
きる。 By the way, as shown in FIGS. 4A and 4B, interference fringe patterns may shift and overlap due to variations in the film thickness of the object to be measured 4, resulting in weak portions. In order to avoid this, the film thickness is measured as described above from the output for the extreme value when the difference between the local maximum value and the local minimum value is greater than or equal to a predetermined value. Thereby, the film thickness d of the object to be measured 4 can be measured from strong and reliable interference fringes without picking up uncertain and weak interference fringes.
また、イメージセンサ11に電荷蓄積型撮像素
子CCDを用いると、被測定対象4が移動してい
て、その厚さ等がずれると、やや異つた干渉縞パ
ターンがイメージセンサ11の各素子に一走査周
期内に入射して合成され、全体としてコントラス
トが悪くなる。 Furthermore, when a charge accumulation type image sensor CCD is used as the image sensor 11, if the object to be measured 4 moves and its thickness etc. deviate, a slightly different interference fringe pattern will appear on each element of the image sensor 11 in one scan. They are incident within the period and are combined, resulting in poor contrast as a whole.
このため、リセツト手段6によりリセツトをか
けるようにしてイメージセンサ11の蓄積時間を
制限し、つまり一走査内の測定時間を制限し、イ
メージセンサ11への入射光の変動の影響を少く
し、干渉縞のコントラストが悪くなるのを防止
し、測定を確実なものとする。第3図で示すよう
に、イメージセンサ11の各画素出力は、所定時
間Tごとに転送され、その間各画素に電荷が蓄積
されるのであるが、リセツト手段6により時間t1
だけリセツトすると、その間各画素には電荷は蓄
積されず、リセツト解除後の蓄積時間t2分だけの
電荷が各画素に蓄積されることになる。このリセ
ツト時間t1は最適な値と任意になるよう変化させ
て設定できる。 Therefore, by applying a reset using the reset means 6, the accumulation time of the image sensor 11 is limited, that is, the measurement time within one scan is limited, the influence of fluctuations in the incident light on the image sensor 11 is reduced, and the interference is reduced. To prevent deterioration of stripe contrast and ensure reliable measurement. As shown in FIG. 3, each pixel output of the image sensor 11 is transferred every predetermined time T, during which charge is accumulated in each pixel.
If the reset is performed by 1, no charge will be accumulated in each pixel during that time, and the charge will be accumulated in each pixel for the accumulation time t2 after the reset is released. This reset time t1 can be changed and set to an optimal value.
[発明の効果]
以上述べたように、この発明は、リセツト手段
によりイメージセンサの電荷蓄積時間を制限し、
所定時間毎に測定しているので、十分な干渉縞の
コントラストが得られ、安定した高精度の膜厚測
定が可能となる。[Effects of the Invention] As described above, the present invention limits the charge accumulation time of the image sensor by the reset means,
Since the measurement is performed at predetermined time intervals, sufficient contrast of interference fringes can be obtained, and stable and highly accurate film thickness measurement is possible.
第1図、第2図は、この発明の一実施例を示す
構成説明図、第3図は、信号の説明図、第4図
は、干渉縞の説明図である。
1…光源、2,5,8,10…レンズ、3…ハ
ーフミラー、4…被測定対象、6…リセツト手
段、7…しぼり、9…分光手段、11…イメージ
センサ、12…増幅器、13…演算手段。
1 and 2 are configuration explanatory diagrams showing one embodiment of the present invention, FIG. 3 is an explanatory diagram of signals, and FIG. 4 is an explanatory diagram of interference fringes. DESCRIPTION OF SYMBOLS 1... Light source, 2, 5, 8, 10... Lens, 3... Half mirror, 4... Measured object, 6... Reset means, 7... Aperture, 9... Spectroscopic means, 11... Image sensor, 12... Amplifier, 13... calculation means.
Claims (1)
過光または反射光を分光して干渉縞をイメージセ
ンサで検出し、被測定対象の膜厚を測定する装置
において、前記イメージセンサのリセツト時間を
変化させるリセツト手段を設けたことを特徴とす
る膜厚測定装置。1. In an apparatus that projects light from a light source onto an object to be measured, separates the transmitted light or reflected light, and detects interference fringes with an image sensor, and measures the film thickness of the object to be measured, the image sensor is reset. A film thickness measuring device characterized by being provided with a reset means for changing time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31349486A JPS63163104A (en) | 1986-12-25 | 1986-12-25 | Apparatus for measuring thickness of film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31349486A JPS63163104A (en) | 1986-12-25 | 1986-12-25 | Apparatus for measuring thickness of film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63163104A JPS63163104A (en) | 1988-07-06 |
| JPH0444202B2 true JPH0444202B2 (en) | 1992-07-21 |
Family
ID=18041985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31349486A Granted JPS63163104A (en) | 1986-12-25 | 1986-12-25 | Apparatus for measuring thickness of film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63163104A (en) |
-
1986
- 1986-12-25 JP JP31349486A patent/JPS63163104A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63163104A (en) | 1988-07-06 |
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