JPH0444393A - Manufacture of multilayer ceramic circuit board - Google Patents

Manufacture of multilayer ceramic circuit board

Info

Publication number
JPH0444393A
JPH0444393A JP15356390A JP15356390A JPH0444393A JP H0444393 A JPH0444393 A JP H0444393A JP 15356390 A JP15356390 A JP 15356390A JP 15356390 A JP15356390 A JP 15356390A JP H0444393 A JPH0444393 A JP H0444393A
Authority
JP
Japan
Prior art keywords
ceramic
conductive
circuit
parts
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15356390A
Other languages
Japanese (ja)
Inventor
Satoru Ogawa
悟 小川
Noboru Yamaguchi
昇 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP15356390A priority Critical patent/JPH0444393A/en
Publication of JPH0444393A publication Critical patent/JPH0444393A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To contrive to generate hardly a warpage in the title board and to contrive the improvement of the thermal shock resistance of the board by a method wherein a conductive cementing material consists of a conductive paste containing a resin composition as a binder and/or a solder material and an insulative bonding agent is constituted of an organic bonding agent. CONSTITUTION:With an organic bonding agent 4 consisting of an SiO2 particle- containing thermosetting epoxy resin composition applied on the surface of a ceramic substrate 1' except parts 2'a for intersubstrate continuity use of a circuit 2' on the surface of the substrate 1' by a screen printing method, a conductive paste 5 containing a resin composition as a binder is applied on the parts 2'a as a conductive cementing material using a dispenser. A ceramic substrate 1 is superposed on the substrate 1' in such a way that parts 2a for intersubstrate continuity use face the parts 2'a via the paste 5 and the substrates 1 and 1' are pressed and heated. Whereupon, the bonding agent 4 and the paste 5 are hardened, the parts 2a and 2'a are jointed to each other and a multilayer ceramic circuit board is completed. A prescribed interval is held between the ceramic substrates 1 and 1' SiO2 particles and short circuit between a circuit 2 on the surface of the substrate 1 and the circuit 2' is reliably prevented.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、セラミック基板複数枚が積層接着されてな
るセラミック多層配線板の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing a ceramic multilayer wiring board in which a plurality of ceramic substrates are laminated and bonded.

〔従来の技術および問題点〕[Conventional technology and problems]

近年、電子機器の小型化・軽量化に伴い、電子回路の実
現のために使われている配線板に高密度化が強く要請さ
れている。セラミック配線板においても例外ではなく、
高密度化のために、多層化が検討・提案されている。
In recent years, as electronic devices have become smaller and lighter, there has been a strong demand for higher density wiring boards used to implement electronic circuits. Ceramic wiring boards are no exception.
Multi-layering is being considered and proposed for higher density.

例えば、導体ペーストを回路パターンで印刷したセラミ
ック基板前段階のセラミックグリーンシートを積み重ね
て焼成するという方法があるが、焼成の際にワレ易いと
か、反り易いとかという問題がある。
For example, there is a method of stacking and firing ceramic green sheets that are printed with conductor paste in a circuit pattern before a ceramic substrate, but this method has problems such as being prone to cracking or warping during firing.

そこで、上記ワレや反りの問題を解消するため、グリー
ンシートではない基板化・回路化処理をしたセラミック
基板複数を得ておいて、これらを、回路における基板間
導通用部分が高温(800℃程度)処理型導電性接合材
を介して対面するとともに他の部分がガラス組成物の絶
縁性接着剤を介するようにして重ね合わせておいて、加
圧加熱する方法がある(尾野他;電子材料 1988年
5月P、64〜68頁)、シかしながら、この方法でも
、反りの問題が十分に改善されたとは言い難く、また、
セラミック基板間接着部分の耐熱衝撃性が十分でないと
いう問題がある。
Therefore, in order to solve the problem of cracking and warping mentioned above, we obtained a plurality of ceramic substrates that were processed into substrates and circuits instead of using green sheets, and used them to heat the conductive parts between the substrates in the circuit at a high temperature (approximately 800 degrees Celsius). ) There is a method in which the two parts are placed facing each other through a treated conductive bonding material and the other parts are overlapped through an insulating adhesive made of a glass composition, and then heated under pressure (Ono et al.; Electronic Materials 1988). However, even with this method, it is difficult to say that the problem of warping has been sufficiently improved;
There is a problem that the thermal shock resistance of the bonded portion between the ceramic substrates is insufficient.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

この発明は、上記事情に鑑み、反りが生じ難く、セラミ
ック基板間接着部分の耐熱衝撃性が優れたセラミック多
層配線板を得ることのできる方法を提供することを課題
とする。
In view of the above circumstances, it is an object of the present invention to provide a method for obtaining a ceramic multilayer wiring board that is less likely to warp and has excellent thermal shock resistance at bonded portions between ceramic substrates.

〔課題を解決するための手段〕[Means to solve the problem]

前記課題を解決するため、この発明にかかるセラミック
多層配線板の製造方法では、回路における基板間導通用
部分が導電性接合材を介して対面するとともに他の部分
が絶縁性接着剤を介するようにして重ね合わせておいて
、加熱処理するにあたり、前記導電性接合材が樹脂組成
物をバインダーとする導電ペーストおよび/または半田
材からなり、前記絶縁性接着材が有機系接着剤からなる
構成をとるようにしている。
In order to solve the above-mentioned problem, in the method for manufacturing a ceramic multilayer wiring board according to the present invention, the parts for inter-board conduction in the circuit face each other via a conductive bonding material, and the other parts are arranged via an insulating adhesive. The conductive bonding material is made of a conductive paste and/or solder material using a resin composition as a binder, and the insulating adhesive material is made of an organic adhesive. That's what I do.

この発明で使う回路形成済のセラミック基板としては、
セラミック基板に無電解メツキ等のメツキ法、あるいは
、スパッタリング等の蒸着法により金属層(例えば、銅
層)を形成しフォトリソグラフィ技術を利用してパター
ン化して回路を設けたものが挙げられる。この他、導電
ペーストを所定パターンで印刷し焼成したものも挙げら
れるが、前者の金属層形成・パターン化の方が微細な回
路形成が可能であり、回路自体の電気抵抗が低いという
利点もある。セラミック基板は、さらに、抵抗素子や半
導体素子が搭載されHIC(ハイフリットIC)化され
たものであってもよい。また、セラミック基板の厚みは
、通常、0.3〜1n程度である。
The circuit-formed ceramic substrate used in this invention is as follows:
Examples include those in which a metal layer (for example, a copper layer) is formed on a ceramic substrate by a plating method such as electroless plating or a vapor deposition method such as sputtering, and then patterned using photolithography technology to provide a circuit. Another option is to print a conductive paste in a predetermined pattern and fire it, but the former method of forming a metal layer and patterning allows for the formation of finer circuits, and has the advantage that the electrical resistance of the circuit itself is lower. . The ceramic substrate may be further mounted with a resistive element or a semiconductor element to form a HIC (high frit IC). Further, the thickness of the ceramic substrate is usually about 0.3 to 1 nm.

この発明では導電性接合材として、樹脂組成物(例えば
、エポキシ樹脂組成物の如き熱硬化性樹脂組成物)をバ
インダーとする導電ペースト、半田材が単独または併用
される。導電ペーストの場合、スクリーン印刷法等でセ
ラミック基板表面の所定位置に塗布するようにする。半
田材の場合、半田ペースト(半田粉末とビビクルを混練
したクリーム状物)を用いてスクリーン印刷法等でセラ
ミック基板表面の所定位置に塗布するか、半田浴への/
f漬によりセラミック基板表面の所定位置に付着させる
等の方法がある。
In the present invention, as the conductive bonding material, a conductive paste having a resin composition (for example, a thermosetting resin composition such as an epoxy resin composition) as a binder and a solder material are used alone or in combination. In the case of a conductive paste, it is applied to a predetermined position on the surface of the ceramic substrate using a screen printing method or the like. In the case of solder materials, solder paste (a cream-like mixture of solder powder and vehicle) is applied to a predetermined position on the surface of a ceramic board using a screen printing method, or it is applied to a predetermined position on the surface of a ceramic substrate using a solder bath.
There are methods such as attaching it to a predetermined position on the surface of a ceramic substrate by f-dipping.

この発明で使う絶縁性接着剤たる有機系接着剤としては
、例えばエポキシ樹脂組成物の如き熱硬化性樹脂組成物
、半田レジスト等が挙げられる。
Examples of the organic adhesive used as the insulating adhesive in this invention include thermosetting resin compositions such as epoxy resin compositions, solder resists, and the like.

なお、絶縁性接着剤中には基板間隔を調整するためにフ
ィラーが混入されていることが好ましい。
Note that it is preferable that a filler is mixed into the insulating adhesive in order to adjust the distance between the substrates.

具体的には、粒径20〜100μ程度のセラミック粒子
(例えば、5iOz粒子、A1.O,粒子)が絶縁性接
着剤100νo1%のうち5〜50νo1%程度占めて
いるようにする。
Specifically, ceramic particles (for example, 5iOz particles, A1.O, particles) having a particle size of about 20 to 100 microns are made to account for about 5 to 50vo1% of 100vo1% of the insulating adhesive.

加熱処理は、普通、導電ペーストの場合は200℃以下
の温度、半田材の場合は250℃以下の温度で行い、0
.1〜1kg/aJ程度の圧力をかける続いて、図面を
参照しながら、製造の一例の流れを説明する。
Heat treatment is usually carried out at a temperature of 200°C or less for conductive pastes and 250°C or less for solder materials, and
.. Applying a pressure of about 1 to 1 kg/aJ Next, an example of the flow of manufacturing will be explained with reference to the drawings.

まず、スルーホールを含む回路付のセラミック基板を、
以下のようにして準備する。
First, a ceramic board with a circuit including through holes,
Prepare as follows.

スルホール用孔(径0.3〜0.5m)の明いた96%
アルミナ基板(厚み0−5 wm、 W 10 cm、
横10(J)2枚を、270〜330℃程度の85%リ
ン酸浴中に3〜10分間浸漬し表面を粗化処理する。つ
ぎに、通常の厚付は無電解銅メツキ法により、スルーホ
ール用孔内を含む基板表面を厚み10μmのf1屓で覆
い、第1図(alにみるように、通常のフォトリソグラ
フィ技術を利用して!PlFiをパターン化しスルーホ
ールを含む回路2.2′を形成する。この場合、回路で
の最小線幅、最小線間距離を50n程度とすることが十
分に可能である。
96% of through holes (diameter 0.3 to 0.5 m) are clear.
Alumina substrate (thickness 0-5 wm, W 10 cm,
Two pieces of horizontal 10 (J) are immersed in an 85% phosphoric acid bath at about 270 to 330°C for 3 to 10 minutes to roughen the surface. Next, the normal thickness is applied by electroless copper plating to cover the substrate surface including the inside of the through hole with a 10 μm thick layer of f1, using normal photolithography technology as shown in Figure 1 (al). Then, !PlFi is patterned to form a circuit 2.2' including through holes.In this case, it is fully possible to set the minimum line width and minimum distance between lines in the circuit to about 50n.

この後、第1図t8)にみるように、セラミック基板1
.1′に抵抗素子3.3′を設け、スルーホールを含む
回路付のセラミック基板1.1′を得る。抵抗素子3.
3 ′の形成には、il!常のN2焼成型抵抗体ペース
ト、あるいは、有機系抵抗体ペーストが使われる。
After this, as shown in FIG. 1 t8), the ceramic substrate 1
.. A resistive element 3.3' is provided at 1' to obtain a ceramic substrate 1.1' with a circuit including through holes. Resistance element 3.
For the formation of 3′, il! A conventional N2 fired resistor paste or an organic resistor paste is used.

続いて、第1図(blにみるように、セラミ’7り基板
1′表面における回路2′の基板間導通用部分(導通用
電極)2′aを除いてSiO□粒子含有熱硬化性エポキ
シ樹脂組成物からなる有機系(絶縁性)接着剤4をスク
リーン印刷法で塗布するとともに、基板間導通用部分2
′aに導電性接合材として、樹脂組成物をバインダーと
する導電ペースト5をデイスペンサーにより塗布する。
Subsequently, as shown in FIG. 1 (bl), SiO□ particle-containing thermosetting epoxy was applied to the surface of the ceramic substrate 1', except for the inter-substrate conduction portion (conduction electrode) 2'a of the circuit 2'. An organic (insulating) adhesive 4 made of a resin composition is applied by a screen printing method, and a conductive part 2 between the substrates is applied.
A conductive paste 5 having a resin composition as a binder is applied as a conductive bonding material to 'a by a dispenser.

そして、セラミック基板1.1′を基板間導通用部分2
a、2′aが導電ペースト5を介して対面するようにし
て重ね合わせておいて、例えば、N2雰囲気下、150
℃の条件で加圧加熱する。そうすると、有機系接着剤4
および導電ペースト5が硬化して基板間導通用部分2a
、2’aが結合し、第1図(C1にみるように、セラミ
ック多層配線板が完成する。セラミック基板1.1′は
5iO=粒子により所定の間隔が保たれ、回路短絡が確
実に阻止されるなお、導電性接合材として、半田材を用
いる場合には、先に有機系接着剤を加圧加熱硬化させて
から、さらに半田熔融温度以上の温度で熱処理(無圧で
よい)するようにする。
Then, the ceramic substrate 1.1' is connected to the inter-board conduction portion 2.
a and 2'a are stacked so as to face each other with the conductive paste 5 interposed therebetween, and then, for example, 150
Heat under pressure at ℃. Then, organic adhesive 4
And the conductive paste 5 is hardened and the inter-board conductive portion 2a
, 2'a are combined, and a ceramic multilayer wiring board is completed as shown in Figure 1 (C1).The ceramic substrate 1.1' is maintained at a predetermined distance by 5iO=particles, and short circuits are reliably prevented. When using a solder material as a conductive bonding material, it is recommended that the organic adhesive is first cured under pressure and heat, and then heat treated at a temperature higher than the solder melting temperature (no pressure is sufficient). Make it.

もちろん、この発明は、上記−例に限らない。Of course, the invention is not limited to the above example.

例えば、基板表面の粗化処理は省略してもよい。For example, the roughening treatment on the substrate surface may be omitted.

また、セラミック基板積層枚数が2枚であったが、重ね
合せる基板枚数に制限はなく、3枚、4枚・・・と多数
枚であってもよいことは言うまでもない。さらに、セラ
ミック基板1表面における回路2の基板間導通用部分(
導通用電極)2aを除いた部分にも有機系(絶縁性)接
着剤4を塗布したり、基板間導通用部分2aにも導電ペ
ースト5を塗布するようにして、両方の接着面に導電性
接合材や有機系接着剤があるようにしてもよい。
Furthermore, although the number of laminated ceramic substrates is two, there is no limit to the number of laminated substrates, and it goes without saying that the number of laminated ceramic substrates may be as many as three, four, and so on. Furthermore, the inter-board conduction portion of the circuit 2 on the surface of the ceramic substrate 1 (
The organic (insulating) adhesive 4 is also applied to the part other than the conductive electrode 2a, and the conductive paste 5 is also applied to the inter-board conductive part 2a, so that both adhesive surfaces are conductive. A bonding material or an organic adhesive may also be used.

〔作   用〕[For production]

この発明にかかるセラミック多層配線板の製造方法では
、導電性接合材として、熱処理温度が低くて済む樹脂組
成物をバインダーとする導電ペーストおよび/または半
田材からなるもの、および、熱処理温度が低くて済む有
機系絶縁性接着剤を用い、従来より低い温度の熱処理で
基板間の積層接着を行うため、反りが生じ難い、また、
導電性接合材と共に有機系接着剤が基板間を確りと結合
し、ガラス組成物で基板間を直に結合することはしない
ので、基板間接着部分の耐熱衝撃性が良くなる。ガラス
組成物による直結合は、それ以降の加工工程で加わる熱
衝撃でガラス部分に割れが入り易く弱いのである。
In the method for manufacturing a ceramic multilayer wiring board according to the present invention, the conductive bonding material includes a conductive paste and/or a solder material whose binder is a resin composition that requires a low heat treatment temperature, and a conductive paste and/or a solder material that requires a low heat treatment temperature. Since the laminated bonding between the substrates is performed using a low-temperature organic insulating adhesive and heat treatment at a lower temperature than conventional methods, warping is less likely to occur.
Since the organic adhesive together with the conductive bonding material firmly bonds the substrates, and the glass composition does not directly bond the substrates, the thermal shock resistance of the bonded portion between the substrates is improved. Direct bonding using a glass composition is weak because the glass portion is likely to crack due to thermal shock applied in subsequent processing steps.

〔実 施 例〕〔Example〕

以下、この発明の詳細な説明する。この発明は下記の実
施例に限らない。
The present invention will be explained in detail below. This invention is not limited to the following embodiments.

実施例1− スルホール用孔(径0.3m)の明いた96%アルミナ
基板(厚み0.5 m、縦10aa、横10c11)2
枚を、300℃の85%リン酸浴中に5分間浸漬し表面
を粗化処理する。つぎに、高速無電解銅メツキ法により
、スルーホール用孔内を含む基板表面を厚み10.nの
銅層で覆い、通常のフォトリソグラフィ技術を利用して
銅層をパターン化しスルーホールを含む回路を形成する
。この場合、回路での最小線幅、最小線間距離は50n
程度′である。この後、セラミック基板に通常のN2焼
成型抵抗体ペーストを塗布し焼成して抵抗素子を設けた
Example 1 - 96% alumina substrate (thickness 0.5 m, length 10 aa, width 10 c11) with open holes for through holes (diameter 0.3 m) 2
The sheet is immersed in an 85% phosphoric acid bath at 300° C. for 5 minutes to roughen the surface. Next, using a high-speed electroless copper plating method, the surface of the substrate including the inside of the through hole was coated to a thickness of 10. n copper layer and pattern the copper layer using conventional photolithography techniques to form a circuit including through holes. In this case, the minimum line width and minimum line distance in the circuit is 50n.
degree'. Thereafter, a normal N2 firing type resistor paste was applied to the ceramic substrate and fired to provide a resistor element.

ついで、一方のセラミック基板表面の回路における基板
間導通用部分(導通用電極)を除いて粒径30nのAl
−0a粒子を30νo1%含む熱硬化性エポキシ樹脂組
成物からなる有機系(絶縁性)接着剤をスクリーン印刷
法で塗布するとともに、基板間導通用部分にエポキシ樹
脂組成物をバインダーとする銅(導電)ペーストをデイ
スペンサーで塗布し、2枚のセラミック基板を基板間導
通用部分が銅ペーストを介して対面するようにして重ね
合わせておいて、N、雰囲気下、150℃の温度で加圧
加熱すると、有機系接着剤および銅ペーストが硬化し基
板間導通用部分が結合して、セラミック多層配線板が完
成することとなる。
Next, Al with a particle size of 30 nm was applied to the surface of one ceramic substrate, excluding the inter-board conduction portion (conduction electrode) in the circuit.
An organic (insulating) adhesive made of a thermosetting epoxy resin composition containing 30νo1% of -0a particles is applied by screen printing, and a copper (conductive ) Apply the paste with a dispenser, stack two ceramic substrates so that the conductive parts between the substrates face each other with the copper paste in between, and heat under pressure at a temperature of 150°C in a N atmosphere. Then, the organic adhesive and copper paste harden, and the inter-board conductive parts are bonded together, completing the ceramic multilayer wiring board.

一実施例2− 有機系接着剤として、フィラーを含有しない市販の半田
レジストを用いた他は、実施例1と同様にしてセラミッ
ク多層配線板を得た。
Example 2 A ceramic multilayer wiring board was obtained in the same manner as in Example 1, except that a commercially available solder resist containing no filler was used as the organic adhesive.

一実施例3− 銅(導電)ペーストの代わりに半田ペーストを用い、ま
ず、Nオ雰囲気下、150℃の温度で加圧加熱しエポキ
シ樹脂組成物を硬化させ、ついで、ハンダフロー炉を用
い、N8雰囲気下、半田ペーストが溶ける230℃の温
度で熱処理し、基板間の導通を確保するようにした他は
、実施例1と同様にしてセラミック多層配線板を得た。
Example 3 - Using a solder paste instead of a copper (conductive) paste, the epoxy resin composition was first cured by pressure heating at a temperature of 150° C. in an N2 atmosphere, and then a solder flow furnace was used to cure the epoxy resin composition. A ceramic multilayer wiring board was obtained in the same manner as in Example 1, except that heat treatment was performed in an N8 atmosphere at a temperature of 230° C. at which the solder paste melts to ensure conduction between the substrates.

一実施例4 粗面化処理を行わず、スパッタリング法により銅層を形
成するようにし、かつ、粒径50nの5iO8粒子を1
0voj!%含む熱硬化性エポキシ樹脂組成物からなる
有機系(絶縁性)接着剤を用いるようにした他は、実施
例1と同様にしてセラミック多層配線板を得た。
Example 4 A copper layer was formed by sputtering without surface roughening treatment, and 5iO8 particles with a particle size of 50 nm were
0voj! A ceramic multilayer wiring board was obtained in the same manner as in Example 1, except that an organic (insulating) adhesive made of a thermosetting epoxy resin composition containing 10% was used.

一実施例5− 窒化アルミニウム基板(厚み0.635鶴、縦51、横
5C1l)を用いるようにした他は、実施例4と同様に
してセラミック多層配線板を得た。
Example 5 A ceramic multilayer wiring board was obtained in the same manner as in Example 4, except that an aluminum nitride substrate (thickness: 0.635 mm, length: 51 cm, width: 5 C1 l) was used.

−比較例1〜 導電性接合材として銅粉末、ガラス粉末およびビヒクル
からなる高温焼成型の導電性接合材を用い、絶縁性接着
剤としてガラス組成物ペーストを用い、N!中、900
℃の温度で加圧加熱し基板間をガラス組成物たる絶縁層
で直に結合させるようにした他は、実施例1と同様にし
てセラミック多層配線板を得た。
-Comparative Example 1~ A high-temperature firing type conductive bonding material made of copper powder, glass powder, and vehicle was used as the conductive bonding material, a glass composition paste was used as the insulating adhesive, and N! Medium, 900
A ceramic multilayer wiring board was obtained in the same manner as in Example 1, except that the substrates were heated under pressure at a temperature of .degree. C. and the substrates were directly bonded through an insulating layer made of a glass composition.

実施例1〜5のセラミ、り多層配線板では、電気的導通
、基板間密着力がいずれも十分な状態であり、異常な回
路短絡も起きていなかった。
The ceramic multilayer wiring boards of Examples 1 to 5 had sufficient electrical continuity and adhesion between substrates, and no abnormal short circuits occurred.

比較例1のセラミック多層配線板は、実施例3のものに
比べ、反りが大きく、基板間接着部分の耐熱衝撃性が低
かった。
The ceramic multilayer wiring board of Comparative Example 1 had greater warpage than that of Example 3, and the thermal shock resistance of the bonded portion between the boards was low.

〔発明の効果〕〔Effect of the invention〕

以上に述べたように、この発明にかかるセラミック多層
配線板の製造方法では、セラミック基板の積層接着の際
の熱処理温度が従来よりも低いために反り難く、導電性
接合材と共に有機系接着剤により基板間の接着が確りと
しているとともにセラミック基板をガラス組成物で直に
接合せずに済むため、基板間接着部分の熱衝撃特性を向
上させることができる。
As described above, in the method for manufacturing a ceramic multilayer wiring board according to the present invention, the heat treatment temperature during lamination bonding of ceramic substrates is lower than that in the past, so warping is less likely to occur, and an organic adhesive is used in addition to a conductive bonding material. Since the adhesion between the substrates is reliable and there is no need to directly bond the ceramic substrates with a glass composition, the thermal shock characteristics of the bonded portion between the substrates can be improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明のセラミック多層配線板の製造方法
の一例を実施するときの工程を説明するための模式的断
面図である。 ■、1′・・・回路が形成されたセラミ・7り基板2.
2′・・・回路  2a、2’a・・・基板間導通用部
分  4・・・有機系絶縁性接着剤 5・・・導電ペー
スト 代理人 弁理士  松 本 武 彦 手続補正書(眺 7)つ 平成2年8月/θ「− 1,19牛のjし六 特願平2−153563号 2、発明の名称 セラミック多層配線板の製造方法 3、補正をする者 事件との関係   特許出願人 住   所    大阪府門真市大字門真1048番地
名 称(583)松下電工株式会社 代表者  (1m 三 好 俊 夫 4、代理人 6、補正の対象 明細書 7、補正の内容 ■ 明細書第4頁第10行に「0.3〜1」とあるを、
「0.1〜1」と訂正する。 ■ 明細書第5頁第13〜15行に「半田材の場合は・
・・をかける。」とあるを、「半田材の場合は400℃
以下の温度で行い、0.1〜1kg/−程度の圧力をか
ける。なお、多層板とした後、半導体素子等の部品を実
装するために行われるハンダリフロー工程で基板間の半
田が溶は流れ出ないようハンダリフロー温度以上の融点
(液相温度)を有する高温半田材を用いるのが好ましい
。」と訂正する。 ■ 明細書第11頁第15行と第16行の間に下記の文
言を挿入する。 「      一実施例6− 銅(導電)ペーストの代わりに、市販の液相温度240
℃を有する高温半田ペーストを用い、まず、N2雰囲気
下、150℃の温度で加熱加圧しエポキシ樹脂を硬化さ
せ、ついで、ハンダフロー炉を用い、N2雰囲気下、半
田ペーストが熔ける280℃の温度で熱処理し、基板間
の導通を確保するようにした他は、実施例1と同様にし
てセラミック多層配線板を得た。」
FIG. 1 is a schematic cross-sectional view for explaining steps in carrying out an example of the method for manufacturing a ceramic multilayer wiring board of the present invention. ■, 1'... Ceramic substrate 2 on which a circuit is formed.
2'...Circuit 2a, 2'a...Part for conduction between boards 4...Organic insulating adhesive 5...Conductive paste agent Patent attorney Takehiko Matsumoto Procedural amendment (View 7) August 1990 / θ "- 1,19 Ushi no J Shiroku Patent Application No. 2-153563 2, Title of Invention Method for Manufacturing Ceramic Multilayer Wiring Board 3, Relationship with the Amendment Person Case Patent Applicant Address 1048 Kadoma, Kadoma City, Osaka Name (583) Representative Matsushita Electric Works Co., Ltd. (1 m Toshio Miyoshi 4, Agent 6, Specification subject to amendment 7, Contents of amendment ■ Specification page 4 Line 10 says "0.3~1",
Correct it to "0.1~1". ■ On page 5 of the specification, lines 13 to 15, it says “In the case of solder material...
··multiply. "In the case of solder material, the temperature is 400℃.
It is carried out at the following temperature and a pressure of about 0.1 to 1 kg/- is applied. In addition, high-temperature solder material with a melting point (liquidus temperature) higher than the solder reflow temperature is used to prevent the solder between the boards from flowing out during the solder reflow process that is performed to mount components such as semiconductor elements after forming the multilayer board. It is preferable to use ” he corrected. ■ Insert the following text between lines 15 and 16 on page 11 of the specification. “Example 6 - Instead of copper (conductive) paste, commercially available liquidus temperature 240
Using a high-temperature solder paste having a temperature of 150°C, first heat and pressurize the epoxy resin in an N2 atmosphere at a temperature of 150°C to harden the epoxy resin, then use a solder flow furnace to heat the solder paste at a temperature of 280°C, which melts the solder paste, in an N2 atmosphere. A ceramic multilayer wiring board was obtained in the same manner as in Example 1, except that heat treatment was performed to ensure conduction between the substrates. ”

Claims (1)

【特許請求の範囲】[Claims] 1 回路が形成された複数のセラミック基板を、回路に
おける基板間導通用部分が導電性接合材を介して対面す
るとともに他の部分が絶縁性接着剤を介するようにして
重ね合わせておいて、加熱処理するようにするセラミッ
ク多層配線板の製造方法において、前記導電性接合材が
樹脂組成物をバインダーとする導電ペーストおよび/ま
たは半田材からなり、前記絶縁性接着剤が有機系接着剤
からなることを特徴とするセラミック多層配線板の製造
方法。
1 A plurality of ceramic substrates on which circuits are formed are stacked so that the parts for inter-board conduction in the circuits face each other via a conductive bonding material, and other parts are placed via an insulating adhesive, and heated. In the method for manufacturing a ceramic multilayer wiring board, the conductive bonding material is made of a conductive paste and/or a solder material using a resin composition as a binder, and the insulating adhesive is made of an organic adhesive. A method for manufacturing a ceramic multilayer wiring board characterized by:
JP15356390A 1990-06-11 1990-06-11 Manufacture of multilayer ceramic circuit board Pending JPH0444393A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15356390A JPH0444393A (en) 1990-06-11 1990-06-11 Manufacture of multilayer ceramic circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15356390A JPH0444393A (en) 1990-06-11 1990-06-11 Manufacture of multilayer ceramic circuit board

Publications (1)

Publication Number Publication Date
JPH0444393A true JPH0444393A (en) 1992-02-14

Family

ID=15565234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15356390A Pending JPH0444393A (en) 1990-06-11 1990-06-11 Manufacture of multilayer ceramic circuit board

Country Status (1)

Country Link
JP (1) JPH0444393A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1355353A3 (en) * 2002-04-15 2006-06-28 Hamilton Sundstrand Corporation Compact circuit carrier package
JP2017516319A (en) * 2014-07-17 2017-06-15 武漢電信器件有限公司 High frequency photoelectric detector package base using multilayer ceramic tank type package

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1355353A3 (en) * 2002-04-15 2006-06-28 Hamilton Sundstrand Corporation Compact circuit carrier package
US7754976B2 (en) 2002-04-15 2010-07-13 Hamilton Sundstrand Corporation Compact circuit carrier package
JP2017516319A (en) * 2014-07-17 2017-06-15 武漢電信器件有限公司 High frequency photoelectric detector package base using multilayer ceramic tank type package

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