JPH0444939B2 - - Google Patents

Info

Publication number
JPH0444939B2
JPH0444939B2 JP22685083A JP22685083A JPH0444939B2 JP H0444939 B2 JPH0444939 B2 JP H0444939B2 JP 22685083 A JP22685083 A JP 22685083A JP 22685083 A JP22685083 A JP 22685083A JP H0444939 B2 JPH0444939 B2 JP H0444939B2
Authority
JP
Japan
Prior art keywords
semiconductor laser
wavelength
interferometer
interference fringes
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP22685083A
Other languages
Japanese (ja)
Other versions
JPS60119428A (en
Inventor
Kimio Tateno
Keiji Kataoka
Seiji Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22685083A priority Critical patent/JPS60119428A/en
Publication of JPS60119428A publication Critical patent/JPS60119428A/en
Publication of JPH0444939B2 publication Critical patent/JPH0444939B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、光学的干渉計に関し、特に、干渉縞
の読み取りに高精度が要求される光学部品の検査
などに用いて好適な波長走査型半導体レーザ干渉
計に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an optical interferometer, and in particular to a wavelength scanning semiconductor suitable for use in inspection of optical components that require high accuracy in reading interference fringes. This relates to laser interferometers.

〔発明の背景〕[Background of the invention]

従来の光学的干渉計では、光源の波長は固定し
ており、干渉縞の読み取り精度を上げるために、
例えば、光束の一方に、周波数シフターを設けた
り、あるいは、ピエゾ振動子により光の位相を変
調するなどの方法がとられていたが、いずれの素
子も、高価であるうえ、調整箇所も多く、しかも
高電圧の駆動電源が必要などの欠点があつた。
In conventional optical interferometers, the wavelength of the light source is fixed, and in order to improve the accuracy of reading interference fringes,
For example, methods such as providing a frequency shifter on one side of the light beam or modulating the phase of the light with a piezoelectric vibrator have been used, but both of these devices are expensive and require many adjustment points. Moreover, it had drawbacks such as the need for a high-voltage driving power source.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、以上の欠点を解消し、安価か
つ簡素で、しかも走査容易であり、高い精度で干
渉縞を電気的に読み取ることのできる半導体レー
ザ干渉計を提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a semiconductor laser interferometer that eliminates the above drawbacks, is inexpensive, simple, easy to scan, and can electrically read interference fringes with high accuracy.

〔発明の概要〕[Summary of the invention]

すなわち、本発明は、トワイマングリン干渉計
や、マツハツエンダー干渉計などの光源に半導体
レーザを用い、その駆動電流を変調し、半導体レ
ーザの波長を走査することにより、干渉縞を視野
内で走査して、干渉縞の読み取り精度を向上せん
とするものである。
That is, the present invention uses a semiconductor laser as a light source in a Twyman Grin interferometer, a Matsuhatsu-Ender interferometer, etc., modulates its drive current, and scans the wavelength of the semiconductor laser to create interference fringes within the field of view. The purpose is to improve the accuracy of reading interference fringes by scanning.

〔発明の実施例〕[Embodiments of the invention]

まず、本発明の原理を説明する。 First, the principle of the present invention will be explained.

一般に半導体レーザでは、駆動電流ΔI(mA)
だけ変化させると、波長がシフトする。例えば、
みぞ付基盤型半導体レーザを例にとれば、波長の
シフト量Δλは、 Δλ=0.006・ΔI(nm) ……(1) で与えられる。
In general, in semiconductor lasers, the drive current ΔI (mA)
If you change just that, the wavelength will shift. for example,
Taking a grooved substrate type semiconductor laser as an example, the wavelength shift amount Δλ is given by Δλ=0.006·ΔI (nm) (1).

一方、干渉パタン上の任意の点(x,y)での
光の複素振幅は、時間平均をとつて、 V(x,y)=u0(x,y)exp{ik・r0(x,y)}
+ur(x,y)exp{ik・rr(x,y)} で与えられる。ここにu0,urはそれぞれ物体光
医、参照光の振巾、r0,rrは物体光、参照光な基
準面からの光路長、kは波形で k=2π/λ で与えられる。これから強度分布は I(x,y)=|V(x,y)|2 =u0 2(x,y)+ur 2(x,y) +2u0・ur・cos{2π/λ(r0−rr)} つて、 2π/λ{r0(x,y)−rr(x,y)}=m(m:整
数) を満す点(x,y)で最大強度、 2π/λ{r0(x,y)−rr(x,y)}=π/2・m
(m:整 数) を満す点で最小強度となるような干渉パタンが得
られる。
On the other hand, the complex amplitude of light at any point (x, y) on the interference pattern is time-averaged and is given by V(x, y)=u 0 (x, y) exp{ik・r 0 (x ,y)}
+u r (x, y) exp {ik・r r (x, y)}. Here, u 0 and u r are the amplitudes of the object beam and the reference beam, respectively, r 0 and r r are the optical path lengths of the object beam and the reference beam from the reference plane, and k is the waveform, which is given by k = 2π/λ. . From this, the intensity distribution is I (x, y) = | V (x, y) | 2 = u 0 2 (x, y) + u r 2 (x, y) + 2u 0・u r・cos 0 − r r )}, the maximum intensity is at the point (x, y) that satisfies 2π/λ{r 0 (x, y) − r r (x, y)} = m (m: integer), 2π/ λ{r 0 (x, y)−r r (x, y)}=π/2・m
(m: integer) An interference pattern is obtained that has the minimum intensity at points that satisfy (m: integer).

今、干渉パタンを1波長(2π位相)分だけ走
査することを考える。すなわち二光束路差 l=r0(x,y)−rr(x,y) 内にn箇の波があると n・λ=l ……(2) が成立する。次に式(1)に従つて半導体レーザの駆
動電流を増加させ、波長を長波長方向にΔλだ
けシプトさせると、光路差l内にはn−1箇の波
が存在するから (n−1)(λ+Δλ)=l ……(3) が成立する。式(2),(3)よりnを消去すると l=λ2/Δλ ……(4) が得られる。式(1),(4)より ΔI=10/l(mA) ……(5) 式(5)は光路差lの干渉計において、干渉パタン
を1波長分シフトするための電流の変化ΔIを与
えるものである。第1図はこの関係をグラフ化し
たものであり、例えば、光路差が10mmある時、
ΔI=1mAとなり、通常、半導体レーザの動作
中央値が、第2図に示すように60〜100mAであ
ることから、極く僅かの電流変調で波長走査が可
能であることがわかる。またこのような電流変化
に対して、光出力の変化は極く僅かである。
Now, consider scanning the interference pattern by one wavelength (2π phase). That is, if there are n waves within the path difference between the two light beams l=r 0 (x, y)−r r (x, y), n·λ=l (2) holds true. Next, according to equation (1), if the driving current of the semiconductor laser is increased and the wavelength is shifted in the longer wavelength direction by Δλ, there will be n-1 waves within the optical path difference l, so (n-1 )(λ+Δλ)=l...(3) holds true. By eliminating n from equations (2) and (3), l=λ 2 /Δλ (4) is obtained. From equations (1) and (4), ΔI = 10/l (mA) ...(5) Equation (5) expresses the change in current ΔI to shift the interference pattern by one wavelength in an interferometer with an optical path difference of l. It is something to give. Figure 1 is a graph of this relationship. For example, when the optical path difference is 10 mm,
Since ΔI=1 mA and the average operating value of a semiconductor laser is normally 60 to 100 mA as shown in FIG. 2, it is understood that wavelength scanning is possible with extremely small current modulation. Furthermore, with respect to such a change in current, the change in optical output is extremely small.

第3図は本発明の一実施例を示す構成図であ
り、マツハツエンダー型干渉計の場合を示すもの
である。この干渉計は、半導体レーザ1を光源と
し、この半導体レーザからの光束を集光レンズ2
により平行光とし、ビームスプリツタ3−1によ
り2つの光束に分け、一方の光束を検査用光束と
し、この光束中に測定されるべき透過物体10を
おき、反射ミラー4−2により、第2のビームス
プリツター3−2を経て、反射ミラー4−1から
他方の光束(参照光束)と共に光検知器6上て干
渉縞を形成するものである。これら二光束の光路
差は、ビームスプリツター3−1の回転、および
反射ミラー4−1を移動することにより、両光束
間の光差を調整することができる。
FIG. 3 is a block diagram showing one embodiment of the present invention, and shows the case of a Matsuhatsu Ender type interferometer. This interferometer uses a semiconductor laser 1 as a light source, and a light beam from this semiconductor laser is passed through a condensing lens 2.
The beam splitter 3-1 divides the beam into two beams, one beam is used as the inspection beam, the transmitting object 10 to be measured is placed in this beam, and the second beam is parallelized by the reflecting mirror 4-2. The light beam passes through the beam splitter 3-2 and forms interference fringes on the photodetector 6 together with the other beam (reference beam) from the reflecting mirror 4-1. The optical path difference between these two beams can be adjusted by rotating the beam splitter 3-1 and moving the reflecting mirror 4-1.

第4図はこの干渉計から得られる干渉パタンの
一例を示す図である。第4図において、干渉縞
L1(実線で示す。)、L2(点線で示す。)の間隔は1
波長分の波面のずれに相当する。半導体レーザ1
の波長をλ1からλ2まで変化させると、波長がλ1
き、干渉縞L1が生じ、波長がλ2のとき、干渉縞
L2が生じ、干渉縞が移動する。半導体レーザ1
の電流を周波数ω、振幅ΔIで変調し、光電検知
器6で光電変換してデータを取り込む時、周波数
ωのフイルターを通すことにより、その周波数成
分だけをとり出すことができ、高いS/Nの信号
となる。すなわち、干渉計の外乱による振動成分
や、温度などの影響を除去することができ、測定
を多数回、不規則に繰り返して平均をとることに
より、読み取り精度を向上することでができる。
さらに、干渉計自体の誤差、傾き、焦点合わせの
誤差などを引き算した後の位相分布を等高線図な
どで表示することが可能となる。
FIG. 4 is a diagram showing an example of an interference pattern obtained from this interferometer. In Figure 4, the interference fringes
The interval between L 1 (indicated by a solid line) and L 2 (indicated by a dotted line) is 1
This corresponds to a shift in the wavefront by a wavelength. Semiconductor laser 1
If the wavelength of _
L 2 occurs and the interference fringes move. Semiconductor laser 1
When the current is modulated with frequency ω and amplitude ΔI, and data is acquired by photoelectric conversion using the photoelectric detector 6, only that frequency component can be extracted by passing it through a filter with frequency ω, resulting in a high S/N ratio. It becomes a signal. That is, it is possible to remove vibration components caused by disturbance to the interferometer and the influence of temperature, etc., and reading accuracy can be improved by irregularly repeating measurements many times and taking the average.
Furthermore, it is possible to display the phase distribution after subtracting errors, inclinations, focusing errors, etc. of the interferometer itself in a contour diagram or the like.

第5図は、本発明の他の実施例を示す構成図で
あり、本発明をトワイマングリーン干渉計に応用
したものである。半導体レーザ1からなる光源か
らのビームを集光レンズ2で平行光とし、ビーム
スプリツター3により2つの光束に分け、参照光
束となる一方の光束は反射ミラー4によつて反射
され、ビームスプリツタ3を透過して光検出器6
に照射される。ビームスプリツター3を透過した
ビームは検査光束として用いられ、この光束は被
検査物体10により反射させれ、さらにビームス
プリツター3で反射され、検出知器6上で参照光
束とともに干渉縞を形成する。この時、二光束の
光路差は、反射ミラー4を光軸方向に移動するこ
とにより調整することができる。
FIG. 5 is a block diagram showing another embodiment of the present invention, in which the present invention is applied to a Twyman Green interferometer. A beam from a light source consisting of a semiconductor laser 1 is made into parallel light by a condenser lens 2, and divided into two beams by a beam splitter 3. One beam, which becomes a reference beam, is reflected by a reflection mirror 4, and is sent to the beam splitter. 3 to the photodetector 6
is irradiated. The beam transmitted through the beam splitter 3 is used as an inspection light beam, and this light beam is reflected by the object to be inspected 10 and further reflected by the beam splitter 3 to form interference fringes together with the reference beam on the detector 6. . At this time, the optical path difference between the two beams can be adjusted by moving the reflecting mirror 4 in the optical axis direction.

第6図aは、本発明で用いられる半導体レーザ
駆動回路の一実施例を示す回路図であり、第6図
bはその信号波形図である。
FIG. 6a is a circuit diagram showing an embodiment of the semiconductor laser drive circuit used in the present invention, and FIG. 6b is a signal waveform diagram thereof.

この回路は、半導体レーザLDをバイアス電流
I0を中心値として、振幅ΔIで変調するためのもの
である。今、図中A点に−VEボルトの電圧を加
え、ポリユームR1により、B点(トランジスタ
Qのベース)あでの電位を−VBボルトに設定す
れば、半導体レーザLDの両端には、 V=(−VB−0.7)−(VE) の電圧がかかる。このため、半導体レーザの抵抗
をrとすれば、直流抵抗R3を介してI0=V/
(R3+r)の電流を流すことができ、半導体レー
ザLDが発振する。この値をバイアス電流とする。
This circuit uses a semiconductor laser LD with a bias current
This is for modulating with amplitude ΔI with I 0 as the center value. Now, if a voltage of -VE volts is applied to point A in the figure, and the potential at point B (base of transistor Q) is set to -V B volts using polyurethane R1 , the voltage across the semiconductor laser LD will be as follows. A voltage of V = (-V B -0.7) - (V E ) is applied. Therefore, if the resistance of the semiconductor laser is r, I 0 = V/
A current of (R 3 +r) can flow, and the semiconductor laser LD oscillates. This value is taken as the bias current.

ΔI0を振巾とする電流変調は、図中C点に外部
より第6図bに示すような周波数ωの正弦波、あ
るいは矩形波を入力し、半導体レーザを I=I0+ΔI0sinωt なる変調電流によつて駆動するものである。
Current modulation with an amplitude of ΔI 0 is performed by inputting a sine wave or a rectangular wave with a frequency ω as shown in Figure 6b from the outside to point C in the figure, and changing the semiconductor laser so that I = I 0 + ΔI 0 sinωt. It is driven by modulated current.

〔発明の効果〕〔Effect of the invention〕

以上のように、本発明によれば、半導体レーザ
光源の駆動電流を僅かに変調するだけで、高精度
の干渉縞読み取りが可能となる。
As described above, according to the present invention, it is possible to read interference fringes with high precision just by slightly modulating the drive current of the semiconductor laser light source.

さらに、光デイスクの記録や再生に用いられる
光ヘツドのスポツトの波円計測や、半導体レーザ
自信が固有に持つている収差測定も、高精度で行
なうことが可能となる。
Furthermore, it is also possible to measure the wave circle of a spot on an optical head used for recording and reproducing an optical disk, and to measure the aberration inherent in the semiconductor laser itself with high precision.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、干渉計の二つの光束の光路差に対
し、半導体レーザの波長を1波長だけシフトする
に要する電流変化分を示すグラフ、第2図は半導
体レーザの電流、光出力特性を示すグラフ、第3
図は本発明の一実施例を示す構成図、第4図は本
発明による干渉パタンの一例を示す図、第5図は
本発明の他の実施例を示す図、第6図aは本発明
で用いられる半導体レーザ駆動回路の一例を示す
回路図、第6図bはその信号波形図である。 1……半導体レーザ、3,3−1,3−2……
ビームスプリツター、4,4−1,4−2……反
射ミラー、6……光検知器、10……被検査物
体。
Figure 1 is a graph showing the current change required to shift the wavelength of the semiconductor laser by one wavelength with respect to the optical path difference between the two light beams of the interferometer. Figure 2 shows the current and optical output characteristics of the semiconductor laser. Graph, 3rd
FIG. 4 is a diagram showing an example of an interference pattern according to the present invention, FIG. 5 is a diagram showing another embodiment of the present invention, and FIG. 6 a is a diagram showing an example of the interference pattern according to the present invention. FIG. 6B is a circuit diagram showing an example of a semiconductor laser drive circuit used in the present invention, and FIG. 6B is a signal waveform diagram thereof. 1... Semiconductor laser, 3, 3-1, 3-2...
Beam splitter, 4, 4-1, 4-2...Reflection mirror, 6...Photodetector, 10...Object to be inspected.

Claims (1)

【特許請求の範囲】[Claims] 1 光源からの光束を二つに分割し、一方を参照
光束、他方を検査用光束とし、該二光束を再び同
一面上に照射して、干渉縞を生じせしめる干渉計
において、該光源として半導体レーザを用い、該
半導体レーザの駆動電流を変調することにより該
半導体レーザの波長を走査して、上記干渉縞の強
度分布を変化させることを特徴とする波長走査型
半導体レーザ干渉計。
1. In an interferometer that splits a light beam from a light source into two, one as a reference beam and the other as a test beam, and then irradiates the two beams onto the same surface again to produce interference fringes, a semiconductor is used as the light source. A wavelength scanning semiconductor laser interferometer, characterized in that a laser is used to scan the wavelength of the semiconductor laser by modulating the drive current of the semiconductor laser, thereby changing the intensity distribution of the interference fringes.
JP22685083A 1983-12-02 1983-12-02 Wavelength scanning type semiconductor laser interferometer Granted JPS60119428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22685083A JPS60119428A (en) 1983-12-02 1983-12-02 Wavelength scanning type semiconductor laser interferometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22685083A JPS60119428A (en) 1983-12-02 1983-12-02 Wavelength scanning type semiconductor laser interferometer

Publications (2)

Publication Number Publication Date
JPS60119428A JPS60119428A (en) 1985-06-26
JPH0444939B2 true JPH0444939B2 (en) 1992-07-23

Family

ID=16851541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22685083A Granted JPS60119428A (en) 1983-12-02 1983-12-02 Wavelength scanning type semiconductor laser interferometer

Country Status (1)

Country Link
JP (1) JPS60119428A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6193676B1 (en) * 1997-10-03 2001-02-27 Intraluminal Therapeutics, Inc. Guide wire assembly

Also Published As

Publication number Publication date
JPS60119428A (en) 1985-06-26

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