JPH0445784A - Apparatus for culture - Google Patents

Apparatus for culture

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Publication number
JPH0445784A
JPH0445784A JP15630490A JP15630490A JPH0445784A JP H0445784 A JPH0445784 A JP H0445784A JP 15630490 A JP15630490 A JP 15630490A JP 15630490 A JP15630490 A JP 15630490A JP H0445784 A JPH0445784 A JP H0445784A
Authority
JP
Japan
Prior art keywords
gas
culture chamber
sensor
culture
path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15630490A
Other languages
Japanese (ja)
Other versions
JPH078228B2 (en
Inventor
Yuichi Tamaoki
裕一 玉置
Sadami Hagiguchi
萩口 定美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2156304A priority Critical patent/JPH078228B2/en
Publication of JPH0445784A publication Critical patent/JPH0445784A/en
Publication of JPH078228B2 publication Critical patent/JPH078228B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To obtain the subject apparatus of a specific construction, designated to keep a material gas passage and a gas sensor at a high temperature than that in a culture chamber and capable of stably sensing a high gas concentration without growing various germs in the material gas passage. CONSTITUTION:An apparatus is obtained by providing gas sensors 13 and 14 in a material gas passage 10 for flowing a gas in a culture chamber 2 kept at a high humidity and simultaneously installing a heating means 31 and a control means 23 for controlling the gas concentration in the culture chamber. The heating means 31 is further controlled so as to keep the material as passage 10 and the gas sensors 13 and 14 at a high temperature than that in the culture chamber 2 with the control means 23. Thereby, an influence of the outside air temperature on the gas sensors 13 and 14 is eliminated to prevent moisture from condensing in the material gas passage 10.

Description

【発明の詳細な説明】 (イ)産業上の利用分野 本発明は室内のガス環境を制御し、細胞等の培養を行う
ための培養装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a culture device for controlling an indoor gas environment and culturing cells and the like.

(ロ)従来の技術 従来この種培養装置は、癌細胞等の細胞組織を培養する
ため特開昭60−141279号公報に示される如く、
室内の+30”C以上の比較的高温とし、湿度を95%
以上の高温とすると共に、二酸化炭素濃度や酸素濃度等
のガス環境を制御できるように構成されている。
(B) Conventional technology Conventionally, this type of culture apparatus is used for culturing cell tissues such as cancer cells, as shown in Japanese Patent Application Laid-open No. 141279/1983.
Relatively high temperature indoors over +30”C and humidity 95%
The structure is such that the gas environment, such as carbon dioxide concentration and oxygen concentration, can be controlled in addition to the above-mentioned high temperature.

このガス濃度の制御は、赤外線や、電気伝導度の変化を
利用して所定のガス濃度を検出するガスセンサーを用い
て行われるが、これらセンサーは当該センサーが測定し
ようとする資料ガスの温度や湿度によって影響を受けて
出力が変化してしまう。特に培養室内のガスは高温であ
るので、この影響は大きい。
This gas concentration control is performed using a gas sensor that detects a predetermined gas concentration using infrared rays or changes in electrical conductivity. Output changes due to humidity. In particular, since the gas inside the culture chamber is at a high temperature, this effect is large.

そこで、前記公報では濃度を検出するための資料ガスを
冷却装置によって冷却することにより、一定の低温とし
て且つ除湿し、100%の恒温状態としてガスセンサー
に送るようにしている。
Therefore, in the above-mentioned publication, the sample gas for detecting the concentration is cooled by a cooling device to a constant low temperature and dehumidified, and then sent to the gas sensor in a 100% constant temperature state.

また、センサーとして赤外線式のセンサーを用いる場合
、光路の汚れや光源自体の劣化により長期的に赤外線検
出素子に到達する光の量が変化してしまうので、第3図
のような構造により、零点校正を行っていた。
Furthermore, when using an infrared sensor as a sensor, the amount of light that reaches the infrared detection element changes over time due to dirt in the optical path or deterioration of the light source itself. I was doing proofreading.

第3図中、100は資料ガスを流す資料セル、101は
比較ガスを封入した比較セル、102.103は赤外線
の光源、104はチョッパ 105は検出器であり、比
較セル101透過する赤外線による出力を用いて、定期
的に零点校正を行うものである。
In FIG. 3, 100 is a data cell through which a data gas flows, 101 is a comparison cell filled with a comparison gas, 102 and 103 are an infrared light source, 104 is a chopper, and 105 is a detector, which outputs the infrared light transmitted through the comparison cell 101. Zero point calibration is performed periodically using

(ハ)発明が解決しようとする課題 然し乍ら、上記公報の如き構成では冷却装置が必要とな
るので装置全体が大型化してしまう。また、資料ガスの
水分を除去排出してしまうので、資料ガスを培養室内に
帰還させても培養室内の水分は浪費される。
(c) Problems to be Solved by the Invention However, the configuration as disclosed in the above publication requires a cooling device, which increases the size of the entire device. Moreover, since the moisture in the sample gas is removed and discharged, the moisture in the culture chamber is wasted even if the sample gas is returned to the culture chamber.

更に、センサーはそれ自体の温度によっても影響を受け
る。特に、赤外線式ガスセンサーでは光源から発生する
赤外線の量が変化するので、外気温度が変化した場合に
は検出々力が変化してしまう問題があった。
Furthermore, the sensor is also affected by its own temperature. In particular, with infrared gas sensors, the amount of infrared rays emitted from the light source changes, so there is a problem in that the detection power changes when the outside temperature changes.

更にまた、第3図の如き構造の零点校正法では常に2光
路が必要であり、高価なものとなると共に、実際には比
較セル101外面にも不純物が付着するので、零点は変
動する問題があった。
Furthermore, the zero point calibration method with the structure shown in FIG. 3 always requires two optical paths, making it expensive, and in reality, impurities also adhere to the outer surface of the comparison cell 101, so there is a problem that the zero point fluctuates. there were.

本発明は、これらの課題を解決することを目的とする。The present invention aims to solve these problems.

(ニ)課題を解決するための手段 本発明は、高湿度にて維持される培養室と、この培養室
内のガスを流通させる資料ガス経路と、この資料ガス経
路に設けたガスセンサーと、加熱手段と、培養室内のガ
ス濃度を制御する制御手段とから培養装置を構成し、制
御手段は資料ガス経路とガスセンサーを培養室内の温度
よりも高い所定の温度に維持するよう加熱手段を制御す
るよう構成したものである。
(d) Means for Solving the Problems The present invention provides a culture chamber maintained at high humidity, a material gas path for circulating gas in this culture chamber, a gas sensor provided in this material gas path, and a heating device. and a control means for controlling the gas concentration within the culture chamber, and the control means controls the heating means to maintain the material gas path and the gas sensor at a predetermined temperature higher than the temperature within the culture chamber. It is structured as follows.

また、上記培養装置において、資料ガス経路に導入した
資料ガスは培養室内に帰還させるようにしたものである
Further, in the above culture apparatus, the sample gas introduced into the sample gas path is returned into the culture chamber.

更に、上記において、ガスセンサーには、IHI式ガス
センサーを用い、この赤外線式ガスセンサーには湿度に
よって吸収される波長の透過を阻止するフィルタを設け
たものである。
Furthermore, in the above, an IHI type gas sensor is used as the gas sensor, and this infrared type gas sensor is provided with a filter that blocks transmission of wavelengths that are absorbed by humidity.

又、この培養装置において、ガスセンサーが位置する資
料ガス経路に外気を流通させる手段を設け、制御手段は
この外気を用いて赤外線式ガスセンサーの零点校正を行
うようにしたものである。
Further, in this culture apparatus, a means for circulating outside air is provided in the sample gas path where the gas sensor is located, and the control means uses this outside air to perform zero point calibration of the infrared gas sensor.

(ホ)作用 本発明によれば、センサーは一定の温度に維持されるの
で外気温度に影響されず、安定した濃度検出が可能とな
る。また、資料ガス経路内に水分が凝結しないので雑菌
が成長しない。
(E) Function According to the present invention, since the sensor is maintained at a constant temperature, stable concentration detection is possible without being affected by outside temperature. In addition, since moisture does not condense in the material gas path, bacteria do not grow.

また、資料ガスの水分を除去するものではないので、資
料ガスを培養室内に帰還せしめれば、ガスや加湿用の水
分の浪費が防止される。
Furthermore, since the water content of the sample gas is not removed, waste of gas and humidifying water can be prevented by returning the sample gas to the culture chamber.

更に、センサーとして赤外線式ガスセンサーを用い湿度
にて吸収される波長を除去するフィルタを設ければ、湿
度の変化によっても検出々力が変化しない。
Furthermore, if an infrared gas sensor is used as the sensor and a filter is provided to remove wavelengths that are absorbed by humidity, the detection power will not change even with changes in humidity.

また、資料ガス経路に外気を流通させて零点校正を行わ
せれば、零点校正に2光路を必要としない (へ)実施例 次に本発明の詳細な説明する。第1図は本発明の培養装
置1の構成図を示す。培養装置1の培養室2内は断熱材
7にて断熱されており、二酸化炭素を封入したガスボン
ベ3と、窒素を封入したガスボンベ4とが別々の経路5
.6にてそれぞれ培養室2と連通せらhる形となってい
る。各経路5及び6には二方弁がら成るバルブ8.9が
それぞれ介設されている。
Furthermore, if the zero point calibration is performed by circulating outside air through the sample gas path, two optical paths are not required for the zero point calibration.Example: The present invention will now be described in detail. FIG. 1 shows a configuration diagram of a culture apparatus 1 of the present invention. The inside of the culture chamber 2 of the culture device 1 is insulated with a heat insulating material 7, and a gas cylinder 3 filled with carbon dioxide and a gas cylinder 4 filled with nitrogen are routed through separate paths 5.
.. 6, each of which communicates with the culture chamber 2. A valve 8.9 consisting of a two-way valve is inserted in each path 5 and 6.

lOは資料ガス経路であり、入口10aを培養室2に連
通しており、ここにエアポンプ11と、流通ガス中の塵
埃を除去するフィルタ12と、二酸化炭素ガス濃度セン
サー13及び酸素ガス濃度センサー14が介設され、エ
アポンプ11は、入口10aから培養室2内の雰囲気を
資料ガスとして吸引し、各センサー13及び14に流通
させた後、出口10bより再び培養室2内に戻すよう動
作する。
1O is a material gas path, which communicates the inlet 10a with the culture chamber 2, and includes an air pump 11, a filter 12 for removing dust from the circulating gas, a carbon dioxide gas concentration sensor 13, and an oxygen gas concentration sensor 14. The air pump 11 operates to suck the atmosphere in the culture chamber 2 as a sample gas from the inlet 10a, circulate it to each sensor 13 and 14, and then return it to the culture chamber 2 from the outlet 10b.

二酸化炭素ガス濃度センサー13は第2図に分解図で示
すような赤外線式ガスセンサーである。
The carbon dioxide gas concentration sensor 13 is an infrared gas sensor as shown in an exploded view in FIG.

センサー13は近年開発された所謂モジュレーションタ
イプの焦電形赤外線検出器15と、遠赤外線を発生する
ヒーター等の光源16とから構成される。赤外線検出器
15はシールドボックス17内に赤外線検出部Sを収納
し、シールドボックス17に形成した図示しない透孔に
対応する位置に圧電バイモルフ振動子18によって駆動
されるスリット部材19から成るチョッパCを設け、更
にそれに対応する位置に透孔20を形成したケース21
にて全体をカバーし、このケース21内にこれらの部品
を内蔵せしめている。スリット部材19は、スリットを
形成した2枚の板を重合関係に取り付けて構成され、チ
ョッパCに入力される駆動電圧の周波数と同じ周波数で
圧電バイモルフ振動子18が振動することによりスリッ
トを開閉し透孔20より入射して赤外線検出部Sに到達
する赤外線Uを断続して、赤外線量に応じた出力をチジ
ッパCの入力周波数と同じ周波数の交流信号として発生
する。
The sensor 13 includes a so-called modulation type pyroelectric infrared detector 15 developed in recent years, and a light source 16 such as a heater that generates far infrared rays. The infrared detector 15 houses an infrared detection part S in a shield box 17, and has a chopper C made of a slit member 19 driven by a piezoelectric bimorph vibrator 18 at a position corresponding to a through hole (not shown) formed in the shield box 17. A case 21 in which a through hole 20 is formed in a corresponding position.
The case 21 covers the entire body, and these parts are housed inside the case 21. The slit member 19 is constructed by attaching two plates with a slit formed thereon in an overlapping relationship, and opens and closes the slit by the piezoelectric bimorph vibrator 18 vibrating at the same frequency as the frequency of the drive voltage input to the chopper C. The infrared rays U entering through the through hole 20 and reaching the infrared detecting section S are intermittent, and an output corresponding to the amount of infrared rays is generated as an alternating current signal of the same frequency as the input frequency of the chipper C.

この光源16と透孔20間に第2図中破線矢印の如く資
料ガスを流通させ、資料ガス中の二酸化炭素に赤外線が
吸収される性質を利用してガス濃度を検出する。
A sample gas is caused to flow between the light source 16 and the through hole 20 as indicated by the broken line arrow in FIG. 2, and the gas concentration is detected by utilizing the property that carbon dioxide in the sample gas absorbs infrared rays.

また、透孔20にはサファイヤガラス22がはめ込まれ
るが、そこには湿度によって吸収される波長を除去する
フィルタが塗布形成されている。
A sapphire glass 22 is fitted into the through hole 20, and a filter for removing wavelengths absorbed by humidity is coated thereon.

酸素ガス濃度センサー14は電気伝導度を検知する方式
のガスセンサーであり、各センサー13及び14の出力
はマイクロコンピュータにて構成される制御装置23に
入力される。制御装置23には培養室2内の温度を検出
するセンサー24の出力も入力される。
The oxygen gas concentration sensor 14 is a gas sensor that detects electrical conductivity, and the outputs of the sensors 13 and 14 are input to a control device 23 comprised of a microcomputer. The output of a sensor 24 that detects the temperature inside the culture chamber 2 is also input to the control device 23 .

26は外気を導入するための外気経路であり、外気導入
口27にて一端を開口し、他端はフィルタ12と二酸化
炭素ガス濃度センサー13の間の資料ガス経路10に接
続されている。外気経路26には順次エアポンプ28と
フィルタ29が介設され、このエアポンプ28にて外気
(大気)を資料ガス経路10に流通させる。
Reference numeral 26 denotes an outside air path for introducing outside air, one end of which is open at an outside air introduction port 27, and the other end connected to the sample gas path 10 between the filter 12 and the carbon dioxide gas concentration sensor 13. An air pump 28 and a filter 29 are successively provided in the outside air path 26 , and the air pump 28 allows outside air (atmosphere) to flow through the sample gas path 10 .

資料ガス経路10とエアポンプ11、フィルタ12及び
29、各センサー13及び14は断熱ケース30内に収
納されて、外気と断熱されると共に、このケース30内
にはヒータ31及びケース30内の温度を検出するため
の温度センサー32が設けられセンサー32の出力は制
御装置23に入力される。
The data gas path 10, the air pump 11, the filters 12 and 29, and the sensors 13 and 14 are housed in a heat insulating case 30 to be insulated from the outside air. A temperature sensor 32 for detection is provided, and the output of the sensor 32 is input to the control device 23.

34は培養室2内を加熱するためのヒータ、35は培養
室2加湿用の水を入れた容器である。
34 is a heater for heating the inside of the culture chamber 2, and 35 is a container containing water for humidifying the culture chamber 2.

制御装置23はバルブ8及び9の制御出力をそれぞれ発
生すると共に、各エアポンプ11及び28の運転を制御
し、更に、5SR36及び37の導通を制御してヒータ
31及び34の発熱を制御する。
The control device 23 generates control outputs for the valves 8 and 9, controls the operation of the air pumps 11 and 28, and further controls conduction of the 5SRs 36 and 37 to control heat generation of the heaters 31 and 34.

次に、制御装置23の動作を説明する。一般にこの種培
養装置は、培養室2内の温度は+30〜40℃、湿度は
95%以上、二酸化炭素ガス濃度5%、酸素ガス濃度5
%における用途が多い。また、酸素ガス濃度の制御に窒
素ガスを用いるのは大気中の酸素濃度が約2】%であり
、5%で使用する場合は窒素ガスによって培養室2内の
酸素ガス濃度を下げる必要があるからである。
Next, the operation of the control device 23 will be explained. Generally, in this type of seed culture device, the temperature in the culture chamber 2 is +30 to 40°C, the humidity is 95% or more, the carbon dioxide gas concentration is 5%, and the oxygen gas concentration is 5%.
There are many uses in %. In addition, nitrogen gas is used to control the oxygen gas concentration because the oxygen concentration in the atmosphere is approximately 2%, and when using it at 5%, it is necessary to lower the oxygen gas concentration in the culture chamber 2 with nitrogen gas. It is from.

尚、大気中の二酸化炭素濃度は約0.03%であり、ま
た、説明の便宜上二酸化炭素ガス濃度の制簀についての
み説明する。
Note that the carbon dioxide concentration in the atmosphere is about 0.03%, and for convenience of explanation, only the control of the carbon dioxide gas concentration will be described.

制御装置23はセンサー24の出力に基づき、5SR3
7を制御してヒータ34の発熱を調節し培養室2内を例
えば+37℃等の一定の温度に維持する。
Based on the output of the sensor 24, the control device 23
7 to adjust the heat generation of the heater 34 to maintain the inside of the culture chamber 2 at a constant temperature of, for example, +37°C.

また、ポンプ11を運転し、資料ガスを経路10に導入
し、各センサ13.14に流通させて各センサ13及び
14から二酸化炭素ガス濃度及び酸素ガス濃度に関する
出力を得て各バルブ8及び9を開閉し、培養室2内のガ
ス環境を調節する。
In addition, the pump 11 is operated to introduce the sample gas into the path 10 and let it flow through each sensor 13 and 14 to obtain outputs regarding carbon dioxide gas concentration and oxygen gas concentration from each sensor 13 and 14, and each valve 8 and 9 The gas environment inside the culture chamber 2 is adjusted by opening and closing.

更に、制御装置23はセンサー32の出力に基づいて5
SR3−6を制御することにより、断熱ケース30内を
培養室2内の温度よりも高い一定の温度に維持する。例
えば、培養室2が前述の+37℃であれば断熱ケース3
0内は+42℃に維持する。これによって資料ガス経路
10及び各センサー13及び14の温度は一定となるの
で、外気温度の変動に対しても検出々力が変化すること
はない。また、経路10は資料ガスの温度より高いから
、資料ガス中の水分が経路10内で凝結することはなく
、従って経路10内は常に乾燥状態を維持され、雑菌が
繁殖することもなく、更に、センサー13.14に水滴
が付いて検出誤差が生じることもない。また、この資料
ガスは培養室2内に戻されるから、培養室2内の水分の
浪費も生じない。
Further, the control device 23 controls the 5 based on the output of the sensor 32.
By controlling SR3-6, the inside of the heat insulating case 30 is maintained at a constant temperature higher than the temperature inside the culture chamber 2. For example, if the culture chamber 2 is +37℃ as mentioned above, the insulation case 3
0 is maintained at +42°C. As a result, the temperature of the sample gas path 10 and the sensors 13 and 14 remains constant, so that the detection power does not change even with changes in outside air temperature. In addition, since the temperature of the path 10 is higher than that of the material gas, the moisture in the material gas does not condense within the path 10, so the inside of the path 10 is always kept dry, and bacteria do not propagate. , there is no possibility of detection errors caused by water droplets on the sensors 13 and 14. Furthermore, since this sample gas is returned to the culture chamber 2, water in the culture chamber 2 is not wasted.

次に、制御装置23は例えば4時間に1回エアポンプ1
1を停止しくエアポンプの停止中に空気の逆流はない。
Next, the control device 23 controls the air pump 1 once every 4 hours, for example.
There is no backflow of air when the air pump is stopped.

以下同じ。)、エアポンプ28を2分間運転して、外気
の各センサー13及び14に流通し、それぞれが検出す
る大気の二酸化炭素ガス濃度及び酸素ガス濃度を記憶し
、大気の各濃度は分かっているので、これによって二酸
化縦索ガス濃度センサー13の零点校正を実行する。
same as below. ), the air pump 28 is operated for 2 minutes, the outside air is distributed to each sensor 13 and 14, and the atmospheric carbon dioxide gas concentration and oxygen gas concentration detected by each are memorized, and since each atmospheric concentration is known, This executes the zero point calibration of the carbon dioxide longitudinal cable gas concentration sensor 13.

従って、従来の如く零点校正のために2光路式の構造を
採る必要はなくなる。また、この零点校正は、二酸化炭
素ガス濃度センサー13の透孔20にはめこまれたサフ
ァイヤガラス22には湿度によって吸収される波長を除
去するフィルタが塗布形成されているので、導入した外
気の湿度に影響されない。
Therefore, it is no longer necessary to adopt a two-light path type structure for zero point calibration as in the past. In addition, this zero point calibration is performed by applying a filter to the sapphire glass 22 fitted into the through hole 20 of the carbon dioxide gas concentration sensor 13 to remove wavelengths that are absorbed by humidity. not affected by

尚、制御装置23は同時に酸素ガス濃度センサー14の
スパン補正をも実行する。また、上記零点校正用の外気
は活性炭や石炭等の二酸化炭素吸着剤を通して導入して
も良く、それによって例えば1%以下の低二酸化炭素濃
度の制御も長期安定的に実行できる。
Note that the control device 23 also executes span correction of the oxygen gas concentration sensor 14 at the same time. Furthermore, the outside air for zero point calibration may be introduced through a carbon dioxide adsorbent such as activated carbon or coal, thereby making it possible to stably control a carbon dioxide concentration as low as 1% or less for a long period of time.

(ト)発明の効果 本発明によれば、ガスセンサーは一定の温度に維持され
るので外気温度に影響されず、安定した濃度検出が可能
となる。また、資料ガス経路内に水分が凝結しないので
雑菌が成長せず、この水滴がガスセンサーに付着して検
出不能となることもない。
(g) Effects of the Invention According to the present invention, the gas sensor is maintained at a constant temperature, so it is not affected by the outside temperature, and stable concentration detection is possible. Furthermore, since moisture does not condense in the sample gas path, bacteria do not grow, and water droplets do not adhere to the gas sensor and become undetectable.

また、資料ガスの水分を除去するものではないので、資
料ガスを培養室内に帰還せしめれば、ガスや加湿用の水
分の浪費が防止される。
Furthermore, since the water content of the sample gas is not removed, waste of gas and humidifying water can be prevented by returning the sample gas to the culture chamber.

更に、センサーとして赤外線式ガスセンサーを用い湿度
にて吸収される波長を除去するフィルタを設ければ、湿
度の変化によっても検出々力が変化しない。加えて資料
ガス経路に外気を流通させて零点校正を行わせれば、従
来の如く零点校正に2光路を必要とせず、総じて安価な
培養装置を提供できる。
Furthermore, if an infrared gas sensor is used as the sensor and a filter is provided to remove wavelengths that are absorbed by humidity, the detection power will not change even with changes in humidity. In addition, if the zero point calibration is performed by circulating outside air through the sample gas path, two optical paths are not required for the zero point calibration as in the conventional method, and an inexpensive culturing device can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

II1図は本発明の培養装置の構成図、第2図は二酸化
炭素ガス濃度センサーの分解斜視図、第3図は従来の零
点校正を説明する図である。
FIG. II1 is a configuration diagram of the culture apparatus of the present invention, FIG. 2 is an exploded perspective view of a carbon dioxide gas concentration sensor, and FIG. 3 is a diagram illustrating conventional zero point calibration.

Claims (1)

【特許請求の範囲】 1)高湿度にて維持される培養室と、該培養室内のガス
を流通させる資料ガス経路と、該資料ガス経路に設けた
ガスセンサーと、加熱手段と、前記培養室内のガス濃度
を制御する制御手段とから成り、前記制御手段は前記資
料ガス経路とガスセンサーを前記培養室内の温度よりも
高い所定の温度に維持するよう前記加熱手段を制御する
ことを特徴とする培養装置。 2)資料ガス経路に導入した資料ガスは培養室内に帰還
させることを特徴とする請求項1記載の培養装置。 3)ガスセンサーには赤外線式ガスセンサーを用い、該
赤外線式ガスセンサーには湿度によって吸収される波長
の透過を阻止するフィルタを設けた請求項1記載の培養
装置。 4)ガスセンサーが位置する資料ガス経路に外気を流通
させる手段を設け、制御手段はこの外気を用いて赤外線
式ガスセンサーの零点校正を行うことを特徴とする請求
項3記載の培養装置。
[Scope of Claims] 1) A culture chamber maintained at high humidity, a material gas path through which gas within the culture chamber flows, a gas sensor provided in the material gas path, a heating means, and the culture chamber. and a control means for controlling the gas concentration of the culture chamber, and the control means controls the heating means to maintain the sample gas path and the gas sensor at a predetermined temperature higher than the temperature inside the culture chamber. Culture device. 2) The culture apparatus according to claim 1, wherein the sample gas introduced into the sample gas path is returned into the culture chamber. 3) The culture apparatus according to claim 1, wherein an infrared gas sensor is used as the gas sensor, and the infrared gas sensor is provided with a filter that blocks transmission of wavelengths absorbed by humidity. 4) The culture apparatus according to claim 3, wherein means is provided for circulating outside air through the sample gas path where the gas sensor is located, and the control means uses this outside air to perform zero point calibration of the infrared gas sensor.
JP2156304A 1990-06-13 1990-06-13 Incubator Expired - Fee Related JPH078228B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2156304A JPH078228B2 (en) 1990-06-13 1990-06-13 Incubator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2156304A JPH078228B2 (en) 1990-06-13 1990-06-13 Incubator

Publications (2)

Publication Number Publication Date
JPH0445784A true JPH0445784A (en) 1992-02-14
JPH078228B2 JPH078228B2 (en) 1995-02-01

Family

ID=15624884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2156304A Expired - Fee Related JPH078228B2 (en) 1990-06-13 1990-06-13 Incubator

Country Status (1)

Country Link
JP (1) JPH078228B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007102399A1 (en) * 2006-03-06 2007-09-13 Sanyo Electric Co., Ltd. Incubator for isolator
JP2008220235A (en) * 2007-03-12 2008-09-25 Sanyo Electric Co Ltd Culture apparatus
WO2017115667A1 (en) * 2015-12-28 2017-07-06 パナソニックヘルスケアホールディングス株式会社 Gas-borne fine particle measuring instrument and clean environmental device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007102399A1 (en) * 2006-03-06 2007-09-13 Sanyo Electric Co., Ltd. Incubator for isolator
JP2007236216A (en) * 2006-03-06 2007-09-20 Sanyo Electric Co Ltd Incubator for isolator
US9464265B2 (en) 2006-03-06 2016-10-11 Panasonic Healthcare Holdings Co., Ltd. Incubator for isolator
JP2008220235A (en) * 2007-03-12 2008-09-25 Sanyo Electric Co Ltd Culture apparatus
WO2017115667A1 (en) * 2015-12-28 2017-07-06 パナソニックヘルスケアホールディングス株式会社 Gas-borne fine particle measuring instrument and clean environmental device
JPWO2017115667A1 (en) * 2015-12-28 2018-06-07 Phcホールディングス株式会社 Air particulate measuring instrument and clean environment equipment

Also Published As

Publication number Publication date
JPH078228B2 (en) 1995-02-01

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