JPH0446001A - Method for recovering high purity hydrogen from waste gas - Google Patents
Method for recovering high purity hydrogen from waste gasInfo
- Publication number
- JPH0446001A JPH0446001A JP2154929A JP15492990A JPH0446001A JP H0446001 A JPH0446001 A JP H0446001A JP 2154929 A JP2154929 A JP 2154929A JP 15492990 A JP15492990 A JP 15492990A JP H0446001 A JPH0446001 A JP H0446001A
- Authority
- JP
- Japan
- Prior art keywords
- waste gas
- gas
- oxygen
- hydrogen
- hydrogen gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 239000002912 waste gas Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000001257 hydrogen Substances 0.000 title claims abstract description 12
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 25
- 239000012535 impurity Substances 0.000 claims abstract description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000001301 oxygen Substances 0.000 claims abstract description 15
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000007789 gas Substances 0.000 claims abstract description 10
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 25
- 229910001882 dioxygen Inorganic materials 0.000 claims description 25
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract description 6
- 239000000571 coke Substances 0.000 abstract description 6
- 239000002808 molecular sieve Substances 0.000 abstract description 5
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 abstract description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052742 iron Inorganic materials 0.000 abstract description 4
- 229910021529 ammonia Inorganic materials 0.000 abstract description 2
- 150000002431 hydrogen Chemical class 0.000 abstract description 2
- 238000001179 sorption measurement Methods 0.000 description 16
- 238000000926 separation method Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000011084 recovery Methods 0.000 description 6
- 230000008929 regeneration Effects 0.000 description 6
- 238000011069 regeneration method Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- -1 reduced iron group metals Chemical class 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000007791 dehumidification Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- WHRZCXAVMTUTDD-UHFFFAOYSA-N 1h-furo[2,3-d]pyrimidin-2-one Chemical compound N1C(=O)N=C2OC=CC2=C1 WHRZCXAVMTUTDD-UHFFFAOYSA-N 0.000 description 1
- 235000005956 Cosmos caudatus Nutrition 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 101100045390 Drosophila melanogaster Tao gene Proteins 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 235000006173 Larrea tridentata Nutrition 0.000 description 1
- 244000073231 Larrea tridentata Species 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229960002126 creosote Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Hydrogen, Water And Hydrids (AREA)
Abstract
Description
【発明の詳細な説明】
の
この発明は、廃ガス、例えばコークス炉ガス、転炉ガス
等から高純度の水素ガスを回収する方法に関する。DETAILED DESCRIPTION OF THE INVENTION This invention relates to a method for recovering high purity hydrogen gas from waste gas, such as coke oven gas, converter gas, and the like.
従」１辺」Ｌ術
一般に、高純度の水素ガスは油脂の水添、過酸化水素の
製造、半導体の製造および有機、無機化合物の水添およ
び還元用として化学工業の多くの分野で利用されている
。In general, high-purity hydrogen gas is used in many fields of the chemical industry for the hydrogenation of oils and fats, the production of hydrogen peroxide, the production of semiconductors, and the hydrogenation and reduction of organic and inorganic compounds. ing.
一方、コークス炉、転炉等から排出される廃ガスには水
素ガス分が多量に含まれているので、仮にこの水素ガス
を経済的、効率的に回収できれば、化学工業上非常に有
益である。On the other hand, waste gas discharged from coke ovens, converters, etc. contains a large amount of hydrogen gas, so if this hydrogen gas could be recovered economically and efficiently, it would be extremely beneficial for the chemical industry. .
従来、このような廃ガスから高純度の水素ガスを回収す
る方法としては、例えば特公昭６１−８００２号公報に
記載されているようなものが提案されている。このもの
は、廃ガスを８気圧以上に昇圧する工程と、該昇圧した
廃ガスから不純物を除去する工程と、不純物が除去され
た廃ガスから酸素含有水素ガスを分離する工程と、該酸
素含有水素ガスから酸素ガスを除去する工程と、を備え
た廃ガスからの高純度水素回収方法であって、前記酸素
ガス除去工程と、鉄族金属と希土類元素の酸化物と白金
族金属とからなる三元組成系の触媒に酸素含有水素ガス
を接触させて酸素ガスと水素ガスとを反応させ気体状の
水を生成するステップと、該水を含んだ高純度水素ガス
をモレキュラーシーブに接触させ該水を選択吸着して除
去するステップと、から構成している。Conventionally, as a method for recovering high-purity hydrogen gas from such waste gas, a method such as that described in Japanese Patent Publication No. 8002/1983 has been proposed, for example. This process includes a step of pressurizing waste gas to 8 atmospheres or higher, a step of removing impurities from the pressurized waste gas, a step of separating oxygen-containing hydrogen gas from the waste gas from which impurities have been removed, and a step of separating the oxygen-containing hydrogen gas from the waste gas from which impurities have been removed. A method for recovering high-purity hydrogen from waste gas, comprising a step of removing oxygen gas from hydrogen gas, the step of removing oxygen gas, an oxide of an iron group metal, a rare earth element, and a platinum group metal. A step of bringing oxygen-containing hydrogen gas into contact with a ternary composition catalyst to cause the oxygen gas and hydrogen gas to react to produce gaseous water; and a step of bringing the water-containing high-purity hydrogen gas into contact with a molecular sieve. It consists of a step of selectively adsorbing and removing water.
が
しかしながら、このような従来の方法にあっては、酸素
を除去するために酸素ガスと水素ガスとを反応させ水を
生成するようにしているので、このような水を吸着除去
するステップが前記反応ステップの後に必要となり、こ
れにより、回収装置が大型化するとともに、設備費も高
価となり、さらに信頼性も低下するという問題点がある
。However, in such conventional methods, in order to remove oxygen, oxygen gas and hydrogen gas are reacted to generate water, so the step of adsorbing and removing such water is not performed in the above-mentioned step. It is necessary after the reaction step, and as a result, there are problems in that the recovery device becomes larger, the equipment cost becomes expensive, and the reliability also decreases.
この発明は、設備が小をでかつ安価であり、また信頼性
が高い廃ガスからの高純度水素回収方法を提供すること
を目的とする。An object of the present invention is to provide a method for recovering high-purity hydrogen from waste gas, which requires small and inexpensive equipment and is highly reliable.
ための
このような目的は、廃ガスからの高純度水素回収方法に
おいて、酸素ガス除去工程と、担体に担持された還元状
態の鉄族金属、第ＩＩｂ族金属に酸素ガスを化学吸着さ
せることにより行うことで達成することができる。This purpose is to perform a high-purity hydrogen recovery method from waste gas by performing an oxygen gas removal step and chemically adsorbing oxygen gas onto reduced iron group metals and group IIb metals supported on a carrier. It can be achieved by doing.
１月
まず、コークス炉、転炉等からの廃ガスを８気圧以上に
昇圧した後、該外圧した廃ガスから不純物を除去する０
次いで、該廃ガスから酸素含有水素ガスを分離するが、
この分離工程も昇圧した状態で行なう０次に、酸素含有
水素ガスから酸素ガスを前述した昇圧状態下で除去する
が、この工程は、担体に担持された還元状態の鉄族金属
、第ＩＩｂ族金属に酸素ガスを化学吸着させることによ
り行なう、このように酸素ガスを化学吸着させることで
除去するようにしているので、この除去工程において水
が生成されるようなことはなく、この結果、該水の除去
のための設備が不要となる。First, waste gas from coke ovens, converters, etc. is pressurized to 8 atmospheres or more, and then impurities are removed from the externally pressurized waste gas.
Next, oxygen-containing hydrogen gas is separated from the waste gas,
This separation step is also carried out under increased pressure.Next, oxygen gas is removed from the oxygen-containing hydrogen gas under the aforementioned increased pressure. This is done by chemically adsorbing oxygen gas onto the metal.Since oxygen gas is removed by chemical adsorption, no water is produced in this removal process, and as a result, the Equipment for removing water becomes unnecessary.
このため、回収装置を小型化することができるとともに
、設備費を安価とすることができ、さらに信頼性を向上
させることもできる。Therefore, the collection device can be downsized, the equipment cost can be reduced, and the reliability can be improved.
叉ＪＬ医 以下、この発明の一実施例を図面に基づいて説明する。JL doctor Hereinafter, one embodiment of the present invention will be described based on the drawings.
第１図において、 １は昇圧工程であり、この昇圧工程
１にはコークス炉、転炉等から排出された廃ガスが供給
される。ここで、この廃ガスはコークス炉等から排出さ
れた当初においては水素以外の成分が多く含まれている
ため、常温まで冷却された後、タール除去、アンモニア
回収、軽油回収、ナフタリン回収、硫化水素除去等の多
くの精製工程を経た後、前記昇圧工程１に供給される。In FIG. 1, 1 is a pressure increasing step, and waste gas discharged from a coke oven, a converter, etc. is supplied to this pressure increasing step 1. When this waste gas is first discharged from a coke oven, etc., it contains many components other than hydrogen, so after it is cooled to room temperature, it undergoes tar removal, ammonia recovery, light oil recovery, naphthalene recovery, and hydrogen sulfide recovery. After passing through many purification steps such as removal, it is supplied to the pressurization step 1.
そして、この昇圧工程１に供給された廃ガスは往復動式
圧縮機あるいは遠心圧縮機により８気圧以上に昇圧され
る。ここで、このように廃ガスを８気圧以上に加圧する
のは、後述する不純物除去工程での主に芳香族物質から
なる不純物の除去と、また、水素ガス分離工程での吸着
等と、さらに、酸素ガス除去工程での酸素ガス除去を高
能率で行なわせるためである。なお、前記昇圧圧力は８
〜１０気圧が好ましい。The waste gas supplied to this pressurization step 1 is pressurized to 8 atmospheres or more by a reciprocating compressor or a centrifugal compressor. Here, the reason why the waste gas is pressurized to 8 atmospheres or more is to remove impurities mainly consisting of aromatic substances in the impurity removal process described later, and also for adsorption in the hydrogen gas separation process. This is to allow oxygen gas removal in the oxygen gas removal step to be performed with high efficiency. Note that the boost pressure is 8
~10 atmospheres is preferred.
このように昇圧された廃ガスは次に、不純物除去工程２
に送られる。この不純物除去工程２においては、前記廃
ガスを活性炭あるいはクレオソート油勢の吸着油に接触
させ、該廃ガス中から前記処理工程で取除くことのでき
なかった少量のＢＴＸ分、ナフタリン分、タール分等の
芳香族物質、さらには少量のダスト等の微粒子物質を除
去する。The waste gas pressurized in this way is then subjected to impurity removal step 2.
sent to. In this impurity removal step 2, the waste gas is brought into contact with activated carbon or creosote adsorption oil, and a small amount of BTX, naphthalene, and tar that could not be removed in the above treatment step is removed from the waste gas. It removes aromatic substances such as particles and even small amounts of particulate substances such as dust.
なお、この不純物除去は前記昇圧された圧力、即ち８気
圧以上で効率良く行なわれる。そして、このような不純
物除去工程２を経ることにより、次の水素ガス分離工程
３におけるモレキュラーシーブの被毒や目詰まりが防止
される。Note that this impurity removal is efficiently carried out at the increased pressure, that is, at 8 atmospheres or more. By going through such an impurity removal step 2, poisoning and clogging of the molecular sieve in the next hydrogen gas separation step 3 is prevented.
このように不純物が除去された廃ガスは次に、水素ガス
分離工程３へと供給されるが、この水素ガス分離工程３
に供給される時点における廃ガス中には、メタン、−酸
化炭素ガス、二酸化炭素ガスおよび微量の酸素ガス等が
含まれている。そして、この水素ガス分離工程３におい
ては公知のモレキュラーシーブ法を適用して、前記昇圧
状態下で水素ガス、酸素ガス以外のガスを吸着し、酸素
含有水素ガスを分離する。ここで、モレキュラーシーブ
法とは、処理すべき水素ガスおよびそれ以外のガス成分
を含む混合ガス中の除去すべき各成分に適した吸着剤の
混合物により水素ガス以外のガス成分を加圧下で選択吸
着除去し、高純度の水素ガスを得る方法である。なお、
この水素ガス分離工程３において、混合ガス中に ３〜
１０ ｐｐｍ程度へまれでいる酸素ガスを吸着除去する
ことも考えられるが、このようにすると、装置が極めて
大型化し設備費も膨大なものとなるので、この酸素ガス
の除去は水素ガス分離工程３では行なわず、水素ガス分
離工程３から切り離して以下説明するように水素ガス分
離工程３の直後に行なう。The waste gas from which impurities have been removed in this way is then supplied to the hydrogen gas separation step 3.
The waste gas at the time it is supplied contains methane, carbon oxide gas, carbon dioxide gas, trace amounts of oxygen gas, and the like. In this hydrogen gas separation step 3, a well-known molecular sieve method is applied to adsorb gases other than hydrogen gas and oxygen gas under the increased pressure, and to separate oxygen-containing hydrogen gas. Here, the molecular sieve method refers to the selection of gas components other than hydrogen gas under pressure using a mixture of adsorbents suitable for each component to be removed in a mixed gas containing hydrogen gas to be treated and other gas components. This is a method to obtain high-purity hydrogen gas by adsorption and removal. In addition,
In this hydrogen gas separation step 3, 3~
It is possible to adsorb and remove oxygen gas, which is as rare as about 10 ppm, but this would result in an extremely large equipment and an enormous equipment cost. Instead, it is separated from the hydrogen gas separation step 3 and carried out immediately after the hydrogen gas separation step 3 as described below.
次に、酸素ガスを前述のように３〜１０ ｐｐｍ程度含
む水素ガス、即ち酸素含有水素ガスは、酸素ガス除去工
程４に供給される。この酸素ガス除去工程４を実施する
ための装置としては、例えば第２図に示すような廃ガス
を導くメインバイブ８お゛よび二のメインバイブ８の途
中に設置された吸着塔８が用いられる。そしてこの吸着
塔９内には、担体およびこの担体に担持された吸着金属
から構成される吸着剤が錠剤状に固められた状態で多数
個収納されている。ここで、前記担体としては、例えば
シリカ、アルミナ、けいそう土等が挙げられ、また、吸
着金属としては、還元状態の鉄属金属、例えば鉄、ニッ
ケルの単体、あるいは還元状態の第ｍｂ族金属、例えば
亜鉛の単体、さらにはこれら鉄属金属、第ＩＩｂ族金属
の混合物が挙げられる。Next, the hydrogen gas containing about 3 to 10 ppm of oxygen gas as described above, that is, the oxygen-containing hydrogen gas, is supplied to the oxygen gas removal step 4. As a device for carrying out this oxygen gas removal step 4, for example, a main vibe 8 for guiding waste gas and an adsorption tower 8 installed in the middle of the second main vibe 8 as shown in FIG. 2 are used. . In the adsorption tower 9, a large number of adsorbents composed of a carrier and an adsorbed metal supported on the carrier are stored in a solidified tablet form. Here, examples of the carrier include silica, alumina, diatomaceous earth, etc., and examples of the adsorbed metal include ferrous metals in a reduced state, such as elemental iron and nickel, or group MB metals in a reduced state. Examples include zinc as a simple substance, and mixtures of these iron metals and Group IIb metals.
そして、常温の酸素含有水素ガスは吸着塔９内を通過す
るとき前述した吸着金属に接触するが、このとき、酸素
ガスのみが吸着金属に選択的に化学吸着されて水素ガス
中から除去され、一方、この化学吸着により吸着金属は
酸化物、例えば酸化ニッケル、酸化亜鉛となる。このよ
うにして酸素含有水素ガスから酸素ガスだけが選択吸着
され、吸着塔９から酸素ガス濃度が１ ｐｐｍ以下とな
った高純度の製品水素ガスが導出される。１２は吸着塔
９の直前のメインバイブ８に先端が接続された第１副バ
イブであり、この第１副バイブ１２の基端は昇圧工程１
の直後のバイブに接続されている。そして、この第１副
バイブ１２の途中には第１副バイブ１２内を通過する廃
ガスを加熱する再生用ヒーター１３が設置されている。When the oxygen-containing hydrogen gas at room temperature passes through the adsorption tower 9, it comes into contact with the adsorbed metal described above, but at this time, only the oxygen gas is selectively chemically adsorbed by the adsorbed metal and removed from the hydrogen gas. On the other hand, due to this chemisorption, the adsorbed metal becomes an oxide, such as nickel oxide or zinc oxide. In this way, only oxygen gas is selectively adsorbed from the oxygen-containing hydrogen gas, and high purity product hydrogen gas with an oxygen gas concentration of 1 ppm or less is led out from the adsorption tower 9. 12 is a first sub-vibrator whose tip end is connected to the main vibrator 8 immediately before the adsorption tower 9;
It is connected to the vibrator immediately after. A regeneration heater 13 that heats the waste gas passing through the first sub-vibrator 12 is installed in the middle of the first sub-vibrator 12 .
また、１４は吸着塔９の直後のメインバイブ８に先端が
接続された第２副バイブであり、この第２副バイブ１４
の基端は昇圧工程１の直前のパイプに接続されている。Further, 14 is a second sub-vibrator whose tip is connected to the main vibrator 8 immediately after the adsorption tower 9;
The base end of is connected to the pipe immediately before the pressure increasing step 1.
そして、この第２副バイブ１４の途中には第２副バイブ
１４内を通過する廃ガスを冷却する再生用クーラー１５
が設置されている。なお、１６．１７．１８．１９はバ
ルブである。そして、前述のような装置を長期間、例え
ば１年程度連続運転すると、前記吸着金属の化学吸着が
ほぼ飽和してくる。この場合には、バルブ１６．１７を
閉止した後、バルブ１８．１９を開放する。In the middle of this second sub-vibrator 14, there is a regeneration cooler 15 that cools the waste gas passing through the second sub-vibrator 14.
is installed. Note that 16, 17, 18, and 19 are valves. When the above-mentioned apparatus is continuously operated for a long period of time, for example, about one year, the chemical adsorption of the adsorbed metal becomes almost saturated. In this case, after closing valves 16.17, valves 18.19 are opened.
この結果、再生用ヒーター１３によって加熱された廃ガ
スが吸着塔９内に供給され、吸着塔９内の酸化された吸
着金属は廃ガス中の高濃度水素ガスに接触して還元され
る。このとき、廃ガスは還元を能率良く行なわせるため
、吸着金属がニッケルの場合は１５０〜５００℃程度に
、亜鉛の場合は４００〜７００℃程度に加熱される。な
お、吸着塔９を通過した廃ガスは再生用クーラー１５に
よって常温まで冷却された後、第２副バイブ１４を通じ
て昇圧工程１の直前に戻される。ここで、従来技術にあ
っては、脱湿塔を複数基設け、ある塔によって脱湿操作
を行っているとき、他の塔の再生操作を行うよう必要が
あるが、この実施例のものでは、吸着塔９を１基設け、
年に１度程度該吸着塔９の還元作業を行うだけで製品水
素ガスを連続して回収することができ、装置がさらに小
皿化するとともに設備費も安価となる。As a result, the waste gas heated by the regeneration heater 13 is supplied into the adsorption tower 9, and the oxidized adsorbed metal in the adsorption tower 9 is reduced by contacting the high concentration hydrogen gas in the waste gas. At this time, the waste gas is heated to about 150 to 500° C. if the adsorbed metal is nickel, and to about 400 to 700° C. if the adsorbed metal is zinc, in order to efficiently perform the reduction. Note that the waste gas that has passed through the adsorption tower 9 is cooled to room temperature by the regeneration cooler 15 and then returned through the second sub-vibrator 14 immediately before the pressurization step 1. Here, in the conventional technology, when a plurality of dehumidification towers are provided and one tower performs dehumidification operation, it is necessary to perform regeneration operation on the other towers, but in this embodiment, it is necessary to perform regeneration operation on the other towers. , one adsorption tower 9 is installed,
Product hydrogen gas can be continuously recovered by performing reduction work on the adsorption tower 9 about once a year, and the equipment can be made smaller and the equipment cost can be reduced.
ｌ豆立濫１
以上説明したように、この発明によれば、設備を小型で
かつ安価とすることができ、また信頼性を向上させるこ
ともできる。1 As explained above, according to the present invention, equipment can be made small and inexpensive, and reliability can also be improved.
第１図はこの発明の一実施例を示す全体系統図、第２図
は酸素ガス除去工程を実施する装置の一例を示す記号で
表わされた全体図である。
１・・・昇圧工程
２・・・不純物除去工程
３・・・水素ガス分離工程
４・・・酸素ガス除去工程
特許出願人 コスモエンジニアリング株式会社代理人
弁理士 多 １）敏 雄
第
図
１ 昇圧工程
２ 不純物除去工程FIG. 1 is an overall system diagram showing an embodiment of the present invention, and FIG. 2 is an overall diagram represented by symbols showing an example of an apparatus for carrying out an oxygen gas removal process. 1...Pressure increase process 2...Impurity removal process 3...Hydrogen gas separation process 4...Oxygen gas removal process Patent applicant Cosmo Engineering Co., Ltd. Agent
Patent Attorney Tao 1) Toshio Figure 1 Pressure increase process 2 Impurity removal process
Claims (2)
た廃ガスから不純物を除去する工程と、不純物が除去さ
れた廃ガスから酸素含有水素ガスを分離する工程と、該
酸素含有水素ガスから酸素ガスを除去する工程と、を備
えた廃ガスからの高純度水素回収方法において、前記酸
素ガス除去工程を、担体に担持された還元状態の鉄族金
属に酸素ガスを化学吸着させることにより行うようにし
たことを特徴とする廃ガスからの高純度水素回収方法。(1) A step of pressurizing waste gas to 8 atmospheres or higher, a step of removing impurities from the pressurized waste gas, a step of separating oxygen-containing hydrogen gas from the waste gas from which impurities have been removed, and a step of separating the oxygen-containing hydrogen gas from the waste gas with impurities removed. A method for recovering high-purity hydrogen from waste gas, comprising: removing oxygen gas from the gas, wherein the oxygen gas removing step is performed by chemically adsorbing oxygen gas onto a reduced iron group metal supported on a carrier. A method for recovering high-purity hydrogen from waste gas, characterized in that the method is performed by:
うにした請求項１記載の廃ガスからの高純度水素回収方
法。(2) The method for recovering high-purity hydrogen from waste gas according to claim 1, wherein a group IIb metal is used instead of the iron group metal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2154929A JPH0446001A (en) | 1990-06-13 | 1990-06-13 | Method for recovering high purity hydrogen from waste gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2154929A JPH0446001A (en) | 1990-06-13 | 1990-06-13 | Method for recovering high purity hydrogen from waste gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0446001A true JPH0446001A (en) | 1992-02-17 |
Family
ID=15595032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2154929A Pending JPH0446001A (en) | 1990-06-13 | 1990-06-13 | Method for recovering high purity hydrogen from waste gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0446001A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0781901A (en) * | 1993-09-16 | 1995-03-28 | Taiyo Sanso Co Ltd | Method for purifying gaseous hydride or gas obtained by diluting the same |
| KR20000040628A (en) * | 1998-12-18 | 2000-07-05 | 신현준 | Adsorbent for high-boiling point hydrocarbons and method for continuous removal of hydrocarbons using the same adsorbent |
| JP2012518521A (en) * | 2008-01-07 | 2012-08-16 | ロマックス、フランクリン・デー． | Apparatus and method for absorbing PAH from a gas stream |
-
1990
- 1990-06-13 JP JP2154929A patent/JPH0446001A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0781901A (en) * | 1993-09-16 | 1995-03-28 | Taiyo Sanso Co Ltd | Method for purifying gaseous hydride or gas obtained by diluting the same |
| KR20000040628A (en) * | 1998-12-18 | 2000-07-05 | 신현준 | Adsorbent for high-boiling point hydrocarbons and method for continuous removal of hydrocarbons using the same adsorbent |
| JP2012518521A (en) * | 2008-01-07 | 2012-08-16 | ロマックス、フランクリン・デー． | Apparatus and method for absorbing PAH from a gas stream |
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