JPH0446540U

JPH0446540U -

Info

Publication number: JPH0446540U
Application number: JP8928590U
Authority: JP
Priority date: 1990-08-27
Filing date: 1990-08-27
Publication date: 1992-04-21

Description

[Brief explanation of the drawing]

第１図は本考案の１実施例を示す断面概略図、
第２図は同前平面図、第３図、第４図は従来例の
１つを示すもので第３図は第４図のＡ−Ａ矢視図
、第４図は第２図のＢ−Ｂ矢視図、第５図、第６
図は他の従来例を示すもので、第５図は第６図の
Ｃ−Ｃ矢視図、第６図は第５図のＤ−Ｄ矢視図で
ある。７は電極板、２１はウエーハ、３１，３２は伝
熱盤、３３は流油路、３９は配管、４２は熱交換
器、４３はヒータを示す。 FIG. 1 is a cross-sectional schematic diagram showing one embodiment of the present invention;
Fig. 2 is a front plan view of the same, Fig. 3 and Fig. 4 show one of the conventional examples, Fig. 3 is a view taken along arrow A-A in Fig. 4, and Fig. 4 is a view taken from B in Fig. 2. -B arrow view, Figure 5, Figure 6
The figures show another conventional example, in which FIG. 5 is a view along the line CC in FIG. 6, and FIG. 6 is a view along the line D-D in FIG. 7 is an electrode plate, 21 is a wafer, 31 and 32 are heat transfer plates, 33 is an oil passage, 39 is a pipe, 42 is a heat exchanger, and 43 is a heater.

Claims

[Scope of utility model registration request]

In electrodes of wafer processing equipment that performs processes such as dry etching and CVD, an electrode plate on which a wafer is placed is attached to a heat transfer plate, an oil passage is formed on the heat exchange plate, and an oil passage is formed in the oil passage. An electrode for a wafer processing apparatus, characterized in that a heating medium oil is circulated and a cooling/heating device is provided in the oil circulation path.