JPH044654B2 - - Google Patents

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Publication number
JPH044654B2
JPH044654B2 JP61247864A JP24786486A JPH044654B2 JP H044654 B2 JPH044654 B2 JP H044654B2 JP 61247864 A JP61247864 A JP 61247864A JP 24786486 A JP24786486 A JP 24786486A JP H044654 B2 JPH044654 B2 JP H044654B2
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Prior art keywords
film
magnetic
base film
alloy
substrate
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JPS63102033A (en
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Description

【発明の詳細な説明】[Detailed description of the invention]

利用産業分野 この発明は、非磁性基板上に、成膜する下地膜
を介して磁性薄膜を設けてなる磁気デイスク等に
用いられる磁気記録媒体の改良に係り、特に下地
膜をbcc構造を有しない結晶構造からなる非磁性
もしくは弱磁性のFe−Cr合金膜にて形成し、経
済性にすぐれ、厚い下地膜であつてもクラツクや
剥離がなく、また、下地膜と磁性膜の成膜インタ
ーバルを長く設定でき、各膜の成膜条件の適正化
を計ることができる磁気記録媒体に関する。 背景技術 磁性デイスク装置は、コンピユータ等の情報処
理システムにおける記憶装置として多用されてい
る。今日では、情報処理能力を高めるため、磁気
デイスク装置の高密度、大容量化が望まれてお
り、磁気デイスクの磁気記録層として、スパツタ
リング、イオンプレーテイングなどによる金属薄
膜が実用化されつつある。 かかる磁気記録媒体として、非磁性基板上に、
Cr膜を形成した後、該Cr膜上にCo膜を、スパツ
タ法や蒸着法にて形成した構成が知られている。 この磁気記録媒体は、面内方向で高い保磁力を
有し、面内記録型の磁気デイスクに用いられてい
る。 さらに、前記のCo膜に変えて、磁性膜にCo−
Ni膜、Co−Ni−Cr膜を用いた磁気記録媒体が知
られている。 一方、下地膜には、前記のいずれの組成の磁性
膜にもかかわらず、Cr膜が用いられ、Co系磁性
膜の面内配向を促進し、保磁力を増大させるため
に用いられている。 しかし、かかるCr下地膜は、その保磁力を増
大させるためには、磁性膜厚みの500Å〜800Åに
比べて、遥かに厚い2000Å〜6000Åの膜厚に被着
形成する必要がある。 従つて、高価なCrを多量に消費するため、そ
のコストが増大し、また、Crが本質的に脆化し
易く、膜厚が比較的厚い場合は、基板との熱膨脹
係数差や成膜時の内部応力等により、微細なクラ
ツクを招来し易いことから、磁気記録媒体の下地
膜としての靭性、強度に欠けるという問題点があ
つた。 また、スバツタ法において、基板にCrを被着
したのち、磁性膜を被着するまでのインターバル
(間隔時間)が長いと、大きな保磁力が得難いと
いう問題があつた。 この原因としては、Crは酸素と結合し易く、
アルゴンガス中の残留酸素がCrに吸着されて、
磁性膜のエピタキシヤル成長を阻害するためであ
ると考えられている。 従つて、従来は、基板上に成膜する際、Cr下
地膜とその上の磁性膜との成膜インターバルを、
1分以下、望ましくは10秒以内にする必要があ
り、例えば、製造装置もかかる要請から大きな制
約を受け、各被膜の成膜に各々最適の条件を取る
ことが困難であつた。 発明の目的 この発明は、非磁性基板上に下地膜を介して磁
性膜を設けた磁気デイスクなどに用いられる磁気
記録媒体において、従来のCr下地膜の問題点を
解消し、Cr下地膜と同様の磁性膜の保磁力増大
効果を有し、Cr下地膜に比べて経済性にすぐれ、
成膜インターバルを比較的長く取ることができ、
かつクラツク発生や剥離の問題がない新規な下地
膜を有する磁気記録媒体を目的としている。 発明の構成と効果 この発明は、従来のCr下地膜の問題を解消で
きる新規な下地膜を有する磁気記録媒体を目的に
種々検討した結果、非磁性基板の少なくとも下地
膜の被成膜表面がガラスからなるとともに従来の
純Cr下地膜に代えて、bcc構造を有しない所謂平
衡相とは異なる結晶構造を有すると考えられる非
磁性もしくは弱磁性のFe−Cr合金膜を用いるこ
とにより、従来のCr下地膜に比べて経済性にす
ぐれ、成膜インターバルを長く取ることができ、
かつクラツク発生や剥離の問題が少ない磁気記録
媒体が得られることを知見し、この発明を完成し
たものである。 すなわち、この発明は、 非磁性基板上に、下地膜及び磁性膜を積層被膜
した磁気記録媒体において、 非磁性基板の少なくとも下地膜の被成膜表面が
ガラスからなり、 前記下地膜が、Cr30wt%〜70wt%、残部Feか
らなり、bcc構造を有しない結晶構造からなる非
磁性もしくは弱磁性合金膜であることを特徴とす
る磁気記録媒体である。 さらに、詳述すると、磁気記録媒体の下地膜
は、磁性膜の面内配向を促進し、磁性膜に大きな
保磁力を付与する目的で設けられるため、かかる
下地膜が強磁性であると、磁気的相互作用によ
り、例えば、下地膜の保磁力が数Oe〜数+Oeと
低い場合は、磁性膜の保磁力も100Oeないし
200Oe程度と小さくなり、磁性膜の特性も劣化さ
せることが知られている。 ところで、公知のFe−Cr合金膜は、Cr含有が
70wt%程度まで、常温で強磁性を示すことが知
られており、上記説明からも明らかな如く、従
来、磁気記録媒体の下地膜としては、適用不可能
と考えられていた。 しかし、発明者らは、種々実験の結果、非磁性
基板の少なくとも下地膜の被成膜表面がガラスか
らなるとともにCr30wt〜70wt%、残部Feからな
るFe−Cr合金膜を、平板RFマグネトロンスパツ
タ法などの後述する如き条件のRFスパツタ法に
て基板上に成膜すると、磁気記録媒体用下地膜と
して、Cr膜に比べてすぐれた特性を有し、実質
的に非磁性膜となることを知見したものである。 この発明において、非磁性もしくは弱磁性と
は、実質的非磁性、すなわち、磁性膜の磁気特性
を著しく損なつたりあるいは磁気ヘツドの再生信
号に影響を及ぼしたりすることのない程度の実用
的な非磁性もしくは弱磁性も意味している。 従つて、下地膜が、非磁性相と若干の強磁性相
との混合相から構成されていても、全体として数
emu/g程度の磁化を有する程度であれば実用上
問題ないと考えられる。 この発明による下地膜のFe−Cr合金が、実質
的な非磁性を示す理由は、明白ではないが、後述
する実施例1にて示す如く、Fe−40Cr合金膜
(第2表の試料No.1)及びFe−50Cr合金膜(第2
表の試料No.2)は、磁化値1.2emu/g以下を示
している。 また、第1図a図に、この発明によるFe−
40Cr合金下地膜(第2表の試料No.1)のX線回
折結果を示す如く、公知のFe−40Cr合金(前記
薄膜のターゲツト試料No.3)の回折結果(第1図
b図)と比較して回折ピークの角度(2θ)が著し
く異なり、特別の結晶構造を有するか、もしくは
既知の平衡相とは異なる結晶構造を有するものが
含まれているであろうと考えられる。 すなわち、第1表に示す如く、この発明の合金
膜とほぼ同組成を有するターゲツト材は第1図b
図で得られた回析ピークより計算した面間隔が、
文献値のCrやFeのそれとほぼ一致しており、こ
の結晶構造はbcc(体心立方晶)構造を有してい
ることが分かる。 これに対して、この発明の合金膜の面間隔は、
第1図a図で得られた回析ピークより計算した結
果を示す第1表に明らかな如く、文献値のCrや
Feのそれとは一致せず、また近い組成を有する
Fe−46.5%Cr(σ相)のそれとも一致しないこと
から、既知の平衡相の結晶構造とは全く異なる、
bcc構造を有しない結晶構造であることが分か
る。
Field of Application This invention relates to the improvement of magnetic recording media used in magnetic disks, etc., in which a magnetic thin film is provided on a non-magnetic substrate via a base film to be formed, and in particular the base film does not have a BCC structure. Formed from a non-magnetic or weakly magnetic Fe-Cr alloy film with a crystalline structure, it is highly economical, does not cause cracks or peeling even with a thick base film, and has a short deposition interval between the base film and magnetic film. The present invention relates to a magnetic recording medium that can be set for a long time and that can optimize the film forming conditions for each film. BACKGROUND ART Magnetic disk devices are frequently used as storage devices in information processing systems such as computers. Nowadays, in order to increase information processing ability, it is desired that magnetic disk devices have higher density and larger capacity, and metal thin films formed by sputtering, ion plating, etc. are being put into practical use as magnetic recording layers of magnetic disks. As such a magnetic recording medium, on a non-magnetic substrate,
A configuration is known in which a Cr film is formed and then a Co film is formed on the Cr film by a sputtering method or a vapor deposition method. This magnetic recording medium has a high coercive force in the in-plane direction and is used in in-plane recording type magnetic disks. Furthermore, instead of the above-mentioned Co film, Co-
Magnetic recording media using Ni films and Co-Ni-Cr films are known. On the other hand, a Cr film is used as the base film, regardless of the magnetic film composition described above, and is used to promote in-plane orientation of the Co-based magnetic film and increase coercive force. However, in order to increase the coercive force, such a Cr underlayer needs to be deposited to a thickness of 2000 Å to 6000 Å, which is much thicker than the magnetic film thickness of 500 Å to 800 Å. Therefore, a large amount of expensive Cr is consumed, increasing the cost. Also, Cr is inherently prone to embrittlement, and if the film is relatively thick, there may be a difference in thermal expansion coefficient with the substrate or during film formation. Since it tends to cause minute cracks due to internal stress, etc., it has the problem of lacking toughness and strength as a base film for magnetic recording media. Furthermore, in the sputtering method, there was a problem in that it was difficult to obtain a large coercive force if the interval (interval time) between depositing Cr on the substrate and depositing the magnetic film was long. The reason for this is that Cr easily combines with oxygen,
Residual oxygen in argon gas is adsorbed by Cr,
It is thought that this is because it inhibits the epitaxial growth of the magnetic film. Therefore, conventionally, when forming a film on a substrate, the film forming interval between the Cr base film and the magnetic film thereon was set as follows:
The deposition time needs to be within 1 minute, preferably within 10 seconds. For example, manufacturing equipment is also subject to significant restrictions due to this requirement, making it difficult to find optimal conditions for forming each film. Purpose of the Invention The present invention solves the problems of conventional Cr underlayers in magnetic recording media used in magnetic disks, etc., in which a magnetic film is provided on a non-magnetic substrate via an underlayer, and is similar to the Cr underlayer. It has the effect of increasing the coercive force of the magnetic film, and is more economical than the Cr underlayer.
The film deposition interval can be relatively long,
The object of the present invention is to provide a magnetic recording medium having a new underlayer film that is free from cracking and peeling problems. Structure and Effects of the Invention As a result of various studies aimed at creating a magnetic recording medium having a novel underlayer that can solve the problems of conventional Cr underlayers, the present invention has revealed that at least the surface of the non-magnetic substrate on which the underlayer is formed is made of glass. By using a nonmagnetic or weakly magnetic Fe-Cr alloy film, which is thought to have a crystal structure different from the so-called equilibrium phase, which does not have a bcc structure, in place of the conventional pure Cr underlayer, It is more economical than the base film and allows for longer film deposition intervals.
The present invention was completed based on the finding that a magnetic recording medium with fewer problems of cracking and peeling can be obtained. That is, the present invention provides a magnetic recording medium in which a base film and a magnetic film are layered on a non-magnetic substrate, wherein at least the surface of the non-magnetic substrate on which the base film is formed is made of glass, and the base film is made of 30wt% Cr. This magnetic recording medium is characterized in that it is a nonmagnetic or weakly magnetic alloy film consisting of ~70wt%, the balance being Fe, and having a crystal structure that does not have a bcc structure. Furthermore, in detail, since the base film of a magnetic recording medium is provided for the purpose of promoting in-plane orientation of the magnetic film and imparting a large coercive force to the magnetic film, if the base film is ferromagnetic, the magnetic Due to the interaction between
It is known that it becomes as small as about 200 Oe and also deteriorates the characteristics of the magnetic film. By the way, the known Fe-Cr alloy film contains Cr.
It is known that up to about 70 wt%, it exhibits ferromagnetism at room temperature, and as is clear from the above explanation, it was conventionally thought that it could not be used as an underlayer for magnetic recording media. However, as a result of various experiments, the inventors found that at least the surface of the base film of the nonmagnetic substrate was made of glass, and an Fe-Cr alloy film made of 30wt% to 70wt% Cr and the balance Fe was deposited on a flat plate RF magnetron sputtering method. When a film is formed on a substrate using the RF sputtering method under the conditions described below, it has superior properties compared to a Cr film as an underlayer film for magnetic recording media, and becomes a substantially non-magnetic film. This is what I found out. In this invention, non-magnetic or weakly magnetic means substantially non-magnetic, that is, practically non-magnetic to the extent that it does not significantly impair the magnetic properties of the magnetic film or affect the reproduction signal of the magnetic head. It also means magnetic or weakly magnetic. Therefore, even if the base film is composed of a mixed phase of a non-magnetic phase and some ferromagnetic phase, the overall
It is considered that there is no practical problem as long as the magnetization is on the order of emu/g. The reason why the Fe-Cr alloy of the underlayer film according to the present invention exhibits substantial non-magnetism is not clear, but as shown in Example 1 below, Fe-40Cr alloy film (Sample No. in Table 2) 1) and Fe-50Cr alloy film (second
Sample No. 2) in the table shows a magnetization value of 1.2 emu/g or less. In addition, Fig. 1a shows Fe-
As shown in the X-ray diffraction results of the 40Cr alloy base film (sample No. 1 in Table 2), the diffraction results of the known Fe-40Cr alloy (target sample No. 3 of the thin film) (Fig. 1 b) In comparison, the angles (2θ) of the diffraction peaks are significantly different, and it is thought that some particles have a special crystal structure or a crystal structure different from that of the known equilibrium phase. That is, as shown in Table 1, the target material having almost the same composition as the alloy film of the present invention is shown in Figure 1b.
The interplanar spacing calculated from the diffraction peaks obtained in the figure is
This almost matches the literature values for Cr and Fe, and it can be seen that this crystal structure has a bcc (body-centered cubic) structure. On the other hand, the interplanar spacing of the alloy film of this invention is
As is clear from Table 1, which shows the results calculated from the diffraction peaks obtained in Figure 1a, the literature values of Cr and
Does not match that of Fe, and has a similar composition
Since it does not match that of Fe-46.5%Cr (σ phase), it is completely different from the known equilibrium phase crystal structure.
It can be seen that the crystal structure does not have a bcc structure.

【表】【table】

【表】 発明の好ましい実施態様 この発明における磁気記録媒体の基板には、少
なくとも下地被膜表面にガラスを形成した構成で
あればいずれの材質でも良く、例えば、ガラスコ
ーテイングされたアルミニウム基板の他、アルミ
ナ、炭化けい素、炭化チタン、ジルコニア、窒化
けい素、アルミナ一酸化けい素などの各種セラミ
ツクスにガラスクレージングした基板、さらに、
強化ガラスや結晶化ガラスなどを用いることがで
きる。 また、この発明の磁気記録媒体の特徴である
Fe−Cr下地膜には、基板の材質や下地膜の上に
被着する磁性層の組成等に応じて、Cr含有量を
適宜選定して用いることができるが、Crが30wt
%未満の場合は、形成された膜が強磁性となり、
Crが70wt%を越える場合には膜の靭性や強度が
低下するので好ましくない。望ましくは、Crは
35wt%〜60wt%、さらに望ましくは38wt%〜
50wt%が良い。 また、下地膜のFe−Cr合金の添加元素として
は、下地膜をより完全な非磁性にするの目的で、
Cu、Mn、Ru、Mo、W、V、Nb、Ta、Ti、
Zr、Hf、Al、Si等のうち単独または複合して添
加したり、磁性膜の磁気特性を向上させたり、下
地膜の靭性、耐食性及び強度の向上等の目的で、
Co、Cu、Ni、Mn、Ru、Mo、W、V、Nb、
Ta、Ti、Zr、Hf、Al、Si等のうち単独または複
合して添加することが可能であるが、これらの添
加元素が総量で30wt%を越えると、下地膜の靭
性、強度がかえつて低下したり、磁性膜の保持力
増大効果を失つたりするので、30wt%以下にす
る必要がある。 また、この発明による非磁性もしくは弱磁性
Fe−Cr合金下地膜の厚さは、一般に厚い程、磁
性膜の保磁力が増大する効果があり、少なくとも
500Å以上で10000Å以下、さらに望ましくは2000
Å〜5000Å程度が良い。 次に、磁性膜は、Co、Co−Ni、Co−Ni−Cr、
Co−Pt合金等のhop構造からなり、面内磁気異方
性を有する硬質磁性膜であれば、いずれの合金も
成膜することができる。また、下地膜に対する磁
性膜のエピタキシヤル性を高めるために、各種の
添加元素を添加することは、磁気特性を高めるた
めに有効な手段である。磁性膜の膜厚も従来から
使用されている薄膜媒体と同様に数百〜2000Å程
度に適宜選定すれば良い。 また、必要に応じて、磁性膜の上に公知の各種
保護膜を適宜選定し、(例えばカーボン膜、SiO2
膜、その他のセラミツク膜等)百〜数百Å設ける
ことは、媒体の長寿命化に有効であり、さらに、
潤滑膜を塗布しても良い。 この発明の下地膜の形成方法としては、特に、
平板RFマグネトロンスパツタ法等のRFスパツタ
法が有効である。 また、下地膜の成膜スパツタ法の条件として
は、スパツタガス圧が1〜100mTorr、基板温度
は室温〜400℃以下が望ましい。 また、磁性膜、保護膜はスパツタ法の他、蒸着
法、イオンプレーテイング法、プラズマCVD法
等の公知の成膜法を適宜選定して製造することが
できる。 また、下地膜と磁性膜との成膜のインターバル
(間隔時間)は、できるだけ短いことが磁性特性
向上の点から望ましいとされているが、この発明
による非磁性もしくは弱磁性Fe−Cr下地膜は、
Cr膜に比べ活性度が低く、実施例に示す如く、
数分間のインターバルを取ることができるため、
例えば、スパツタ法において、下地膜と磁性膜の
成膜槽をバルブによつて仕切り、下地膜の成膜条
件と磁性膜の成膜条件をそれぞれ最適条件とする
ことができる。 実施例 実施例 1 外径130mm、内径40mm、厚み1.2mmのAl2O3基板
に、20μm厚みのガラスグレーズを施し、表面を
研摩した後、平板RFマグネトロンスパツタ装置
を用い、下記条件にて、第1表に示す組成からな
る2種のターゲツトを使用し、基板ガラスグレー
ズ表面に、Fe−Cr合金下地膜を被膜した。 到達真空度;1〜2×10-6Torr スパツタ時雰囲気;99.99%Ar 6mTorr 投入電力;300W 極間隔;70mm 基板温度;100℃ また、比較のため、平板DCマグネトロンスパ
ツタ装置を用い、上記条件でFe−Cr合金下地膜
を被膜した。 基板に被膜させた各々のFe−Cr合金下地膜の
組成と磁化値及び膜厚を第2表に示す。 なお、分析は合金膜にはX線マイクロアナライ
ザー、ターゲツトにはプラズマ発光分光分析装置
及びガス分析装置を用いた。 表中、合金膜については、Fe、Cr以外の元素
は検出限界以下であつた。また、ターゲツトのそ
の他の元素とは、Ni、Mg、Al、P等であり、い
ずれも0.04wt%以下であつた。また、磁性特性の
測定には、振動試料型磁力計を用いた。 第2表の結果から明らかなように、この発明に
よるFe−Cr合金下地膜(試料No.1、2)は、
1.2emu/g以下の磁化値を示し、下地膜として
不可欠な実質的な非磁性膜であることが分る。ま
た、下地膜の組成比とターゲツトの組成比は実質
的に同等であることが分る。なお、1.2emu/g
以下と表示したのは測定限界のためである。 一方、比較例(試料No.5、6)の平板DCマグ
ネトロンスパツタ装置を用いて作成した合金下地
膜は、組成比としてはこの発明の合金膜とほぼ同
一であるが、磁化が80〜93emu/gとターゲツト
材とほぼ同様な強磁性体であることが分かる。
[Table] Preferred Embodiments of the Invention The substrate of the magnetic recording medium in this invention may be made of any material as long as it has a structure in which glass is formed at least on the surface of the base film. For example, in addition to an aluminum substrate coated with glass, alumina , substrates made of various ceramics such as silicon carbide, titanium carbide, zirconia, silicon nitride, alumina and silicon monoxide, and glass crazing.
Tempered glass, crystallized glass, etc. can be used. Furthermore, the magnetic recording medium of the present invention is characterized by
The Cr content of the Fe-Cr underlayer can be selected as appropriate depending on the material of the substrate and the composition of the magnetic layer deposited on the underlayer.
If it is less than %, the formed film becomes ferromagnetic,
If Cr exceeds 70 wt%, it is not preferable because the toughness and strength of the film decrease. Preferably, Cr is
35wt%~60wt%, more preferably 38wt%~
50wt% is good. In addition, as elements added to the Fe-Cr alloy of the base film, for the purpose of making the base film more completely non-magnetic,
Cu, Mn, Ru, Mo, W, V, Nb, Ta, Ti,
Zr, Hf, Al, Si, etc. may be added singly or in combination to improve the magnetic properties of the magnetic film, or to improve the toughness, corrosion resistance, and strength of the underlying film.
Co, Cu, Ni, Mn, Ru, Mo, W, V, Nb,
It is possible to add Ta, Ti, Zr, Hf, Al, Si, etc. singly or in combination, but if the total amount of these additive elements exceeds 30wt%, the toughness and strength of the base film will deteriorate. It is necessary to keep it below 30wt%, since the coercive force increasing effect of the magnetic film may be lost. In addition, non-magnetic or weakly magnetic
Generally speaking, the thicker the Fe-Cr alloy base film is, the greater the coercive force of the magnetic film is.
500Å or more and 10000Å or less, more preferably 2000Å
Approximately Å to 5000 Å is good. Next, the magnetic film is Co, Co-Ni, Co-Ni-Cr,
Any alloy can be formed as long as it is a hard magnetic film that has a hop structure such as a Co--Pt alloy and has in-plane magnetic anisotropy. Further, in order to improve the epitaxial properties of the magnetic film with respect to the underlying film, adding various additive elements is an effective means for improving the magnetic properties. The thickness of the magnetic film may also be appropriately selected to be approximately several hundred to 2000 Å, similar to conventionally used thin film media. In addition, if necessary, various known protective films may be appropriately selected on the magnetic film (for example, carbon film, SiO 2
film, other ceramic films, etc.) is effective for extending the life of the medium.
A lubricating film may be applied. In particular, the method for forming the base film of this invention includes:
RF sputtering methods such as flat plate RF magnetron sputtering method are effective. Further, as the conditions for the sputtering method for forming the base film, it is desirable that the sputtering gas pressure be 1 to 100 mTorr, and the substrate temperature be from room temperature to 400°C or less. Further, the magnetic film and the protective film can be manufactured by appropriately selecting a known film forming method such as a vapor deposition method, an ion plating method, a plasma CVD method, etc. in addition to the sputtering method. Furthermore, it is said that it is desirable that the interval (interval time) between the formation of the base film and the magnetic film be as short as possible from the viewpoint of improving magnetic properties. ,
The activity is lower than that of Cr film, and as shown in the examples,
Because you can take intervals of several minutes,
For example, in the sputtering method, the film-forming baths for the base film and the magnetic film are separated by a valve, so that the film-forming conditions for the base film and the film-forming conditions for the magnetic film can be set to optimal conditions, respectively. Examples Example 1 An Al 2 O 3 substrate with an outer diameter of 130 mm, an inner diameter of 40 mm, and a thickness of 1.2 mm was coated with a 20 μm thick glass glaze, and the surface was polished, using a flat plate RF magnetron sputtering device under the following conditions. Using two types of targets having the compositions shown in Table 1, an Fe--Cr alloy base film was coated on the glass glaze surface of the substrate. Ultimate vacuum level: 1 to 2 x 10 -6 Torr Atmosphere during sputtering: 99.99%Ar 6mTorr Input power: 300W Pole spacing: 70mm Substrate temperature: 100°C For comparison, a flat DC magnetron sputtering device was used under the above conditions. A Fe-Cr alloy base film was coated. Table 2 shows the composition, magnetization value, and film thickness of each Fe-Cr alloy base film coated on the substrate. In the analysis, an X-ray microanalyzer was used for the alloy film, and a plasma emission spectrometer and a gas analyzer were used for the target. In the table, for the alloy film, elements other than Fe and Cr were below the detection limit. Further, the other elements of the target were Ni, Mg, Al, P, etc., all of which were 0.04 wt% or less. In addition, a vibrating sample magnetometer was used to measure the magnetic properties. As is clear from the results in Table 2, the Fe-Cr alloy base film (sample Nos. 1 and 2) according to the present invention
It shows a magnetization value of 1.2 emu/g or less, indicating that it is a substantially nonmagnetic film that is essential as an underlayer. Furthermore, it can be seen that the composition ratio of the base film and the composition ratio of the target are substantially the same. In addition, 1.2emu/g
The following is indicated because of the measurement limit. On the other hand, the alloy base films of Comparative Examples (Samples No. 5 and 6) prepared using a flat plate DC magnetron sputtering device have almost the same composition ratio as the alloy film of the present invention, but the magnetization is 80 to 93 emu. /g, indicating that it is a ferromagnetic material almost the same as the target material.

【表】 実施例 2 外径130mm、内径40mm、厚み1.2mmのAl2O3基板
に、20μm厚みのガラスグレーズを施し、表面を
研摩した後、平板RFマグネトロンスパツタ装置
を用い、実施例1と同一条件にて、第2表に示す
組成からなる2種のターゲツト、すなわち、試料
No.3と試料No.4を使用し、基板ガラスグレーズ表
面に、Fe−Cr合金下地膜を2000Å厚みに被膜し
た。 さらに、Co−30Ni−7.5Cr合金ターゲツトを用
いて、磁性膜を800Å厚みで被膜した。 得られた磁気記録媒体により、5mm×5.8mmの
試料を切出し、VSMで測定し、ターゲツト試料
No.3を使用した測定結果を第2図a図に、ターゲ
ツト試料No.4を使用した測定結果をb図に示す。 また、下地膜としてCrを2000Å厚みで被膜し
た以外は同一条件で製造した従来磁気記録媒体よ
り同寸法の試料を切出し、同様にVSMにて測定
した、結果は第2図c図に示す。 第2図から明らかなように、この発明による
Fe−Cr合金下地膜を有する磁気記録媒体は、Cr
下地膜を有する従来磁気記録媒体に比較して、保
磁力角形比(S*)は若干低下するものの、保磁
力は10%〜20%程度増大し、同等以上の磁気特性
を有することが分る。 実施例 3 外径130mm、内径40mm、厚み1.2mmのAl2O3基板
に、20μm厚みのガラスグレーズを施し、表面を
研摩した後、平板RFマグネトロンスパツタ表置
を用い、下記条件並びにターゲツトを用いて、基
板ガラスグレーズ表面に、Fe−Cr合金下地膜を
2500Å厚みで被膜し、さらに、磁性膜を800Å厚
みで被膜し、その後、カーボン膜を300Å厚みで
被膜した。 到達真空度;1〜2×10-6Torr スパツタ時雰囲気;99.99%Ar 10mTorr 投入電力;300W 極間隔;70mm 基板温度;150℃ 下地膜用ターゲツト;Fe−40Cr(第2表、試料No.
3) 磁性膜用ターゲツト;Cu−30Ni−7.5Cr 保護膜;高密度炭素 得られたこの発明による磁気記録媒体の電磁変
換特性を以下の条件で測定した。 使用ヘツド;Mn−Znフエライトミニウインチエ
スタートラツク幅16μm、ギヤツプ長1.0μm、
ギヤツプ深さ20μm、巻数16T×2 フライイングハイト;0.3μm 1F;1.25MHz 2F;2.5MHz テイスク回転数;3600rpm 測定箇所;デイスク中心からR=62mm部分にて測
定 測定した再生出力特生は次のとおりであつた。 再生出力(2.5MHz、Iw=80mA)=1.5mV 再生出力(5MHz、Iw=80mA)=1.3mV 分解能(Iw=80mA)=87% オーバーライト=−30dB 測定結果から明らかなように、この発明による
磁気記録媒体は、高密度記録媒体としての特性を
備えていることが分る。 実施例 4 外径130mm、内径40mm、厚み1.2mmのAl2O3基板
に、20μm厚みのガラスグレーズを施し、表面を
研摩した後、平板RFマグネトロンスパツタ装置
を用い、実施例1と同一条件にて、Fe−40Cr合
金(第2表、試料No.3)及びCrからなる2種の
ターゲツトを使用し、2種の基板ガラスグレーズ
表面に、それぞれFe−Cr合金下地膜とCr下地膜
を2000Å厚みに被膜した。 さらに、Co−30Ni−7.5Cr合金ターゲツトを用
いて、磁性膜を800Å厚みで被膜した。 磁性膜の被膜の際に、下地膜から磁性膜の被膜
までの成膜インターバルを30秒と4分との2条件
に設定し、磁性膜を被着した。 得られた4種の磁気記録媒体より、5mm×5.8
mmの試料を切出し、VSMで測定した結果、第3
表に示す下地膜の特性を得た。 第3表の結果より明らかな如く、この発明によ
るFe−Cr合金下地膜の場合は、成膜インターバ
ルを従来では考えられない程に長く設定しても、
下地膜のHcの劣化が遥かに少ないことが分る。
[Table] Example 2 An Al 2 O 3 substrate with an outer diameter of 130 mm, an inner diameter of 40 mm, and a thickness of 1.2 mm was coated with a glass glaze of 20 μm in thickness, and the surface was polished using a flat plate RF magnetron sputtering device. Under the same conditions as above, two types of targets having the compositions shown in Table 2, namely, samples were prepared.
Using Sample No. 3 and Sample No. 4, an Fe-Cr alloy base film was coated to a thickness of 2000 Å on the glass glaze surface of the substrate. Furthermore, a magnetic film was coated with a thickness of 800 Å using a Co-30Ni-7.5Cr alloy target. Using the obtained magnetic recording medium, cut out a 5 mm x 5.8 mm sample, measure it with a VSM, and select it as the target sample.
The measurement results using target sample No. 3 are shown in Fig. 2 (a), and the measurement results using target sample No. 4 are shown in Fig. 2 (b). In addition, a sample of the same size was cut out from a conventional magnetic recording medium manufactured under the same conditions except that it was coated with Cr to a thickness of 2000 Å as an underlayer, and similarly measured using VSM. The results are shown in Figure 2c. As is clear from Fig. 2, according to this invention
A magnetic recording medium having a Fe-Cr alloy underlayer is Cr
Although the coercive force squareness ratio (S * ) is slightly lower than that of conventional magnetic recording media with an underlayer, the coercive force is increased by about 10% to 20%, indicating that the magnetic properties are equivalent or better. . Example 3 An Al 2 O 3 substrate with an outer diameter of 130 mm, an inner diameter of 40 mm, and a thickness of 1.2 mm was coated with a 20 μm thick glass glaze, and the surface was polished. Using a flat plate RF magnetron sputtering surface, the following conditions and targets were applied. A Fe-Cr alloy base film is applied to the glass glaze surface of the substrate using
A film was applied to a thickness of 2500 Å, a magnetic film was further applied to a thickness of 800 Å, and then a carbon film was applied to a thickness of 300 Å. Ultimate vacuum: 1 to 2 x 10 -6 Torr Atmosphere during sputtering: 99.99%Ar 10mTorr Input power: 300W Pole spacing: 70mm Substrate temperature: 150℃ Base film target: Fe-40Cr (Table 2, sample No.
3) Target for magnetic film: Cu-30Ni-7.5Cr Protective film: High-density carbon The electromagnetic conversion characteristics of the obtained magnetic recording medium according to the present invention were measured under the following conditions. Head used: Mn-Zn ferrite mini winch Ester track width 16μm, gap length 1.0μm,
Gap depth 20μm, number of turns 16T x 2 Flying height: 0.3μm 1F: 1.25MHz 2F: 2.5MHz Take rotation speed: 3600rpm Measurement location: Measured at R = 62mm from the center of the disk The measured playback output characteristics are as follows That's right. Reproduction output (2.5MHz, Iw = 80mA) = 1.5mV Reproduction output (5MHz, Iw = 80mA) = 1.3mV Resolution (Iw = 80mA) = 87% Overwrite = -30dB As is clear from the measurement results, the present invention It can be seen that the magnetic recording medium has characteristics as a high-density recording medium. Example 4 An Al 2 O 3 substrate with an outer diameter of 130 mm, an inner diameter of 40 mm, and a thickness of 1.2 mm was coated with a 20 μm thick glass glaze, and the surface was polished using a flat plate RF magnetron sputtering device under the same conditions as Example 1. Using two types of targets consisting of Fe-40Cr alloy (Table 2, sample No. 3) and Cr, a Fe-Cr alloy base film and a Cr base film were respectively applied to the glass glaze surfaces of two types of substrates. The film was coated to a thickness of 2000 Å. Furthermore, a magnetic film was coated with a thickness of 800 Å using a Co-30Ni-7.5Cr alloy target. When coating the magnetic film, two conditions were set for the film formation interval from the base film to the magnetic film coating: 30 seconds and 4 minutes, and the magnetic film was deposited. From the four types of magnetic recording media obtained, 5 mm x 5.8
As a result of cutting out a mm sample and measuring it with VSM, the third
The properties of the base film shown in the table were obtained. As is clear from the results in Table 3, in the case of the Fe-Cr alloy base film according to the present invention, even if the film formation interval is set to a length unimaginable in the past,
It can be seen that the deterioration of Hc in the base film is much less.

【表】 実施例 5 実施例2で得られた3種の磁気記録媒体を引つ
掻き試験に供し、その結果を第4表に示す。表
中、本発明1は第2表に示すターゲツト試料No.3
を使用した磁気記録媒体であり、本発明2は第2
表に示すターゲツト試料No.4を使用した磁気記録
媒体である。 試験は、先端直径が10μmのダイヤモンド針に
種々の荷重を付加しなから、デイスクを移動して
膜の剥離により、被着強度を評価した。
[Table] Example 5 The three types of magnetic recording media obtained in Example 2 were subjected to a scratch test, and the results are shown in Table 4. In the table, Invention 1 is the target sample No. 3 shown in Table 2.
The second invention is a magnetic recording medium using the second invention.
This is a magnetic recording medium using target sample No. 4 shown in the table. In the test, adhesion strength was evaluated by peeling off the film by moving the disk while applying various loads to a diamond needle with a tip diameter of 10 μm.

【表】【table】 【図面の簡単な説明】[Brief explanation of drawings]

第1図a図はこの発明によるFe−Cr合金下地
膜の成分のX線回折結果示すグラフであり、b図
はこの発明によるFe−Cr合金下地膜の成膜に用
いたターゲツトのX線回折結果示すグラフであ
る。第2図はa,b図はこの発明による磁気記録
媒体の磁化曲線を示すグラフであり、c図は従来
磁気記録媒体の磁化曲線を示すグラフである。
Figure 1a is a graph showing the X-ray diffraction results of the components of the Fe-Cr alloy base film according to the present invention, and Figure b is a graph showing the X-ray diffraction results of the target used in forming the Fe-Cr alloy base film according to the present invention. This is a graph showing the results. In FIG. 2, figures a and b are graphs showing the magnetization curve of the magnetic recording medium according to the present invention, and figure c is a graph showing the magnetization curve of the conventional magnetic recording medium.

Claims (1)

【特許請求の範囲】[Claims] 1 非磁性基板上に、下地膜及び磁性膜を積層被
膜した磁気記録媒体において、非磁性基板の少な
くとも下地膜の被成膜表面がガラスからなり、前
記下地膜が、Cr30wt%〜70wt%、残部Feからな
り、bcc構造を有しない結晶構造からなる非磁性
もしくは弱磁性合金膜であることを特徴とする磁
気記録媒体。
1. In a magnetic recording medium in which a base film and a magnetic film are laminated and coated on a non-magnetic substrate, at least the surface on which the base film is formed on the non-magnetic substrate is made of glass, and the base film contains 30 wt% to 70 wt% Cr, and the remainder A magnetic recording medium characterized in that it is a nonmagnetic or weakly magnetic alloy film made of Fe and having a crystal structure that does not have a bcc structure.
JP24786486A 1986-10-17 1986-10-17 Magnetic recording medium Granted JPS63102033A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24786486A JPS63102033A (en) 1986-10-17 1986-10-17 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24786486A JPS63102033A (en) 1986-10-17 1986-10-17 Magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS63102033A JPS63102033A (en) 1988-05-06
JPH044654B2 true JPH044654B2 (en) 1992-01-29

Family

ID=17169771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24786486A Granted JPS63102033A (en) 1986-10-17 1986-10-17 Magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS63102033A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5877027A (en) * 1981-10-31 1983-05-10 Tdk Corp Magnetic recording medium

Also Published As

Publication number Publication date
JPS63102033A (en) 1988-05-06

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