JPH0447036B2 - - Google Patents
Info
- Publication number
- JPH0447036B2 JPH0447036B2 JP59107170A JP10717084A JPH0447036B2 JP H0447036 B2 JPH0447036 B2 JP H0447036B2 JP 59107170 A JP59107170 A JP 59107170A JP 10717084 A JP10717084 A JP 10717084A JP H0447036 B2 JPH0447036 B2 JP H0447036B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plated
- rod
- shaped electrode
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Electroplating Methods And Accessories (AREA)
Description
【発明の詳細な説明】
〔発明の属する技術分野〕
この発明は電気めつき装置に係り、特にめつき
すべき物品(以下被めつき物という)の一部分の
みにめつき処理を施せるようにした電気めつき装
置に関する。[Detailed Description of the Invention] [Technical Field to Which the Invention Pertains] The present invention relates to an electroplating device, and in particular, is capable of plating only a portion of an article to be plated (hereinafter referred to as the object to be plated). Related to electroplating equipment.
電気部品等の被めつき物の一部分のみにめつき
を施すにはめつき不要部をテープやパテを使つて
マスキング処理することが多く、第3図および第
4図はこの種の従来のめつき装置を示している。
When plating only a portion of an object to be plated, such as an electrical component, the unnecessary parts are often masked off using tape or putty, and Figures 3 and 4 show this type of conventional plating. The device is shown.
第3図に示した例は、円柱状の被めつき物1の
端面1aのみにめつき処理を行う例を示したもの
で、めつきの不要部分はテープ、パテあるいは塗
料のマスキング材2によつて被覆されている。こ
のような被めつき物1はめつき液3中に浸漬さ
れ、直流電源の負極側に接続されている。なお、
めつき液3中には、直流電源の陽極側に接続され
ためつき金属4が吊持されている。 The example shown in Fig. 3 shows an example in which plating is applied only to the end face 1a of a cylindrical plated object 1, and areas that do not require plating are covered with masking material 2 such as tape, putty, or paint. covered. The object 1 to be plated is immersed in a plating liquid 3 and connected to the negative electrode side of a DC power source. In addition,
A plating metal 4 connected to the anode side of a DC power source is suspended in the plating liquid 3.
しかしながら、この従来のめつき装置はマスキ
ング処理に長時間を要して作業能率が悪く、また
めつき速度も従来速度の域を出ないという問題が
あつた。 However, this conventional plating apparatus has problems in that the masking process takes a long time, resulting in poor work efficiency, and the plating speed is also within the conventional speed range.
めつき速度を上げるために、ジエツト噴流式の
めつき装置が提案されている。これは、第4図に
示したようなもので、円柱状の被めつき物1は、
端面1aのみをめつき室5内に露出させてマスキ
ングセル6に保持されている。そして、めつき液
はめつき液供給管7を介して下方よりめつき室5
内の被めつき物1に向かつて噴射される。このよ
うなめつき装置は、高速でめつきできるという利
点を有する反面、めつき液を周囲に飛散させない
ためにマスキングセル6を精密に製造しなければ
ならないという問題があつた。特に被めつき物1
とマスキングセル6との隙間からめつき液が浸出
しやすいのでその部分におけるシールを考慮しな
ければならないという問題があつた。 In order to increase the plating speed, a jet plating device has been proposed. This is as shown in Fig. 4, and the cylindrical covered object 1 is
It is held in a masking cell 6 with only the end face 1a exposed in the plating chamber 5. Then, the plating liquid is supplied to the plating chamber 5 from below through the plating liquid supply pipe 7.
It is sprayed towards the object 1 inside. Although such a plating apparatus has the advantage of being able to perform plating at high speed, it has the problem that the masking cells 6 must be precisely manufactured to prevent the plating liquid from scattering around. Especially covered items 1
Since the plating liquid tends to seep out from the gap between the masking cell 6 and the masking cell 6, there is a problem in that sealing in that area must be taken into consideration.
この発明は、上述した従来の装置が有する問題
点を解消し、被めつき物に対してマスキング処理
を施すことなく被めつき物の一部に高速度でめつ
き処理を施すことのできるめつき装置を提供する
ことを目的とするものである。
The present invention solves the problems of the conventional apparatus described above, and is capable of plating a part of a plated object at high speed without masking the plated object. The purpose of this invention is to provide a lighting device.
この発明は、断面形状が被めつき物のめつき面
の形状と同一形状に形成され、中央部に軸方向に
貫通するめつき液の供給路を有するめつき金属か
らなる棒状電極を設け、前記被めつき物のめつき
面を前記棒状電極の上端面と微小間隔おいて対向
させ、前記棒状電極の下端側から前記めつき液供
給路にめつき液を供給して棒状電極の上端面上に
めつき液の膜を形成し、このめつき液膜中に前記
被めつき物のめつき面を置き、前記棒状電極と被
めつき物間にめつき電圧を加えるようにしたもの
である。
The present invention provides a rod-shaped electrode made of a plating metal whose cross-sectional shape is the same as the shape of the plating surface of the object to be plated, and has a plating liquid supply passage passing through the center in the axial direction. The plating surface of the object to be plated is opposed to the upper end surface of the rod-shaped electrode with a small distance therebetween, and the plating liquid is supplied from the lower end side of the rod-shaped electrode to the plating liquid supply path to coat the upper end surface of the rod-shaped electrode. A plating liquid film is formed, the plating surface of the object to be plated is placed in the plating liquid film, and a plating voltage is applied between the rod-shaped electrode and the object to be plated. .
以下この発明による電気めつき装置の一実施例
を第1図および第2図を参照して説明する。
An embodiment of an electroplating apparatus according to the present invention will be described below with reference to FIGS. 1 and 2.
第1図において、符号10は受皿を示し、この
受皿10の上には、断面が円形のめつき金属より
なる棒状電極11が載置されている。この棒状電
極11は、被めつき物にめつきしようとする金属
の種類によつて決定されることはもちろんであ
り、この棒状電極11はリード線12を介して直
流電源13の陽極側に接続されている。この直流
電源13の陰極側は、リード線14を介して被め
つき物15に接続されている。この実施例では被
めつき物15は円柱状の形態をなし、めつきすべ
き部分は、その下端面16で円形をなしている。
もちろん被めつき物の15の形状は種々の例があ
り、そのめつき面の輪郭形状に合わせるようにし
て、前記棒状電極11の極端面すなわち断面の形
状が決定される。つまり、棒状電極11の極端面
17の輪郭形状は、被めつき物15のめつき面1
6の輪郭形状と同一であつて、その大きさは棒状
電極11の方が若干大きくなつていることが望ま
しいのである。 In FIG. 1, the reference numeral 10 indicates a saucer, and on the saucer 10 is placed a rod-shaped electrode 11 made of plated metal and having a circular cross section. Of course, the rod-shaped electrode 11 is determined by the type of metal to be plated on the object, and this rod-shaped electrode 11 is connected to the anode side of a DC power source 13 via a lead wire 12. has been done. The cathode side of this DC power supply 13 is connected to a covered object 15 via a lead wire 14. In this embodiment, the plated object 15 has a cylindrical shape, and the portion to be plated has a circular lower end surface 16.
Of course, there are various shapes of the object 15 to be plated, and the shape of the extreme face, that is, the cross section of the rod-shaped electrode 11 is determined in accordance with the contour shape of the surface to be plated. In other words, the contour shape of the extreme surface 17 of the rod-shaped electrode 11 is the same as that of the plating surface 1 of the object 15 to be plated.
It is desirable that the rod-shaped electrode 11 has the same outline shape as the electrode 6, but is slightly larger in size.
しかして、上記棒状電極11の中央部には、め
つき液の供給路18が軸方向に貫通して設けられ
ており、その供給路18の入口側は供給管19が
接続されており、この供給管19は途中に流量調
節弁20を介在させて供給ポンプ21の吐出側に
接続されている。したがつて、供給ポンプ21が
駆動されると、めつき液22は供給管19を通つ
てめつき金属からなる棒状電極11の供給路18
内に導かれ、上方の極端面17の上に溢流し、電
極11の外周面を伝つて下方へ向かつて流下す
る。このとき、重要なことは、棒状電極11の極
端面17の上にめつき液22による被膜23を形
成することである。この液膜23の厚さは流量調
節弁20の開度によつて調節することができる。
なお棒状電極11の外側を流下しためつき液22
はいつたん受皿10内に貯溜され、排出管24を
通じてめつき液槽25内に戻される。 In the center of the rod-shaped electrode 11, a plating liquid supply passage 18 is provided passing through in the axial direction, and a supply pipe 19 is connected to the inlet side of the supply passage 18. The supply pipe 19 is connected to the discharge side of a supply pump 21 with a flow rate control valve 20 interposed therebetween. Therefore, when the supply pump 21 is driven, the plating liquid 22 passes through the supply pipe 19 to the supply path 18 of the rod-shaped electrode 11 made of plating metal.
The liquid is guided inward, overflows onto the upper extreme surface 17, and flows downward along the outer peripheral surface of the electrode 11. At this time, what is important is to form a coating 23 with the plating liquid 22 on the extreme surface 17 of the rod-shaped electrode 11. The thickness of this liquid film 23 can be adjusted by the opening degree of the flow control valve 20.
Note that the plating liquid 22 flows down the outside of the rod-shaped electrode 11.
The plating liquid is stored in the plating liquid tank 10 and returned to the plating liquid tank 25 through the discharge pipe 24.
本発明はこのように構成されているから、めつ
き作業をするときには、供給ポンプ21を駆動し
てめつき液22を供給管19および供給路18を
通してめつき金属からなる棒状電極11の極端面
17上に溢流させ、めつき液22による所定厚さ
の液膜23を形成する。次いで、被めつき物15
をこの液膜23に向かつて降下させて、第2図に
示したように、被めつき物15の下端のめつき面
16が液膜23と接触しこの中に浸漬されるよう
になる微小の間隔まで接近させて棒状電極11と
対向させる。めつき面16を所定時間だけ液膜2
3と接触させてめつきが付着したのちに被めつき
物15を上方へ引き上げる。この被めつき物15
のめつき面16を液膜23中に置く時間は、希望
するめつき厚さによつて決定されることはもちろ
んである。 Since the present invention is configured in this manner, when plating work is performed, the supply pump 21 is driven to supply the plating liquid 22 through the supply pipe 19 and the supply path 18 to the end surface of the rod-shaped electrode 11 made of plating metal. 17 to form a liquid film 23 of a predetermined thickness by the plating liquid 22. Next, the covered object 15
is lowered toward this liquid film 23, and as shown in FIG. The two electrodes are brought close to each other with a distance of , and are opposed to the rod-shaped electrode 11. The liquid film 2 is applied to the plating surface 16 for a predetermined period of time.
After the plated object 15 is brought into contact with the object 3 and plated, the object 15 to be plated is pulled upward. This covering item 15
Of course, the time period for which the plating surface 16 is placed in the liquid film 23 is determined by the desired plating thickness.
なお、上記実施例においては、被めつき物15
のめつき面が円形であつたので、棒状電極の断面
形状を円形としたが、これらの形状にとらわれる
ものではない。 In addition, in the above embodiment, the covered object 15
Since the plating surface was circular, the cross-sectional shape of the rod-shaped electrode was made circular, but the present invention is not limited to these shapes.
以上の説明から明らかなように、この発明によ
れば、めつき金属よりなる棒状電極の中央に穿設
されためつき液の供給路を通して棒状電極の上方
の極端面上にめつき液を溢流させてめつき液の液
膜を形成し、この液膜中に被めつき物のめつきす
べき面を置くようにしたから、めつきの必要な部
分だけにめつき液が接触され、不要な部分には、
めつき液の接触がなくなるため、マスキング処理
を施すことなく被めつき物の一部の面にのみ確実
にめつきを施すことができる。また、棒状電極の
極端面に上に形成されるめつき液膜は、連続供給
されるめつき液による流動状態の薄い液膜とな
り、かつ、めつき金属よりなる棒状電極の極面と
被めつき物のめつき面が小さい間隔で対向するた
め、被めつき物のめつき面の近傍のめつき金属イ
オンの欠乏層が小さくなり、めつき速度も一般の
浸漬めつき法にくらべて10〜100倍のめつき速度
を得ることができる。
As is clear from the above description, according to the present invention, the plating liquid overflows onto the upper extreme surface of the rod-shaped electrode through the plating liquid supply channel bored in the center of the rod-shaped electrode made of plated metal. The surface of the object to be plated is placed in this liquid film, so that the plating liquid contacts only the areas that need plating, and removes unnecessary parts. In the part,
Since there is no contact with the plating liquid, it is possible to reliably apply plating to only a part of the surface of the object to be plated without performing a masking process. In addition, the plating liquid film formed on the extreme surface of the rod-shaped electrode becomes a thin liquid film in a fluid state due to the continuously supplied plating liquid, and the plating liquid film forms on the extreme surface of the rod-shaped electrode made of plating metal. Since the plating surfaces of the plating object face each other with a small interval, the plating metal ion depletion layer near the plating surface of the object to be plated becomes smaller, and the plating speed is 10 times faster than that of the general immersion plating method. ~100 times faster plating speed can be obtained.
第1図はこの発明による電気めつき装置の一実
施例を示した縦断面図、第2図はめつき時におけ
る被めつき物とめつき金属よりなる棒状電極の近
接状態を示した説明図、第3図は従来の電気めつ
き装置の一例を示す説明図、第4図は従来の他の
例による電気めつき装置を示した説明図である。
10…受皿、11…めつき金属よりなる棒状電
極、15…被めつき物、18…供給路、20…流
量調節弁、21…供給ポンプ、22…めつき液、
23…液膜。
FIG. 1 is a longitudinal sectional view showing an embodiment of an electroplating apparatus according to the present invention, FIG. 2 is an explanatory view showing the proximity of an object to be plated and a rod-shaped electrode made of a metal to be plated during plating, and FIG. FIG. 3 is an explanatory diagram showing an example of a conventional electroplating apparatus, and FIG. 4 is an explanatory diagram showing another example of the conventional electroplating apparatus. DESCRIPTION OF SYMBOLS 10... saucer, 11... rod-shaped electrode made of plating metal, 15... plating object, 18... supply path, 20... flow rate control valve, 21... supply pump, 22... plating liquid,
23...Liquid film.
Claims (1)
一形状に形成され、中央部に軸方向に貫通するめ
つき液の供給路を有するめつき金属からなる棒状
電極を設け、前記被めつき物のめつき面を前記棒
状電極の上端面と微小間隔おいて対向させ、前記
棒状電極の下端側から前記めつき液供給路にめつ
き液を供給して棒状電極の上端面上にめつき液の
膜を形成し、このめつき液膜中に前記被めつき物
のめつき面を置き、前記棒状電極と被めつき物間
にめつき電圧を加えるようにしたことを特徴とす
る電気めつき装置。1. A rod-shaped electrode made of plating metal is provided, the cross-sectional shape of which is the same as the shape of the plating surface of the object to be plated, and which has a supply passage for plating liquid passing through the object in the axial direction in the center. The surface to be plated of the object is opposed to the upper end surface of the rod-shaped electrode at a small distance, and the plating liquid is supplied from the lower end side of the rod-shaped electrode to the plating liquid supply path to plate the object on the upper end surface of the rod-shaped electrode. An electrical device characterized in that a liquid film is formed, the plating surface of the object to be plated is placed in the plating liquid film, and a plating voltage is applied between the rod-shaped electrode and the object to be plated. Plating device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10717084A JPS60251295A (en) | 1984-05-25 | 1984-05-25 | Electroplating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10717084A JPS60251295A (en) | 1984-05-25 | 1984-05-25 | Electroplating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60251295A JPS60251295A (en) | 1985-12-11 |
| JPH0447036B2 true JPH0447036B2 (en) | 1992-07-31 |
Family
ID=14452253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10717084A Granted JPS60251295A (en) | 1984-05-25 | 1984-05-25 | Electroplating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60251295A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6020477B2 (en) * | 1980-04-26 | 1985-05-22 | 日本電気ホームエレクトロニクス株式会社 | Jet plating device |
-
1984
- 1984-05-25 JP JP10717084A patent/JPS60251295A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60251295A (en) | 1985-12-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |