JPH0448697A - Electromagnetic shielding material and manufacture thereof - Google Patents
Electromagnetic shielding material and manufacture thereofInfo
- Publication number
- JPH0448697A JPH0448697A JP15636290A JP15636290A JPH0448697A JP H0448697 A JPH0448697 A JP H0448697A JP 15636290 A JP15636290 A JP 15636290A JP 15636290 A JP15636290 A JP 15636290A JP H0448697 A JPH0448697 A JP H0448697A
- Authority
- JP
- Japan
- Prior art keywords
- conductive
- electromagnetic shielding
- thin film
- metal thin
- shielding material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 80
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 63
- 239000002184 metal Substances 0.000 claims abstract description 63
- 239000010409 thin film Substances 0.000 claims abstract description 59
- 239000010408 film Substances 0.000 claims abstract description 48
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910052742 iron Inorganic materials 0.000 claims abstract description 20
- 238000000576 coating method Methods 0.000 claims description 60
- 239000011248 coating agent Substances 0.000 claims description 53
- 239000003973 paint Substances 0.000 claims description 49
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 43
- 229910052759 nickel Inorganic materials 0.000 claims description 20
- 238000007747 plating Methods 0.000 claims description 19
- 230000007797 corrosion Effects 0.000 abstract description 22
- 238000005260 corrosion Methods 0.000 abstract description 22
- 238000000151 deposition Methods 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 26
- 239000011347 resin Substances 0.000 description 26
- 239000002585 base Substances 0.000 description 18
- 239000004020 conductor Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 229910000831 Steel Inorganic materials 0.000 description 11
- 238000001035 drying Methods 0.000 description 11
- 238000007772 electroless plating Methods 0.000 description 11
- 239000010959 steel Substances 0.000 description 11
- 238000011282 treatment Methods 0.000 description 11
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229920001187 thermosetting polymer Polymers 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 238000005238 degreasing Methods 0.000 description 4
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 2
- 229910000165 zinc phosphate Inorganic materials 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 241000269821 Scombridae Species 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007849 furan resin Substances 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 235000020640 mackerel Nutrition 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- PRWXGRGLHYDWPS-UHFFFAOYSA-L sodium malonate Chemical compound [Na+].[Na+].[O-]C(=O)CC([O-])=O PRWXGRGLHYDWPS-UHFFFAOYSA-L 0.000 description 1
- 238000007592 spray painting technique Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- -1 whiskers Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Coating Apparatus (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、電子機器のハウジングなどに好適に使用され
る電磁シールド材およびその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electromagnetic shielding material suitable for use in housings of electronic devices, and a method for manufacturing the same.
[従来の技術と発明が解決しようとする課題]近年、外
部からのノイズによる誤動作を防止するため、電子機器
のハウジングは、通常、金属基材の表面に、耐蝕性及び
導電性を付与する導電性塗料を塗布した電磁シールド材
で形成されている。[Prior Art and Problems to be Solved by the Invention] In recent years, in order to prevent malfunctions caused by external noise, housings of electronic devices are usually made of conductive metal that provides corrosion resistance and conductivity on the surface of the metal base material. It is made of electromagnetic shielding material coated with adhesive paint.
この電磁シールド材は、金属基材の表面を脱脂処理した
後、密着性を高めるため、リン酸亜鉛などにより化成処
理した後、導電性カーボンブラック、導電性金属粉末な
どの導電性材料を含む導電性塗料を塗布し、乾燥硬化さ
せることにより製造されている。This electromagnetic shielding material is manufactured by degreasing the surface of the metal base material, then chemically treating it with zinc phosphate, etc. to improve adhesion, and then applying conductive materials containing conductive materials such as conductive carbon black and conductive metal powder. It is manufactured by applying a synthetic paint and drying and curing it.
一方、導電性塗膜の導電性と電磁シールド性とは比例関
係にある。従って、高い電磁シールド性を発現させるた
め、前記導電性材料の含有量の大きな導電性塗料が使用
されている。しかしながら、このような導電性塗料を使
用する場合には、基材と導電性塗膜との密着性が小さく
、耐蝕性が劣るので、長期に亘り高い電磁シールド性を
維持できない。特に、高価な導電性塗料の使用量を低減
するため、導電性塗膜の膜厚を小さくする場合には、耐
蝕性が著しく低下する。On the other hand, the conductivity and electromagnetic shielding properties of a conductive coating film are in a proportional relationship. Therefore, in order to exhibit high electromagnetic shielding properties, conductive paints containing a large amount of the conductive material are used. However, when such a conductive coating material is used, the adhesion between the base material and the conductive coating film is low and the corrosion resistance is poor, making it impossible to maintain high electromagnetic shielding properties over a long period of time. In particular, when the thickness of the conductive coating film is reduced in order to reduce the amount of expensive conductive paint used, the corrosion resistance is significantly reduced.
従って、本発明の目的は、基材と導電性塗膜との密着性
に優れると共に、膜厚が薄くても高い耐蝕性、導電性お
よび電磁シールド性を示す電磁シールド材を提供するこ
とにある。Therefore, an object of the present invention is to provide an electromagnetic shielding material that has excellent adhesion between a base material and a conductive coating, and also exhibits high corrosion resistance, conductivity, and electromagnetic shielding properties even when the film is thin. .
また、本発明の他の目的は、上記の如き優れた特性を有
する電磁シールド材を効率よくかつ安価に製造できる電
磁シールド材の製造方法を提供することにある。Another object of the present invention is to provide a method for producing an electromagnetic shielding material that can efficiently and inexpensively produce an electromagnetic shielding material having the above-mentioned excellent properties.
[発明の構成]
上記目的を達成するため、本発明者らは、鋭意検討の結
果、(1)従来のように、鉄系基材と導電性塗膜との密
着性を高めるために鉄系基材を化成処理する場合には、
化成皮膜に起因して導電性が低下し、高い電磁シールド
性を付与するには限界があること、(2)鉄系基材の表
面に、導電性金属薄膜と導電性塗膜とを組合せて形成す
る場合には、導電性金属薄膜及び導電性塗膜の厚みが薄
くても、鉄系基材との密着性、耐蝕性だけでなく、導電
性が著しく向上することを見いだし、本発明を完成した
。すなわち、本発明は、鉄系基材の表面に、導電性金属
薄膜層を介して、導電性塗膜が形成されている電磁シー
ルド材を提供する。[Structure of the Invention] In order to achieve the above object, the present inventors have made extensive studies and found that (1) as in the past, iron-based When chemically treating the base material,
(2) Combining a conductive metal thin film and a conductive coating on the surface of an iron-based base material. The present inventors have discovered that even when the conductive metal thin film and conductive coating film are thin, not only the adhesion to the iron-based substrate and corrosion resistance but also the conductivity are significantly improved. completed. That is, the present invention provides an electromagnetic shielding material in which a conductive coating film is formed on the surface of an iron-based base material via a conductive metal thin film layer.
また、本発明は、鉄系基材の表面に導電性金属薄膜を形
成する金属薄膜形成工程と、導電性金属薄膜の表面に、
導電性塗料を塗布する塗布工程とを含む電磁シールド材
の製造方法を提供する。The present invention also provides a metal thin film forming step of forming a conductive metal thin film on the surface of an iron-based base material, and a metal thin film forming step on the surface of the conductive metal thin film.
Provided is a method for manufacturing an electromagnetic shielding material, which includes a coating step of applying a conductive paint.
本発明の電磁シールド材を構成する鉄系基材としては、
機械的強度などが大きく、電子機器のノ1ウジングやケ
ースなどを形成できる鉄鋼材料であればいずれも使用で
きる。鉄系基材は、通常、鋼板状のものが使用できる。The iron-based base material constituting the electromagnetic shielding material of the present invention includes:
Any steel material can be used as long as it has high mechanical strength and can be used to form housings, cases, etc. of electronic devices. As the iron-based base material, a steel plate-like material can usually be used.
この鉄系基材の表面には、導電性金属薄膜層が形成され
ている。導電性金属薄膜層は、導電性金属、例えば、ア
ルミニウム、銅、銀、金、マグネシウム、タングステン
、モリブデン、亜鉛、コバルト、ニッケル、パラジウム
、カドミウムなどの少なくとも一種で形成できる。これ
らの導電性金属薄膜層は、例えば、蒸着、スパッタリン
グなどのPVDまたはCVD法により形成してもよいが
、好ましくは電気メツキ処理、さらに好ましくは無電解
メツキ処理により形成されている。好ましい導電性金属
薄膜層は、無電解銅メツキ層、特に、高い耐腐蝕性を付
与し、導電性塗膜との密着性に優れる無電解ニッケルメ
ッキ層である。A conductive metal thin film layer is formed on the surface of this iron-based base material. The conductive metal thin film layer can be formed of at least one of conductive metals such as aluminum, copper, silver, gold, magnesium, tungsten, molybdenum, zinc, cobalt, nickel, palladium, and cadmium. These conductive metal thin film layers may be formed by, for example, PVD or CVD methods such as vapor deposition and sputtering, but are preferably formed by electroplating, and more preferably by electroless plating. A preferred conductive metal thin film layer is an electroless copper plating layer, particularly an electroless nickel plating layer which provides high corrosion resistance and has excellent adhesion to the conductive coating film.
導電性金属薄膜層の厚みは、通常、0.1μm以上であ
ればよく、その上限値は、経済性、生産性の点から決定
される。導電性金属薄膜層の厚みが0.1μm未満であ
る場合には、高い耐食性を付与するのが困難である。導
電性金属薄膜層の好ましい厚みは、0.5〜10μm1
特に1〜5μm程度である。The thickness of the conductive metal thin film layer should normally be 0.1 μm or more, and the upper limit thereof is determined from the viewpoint of economy and productivity. When the thickness of the conductive metal thin film layer is less than 0.1 μm, it is difficult to impart high corrosion resistance. The preferred thickness of the conductive metal thin film layer is 0.5 to 10 μm1
In particular, it is about 1 to 5 μm.
この導電性金属薄膜層は、導電性塗膜で被覆されている
。導電性塗膜は、導電性材料と樹脂とを含む導電性塗料
で形成できる。This conductive metal thin film layer is coated with a conductive coating. The conductive coating film can be formed from a conductive paint containing a conductive material and a resin.
上記導電性材料としては、慣用の材料、例えば、アルミ
ニウム、金、銀、銅、パラジウム、ニッケルおよびこれ
ら金属を含む合金などの金属粉末;導電性カーボンブラ
ック、グラファイト、炭素繊維などの炭素材;導電性金
属で被覆された粉体、ウィスカー、繊維などが例示でき
る。これらの導電性材料は少なくとも一種使用される。The above-mentioned conductive materials include conventional materials such as metal powders such as aluminum, gold, silver, copper, palladium, nickel, and alloys containing these metals; carbon materials such as conductive carbon black, graphite, and carbon fiber; Examples include powders, whiskers, and fibers coated with metals. At least one of these conductive materials is used.
また、樹脂には、塗膜形成可能なポリマー、例えば、熱
可塑性樹脂および熱硬化性樹脂などが含まれる。熱可塑
性樹脂としては、例えば、アクリル樹脂、スチレン系ポ
リマー ポリ塩化ビニル、ポリ酢酸ビニル、エチレン−
酢酸ビニル、ポリエステル、ポリビニルアセタール、ポ
リアミド、ポリカーボネートなどが挙げられる。熱硬化
性樹脂としては、例えば、熱硬化性アクリル樹脂、エポ
キシ樹脂、エポキシエステル樹脂、不飽和ポリエステル
、アルキド樹脂、フェノール樹脂、フラン樹脂、尿素樹
脂、メラミン樹脂、ジアリルフタレート樹脂、ポリウレ
タン、ポリイミド、シリコーン樹脂などが挙げられる。Furthermore, resins include polymers capable of forming coating films, such as thermoplastic resins and thermosetting resins. Examples of thermoplastic resins include acrylic resins, styrene polymers, polyvinyl chloride, polyvinyl acetate, and ethylene.
Examples include vinyl acetate, polyester, polyvinyl acetal, polyamide, and polycarbonate. Examples of thermosetting resins include thermosetting acrylic resin, epoxy resin, epoxy ester resin, unsaturated polyester, alkyd resin, phenol resin, furan resin, urea resin, melamine resin, diallyl phthalate resin, polyurethane, polyimide, and silicone. Examples include resin.
これらの樹脂は少なくとも一種使用される。これらの樹
脂の中で密着性、耐食性などに優れる熱硬化性樹脂が好
ましい。At least one of these resins is used. Among these resins, thermosetting resins are preferred because of their excellent adhesiveness, corrosion resistance, and the like.
導電性塗膜中の導電性材料と樹脂との割合は、導電性材
料の種類などにより導電性が変化するので一種に規定で
きないが、通常、導電性材料の含有量は5〜80重量%
、好ましくは15〜50重量%程度である。The ratio of the conductive material and resin in the conductive coating film cannot be defined as one type because the conductivity changes depending on the type of conductive material, etc., but the content of the conductive material is usually 5 to 80% by weight.
, preferably about 15 to 50% by weight.
電磁シールド材の表面抵抗値は、例えば10−2〜5×
102Ω、好ましくは、10−2〜1.5×102Ω程
度である。特に好ましい電磁シールド材は10〜102
Ω、特に10−2〜25Ω程度の表面抵抗値を示す。The surface resistance value of the electromagnetic shielding material is, for example, 10-2 to 5×
102Ω, preferably about 10-2 to 1.5×102Ω. Particularly preferable electromagnetic shielding material is 10 to 102
It shows a surface resistance value of Ω, particularly about 10 −2 to 25 Ω.
前記導電性金属薄膜層と導電性塗膜とを組合わせる場合
、電磁シールド材は、導電性塗膜の厚みが薄くても高い
導電性および耐腐蝕性を示す。従って、導電性塗膜の厚
みは、均一な塗膜を形成できる範囲、例えば、5μm以
上である限り特に制限されず、膜厚の上限値は、経済性
および生産性の観点から決定される。導電性塗膜の厚み
は、通常、5〜100μm1好ましくは10〜80μm
1さらに好ましくは15〜50μm程度である。When the conductive metal thin film layer and a conductive coating are combined, the electromagnetic shielding material exhibits high conductivity and corrosion resistance even if the conductive coating is thin. Therefore, the thickness of the conductive coating film is not particularly limited as long as it is within a range where a uniform coating film can be formed, for example, 5 μm or more, and the upper limit of the film thickness is determined from the viewpoints of economy and productivity. The thickness of the conductive coating is usually 5 to 100 μm, preferably 10 to 80 μm.
1 More preferably, it is about 15 to 50 μm.
なお、前記導電性金属薄膜上には、少なくとも1層の導
電性塗膜が形成されていればよく、導電性塗膜は、同種
又は異種の2層以上の導電性塗膜で形成されていてもよ
い。また、導電性塗膜は、導電性および塗膜の特性に悪
影響を及ぼさない範囲で、可塑剤、分散剤、着色剤、酸
化防止剤、紫外線吸収剤、充填剤などの添加剤を含んで
いてもよい。Note that it is sufficient that at least one conductive coating film is formed on the conductive metal thin film, and the conductive coating film may be formed of two or more conductive coating films of the same type or different types. Good too. In addition, conductive coatings may contain additives such as plasticizers, dispersants, colorants, antioxidants, ultraviolet absorbers, fillers, etc., to the extent that they do not adversely affect the conductivity and properties of the coating. Good too.
本発明の電磁シールド材は、鉄系基材の少なくとも一方
の面に導電性金属薄膜層と導電性塗膜とが形成されてい
ればよい。The electromagnetic shielding material of the present invention only needs to have a conductive metal thin film layer and a conductive coating formed on at least one surface of an iron-based base material.
本発明の電磁シールド材は、鉄系基材の表面に導電性金
属薄膜を形成する金属薄膜形成工程と、導電性金属薄膜
に導電性塗料を塗布する塗布工程とを経ることにより製
造できる。The electromagnetic shielding material of the present invention can be manufactured through a metal thin film forming step of forming a conductive metal thin film on the surface of an iron-based base material, and a coating step of applying a conductive paint to the conductive metal thin film.
鉄系基材には、通常、メツキ処理に先だって慣用の前処
理が施される。前処理としては、例えば、脱脂処理、酸
洗処理、表面研磨処理などが挙げられる。Iron-based substrates are usually subjected to conventional pretreatment prior to plating. Examples of the pretreatment include degreasing treatment, pickling treatment, and surface polishing treatment.
導電性金属薄膜は、慣用の成膜手段、例えば、蒸着、ス
パッタリングなどのPVDまたはCVD法により形成す
ることも可能であるが、生産効率の観点から、メツキ処
理により形成するのが好ましい。メツキ処理は、電気メ
ツキ処理および無電解メツキ処理のいずれであってもよ
いが、均一で密着性に優れた金属薄膜を簡便かつ生産性
よく形成できる無電解メツキ処理が好ましい。The conductive metal thin film can be formed by conventional film forming means, for example, PVD or CVD methods such as vapor deposition and sputtering, but from the viewpoint of production efficiency, it is preferable to form it by plating. The plating process may be either an electroplating process or an electroless plating process, but the electroless plating process is preferable because it can form a uniform thin metal film with excellent adhesion easily and with high productivity.
この無電解メツキ処理は、慣用の方法、例えば、少なく
とも前記金属薄膜を形成する金属塩と還元剤とを含む無
電解メツキ洛中に浸漬することにより行なうことができ
る。導電性金属薄膜を構成する金属塩としては、塩酸塩
、硝酸塩、硫酸塩、次亜リン酸塩、酢酸塩、シアン化ア
ルカリなどの慣用の塩が使用できる。これらの無電解メ
ツキ処理の中で、容易かつ生産性よく高い導電性金属薄
膜を形成できる無電解銅メツキ処理、特に無電解ニッケ
ルメッキ処理が好ましい。無電解ニッケルメッキ処理に
より得られたニッケル薄膜は、導電性および耐腐蝕性が
高く、しかも前記鉄系基材および導電性塗膜との密着性
に優れる。This electroless plating treatment can be carried out by a conventional method, for example, by immersing it in an electroless plating solution containing at least the metal salt forming the metal thin film and a reducing agent. As the metal salt constituting the conductive metal thin film, conventional salts such as hydrochloride, nitrate, sulfate, hypophosphite, acetate, and alkali cyanide can be used. Among these electroless plating treatments, electroless copper plating, particularly electroless nickel plating, is preferred because it can form a highly conductive metal thin film easily and with good productivity. The nickel thin film obtained by electroless nickel plating has high conductivity and corrosion resistance, and also has excellent adhesion to the iron base material and the conductive coating film.
還元剤としては、例えば、次亜リン酸塩、水素化ホウ素
化合物、ヒドラジン、ホルムアルデヒド、ブドウ糖、酒
石酸などが挙げられ、これらの還元剤は一種または二種
以上使用できる。また、無電解メツキ処理浴には、慣用
の添加剤、例えば、酢酸ナトリウム、プロピオン酸、乳
酸、塩化アンモニウム、硫酸アンモニウム、マロン酸ナ
トリウム、エチレンジアミン、水酸化ナトリウム、ED
TAなどが含まれていてもよい。Examples of the reducing agent include hypophosphites, borohydride compounds, hydrazine, formaldehyde, glucose, and tartaric acid, and one or more of these reducing agents can be used. The electroless plating bath also contains conventional additives such as sodium acetate, propionic acid, lactic acid, ammonium chloride, ammonium sulfate, sodium malonate, ethylenediamine, sodium hydroxide, ED
TA etc. may be included.
無電解メツキ浴は、例えば、pH3〜6程度の酸性浴、
pH7程度の中性浴、pH3〜6程程度のアルカリ性浴
などであってもよく、また低温浴、高温浴のいずれであ
ってもよい。Electroless plating baths include, for example, acidic baths with a pH of about 3 to 6;
A neutral bath with a pH of about 7, an alkaline bath with a pH of about 3 to 6, etc. may be used, and either a low temperature bath or a high temperature bath may be used.
無電解メツキ処理による金属薄膜の厚みは、浴への浸漬
時間を調整するという簡便な操作で制御できる。The thickness of the metal thin film produced by electroless plating can be controlled simply by adjusting the immersion time in the bath.
導電性金属薄膜の表面は、クロム酸やその塩で処理して
もよい。クロム酸やその塩で導電性金属薄膜を処理する
場合には、耐蝕性および導電性塗膜との長期に亘る密着
性を確保てきる。The surface of the conductive metal thin film may be treated with chromic acid or its salt. When a conductive metal thin film is treated with chromic acid or its salt, corrosion resistance and long-term adhesion to the conductive coating film can be ensured.
塗布工程では、導電性金属薄膜の表面に導電性塗料を適
用する。In the coating process, a conductive paint is applied to the surface of the conductive metal thin film.
導電性塗料の種類は特に制限されず、例えば、水性塗料
、溶剤型塗料のいずれであってもよい。The type of conductive paint is not particularly limited, and may be either a water-based paint or a solvent-based paint, for example.
導電性塗料は、前記のように、導電性材料と樹脂とを含
んでいる。樹脂に対する導電性材料の適正な含有量は、
その種類に応じて変化するが、通常、樹脂/導電性材料
−20〜95/80〜5重量部、好ましくは50〜85
150〜15重量部程度である。導電性材料の含有量が
上記範囲未満である場合には、電磁シールド性を高める
ことが困難であり、上記範囲を越える場合には、導電性
塗膜の密着性などが低下し易い。好ましい導電性塗料は
、密着性および耐性に優れる焼付は型塗料である。As described above, the conductive paint contains a conductive material and a resin. The appropriate content of conductive material in resin is
Although it varies depending on the type, usually resin/conductive material -20 to 95/80 to 5 parts by weight, preferably 50 to 85 parts by weight.
It is about 150 to 15 parts by weight. When the content of the conductive material is less than the above range, it is difficult to improve electromagnetic shielding properties, and when it exceeds the above range, the adhesion of the conductive coating film is likely to deteriorate. A preferred conductive paint is a baking type paint that has excellent adhesion and durability.
なお、水性又は溶剤型導電性塗料は、その種類に応じて
、水、アルコール類、脂肪族炭化水素類、芳香族炭化水
素類、エステル類、ケトン類、エーテル類などの溶媒を
含んでおり、さらに、消泡剤、粘度調整剤、界面活性剤
、レベリング剤、前記各種の添加剤などを含んでいても
よい。Note that water-based or solvent-based conductive paints contain solvents such as water, alcohols, aliphatic hydrocarbons, aromatic hydrocarbons, esters, ketones, and ethers, depending on the type. Furthermore, it may contain an antifoaming agent, a viscosity modifier, a surfactant, a leveling agent, the various additives mentioned above, and the like.
塗布工程では、慣用の塗布方法、例えば、ディッピング
、ロールコーティング、スプレーコーティングなどが採
用できる。In the coating process, conventional coating methods such as dipping, roll coating, spray coating, etc. can be employed.
本発明の方法では、鉄系基材と導電性塗膜との間に導電
性金属薄膜を介在させるので、導電性塗膜の厚みが薄く
ても、高い耐腐蝕性および導電性を示す。また、介在す
る導電性金属薄膜により導電性塗料の導電性が効果的に
発現する。従って、複数回に亘り導電性塗料を塗布して
膜厚を大きくすることなく、1回の塗布により、高い電
磁シールド性を示す電磁シールド材が得られ、生産性が
高い。しかも高価な導電性塗料の使用量が少なくて済む
ので、経済的に有利である。従って、塗布工程では、1
回のコーティングにより形成できる塗膜厚、例えば乾燥
後の塗膜厚が10〜50μm、特に15〜45μm程度
となるように導電性塗料を塗布するのが好ましい。In the method of the present invention, since a conductive metal thin film is interposed between the iron-based base material and the conductive coating film, even if the conductive coating film is thin, it exhibits high corrosion resistance and conductivity. Furthermore, the intervening conductive metal thin film effectively exhibits the conductivity of the conductive paint. Therefore, an electromagnetic shielding material exhibiting high electromagnetic shielding properties can be obtained by applying the conductive paint once without increasing the film thickness by applying the conductive paint multiple times, resulting in high productivity. Moreover, since only a small amount of expensive conductive paint is used, it is economically advantageous. Therefore, in the coating process, 1
It is preferable to apply the conductive paint so that the coating film thickness that can be formed by multiple coatings, for example, the coating film thickness after drying, is about 10 to 50 μm, particularly about 15 to 45 μm.
なお、導電性金属薄膜上に同種又は異種の導電性塗料を
複数回に亘り塗布してもよい。導電性金属薄膜上に耐蝕
性の高い導電性塗料を塗布した後、導電性の高い導電性
塗料を塗布する場合には、例えば、20〜50μm程度
の薄い塗膜厚であっても、高い耐蝕性を示し、かつ表面
抵抗値が著しく小さな電磁シールド材が得られる。また
、この方法で、例えば50〜100μm程度の厚い導電
性塗膜を形成する場合には、表面抵抗値がさらに小さく
なる。耐蝕性の高い導電性塗料としては、例えば、エポ
キシ樹脂、エポキシエステル樹脂などの熱硬化性樹脂を
含有する塗料が挙げられ、導電性の高い導電性塗料とし
ては、例えば、1〜10重量%の導電性カーボンブラッ
クと20〜30重量%のニッケル粉末と含有する塗料が
挙げられる。Note that the same or different types of conductive paints may be applied multiple times on the conductive metal thin film. When coating a conductive paint with high corrosion resistance on a conductive metal thin film and then applying a conductive paint with high conductivity, for example, even if the coating thickness is as thin as 20 to 50 μm, high corrosion resistance can be achieved. It is possible to obtain an electromagnetic shielding material that exhibits excellent properties and has a significantly small surface resistance value. Moreover, when a thick conductive coating film of, for example, about 50 to 100 μm is formed by this method, the surface resistance value becomes even smaller. Examples of conductive paints with high corrosion resistance include paints containing thermosetting resins such as epoxy resins and epoxy ester resins. Examples include paints containing conductive carbon black and 20 to 30% by weight of nickel powder.
導電性金属薄膜に塗布した導電性塗料は、その種類に応
じて、乾燥または硬化工程に供することにより導電性塗
膜を形成できる。乾燥及び硬化は、室温〜250℃程度
の温度で行なうことができるる。なお、導電性塗料に含
まれる樹脂が熱硬化性樹脂である場合、低温、例えば、
100〜170℃程度の温度で塗料を硬化させると、高
い耐蝕性を付与できる。また、高温、例えば、170〜
250℃程度で塗料を硬化させる場合には、電磁シール
ド材の表面抵抗値が小さくなる傾向を示す。The conductive paint applied to the conductive metal thin film can be subjected to a drying or curing process to form a conductive coating film, depending on the type of the conductive paint. Drying and curing can be performed at a temperature of about room temperature to 250°C. In addition, when the resin contained in the conductive paint is a thermosetting resin, low temperature, e.g.
If the paint is cured at a temperature of about 100 to 170°C, high corrosion resistance can be imparted. Also, high temperature, for example, 170~
When the paint is cured at about 250°C, the surface resistance value of the electromagnetic shielding material tends to decrease.
なお、本発明の好ましい態様は次の通りである。Note that preferred embodiments of the present invention are as follows.
(A)鉄系基材の表面に、厚み0.5〜10μm1好ま
しくは1〜5μmの導電性金属薄膜層を介して、導電性
塗膜が形成され、かつ表面抵抗値が10〜5×102Ω
である電磁シールド材。(A) A conductive coating film is formed on the surface of the iron base material via a conductive metal thin film layer with a thickness of 0.5 to 10 μm, preferably 1 to 5 μm, and has a surface resistance value of 10 to 5 × 10 Ω.
Electromagnetic shielding material.
(B)導電性金属薄膜層が、無電解メツキ層である電磁
シールド材。(B) An electromagnetic shielding material in which the conductive metal thin film layer is an electroless plating layer.
(C)導電性金属薄膜層か、無電解銅メツキ層、特に無
電解ニッケルメッキ層である電磁シールド材。(C) Electromagnetic shielding material which is a conductive metal thin film layer or an electroless copper plating layer, especially an electroless nickel plating layer.
(D)導電性塗膜の厚みが、5〜1.00 g m、好
ましくは10〜50μm1さらに好ましくは15〜45
μmである電磁シールド材。(D) The thickness of the conductive coating is 5 to 1.00 g m, preferably 10 to 50 μm, and more preferably 15 to 45 g m.
Electromagnetic shielding material with μm.
(E)鉄系基材の表面に、無電解メツキ処理により厚み
0.5〜10μm1好ましくは1〜5μmの導電性金属
薄膜を形成する金属薄膜形成工程と、導電性金属薄膜の
表面に、導電性塗料を1回塗布する塗布工程とを含む電
磁シールド材の製造方法。(E) A metal thin film forming step of forming a conductive metal thin film with a thickness of 0.5 to 10 μm, preferably 1 to 5 μm, on the surface of the iron-based base material by electroless plating, and forming a conductive metal thin film on the surface of the conductive metal thin film. 1. A method for producing an electromagnetic shielding material, comprising a coating step of applying a magnetic paint once.
(F)塗布工程での導電性塗料の1回の塗布量が、乾燥
又は硬化後の塗膜厚10〜50μm、特に15〜45μ
mである電磁シールド材の製造方法。(F) The amount of conductive paint applied once in the coating process is 10 to 50 μm, especially 15 to 45 μm in film thickness after drying or curing.
A method for manufacturing an electromagnetic shielding material.
(G)樹脂と導電性材料との割合が、樹脂/導電性材料
−20〜95/80〜5重量部、好ましくは50〜85
150〜15重量部である導電性塗料を用いる電磁シー
ルド材の製造方法。(G) The ratio of resin to conductive material is resin/conductive material -20 to 95/80 to 5 parts by weight, preferably 50 to 85 parts by weight.
A method for manufacturing an electromagnetic shielding material using a conductive paint in an amount of 150 to 15 parts by weight.
(H)樹脂が熱硬化性樹脂である導電性塗料を用いる電
磁シールド材の製造方法。(H) A method for producing an electromagnetic shielding material using a conductive paint whose resin is a thermosetting resin.
(1)導電性金属薄膜上に耐蝕性の高い導電性塗料を塗
布した後、導電性の高い導電性塗料を塗布する電磁シー
ルド材の製造方法。(1) A method for producing an electromagnetic shielding material, in which a conductive paint with high corrosion resistance is applied on a conductive metal thin film, and then a conductive paint with high conductivity is applied.
(J)導電性金属薄膜上に、熱硬化性樹脂を含む導電性
塗料を塗布した後、好ましくは前記(1)の方法で導電
性塗料を順次塗布した後、低温で硬化させ、膜厚20〜
100μm程度の導電性塗膜を形成する電磁シールド材
の製造方法。(J) After applying a conductive paint containing a thermosetting resin on the conductive metal thin film, preferably sequentially applying the conductive paint by the method described in (1) above, and curing at a low temperature to obtain a film thickness of 20 ~
A method for manufacturing an electromagnetic shielding material that forms a conductive coating film of about 100 μm.
[発明の効果コ
本発明の電磁シールド材は、導電性金属薄膜層が介在す
るので、鉄系基材と導電性塗膜との密着性に優れると共
1ご、膜厚が薄くても高い耐蝕性、導電性および電磁シ
ールド性を示す。[Effects of the invention] Since the electromagnetic shielding material of the present invention has a conductive metal thin film layer, it has excellent adhesion between the iron-based base material and the conductive coating film, and has high adhesion even if the film thickness is thin. Exhibits corrosion resistance, electrical conductivity, and electromagnetic shielding properties.
また、本発明の電磁シールド材の製造方法では、導電性
塗膜の厚みを薄くできるので、上記の如き優れた特性を
有する電磁シールド材を効率よくかつ安価に製造できる
。Further, in the method for producing an electromagnetic shielding material of the present invention, the thickness of the conductive coating film can be reduced, so that an electromagnetic shielding material having the above-mentioned excellent properties can be produced efficiently and at low cost.
[実施例]
以下に、実施例に基づいて本発明をより詳細に゛説明す
る。[Examples] The present invention will be described in more detail below based on Examples.
実施例1
幅80mm、長さ120mmおよび厚み1,2圃の5p
cc鋼板をアルカリ脱脂処理し、水洗、酸洗、水洗した
後、下記の条件で無電解ニッケルメッキ処理を施し、厚
み約3μmの無電解ニッケルメッキ薄膜を形成した。Example 1 5p of width 80mm, length 120mm and thickness 1.2 fields
After a CC steel plate was subjected to alkaline degreasing treatment, water washing, pickling, and water washing, electroless nickel plating treatment was performed under the following conditions to form an electroless nickel plating thin film with a thickness of about 3 μm.
(a)無電解ニッケルメッキ液の組成
硫酸ニッケル 30 g/J酢酸ナトリウム
10 g/j次亜リン酸ナトリウム 10
g/J
(b)浴の温度 90℃
(e)メツキ時間 9分
次いで、無電解ニッケルメッキ薄膜面を、固形分中に導
電性カーボンブラックを5fr量%含むエポキシエステ
ル樹脂系導電性塗料をスプレー塗装し、乾燥炉にて温度
160℃で20分間焼付けし、膜厚40μmの導電性塗
膜を形成することにより、電磁シールド材を作製した。(a) Composition of electroless nickel plating solution Nickel sulfate 30 g/J Sodium acetate 10 g/J Sodium hypophosphite 10
g/J (b) Bath temperature: 90°C (e) Plating time: 9 minutes Next, the electroless nickel plated thin film surface was sprayed with an epoxy ester resin-based conductive paint containing 5fr% of conductive carbon black in the solid content. An electromagnetic shielding material was produced by painting and baking in a drying oven at a temperature of 160° C. for 20 minutes to form a conductive coating film with a thickness of 40 μm.
なお、導電性塗膜の膜厚は、電磁シールド材を切断し、
切断面の顕微鏡写真により測定した。The thickness of the conductive coating is determined by cutting the electromagnetic shielding material.
Measurement was made using a microscopic photograph of the cut surface.
また、焼付は条件を温度180”Cl2O分間とする以
外、上記と同様にして、電磁シールド材を作製した。Further, an electromagnetic shielding material was produced in the same manner as above except that the baking conditions were changed to a temperature of 180'' Cl2O for minutes.
比較例1
幅80 mm、長さ120 mmおよび厚み1.2mm
の5pcc鋼板をアルカリ脱脂処理し、水洗、酸洗、水
洗した後、チタンコロイド水溶液で表面調整した後、下
記の条件で、市販のリン酸亜鉛系化成処理液で処理し、
表面にリン酸塩皮膜を形成した。Comparative Example 1 Width: 80 mm, length: 120 mm, and thickness: 1.2 mm
A 5 pcc steel plate was subjected to alkali degreasing treatment, washed with water, pickled, and washed with water, and then surface conditioned with a titanium colloid aqueous solution, and then treated with a commercially available zinc phosphate chemical conversion treatment solution under the following conditions,
A phosphate film was formed on the surface.
(a)処理温度 55℃
<b>処理時間 7分
(c)乾燥条件 80℃で20分間
次いで、リン酸塩処理した鋼板の表面を、実施例1て用
いた導電性塗料をスプレー塗装し、実施例1と同様にし
て電磁シールド材を作製した。(a) Treatment temperature: 55°C <b> Treatment time: 7 minutes (c) Drying conditions: 80°C for 20 minutes Then, the surface of the phosphate-treated steel plate was spray-painted with the conductive paint used in Example 1, An electromagnetic shielding material was produced in the same manner as in Example 1.
実施例2
実施例1と同様にして、5pcc鋼板を無電解ニッケル
メッキ処理し、無電解ニッケルメッキ薄膜面を、固形分
中、導電性カーボンブラックを5重量%、ニッケル粉末
を15重量%含むエポキシエステル樹脂系導電性塗料を
スプレー塗装し、乾燥炉にて温度160℃で20分間焼
付けし、膜厚25μmの導電性塗膜を形成することによ
り、電磁シールド材を作製した。Example 2 A 5 pcc steel plate was subjected to electroless nickel plating in the same manner as in Example 1, and the electroless nickel plated thin film surface was coated with epoxy containing 5% by weight of conductive carbon black and 15% by weight of nickel powder in the solid content. An electromagnetic shielding material was prepared by spray painting an ester resin-based conductive paint and baking it in a drying oven at a temperature of 160° C. for 20 minutes to form a conductive coating film with a thickness of 25 μm.
また、焼付は条件を温度180”Cl2O分間とする以
外、上記と同様にして、電磁シールド材を作製した。Further, an electromagnetic shielding material was produced in the same manner as above except that the baking conditions were changed to a temperature of 180'' Cl2O for minutes.
比較例2
spcc鋼板を比較例1と同様にリン酸塩処理する以外
、実施例2と同様にして、電磁シールド材を作製した。Comparative Example 2 An electromagnetic shielding material was produced in the same manner as in Example 2, except that the SPCC steel plate was treated with phosphate in the same manner as in Comparative Example 1.
実施例3
実施例1と同様にして、5pcc鋼板を無電解ニッケル
メッキ処理し、無電解ニッケルメッキ薄膜面を、固形分
中、導電性カーボンブラックを3重量%、ニッケル粉末
を26重量%含むアクリル樹脂系導電性塗料をスプレー
塗装し、乾燥炉にて温度160℃で20分間焼付けし、
膜厚30μmの導電性塗膜を形成することにより、電磁
シールド材を作製した。Example 3 A 5 pcc steel plate was subjected to electroless nickel plating in the same manner as in Example 1, and the electroless nickel plated thin film surface was coated with acrylic material containing 3% by weight of conductive carbon black and 26% by weight of nickel powder in the solid content. Spray paint with resin-based conductive paint and bake in a drying oven at a temperature of 160°C for 20 minutes.
An electromagnetic shielding material was produced by forming a conductive coating film with a thickness of 30 μm.
また、焼付は条件を温度180℃、20分間とする以外
、上記と同様にして、電磁シールド材を作製した。Further, an electromagnetic shielding material was produced in the same manner as above except that the baking conditions were 180° C. for 20 minutes.
比較例3
spcc鋼板を比較例1と同様にリン酸塩処理する以外
、実施例3と同様にして、導電性塗膜が形成された電磁
シールド材を作製した。Comparative Example 3 An electromagnetic shielding material on which a conductive coating was formed was produced in the same manner as in Example 3, except that the SPCC steel plate was treated with phosphate in the same manner as in Comparative Example 1.
実施例4
実施例1と同様にして、5pcc鋼板を無電解ニッケル
メッキ処理し、無電解ニッケルメッキ薄膜面を、実施例
1で用いた導電性塗料をスプレー塗装し、室温で10分
間放置した後、実施例3で用いた導電性塗料をスプレー
塗装した。その後、乾燥炉にて温度160℃で20分間
焼付けし、下層の膜厚20μm、上層の膜厚20μm1
総膜厚40μmの導電性塗膜を形成することにより、電
磁シールド材を作製した。Example 4 A 5 pcc steel plate was subjected to electroless nickel plating in the same manner as in Example 1, and the electroless nickel plated thin film surface was spray-painted with the conductive paint used in Example 1, and after being left at room temperature for 10 minutes. The conductive paint used in Example 3 was spray coated. After that, it was baked in a drying oven at a temperature of 160°C for 20 minutes, and the lower layer had a film thickness of 20 μm and the upper layer had a film thickness of 20 μm.
An electromagnetic shielding material was produced by forming a conductive coating film with a total thickness of 40 μm.
実施例5
実施例1と同様にして、5pcc鋼板を無電解ニッケル
メッキ処理し、無電解ニッケルメッキ薄膜面を、実施例
1で用いた導電性塗料をスプレー塗装し、室温で10分
間放置した後、実施例3て用いた導電性塗料をスプレー
塗装した。その後、乾燥炉にて温度160℃で20分間
焼付けし、下層の膜厚40μm、上層の膜厚40μm、
総膜厚80μmの導電性塗膜を形成することにより、電
磁シールド材を作製した。Example 5 A 5 pcc steel plate was subjected to electroless nickel plating in the same manner as in Example 1, and the electroless nickel plated thin film surface was spray-painted with the conductive paint used in Example 1, and after being left at room temperature for 10 minutes. The conductive paint used in Example 3 was spray-painted. After that, it was baked in a drying oven at a temperature of 160°C for 20 minutes, and the lower layer had a thickness of 40 μm, the upper layer had a thickness of 40 μm, and
An electromagnetic shielding material was produced by forming a conductive coating film with a total thickness of 80 μm.
そして、各実施例および比較例で得られた電磁シールド
材の表面抵抗値を電極間距離3amの条件で測定した。Then, the surface resistance values of the electromagnetic shielding materials obtained in each Example and Comparative Example were measured under the condition that the distance between the electrodes was 3 am.
また、耐蝕性は、試験片の略中夫に、素地に達する長さ
5aaのカットラインを入れ、JIs Z 237
1に準じて100時間の塩水噴霧試験により、下記の基
準で評価した。Corrosion resistance was determined by cutting a 5aa long cut line that reached the substrate approximately at the center of the test piece, and using JIs Z 237.
A 100-hour salt water spray test was conducted in accordance with No. 1 and evaluated based on the following criteria.
耐蝕性の評価基準
10:錆および膨れが共に全くなし
9:上部のカットラインにかすかに錆が発生8:カット
ラインの一部がら鯖が発生
7:カットラインから1 mm幅で錆又は膨れが発生
6:カットラインから1.5mm幅で錆又は膨れが発生
5:カットラインから2 mm幅で錆又は膨れが発生
4:カットラインから3 mm幅で錆又は膨れが発生
3:カットラインからS mm幅で錆又は膨れが発生
2:カットラインから10mm幅で錆又は膨れが発生
1:全面から錆又は膨れが発生
結果を表に示す。Corrosion resistance evaluation criteria 10: No rust or blisters at all 9: Slight rust on the upper cut line 8: Part of the cut line has mackerel 7: Rust or blisters 1 mm wide from the cut line Occurrence 6: Rust or blisters occur within a width of 1.5 mm from the cut line 5: Rust or blisters occur within a width of 2 mm from the cut line 4: Rust or blisters occur within a width of 3 mm from the cut line 3: S from the cut line Rust or blisters occur in a width of 10 mm from the cut line 2: Rust or blisters occur in a width of 10 mm from the cut line 1: Rust or blisters occur on the entire surface The results are shown in the table.
(以下、余白)
表より明らかなように、各実施例の電磁シールド材は、
比較例の電磁シールド材よりも表面抵抗値が著しく小さ
く、また耐蝕性に優れている。(Hereinafter, blank space) As is clear from the table, the electromagnetic shielding material of each example was
The surface resistance value is significantly lower than that of the electromagnetic shielding material of the comparative example, and the material has excellent corrosion resistance.
なお、各実施例の電磁シールド材について、塩水噴霧2
4時間後の塗膜の密着性を、間隔3 mm、コハン目1
6個のゴバン目試験により評価したところ、いずれも1
6/16であり、剥離がなく、密着性に優れていた。In addition, regarding the electromagnetic shielding material of each example, salt water spray 2
After 4 hours, the adhesion of the coating film was measured with a spacing of 3 mm and a diagonal of 1.
When evaluated by six goban eyes tests, all of them were 1
The score was 6/16, indicating that there was no peeling and the adhesion was excellent.
特許出願人 株式会社興和工業所Patent applicant: Kowa Kogyo Co., Ltd.
Claims (3)
電性塗膜が形成されていることを特徴とする電磁シール
ド材。1. An electromagnetic shielding material characterized in that a conductive coating film is formed on the surface of an iron-based base material via a conductive metal thin film layer.
る請求項1記載の電磁シールド材。2. The electromagnetic shielding material according to claim 1, wherein the conductive metal thin film layer is an electroless nickel plating layer.
膜形成工程と、導電性金属薄膜の表面に、導電性塗料を
塗布する塗布工程とを含むことを特徴とする電磁シール
ド材の製造方法。3. A method for producing an electromagnetic shielding material, comprising a metal thin film forming step of forming a conductive metal thin film on the surface of an iron-based base material, and a coating step of applying a conductive paint to the surface of the conductive metal thin film. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15636290A JPH0448697A (en) | 1990-06-13 | 1990-06-13 | Electromagnetic shielding material and manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15636290A JPH0448697A (en) | 1990-06-13 | 1990-06-13 | Electromagnetic shielding material and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0448697A true JPH0448697A (en) | 1992-02-18 |
Family
ID=15626099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15636290A Pending JPH0448697A (en) | 1990-06-13 | 1990-06-13 | Electromagnetic shielding material and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0448697A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07122871A (en) * | 1993-10-25 | 1995-05-12 | Nec Corp | Electromagnetic wave shielding coating method for electronic device housing |
| CN100376334C (en) * | 2004-02-25 | 2008-03-26 | 闳晖实业股份有限公司 | Method for manufacturing metal product and product thereof |
| EP1903140A1 (en) | 2006-09-12 | 2008-03-26 | Formosa Taffeta Co.,Ltd. | Color-coated, fouling-resistant conductive cloth and manufacturing method thereof |
| US8173555B2 (en) | 2006-09-06 | 2012-05-08 | Formosa Taffeta Co., Ltd. | Color-coated, fouling-resistant conductive cloth and manufacturing method thereof |
| CN104451549A (en) * | 2014-11-28 | 2015-03-25 | 广东欧珀移动通信有限公司 | Metal workpiece and outer surface spray processing method of metal workpiece |
| CN109735832A (en) * | 2019-02-26 | 2019-05-10 | 秦皇岛玻璃工业研究设计院有限公司 | It is a kind of shield silk screen preparation method and preparation shielding silk screen and shield glass |
-
1990
- 1990-06-13 JP JP15636290A patent/JPH0448697A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07122871A (en) * | 1993-10-25 | 1995-05-12 | Nec Corp | Electromagnetic wave shielding coating method for electronic device housing |
| CN100376334C (en) * | 2004-02-25 | 2008-03-26 | 闳晖实业股份有限公司 | Method for manufacturing metal product and product thereof |
| US8173555B2 (en) | 2006-09-06 | 2012-05-08 | Formosa Taffeta Co., Ltd. | Color-coated, fouling-resistant conductive cloth and manufacturing method thereof |
| EP1903140A1 (en) | 2006-09-12 | 2008-03-26 | Formosa Taffeta Co.,Ltd. | Color-coated, fouling-resistant conductive cloth and manufacturing method thereof |
| CN104451549A (en) * | 2014-11-28 | 2015-03-25 | 广东欧珀移动通信有限公司 | Metal workpiece and outer surface spray processing method of metal workpiece |
| CN109735832A (en) * | 2019-02-26 | 2019-05-10 | 秦皇岛玻璃工业研究设计院有限公司 | It is a kind of shield silk screen preparation method and preparation shielding silk screen and shield glass |
| CN109735832B (en) * | 2019-02-26 | 2021-01-22 | 秦皇岛玻璃工业研究设计院有限公司 | Preparation method of shielding wire mesh, prepared shielding wire mesh and shielding glass |
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