JPH0448745A - Evaluation of wear resistance of thin film - Google Patents
Evaluation of wear resistance of thin filmInfo
- Publication number
- JPH0448745A JPH0448745A JP15792790A JP15792790A JPH0448745A JP H0448745 A JPH0448745 A JP H0448745A JP 15792790 A JP15792790 A JP 15792790A JP 15792790 A JP15792790 A JP 15792790A JP H0448745 A JPH0448745 A JP H0448745A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- wear
- film
- injecting
- wear resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、薄膜の耐摩耗性を評価する評価方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an evaluation method for evaluating the wear resistance of a thin film.
近年、真空蒸着やスパッタリング、CVD法などにより
各種材料のfiI膜(厚さ数ミクロン以下)が形成され
、さまざまな用途に使われるようになった。その中で、
特に高硬度材料の薄膜により耐摩耗性を向上させること
が注目されている。これらの薄膜において、その耐摩耗
性の評価手段としては、[固体潤滑ハンドブックJ p
、371〜326(宰書房1982年〉に示されたよう
なバルク材料の評価に適したピンオンディスク式摩耗試
験や、ダイヤモンド圧子などによる引っかき試験などが
従来用いられてきた。また、Tribology Tr
ansactIonsVol、31.p、228(19
8g)で示されたような微粒子による研磨(ボリッシニ
)を行い、その研磨速度により評価する方法も考えられ
ている。In recent years, fiI films (with a thickness of several microns or less) of various materials have been formed by vacuum evaporation, sputtering, CVD, etc., and have come to be used for various purposes. among them,
In particular, attention has been focused on improving wear resistance by using thin films of highly hard materials. As a means of evaluating the wear resistance of these thin films, [Solid Lubrication Handbook J p
, 371-326 (Zai Shobo, 1982), a pin-on-disk type abrasion test suitable for evaluating bulk materials, and a scratch test using a diamond indenter, etc. have been conventionally used.
ansactIonsVol, 31. p, 228 (19
A method of performing polishing (Borissini) using fine particles as shown in 8g) and evaluating it based on the polishing rate has also been considered.
第3図はピンオンディスク式摩耗試験を説明するための
概略図で、試料であるピン11をディスク12に押し付
け、一定時間ディスク12を回転させて摩耗の程度を調
べるものである。FIG. 3 is a schematic diagram for explaining a pin-on-disk type wear test, in which a pin 11 as a sample is pressed against a disk 12, and the disk 12 is rotated for a certain period of time to examine the degree of wear.
また、第4図(a)、(b)は微粒子による研磨を行う
タイプの試験機で、微粒子を界面活性剤などとともに水
に溶いた懸濁液を第4図(a)に示すように、滴下ノズ
ル23より研磨パッド22上に滴下する。その研磨パッ
ド22上に、第4図(b)に示す試料ホルダ24に固定
された試料21を押し付け、研磨パッド22と試料21
を相対的に移動させながら研磨を行い、その研磨速度(
単位時間当たりの研磨深さ)により耐摩耗性を評価する
ものである。なお、25は前記試料ホルダ24の回転軸
である。In addition, Figures 4(a) and (b) show a test machine of the type that performs polishing using fine particles, and a suspension of fine particles dissolved in water together with a surfactant, etc., is used as shown in Figure 4(a). It is dripped onto the polishing pad 22 from the dripping nozzle 23. The sample 21 fixed to the sample holder 24 shown in FIG. 4(b) is pressed onto the polishing pad 22, and the polishing pad 22 and sample 21
Polishing is performed while moving relatively, and the polishing speed (
Wear resistance is evaluated based on the polishing depth (polishing depth per unit time). Note that 25 is a rotation axis of the sample holder 24.
しかしながら、上記のようなピンオンディスク式や引っ
かき式による耐摩耗性の評価方法では、微小な加圧力の
調整が困難であり、また、ポリッシュ方式では試料端部
への応力集中によりいわゆる面ブレが起こり、正確な摩
耗量の評価ができない。また、ブラスト法でも砂の粒子
を噴射する時にその運動エネルギーを大きくしないと薄
膜が摩耗せず、運動エネルギーを大きくすると、薄膜表
面だけに力がかかるのでなく、下地にまで力がかかって
しまい、薄膜の剥離や巨視的な変形を引き起こすという
問題点があった。However, with the above-mentioned pin-on-disc or scratch-based wear resistance evaluation methods, it is difficult to adjust the minute pressure, and the polishing method causes so-called surface wobbling due to stress concentration at the sample edge. This makes it impossible to accurately evaluate the amount of wear. Also, in the blasting method, the thin film will not wear unless the kinetic energy is increased when sand particles are injected, and if the kinetic energy is increased, the force will not only be applied to the surface of the thin film, but will also be applied to the underlying layer. There were problems in that it caused peeling of the thin film and macroscopic deformation.
この発明は、上記のような問題点を解消するためになさ
れたもので、薄膜の剥離や巨視的変形を伴わず、精度よ
く薄膜の耐摩耗性を評価できる方法を提供することを目
的とするものである。This invention was made to solve the above-mentioned problems, and aims to provide a method that can accurately evaluate the wear resistance of a thin film without peeling or macroscopic deformation of the thin film. It is something.
この発明に係る薄膜の耐摩耗性評価方法は、基板上に形
成された薄膜表面に、高硬度材料の微粒子を水に懸濁し
た懸濁液を噴射用ノズルから噴射せしめ、薄膜の摩耗度
を検出するものである。A method for evaluating wear resistance of a thin film according to the present invention involves spraying a suspension of fine particles of a highly hard material in water from a spray nozzle onto the surface of a thin film formed on a substrate, and evaluating the degree of wear of the thin film. It is something to detect.
この発明においては、高硬度材料の微粒子を水に懸濁し
た懸濁液を薄膜表面に噴射し、薄膜最表面で生ずる微小
摩耗を検出することによって4膜の耐摩耗性の評価が正
確に行える。In this invention, the wear resistance of the four films can be accurately evaluated by spraying a suspension of fine particles of a highly hard material in water onto the surface of the thin film and detecting the minute abrasion that occurs on the outermost surface of the thin film. .
以下、この発明ついて説明する。 This invention will be explained below.
第1図はこの発明に基づく薄膜の耐摩耗性評価を行うた
めの装置の概略図である。この図で、1は基板(ウェハ
)上に種々の方法で形成した試料となる薄膜、2は噴射
用ノズル、3は加圧タンク、4はこの加圧タンク3に収
容された懸濁液で、この懸濁#14は、高硬度材料の微
粒子を界面活性剤とともに水に懸濁したものである。こ
のように、界面活性剤を用いると微粒子が安定して溶液
中に分散させておくことができる。FIG. 1 is a schematic diagram of an apparatus for evaluating the wear resistance of thin films based on the present invention. In this figure, 1 is a thin film as a sample formed on a substrate (wafer) by various methods, 2 is an injection nozzle, 3 is a pressurized tank, and 4 is a suspension contained in this pressurized tank 3. , this suspension #14 is a suspension of fine particles of a highly hard material in water together with a surfactant. In this way, when a surfactant is used, fine particles can be stably dispersed in a solution.
高硬度材料の微粒子を、例えばバルク硬度で示すと下記
のようになる。For example, the bulk hardness of fine particles of a high hardness material is as follows.
酸化アルミ Hv 1800
炭化ケイ素 H・ 25°0
また、その粒度については、概ね0.3μm〜0.5m
m程度が適用できる。Aluminum oxide Hv 1800 Silicon carbide H・25°0 Also, the particle size is approximately 0.3 μm to 0.5 m
Approximately m is applicable.
薄膜1として、例えばS1ウニへ上にイオンブレーティ
ング法で形成された窒化チタン膜(厚さ0.2μ+n)
を用い、噴射用微粒子として酸化アルミ (平均粒子径
15μff+)を界面活性剤とともに水に懸濁した懸濁
液4を噴射圧7kg/cffl”、ノズル径0.2en
ffIの噴射用ノズル2から噴射した。As the thin film 1, for example, a titanium nitride film (thickness 0.2μ+n) formed on the S1 sea urchin by an ion-blating method.
Using a suspension 4 in which aluminum oxide (average particle size 15 μff+) was suspended in water together with a surfactant as fine particles for injection, the injection pressure was 7 kg/cffl, and the nozzle diameter was 0.2 en.
It was injected from the ffI injection nozzle 2.
摩耗深さは繰り返し反射干渉法により干渉しまのずれか
ら算出した。噴射時間に対し、最大摩耗深さをプロット
したものを第2図に示す。窒化チタン膜の膜厚(0,2
μff+)近くの深さまでは摩耗が一定の速度で進行し
ている。また、乙のときの表面を光学顕微鏡(倍率40
0倍)で観察しても、窒化チタン膜の剥離は見られなか
った。The wear depth was calculated from the deviation of interference stripes using repeated reflection interferometry. Figure 2 shows a plot of maximum wear depth versus injection time. Film thickness of titanium nitride film (0,2
Wear progresses at a constant speed up to a depth near μff+). In addition, the surface at the time of O was examined using an optical microscope (magnification: 40
Even when observed at 0x magnification, no peeling of the titanium nitride film was observed.
同じ窒化チタン膜を従来技術である引っかき法とポリッ
シュ方式で評価したが、引っかき法はダイヤモンド針(
先端曲率半径約10101Iで荷重3g、相対速度10
cm/minで引っかいた。The same titanium nitride film was evaluated using the conventional scratching method and polishing method, but the scratching method used a diamond needle (
The tip curvature radius is approximately 10101I, the load is 3g, and the relative speed is 10.
Scratched at cm/min.
その結果、窒化チタン膜は塑性変形によりキズとその周
囲に盛り上がり部ができただけで摩耗しなかった。一方
、ポリッシュ法では平均粒径1μmの酸化アルミ研磨剤
で面圧0.3kg/c+n”で研磨したが、試料の端部
(Siラウェ、の外周付近)のみ削れ、試料中央部は摩
耗しなかった。As a result, the titanium nitride film did not wear out, only scratches and raised areas were formed around the scratches due to plastic deformation. On the other hand, in the polishing method, polishing was performed with an aluminum oxide abrasive with an average particle size of 1 μm at a surface pressure of 0.3 kg/c+n'', but only the edges of the sample (near the outer periphery of the Si raw material) were ground, but the center of the sample was not worn. Ta.
また、他の実施例として金属薄膜型磁気ディスク媒体の
保護膜(スパッタリングにより形成された炭素膜、厚さ
0.05μm)をこの発明に係る方法で評価した。この
時の噴射用微粒子は炭化ケイ素(平均粒径5,17+1
1)で、噴射圧5kg/cffI’、7ズル径0.1r
nmで噴射した。スパッタガス圧2InTO「「で成膜
した炭素膜の場合、剥離は生じず、炭素膜厚(0,05
μm)が削れるまで約10分要した。一方、炭素膜のス
パッタリング条件を上の例とは異なり、ガス圧30 r
n Torrと設定して成膜した炭素膜では、同一条件
での摩耗試験を行ったところ、O,OSμm削れるのに
要した時間は約18分であった。このようにこの発明に
係る方法では、スパッタリング条件の遅いと炭素膜の耐
摩耗性の差を明確に対応づけることができた。In addition, as another example, a protective film (a carbon film formed by sputtering, thickness 0.05 μm) of a metal thin film type magnetic disk medium was evaluated using the method according to the present invention. The fine particles for injection at this time are silicon carbide (average particle size 5,17+1
1), injection pressure 5kg/cffI', 7th diameter 0.1r
Injected at nm. In the case of a carbon film formed at a sputtering gas pressure of 2InTO, no peeling occurred and the carbon film thickness (0.05
It took about 10 minutes to remove .mu.m). On the other hand, the sputtering conditions for the carbon film were different from those in the above example, and the gas pressure was 30 r.
When a wear test was conducted under the same conditions for a carbon film formed at n Torr, it took about 18 minutes to remove O,OS μm. As described above, in the method according to the present invention, it was possible to clearly correlate the slow sputtering conditions with the difference in wear resistance of the carbon film.
なお、上記実施例では噴射用微粒子として酸化アルミと
炭化ケイ素を用い、噴射圧を7kg/cffI2と5k
g/cm”にし、ノズル径を0.2m+nと0.1 r
n rnにした例を示したが、これに限らず微粒子とし
て酸化クロム、窒化ケイ素、ダイヤモンド。In the above example, aluminum oxide and silicon carbide were used as the injection particles, and the injection pressure was 7 kg/cffI2 and 5k.
g/cm”, and the nozzle diameter is 0.2 m + n and 0.1 r.
An example of n rn is shown, but the fine particles are not limited to chromium oxide, silicon nitride, and diamond.
酸化鉄などでも構わないし、噴射圧も1.5kg/Cm
”ないし20kg/Cm2の範囲で適宜設定すれば良い
。また、第1図の実施例では加圧タンク3を用いた例を
示したが、高圧ポンプを使用しても構わない。また、ノ
ズル径も0.05mmないし0.5mmの範囲であれば
同様の効果を奏する。さらに、耐摩耗性の評価をすべき
薄膜はセラミクス系薄膜の他金属薄膜、有機高分子薄膜
などいずれであってもよいことは言うまでもなく、その
膜厚も0.5ffIIr+以下であればよい。Iron oxide etc. can also be used, and the injection pressure is 1.5kg/Cm.
The pressure may be set appropriately within the range of 20 kg/cm2 to 20 kg/cm2.Also, although the embodiment shown in Fig. 1 shows an example using the pressurized tank 3, a high-pressure pump may also be used.Also, the nozzle diameter The same effect can be achieved if the thickness is in the range of 0.05 mm to 0.5 mm.Furthermore, the thin film to be evaluated for wear resistance may be any ceramic thin film, metal thin film, organic polymer thin film, etc. Needless to say, the film thickness may be 0.5ffIIr+ or less.
以上説明したように、この発明は、基板上に形成された
薄膜の表面に、高硬度材料の微粒子を水に懸濁した懸濁
液を噴射用ノズルから噴射せしめ、fipFIAの摩耗
度を検出するので、評価試験における薄膜の剥離がなく
、薄膜の正確な耐摩耗性を評価することができる。As explained above, the present invention detects the degree of wear of fipFIA by injecting a suspension of fine particles of a highly hard material in water from an injection nozzle onto the surface of a thin film formed on a substrate. Therefore, there is no peeling of the thin film during the evaluation test, and the wear resistance of the thin film can be accurately evaluated.
第1図はこの発明の耐摩耗性評価方法の一実施例を説明
するための装置の概略図、第2図はこの発明の実施例に
おける窒化チタン膜の耐摩耗深さと噴射時間の関係を示
す図、第3図、第4図は従来例を示す斜視図である。
図において、1は薄膜、2は噴射用ノズノし、3は加圧
タンク、4は懸濁液である。
代理人 大 岩 増 雄 (外2名)第1図
第2図
凸
第3図
噴射時間(分)Fig. 1 is a schematic diagram of an apparatus for explaining an embodiment of the wear resistance evaluation method of the present invention, and Fig. 2 shows the relationship between the wear resistance depth of the titanium nitride film and the injection time in the embodiment of the invention. 3 and 4 are perspective views showing conventional examples. In the figure, 1 is a thin film, 2 is an injection nozzle, 3 is a pressurized tank, and 4 is a suspension. Agent Masuo Oiwa (2 others) Figure 1 Figure 2 Convex Figure 3 Injection time (minutes)
Claims (1)
子を水に懸濁した懸濁液を噴射用ノズルから噴射せしめ
、前記薄膜の摩耗度を検出することを特徴とする薄膜の
耐摩耗性評価方法。Abrasion resistance of a thin film, characterized in that a suspension of fine particles of a highly hard material suspended in water is injected from a spray nozzle onto the surface of a thin film formed on a substrate, and the degree of wear of the thin film is detected. Gender evaluation method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15792790A JPH0448745A (en) | 1990-06-14 | 1990-06-14 | Evaluation of wear resistance of thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15792790A JPH0448745A (en) | 1990-06-14 | 1990-06-14 | Evaluation of wear resistance of thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0448745A true JPH0448745A (en) | 1992-02-18 |
Family
ID=15660515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15792790A Pending JPH0448745A (en) | 1990-06-14 | 1990-06-14 | Evaluation of wear resistance of thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0448745A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6411690B1 (en) | 1998-08-27 | 2002-06-25 | Kabushiki Kaisha Infocity | Display object selection system |
| US9243418B2 (en) | 2010-06-14 | 2016-01-26 | Max Bogl Bauunternehmung Gmbh & Co. Kg | Tower comprising an adapter piece and method for producing a tower comprising an adapter piece |
-
1990
- 1990-06-14 JP JP15792790A patent/JPH0448745A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6411690B1 (en) | 1998-08-27 | 2002-06-25 | Kabushiki Kaisha Infocity | Display object selection system |
| US9243418B2 (en) | 2010-06-14 | 2016-01-26 | Max Bogl Bauunternehmung Gmbh & Co. Kg | Tower comprising an adapter piece and method for producing a tower comprising an adapter piece |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Swain | Microfracture about scratches in brittle solids | |
| EP0064136B1 (en) | Magnetic disk substrate polishing method and polishing pad therefor | |
| Erickson et al. | Cohesion in plasma-sprayed coatings—a comparison between evaluation methods | |
| EP1217089B1 (en) | Enhanced surface preparation process for application of ceramic coatings | |
| US6004189A (en) | Finishing of tungsten carbide surfaces | |
| US6171224B1 (en) | Finishing of tungsten carbide surfaces | |
| US4466218A (en) | Fixed abrasive polishing media | |
| JP2015014503A (en) | Interface evaluation method | |
| JP3679882B2 (en) | Polishing cloth dresser and manufacturing method thereof | |
| JPH0448745A (en) | Evaluation of wear resistance of thin film | |
| Ohmori et al. | Investigation of substrate finishing conditions to improve adhesive strength of DLC films | |
| US6869340B2 (en) | Polishing cloth for and method of texturing a surface | |
| US6755722B1 (en) | Method of chemical mechanical texturing | |
| US20050172670A1 (en) | Method of manufacturing a glass substrate for a magnetic disk and method of manufacturing a magnetic disk | |
| JP2008006526A (en) | Polishing carrier | |
| Nanbu et al. | Wear resistance of AISI316L steel modified by pre-FPP treated DLC coating | |
| JP4698178B2 (en) | Carrier for holding an object to be polished | |
| US6350176B1 (en) | High quality optically polished aluminum mirror and process for producing | |
| US20150231757A1 (en) | Multiple-phase surfaces, and method therefor | |
| JP3713738B2 (en) | Diamond polishing method and apparatus | |
| CN109719469A (en) | Texture surface processing method for improving wear resistance of titanium alloy | |
| JP3078110B2 (en) | Single side polishing method | |
| JP5892414B2 (en) | Method for producing coated article excellent in corrosion resistance and coated article | |
| JP2001150351A (en) | Electrodeposition grinding wheel for dressing | |
| DL | Evaluation of abrasive wear resistance of self-fluxing Ni-base coatings by scratch testing. |