JPH0451861Y2 - - Google Patents
Info
- Publication number
- JPH0451861Y2 JPH0451861Y2 JP6580986U JP6580986U JPH0451861Y2 JP H0451861 Y2 JPH0451861 Y2 JP H0451861Y2 JP 6580986 U JP6580986 U JP 6580986U JP 6580986 U JP6580986 U JP 6580986U JP H0451861 Y2 JPH0451861 Y2 JP H0451861Y2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- automatic
- flow rate
- detection device
- control valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000428 dust Substances 0.000 claims description 20
- 238000001514 detection method Methods 0.000 claims description 15
- 238000013022 venting Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Flow Control (AREA)
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は真空室を有する装置、特に真空室の排
気及びベントを行う装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an apparatus having a vacuum chamber, and particularly to an apparatus for evacuating and venting the vacuum chamber.
真空処理装置としては一定時間排気及びベント
の量を抑えるスロー排気及びスローベント機構を
備えた真空室の排気及びベントを行う装置があ
る。
As a vacuum processing apparatus, there is an apparatus that performs evacuation and venting of a vacuum chamber and is equipped with a slow evacuation and slow vent mechanism that suppresses the amount of evacuation and venting for a certain period of time.
上述した従来の真空室の排気及びベントを行う
装置は第３図に示すように真空室１の排気及びベ
ント配管１ａ，１ｂに、定量のコンダクタンスを
与える固定コンダクタンスバルブ１２や手動式の
流量調節弁１４、排気バルブ１１、ベントバルブ
１３を含むバイパスラインL1，L2を設け、一定
時間排気配管１ａにコンダクタンスを与えたり、
或いはベント配管１ｂの流量を絞ることで真空室
１内での塵の舞い上がりを抑える機構になつてい
る。２は排気用ポンプ、６はバルブである。 As shown in FIG. 3, the conventional device for exhausting and venting a vacuum chamber described above includes a fixed conductance valve 12 that provides a fixed amount of conductance to the exhaust and vent piping 1a, 1b of the vacuum chamber 1, and a manual flow rate control valve. 14. Provide bypass lines L 1 and L 2 including the exhaust valve 11 and vent valve 13 to provide conductance to the exhaust pipe 1a for a certain period of time,
Alternatively, by restricting the flow rate of the vent pipe 1b, a mechanism is provided to suppress dust from flying up within the vacuum chamber 1. 2 is an exhaust pump, and 6 is a valve.
しかしながら、真空室１で実際の塵の状況を測
定していないため、真空室内に存在する塵の量が
変化したり排気及びベントの能力が変化すると、
有効に塵の舞い上がりを抑えることができないと
いう欠点がある。
However, since the actual dust situation in vacuum chamber 1 has not been measured, if the amount of dust existing in the vacuum chamber changes or the exhaust and vent capacity changes,
The drawback is that it cannot effectively suppress dust flying up.
本考案の目的は清浄状態で真空処理を行う真空
処理装置を提供することにある。 An object of the present invention is to provide a vacuum processing apparatus that performs vacuum processing in a clean state.
本考案は真空室の配管に自動コンダクタンス調
節バルブ或いは自動流量調節器を設け、該真空室
内に塵検出装置を設置し、塵検出装置の出力信号
に基づいて自動コンダクタンス調節バルブ及び自
動流量調節器の動作制御を行う制御部を備えたこ
とを特徴とする真空処理装置である。
The present invention installs an automatic conductance control valve or an automatic flow rate regulator in the piping of a vacuum chamber, installs a dust detection device in the vacuum chamber, and controls the automatic conductance control valve and automatic flow rate regulator based on the output signal of the dust detection device. This vacuum processing apparatus is characterized in that it includes a control section that performs operation control.
以下、本考案の一実施例を図により説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.
第１図ａ，ｂに示すように、真空室１の排気用
配管１ａにバルブ６を介して自動コンダクタンス
調節バルブ４及び排気用ポンプ２を接続し、一
方、真空室１のベント配管１ｂに自動流量調節器
３を接続し、また、真空室１内に塵検出装置５を
設置する。さらに塵検出装置５の出力信号に基づ
いて自動コンダクタンス調節バルブ４及び自動流
量調節器３の各動作部４ａ，３ａに指令を発する
制御部１５を備えている。 As shown in FIGS. 1a and 1b, an automatic conductance control valve 4 and an exhaust pump 2 are connected to the exhaust pipe 1a of the vacuum chamber 1 via a valve 6, while an automatic conductance control valve 4 and an exhaust pump 2 are connected to the exhaust pipe 1b of the vacuum chamber 1. A flow rate regulator 3 is connected, and a dust detection device 5 is installed in the vacuum chamber 1. Furthermore, a control section 15 is provided which issues commands to each operating section 4a, 3a of the automatic conductance control valve 4 and the automatic flow rate regulator 3 based on the output signal of the dust detection device 5.
本考案によれば、真空室１に設置された塵検出
装置５により真空室１内で舞い上がる塵を検出
し、その検出信号に基づき制御部１５から自動コ
ンダクタンス調節バルブ４の動作部４ａ及び自動
流量調節器３の動作部３ａに指令を発して自動コ
ンダクタンス調節バルブ４及び自動流量調節器３
の動作を制御し、真空室１内での塵の舞い上がり
を抑えながら排気及びベントを行う。 According to the present invention, dust flying up in the vacuum chamber 1 is detected by the dust detection device 5 installed in the vacuum chamber 1, and based on the detection signal, the control section 15 controls the operation section 4a of the automatic conductance control valve 4 and the automatic flow rate. A command is issued to the operating part 3a of the regulator 3 to control the automatic conductance control valve 4 and the automatic flow rate regulator 3.
The operation of the vacuum chamber 1 is controlled to perform exhaust and venting while suppressing dust from flying up inside the vacuum chamber 1.
第２図は塵検出装置５としてレーザー散乱によ
る塵検出装置を用いた場合の実施例である。レー
ザー発振器７からの光はスキヤナー８により真空
室１内の一定領域を走査し、光吸収コーン１０に
入る。塵により散乱された光を散乱光検知部９で
検知し、その出力を出力部９ａに入力する。出力
部９ａの信号を受けて制御部１５は出力部９ａへ
の入力電圧を一定基準値以下になるように自動コ
ンダクタンス調節バルブ４及び自動流量調節器３
を制御し、排気及びベントを行う。 FIG. 2 shows an embodiment in which a dust detection device using laser scattering is used as the dust detection device 5. In FIG. The light from the laser oscillator 7 is scanned over a certain area within the vacuum chamber 1 by a scanner 8 and enters a light absorption cone 10 . The light scattered by the dust is detected by the scattered light detection section 9, and its output is input to the output section 9a. In response to the signal from the output section 9a, the control section 15 controls the automatic conductance control valve 4 and the automatic flow rate regulator 3 so that the input voltage to the output section 9a is below a certain reference value.
control, exhaust and vent.
以上説明したように本考案は真空室内の塵の量
の変化や排気能力、ベント圧力の変化に対して塵
検出装置と自動コンダクタンス調節バルブ及び自
動流量調節器とを連動させることにより対処で
き、塵の舞い上がりを低減し清浄な処理を行うこ
とができるという効果がある。
As explained above, the present invention can cope with changes in the amount of dust in the vacuum chamber, exhaust capacity, and vent pressure by linking the dust detection device, automatic conductance control valve, and automatic flow rate regulator. This has the effect of reducing the amount of floating particles and making it possible to perform clean processing.
第１図ａは本考案の一実施例を示す構成図、ｂ
は制御系統図、第２図は塵検出装置の一例を示す
斜視図、第３図は従来の真空室排気及びベント装
置を示す構成図である。
１……真空室、２……排気用ポンプ、３……自
動流量調節器、４……自動コンダクタンス調節バ
ルブ、５……塵検出装置、６……バルブ、７……
レーザー発振器、８……スキヤナー、９……散乱
光検知部、１０……光吸収コーン。
Fig. 1a is a block diagram showing an embodiment of the present invention, b
1 is a control system diagram, FIG. 2 is a perspective view showing an example of a dust detection device, and FIG. 3 is a configuration diagram showing a conventional vacuum chamber exhaust and vent device. DESCRIPTION OF SYMBOLS 1...Vacuum chamber, 2...Exhaust pump, 3...Automatic flow controller, 4...Automatic conductance control valve, 5...Dust detection device, 6...Valve, 7...
Laser oscillator, 8... Scanner, 9... Scattered light detection unit, 10... Light absorption cone.
Claims (1)
或いは自動流量調節器を設け、該真空室内に塵検
出装置を設置し、塵検出装置の出力信号に基づい
て自動コンダクタンス調節バルブ及び自動流量調
節器の動作制御を行う制御部を備えたことを特徴
とする真空処理装置。 An automatic conductance control valve or automatic flow rate regulator is installed in the vacuum chamber piping, a dust detection device is installed in the vacuum chamber, and the operation of the automatic conductance control valve and automatic flow rate regulator is controlled based on the output signal of the dust detection device. 1. A vacuum processing apparatus characterized by comprising a control section for performing the processing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6580986U JPH0451861Y2 (en) | 1986-04-30 | 1986-04-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6580986U JPH0451861Y2 (en) | 1986-04-30 | 1986-04-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62179029U JPS62179029U (en) | 1987-11-13 |
| JPH0451861Y2 true JPH0451861Y2 (en) | 1992-12-07 |
Family
ID=30903227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6580986U Expired JPH0451861Y2 (en) | 1986-04-30 | 1986-04-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0451861Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0815542B2 (en) * | 1988-06-24 | 1996-02-21 | 富士通株式会社 | Exhaust method of valve with control function and decompression chamber |
-
1986
- 1986-04-30 JP JP6580986U patent/JPH0451861Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62179029U (en) | 1987-11-13 |
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