JPH0453047A - Optical memory element - Google Patents
Optical memory elementInfo
- Publication number
- JPH0453047A JPH0453047A JP16327190A JP16327190A JPH0453047A JP H0453047 A JPH0453047 A JP H0453047A JP 16327190 A JP16327190 A JP 16327190A JP 16327190 A JP16327190 A JP 16327190A JP H0453047 A JPH0453047 A JP H0453047A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- transition metal
- magneto
- rare earth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
本発明は、レーザー等の光を照射することにより、情報
の記憶、再生、消去等を行う光学記憶素子に関づ゛るし
のである。[Detailed description of the invention] (a) Industrial application field The present invention relates to an optical memory element that stores, reproduces, erases, etc. information by irradiating it with light such as a laser. .
(ロ)従来の技術
希土類と遷移金嘱との非晶質合金薄膜を用いた光磁気記
憶媒体は、その読み出し、特性が充分ではなく、従来、
種々の改善策が検討されている。(b) Conventional technology Magneto-optical storage media using thin films of amorphous alloys of rare earths and transition metals do not have sufficient readout characteristics;
Various improvement measures are being considered.
その−例として、基板上の光学記憶1乞に反射膜を設け
る方式(反射膜構造)が提案されている。この方式(ま
カー効果とファラデー効果の併用により性能指数の向上
を目指すもので、以前は、可視光領域で透明に近く、光
吸収係数の小さい磁性ガーネットでの利用が検討されて
い1こ。光磁気記憶媒体において、この方式を用いる場
合、その吸収係数の大きさから、膜厚は200人前後が
最適とされている。As an example, a method has been proposed in which a reflective film is provided on the optical memory 1 on the substrate (reflective film structure). This method (which aims to improve the figure of merit by combining the Maker effect and the Faraday effect) has previously been considered for use with magnetic garnet, which is nearly transparent in the visible light range and has a small light absorption coefficient. When using this method in a magnetic storage medium, the optimum film thickness is around 200 layers due to the magnitude of its absorption coefficient.
さらに、他の一例として、読み出し層と書き込み層とか
らなる二層構造の交換結合光磁気記憶媒体(磁気二層膜
媒体)が提案されている。この方式は、読み出し層にカ
ー回転角の大きな光磁気記憶媒体を用いることにより性
能指数の向上を目指すもので、−射的に読み出し層媒体
にはGdFe。Furthermore, as another example, an exchange-coupled magneto-optical storage medium (magnetic double-layer film medium) having a two-layer structure consisting of a read layer and a write layer has been proposed. This method aims to improve the figure of merit by using a magneto-optical storage medium with a large Kerr rotation angle for the readout layer, and the readout layer medium is shot using GdFe.
GclFeCo、TbFeCo等が用いられ、書き込み
層にはTbFeXDyFe、TbFeCo等が用いられ
ている。また、読み出し層、書き込み層の膜厚はカー回
転角の大きさ及び交換結合力の効果を考え各々500
A、二層合わせて1000人とすることが最も多い。GclFeCo, TbFeCo, etc. are used, and TbFeXDyFe, TbFeCo, etc. are used for the write layer. In addition, the film thicknesses of the read layer and write layer are each 500 mm, considering the size of Kerr rotation angle and the effect of exchange coupling force.
A: Most often, the number of people in the two layers is 1,000.
このような記憶媒体を用いた、情報の記憶、再生、消去
等を行う光磁気ディスクの応用は、近年、さらに高性能
を要するものになってきており、特に、アナログ記録の
分野では、例えば、動画記録に用いる場合、その再生画
質は、単一周波数を記録し1こ時のC/N値が大きいほ
ど高画質となるため、より高C/N値が望まれている。In recent years, the application of magneto-optical disks that use such storage media to store, reproduce, erase, etc. information has required even higher performance, and in particular, in the field of analog recording, for example, When used for video recording, a higher C/N value is desired because a single frequency is recorded and the larger the C/N value at one time, the higher the quality of the reproduced image.
(ハ)発明が解決しようとする課題
しかしながら、前記従来の光磁気記録媒体よりも高C/
N値を達成する光磁気記憶媒体は現在までに開発されて
いない。(c) Problems to be Solved by the Invention However, the C/P ratio is higher than that of the conventional magneto-optical recording medium.
A magneto-optical storage medium that achieves the N value has not been developed to date.
そこで、一つの試みとして、前記二側の各要素を合わせ
た、磁気二層膜を記憶媒体とする反射膜構造光磁気記憶
媒体(反射膜構造磁気二層膜光磁気記憶媒体)が考えら
れる。Therefore, as an attempt, a reflective film structure magneto-optical storage medium (reflective film structure magnetic double-layer film magneto-optical storage medium) using a magnetic double-layer film as a storage medium, which is a combination of the elements on the two sides, can be considered.
しかし、磁気二層膜の最適膜厚と反射膜構造における記
憶媒体の最適膜厚は大きく異なるため、実際には、反射
膜構造磁気二層膜光磁気記憶媒体を設計することは困難
であった。また、たとえ設計できても、そのC/N値が
従来の値は上回るかどうかは未知数であった。However, since the optimal film thickness of the magnetic double-layer film and the optimal film thickness of the storage medium with the reflective film structure are significantly different, it has been difficult to actually design a magnetic double-layer film magneto-optical storage medium with the reflective film structure. . Furthermore, even if a design could be made, it was unknown whether the C/N value would exceed the conventional value.
本発明の目的は、上記、反射膜構造磁気二層膜光磁気記
憶媒体の最適化を可能とし、[従来の技術]の項におい
て示した二つの例によって得られるC/N値を上回る性
能を有する光磁気記憶媒体を提供することにある。An object of the present invention is to enable optimization of the above-mentioned reflective film structure magnetic double-layer film magneto-optical storage medium, and to achieve performance exceeding the C/N value obtained by the two examples shown in the [Prior Art] section. An object of the present invention is to provide a magneto-optical storage medium having the following features.
(ニ)課題を解決するための手段及び作用かくして本発
明によれば、基板上に、誘電体膜、光磁気記憶膜、誘電
体膜及び反射膜をこの順に積層してなり、光磁気記憶膜
が、希土類遷移金属非晶質薄膜からなる第1層と、第1
層とは異なる組成の希土類遷移金属非晶質薄膜からなる
第2層との交換結合二層膜であり、上記第1層が、下記
組成式:
%式%
(式中、X=5〜25atI11%、Y= 1.8〜3
0atm%、Z=16〜24atm%)で示されかつ遷
移金属TMの副格子磁化M S TXが希土類金@RE
の副格子磁化Ms□より大きな希土類遷移金属合金から
なり、上記第2層も遷移金属TMの副格子磁化M s
tMが希土類金属REの副格子磁化MsR1より大きく
なる組成の希土類遷移金属合金からなり、さらに、これ
ら第1層と第2層の膜厚が各々160Å以上でかつ合わ
せて500Å以下であることを特徴とする光学記憶素子
が提供される。(d) Means and operation for solving the problems Thus, according to the present invention, a dielectric film, a magneto-optical memory film, a dielectric film, and a reflective film are laminated in this order on a substrate, and the magneto-optical memory film is a first layer consisting of a rare earth transition metal amorphous thin film, and a first layer
It is an exchange-coupled two-layer film with a second layer consisting of a rare earth transition metal amorphous thin film having a composition different from that of the first layer, and the first layer has the following composition formula: % formula % (wherein, X = 5 to 25 at I %, Y=1.8~3
0 atm%, Z=16 to 24 atm%) and the sublattice magnetization M S TX of the transition metal TM is rare earth gold@RE.
The second layer also has a sublattice magnetization M s of the transition metal TM.
It is characterized by being made of a rare earth transition metal alloy having a composition in which tM is larger than the sublattice magnetization MsR1 of the rare earth metal RE, and further, the film thickness of the first layer and the second layer is each 160 Å or more and the total thickness is 500 Å or less. An optical storage element is provided.
上記の媒体構成によれば、第1層がカー回転角の大きな
読み出し層として作用すると共に第2層か書き込み層と
して働き、かつ、読み出し層、書き込み層ともTMリッ
チ組成比を有するたわ、読み出し層、書き込み層のどち
らか、もしくは両層とも、遷移金属TMの副格子磁化M
S Tオが希土類金属REの副格子磁化M S RE
より小さい(REリッチ)組成比となる二層膜構造と比
ベカー回転角は大きくなる。According to the above medium configuration, the first layer acts as a reading layer with a large Kerr rotation angle, and the second layer acts as a writing layer, and both the reading layer and the writing layer have a TM-rich composition ratio. sublattice magnetization M of the transition metal TM.
S T O is the sublattice magnetization of rare earth metal RE M S RE
When the two-layer film structure has a smaller (RE-rich) composition ratio, the relative Bekar rotation angle becomes larger.
また、読み出し層、書き込み層の各膜厚を上記の範囲内
で制御することにより、交換結合二層膜としての磁気特
性を得ると共に反射膜構造としたときにその効果も得る
ことができる。しかして、この反射膜構造磁気二層膜光
磁気記憶媒体によりC/Nの向上が可能となる。Furthermore, by controlling the thicknesses of the reading layer and the writing layer within the above ranges, it is possible to obtain magnetic properties as an exchange-coupled two-layer film, and also to obtain the same effect when used as a reflective film structure. Therefore, the C/N ratio can be improved by this reflective film structure magnetic double-layer film magneto-optical storage medium.
本発明における第1層の希土類遷移金属非晶質薄膜は、
下記組成:
(G d +oo−xD 3’x) z (F e 1
.0O−YCQY) l1l−Z(式中、X=5〜25
atm%、Y= 18〜30atn%、Z= 16〜2
4atm%)からなる。ここでGdDyFeCoの組成
比と保磁力(He)、カー回転角(θh)及び磁化(M
s)との関係を第1表に示した。このように、上記組成
範囲において、カー回転角θkが0.48度以上となり
、従来から磁気二層膜の読み出し層として用いられてい
るGd11表 GdDyFeCoの組成比とlie、θ
に、Msとの関係FeCoのカー回転角046度を上回
ることが可能である。The first layer of rare earth transition metal amorphous thin film in the present invention is:
The following composition: (G d +oo-xD 3'x) z (F e 1
.. 0O-YCQY) l1l-Z (wherein, X=5-25
atm%, Y=18~30atn%, Z=16~2
4 atm%). Here, the composition ratio of GdDyFeCo, coercive force (He), Kerr rotation angle (θh), and magnetization (M
s) is shown in Table 1. In this way, in the above composition range, the Kerr rotation angle θk is 0.48 degrees or more, and the composition ratio of GdDyFeCo and lie, θ
In addition, it is possible to exceed the Kerr rotation angle of 046 degrees for FeCo in relation to Ms.
(以下余白)
一方、本発明における第2層の希土類遷移金属非晶質薄
膜としては、通常の交換結合二層膜の書き込み層に用い
られている種々の希土類遷移金属合金からなるものを適
用でき、例えばTbFe、DyFeCo、ThFeCo
合金が挙げられる。(Left below) On the other hand, as the rare earth transition metal amorphous thin film of the second layer in the present invention, those made of various rare earth transition metal alloys that are used in the writing layer of ordinary exchange-coupled two-layer films can be used. , for example TbFe, DyFeCo, ThFeCo
Examples include alloys.
上記第1層及び第2Mの希土類遷移金属非晶質薄膜は共
に、遷移金属TMの副格子磁化M S TMが希土類金
属REの副格子磁化Ms*xより大きくなる組成、すな
わち、TMリッチ組成比からなる。Both the first layer and the second M rare earth transition metal amorphous thin film have a composition in which the sublattice magnetization M S TM of the transition metal TM is larger than the sublattice magnetization M S *x of the rare earth metal RE, that is, a TM rich composition ratio. Consisting of
ここで従来から、磁気二層膜媒体には、第1図(a)、
(b)に示すように、読み出し層RLと書き込み層WL
との磁化Ms□、Mstが互いに平行になるもの(Pタ
イプ)と、第2図(a)、(b)に示すように、読み出
し層RLと書き込み層WLとの磁化M s 、、MS!
が互いに逆向きになるもの(Aタイプ)とがある。本発
明の磁気二層膜媒体は反射膜構造において用いるため、
再生レーザー光は磁気二層膜媒体中を透過することにな
る。そのため、検出される再生信号量には読み出し層の
記録状態ばかりでなく書き込み層の記録状態も影響する
こと7こなる。また、カー回転角の大きさは、主に、遷
移金属TMの副格子磁化M S THの大きさに垂直磁
化する範囲内で比例するfこめ、磁化M S THの向
きは二層間で揃えた方が大きくなる。即ち、第1図(a
)に示した、読み出し層、書き込み層上もTMリッチ組
成比の構成が最も再生信号量か大きくなることが分かる
。かかる知見により、本発明においては第1層及び第2
層共に、TMリッチ組成比のものが用いられる。Here, conventionally, magnetic double-layer film media have the following types:
As shown in (b), the read layer RL and the write layer WL
As shown in FIGS. 2(a) and 2(b), the magnetizations Ms□ and Mst of the read layer RL and the write layer WL are parallel to each other (P type), and the magnetizations M s , , MS!
There is a type (A type) in which the directions are opposite to each other. Since the magnetic double layer film medium of the present invention is used in a reflective film structure,
The reproduction laser beam will be transmitted through the magnetic double layer film medium. Therefore, the amount of reproduced signal detected is affected not only by the recording state of the reading layer but also by the recording state of the writing layer. In addition, the magnitude of the Kerr rotation angle is mainly proportional to the magnitude of the sublattice magnetization M S TH of the transition metal TM within the range of perpendicular magnetization, and the direction of the magnetization M S TH is aligned between the two layers. is larger. That is, Fig. 1 (a
), it can be seen that the TM-rich composition ratio on the read layer and write layer results in the largest amount of reproduced signal. Based on this knowledge, in the present invention, the first layer and the second layer
Both layers have a TM-rich composition ratio.
なお、これらの各層は、蒸着、スパッタリング、CVD
等の公知の手法によって誘電体膜上に薄膜状に形成する
ことができる。Note that each of these layers is formed by vapor deposition, sputtering, CVD.
It can be formed into a thin film on a dielectric film by a known method such as.
本発明において上記第1層及び第2層の膜厚は各々16
0Å以上とされ、かつこれらの合計皐みはSOOÅ以下
とされる。ここで、GdDyF’ eC。In the present invention, the first layer and the second layer each have a thickness of 16
The total wrinkles are set to be 0 Å or more, and the total wrinkles are set to be not more than SOO Å. Here, GdDyF' eC.
媒体単層膜について、第2表に膜厚と保磁力Hcの関係
の実験結果を示す。これより、垂直磁化するために必要
な膜厚は、最低85人前後であり、保磁力Haは膜厚と
共に増加していることか分かる。しかし、保磁力Heの
大きさはある膜厚以上で飽和するものと考えられる。Regarding the medium single layer film, Table 2 shows the experimental results of the relationship between the film thickness and the coercive force Hc. From this, it can be seen that the film thickness necessary for perpendicular magnetization is at least around 85 mm, and the coercive force Ha increases with the film thickness. However, the magnitude of the coercive force He is considered to be saturated at a certain film thickness or more.
第2表
第3表
次に、二層膜の構成上、最も重要な点である、各層が各
々の磁気特性を維持し、かつ二層間に交換結合力が有効
に働く各層の膜厚を調べた実験結果を第3表に示す。実
験方法は外部磁場とカー回転角及びファラデー回転角と
のヒステリシスループから、読み出し層RLと書き込み
層WLの、各々、単層のときと二層にしたときとの保磁
力Heの変化を調べるもので、実験的に、第3図のよう
なヒステリシスループを示すものを上記の特性を満足す
る二層膜構成と判断し、表中にO印で示した。これより
、各層の膜厚のは約160A以上必要なことが分かる。Table 2 Table 3 Next, we investigated the thickness of each layer, which is the most important point in the structure of a two-layer film, so that each layer maintains its own magnetic properties and that the exchange coupling force works effectively between the two layers. The experimental results are shown in Table 3. The experimental method was to examine the change in coercive force He of the read layer RL and the write layer WL when they were made into a single layer and when they were made into two layers, respectively, from a hysteresis loop between an external magnetic field and Kerr rotation angle and Faraday rotation angle. Therefore, we experimentally determined that a film exhibiting a hysteresis loop as shown in FIG. 3 is a two-layer film structure that satisfies the above characteristics, and is marked with an O in the table. From this, it can be seen that the thickness of each layer is required to be approximately 160A or more.
さらに、光学的観点から二層膜媒体の二層合わせた全膜
厚は制限される、すなわち、反射膜構造においては、レ
ーザー光は二層膜媒体を透過し、反射膜により反射され
た後、再度、二層膜媒体を透過しなければならないので
、この過程でのレーザー光強度の減衰を考えると、二層
膜媒体の全膜厚は500Å以下にしなければ反射膜構造
の効果は得られないことか分かる。以上より、二層膜媒
体の二層合わせ几全膜厚は320Å以上で500Å以下
とする必要がある。Furthermore, from an optical point of view, the total thickness of the two layers of a two-layer film medium is limited; in other words, in a reflective film structure, the laser light passes through the two-layer film medium, and after being reflected by the reflective film, Since the laser beam must pass through the double-layer film medium again, considering the attenuation of the laser light intensity during this process, the total thickness of the double-layer film must be 500 Å or less in order to obtain the effect of the reflective film structure. I understand that. From the above, it is necessary that the total thickness of the two-layer film of the two-layer film medium be 320 Å or more and 500 Å or less.
(ホ)実施例 以下、本発明の実施例を図面を参照して説明する。(e) Examples Embodiments of the present invention will be described below with reference to the drawings.
第4図は光磁気ディスクを示しており、1はガラス、ポ
リカーボネート、アクリル等からなる透明基板であり、
この透明基板l上に第1の透明誘電体膜である窒化アル
ミニウム(AIN)膜2が例えば膜厚97nmに形成さ
れ、このAIN膜2上2上土類遷移金属光磁気記憶媒体
である読み出し層のガドリニウム、ディスプロシウム、
鉄、コバルト(GdDyFeCo)合金薄膜3が例えば
膜厚20rmmに形成され、このGdDyFeC。Figure 4 shows a magneto-optical disk, where 1 is a transparent substrate made of glass, polycarbonate, acrylic, etc.
On this transparent substrate l, an aluminum nitride (AIN) film 2, which is a first transparent dielectric film, is formed to have a thickness of, for example, 97 nm, and on this AIN film 2, a readout layer, which is an earth-transition metal magneto-optical storage medium, is formed. gadolinium, dysprosium,
An iron, cobalt (GdDyFeCo) alloy thin film 3 is formed to have a thickness of, for example, 20 rpm, and this GdDyFeC.
合金薄膜3上に希土類遷移金属光磁気記憶媒体である書
き込み層のテルビウム、ディスプロシウム、鉄、コバル
ト(TbDyFeCo)合金薄膜4が例えば膜厚20n
nnに形成され、このTbDyFeCo合金薄[14上
に第2の透明誘電体膜であるAIN膜5が例えば膜厚3
0nmに形成され、更に、このA I N膜5上に反射
膜であるアルミニウム(A1)膜6が例えば膜厚50n
m形成されている。On the alloy thin film 3, a terbium, dysprosium, iron, cobalt (TbDyFeCo) alloy thin film 4 serving as a writing layer, which is a rare earth transition metal magneto-optical storage medium, has a film thickness of, for example, 20 nm.
nn, and on this TbDyFeCo alloy thin film [14], an AIN film 5, which is a second transparent dielectric film, is formed to have a film thickness of, for example, 3.
Further, on this A I N film 5, an aluminum (A1) film 6 as a reflective film is formed with a film thickness of 50 nm, for example.
m is formed.
ここで、読み出し層3の組成比は(c dseD y+
+) ls (P e ?ICOt+) 5zatff
i%であり、書き込み層4の組成比は(Tb7oDyi
o)(Feioc。Here, the composition ratio of the readout layer 3 is (c dseD y+
+) ls (P e ?ICOt+) 5zatff
i%, and the composition ratio of the writing layer 4 is (Tb7oDyi
o) (Feioc.
Il+)の補償組成近傍のTMリッチ組成比である。This is the TM-rich composition ratio near the compensation composition of Il+).
また、第11第2の透明誘電体膜は、基板側からのレー
ザー光入射に対し、カー回転角、ファラデー回転角をエ
ンハンスし、見かけ上のカー回転角が大きくなるよう設
定されている。Furthermore, the eleventh and second transparent dielectric films are set to enhance the Kerr rotation angle and Faraday rotation angle with respect to laser light incident from the substrate side, and to increase the apparent Kerr rotation angle.
以上の各層は、スパッタリング法にて形成されているが
、膜形成法としては、スパッタリング法の他に真空蒸着
法やイオンブレーティング法などでもよい。第4表に上
記の構成における磁気二層膜の、各々、単層での保磁力
Heと二層合わせた時の保磁力Heの変化を示す。Although each of the above layers is formed by a sputtering method, the film forming method may be a vacuum evaporation method, an ion blating method, or the like in addition to the sputtering method. Table 4 shows the changes in the coercive force He of a single layer and the coercive force He of the two layers combined in each of the magnetic double layer films having the above structure.
(以下余白)
第4表
の反射率、θには記憶媒体のカー回転角)かC/Nと、
rRXθkcx:C/Nの関係にあることは周知のとお
りである。測定波長は830nmで10μm幅のランド
面での測定結果である。(Left below) Reflectance in Table 4, θ is the Kerr rotation angle of the storage medium) or C/N,
It is well known that there is a relationship of rRXθkcx:C/N. The measurement wavelength was 830 nm, and the results were measured on a land surface with a width of 10 μm.
これより、各層が各々の磁気特性を維持し、かつ二層間
に交換結合力が有効に働いていることが分かる。From this, it can be seen that each layer maintains its respective magnetic properties and that the exchange coupling force is working effectively between the two layers.
第5図に本発明の反射膜構造磁気二層膜光磁気記憶媒体
を用いた光磁気ディスク(a)と性能指数を比較するた
めに用いた膜構造の光磁気ディスク構造を示す。図中、
(b)は光磁気ディスクで一般的に用いられている三層
膜構造、(e)は反射膜構造、(d)は通常の磁気二層
膜構造のディスクである。ここで、1はガラス基板、7
は透明誘電体膜、8は読み出し層光磁気記憶膜、9は書
き込み層光磁気記憶膜、10は光磁気記憶膜、11は反
射膜である。そして、第5表に各光磁気ディス’)(1
)構造の違いによる性能指数の違いを示す。ここで、性
能指数rRXθk(Rは記憶媒体第5表
これより、本発明の反射膜構造磁気二層膜ディスク(a
)は性能指数が最も大きく記録特性に優れることが分か
る。FIG. 5 shows a magneto-optical disk structure with a film structure used to compare the figure of merit with the magneto-optical disk (a) using a reflective film structure magnetic double-layer film magneto-optical storage medium of the present invention. In the figure,
(b) shows a disk with a three-layer film structure commonly used in magneto-optical disks, (e) shows a disk with a reflective film structure, and (d) shows a disk with a normal magnetic double-layer structure. Here, 1 is a glass substrate, 7
8 is a transparent dielectric film, 8 is a readout layer magneto-optical storage film, 9 is a write layer magneto-optical storage film, 10 is a magneto-optical storage film, and 11 is a reflective film. Table 5 shows each magneto-optical disk') (1
) Shows the difference in performance index due to difference in structure. Here, the figure of merit rRXθk (R is the storage medium Table 5) From this, the reflective film structure magnetic double-layer film disk of the present invention (a
) has the largest figure of merit and is found to have excellent recording characteristics.
第6表に反射膜構造磁気二層膜ディスクのC/N値の測
定結果を示す。ディスクは上記構造のものを、反射膜側
を内側にして接着剤で2枚張り合わせkものを用いた。Table 6 shows the measurement results of the C/N value of the reflective film structure magnetic double layer film disk. Two disks having the above structure were used, with the reflective film side facing inward and glued together with an adhesive.
記録再生条件は、ディスク回転数1800rp@、記録
周波数6.5MHz、記録半径55m m 、記録パワ
ー8.4mW、補助磁場1500e、再生パワー1.5
mWである。The recording and reproducing conditions were: disk rotation speed 1800 rpm, recording frequency 6.5 MHz, recording radius 55 mm, recording power 8.4 mW, auxiliary magnetic field 1500 e, and reproducing power 1.5.
mW.
第6表
C/N値は53dBを上回っており、非常に大きい値を
達成している。また、実験的に、書き込み層として補償
組成近傍の保磁力の大きい媒体を用いると、ディスクの
書き込みノイズを小さく押さえられることが分かった。The C/N value in Table 6 exceeds 53 dB, achieving a very large value. Furthermore, it has been experimentally found that if a medium with a large coercive force near the compensation composition is used as the writing layer, the writing noise of the disk can be suppressed to a small level.
なお、本発明に係る誘電体膜としては、ALN以外にS
i0%SiN膜等を用いても良い。また、反射膜として
はAI以外にCu、Ag、Au、Ti、Cr膜等を用い
ても良い。Note that the dielectric film according to the present invention may include S in addition to ALN.
An i0%SiN film or the like may also be used. Further, as the reflective film, other than AI, Cu, Ag, Au, Ti, Cr films, etc. may be used.
(へ)発明の効果
本発明の構成によれば、従来困難とされていた、反射膜
構造と磁気二層膜構造各々のC/N値向上向上めの効果
を共に発現することが可能となり、記録再生特性の優れ
たディスクを作製することができる。そして、例えば、
高画質、長時間を有するアナログ記録用途のディスク開
発も可能となる。(F) Effects of the Invention According to the configuration of the present invention, it is possible to achieve both the effect of improving the C/N value of both the reflective film structure and the magnetic double-layer film structure, which has been considered difficult in the past. A disk with excellent recording and reproducing characteristics can be manufactured. And for example,
It also becomes possible to develop discs for analog recording with high image quality and long duration.
【図面の簡単な説明】
第1図(a)、(b)はPタイプの交換結合二層膜にお
ける磁化状態を示す説明図である。第2図(a、 )
、 (b )はAタイプの交換結合二層膜における磁化
状態を示す説明図である。第3図は本発明における光学
記憶素子における磁気ヒステリシスループを示す説明図
である。第4図は本発明の一実施例の光磁気ディスクの
概略縦断面図である。第5図(a)は本発明の光磁気デ
ィスクの概略縦断面図、第5図(b)〜(d)は各々、
従来の光磁気ディスクの概略縦断面図である。
l・・・・・・透明基板、2,5・・・・・・AIN膜
、3・・・・・・GdDyFaCo合金薄膜、TdDy
FeCo合金薄膜、
・AI膜。
第
図
(a)
(b)
、−、、、、、1−m−−
(C)
(d)BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1(a) and 1(b) are explanatory diagrams showing the magnetization state in a P-type exchange-coupled double-layer film. Figure 2 (a, )
, (b) is an explanatory diagram showing the magnetization state in an A-type exchange-coupled bilayer film. FIG. 3 is an explanatory diagram showing a magnetic hysteresis loop in an optical storage element according to the present invention. FIG. 4 is a schematic longitudinal sectional view of a magneto-optical disk according to an embodiment of the present invention. FIG. 5(a) is a schematic longitudinal sectional view of the magneto-optical disk of the present invention, and FIGS. 5(b) to 5(d) are respectively,
FIG. 1 is a schematic vertical cross-sectional view of a conventional magneto-optical disk. l...Transparent substrate, 2,5...AIN film, 3...GdDyFaCo alloy thin film, TdDy
FeCo alloy thin film, ・AI film. Figures (a) (b) , -, , , 1-m-- (C) (d)
Claims (1)
反射膜をこの順に積層してなり、光磁気記憶膜が、希土
類遷移金属非晶質薄膜からなる第1層と、第1層とは異
なる組成の希土類遷移金属非晶質薄膜からなる第2層と
の交換結合二層膜であり、上記第1層が、下記組成式: (Gd_1_0_0_−_XDy_X)_Z(Fe_1
_0_0_−_YCo_Y)_1_0_0_−_z(式
中、X=5〜25atm%、Y=18〜30atm%、
Z=16〜24atm%)で示されかつ遷移金属TMの
副格子磁化Ms_T_Mが希土類金属REの副格子磁化
Ms_R_Eより大きな希土類遷移金属合金からなり、
上記第2層も遷移金属TMの副格子磁化Ms_T_Mが
希土類金属REの副格子磁化Ms_R_Eより大きくな
る組成の希土類遷移金属合金からなり、さらに、これら
第1層と第2層の膜厚が各々160Å以上でかつ合わせ
て500Å以下であることを特徴とする光学記憶素子。[Claims] 1. A dielectric film, a magneto-optical memory film, a dielectric film, and a reflective film are laminated in this order on a substrate, and the magneto-optical memory film is made of an amorphous thin film of a rare earth transition metal. It is an exchange-coupled two-layer film consisting of a first layer and a second layer made of a rare earth transition metal amorphous thin film having a composition different from that of the first layer, and the first layer has the following compositional formula: (Gd_1_0_0_−_XDy_X) _Z(Fe_1
_0_0_-_YCo_Y)_1_0_0_-_z (wherein, X = 5 to 25 atm%, Y = 18 to 30 atm%,
Z = 16 to 24 atm%), and the sublattice magnetization Ms_T_M of the transition metal TM is larger than the sublattice magnetization Ms_R_E of the rare earth metal RE,
The second layer is also made of a rare earth transition metal alloy having a composition in which the sublattice magnetization Ms_T_M of the transition metal TM is larger than the sublattice magnetization Ms_R_E of the rare earth metal RE, and furthermore, the film thicknesses of the first layer and the second layer are each 160 Å. An optical memory element having the above properties and a total thickness of 500 Å or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16327190A JP2701963B2 (en) | 1990-06-20 | 1990-06-20 | Optical storage element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16327190A JP2701963B2 (en) | 1990-06-20 | 1990-06-20 | Optical storage element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0453047A true JPH0453047A (en) | 1992-02-20 |
| JP2701963B2 JP2701963B2 (en) | 1998-01-21 |
Family
ID=15770639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16327190A Expired - Fee Related JP2701963B2 (en) | 1990-06-20 | 1990-06-20 | Optical storage element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2701963B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0737282A (en) * | 1993-07-22 | 1995-02-07 | Nec Corp | Magneto-optical recording medium |
| EP0706181A1 (en) * | 1994-10-05 | 1996-04-10 | Canon Kabushiki Kaisha | Magneto-optic recording medium and information reproducing method using the medium |
-
1990
- 1990-06-20 JP JP16327190A patent/JP2701963B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0737282A (en) * | 1993-07-22 | 1995-02-07 | Nec Corp | Magneto-optical recording medium |
| EP0706181A1 (en) * | 1994-10-05 | 1996-04-10 | Canon Kabushiki Kaisha | Magneto-optic recording medium and information reproducing method using the medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2701963B2 (en) | 1998-01-21 |
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