JPH0453630B2 - - Google Patents
Info
- Publication number
- JPH0453630B2 JPH0453630B2 JP60245739A JP24573985A JPH0453630B2 JP H0453630 B2 JPH0453630 B2 JP H0453630B2 JP 60245739 A JP60245739 A JP 60245739A JP 24573985 A JP24573985 A JP 24573985A JP H0453630 B2 JPH0453630 B2 JP H0453630B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- workpiece
- spot
- laser processing
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0732—Shaping the laser spot into a rectangular shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Description
この発明は、太陽電池としての薄膜型光電変換
基板である被加工物として、該被加工物の加工面
上にレーザ光を照射してレーザスクライブ加工を
施すことにより、薄膜加工面に所定パターンの開
溝を形成するレーザ加工装置に関する。
This invention provides a workpiece that is a thin film photoelectric conversion substrate used as a solar cell, and a predetermined pattern is formed on the thin film processing surface by irradiating a laser beam onto the processing surface of the workpiece and performing laser scribing processing. The present invention relates to a laser processing device for forming open grooves.
従来より頭記した光電変換基板を対象に、絶縁
基板上に成層した第1の導電性被膜をレーザスク
ライブ加工して所定形状の第1の開溝を形成して
パターンニングを行い、次に前記導電性被膜の上
にアモルフアス半導体被膜を成層した後に前記第
1の開溝部を基準として所定位置にレーザスクラ
イブ加工を施して半導体被膜に第2の開溝を形成
してパターンニングを行い、さらに半導体被膜の
上に第2の導電性被膜を形成した後に前記した第
2の開溝部を基準にレーザスクライブ加工により
所定位置に第3の開溝を形成して回路のパターン
ニングを行うようにしたレーザ光による薄膜のパ
ターンニング加工方法が知られている。
次に上記したレーザスクライブ加工を行うため
の従来におけるレーザ加工装置のブロツク図を第
6図に示して説明する。第6図において、1は先
記した光電変換基板等の被加工物2を搭載したX
−Yテーブル、3は例えばYAGレーザのレーザ
発振器、4はコリメータレンズ、5は反射ミラ
ー、6は集光レンズ、7は運転制御用のコンピユ
ータである。かかる構成で加工の際にはコンピユ
ータ7のプログラム実行により、レーザ発振器3
より発振したレーザ光8はコリメータレンズ4、
反射ミラー5、集光レンズ6を経由して被加工物
2の加工面に照射され、一方ではレーザ光の照射
に連動してコンピユータ7の数値制御によりX−
Yテーブル1が所定のパターンにしたがつてX
軸、Y軸方向に移動制御され、これによりレーザ
光の集光スポツトが被加工面上を走査してレーザ
スクライブ加工を行い、所定の回路パターンに沿
つた開溝部9を形成する。
ところで前記構成におけるレーザ発振器3から
発振出力されたレーザ光のビームスポツトは通常
円形状であり、該レーザ光をそのままコリメータ
レンズ、集光レンズを通じて被加工面上に照射し
てレーザスクライブ加工を行う従来のレーザ加工
方式では、レーザ光の集光スポツトの形状が第7
図のイで示すように円形状を呈しており、かつそ
の集光径方向の光強度分布は図示ロのように集光
スポツトの中心部でエネルギー密度が最も高く、
スポツト周辺部に向けてエネルギー密度が急激に
減衰する一種のガウシアン分布を呈している。
しかして上記のようにレーザ光の集光スポツト
が円形状で、かつその光強度分布がガウシアン分
布を呈しているパルスレーザ光の集光スポツトを
そのまま被加工面に照射し、かつ所定のパターン
にしたがつて走査しながらレーザスクライブ加工
を行う従来の加工方式では次記のような問題があ
る。すなわち円形状の集光スボツトをそのまま被
加工面に走査して全域にわたり均一幅の開溝部9
を形成するには、第8図のように開溝部を9に沿
つて集光スポツトイの繰り返しパルスを細かく重
ね合わせながら矢印Y方向に走査して繰り返し照
射を行わなければならず、結果的に集光スポツト
の重ね合わせによるロス分が大きくなつて開口部
9を形成する加工速度が遅くなる。逆に加工速度
を高めるように繰り返しパルスの集光スポツトの
重なり幅を第9図のようち少なくすると、開溝部
9の側縁が波形を呈するようになつて均一幅の開
溝を形成することが困難となる。さらに前記のよ
うに集光スポツトの光強度分布はその中心部分で
高いエネルギー密度を呈するガウシアン分布であ
ることから、第10図に示すように薄膜型光電変
換基板を対象に、その絶縁基板10の上に第1の
導電性被膜11を成層して第1の開溝部12をレ
ーザスクライブ加工した後に、この上に成層され
たアモルフアスの半導体被膜13に付いて第2の
開溝部14をレーザ加工して形成した際には、前
記したレーザ光の集光スポツトの光強度分布に起
因して開溝部14の溝底部加工面が平坦となら
ず、図示のように開溝図の加工深さが溝の中央部
で局部的に過度となつて極端に深まり、加工深さ
が第1の導電性被膜11にまで達してこの被膜1
1に加工損傷のダメージを与えるとともに、開溝
部内の側縁部では逆に加工深さが不足して溶融残
存物15が残留するようになる。また開溝部14
の開口縁には突起物16や、飛散物17の付着等
も生じ易い。しかも図示のように薄膜積層体とし
てなる光電変換素子等の薄膜を被加工物とてここ
に選択的に開溝を形成して積層領域を分離加工す
るに際し、前記のような開溝部14に加工面の不
均一,下層被膜への加工損傷等が発生すると、積
層領域の短絡,抵抗の増大に繋かつて光電変換効
率を低める等、製品としての特性のばらつきが大
となつて製品の歩留りが低下する不具合を招くこ
とになる。
Targeting the photoelectric conversion substrate mentioned above, the first conductive film layered on the insulating substrate is laser scribed to form a first groove of a predetermined shape and patterned, and then patterned as described above. After layering an amorphous semiconductor film on the conductive film, laser scribing is performed at a predetermined position using the first groove as a reference to form a second groove in the semiconductor film and patterning is performed. After forming a second conductive film on the semiconductor film, a third groove is formed at a predetermined position by laser scribing using the second groove as a reference, and patterning of the circuit is performed. A thin film patterning method using a laser beam is known. Next, a block diagram of a conventional laser processing apparatus for performing the above-mentioned laser scribing process will be described with reference to FIG. 6. In Fig. 6, 1 is an
- Y table, 3 is a laser oscillator of, for example, a YAG laser, 4 is a collimator lens, 5 is a reflection mirror, 6 is a condensing lens, and 7 is a computer for operation control. When processing with this configuration, the laser oscillator 3 is activated by executing a program on the computer 7.
The more oscillated laser beam 8 is passed through the collimator lens 4,
The processing surface of the workpiece 2 is irradiated via the reflection mirror 5 and the condensing lens 6, and on the other hand, the X-
As Y table 1 follows a predetermined pattern,
The movement is controlled in the axial and Y-axis directions, so that the focused spot of the laser beam scans the surface to be processed and performs laser scribing, thereby forming an open groove 9 along a predetermined circuit pattern. By the way, the beam spot of the laser beam oscillated and output from the laser oscillator 3 in the above configuration is usually circular, and in the conventional laser scribing process, the laser beam is directly irradiated onto the surface to be processed through a collimator lens and a condensing lens. In this laser processing method, the shape of the laser beam focusing spot is
As shown in A in the figure, it has a circular shape, and the light intensity distribution in the direction of the condensing diameter has the highest energy density at the center of the condensing spot, as shown in B in the figure.
It exhibits a kind of Gaussian distribution in which the energy density rapidly decreases toward the periphery of the spot. However, as mentioned above, the laser beam convergence spot is circular and the light intensity distribution exhibits a Gaussian distribution.The convergence spot of the pulsed laser beam is directly irradiated onto the workpiece surface, and a predetermined pattern is formed. Therefore, the conventional processing method that performs laser scribing processing while scanning has the following problems. In other words, the circular condensing spot is scanned directly over the surface to be machined to form an open groove 9 with a uniform width over the entire area.
In order to form , it is necessary to repeatedly irradiate the open groove along 9 by scanning in the direction of arrow Y while finely overlapping the repeated pulses of the condensing spot toy as shown in Figure 8. The loss due to the overlapping of the condensing spots becomes large, and the processing speed for forming the opening 9 becomes slow. On the other hand, if the overlapping width of the focused spots of the repeated pulses is reduced as shown in FIG. 9 in order to increase the processing speed, the side edges of the groove portion 9 will take on a wavy shape, forming an groove with a uniform width. This becomes difficult. Furthermore, as mentioned above, since the light intensity distribution of the condensing spot is a Gaussian distribution with a high energy density in the central part, as shown in FIG. After layering the first conductive film 11 thereon and laser scribing the first grooves 12, laser scribing the second grooves 14 on the amorphous semiconductor film 13 layered thereon. When formed by machining, the machined surface of the groove bottom of the open groove part 14 is not flat due to the light intensity distribution of the laser beam condensing spot described above, and the machined depth of the groove diagram as shown in the figure is not flat. The groove becomes locally excessive and extremely deep in the center of the groove, and the machining depth reaches the first conductive coating 11.
In addition to causing machining damage to 1, the machining depth is insufficient at the side edges of the open groove, and molten residue 15 remains. Also, the open groove portion 14
Protrusions 16 and scattered objects 17 are likely to adhere to the edge of the opening. Moreover, when a thin film such as a photoelectric conversion element formed as a thin film laminate is processed as a thin film laminate as shown in the figure, and when selectively forming grooves therein to separate the laminated regions, the grooves 14 as described above are processed. If non-uniformity of the machined surface or processing damage to the underlying film occurs, it will lead to short circuits in the laminated area, increase in resistance, lowering photoelectric conversion efficiency, etc. This will increase the dispersion of product characteristics and reduce the product yield. This will lead to a problem of deterioration.
この発明は上記の点にかんがみなされたもので
あり、前記した従来のレーザ加工方式による欠点
を除去し、薄膜加工物を対象に開溝部の加工損傷
の発生を防止して、開溝部の薄膜の選択的加工を
可能とし、かつ均一幅の開溝部を高速度でレーザ
スクライブ加工できるようにしたレーザ加工装置
を提供することを目的とする。
The present invention has been made in consideration of the above points, and eliminates the drawbacks of the conventional laser processing method described above, prevents processing damage to the open groove part, and improves the open groove part. It is an object of the present invention to provide a laser processing device that enables selective processing of thin films and laser scribing of grooves of uniform width at high speed.
上記目的を達成するために、本発明によれば、
薄膜型光電変換基板である被加工物を対象に、レ
ーザ発振器より発振したパルスレーザ光をレーザ
光学系を通じて被加工物の加工面に照射し、かつ
被加工物を搭載したX−Yテーブルの移動操作に
より前記レーザ光の集光スポツトを被加工面上で
走査して開溝部をレーザスクライブ加工するよう
にしたレーザ加工装置において、前記レーザ光学
系の系内に、被加工物の加工面に照射するレーザ
光の集光スポツトを走査方向と平行な方形状でか
つフラツトな光強度分布を呈する集光スポツトに
成形する視野絞り手段と、レーザ光を被加工面に
集光させる焦点距離が10mmないし15mmの集光レン
ズとを装備し、かつ前記X−Yテーブルは、前記
集光スポツトの被加工面上の重なり率が小さくな
るように前記集光スポツトを走査する駆動系を備
えて成るものとする。これによりレーザスクライ
ブ加工に際してそのレーザ光の繰り返しパルスに
よる集光スポツトの重なり率を少なくして均一幅
な開溝部が高速加工できるようにするとともに、
併せて薄膜加工面の開溝部に加工損傷を与えるこ
となしに加工深さ精度の高い均一な開溝部を加工
パターンに沿つて形成できるようにしたものであ
る。
In order to achieve the above object, according to the present invention,
Targeting the workpiece, which is a thin-film photoelectric conversion substrate, irradiates the processing surface of the workpiece with pulsed laser light oscillated by a laser oscillator through the laser optical system, and moves the X-Y table on which the workpiece is mounted. In the laser processing apparatus, which performs laser scribing of an open groove by scanning the condensing spot of the laser beam on the workpiece surface by operation, the laser optical system includes a laser beam on the processing surface of the workpiece. A field diaphragm means that forms the convergence spot of the irradiated laser beam into a rectangular convergence spot that is parallel to the scanning direction and exhibits a flat light intensity distribution, and a focal length of 10 mm to condense the laser beam onto the workpiece surface. or a 15 mm condensing lens, and the X-Y table is equipped with a drive system that scans the condensing spot so that the overlap rate of the condensing spot on the workpiece surface is reduced. shall be. This reduces the overlap rate of the focused spots due to the repeated pulses of the laser beam during laser scribe processing, making it possible to process grooves with uniform width at high speed.
In addition, it is possible to form uniform grooves with high machining depth accuracy along the machining pattern without causing machining damage to the grooves on the thin film processed surface.
第1図はこの発明の実施例によるレーザ加工装
置のブロツク図を示すものであり、第6図と対応
する同一部材には同じ符号が付してある。すなわ
ちレーザ加工装置は大別してレーザ光学系と、被
加工物を搭載して移動制御されるX−Yテーブル
の駆動系と、レーザ光照射スポツトのピン合わせ
を行う監視光学系とから構成されている。ここで
レーザ光学系はレーザ発振器3、コリメータレン
ズ4、ダイクロイツクミラー5、集光レンズ6、
およびこの発明で新たに追加設置された視野絞り
体18、集光レンズ6の焦点合わせ用モータドラ
イブ機構19等から構成されている。ここで前記
した集光レンズ6は焦点距離が例えば10〜15mm程
度である極めて焦点距離の短いレンズが採用され
ている。また視野絞り体18はレーザ光8の光軸
に中心位置を合わせ集光レンズ6の手前側のコリ
メータレンズ4とミラー5との間に介装配備され
ており、かつその絞り体には方形状の絞り穴18
aが開口されている。なおレーザ発振器3には例
えば波長1.06μm、繰り返しパルス周波数1〜
40KHzz、出力0.1〜12WのYAGレーザが使用さ
れる。
一方、X−Yテーブル駆動系は架台20と、該架
台20上に設置されてコンピユータ7により駆動
制御されるX−Yテーブル1と、該X−Yテーブ
ル1上に設置された微調整用のステージ21と、
および該ステージ21の上に設置され、かつその
上面に搭載した薄膜型光電変換基板である被加工
物2を定位置に保持する真空吸着式の保持台22
等で構成されている。なおこの保持台22はその
上面に真空ポンプ23に連通する多数の吸着穴が
開口しており、被加工物2を搭載した状態で真空
ポンプ23を運転することにより、被加工物2を
台上に真空吸着して所定位置に保持するものであ
る。
また監視光学系は照明ランプ24,照明レンズ
25,ダイクロイツクミラー26、結像レンズ2
7、位置合わせ用の十字線28、テレビカメラ2
9、およびモニタテレビ30の組合せからなり、
前記したレーザ光学系の集光レンズ6に光軸を合
わせてその上方に配備されている。さらに被加工
物2と対面する集光レンズ6に近接して符号31
で示す真空式吸引ノズルが前記した真空ポンプ2
3に接続して配備されている。この吸引ノズル3
1は被加工物2をレーザ加工する際に加工面から
周囲に蒸発、飛散する飛散物を吸引して系外に除
去するものである。
次に上記構成のレーザ加工装置による加工操作
の手順および加工動作に付いて説明すると、まず
被加工物2を保持台22の上に搭載した状態で真
空ポンプ23を始動して被加工物2を保持台22
上の定位置に真空吸着させる。続いてX−Yテー
ブル1を加工開始位置にセツトし、監視光学系を
作動してモニタテレビ30の画面を目視しながら
モータドライブ機構19により集光レンズ6を上
下移動させて焦点合わせを行う。また同時にX−
Yテーブル駆動系の微調整ステージ21を調整し
て被加工物の加工開始位置および水平度を正しく
初期設定する。次にコンピユータ7に加工開始指
令を与えてレーザ発振器3を作動させ、同時にX
−Yテーブル1をあらかじめコンピユータに書き
込んである所定の加工パターンにしたがつて移動
制御する。これにより被加工物2の加工面に照射
したレーザ光の集光スポツトが重なり率を小さく
して所定のパターンに沿つて走査され、加工面を
レーザスクライブ加工して開溝を形成する。
この場合にレーザ発振器3から発振してコリメ
ータレンズ4を透過した直後のレーザ光ビームの
スポツト形状、およびその光強度分布は第2図a
のハ,ニであるのに対し、前述した方形状の視野
絞り体18を透過した後のスポツト形状、光強度
分布は第2図bにおけるホ,ヘで示すように円形
状を呈するレーザ光ビームの周辺域がトリミング
されて方形状に変わり、かつその光強度分布もガ
ウシアン分布ニから高エネルギー密度でかつビー
ムスポツト全域でほぼ均等な光強度となるフラツ
ト分布ヘに変化する。なお前記した視野絞り体1
8の絞り穴18aの縦,横寸法比を様々に変える
ことにより、ビームスポツトの形状を正方形、長
方形等種々に選択できる。この場合に視野絞り体
18の向きは、方形状の集光スポツトホがその平
行な2辺をレーザ光の走査方向と平行にして被加
工物の加工面を照射するようにセツトされる。ま
た視野絞り体18を透過したレーザ光の光強度分
布はコリメータレンズ4によるビーム径の拡大倍
率を変えることにより第3図a,b,cの分布を
選択できる。なお第3図a,b,cの分布はビー
ム径の拡大倍率の大きい方から順に示している。
また上記したレーザ加工装置によれば、まず被
加工物2の加工面を照射する集光スポツトの繰り
返しパルス走査に伴う重なり状況は第4図のよう
になる。この図から明らかなように各パルスの集
光スポツトは方形状を呈し、かつその走査方向Y
に沿つて平行移動する。これにより集光スポツト
と次のパルスの集光スポツトとの間の重なり幅が
僅少であつても走査方向Yに沿つて均一幅の開溝
部9を形成することが可能となり、したがつて第
9図のように円形状の集光スポツトを呈するパル
スレーザ光を走査する場合に生じる波形状の開溝
部を形成することなく、レーザ光照射点の移動速
度を高めつつ均一幅の開溝部を加工することがで
き、それだけレーザスクライブ加工速度の高速化
が図れるようになる。この点に付いて発明者の行
つた加工実験によれば、視野絞り体18の絞り穴
の形状を正方形として加工面上の加工パターンに
沿つて均一幅の開溝部をレーザスクライブ加工す
るのに、円形状の集光スポツトを走査する従来方
式と比べて加工速度を約4.5倍に高めることがで
きることが確認されている。なおこの場合に先記
した視野絞り体18の絞り穴の形状を横長の長方
形に選定し、かつこの長辺を集光スポツトの走査
方向に合わせて照射を行うことにより、より一層
の加工速度の高速化が得られることは容易に理解
されることであり、これにより従来方式と比べて
加工速度を約10倍程度まで高めることができる。
さらに、集光スポツト間の重なり率によつて、
レーザ光の強度分布を、上記第3図a,b,cか
ら適宜選択することにより、集光スポツトの重な
る部分と重ならない部分とを含めて、開溝部全域
での溝深さを、むらを生じることなくほぼ均一に
形成することができる。
また第1図の装置では、先記のように集光レン
ズ6として焦点距離が10〜15mm程度である短焦点
距離のレンズが使用されているのでその焦点深度
は極めて浅く、かつ前記した方形状の視野絞り体
18の採用により集光スポツト光強度分布がフラ
ツト分布であることから、薄膜加工面に対して残
存物を生成することなく高精度でかつ均一な加工
深さの開溝部をレーザスクライブ加工によつて形
成することができ、さらに加えて第1図に示した
真空式吸引ノズル31を加工面の近傍に配備して
加工の際に生じる飛散物を排除するようにしたこ
とにより、第10図で述べたような開溝底部で下
層へのダメージを与える加工損傷、突起物、付着
物等の発生を良好に防止してより一層高い加工性
能が得られるようになる。
本発明が対象とする太陽電池に用いられる薄膜
の加工に際しては、例えばその薄膜がアモルフア
ス半導体膜である場合、膜厚はおよそ3000〜7000
〓と薄い。よつてレンズとしてはできるだけ焦点
距離の短いレンズが適しているが、本実施例にお
いては、一般に市販されており実用的である焦点
距離が10〜15mmのレンズを用いている。
第5図は薄膜を積層してなる光電変換基板を被
加工物として、第10図と同様に絶縁基板10の
上に導電性被膜11,半導体被膜13を成層した
段階で半導体被膜13に対して第1図のレーザ加
工装置によりレーザスクライブ加工を行つて開溝
部14を形成した場合の加工部分の断面図を描い
たものであり、この図から明らかなように開溝部
14には第10図に見られた溶融残存物、突起
物、付着物が殆ど発生せず、かつ開溝部14の加
工深さは幅方向でほぼ均一となり下層の導電性被
膜11に対する加工損傷も無視し得る程度に抑え
ることができた。このことは集光レンズの焦点深
度が極めて浅く、かつ集光スポツトの光強度分布
がフラツト分布であり、半導体被膜13の薄膜加
工面に焦点を正しく合わせることにより、下層の
導電性被膜11は焦点深度域から外れてレーザ光
の照射エネルギーが大幅に減衰するためである。
またレーザ加工に伴つて生じた一種の微粒の蒸発
物である飛散物は、真空式吸引ノズル31により
その場から直ちに吸引排除されるので、周囲への
飛散物の付着を防止して付着物の発生が良好に防
止できる。
FIG. 1 shows a block diagram of a laser processing apparatus according to an embodiment of the present invention, and the same members corresponding to those in FIG. 6 are given the same reference numerals. In other words, a laser processing device is broadly divided into a laser optical system, a drive system for an X-Y table on which a workpiece is mounted and whose movement is controlled, and a monitoring optical system that focuses the laser beam irradiation spot. . Here, the laser optical system includes a laser oscillator 3, a collimator lens 4, a dichroic mirror 5, a condenser lens 6,
It also includes a field diaphragm 18 and a motor drive mechanism 19 for focusing the condenser lens 6, which are newly added in this invention. As the condensing lens 6 described above, a lens with an extremely short focal length of, for example, about 10 to 15 mm is used. The field diaphragm 18 is centered on the optical axis of the laser beam 8 and is interposed between the collimator lens 4 and the mirror 5 on the front side of the condenser lens 6, and the diaphragm has a rectangular shape. Aperture hole 18
a is open. For example, the laser oscillator 3 has a wavelength of 1.06 μm and a repetition pulse frequency of 1 to
A YAG laser with a frequency of 40KHz and an output of 0.1 to 12W is used. On the other hand, the X-Y table drive system includes a pedestal 20, an X-Y table 1 installed on the pedestal 20 and driven and controlled by the computer 7, and a fine-adjustment table 1 installed on the X-Y table 1. Stage 21 and
and a vacuum suction type holding table 22 that is installed on the stage 21 and holds the workpiece 2, which is a thin film photoelectric conversion substrate mounted on the top surface, in a fixed position.
It is made up of etc. Note that this holding table 22 has a large number of suction holes opened on its upper surface that communicate with a vacuum pump 23, and by operating the vacuum pump 23 with the workpiece 2 mounted, the workpiece 2 can be moved onto the table. It is held in place by vacuum suction. The monitoring optical system includes an illumination lamp 24, an illumination lens 25, a dichroic mirror 26, and an imaging lens 2.
7. Crosshair 28 for positioning, TV camera 2
9, and a combination of a monitor television 30,
It is arranged above the condensing lens 6 of the laser optical system described above with its optical axis aligned. Further, a reference numeral 31 is located close to the condenser lens 6 facing the workpiece 2.
The vacuum pump 2 has a vacuum suction nozzle shown in
It is installed connected to 3. This suction nozzle 3
Reference numeral 1 is for sucking and removing debris that evaporates and scatters from the processing surface to the surroundings when laser processing the workpiece 2 to the outside of the system. Next, the processing procedure and processing operation using the laser processing apparatus with the above configuration will be explained. First, with the workpiece 2 mounted on the holding table 22, the vacuum pump 23 is started and the workpiece 2 is moved. Holding stand 22
Vacuum adsorb it to the upper position. Subsequently, the X-Y table 1 is set at the processing start position, the monitoring optical system is activated, and while the screen of the monitor television 30 is visually viewed, the condenser lens 6 is moved up and down by the motor drive mechanism 19 to perform focusing. At the same time, X-
The fine adjustment stage 21 of the Y table drive system is adjusted to correctly initialize the machining start position and horizontality of the workpiece. Next, a processing start command is given to the computer 7 to activate the laser oscillator 3, and at the same time
- Control the movement of the Y table 1 according to a predetermined machining pattern written in the computer in advance. As a result, the focused spot of the laser beam irradiated onto the processed surface of the workpiece 2 is scanned along a predetermined pattern with a small overlap ratio, and the processed surface is laser scribed to form an open groove. In this case, the spot shape of the laser beam immediately after it is oscillated from the laser oscillator 3 and transmitted through the collimator lens 4, and its light intensity distribution are shown in Figure 2a.
In contrast, the spot shape and light intensity distribution after passing through the rectangular field diaphragm 18 described above are circular as shown by E and F in FIG. 2B. The peripheral area of the beam spot is trimmed and changed into a rectangular shape, and its light intensity distribution also changes from a Gaussian distribution to a flat distribution with high energy density and almost uniform light intensity over the entire beam spot. In addition, the above-mentioned field stop body 1
By varying the ratio of the vertical and horizontal dimensions of the diaphragm hole 18a of 8, the shape of the beam spot can be selected from various shapes such as square and rectangular. In this case, the orientation of the field diaphragm 18 is set so that the rectangular condensing spot irradiates the machined surface of the workpiece with its two parallel sides parallel to the scanning direction of the laser beam. Further, the light intensity distribution of the laser beam transmitted through the field stop 18 can be selected from the distributions shown in FIGS. 3a, b, and c by changing the beam diameter magnification by the collimator lens 4. The distributions in FIGS. 3a, b, and c are shown in descending order of beam diameter magnification. Further, according to the above-mentioned laser processing apparatus, first, the overlapping situation caused by repeated pulse scanning of the condensing spot that irradiates the processing surface of the workpiece 2 is as shown in FIG. As is clear from this figure, the focal spot of each pulse has a rectangular shape, and its scanning direction Y
Translate parallel along. This makes it possible to form the open groove portion 9 with a uniform width along the scanning direction Y even if the overlap width between the focal spot and the focal spot of the next pulse is small. As shown in Figure 9, without forming the wave-shaped grooves that occur when scanning with a pulsed laser beam that exhibits a circular condensing spot, we can increase the moving speed of the laser beam irradiation point and create grooves with a uniform width. can be processed, and the laser scribing processing speed can be increased accordingly. Regarding this point, according to a machining experiment conducted by the inventor, it is possible to laser scribe an opening groove of uniform width along the machining pattern on the machining surface by setting the aperture hole of the field diaphragm 18 in a square shape. It has been confirmed that the processing speed can be increased approximately 4.5 times compared to the conventional method of scanning a circular light spot. In this case, by selecting the shape of the aperture hole of the field diaphragm 18 as described above to be a horizontally long rectangle, and irradiating with the long side aligned with the scanning direction of the condensing spot, the processing speed can be further increased. It is easy to understand that this method can increase the processing speed, and as a result, the processing speed can be increased by about 10 times compared to the conventional method. Furthermore, depending on the overlap rate between the focal spots,
By appropriately selecting the intensity distribution of the laser beam from the above figures 3a, b, and c, the groove depth can be made uneven over the entire open groove, including the overlapping and non-overlapping parts of the condensing spots. It can be formed almost uniformly without causing. In addition, in the apparatus shown in FIG. 1, a short focal length lens with a focal length of about 10 to 15 mm is used as the condenser lens 6 as described above, so the depth of focus is extremely shallow, and the rectangular shape described above is used. By using the field diaphragm 18, the focused spot light intensity distribution is flat, so the laser can cut grooves with high precision and a uniform processing depth without creating any residue on the thin film processing surface. It can be formed by scribing, and in addition, the vacuum suction nozzle 31 shown in FIG. Processing damage, protrusions, deposits, etc. that damage the underlying layer at the bottom of the open groove as described in FIG. 10 can be effectively prevented, and even higher processing performance can be obtained. When processing a thin film used in a solar cell, which is the object of the present invention, for example, when the thin film is an amorphous semiconductor film, the film thickness is approximately 3000 to 7000.
〓 and thin. Therefore, a lens with a focal length as short as possible is suitable as a lens, but in this embodiment, a commercially available and practical lens with a focal length of 10 to 15 mm is used. FIG. 5 shows a photoelectric conversion substrate formed by laminating thin films as a workpiece, and a conductive film 11 and a semiconductor film 13 are layered on an insulating substrate 10 in the same manner as in FIG. 10. This is a cross-sectional view of the processed part when the open groove 14 is formed by laser scribing using the laser processing apparatus shown in FIG. The melting residues, protrusions, and deposits seen in the figure are hardly generated, and the processing depth of the open groove portion 14 is almost uniform in the width direction, and processing damage to the underlying conductive coating 11 can be ignored. I was able to keep it down to This means that the depth of focus of the condensing lens is extremely shallow and the light intensity distribution at the condensing spot is flat. This is because the irradiation energy of the laser beam is significantly attenuated outside the depth range.
In addition, the scattered particles, which are a type of fine evaporation material generated during laser processing, are immediately suctioned away from the spot by the vacuum suction nozzle 31, preventing the scattered particles from adhering to the surrounding area. Occurrence can be effectively prevented.
以上述べたようにこの発明によれば、上記の構
成を採用した結果、下記の効果を奏する。
集光スポツトの重なり率を少なくしたことに
より、均一巾の開溝部を形成する際の加工速度
を大幅に高めて作業能率の向上を図ることがで
きる。
集光スポツトの重なり率を少なくしたことに
加え、焦点距離が10〜15mmのレンズを用いたこ
とにより、集光スポツトが重ならない大部分の
開溝部全域を、より一層むらなくほぼ均一に形
成することができる。
集光スポツトの重なり率を少なくし、また焦
点距離が10〜15mmのレンズを用いたことによ
り、開溝部における加工損傷の発生を防止する
ことができる。
上記,により、薄膜型光電変換基板を対
象として、開溝部の薄膜の選択的加工を確実に
実現することができる。
以上により、製品の特性ばらつきも少なく、
製品を量産する場合の歩留りを大幅に向上する
ことができる。
As described above, according to the present invention, the following effects are achieved as a result of employing the above configuration. By reducing the overlapping ratio of the light condensing spots, it is possible to significantly increase the processing speed when forming grooves of uniform width, thereby improving work efficiency. In addition to reducing the overlapping rate of the condensing spots, by using a lens with a focal length of 10 to 15 mm, the entire area of the groove where the condensing spots do not overlap can be formed more evenly and almost uniformly. can do. By reducing the overlapping rate of the condensing spots and using a lens with a focal length of 10 to 15 mm, it is possible to prevent processing damage in the open groove portion. According to the above, it is possible to reliably realize selective processing of the thin film in the groove portion of the thin film type photoelectric conversion substrate. As a result of the above, there is less variation in product characteristics.
It is possible to significantly improve the yield when mass producing products.
第1図ないし第5図はこの発明の実施例、第6
図ないし第10図は従来装置に対応する図を示す
ものであり、第1図,第6図はそれぞれこの発明
の実施例、および従来におけるレーザ加工装置の
ブロツク図、第2図a,bおよび第7図はそれぞ
れレーザ光のスポツト形状およびその光強度分布
図、第3図a〜cはそれぞれ第1図実施例におけ
る集光スポツトの光強度分布図、第4図,第8図
および第9図はそれぞれ被加工物の加工面に照射
される繰り返しパルスによる集光スポツトの走査
方式への重なり状態を表す説明図、第5図,第1
0図はそれぞれ薄膜型光電変換基板を被加工物と
してレーザ加工を施した際の開溝部の断面図であ
る。図において、
1……X−Yテーブル、2……被加工物、3…
…レーザ発振器、4……コリメータレンズ、6…
…集光レンズ、8……レーザ光、9,14……レ
ーザ加工により形成された開溝部、18……視野
絞り体、18a……絞り穴、19……モータドラ
イブ機構、22……真空吸着式保持台、29……
監視光学系のテレビカメラ、30……モニターテ
レビ、31……真空式吸引ノズル。
1 to 5 are embodiments of the present invention;
1 to 10 show diagrams corresponding to conventional apparatuses, and FIGS. 1 and 6 are block diagrams of an embodiment of the present invention and a conventional laser processing apparatus, and FIGS. 2a, b, and 2 are block diagrams, respectively. FIG. 7 is a spot shape of a laser beam and its light intensity distribution diagram, FIGS. 3 a to c are light intensity distribution diagrams of a condensing spot in the embodiment of FIG. The figures are explanatory diagrams showing the overlapping state of the condensing spot on the scanning method by repeated pulses applied to the processing surface of the workpiece, Fig. 5 and Fig. 1, respectively.
FIG. 0 is a cross-sectional view of an open groove portion when laser processing is performed using a thin film type photoelectric conversion substrate as a workpiece. In the figure, 1...X-Y table, 2...workpiece, 3...
...Laser oscillator, 4...Collimator lens, 6...
... Condensing lens, 8 ... Laser light, 9, 14 ... Groove formed by laser processing, 18 ... Field diaphragm body, 18a ... Aperture hole, 19 ... Motor drive mechanism, 22 ... Vacuum Adsorption type holding stand, 29...
Surveillance optical system TV camera, 30...Monitor TV, 31...Vacuum suction nozzle.
Claims (1)
に、レーザ発振器より発振したパルスレーザ光を
レーザ光学系を通じて被加工物の加工面に照射
し、かつ被加工物を搭載したX−Yテーブルの移
動操作により前記レーザ光の集光スポツトを被加
工面上で走査して開溝部をレーザスクライブ加工
するようにしたレーザ加工装置において、前記レ
ーザ光学系の系内に、被加工物の加工面に照射す
るレーザ光の集光スポツトを走査方向と平行な方
形状でかつフラツトな光強度分布を呈する集光ス
ポツトに成形する視野絞り手段と、レーザ光を被
加工面に集光させる焦点距離が10mmないし15mmの
集光レンズとを装備し、かつ前記X−Yテーブル
は、前記集光スポツトの被加工面上の重なり率が
小さくなるように前記集光スポツトを走査する駆
動系を備えて成ることを特徴とするレーザ加工装
置。 2 特許請求の範囲第1項記載のレーザ加工装置
において、視野絞り手段がレーザ発振器より発振
したレーザ光に光軸を合わせて集光レンズの手前
側に配備された方形状の絞り穴を有する視野絞り
体であることを特徴とするレーザ加工装置。 3 特許請求の範囲第1項記載のレーザ加工装置
において、レーザ光学系に集光レンズの焦点合わ
せ用のモータドライブ機構を備え、さらに前記集
光レンズの焦点合わせを監視する監視光学系を装
備していることを特徴とするレーザ加工装置。 4 特許請求の範囲第3項記載のレーザ加工装置
において、監視光学系が被加工面上の集光スポツ
トを撮像するテレビカメラとモニターテレビを装
備したものであることを特徴とするレーザ加工装
置。 5 特許請求の範囲第1項記載のレーザ加工装置
において、被加工物と対面する集光レンズの近傍
にレーザ加工の際に加工物面から発生する飛散物
を吸引して系外に除去する真空式の吸引ノズルが
配備されていることを特徴とするレーザ加工装
置。 6 特許請求の範囲第1項記載のレーザ加工装置
において、X−Yテーブル上には被加工物を所定
位置に吸着保持する真空吸着式の保持台が設置さ
れていることを特徴とするレーザ加工装置。[Claims] 1. For a workpiece that is a thin-film photoelectric conversion substrate, a pulsed laser beam oscillated by a laser oscillator is irradiated onto the processing surface of the workpiece through a laser optical system, and the workpiece is mounted. In the laser processing apparatus, the laser scribe processing is performed by scanning the focused spot of the laser light on the surface to be processed by moving the X-Y table, in which the laser optical system includes: A field diaphragm means for shaping the convergence spot of the laser beam irradiated onto the workpiece surface into a rectangular convergence spot parallel to the scanning direction and exhibiting a flat light intensity distribution; It is equipped with a condensing lens with a focal length of 10 mm to 15 mm, and the X-Y table scans the condensing spot so that the overlapping ratio of the condensing spot on the workpiece surface is small. A laser processing device characterized by comprising a drive system. 2. In the laser processing apparatus according to claim 1, the field stop means has a field of view having a rectangular aperture hole arranged in front of the condensing lens so as to align the optical axis with the laser beam oscillated by the laser oscillator. A laser processing device characterized by being a diaphragm body. 3. In the laser processing apparatus according to claim 1, the laser optical system is equipped with a motor drive mechanism for focusing the condensing lens, and is further equipped with a monitoring optical system for monitoring the focusing of the condensing lens. A laser processing device characterized by: 4. The laser processing apparatus according to claim 3, wherein the monitoring optical system is equipped with a television camera and a monitor television for imaging a condensed spot on the surface to be processed. 5. In the laser processing apparatus according to claim 1, a vacuum is provided in the vicinity of the condensing lens facing the workpiece to suck out scattered objects generated from the workpiece surface during laser processing and remove them from the system. A laser processing device characterized by being equipped with a type of suction nozzle. 6. The laser processing apparatus according to claim 1, wherein a vacuum suction type holding table is installed on the X-Y table to suction and hold the workpiece in a predetermined position. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60245739A JPS62104692A (en) | 1985-11-01 | 1985-11-01 | Laser beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60245739A JPS62104692A (en) | 1985-11-01 | 1985-11-01 | Laser beam device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62104692A JPS62104692A (en) | 1987-05-15 |
| JPH0453630B2 true JPH0453630B2 (en) | 1992-08-27 |
Family
ID=17138080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60245739A Granted JPS62104692A (en) | 1985-11-01 | 1985-11-01 | Laser beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62104692A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005509523A (en) * | 2001-11-17 | 2005-04-14 | インステク インコーポレイテッド | Method and system for real-time monitoring and control of cladding layer height using image capture and image processing in laser cladding and direct metal molding technology |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01306088A (en) * | 1988-06-01 | 1989-12-11 | Nippei Toyama Corp | Variable beam laser processing device |
| US6483074B2 (en) | 2001-03-07 | 2002-11-19 | International Business Machines Corporation | Laser beam system for micro via formation |
| JP2005212364A (en) * | 2004-01-30 | 2005-08-11 | Shibaura Mechatronics Corp | Brittle material cleaving system and method |
| JP4615231B2 (en) * | 2004-02-02 | 2011-01-19 | 三星ダイヤモンド工業株式会社 | Scribing apparatus and scribing method using the apparatus |
| US20090314752A1 (en) * | 2008-05-14 | 2009-12-24 | Applied Materials, Inc. | In-situ monitoring for laser ablation |
| JP5546924B2 (en) * | 2010-03-29 | 2014-07-09 | ビアメカニクス株式会社 | Laser processing method and laser processing apparatus |
| KR101706517B1 (en) * | 2011-01-13 | 2017-02-13 | 타마랙 사이언티픽 컴퍼니 인코포레이티드 | Laser removal of conductive seed layers |
| US9076860B1 (en) * | 2014-04-04 | 2015-07-07 | Applied Materials, Inc. | Residue removal from singulated die sidewall |
| US20150287638A1 (en) * | 2014-04-04 | 2015-10-08 | Jungrae Park | Hybrid wafer dicing approach using collimated laser scribing process and plasma etch |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5794482A (en) * | 1980-12-05 | 1982-06-11 | Hitachi Ltd | Pattern forming device by laser |
| JPS59165787U (en) * | 1983-04-18 | 1984-11-07 | 日本電気株式会社 | Dust collection nozzle for laser trimming equipment |
-
1985
- 1985-11-01 JP JP60245739A patent/JPS62104692A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005509523A (en) * | 2001-11-17 | 2005-04-14 | インステク インコーポレイテッド | Method and system for real-time monitoring and control of cladding layer height using image capture and image processing in laser cladding and direct metal molding technology |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62104692A (en) | 1987-05-15 |
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