JPH0455784B2 - - Google Patents

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Publication number
JPH0455784B2
JPH0455784B2 JP60118364A JP11836485A JPH0455784B2 JP H0455784 B2 JPH0455784 B2 JP H0455784B2 JP 60118364 A JP60118364 A JP 60118364A JP 11836485 A JP11836485 A JP 11836485A JP H0455784 B2 JPH0455784 B2 JP H0455784B2
Authority
JP
Japan
Prior art keywords
metal layer
film
workpiece
laser
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60118364A
Other languages
Japanese (ja)
Other versions
JPS61276791A (en
Inventor
Jiro Manabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TAKATO SEIKAN KK
Original Assignee
TAKATO SEIKAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TAKATO SEIKAN KK filed Critical TAKATO SEIKAN KK
Priority to JP60118364A priority Critical patent/JPS61276791A/en
Publication of JPS61276791A publication Critical patent/JPS61276791A/en
Publication of JPH0455784B2 publication Critical patent/JPH0455784B2/ja
Granted legal-status Critical Current

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  • Laser Beam Processing (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、レーザ光線が有する鋭い指向性とエ
ネルギ密度の高い性質を利用して、木材や合成樹
脂板に図形や文字等の線画を精巧に彫刻する方法
に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention utilizes the sharp directivity and high energy density properties of laser beams to create elaborate line drawings such as figures and characters on wood or synthetic resin boards. on how to engrave.

(従来の技術) レーザ光線によるこの種の彫刻方法としては、
同または真ちゆうのようなレーザ光線を遮る金属
板に、加工形状に対応するパターンの透孔を穿設
して型板を作り、この型板を木材等の被加工材の
表面に重ね、上方からレーザ光線を照射して透孔
部分のみを焼き削ることにより、被加工材に型板
の透孔と同じパターンの形状を加工する方法が従
来知られている(たとえば特公昭58−15232号公
報、特開昭56−71000号公報)。
(Prior art) This type of engraving method using a laser beam is as follows:
A template is made by drilling holes in a pattern that corresponds to the processed shape in a metal plate that blocks the laser beam, such as brass or brass. There is a conventionally known method of machining a workpiece into the same pattern as the hole in the template by irradiating a laser beam from the hole and burning only the hole. , Japanese Unexamined Patent Publication No. 56-71000).

(発明が解決しようとする課題) しかし従来の型板による方法では、ループ状に
閉じた透孔は型板の一部が脱落してしまうため穿
設できない。透孔を穿つ場合には必ず型板全体を
一体的に保つための所謂ブリツジが必要である。
従つて従来は文字や図形の外縁全周を被加工材の
表面に彫り下げて完全な形状に形成することは不
可能であつた。
(Problem to be Solved by the Invention) However, in the conventional method using a template, a loop-shaped closed hole cannot be drilled because a part of the template falls off. When drilling through holes, a so-called bridge is required to keep the entire template in one piece.
Therefore, conventionally, it has been impossible to carve the entire outer edge of a character or figure onto the surface of a workpiece to form a perfect shape.

このように従来は彫刻できる形状に著しい制約
があつた。例えば木材の表面に字画の多い漢字を
草書体で彫刻しようとしても、原稿となる文字に
必要なブリツジを付加するなど一定のデザインを
施したうえでなければ彫刻できないから、出来上
つた彫刻の文字は原稿の文字とは形状が異ならざ
るをえなかつた。
In this way, conventionally there were significant restrictions on the shapes that could be engraved. For example, even if you try to engrave kanji with many strokes on the surface of wood in cursive, you cannot engrave them unless you add the necessary bridges to the original characters and apply a certain design. had to have a different shape from the original text.

本発明はこのような事情を鑑み、従来の型板を
改良することにより、原稿どおりの写実的な線画
をレーザ光線を使つて木材等に彫刻することを目
的とする。
In view of the above circumstances, an object of the present invention is to improve the conventional template so as to engrave realistic line drawings exactly as in the original onto wood or the like using a laser beam.

(課題を解決するための手段) 本発明では、先づ耐蝕性の基材フイルムに金属
層を張り合せ、その金属層の表面にフオトレジス
ト膜を積層してマスク材を形成する。そして予め
原稿を撮影しておいたネガフイルムを前記マスク
材のフオトレジスト膜の上に重ね合せてフオトエ
ツチング法によりマスク材の金属層を打抜き、こ
れにより平坦な基材フイルム上に保持されたネガ
フイルムと同一のパターンの金属層を残したレー
ザマスクを形成する。次に当該レーザマスクを木
材のような被加工材の表面に重ね合せて、その上
方よりレーザ光線をレーザマスクの全面に照射し
て金属層で遮光した部分を残して基材フイルムを
除去すると共に、下面の被加工材の表面に前記金
属層で形成されるパターンを浮彫にする。
(Means for Solving the Problems) In the present invention, first, a metal layer is laminated onto a corrosion-resistant base film, and a photoresist film is laminated on the surface of the metal layer to form a mask material. Then, a negative film on which the original has been photographed is superimposed on the photoresist film of the mask material, and the metal layer of the mask material is punched out using the photoetching method, thereby removing the negative film held on the flat base film. A laser mask is formed leaving a metal layer with the same pattern as the film. Next, the laser mask is placed on the surface of a workpiece such as wood, and the entire surface of the laser mask is irradiated with a laser beam from above to remove the base film, leaving a portion blocked by the metal layer. , embossing the pattern formed by the metal layer on the surface of the lower workpiece;

(作用) しかしてネガフイルムを用いてマスク材の金属
層をフオトエツチングすると、金属層はネガフイ
ルムと同一のパターンにエツチングされるが、こ
の金属層は耐蝕性の基材フイルムに裏打ちされて
いるので金属層はばらばらに分離しないで基材フ
イルム上に一体的に保持される。
(Function) When the metal layer of the mask material is photo-etched using a negative film, the metal layer is etched in the same pattern as the negative film, but this metal layer is backed by a corrosion-resistant base film. Therefore, the metal layer is held integrally on the base film without separating into pieces.

このようにして得られたレーザマスクにより被
加工材を覆つて上方からレーザ光線を照射する
と、レーザマスクの金属層で遮られた部分を除く
他の被加工材面が一定の深さだけ蒸発して焼き削
られた状態となり、金属層と同一パターンが被加
工面に残つて浮彫になる。
When the workpiece is covered with the laser mask obtained in this way and a laser beam is irradiated from above, the surface of the workpiece other than the part blocked by the metal layer of the laser mask is evaporated to a certain depth. This results in a state where the metal layer is burnt and shaved, and the same pattern as the metal layer remains on the processed surface, creating an embossed pattern.

(実施例) 次に本発明の実施例を図面に示して説明する。(Example) Next, embodiments of the present invention will be described with reference to the drawings.

1はエツチングで腐食しないような耐蝕性の材
質たとえばポリエステル等から成る厚さ20μ乃至
50μ程度の基材フイルムで、これに鉄、銅、真鋳
のような金属で厚さがエツチング可能な100μ未
満の金属層2を一体的に張り合せ、さらにこの金
属層2の表面に、フオトレジスト膜3を積層し
て、マスク材mを形成する。
1 is made of a corrosion-resistant material that will not corrode by etching, such as polyester, and has a thickness of 20 μm or more.
A base film of approximately 50 μm in thickness is integrally laminated with a metal layer 2 of less than 100 μm in thickness made of metal such as iron, copper, or brass, which can be etched. A resist film 3 is laminated to form a mask material m.

フオトレジスト膜3はフイルム乗のレジストを
金属層2の表面に加熱、加圧してラミネートする
か、液状のレジストを塗布して形成する。
The photoresist film 3 is formed by laminating a film resist on the surface of the metal layer 2 by heating and applying pressure, or by applying a liquid resist.

一方、原稿として例えば白色紙に濃墨で氏名を
書いたものを用意し、これを製版カメラを使つて
撮影する。撮影に使う感光性フイルムは、黒白の
コントラストを明瞭に表わす必要上、硬調(ハイ
コントラスト)のリス型フイルムが好ましい。
On the other hand, a manuscript is prepared, for example, with a name written in dark ink on white paper, and this is photographed using a plate-making camera. The photosensitive film used for photography is preferably a high-contrast lithium-type film, as it is necessary to clearly display the contrast between black and white.

撮影したフイルムは現像し、ネガフイルム4を
得る。第1図で4aは現像して黒化した部分を示
す。
The photographed film is developed to obtain a negative film 4. In FIG. 1, 4a indicates a portion that has been developed and turned black.

次にネガフイルム4をフオトマスクとして前記
のマスク材mに重ねて(マスキングして)フオト
エツチングする。
Next, the negative film 4 is used as a photomask and is superimposed (masked) on the mask material m for photoetching.

それにはマスク材mのフオトレジスト膜3にネ
ガフイルムの乳剤面を重ね合せ、真空焼粋を用い
て密着露光した後(第1図)、マスク材mを現像
液中に漬け込んで現像する。現像が終つた非感光
部分の溶解したレジストかすを水で洗い落して
(第2図)、腐食機(図示しない)に送り込みエツ
チング液を吹き付けてレジスト膜より露出した部
分の金属層2を腐食除去して(ケミカルブランキ
ング)、基材フイルム1の上にフオトマスクのネ
ガフイルム4と同じパターンの金属層を残したレ
ーザマスクLMを形成する(第3図)。
To do this, the emulsion side of a negative film is superimposed on the photoresist film 3 of the mask material m, and after close exposure using vacuum printing (FIG. 1), the mask material m is immersed in a developer and developed. After development, the dissolved resist residue in the non-photosensitive area is washed away with water (Figure 2), and the metal layer 2 exposed from the resist film is corroded away by being sent to a corrosive machine (not shown) and sprayed with an etching solution. (chemical blanking) to form a laser mask LM on the base film 1, leaving a metal layer with the same pattern as the negative film 4 of the photomask (FIG. 3).

次にこのレーザマスクLMをアクリル樹脂のよ
うな合成樹脂または木材等の被加工材5の表面に
密着し、その上方から炭酸ガスレーザのようなレ
ーザ光線Lを前面に照射する(第4図)。この場
合、被加工材5とレーザ光線Lを互いに交差する
X軸及びY軸方向に相対的に移動してレーザ光線
Lを走査すれば、レーザマスクLMの全面にわた
つて適確にレーザ光線を照射できる。
Next, this laser mask LM is closely attached to the surface of a workpiece 5 such as a synthetic resin such as acrylic resin or wood, and a laser beam L such as a carbon dioxide laser is irradiated onto the front surface from above (FIG. 4). In this case, by scanning the laser beam L by moving the workpiece 5 and the laser beam L relatively in the X-axis and Y-axis directions that intersect with each other, the laser beam can be accurately irradiated over the entire surface of the laser mask LM. Can be irradiated.

レーザ光線Lを照射すると、レーザ光線Lは金
属層二で遮断されレーザマスクLMのフオトレジ
スト膜3のみを蒸発させるが、基材フイルム1が
露出した部分では基材フイルム1と共に被加工材
5の表面をある深さ(1ミリ乃至3ミリ)まで蒸
発(高熱による昇華)させて、凹部6を彫り込み
(第5図)、その結果、被加工材4の表面に金属層
2のパターンと同一のパターンすなわちネガフイ
ルム4と同一パターンが被加工面に残つて原稿の
濃墨による氏名が浮彫になる。
When the laser beam L is irradiated, the laser beam L is blocked by the metal layer 2 and evaporates only the photoresist film 3 of the laser mask LM, but in the exposed part of the base film 1, the workpiece 5 is evaporated together with the base film 1. The surface is evaporated (sublimated by high heat) to a certain depth (1 mm to 3 mm) and a recess 6 is carved (Fig. 5). As a result, a pattern identical to the pattern of the metal layer 2 is formed on the surface of the workpiece 4. A pattern, ie, the same pattern as the negative film 4, remains on the processed surface, and the name of the original is embossed in dark ink.

その後、金属層2は基材フイルム1と共に被加
工材5の表面から取り去つてもよいが、基材フイ
ルム1の裏側全体にあらかじめ接着剤を塗布して
おきレーザ光線照射前に外側に剥離紙をはがして
被加工材5の表面にレーザマスクLMを接着させ
ておけば、レーザ照射中にレーザマスクLMの位
置がずれないばかりか、所定パターンの浮彫と同
時に、浮き出たパターンの表面にそれと全く同じ
輪郭の光沢に富む金属層が一工程で被着できる。
なおこの場合、基材フイルム1の裏面に接着剤を
塗布するかわりに、基材フイルム1と被加工材5
の間に両面接着シートを介装して金属層を接着さ
せてもよいことはいうまでもない。
Thereafter, the metal layer 2 may be removed together with the base film 1 from the surface of the workpiece 5, but adhesive may be applied to the entire back side of the base film 1 in advance and release paper is applied to the outside before laser beam irradiation. If the laser mask LM is peeled off and adhered to the surface of the workpiece 5, the position of the laser mask LM will not shift during laser irradiation, and at the same time as the predetermined pattern is embossed, the surface of the embossed pattern will be completely attached to it. A high-gloss metal layer with the same contour can be applied in one step.
In this case, instead of applying adhesive to the back side of the base film 1, the base film 1 and the workpiece 5 are
Needless to say, a double-sided adhesive sheet may be interposed between the two to bond the metal layer.

またフオトレジスト膜に、感光すると可溶性に
なるタイプのものを用いて、金属層2を前述の実
施例とはネガテイプのパターンにエツチングすれ
ば、被加工材5の表面の凹凸が第1図と正反対に
なり、原稿の濃墨による氏名が被加工面に彫り込
まれる。
In addition, if a photoresist film of a type that becomes soluble when exposed to light is used and the metal layer 2 is etched into a pattern that is a negative tape compared to the above-mentioned embodiment, the unevenness on the surface of the workpiece 5 will be exactly opposite to that shown in FIG. The name of the manuscript is engraved in dark ink on the processed surface.

あるいは白色紙に濃墨で書いたものを印画紙に
焼き付けて黒白を反転させたものを原稿にし、こ
れをもとにネガフイルムを作れば、ネガフイルム
は濃墨の文字どおり黒化する。従つてこのネガフ
イルムを用いて、フオトレジスト膜が感光すると
不溶性になる普及タイプのものをフオトエツチン
グすれば、文字部分の金属層が打抜かれたレーザ
マスクが得られるので、その上からレーザ光線を
照射すれば被加工材の表面に濃墨の文字を彫り込
むことができる。
Alternatively, if you write something in dark ink on white paper and print it onto photographic paper, inverting the black and white, and making a negative film from it, the negative film will turn black, just as the dark ink does. Therefore, if you use this negative film to photo-etch a popular type of photoresist film that becomes insoluble when exposed to light, you can obtain a laser mask in which the metal layer of the characters is punched out, and then the laser beam can be applied from above. By irradiating it, it is possible to engrave dark ink letters on the surface of the workpiece.

(発明の効果) これを要するに本発明では、レーザマスクLM
を作るための材料となるマスク材mには耐蝕性の
基材フイルム1を積層するので、金属層2をフオ
トエツチングにより打抜いても、金属層が基材フ
イルム1上に保持されて残りばらばらに分離しな
い。そのため従来のような型板を一体的に保つた
ためブリツジを必要としないから、レーザマスク
を作るうえでデザイン上の制約がなくなり、さら
にこの長所に加えて、本発明では原稿を撮影した
ネガフイルム4をマスク材mにマスキングしフオ
トエツチング法によりレーザマスクLMを作るの
で、原稿に極めて忠実なレーザマスクLMが形成
できる。
(Effect of the invention) In short, in the present invention, the laser mask LM
Since the corrosion-resistant base film 1 is laminated on the mask material m, which is the material for making the mask, even if the metal layer 2 is punched out by photo-etching, the metal layer will be retained on the base film 1 and will not remain in pieces. Do not separate. Therefore, there is no need for a bridge to keep the template integral as in the past, so there are no design restrictions when making laser masks.In addition to this advantage, the present invention uses negative film 4 Since the laser mask LM is made by masking the image on the mask material m and using the photoetching method, it is possible to form a laser mask LM that is extremely faithful to the original.

従つて、このレーザマスクLMを被加工材に重
ね合せてレーザ光線を照射すると、金属層2より
露出した基材フイルム1及びその下面の被加工材
表面が高熱のため除去され、金属層2により遮ら
れた被加工材部分に原稿どおりの極めて写実的な
パターンの浮彫が得られるという効果を奏する。
Therefore, when this laser mask LM is placed on the workpiece and irradiated with a laser beam, the base film 1 exposed from the metal layer 2 and the surface of the workpiece under it are removed due to high heat, and the metal layer 2 The effect is that an extremely realistic pattern relief, just like the original, can be obtained on the blocked part of the workpiece.

特に、本発明では、レーザマスクLMの金属層
より露出した基材フイルムがレーザ照射により瞬
時に除去されるので、レーザ照射中、その下面の
被加工材の上方は完全に開放する。このためレー
ザ照射に伴う被加工材の燃焼ガスが速やかにレー
ザマスクLMの外に発散でき、被加工材とレーザ
マスクLMの間に燃焼ガスが侵入しない。従つ
て、本発明では、基材フイルム付きのレーザマス
クを被加工材表面に重ね合せても、被加工材の燃
焼ガスによりレーザマスクLMの金属層の位置が
ずれたり、被加工材の表面が煤けることがなく、
精密で美麗な彫刻が得られる、という効果もあ
る。
In particular, in the present invention, the base film exposed from the metal layer of the laser mask LM is instantly removed by laser irradiation, so the upper part of the workpiece on the lower surface is completely opened during laser irradiation. Therefore, combustion gas from the workpiece due to laser irradiation can quickly diffuse outside the laser mask LM, and combustion gas does not enter between the workpiece and the laser mask LM. Therefore, in the present invention, even if the laser mask with a base film is superimposed on the surface of the workpiece, the combustion gas of the workpiece may displace the metal layer of the laser mask LM, or the surface of the workpiece may No soot,
It also has the effect of producing precise and beautiful engravings.

このように本発明によれば文字等の線画を原稿
どおりに浮彫にしたりあるいは逆に彫り込んだり
するとができるので、毛筆で書いた原稿の場合に
は筆先にの微細な墨跡も忠実に再現して彫刻で
き、文箱の表面に漢詩や経文を彫刻して装飾した
り自筆の氏名を表札に彫つたりするのに最適であ
る。また文字に限らず拓本、魚拓、浮世絵の版木
等、明暗の差が原稿に彫刻に広く利用でき、たと
えば手に墨を塗つて紙に押したいわゆる手形を原
稿にしてこれをレーザ光線で彫刻すると、手のひ
らの微細なしわまで明瞭に再現して被加工面に彫
刻することができる。
In this way, according to the present invention, line drawings such as characters can be embossed or engraved exactly as in the manuscript, so in the case of manuscripts written with a brush, even minute ink marks on the tip of the brush can be faithfully reproduced. It can be engraved, making it ideal for decorating the surface of the box with Chinese poems and sutras, or for engraving a handwritten name on a nameplate. In addition, the difference in light and shade can be widely used for engraving manuscripts, not only for letters but also for rubbings, fish prints, and ukiyo-e woodblocks.For example, a so-called handprint made by applying ink on a hand and stamping it on paper is used as a manuscript and then engraved with a laser beam. Then, even the minute wrinkles of the palm can be clearly reproduced and engraved on the processed surface.

【図面の簡単な説明】[Brief explanation of the drawing]

第1乃至5図は本発明を実施した彫刻方法の各
工程を示す断面図である。 1は基材フイルム、2は金属層、3はフオトレ
ジスト膜、4はネガフイルム、5は被加工材、m
はマスク材、LMはレーザマスク、Lはレーザ光
線。
1 to 5 are cross-sectional views showing each step of the engraving method according to the present invention. 1 is a base film, 2 is a metal layer, 3 is a photoresist film, 4 is a negative film, 5 is a workpiece, m
is the mask material, LM is the laser mask, and L is the laser beam.

Claims (1)

【特許請求の範囲】[Claims] 1 金属層の表面にフオトレジスト膜、裏面に耐
蝕性の基材フイルムをそれぞれ積層してマスク材
を形成し、予め原稿を撮影しておいたネガフイル
ムを前記マスク材のフオトレジスト膜の上に重ね
合せてフオトエツチング法によりマスク材の金属
層を打ち抜き、これにより平坦な基材フイルム上
に保持された前記ネガフイルムと同一パターンの
金属層を残したレーザマスクを形成し、次に当該
レーザマスクを被加工材の表面に重ね合せて、そ
の上方よりレーザ光線を照射して前記金属層に形
成されているパターンを残して基材フイルムを除
去すると共に、下面に被加工材表面に浮彫りパタ
ーンを形成することを特徴とするレーザ光線によ
る彫刻方法。
1 Form a mask material by laminating a photoresist film on the front surface of the metal layer and a corrosion-resistant base film on the back surface, and place a negative film on which a document has been photographed in advance on the photoresist film of the mask material. The metal layer of the mask material is punched out by photo-etching after being stacked on top of each other, thereby forming a laser mask in which a metal layer with the same pattern as the negative film held on the flat base film remains, and then the laser mask is is superimposed on the surface of the workpiece, and a laser beam is irradiated from above to remove the base film leaving the pattern formed on the metal layer, and at the same time, the pattern embossed on the surface of the workpiece is placed on the bottom surface. An engraving method using a laser beam characterized by forming.
JP60118364A 1985-05-31 1985-05-31 Engraving method by laser beam Granted JPS61276791A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60118364A JPS61276791A (en) 1985-05-31 1985-05-31 Engraving method by laser beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60118364A JPS61276791A (en) 1985-05-31 1985-05-31 Engraving method by laser beam

Publications (2)

Publication Number Publication Date
JPS61276791A JPS61276791A (en) 1986-12-06
JPH0455784B2 true JPH0455784B2 (en) 1992-09-04

Family

ID=14734873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60118364A Granted JPS61276791A (en) 1985-05-31 1985-05-31 Engraving method by laser beam

Country Status (1)

Country Link
JP (1) JPS61276791A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4730696B2 (en) * 2001-03-28 2011-07-20 Toto株式会社 Mark display method and product
CN112490131B (en) * 2020-11-27 2024-09-13 西安交通大学 A lead frame preparation method based on etching process

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2241849C3 (en) * 1972-08-25 1979-10-18 European Rotogravure Association, 8000 Muenchen Process for engraving gravure forms by means of one or more beams
JPS597553A (en) * 1982-06-29 1984-01-14 Nippon Seiko Kk Method for grinding and forming oval rings with uniform wall thickness

Also Published As

Publication number Publication date
JPS61276791A (en) 1986-12-06

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