JPH04633U - - Google Patents

Info

Publication number
JPH04633U
JPH04633U JP4110090U JP4110090U JPH04633U JP H04633 U JPH04633 U JP H04633U JP 4110090 U JP4110090 U JP 4110090U JP 4110090 U JP4110090 U JP 4110090U JP H04633 U JPH04633 U JP H04633U
Authority
JP
Japan
Prior art keywords
fiber
hermetic coating
coating device
ports
exhaust ports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4110090U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4110090U priority Critical patent/JPH04633U/ja
Publication of JPH04633U publication Critical patent/JPH04633U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Glass Fibres Or Filaments (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例に係るハーメチツク
コート装置を用いた線引き工程を示す説明図、第
2図はその−線断面図、第3図は従来技術に
係る線引き工程を示す説明図である。 図面中、11……線引炉、12……強制冷却器
、13……紫外線硬貨樹脂用ダイス、14……紫
外線ランプ、20……ハーメチツクコート装置、
21……反応容器、22a,22b……フアイバ
通過孔、23……シールガス導入管、24……原
料ガス供給口、25……原料ガス供給管、26a
,26b……排気口、27a,27b……排気管
である。
Fig. 1 is an explanatory diagram showing a wire drawing process using a hermetic coating device according to an embodiment of the present invention, Fig. 2 is a cross-sectional view taken along the line -, and Fig. 3 is an explanatory diagram showing a wire drawing process according to the prior art. It is a diagram. In the drawings, 11... wire drawing furnace, 12... forced cooler, 13... die for ultraviolet coin resin, 14... ultraviolet lamp, 20... hermetic coating device,
21... Reaction container, 22a, 22b... Fiber passage hole, 23... Seal gas introduction pipe, 24... Raw material gas supply port, 25... Raw material gas supply pipe, 26a
, 26b...Exhaust port, 27a, 27b...Exhaust pipe.

Claims (1)

【実用新案登録請求の範囲】 (1) 線引きされているフアイバの通過孔を有す
ると共に上部にハーメチツクコート用の原料ガス
の供給口及び下部に排気口を有する反応容器を具
え、線引炉で紡糸された直後の裸フアイバを上記
フアイバ通過孔を介して導入しつつ化学的気相成
長法により連続的に被覆を施すハーメチツクコー
ト装置において、一つの反応容器について上記供
給口が少なくとも二つ以上、上記排気口が少なく
とも四つ以上設けられていると共に該排気口がフ
アイバの軸に直交する面内にて対称に配置されて
いることを特徴とするハーメチツクコート装置。 (2) 請求項1において、供給口あるいは排気口
が一面内に少なくとも四つ有するハーメチツクコ
ート装置。
[Claims for Utility Model Registration] (1) A drawing furnace comprising a reaction vessel having a passage hole for the fiber being drawn, a supply port for raw material gas for hermetic coating in the upper part, and an exhaust port in the lower part. In a hermetic coating device in which a bare fiber immediately after spinning is introduced through the fiber passage hole and continuously coated by chemical vapor deposition, at least two supply ports are provided for one reaction vessel. A hermetic coating device characterized in that at least four or more of the above-mentioned exhaust ports are provided, and the exhaust ports are arranged symmetrically in a plane orthogonal to the axis of the fiber. (2) The hermetic coating device according to claim 1, having at least four supply ports or exhaust ports in one surface.
JP4110090U 1990-04-19 1990-04-19 Pending JPH04633U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4110090U JPH04633U (en) 1990-04-19 1990-04-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4110090U JPH04633U (en) 1990-04-19 1990-04-19

Publications (1)

Publication Number Publication Date
JPH04633U true JPH04633U (en) 1992-01-07

Family

ID=31551476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4110090U Pending JPH04633U (en) 1990-04-19 1990-04-19

Country Status (1)

Country Link
JP (1) JPH04633U (en)

Similar Documents

Publication Publication Date Title
KR20030042614A (en) Multi-sectored flat board type showerhead used in cvd apparatus
JPH10147880A5 (en)
JPS5933797U (en) Fiber stock cleaning equipment
JPH04633U (en)
JPH0766130A (en) Chemical vapor deposition system
JPH0589451U (en) Semiconductor manufacturing equipment
JPH0395632U (en)
JPS61272918A (en) Cvd device improving gas flow distribution
JPS6430357U (en)
JPS6361120U (en)
JPS60149132U (en) Semiconductor heat treatment furnace
JPS6186472U (en)
JPH0750272A (en) Semiconductor manufacturing method and device
JPH08107082A (en) Vertical heat treatment equipment
JPS617025U (en) Furnace tube for semiconductor heat treatment
JPH0530350Y2 (en)
JPS63132422A (en) Reaction tube for vapor growth device
JPS6126333Y2 (en)
JPS61111963U (en)
KR20000051890A (en) Gas injection tube for a vertical diffusion furnace
JPH0538870U (en) Gas nozzle for low pressure CVD
JPH10317145A (en) Vapor phase growth equipment
JPS63106765U (en)
JPH0786262A (en) Reactor of semiconductor manufacturing equipment
JPS63200328U (en)