JPH0464362A - Surface treatment for material buried in vivo - Google Patents
Surface treatment for material buried in vivoInfo
- Publication number
- JPH0464362A JPH0464362A JP2176397A JP17639790A JPH0464362A JP H0464362 A JPH0464362 A JP H0464362A JP 2176397 A JP2176397 A JP 2176397A JP 17639790 A JP17639790 A JP 17639790A JP H0464362 A JPH0464362 A JP H0464362A
- Authority
- JP
- Japan
- Prior art keywords
- calcium
- phosphate
- substrate
- acid
- apatite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Materials For Medical Uses (AREA)
- Dental Preparations (AREA)
- Dental Prosthetics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は生体内に埋め込まれる人工骨、人工歯根などの
表面処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for surface treatment of artificial bones, artificial tooth roots, etc. to be implanted in living bodies.
従来、インブラントとしては金属、セラミック、有機高
分子材料なとの人工材料か利用されている。Conventionally, artificial materials such as metals, ceramics, and organic polymer materials have been used as implants.
インブラントのように一般に異物を生体内に埋め込む場
合、材料の周囲組織は異物に対しである種の生体反応を
起すことか知られている。It is known that when a foreign material is generally implanted into a living body, such as an implant, the tissue surrounding the material causes a certain biological reaction to the foreign material.
インブラント材か比較的生体組織に類似している場合は
同化吸収されるが、有害な金属なとかインブラントされ
た場合、周囲の組織はこの異物を速やかに隔離しようと
して線維性組織で包み込み、生体外に速やかに排出しよ
うとする。If the implant material is relatively similar to living tissue, it will be assimilated and absorbed, but if it is implanted with a harmful metal, the surrounding tissue will quickly try to isolate this foreign material and wrap it in fibrous tissue. Attempts to be quickly excreted from the body.
一方、骨内埋込材料では、水酸アパタイトなとの燐酸カ
ルシウム型の化学構造を有する材料は同化吸収作用を受
けるのに対し、アルミナ型の場合には骨組織と直接結合
するが、若しくは極めて薄い膜を介して結合することか
知られている。On the other hand, for intraosseous implant materials, materials with a calcium phosphate type chemical structure such as hydroxyapatite undergo an anabolic absorption effect, whereas alumina type materials bond directly with bone tissue or It is known that they can be bonded through a thin film.
又、関節、骨、歯根など生体硬組織用の代替材料には、
静力学的強度や、耐疲労性などの動的強度、弾性率など
についても周囲の骨組織と調和する特性を必要とする。In addition, alternative materials for biological hard tissues such as joints, bones, and tooth roots include:
Characteristics such as static strength, dynamic strength such as fatigue resistance, and elastic modulus that harmonize with the surrounding bone tissue are also required.
このような観点から従来金属材料としては、Ti、Ti
合金、オーステナイト系ステンレス鋼やパイタリウム等
か利用されている。From this point of view, conventional metal materials such as Ti and Ti
Alloys, austenitic stainless steel, pitalium, etc. are used.
以上のように、生体硬組織用インブラントとしては、機
械的特性上の観点から、従来主としてT1等の金属材か
利用されている。これらは通常錆びなものとされている
が、それても長期間生体内に留まった場合、必ずしも不
銹であるとはいえない点がある。As described above, from the viewpoint of mechanical properties, metal materials such as T1 have conventionally been mainly used as implants for biological hard tissue. Although these are usually considered rusty, they are not necessarily rustless if they remain in the body for a long period of time.
これらの材料でも、体液と接する表面には微弱ながら腐
食か生じ、これらか材料強度の低下や摺動部の摩擦を促
進し、又、それらの金属の腐食か生じると、金属イオン
か周囲の生体組織へ移行することがあるなどの問題があ
る。Even with these materials, slight corrosion occurs on the surfaces that come into contact with body fluids, which reduces the strength of the material and promotes friction on sliding parts.If corrosion of these metals occurs, metal ions or surrounding living organisms may be generated. There are problems such as transfer to other organizations.
本発明は叙上の問題点を解決するため提案さりものであ
る。The present invention is proposed to solve the above problems.
上記の本発明の目的は、生体内埋込材の表面にアパタイ
ト被覆層を形成することよって達成される。The above objects of the present invention are achieved by forming an apatite coating layer on the surface of an in-vivo implant.
而して、このアパタイト被覆層を形成するには、燐酸イ
オンとカルシウムイオンとを含む浴液中で、被処理基材
、即ち、処理すべき生体内埋込材に通電し、電解発生ガ
ス層を介して放電を行なわせるものである。To form this apatite coating layer, electricity is applied to the substrate to be treated, that is, the in-vivo implant material to be treated, in a bath solution containing phosphate ions and calcium ions, and an electrolytically generated gas layer is formed. This causes discharge to occur through the .
尚、本明細書に於いてアパタイト被覆層とは、アパタイ
ト Ca4(PO4)3水酸化アパタイトCa、
Q(PO4)6(0)1)2を主成分とし、これに、
Caz(PO4)2、 CaHPO,、Ca5(PO4
)3(OH)、 Ca5(PO4)z(OH,C1,F
)、CaJvPOa2H20なとの燐酸とカルシウムの
結合体を含むものをいうものとする。In this specification, the apatite coating layer refers to apatite Ca4(PO4)3 hydroxyapatite Ca,
The main component is Q(PO4)6(0)1)2, and
Caz(PO4)2, CaHPO,, Ca5(PO4
)3(OH), Ca5(PO4)z(OH,C1,F
), CaJvPOa2H20, etc., containing a conjugate of phosphoric acid and calcium.
(作 用〕
本発明は、燐酸イオンとカルシウムイオンとを含む浴液
中に、被処理基材、即ち、所望の加工を施した生体内埋
込材を浸漬し、被処理材を電極として浴液を介して第電
流密度で通電し、大量の電解ガス発生させ、その電解発
生ガスを介して液中放電を行なわせることにより、放電
に伴って発生する熱、衝撃、電界等の作用により、基材
表面に浴液から分解生成するアパタイトを被覆形成させ
るものである。(Function) The present invention involves immersing a substrate to be treated, that is, an in-vivo implant material that has been subjected to a desired process, in a bath solution containing phosphate ions and calcium ions, and using the material to be treated as an electrode in the bath. By passing electricity through the liquid at a current density to generate a large amount of electrolytic gas, and causing a discharge in the liquid through the electrolytically generated gas, the effects of heat, shock, electric field, etc. generated with the discharge, The surface of the substrate is coated with apatite that is decomposed and produced from the bath liquid.
従って、極めて簡単、容易に被処理材の表面に強固なア
パタイト被膜か形成されたインブラントか得られ、アパ
タイト被覆によって基材の生体親和性を高めることを得
る。Therefore, an implant having a strong apatite coating formed on the surface of the material to be treated can be obtained very simply and easily, and the biocompatibility of the substrate can be improved by the apatite coating.
以下、図面により本発明の詳細な説明する。 Hereinafter, the present invention will be explained in detail with reference to the drawings.
第1図は本発明方法を実施する装置の概要を示す断面図
、第2図は本発明方法により処理されたインブラントの
実装状態を示す断面図である。FIG. 1 is a cross-sectional view showing an outline of an apparatus for carrying out the method of the present invention, and FIG. 2 is a cross-sectional view showing the mounting state of an implant treated by the method of the present invention.
第1図に於いて、1は処理容器で、内部に浴液2を貯蔵
する。3は浴液中に浸漬した被処理基材、4は浴液2を
介して被処理材3に通電するため容器Iの底部に設けた
通電電極、5は被処理基材3と電極4との間に通電する
電源装置、6は電解発生ガスである。In FIG. 1, 1 is a processing container in which a bath liquid 2 is stored. 3 is a substrate to be treated immersed in the bath liquid; 4 is an energizing electrode provided at the bottom of the container I to supply electricity to the substrate 3 through the bath liquid 2; 5 is a connection between the substrate 3 to be treated and the electrode 4; A power supply device 6 is an electrolytically generated gas.
而して、電極30表面積は、被処理基材3のそれよりも
充分広くしておくことが推奨される。Therefore, it is recommended that the surface area of the electrode 30 be made sufficiently larger than that of the substrate 3 to be treated.
又、電源5としては、直流、商用若しくは高周波の交流
、パルス電源なとを単独若しくは組み合わせて用いる。Further, as the power source 5, a direct current, a commercial or high frequency alternating current, a pulse power source, etc. are used singly or in combination.
浴液2には、当量の燐酸イオンとカルシウムイオンとか
含まれている。The bath liquid 2 contains equivalent amounts of phosphate ions and calcium ions.
その燐酸分は、下記の如き燐酸化合物として供給される
。The phosphoric acid component is supplied as a phosphoric acid compound as described below.
(1)無機燐酸塩類 燐酸ナトリウム、燐酸カルシウム、ポリメタ燐酸なと。(1) Inorganic phosphates Sodium phosphate, calcium phosphate, polymetaphosphoric acid.
(2)燐酸エステル類
燐酸ジメチル、燐酸トリメチル、燐酸トリブチル、燐酸
トリエチル、燐酸アルキルエステルなと。(2) Phosphate esters such as dimethyl phosphate, trimethyl phosphate, tributyl phosphate, triethyl phosphate, and alkyl phosphate.
(3)ポリヌクレオチド類 オリゴヌクレオチド、核酸なと。(3) Polynucleotides Oligonucleotides and nucleic acids.
(4)有機燐酸類 燐酸セルローズ、燐酸澱粉など。(4) Organic phosphoric acids Cellulose phosphate, starch phosphate, etc.
又、カルシウム分を供給する化合物としては下記のもの
が利用できる。Furthermore, the following compounds can be used as compounds that supply calcium.
(1)有機酸カルシウム塩類
酢酸カルシウム、酪酸カルシウム、吉草酸カルシウム、
乳酸カルシウム、グリコン酸カルシウム、酒石酸カルシ
ウム、クエン酸カルシウム、アジピン酸カルシウムなと
。(1) Organic acid calcium salts calcium acetate, calcium butyrate, calcium valerate,
Calcium lactate, calcium glyconate, calcium tartrate, calcium citrate, and calcium adipate.
(2)キレートカルシウム錯塩類
エチレンシアミンテトラ酢酸、ニトリロトリ酢酸、ヒド
ロキシエチルエチレンジアミントリ酢酸その他のキレー
トのカルシウム錯塩類
(3)イオノフオアカルシウム塩類、
シクロペンタンジェニル、クラウンエーテル、クリプタ
ントなとのカルシウム塩類。(2) Chelate calcium complex salts Calcium complex salts of chelates such as ethylenecyaminetetraacetic acid, nitrilotriacetic acid, hydroxyethylethylenediaminetriacetic acid and others (3) Calcium salts of ionophore calcium salts, cyclopentangenyl, crown ether, cryptant, etc. .
(4)無機カルシウム化合物
塩化カルシウム、燐酸カルシウム、酸化カルシウムなど
。(4) Inorganic calcium compounds such as calcium chloride, calcium phosphate, and calcium oxide.
又、浴液としては、カルシウムと燐酸を含むアルコキシ
ド−(Ca)のアルコール/燐酸混合溶液を用いること
もできる。Further, as the bath liquid, an alcohol/phosphoric acid mixed solution of alkoxide (Ca) containing calcium and phosphoric acid can also be used.
以上のような燐酸とカルシウムの溶存する浴液中に被処
理基材3を入れ、通電すると、電解作用により被処理体
基材3の周囲に多量の酸素、水素、水蒸気なとの電解ガ
ス6か発生し、これか被処理体基材3に付着し、その表
面を覆うようになる。When the substrate 3 to be treated is placed in a bath liquid containing dissolved phosphoric acid and calcium as described above and electricity is applied, a large amount of electrolytic gas 6 such as oxygen, hydrogen, and water vapor is generated around the substrate 3 to be treated due to electrolytic action. The particles are generated, adhere to the substrate 3 of the object to be processed, and come to cover the surface thereof.
このため、通電回路中に等価抵抗か直列に挿入されたこ
ととなり、かつ、この抵抗はガス発生量に比例し増大す
る。Therefore, an equivalent resistance is inserted in series in the current-carrying circuit, and this resistance increases in proportion to the amount of gas generated.
被処理体基材3の表面の電解電流密度を一定の限界を越
えて増大させると、電解ガス層中で放電か発生するよう
になる。When the electrolytic current density on the surface of the substrate 3 to be processed is increased beyond a certain limit, discharge occurs in the electrolytic gas layer.
即ち、電流を増大すると発生ガスも増加し、抵抗値かガ
スの発生量に比例して増大するので、ジュール熱の発生
か加速され、被処理基材3の周辺の液温か急速に上昇し
、水蒸気と電解ガスなとのために発生ガス部分で放電か
発生するようになる。That is, as the current increases, the amount of gas generated also increases, which increases in proportion to the resistance value or the amount of gas generated, so the generation of Joule heat is accelerated, and the temperature of the liquid around the substrate 3 to be treated increases rapidly. Due to water vapor and electrolytic gas, electrical discharge occurs in the generated gas area.
浴液2と被処理基材3の間で放電か発生するようになれ
ば温度は更に上昇し、それにつれて水蒸気とガスの発生
量か増加し、被処理基材3を包んだ状態になり、抵抗値
が更に急速に増大して、浴液温度か更に上昇するように
なる。If electrical discharge occurs between the bath liquid 2 and the substrate 3 to be treated, the temperature will further rise, and the amount of water vapor and gas generated will increase accordingly, enveloping the substrate 3 to be treated. The resistance increases more rapidly, causing the bath temperature to rise further.
電極周辺の液温か100°C近くになると、水蒸気の発
生量が増大し、そのため、被処理基材3を包む混合ガス
内の放電か盛んになり、温度は益々急激に上昇する。When the temperature of the liquid around the electrode approaches 100° C., the amount of water vapor generated increases, and as a result, the discharge in the mixed gas surrounding the substrate 3 to be treated becomes active, and the temperature rises even more rapidly.
このため、被処理基材3の表面を容易に1.000〜2
.000°C程度に加熱することかできる。For this reason, the surface of the substrate 3 to be treated can be easily
.. It can be heated to about 000°C.
加熱された電極3表面には、この放電の加熱作用、衝撃
効果、電界効果などによって浴液成分中のカルシウムと
燐酸の化学反応によって、アパタイトcan(po4)
3 及び 水酸化アパタイトCa+o(POa)s(
OH)2が、 Caz(POt)2、 CaHPO4
、Ca6(Po4)s(OH)、 Ca5(PO4)
i(OH,CI、 P)、Ca2HtPO42H20そ
の他の燐酸とカルシウムの結合体を伴って析出し、緻密
な被膜を形成するようになる。Apatite can (po4) is formed on the surface of the heated electrode 3 by a chemical reaction between calcium and phosphoric acid in the bath liquid components due to the heating action of this discharge, impact effect, electric field effect, etc.
3 and hydroxyapatite Ca+o(POa)s(
OH)2, Caz(POt)2, CaHPO4
, Ca6(Po4)s(OH), Ca5(PO4)
i(OH, CI, P), Ca2HtPO42H20, and other phosphoric acid-calcium combinations are precipitated to form a dense film.
この生成被覆は、被処理基材3の温度上昇によって、被
処理基材3の表面に焼付けられるので、その表面には密
着した、強固なアパタイト被膜か形成される。This produced coating is baked onto the surface of the substrate 3 to be treated as the temperature of the substrate 3 rises, so that a strong apatite coating that adheres to the surface is formed.
このアパタイト被膜は生体との親和力か高く、かつ、数
μmから10数μmの厚みの、緻密で均一な被覆か容易
に得られるので、インブラント表面被覆として極めて有
効である。This apatite film has a high affinity with living organisms and can be easily obtained as a dense and uniform coating with a thickness of several μm to more than 10 μm, so it is extremely effective as an implant surface coating.
次に実施例に就いて説明する。Next, examples will be explained.
〔実施例1〕
重量比で、クエン酸5%、燐酸カルシウム20%(過飽
和)混合水溶液中にTi製の被処理基材を浸漬し、これ
を負極として通電を行なった。[Example 1] A substrate to be treated made of Ti was immersed in a mixed aqueous solution of 5% citric acid and 20% calcium phosphate (supersaturated) by weight, and electricity was applied using this as a negative electrode.
放電条件は100V、IOAて5分間の加熱処理をした
とき、Ti材の表面に約数10μmのアパタイト膜を生
成できた。When heat treatment was performed for 5 minutes under discharge conditions of 100 V and IOA, an apatite film of approximately several 10 μm was able to be formed on the surface of the Ti material.
〔実施例2〕
重量比で、エチレンジアミンテトラ酢酸のCa塩20%
と、燐酸ソーダ10%残部水から成る浴液を用い、Ti
材を正極として放電を行なった。[Example 2] 20% Ca salt of ethylenediaminetetraacetic acid by weight
using a bath solution consisting of 10% sodium phosphate and the balance water.
Electric discharge was performed using the material as a positive electrode.
放電条件100V、 IOAで5分間通電して、厚さ約
5μmのアパタイト被膜を形成することかできた。By applying current for 5 minutes under discharge conditions of 100 V and IOA, an apatite film with a thickness of about 5 μm could be formed.
〔実施例3〕
塩化カルシウム2096を含む燐酸トリブチルエマルジ
ョン液を用い、Ti材を負極として放電を行なった。[Example 3] Discharge was performed using a tributyl phosphate emulsion containing calcium chloride 2096 and using a Ti material as a negative electrode.
放電条件は100V、5A、5分間処理により厚さ約4
μmのアパタイト被膜を形成することができた。The discharge conditions are 100V, 5A, and a thickness of approximately 4 mm after being treated for 5 minutes.
It was possible to form an apatite film of μm.
〔実施例4〕
燐酸トリブチルとグリコン酸カルシウムから成るペース
トを用い、Ti材を負極として放電を行なった。[Example 4] Using a paste consisting of tributyl phosphate and calcium glyconate, discharge was performed using a Ti material as a negative electrode.
放電条件200■、3A、20分間の処理により厚さ約
60μmのアパタイト被膜を形成することができた。An apatite film with a thickness of about 60 μm could be formed by treatment under discharge conditions of 200 μm, 3 A, and 20 minutes.
〔実施例5〕
浴液として、クエン酸5%と、酢酸カルシウムIO%及
び燐酸ソーダ20%を含む水溶液を用い、Ti材を負極
として処理した。[Example 5] An aqueous solution containing 5% citric acid, IO% calcium acetate, and 20% sodium phosphate was used as a bath liquid, and a Ti material was used as a negative electrode.
放電条件は100V、IOAで5分間処理して厚さ約6
μmのアパタイト被膜を形成した。The discharge conditions were 100V and IOA for 5 minutes to a thickness of approximately 6mm.
An apatite film with a thickness of μm was formed.
〔実施例6〕
シクロペンタジェニルカルシウム20%と、燐酸トリメ
チル20%+Nas PO45%の混合水溶液を用い、
Ti材を負極として放電処理を行なった。[Example 6] Using a mixed aqueous solution of 20% cyclopentadienyl calcium, 20% trimethyl phosphate + 45% Nas PO,
Discharge treatment was performed using a Ti material as a negative electrode.
放電条件は180V、5AS10分間の処理により厚さ
12μのアパタイト被膜が形成できた。The discharge conditions were 180V and 5AS was used for 10 minutes to form an apatite film with a thickness of 12μ.
〔実施例7〕
ATPとCaOから成るペースト中にTi材を入れ、出
力500Wの高周波放電を行なわせた。[Example 7] A Ti material was placed in a paste consisting of ATP and CaO, and high frequency discharge with an output of 500 W was performed.
20分間処理したとき厚さ約30μmのアパタイト被膜
か形成できた。When treated for 20 minutes, an apatite film with a thickness of about 30 μm was formed.
〔実験例8〕
アルコキシド−(Ca)と、アルコール、燐酸混合液を
用い、液中にTi材を挿入し、正極放電を行なった。[Experimental Example 8] Using a mixed solution of alkoxide (Ca), alcohol, and phosphoric acid, a Ti material was inserted into the solution, and positive electrode discharge was performed.
放電条件は、30V、 0.5Aで、10分間の処理
により電気泳動、アーク放電を行ない、更に1.5KW
2450M Hzのマイクロ波放電を行って焼付処理を
し、厚さ 100μmのアパタイト被膜を形成した。The discharge conditions were 30V, 0.5A, 10 minutes of electrophoresis and arc discharge, and 1.5KW.
Baking treatment was performed using microwave discharge at 2450 MHz to form an apatite film with a thickness of 100 μm.
第2図は、歯科インブラントに年発明方法を応用したと
きの施術状態を示す断面図である。FIG. 2 is a cross-sectional view showing the state of treatment when the method invented in 2010 is applied to a dental implant.
7はTi又はTi合金等の金属材を加工形成した人工歯
根、8はその表面に形成されたアパタイト被膜である。7 is an artificial tooth root formed by processing a metal material such as Ti or a Ti alloy, and 8 is an apatite coating formed on the surface thereof.
人工歯根7は、脱落若しくは抜かれた歯牙に代り、顎骨
9内に挿入、固定して人工歯11の支台として用いるも
のである。The artificial tooth root 7 is inserted and fixed into the jawbone 9 and used as an abutment for the artificial tooth 11 in place of a fallen or extracted tooth.
アパタイト被膜8は、主としてこの人工歯根7のプレー
ト部分、即ち、歯髄を縦に貫通し顎骨9内まで挿入して
固定する部分の表面に形成されるものである。The apatite coating 8 is mainly formed on the surface of the plate portion of the artificial tooth root 7, that is, the portion that vertically penetrates the dental pulp and is inserted into the jawbone 9 and fixed therein.
このアパタイト膜8は、厚さIOμm程度以下に形成す
ることか望ましい。This apatite film 8 is desirably formed to have a thickness of about IO μm or less.
ブレード表面はこのアパタイト薄膜8によって完全に覆
われ、顎骨9内でブレード金属が直接生体組織に触れる
ことかないようになる。The blade surface is completely covered with this apatite thin film 8, and the blade metal does not come into direct contact with living tissue within the jawbone 9.
又、インブラントの首部は歯肉粘膜10によって覆われ
るが、アパタイト膜は生体組織と極めて良く馴染むので
、インブラントと歯肉との間に隙間が生じることがなく
、インブラントは生体組織に密着するので、細菌か体内
に入り感染を起す危険性も減少する。Furthermore, although the neck of the implant is covered by the gingival mucosa 10, the apatite film blends extremely well with the living tissue, so there is no gap between the implant and the gingiva, and the implant adheres closely to the living tissue. This also reduces the risk of bacteria entering the body and causing infection.
このようにインブラントか安定的に機能し、強固に生体
組織内に埋設されるので、その頭部に金属、ポーセレン
なとから成る歯冠11を強固に固定すれば、極めて安定
した義歯ができる。In this way, the implant functions stably and is firmly embedded in the living tissue, so if the crown 11 made of metal or porcelain is firmly fixed to the head of the implant, an extremely stable denture can be created. .
前記のように、液中放電を利用すればアパタイト被膜が
短時間内に簡単に生成し、かつ、その被膜は放電熱によ
って基材表面に溶着し、強固に焼付けられ、10crl
当り約60〜70kg程度又はそれ以上の密着強度が得
られるものである。As mentioned above, if submerged discharge is used, an apatite film can be easily generated within a short time, and the film is welded to the surface of the base material by the discharge heat and is baked firmly.
An adhesion strength of about 60 to 70 kg or more can be obtained per unit.
被膜の厚さも処理時間を制御することによって自由に制
御でき、数分間の放電処理によって容易に数μmから数
10μmの最適な膜厚か得られる。The thickness of the film can also be freely controlled by controlling the treatment time, and an optimum film thickness of several μm to several tens of μm can be easily obtained by several minutes of discharge treatment.
従来、この種の被膜成形法としてはプラズマ溶射法か一
般的であるが、これによる場合、膜厚か50μmと厚く
なり過ぎ、基材の形状精度を維持することが困難である
上、被膜の密着性か悪く、所要の密着強度か得られない
という欠点かあった。Conventionally, plasma spraying has been the most common method for forming this type of film, but when this method is used, the film is too thick, at 50 μm, and it is difficult to maintain the shape accuracy of the base material. The adhesion was poor and the required adhesion strength could not be obtained.
然しなから、本発明に係る放電被覆法によれば処理時間
によって被膜の厚さを制御することかでき、特に好適な
108m以下の膜厚コントロールが極めて容易に可能で
あるため、基材の形状精度を高精度に維持でき、然もこ
の薄膜は基材との密着性及び生体親和性か高く、そのた
め骨内埋込みの強度と安全性か高められ、長期にわたり
副作用かなく安全て安定した強固な埋込みか可能となる
。However, according to the discharge coating method according to the present invention, the thickness of the coating can be controlled by changing the treatment time, and it is particularly easy to control the coating thickness to a suitable thickness of 108 m or less. In addition, this thin film has high adhesion to the base material and high biocompatibility, which increases the strength and safety of implantation into the bone, making it a safe, stable and strong material for a long period of time without side effects. It is possible to embed it.
尚、第1図に示した実施例に於いて、処理容器l内の浴
液2を図示されていない貯蔵タンクに貯蔵しておき、ポ
ンプによって処理容器1との間を循環させながら放電処
理を行なうようにしてもよく、その場合、ポンプによる
供給回路中に液温制御装置、イオン濃度制御装置等を設
けて浴液の温度及び組成をコントロールしなから処理液
の循環供給を行ない、常に一定条件で安定した処理を行
なうよう構成することが推奨される。In the embodiment shown in FIG. 1, the bath liquid 2 in the processing container 1 is stored in a storage tank (not shown), and the discharge treatment is performed while circulating it between the bath liquid 2 and the processing container 1 by a pump. In that case, a liquid temperature control device, an ion concentration control device, etc. are installed in the supply circuit using a pump to control the temperature and composition of the bath liquid, and then the processing liquid is circulated and supplied, so that it is always kept constant. It is recommended that the configuration be configured to perform stable processing under certain conditions.
以上の様に、本発明は以上の如く構成されるから、本発
明によるときは、生体親和性の良いアパタイト薄膜を材
表面に容易に形成できるものであり、かつその被覆の厚
さの制御が簡単で、実用上最良な10μm程度以下の薄
膜形成が容易にてき、かつその被膜は放電熱の溶着焼付
効果によって強く基材に焼付られるので、密着性が極め
て高いものである。As described above, since the present invention is constructed as described above, according to the present invention, an apatite thin film with good biocompatibility can be easily formed on the surface of a material, and the thickness of the coating can be controlled. It is easy to form a thin film of about 10 μm or less, which is the best for practical use, and the film is strongly baked onto the base material by the welding and baking effect of discharge heat, so it has extremely high adhesion.
金属基材の表面にこのようなアパタイト皮膜を形成する
ことによって、生体親和性の高い良好な骨内インブラン
トか容易に得られる。By forming such an apatite film on the surface of a metal base material, a good intraosseous implant with high biocompatibility can be easily obtained.
即ち、骨は繊維性有機質にカルシウム、燐酸、炭酸など
のミネラル質か沈着したもので、独特の粘弾性を持って
いる。In other words, bones are made up of fibrous organic matter deposited with minerals such as calcium, phosphoric acid, and carbonic acid, and have unique viscoelastic properties.
これらの天然骨のミネラル質の化学式や結晶構造につい
ては従来より研究がなされており、結晶構造は主に水酸
化アバタイ)Ca、。(po、 ) s (oH) 2
であることか知られている。The chemical formula and crystal structure of these natural bone minerals have been studied for a long time, and the crystal structure is mainly hydroxylated abatai)Ca. (po, )s (oH) 2
It is known that
従って、このアパタイト被覆形成処理したインブラント
を骨内に埋め込むと生物学的な同化吸収を受けると同時
に、その部位に新生骨の形成か促進され、インブラント
は骨と一体に強固に結合するようになる。Therefore, when an implant coated with apatite is implanted into bone, it undergoes biological assimilation and absorption, and at the same time, the formation of new bone is promoted at the site, allowing the implant to bond firmly with the bone. become.
又、基材金属として、静力学的強度、耐疲労性などの動
的強度、弾性率などの面で周囲の骨組織の特性と調和す
るTi材などを選定することによって、優れた人工骨を
形成することができる。In addition, by selecting a Ti material as the base metal that harmonizes with the characteristics of the surrounding bone tissue in terms of static strength, dynamic strength such as fatigue resistance, and elastic modulus, we can create excellent artificial bones. can be formed.
アパタイト被膜は金属性基材に対し高い密着性を有して
おり、ピンホールなどを生じることなく完全に基材表面
を覆うので、基材金属と体液との直接接触がなく、その
ため、腐食による劣化や強度低下なとも完全に防止でき
る効果かある。Apatite coatings have high adhesion to metal substrates and completely cover the surface of the substrate without forming pinholes, so there is no direct contact between the substrate metal and body fluids, which prevents corrosion. It has the effect of completely preventing deterioration and strength loss.
第1図は本発明方法を実施する装置の概要を示す断面図
、第2図は本発明方法により処理されたインブラントの
実装状態を示す断面図である。
■・・・・・・・・処理容器
2・・・・・・・・浴液
3.7・・・・・・被処理基材
4・・・・・・・・通電電極
5・・・・・・・・電源装置
6・・・・・・・・電解発生ガス
8・・・・・・・・アパタイト被膜
9・・・・・・・・顎骨
10・・・・・・・・歯肉粘膜
11・・・・・・・・歯冠FIG. 1 is a cross-sectional view showing an outline of an apparatus for carrying out the method of the present invention, and FIG. 2 is a cross-sectional view showing the mounting state of an implant treated by the method of the present invention. ■・・・・・・・・・Processing container 2・・・・・・・Bath liquid 3.7・・・・・・Substrate to be treated 4・・・・・・・Electricity electrode 5・・・・..... Power supply device 6 ..... Electrolytically generated gas 8 ..... Apatite film 9 ..... Jawbone 10 ..... Gums Mucous membrane 11......Tooth crown
Claims (2)
被処理基材に通電し、被処理基材と浴液の間で放電を行
なわせることにより、被処理基材表面にアパタイト被覆
層を形成することを特徴とする生体内埋込材の表面処理
方法。(1) An apatite coating layer is formed on the surface of the substrate by applying electricity to the substrate in a bath solution containing phosphate ions and calcium ions and causing discharge between the substrate and the bath solution. 1. A method for surface treatment of an in-vivo implant, characterized by forming a surface.
の無機燐酸塩類、燐酸ジメチル、燐酸トリメチル、燐酸
トリブチル、燐酸トリエチル、燐酸アルキルエステルそ
の他の燐酸エステル類、オリゴヌクレオチド、核酸その
他のポリヌクレオチド類、燐酸セルローズ、燐酸澱粉そ
の他の有機燐酸類とから成る群のなかから選ばれた少な
くとも一種の燐酸化合物と、 酢酸カルシウム、酪酸カルシウム、吉草酸カルシウム、
乳酸カルシウム、グリコン酸カルシウム、酒石酸カルシ
ウム、クエン酸カルシウム、アジピン酸カルシウムその
他の有機酸カルシウム塩類、エチレンジアミンテトラ酢
酸、ニトリロトリ酢酸、ヒドロキシエチルエチレンジア
ミントリ酢酸その他のキレートのカルシウム錯塩類、シ
クロペンタンジェニル、クラウンエーテル、クリプタン
トその他のイオノフォアカルシウム塩類、塩化カルシウ
ム、燐酸カルシウム、酸化カルシウムその他の無機カル
シウム化合物とから成る群のなかから選ばれた少なくと
も一種のカルシウム化合物とを含む水溶液である請求項
1に記載の生体内埋込材の表面処理方法。(2) The bath liquid contains sodium phosphate, calcium phosphate, polymetaphosphoric acid and other inorganic phosphates, dimethyl phosphate, trimethyl phosphate, tributyl phosphate, triethyl phosphate, phosphate alkyl esters and other phosphate esters, oligonucleotides, nucleic acids and other polynucleotides. at least one phosphoric acid compound selected from the group consisting of cellulose phosphate, starch phosphate, and other organic phosphoric acids, and calcium acetate, calcium butyrate, calcium valerate,
Calcium lactate, calcium glyconate, calcium tartrate, calcium citrate, calcium adipate and other organic acid calcium salts, ethylenediaminetetraacetic acid, nitrilotriacetic acid, hydroxyethylethylenediaminetriacetic acid and other calcium complex salts of chelates, cyclopentangenyl, crown The raw material according to claim 1, which is an aqueous solution containing at least one calcium compound selected from the group consisting of ether, cryptant and other ionophore calcium salts, calcium chloride, calcium phosphate, calcium oxide and other inorganic calcium compounds. Surface treatment method for implantable materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17639790A JP3140452B2 (en) | 1990-07-05 | 1990-07-05 | Surface treatment method for implantable material in vivo |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17639790A JP3140452B2 (en) | 1990-07-05 | 1990-07-05 | Surface treatment method for implantable material in vivo |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0464362A true JPH0464362A (en) | 1992-02-28 |
| JP3140452B2 JP3140452B2 (en) | 2001-03-05 |
Family
ID=16012955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17639790A Expired - Fee Related JP3140452B2 (en) | 1990-07-05 | 1990-07-05 | Surface treatment method for implantable material in vivo |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3140452B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06128793A (en) * | 1992-10-15 | 1994-05-10 | Natl Inst For Res In Inorg Mater | Apatite film forming electrolyte |
| GB2309980A (en) * | 1996-02-06 | 1997-08-13 | Abbey | Treating ferrous surface with gluconate and citrate salts |
| WO1998054089A1 (en) * | 1997-05-30 | 1998-12-03 | Rolf Ewers | Hydroxylapatite gel |
| JP2003024764A (en) * | 2001-07-16 | 2003-01-28 | Japan Science & Technology Corp | Gas generator |
| JP2005027930A (en) * | 2003-07-08 | 2005-02-03 | Ishifuku Metal Ind Co Ltd | Bone filling material |
| JP2008220516A (en) * | 2007-03-09 | 2008-09-25 | Tohoku Univ | Method for producing bone-compatible titanium material |
| JP2011036923A (en) * | 2009-08-06 | 2011-02-24 | Chugoku Electric Power Co Inc:The | Crimping tool cover |
| JP2011167373A (en) * | 2010-02-19 | 2011-09-01 | Kitami Institute Of Technology | Method of producing bone compatible titanium material and bone compatible titanium material |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR112015018942A2 (en) * | 2013-02-22 | 2017-07-18 | Hydro Quebec | techniques for producing chlorinated products and prefabricated cathode structures |
-
1990
- 1990-07-05 JP JP17639790A patent/JP3140452B2/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06128793A (en) * | 1992-10-15 | 1994-05-10 | Natl Inst For Res In Inorg Mater | Apatite film forming electrolyte |
| GB2309980A (en) * | 1996-02-06 | 1997-08-13 | Abbey | Treating ferrous surface with gluconate and citrate salts |
| GB2309980B (en) * | 1996-02-06 | 1998-12-16 | Abbey | Treatment of ferrous metal surfaces |
| US5916379A (en) * | 1996-02-06 | 1999-06-29 | Abbey Research & Development Ltd. | Treatment of ferrous metal surfaces |
| WO1998054089A1 (en) * | 1997-05-30 | 1998-12-03 | Rolf Ewers | Hydroxylapatite gel |
| JP2003024764A (en) * | 2001-07-16 | 2003-01-28 | Japan Science & Technology Corp | Gas generator |
| JP2005027930A (en) * | 2003-07-08 | 2005-02-03 | Ishifuku Metal Ind Co Ltd | Bone filling material |
| JP2008220516A (en) * | 2007-03-09 | 2008-09-25 | Tohoku Univ | Method for producing bone-compatible titanium material |
| JP2011036923A (en) * | 2009-08-06 | 2011-02-24 | Chugoku Electric Power Co Inc:The | Crimping tool cover |
| JP2011167373A (en) * | 2010-02-19 | 2011-09-01 | Kitami Institute Of Technology | Method of producing bone compatible titanium material and bone compatible titanium material |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3140452B2 (en) | 2001-03-05 |
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