JPH0464760U - - Google Patents
Info
- Publication number
- JPH0464760U JPH0464760U JP10874490U JP10874490U JPH0464760U JP H0464760 U JPH0464760 U JP H0464760U JP 10874490 U JP10874490 U JP 10874490U JP 10874490 U JP10874490 U JP 10874490U JP H0464760 U JPH0464760 U JP H0464760U
- Authority
- JP
- Japan
- Prior art keywords
- inductively coupled
- frequency inductively
- coupled plasma
- entrance slit
- plasma emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009616 inductively coupled plasma Methods 0.000 claims 5
- 230000003287 optical effect Effects 0.000 claims 4
- 238000010586 diagram Methods 0.000 description 4
- 230000004075 alteration Effects 0.000 description 2
- 206010010071 Coma Diseases 0.000 description 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Description
第１図は本考案の実施例の斜視図、第２図は本
実施例の側面図、第３図は本実施例の平面図、第
４図は従来例のブロツク図、第５図は本考案の実
施例の場合の入射スリツト上のプラズマの像ので
き方を示すブロツク図、第６図はレンズによる色
収差を示すブロツク図、第７図は球面鏡によるコ
マ収差を示すブロツク図である。
１……プラズマ、２……第１入射鏡、３……第
２入射鏡、４……入射スリツト、５……分光器、
６……光検出器、７……レンズ、８，９……平面
鏡、１０……プラズマの像。
Fig. 1 is a perspective view of the embodiment of the present invention, Fig. 2 is a side view of the embodiment, Fig. 3 is a plan view of the embodiment, Fig. 4 is a block diagram of the conventional example, and Fig. 5 is the main body. FIG. 6 is a block diagram showing how a plasma image is formed on the entrance slit in the case of the embodiment of the invention, FIG. 6 is a block diagram showing chromatic aberration caused by a lens, and FIG. 7 is a block diagram showing coma aberration caused by a spherical mirror. 1...Plasma, 2...First incidence mirror, 3...Second incidence mirror, 4...Incidence slit, 5...Spectroscope,
6... Photodetector, 7... Lens, 8, 9... Plane mirror, 10... Plasma image.
Claims (1)
た高周波誘導結合プラズマ発光分光分析装置にお
いて、 ２枚の凹面円筒鏡を、 各々の曲率中心が直交するように配置して用い
ることにより、 入射スリツト上のプラズマの像の方向を任意に
設計し得る入射光学系を備えたことを特徴とする
高周波誘導結合プラズマ発光分光分析装置。 (2) 前記分光器と、 前記分光器と一対となる前記入射光学系とを、
各々２つ備えたことを特徴とする請求項１記載の
高周波誘導結合プラズマ発光分光分析装置。 (3) 前記２枚の凹面円筒鏡のうちの片方の鏡の
角度を変えて入射スリツト上のプラズマの像の縦
方向の位置を、 前記２枚の円筒鏡のうちのもう一方の鏡の角度
を変えて入射スリツト上のプラズマの像の横方向
の位置を、 各々調節できるように形成した入射光学系を備
えたことを特徴とする請求項１記載の高周波誘導
結合プラズマ発光分光分析装置。[Claims for Utility Model Registration] (1) In a high-frequency inductively coupled plasma emission spectrometer using a spectroscope with its main optical axis in the vertical direction, two concave cylindrical mirrors are arranged so that their centers of curvature are perpendicular to each other. 1. A high-frequency inductively coupled plasma emission spectrometer characterized by comprising an entrance optical system that allows the direction of a plasma image on an entrance slit to be arbitrarily designed by being placed in the entrance slit. (2) The spectrometer and the input optical system paired with the spectrometer,
2. The high-frequency inductively coupled plasma emission spectrometer according to claim 1, characterized in that each device comprises two high-frequency inductively coupled plasma emission spectrometers. (3) Change the vertical position of the plasma image on the entrance slit by changing the angle of one of the two concave cylindrical mirrors, and change the angle of the other of the two cylindrical mirrors. 2. The high-frequency inductively coupled plasma emission spectrometer according to claim 1, further comprising an entrance optical system configured to adjust the lateral position of the plasma image on the entrance slit by changing the lateral position of the plasma image on the entrance slit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10874490U JPH0464760U (en) | 1990-10-17 | 1990-10-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10874490U JPH0464760U (en) | 1990-10-17 | 1990-10-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0464760U true JPH0464760U (en) | 1992-06-03 |
Family
ID=31855864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10874490U Pending JPH0464760U (en) | 1990-10-17 | 1990-10-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0464760U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015184167A (en) * | 2014-03-25 | 2015-10-22 | 株式会社日立ハイテクサイエンス | ICP emission spectrometer |
-
1990
- 1990-10-17 JP JP10874490U patent/JPH0464760U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015184167A (en) * | 2014-03-25 | 2015-10-22 | 株式会社日立ハイテクサイエンス | ICP emission spectrometer |
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