JPH0465614A - Optical surface roughness measuring instrument - Google Patents

Optical surface roughness measuring instrument

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Publication number
JPH0465614A
JPH0465614A JP17777490A JP17777490A JPH0465614A JP H0465614 A JPH0465614 A JP H0465614A JP 17777490 A JP17777490 A JP 17777490A JP 17777490 A JP17777490 A JP 17777490A JP H0465614 A JPH0465614 A JP H0465614A
Authority
JP
Japan
Prior art keywords
light
measurement
measured
displacement
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17777490A
Other languages
Japanese (ja)
Inventor
Motohito Hino
元人 日野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brother Industries Ltd
Original Assignee
Brother Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brother Industries Ltd filed Critical Brother Industries Ltd
Priority to JP17777490A priority Critical patent/JPH0465614A/en
Publication of JPH0465614A publication Critical patent/JPH0465614A/en
Pending legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To cancel the influence due to disturbance such as vibration and to measure the ruggedness of the surface of a body to be measured with high accuracy by measuring the ruggedness of the surface based on the difference between a displacement quantity measured with reference light and a displacement quantity measured with photometric light. CONSTITUTION:The differential signal (e) between measurement signals Sa and Sb corresponds to a displacement quantity DM, i.e. a displacement quantity (d+d') which is the sum of a displacement quantity d' due to the vibration of the whole body 28 to be measured and a displacement quantity (d) due to the ruggedness of the surface 30 and the differential signal Re between reference signals SRa and SRb corresponds to a displacement quantity DR, i.e. the displacement quantity d' due to the vibration of the whole body 28, so the difference between those differential signals (e) and Re corresponds to the displacement quantity only due to the ruggedness of the surface 30 of the body 28 and the influence due to the disturbance such as the vibration is canceled to measure the ruggedness of the surface 30 with high accuracy.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は光学式の表面粗さ測定装置に係り、詳しくは、
光の反射位置が表面の凹凸に応じて変化するのに伴って
反射光の収束発散状態が変化することを利用して表面の
凹凸を測定する装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an optical surface roughness measuring device, and in detail:
The present invention relates to a device that measures the unevenness of a surface by utilizing the fact that the convergence/divergence state of reflected light changes as the position of light reflection changes in accordance with the unevenness of the surface.

従来の技術 被測定物の表面粗さや微細な凹凸形状等を測定する光学
式表面粗さ測定装置の一種に、光軸に対して交差する方
向へ相対移動させられる被測定物の表面にビームウェス
トが略位置する状態でその表面の微小範囲に計測光を集
光させるとともに、その表面で反射された計測光の収束
発散状態の変化を検出することにより、その表面の凹凸
による計測光の反射位置の変位量を測定する形式のもの
がある。そして、上記収束発散状態の変化を検出する一
つの手段として、ナイフェツジと2分割光センサにより
集光位置のずれを検出するナイフェツジ法が知られてい
る。
Conventional technology A type of optical surface roughness measuring device that measures the surface roughness and minute irregularities of the object to be measured. By concentrating the measurement light on a minute area of the surface while the surface is approximately located, and detecting changes in the convergence/divergence state of the measurement light reflected on the surface, the position of reflection of the measurement light due to the unevenness of the surface can be determined. There is a type that measures the amount of displacement. As one means for detecting a change in the convergence/divergence state, the Knifezi method is known, in which a shift in the light focusing position is detected using a Knifezi and a two-split optical sensor.

かかるナイフェツジ法について第2図を参照しつつ具体
的に説明すると、B点が対物レンズIOの焦点位置にあ
れば、B点からの光線は対物レンズ10を通過した後に
平行光線となってナイフェツジ12により下半分の光束
を遮られた後、集光レンズ22によって2分割光センサ
14上に照射される。2分割光センサ14は集光レンズ
22の焦点位置にあるので、B点から出射された光は2
分割光センサ14上の中心位置に集光させられる。
To explain this knife method in detail with reference to FIG. 2, if point B is at the focal position of the objective lens IO, the light ray from point B becomes a parallel ray after passing through the objective lens 10 and passes through the knife 12. After the lower half of the luminous flux is blocked by the condenser lens 22, it is irradiated onto the two-split optical sensor 14. Since the two-split optical sensor 14 is located at the focal point of the condensing lens 22, the light emitted from point B is split into two parts.
The light is focused on the center position on the split light sensor 14.

この光は、図において光軸を境とする上側および下側に
おける光をそれぞれ受光するようになっている一対の受
光部16aおよび16bにより受光されるが、上記のよ
うに2分割光センサ14上の中心位置に集光させられて
いるときにおけるそれぞれの受光量は互いに等しく、上
記受光部16aおよび16bの差動信号は0となる。
This light is received by a pair of light receiving parts 16a and 16b which respectively receive light on the upper side and the lower side of the optical axis as a boundary in the figure. When the light is focused at the center position, the amount of light received by each light receiving section is equal to each other, and the differential signal of the light receiving sections 16a and 16b becomes 0.

ところが、出射点がA点側に移動すると対物レンズ10
を出た光線は発散光となるため、ナイフェツジ12に遮
られない上半分の光束の集光レンズ22による集光位置
(ビームウェスト)が2分割光センサ14の位置よりも
遠くなり、主として2分割光センサ14の上部に照射さ
れるようになる。このため、上側の受光部16aの出力
は下側の受光部16bの出力よりも大きくなって差動信
号は負となる。逆に、出射点が0点側に移動すると対物
レンズ10を出た光線は収束光となるため、集光レンズ
22による光束の集光位置が2分割光センサ14よりも
手前となり、主として2分割光センサ14の下部に照射
されるようになる。このため、下側の受光部16bの出
力は上側の受光部16aの出力よりも大きくなって差動
信号は正となる。したがって、上記2分割光センサ14
の差動信号の正負によって出射点の移動状態を検知する
ことができるのである。
However, when the emission point moves toward point A, the objective lens 10
Since the light beam that exits becomes a diverging light, the position (beam waist) at which the upper half of the light flux that is not blocked by the knife beam 12 is focused by the condenser lens 22 is farther than the position of the two-split optical sensor 14, and the light beam is mainly divided into two parts. The upper part of the optical sensor 14 is now illuminated. Therefore, the output of the upper light receiving section 16a becomes larger than the output of the lower light receiving section 16b, and the differential signal becomes negative. Conversely, when the emission point moves toward the 0 point side, the light beam exiting the objective lens 10 becomes a convergent light, so that the light beam is focused by the condenser lens 22 in front of the two-split optical sensor 14, and is mainly divided into two. The lower part of the optical sensor 14 is now illuminated. Therefore, the output of the lower light receiving section 16b becomes larger than the output of the upper light receiving section 16a, and the differential signal becomes positive. Therefore, the two-split optical sensor 14
The moving state of the emission point can be detected based on the positive and negative states of the differential signals.

ナイフェツジ法は、このように光の収束発散状態の変化
から光の出射位置を検出する方法であり、第3図はこの
ナイフェツジ法を利用して表面の凹凸を測定する装置の
一例を示す骨子図である。かかる第3図において、レー
ザ発振器18から出射された直線偏光レーザ光りは、光
軸上に配置されたビームエキスパンダ20によりビーム
径が拡大されて円形平行光とされた後、偏光ビームスプ
リッタ24に入射させられる。レーザ発振器18の姿勢
は、レーザ光りの偏波面(電気ヘクトルの振動面)が紙
面と直角となるように設定されており、入射面が紙面と
平行になるように配置された偏光ビームスプリッタ24
によりレーザ光りは下方へ反射される。反射されたレー
ザ光りは、X波長板26を通過したあと前記対物レンズ
lOによって被測定物28の表面30に照射される。
The Naifetsu method is a method of detecting the emission position of light from changes in the convergence/divergence state of the light, and Figure 3 is a schematic diagram showing an example of a device that uses the Naifetsu method to measure surface irregularities. It is. In FIG. 3, a linearly polarized laser beam emitted from a laser oscillator 18 is expanded in beam diameter by a beam expander 20 arranged on the optical axis to become a circular parallel beam, and then sent to a polarizing beam splitter 24. It is made incident. The attitude of the laser oscillator 18 is set so that the plane of polarization of the laser beam (the plane of vibration of the electric hector) is perpendicular to the plane of the paper, and the polarizing beam splitter 24 is arranged so that the plane of incidence is parallel to the plane of the paper.
The laser beam is reflected downward. After passing through the X wavelength plate 26, the reflected laser light is irradiated onto the surface 30 of the object to be measured 28 by the objective lens lO.

上記被測定物28は、偏光ビームスプリッタ24によっ
て反射されたレーザ光りの光軸上において、表面30が
対物レンズ10によって集光させられるレーザ光りのビ
ームウェスト(この場合には焦点)と略−敗する位置に
配置されているとともに、駆動装置3,2によ4′てレ
ーザ光りの光軸と直角な平面内を移動させられる移動テ
ーブル34上に載置されている。したがって、レーザ光
りは表面30の微小範囲に照射されることとなり、被測
定物28が移動テーブル34と共に光軸と直角な方向へ
移動させられることにより、その表面30上におけるレ
ーザ光りの反射位置は表面30の凹凸6巳対応じて光軸
方向へ変位させられる。レーザ光りは計測光に相当する
The object to be measured 28 has a surface 30 on the optical axis of the laser beam reflected by the polarizing beam splitter 24, which is approximately the same as the beam waist (in this case, the focal point) of the laser beam focused by the objective lens 10. It is placed on a moving table 34 which is moved in a plane perpendicular to the optical axis of the laser beam by drive devices 3 and 2 4'. Therefore, the laser beam is irradiated onto a minute area of the surface 30, and by moving the object to be measured 28 together with the moving table 34 in a direction perpendicular to the optical axis, the reflection position of the laser beam on the surface 30 is It is displaced in the optical axis direction in accordance with the unevenness of the surface 30. Laser light corresponds to measurement light.

表面30で反射されたレーザ光りは、対物レンズ10を
経てス波長板26を再び通過させられることにより、往
路に比較して偏波面の向きが90゜回転させられ、偏光
ビームスプリッタ24を透過したあとナイフェツジ12
により右半分の光束が遮られる。そして、左半分の光束
となったレーザ光りは、集光レンズ22を通ってその集
光レンズ22の焦点位置にある2分割光センサ14に照
射される。かかる2分割光センサ14の受光部16a、
16bの受光量は、表面30の凹凸によるレーザ光りの
反射位置の変位に伴って、前記第2回に示されている原
理に従って増減させられるため、その受光量に対応する
出力信号Sa、Sbが供給される測定回路36において
は、それ等の信号Sa、Sbの差を求め、その差動信号
の正負の値から例えばデータマツプ等により表面30の
凹凸を求める。
The laser beam reflected by the surface 30 passes through the objective lens 10 and the wavelength plate 26 again, so that the direction of the plane of polarization is rotated by 90 degrees compared to the forward path, and the laser beam is transmitted through the polarizing beam splitter 24. Also Naifetsuji 12
The right half of the light beam is blocked by this. The left half of the laser beam passes through the condenser lens 22 and is irradiated onto the two-split optical sensor 14 located at the focal point of the condenser lens 22. The light receiving section 16a of the two-split optical sensor 14,
The amount of light received by 16b is increased or decreased according to the principle shown in the second part, as the reflection position of the laser beam changes due to the unevenness of the surface 30, so that the output signals Sa and Sb corresponding to the amount of light received are The supplied measuring circuit 36 determines the difference between these signals Sa and Sb, and determines the unevenness of the surface 30 from the positive and negative values of the differential signal using, for example, a data map.

発明が解決しようとする課題 しかしながら、かかる従来の測定方法においては、被測
□宝物を相対移動させる際の振動その他の外乱によりそ
の被測定物が計測光の光軸方向に変位させられると、そ
の変位量を含んで表面粗さが測定されるため、必ずしも
充分な測定精度が得られないという問題があった。
Problems to be Solved by the Invention However, in such conventional measurement methods, if the object to be measured is displaced in the optical axis direction of the measurement light due to vibration or other disturbances when the treasure to be measured is moved relative to the object, the Since the surface roughness is measured including the amount of displacement, there is a problem in that sufficient measurement accuracy cannot always be obtained.

本発明は以上の事情を背景として為されたもので、その
目的とするところは、被測定物の振動等による影響を排
除して測定精度を向上させることにある。
The present invention has been made against the background of the above circumstances, and its purpose is to improve measurement accuracy by eliminating the influence of vibrations of the object to be measured.

課題を解決するための手段 かかる目的を達成するために、本発明の要旨とするとこ
ろは、光軸に対して交差する方向へ相対移動させられる
被測定物の表面にビームウェストが略位置する状態でそ
の表面の微小範囲に計測光を集光させるとともに、その
表面で反射された計測光の収束発散状態の変化を検出す
ることにより、その表面の凹凸による計測光の反射位置
の変位量を測定する方式の光学式表面粗さ測定装置であ
って、(a)光軸が同じで偏波面が互いに直交する2種
類の偏光成分を含む光を出射する光源装置と、(b)前
記2種類の偏光成分をそれぞれ独立に集光し、その2種
類の偏光成分の一方を計測光として、その・ビームウェ
ストが前記被測定物の表面と略一致するようにその表面
の微小範囲に照射するとともに、上記2種類の偏光成分
の他方を参照光として上記被測定物の表面の比較的広い
範囲に照射する対物レンズと、(C)前記表面で反射さ
れ且つ前記対物レンズを通過させられた前記計測光およ
び参照光を分離する偏光ビームスプリッタと、(d)そ
の偏光ビームスプリッタによって分離された前記計測光
を、その光軸と直交する一直線を境として半分を遮光す
るとともに残りの半分を集光することにより、前記表面
における計測光の反射位置の変位に応じてその計測光の
収束発散状態が変化させられるのに伴って、上記光軸と
一直線とを含む平面を境界とする一方の側および他方の
側における計測光の光量をそれぞれ相反的に増減させる
計測用光学素子と、(e)その計測用光学素子により前
記計測光の光量が増減させられる前記境界の両側に跨が
って配設され、゛前記一方の側および他方の側における
その計測光の光量をそれぞれ検出する計測用光センサと
、げ)前記偏光ビームスプリッタによって分離された前
記参照光を、その光軸と直交する一直線を境として半分
を遮光するとともに残りの半分を集光することにより、
前記表面における参照光の反射位置の変位に応じてその
参照光の収束発散状態が変化させられるのに伴って、上
記光軸と一直線とを含む平面を境界とする一方の側およ
び他方の側における参照光の光量をそれぞれ相反的に増
減させる参照用光学素子と、(濁その参照用光学素子に
より前記参照光の光量が増減させられる前記境界の両側
に跨がって配設され、前記−方の側および他方の側にお
けるその参照光の光量をそれぞれ検出する参照用光セン
サと、Ch)前記計測用光センサから出力される計測信
号の差動をとるとともに、前記参照用光センサから出力
される参照信号の差動をとり、それ等の差動信号の差に
基づいて前記表面の凹凸を測定する測定手段とを有する
ことにある。
Means for Solving the Problems In order to achieve the object, the gist of the present invention is to provide a state in which the beam waist is approximately located on the surface of the object to be measured that is relatively moved in a direction intersecting the optical axis. By focusing the measurement light on a minute area of the surface and detecting changes in the convergence/divergence state of the measurement light reflected from the surface, the amount of displacement of the reflection position of the measurement light due to the unevenness of the surface is measured. This is an optical surface roughness measurement device that includes (a) a light source device that emits light containing two types of polarized components whose optical axes are the same and whose polarization planes are orthogonal to each other; and (b) the two types of The polarized light components are each independently focused, and one of the two types of polarized light components is used as measurement light to irradiate a minute range of the surface of the object to be measured so that the beam waist substantially coincides with the surface of the object to be measured, (C) an objective lens that uses the other of the two types of polarized light components as reference light to irradiate a relatively wide range of the surface of the object to be measured; and (C) the measurement light that is reflected on the surface and passed through the objective lens. and a polarizing beam splitter that separates the reference light; (d) blocking half of the measurement light separated by the polarizing beam splitter with a straight line orthogonal to the optical axis as the boundary, and condensing the remaining half; As the convergence/divergence state of the measurement light is changed according to the displacement of the reflection position of the measurement light on the surface, one side and the other side with the plane including the optical axis and the straight line as the boundary are changed. (e) a measurement optical element that reciprocally increases or decreases the amount of measurement light on each side; and (e) disposed across both sides of the boundary where the amount of measurement light is increased or decreased by the measurement optical element;゛A measurement optical sensor that detects the light intensity of the measurement light on the one side and the other side, respectively; By blocking half of the light and concentrating the other half,
As the convergence/divergence state of the reference light is changed according to the displacement of the reflection position of the reference light on the surface, on one side and the other side bounded by a plane containing the optical axis and a straight line. a reference optical element that reciprocally increases or decreases the light intensity of the reference light; Ch) a reference optical sensor that detects the light intensity of the reference light on one side and the other side, respectively; and Ch) a differential measurement signal output from the measurement optical sensor, and a and measuring means for measuring the unevenness of the surface based on the difference between the differential signals.

作用 上記光学式表面粗さ測定装置においては、光軸が同じで
偏波面が互いに直交する2種類の偏光成分を含む光が光
源装置から出射され、対物レンズによって、上記2種類
の偏光成分の一方が計測光として被測定物の表面の微小
範囲に集光させられるとともに、2種類の偏光成分の他
方が参照光として被測定物の表面の比較的広い範囲に集
光させられる。そして、その表面で反射された計測光お
よび参照光は、上記対物レンズを通過させられたあと偏
光ビームスプリッタによって分離され、それぞれ計測用
光学素子および参照用光学素子に入射させられる。
In the above-mentioned optical surface roughness measuring device, light containing two types of polarized light components having the same optical axis and mutually orthogonal polarization planes is emitted from the light source device, and one of the two types of polarized light components is detected by the objective lens. is focused as measurement light on a small area on the surface of the object to be measured, and the other of the two types of polarized light components is focused as reference light on a relatively wide area on the surface of the object to be measured. The measurement light and reference light reflected by the surface are passed through the objective lens, separated by a polarizing beam splitter, and made incident on a measurement optical element and a reference optical element, respectively.

計測用光学素子に入射して半分が遮光されるとともに残
りの半分が集光させられる計測光は、被測定物の表面に
おける反射位置の変位に応じて収束発散状態が変化させ
られるのに伴って、その光軸と上記遮光の境界線とを含
む平面を境界とする一方の側および他方の側において相
反的にその光量が増減させられるとともに、計測用光セ
ンサによってその双方の側における光量がそれぞれ検出
される。また、参照用光学素子に入射して半分が遮光さ
れるとともに残りの半分が集光させられる参照光は、被
測定物の表面における反射位置の変位に応じて収束発散
状態が変化させられるのに伴って、その光軸と上記遮光
の境界線とを含む平面を境界とする一方の側および他方
の側において相反的にその光量が増減させられるととも
に、参照用光センサによってその双方の側における光量
がそれぞれ検出される。そして、測定手段により計測用
光センサおよび参照用光センサから出力される信号の差
動をそれぞれとるとともに、それ等の差動信号の差から
被測定物の表面の凹凸が測定される。
When the measurement light enters the measurement optical element, half of it is blocked and the other half is focused, and the convergence/divergence state changes according to the displacement of the reflection position on the surface of the object to be measured. , the amount of light is reciprocally increased or decreased on one side and the other side of the plane that includes the optical axis and the boundary line of the above-mentioned light shielding, and the amount of light on both sides is increased or decreased by the measuring optical sensor, respectively. Detected. Furthermore, when the reference light enters the reference optical element, half of it is blocked and the other half is focused, the state of convergence and divergence changes depending on the displacement of the reflection position on the surface of the object to be measured. Accordingly, the amount of light is reciprocally increased or decreased on one side and the other side of the plane containing the optical axis and the boundary line of the light shielding, and the amount of light on both sides is increased or decreased by the reference optical sensor. are detected respectively. Then, the measurement means calculates the difference between the signals output from the measurement optical sensor and the reference optical sensor, and the unevenness of the surface of the object to be measured is measured from the difference between these differential signals.

このとき、参照用光センサから出力される参照信号の差
動は、参照光が照射された部分の変位量り、lに相当す
るが、参照光が被測定物の表面の比較的広い範囲に照射
されることにより表面の凹凸による影響が平均化される
ため、その変位量DRは、振動等による被測定物全体の
変位量d“に対応する。また、計測用光センサから出力
される計測信号の差動は、計測光が照射された部分の変
位量り、に相当するが、計測光が被測定物の表面の微小
範囲に照射されることから、その変位量DMは、上記被
測定物全体の変位量d゛と表面の凹凸による変位ldと
を合わせた変位量(d+d’)に対応する。したがって
、それ等の差動信号の差、すなわち変位量D*(−a’
)と変位量D0 (−d+d’)との差は、被測定物の
表面の凹凸のみによる変位量dに相当し、振動等の外乱
による影響が相殺されて表面の凹凸が高い精度で測定さ
れる。
At this time, the difference in the reference signals output from the reference optical sensor corresponds to the displacement of the part irradiated with the reference light, l, but the reference light irradiates a relatively wide range of the surface of the object to be measured. Since the influence of surface irregularities is averaged by this, the amount of displacement DR corresponds to the amount of displacement d'' of the entire measured object due to vibration etc. Also, the measurement signal output from the measurement optical sensor The differential corresponds to the displacement of the part irradiated with the measurement light, but since the measurement light is irradiated to a minute range on the surface of the object to be measured, the displacement DM is equivalent to the displacement of the part irradiated with the measurement light. corresponds to the displacement amount (d+d') which is the sum of the displacement amount d'' of
) and the displacement amount D0 (-d+d') corresponds to the displacement amount d due only to the unevenness of the surface of the object to be measured, and the influence of external disturbances such as vibrations is canceled out, and the surface unevenness can be measured with high accuracy. Ru.

なお、上記変位量り、1.Dイは必ずしも長さ寸法とし
て求められる必要はなく、差動信号の差から最終的に表
面の凹凸が長さ寸法として求められるようになっておれ
ば良く、計測光および参照光によるそれぞれの差動信号
の何れか一方が零となるように対物レンズと被測定物と
を光軸方向へ相対移動させて、他方の差動信号から直接
表面の凹凸を求めるようにすることもできる。
In addition, the above displacement scale, 1. D does not necessarily need to be determined as a length dimension; it is sufficient that the surface unevenness can be finally determined as a length dimension from the difference in the differential signal, and the difference between the measurement beam and the reference beam can be determined as a length dimension. It is also possible to move the objective lens and the object to be measured relative to each other in the optical axis direction so that one of the dynamic signals becomes zero, and to directly determine the surface unevenness from the other differential signal.

発明の効果 このように、本発明の光学式表面粗さ測定装置によれば
、計測光による表面粗さ測定とは別に、被測定物表面の
比較的広い範囲に照射された参照光により被測定物表面
全体の変位量が求められ、この参照光によって測定され
た変位量と計測光によって求められた変位量との差に基
づいて表面の凹凸が測定されることにより、振動等の外
乱による影響が相殺されて被測定物の表面の凹凸が高い
精度で測定されるのである。
Effects of the Invention As described above, according to the optical surface roughness measuring device of the present invention, in addition to surface roughness measurement using the measurement light, the surface roughness of the object to be measured is measured using the reference light irradiated over a relatively wide range of the surface of the object to be measured. The amount of displacement of the entire object surface is determined, and the unevenness of the surface is measured based on the difference between the amount of displacement measured by this reference light and the amount of displacement determined by the measurement light, thereby eliminating the influence of disturbances such as vibration. are canceled out, and the unevenness on the surface of the object to be measured can be measured with high accuracy.

また、本発明によれば、被測定物の表面における反射位
置の変位によって光量が相反的に増減させられる境界の
両側においてその光量を検出するとともに、それ等の差
動をとるようになっているため、光源装置の出力変動等
に起因するノイズが除去される利点がある。
Further, according to the present invention, the amount of light is detected on both sides of the boundary where the amount of light is reciprocally increased or decreased depending on the displacement of the reflection position on the surface of the object to be measured, and the difference between the two is taken. Therefore, there is an advantage that noise caused by output fluctuations of the light source device, etc. can be removed.

実施例 以下、本発明の一実施例を図面に基づいて詳細に説明す
る。なお、以下の実施例において前記第3図の従来例と
共通する部分には同一の符号を付して詳しい説明を省略
する。
EXAMPLE Hereinafter, an example of the present invention will be described in detail based on the drawings. In the following embodiments, parts common to those of the conventional example shown in FIG. 3 are given the same reference numerals and detailed explanations will be omitted.

第1図において、レーザ発振器18の姿勢はレーザ光り
の偏波面が紙面に対して45°傾斜するように設定され
ており、このレーザ発振器18から出射されたレーザ光
りは、ビームエキスパンダ20によりビーム径が拡大さ
れて円形平行光とされた後、無偏光ビームスプリッタ4
0によって下方へ反射され、二重焦点レンズ42に入射
させられる。二重焦点レンズ42は、光学ガラスと複屈
折性材料とを含んで構成されており、入射する光線の偏
波面の方向によって屈折率が異なる特性を備えている。
In FIG. 1, the attitude of the laser oscillator 18 is set so that the plane of polarization of the laser beam is inclined at 45 degrees with respect to the plane of the drawing, and the laser beam emitted from the laser oscillator 18 is converted into a beam by a beam expander 20. After the diameter is expanded and the beam is made into a circular parallel beam, the non-polarizing beam splitter 4
0 and is reflected downward by the beam, and is incident on the bifocal lens 42 . The bifocal lens 42 includes optical glass and a birefringent material, and has a characteristic that the refractive index varies depending on the direction of the polarization plane of the incident light beam.

具体的には、レーザ光りのうち偏波面が紙面と平行なP
偏光成分のレーザ光LPについては、前記被測定物28
の表面30上にビームウェストが略位置して表面30の
微小範囲に照射されるように集光する一方、偏波面が紙
面に直角なSa光成分のレーザ光L8につい・では、ビ
ームウェストが表面30よりも下方となって表面30の
比較的広い範囲に照射されるように集光するようになっ
ている。
Specifically, P of the laser light whose polarization plane is parallel to the plane of the paper
Regarding the polarized laser beam LP, the object to be measured 28
The beam waist is located approximately on the surface 30 and is focused so as to irradiate a minute area on the surface 30. On the other hand, for the laser beam L8 of the Sa light component whose polarization plane is perpendicular to the plane of the paper, the beam waist is located on the surface 30. The light is focused below the surface 30 so that a relatively wide range of the surface 30 is irradiated.

本実施例においては、上記レーザ発振器18゜ビームエ
キスパンダ20.および無偏光ビームスプリッタ40に
よって光源装置44が構成されており、二重焦点レンズ
42は対物レンズに相当する。また、レーザ光り、、L
’、はそれぞれ計測光。
In this embodiment, the laser oscillator 18° beam expander 20. A light source device 44 is constituted by the non-polarizing beam splitter 40, and the bifocal lens 42 corresponds to an objective lens. Also, laser light, L
', respectively, are measurement lights.

参照光に相当する。Corresponds to the reference light.

上記レーザ光LPは表面30の微小範囲に照射されるこ
とから、被測定物28が移動テーブル34と共に光軸j
と直角な方向へ移動させられることにより、その反射位
置が表面30の凹凸に応じて光軸j方向へ変位させられ
るとともに、移動テーブル34の振動などにより被測定
物28が上下に移動した場合にも反射位置は光軸j方向
へ変位する。一方、レーザ光り、は表面30の比較的広
い範囲に照射されることから、被測定物28の上下移動
に応じてその反射位置は変位させられるものの、表面3
0の凹凸による影響は平均化されて反射位置の変位には
殆ど影響しない。すなわち、レーザ光LPの表面30に
おける反射位置の変位量DHは、その表面30の凹凸に
よる変位量dと被測定物28全体の振動等による変位量
d“とを合わせた変位量(d+d”)となり、レーザl
Since the laser beam LP is irradiated onto a minute range of the surface 30, the object to be measured 28 along with the moving table 34 is aligned with the optical axis j.
By moving the object 28 in the direction perpendicular to the surface 30, the reflection position is displaced in the direction of the optical axis j according to the unevenness of the surface 30. Also, the reflection position is displaced in the direction of the optical axis j. On the other hand, since the laser beam is irradiated over a relatively wide range of the surface 30, its reflection position is displaced as the object to be measured 28 moves up and down.
The influence of the unevenness of 0 is averaged out and has almost no effect on the displacement of the reflection position. In other words, the displacement DH of the reflection position of the laser beam LP on the surface 30 is the sum of the displacement d due to the unevenness of the surface 30 and the displacement d" due to vibration of the entire object to be measured 28 (d+d"). Therefore, the laser l
.

の表面30における反射位置の変位量Dmは、振動等に
よる被測定物28全体の変位量d゛となるのである。
The amount of displacement Dm of the reflection position on the surface 30 becomes the amount of displacement d' of the entire object to be measured 28 due to vibration or the like.

表面30で反射されたレーザ光LPおよびり。Laser beams LP and RI reflected by surface 30.

は、二重焦点レンズ42を逆に通過して無偏光ビームス
プリッタ40を透過させられ、偏光ビームスプリッタ4
6に入射させられる。偏光ビームスプリッタ46の入射
面は紙面と平行で、偏波面が紙面と平行なレーザ光LP
はその偏光ビームスプリッタ46を透過させられる一方
、偏波面が紙面と直角なレーザ光り、はその偏光ビーム
スプリッタ46により右方へ反射される。そして、偏光
ビームスプリッタ46を透過したレーザ光LFは、前記
ナイフェツジ12により第1図における光軸jの右半分
が遮光されることにより左半分の光束が前記集光レンズ
22によって集光され、2分割光センサ14に入射させ
られる。なお、集光レンズ22と2分割光センサ14と
の距離は、集光レンズ22の焦点距離に一致させられて
いる。
is passed through the bifocal lens 42 in reverse and transmitted through the non-polarizing beam splitter 40, and is then transmitted through the polarizing beam splitter 4.
6. The plane of incidence of the polarizing beam splitter 46 is parallel to the plane of the paper, and the plane of polarization is parallel to the plane of the paper.
is transmitted through the polarizing beam splitter 46, while laser light whose plane of polarization is perpendicular to the paper plane is reflected to the right by the polarizing beam splitter 46. The laser beam LF transmitted through the polarizing beam splitter 46 is blocked by the knife 12 on the right half of the optical axis j in FIG. The light is made incident on the split light sensor 14. Note that the distance between the condenser lens 22 and the two-split optical sensor 14 is made to match the focal length of the condenser lens 22.

2分割光センサ14は、ナイフェツジ12の工ッジライ
ンである一直線とレーザ光り、の光軸とを含む平面を境
界とする一方側および他方側、すなわち第1図における
光軸jを境とする左側および右側の両方に跨がって配設
されており、その双方の側におけるレーザ光り、の光量
をそれぞれ検出する一対の受光部16a、16bを備え
ている。
The two-split optical sensor 14 is arranged on one side bounded by a plane including a straight line that is the cutting line of the knife 12 and the optical axis of the laser beam, and on the other side, that is, on the left side bounded by the optical axis j in FIG. It is provided with a pair of light receiving sections 16a and 16b that are disposed straddling both right sides and detect the amount of laser light on both sides, respectively.

集光レンズ22に入射する前のレーザ光り、が平行光で
あり、集光レンズ22によりレーザ光り。
The laser beam before entering the condensing lens 22 is parallel light, and the condensing lens 22 converts the laser beam into parallel light.

が2分割光センサ14の中心位置に集光させられるとき
には、その受光部16a、16bのそれぞれの受光量の
検出出力が略等しくなるように調整されている。上記ナ
イフェツジ12および集光レンズ22は計測用光学素子
に相当し、2分割光センサ14は計測用光センサに相当
する。
When the light is focused on the center position of the two-split optical sensor 14, the detection outputs of the amounts of light received by the light receiving sections 16a and 16b are adjusted to be approximately equal. The knife 12 and the condensing lens 22 correspond to a measuring optical element, and the two-split optical sensor 14 corresponds to a measuring optical sensor.

ここで、表面30の凸状に変位した微小範囲部分で反射
されたレーザ光り、は、二重焦点レンズ42を通過した
後に発散状態となり、集光レンズ22によって集光させ
られる集光位置が2分割光センサ14の位置よりも遠く
なるため、主として光軸jの左側に照射されて、受光部
16aの検出出力Saは大きくなる一方、受光部16b
の検出出力sbは小さくなる。このときの受光量の差は
、上記表面30上の凸形状による上方への変位量に対応
じている。逆に、表面30の凹状に変位した微小範囲部
分で反射されたレーザ光LPは、二重焦点レンズ42を
通過した後に収束状態となり、集光レンズ22によって
集光させられる集光位置が2分割光センサ14の位置よ
りも近くなるため、主として光軸jの右側に照射されて
、受光部16aの検出出力Saは小さくなる一方、受光
部16bの検出出力sbは大きくなる。このときの受光
量の差は、上記表面30上の凹形状による下方への変位
量に対応じている。
Here, the laser light reflected by the convexly displaced micro-range portion of the surface 30 becomes a divergent state after passing through the bifocal lens 42, and the condensing position where the light is condensed by the condensing lens 22 is 2. Since the position is farther than the split light sensor 14, the irradiation is mainly on the left side of the optical axis j, and the detection output Sa of the light receiving section 16a becomes large, while the detection output Sa of the light receiving section 16b increases.
The detection output sb of becomes small. The difference in the amount of light received at this time corresponds to the amount of upward displacement due to the convex shape on the surface 30. On the contrary, the laser beam LP reflected by the concavely displaced minute range of the surface 30 becomes convergent after passing through the bifocal lens 42, and the condensing position where the condensing lens 22 condenses the light is divided into two. Since the light is closer to the position of the optical sensor 14, it is mainly irradiated to the right side of the optical axis j, and the detection output Sa of the light receiving section 16a becomes small, while the detection output sb of the light receiving section 16b becomes large. The difference in the amount of light received at this time corresponds to the amount of downward displacement due to the concave shape on the surface 30.

一方、偏光ビームスプリッタ46によって反射されたレ
ーザ光り、は、前記ナイフェツジ1.2と同様のナイフ
ェツジ48により第1図における光軸にの下半分が遮光
されることにより、上半分の光束が前記集光レンズ22
と同様の集光レンズ58によって集光され、2分割光セ
ンサ50に入射させられる。なお、集光レンズ58と2
分割光センサ50との距離は、集光レンズ58の焦点距
離に一致させられている。
On the other hand, the lower half of the laser beam reflected by the polarizing beam splitter 46 on the optical axis in FIG. 1 is blocked by a knife 48 similar to the knife 1.2, so that the upper half of the beam is optical lens 22
The light is focused by a condensing lens 58 similar to the above, and is made incident on the two-split optical sensor 50. Note that the condenser lenses 58 and 2
The distance to the split light sensor 50 is made to match the focal length of the condensing lens 58.

2分割光センサ50は、ナイフェツジ48のエンシライ
ンである一直線とレーザ光り、の光軸とを含む平面を境
界とする一方側および他方側、すなわち第1図における
光軸kを境とする上側および下側の両方に跨がって配設
されており、その双方の側におけるレーザ光LSの光量
をそれぞれ検出する一対の受光部52a、52bを備え
ている。
The two-split optical sensor 50 is arranged on one side and the other side bounded by a plane including a straight line that is the enshiline of the knife 48 and the optical axis of the laser beam, that is, the upper and lower sides bounded by the optical axis k in FIG. A pair of light receiving sections 52a and 52b are disposed across both sides, and each detects the amount of laser light LS on both sides.

このレーザ光LSは二重焦点レンズ42によるビームウ
ェストが表面30よりも下方に位置しているため、その
表面30で反射されて二重焦点レンズ42を逆方向に通
過した光は発散光となって光軸にの上側および下側にお
ける受光量に差を生じるため、上記受光部52a、52
bには予めこの光量差に対応するバイアスがかけられて
おり、前記レーザ光り、のビームウェストが表面3oと
略一致させられた状態において、それらの検出出力の差
が零になるように設定されている。上記ナイフェツジ4
8および集光レンズ58は参照用光学素子に相当し、2
分割光センサ50は参照用光センサに相当する。
Since the beam waist of this laser beam LS due to the bifocal lens 42 is located below the surface 30, the light reflected from the surface 30 and passing through the bifocal lens 42 in the opposite direction becomes diverging light. Since there is a difference in the amount of light received above and below the optical axis, the light receiving sections 52a and 52
A bias corresponding to this difference in light amount is applied in advance to b, and is set so that the difference in the detection outputs thereof becomes zero when the beam waist of the laser beam is approximately aligned with the surface 3o. ing. The above Naifetsuji 4
8 and the condenser lens 58 correspond to reference optical elements, and 2
The divided optical sensor 50 corresponds to a reference optical sensor.

ここで、表面30が全体的Qこ上方向に変位した際にそ
の表面30の比較的広い範囲で反射されたレーザ光り、
は、その発散状態が上記変位に対応じて拡大され、集光
レンズ58によって集光させられる集光位置(ビームウ
ェスト)がそれ以前よりも遠くなるため、光軸にの上側
における照射量と下側における照射量との差がそれ以前
よりも大きくなる。このとき2分割光センサ50の受光
部52aおよび52bによって検出される受光量の差の
増加分は、上記表面30全体の上方への変位量に対応じ
ている。逆に、表面30が全体的に下方向に変位した際
にその表面30の比較的広い範囲で反射されたレーザ光
り、は、その発散状態が上記変位に対応じて縮小され、
集光レンズ58によって集光させられる集光位置がそれ
以前よりも近くなるため、光軸にの上側における照射量
と下側における照射量との差がそれ以前よりも小さくな
る。このとき受光部52aおよび52bによって検出さ
れる受光量の差の減少分は、上記表面30全体の下方へ
の変位量に対応じている。
Here, when the surface 30 is displaced in the overall Q direction, the laser light reflected in a relatively wide range of the surface 30,
The divergence state is expanded in accordance with the above displacement, and the condensing position (beam waist) where the condensed light is condensed by the condensing lens 58 becomes farther than before, so the irradiation amount on the upper side of the optical axis and the lower The difference between the radiation dose on the side becomes larger than before. At this time, the increase in the difference in the amount of light received by the light receiving sections 52a and 52b of the two-split optical sensor 50 corresponds to the amount of upward displacement of the entire surface 30. Conversely, when the surface 30 is entirely displaced downward, the divergence state of the laser light reflected from a relatively wide range of the surface 30 is reduced in accordance with the displacement,
Since the condensing position where the light is condensed by the condenser lens 58 is closer than before, the difference between the irradiation amount above and below the optical axis becomes smaller than before. At this time, the decrease in the difference in the amount of light received by the light receiving sections 52a and 52b corresponds to the amount of downward displacement of the entire surface 30.

そして、前記2分割光センサ14の受光部16a、16
bからそれぞれ出力される計測信号Sa。
The light receiving portions 16a, 16 of the two-split optical sensor 14
Measurement signals Sa respectively output from b.

sb、および上記2分割光センサ50の受光部52a、
52bからそれぞれ出力される参照信号SRa、SRb
が、測定回路54に供給される。測定回路54は、例え
ばマイクロコンピュータをmえて構成され、予め定めら
れたプログラムに従って信号処理を行うことにより、計
測信号Sa、Sbの差動をとるとともに参照信号SRa
、SRbの差動をとり1.それ等の差動信号eとReと
の差から、予め記憶されたデータマツプや演算式等によ
り表面30の凹凸を求める。このデータマツプや演算式
は、レーザ光LP、LSの反射位置と差動信qe、Re
との関係を実験等により求めて定められる。この測定回
路54は測定手段に相当する。
sb, and the light receiving part 52a of the two-split optical sensor 50,
Reference signals SRa and SRb respectively output from 52b
is supplied to the measurement circuit 54. The measurement circuit 54 is configured with a microcomputer, for example, and performs signal processing according to a predetermined program to calculate the difference between the measurement signals Sa and Sb and also generates a reference signal SRa.
, take the differential of SRb and 1. From the difference between the differential signals e and Re, the unevenness of the surface 30 is determined using a data map or an arithmetic expression stored in advance. This data map and calculation formula are based on the reflection positions of the laser beams LP and LS and the differential signals qe and Re.
It is determined by determining the relationship between This measuring circuit 54 corresponds to measuring means.

ここで、上記計測信号Saとsbとの差動信号eは前記
変位量DHすなわち被測定物28全体の振動等による変
位量d゛と表面30の凹凸による変位量dとを合わせた
変位量(d+d”)に対応し、参照信号SRaとSRb
との差動信号Reは前記変位量り、lすなわち被測定物
28全体の振動等による変位量d’に対応するため、そ
れ等の差動信号eとReとの差は、被測定物28の表面
30の凹凸のみによる変位量dに対応し、振動等の外乱
による影響が相殺されて表面30の凹凸が高い精度で測
定される。
Here, the differential signal e between the measurement signals Sa and sb is the displacement amount DH, that is, the displacement amount ( d+d''), and the reference signals SRa and SRb
Since the differential signal Re between the two corresponds to the displacement d' due to the vibration of the displacement measure l, that is, the entire object to be measured 28, the difference between the differential signals e and Re corresponds to the displacement amount d' of the object to be measured 28. Corresponding to the amount of displacement d due only to the unevenness of the surface 30, the influence of external disturbances such as vibrations is canceled out, and the unevenness of the surface 30 can be measured with high accuracy.

また、本実施例の測定装置では2分割光センサ14.5
0が用いられ、表面30で反射されたレーザ光LP 、
’ Lsがナイフェツジ12.48により光束の半分が
遮光されるとともに集光レンズ22.58により集光さ
せられる際に、表面30における反射位置の変位に伴っ
てそれぞれ光量が相反的に増減させられる2位置でレー
ザ光り、、L。
In addition, in the measuring device of this embodiment, the two-split optical sensor 14.5
0 is used and the laser beam LP reflected by the surface 30,
' When half of the luminous flux of Ls is blocked by the knife lens 12.48 and condensed by the condensing lens 22.58, the amount of light is reciprocally increased or decreased as the reflection position on the surface 30 changes2. Laser light at position, L.

の光量を受光検出し、それ等の差動をとるようになって
いるため、光源装置44の出力変動等に起因するノイズ
が除去される利点がある。
Since the amount of light received is detected and the difference between them is taken, there is an advantage that noise caused by fluctuations in the output of the light source device 44, etc. can be removed.

以上、本発明の一実施例を図面に基づいて詳細に説明し
たが、本発明は他の態様で実施することもできる。
Although one embodiment of the present invention has been described above in detail based on the drawings, the present invention can also be implemented in other embodiments.

例えば、前記実施例ではレーザ光LP、LXをそれぞれ
1つの2分割光センサ14,50で受光しているが、そ
れ等のレーザ光り、、”L、をそれぞれビームスプリッ
タで2分割し、それぞれ2つの2分割光センサを用いて
受光することにより、回折光や被測定物28の傾きの影
響を除去することも可能である。
For example, in the embodiment described above, each of the laser beams LP and LX is received by one two-split optical sensor 14, 50, but each of these laser beams, ``L'', is divided into two by a beam splitter. By receiving light using two two-split optical sensors, it is also possible to eliminate the effects of diffracted light and the inclination of the object to be measured 28.

また、前記実施例では差動信号eとReとの差から凹凸
を測定するようになっているが、例えば二重焦点レンズ
42と被測定物28とを相対的に上下方向へ接近離間さ
せる駆動装置を設け、上記差動信号eおよびReの何れ
か一方が零となるように上記駆動装置をフィードバック
制御して、他方の差動信号Reまたはeのみから表面3
0の凹凸を求めるようにすることもできる。
Further, in the embodiment described above, the unevenness is measured from the difference between the differential signals e and Re, but for example, the bifocal lens 42 and the object to be measured 28 are driven to move relatively closer to each other in the vertical direction. A device is provided, and the driving device is feedback-controlled so that one of the differential signals e and Re becomes zero, and the surface 3 is controlled only from the other differential signal Re or e.
It is also possible to determine the unevenness of 0.

また、差動信号eの変化が零となるように集光レンズ2
2と2分割光センサ14とを光軸j方向へ相対移動させ
るとともに、差動信号Reの変化が零となるように集光
レンズ58と2分割光センサ50とを光軸に方向へ相対
移動させ、それらの移動量の差に基づいて表面30の凹
凸を測定することも可能である。
Also, the condenser lens 2 is adjusted so that the change in the differential signal e becomes zero.
2 and the 2-split photosensor 14 relative to each other in the direction of the optical axis j, and the condensing lens 58 and the 2-segment photosensor 50 to be moved relatively in the direction of the optical axis so that the change in the differential signal Re becomes zero. It is also possible to measure the unevenness of the surface 30 based on the difference in the amount of movement thereof.

また、前記実施例ではレーザ光り、が常に発散光の状態
で集光レンズ58に入射させられるとともに、集光レン
ズ58と2分割光センサ5oとの距離が集光レンズ58
の焦点距離に一致させられていたが、レーザ光り、のビ
ームウェストが表面30と略一致している状態において
、集光レンズ58により集光させられるレーザ光り、の
集光位置(ビームウェスト)と略一致する位置に2分割
光センサ50を配設したり、或いは、集光レンズ58に
入射させられる前のレーザ光り、を平行光とするために
、偏光ビームスプリッタ46と集光レンズS8との間に
他の集光レンズを配設したりしてもよく、これらの場合
には、2分割光センサ50の受光部52aおよび52b
に予め所定のバイアスをかける必要がなくなる。
Further, in the embodiment described above, the laser beam is always incident on the condenser lens 58 in a diverging state, and the distance between the condenser lens 58 and the two-split optical sensor 5o is
However, in a state where the beam waist of the laser beam substantially coincides with the surface 30, the focal length (beam waist) of the laser beam condensed by the condenser lens 58 and In order to dispose the two-split optical sensor 50 at substantially coincident positions, or to make the laser beam before entering the condensing lens 58 into parallel light, the polarization beam splitter 46 and the condensing lens S8 can be Another condensing lens may be arranged between them, and in these cases, the light receiving parts 52a and 52b of the two-split optical sensor 50
There is no need to apply a predetermined bias to the .

また、前記実施例ではビームエキスパンダ2゜を出て横
断面が円形の平行光とされたレーザ光りが二重焦点レン
ズ42に入射させられるようになっているが、収束光若
しくは発散光の状態でレーザ光りを二重焦点レンズ42
に入射させるようにしても良い。その場合には、表面3
0で反射されたレーザ光り、、L、が平行光となるよう
に偏光ビームスプリッタ46と集光レンズ22.58と
の間に他のレンズを設けたり、集光レンズ22゜58に
よる集光位置に2分割光センサ14.50を配置したり
するなどすれば良い。
Further, in the embodiment described above, the laser beam that exits the beam expander 2° and becomes a parallel beam with a circular cross section is made incident on the bifocal lens 42, but the laser beam is in the form of convergent light or diverging light. The bifocal lens 42 illuminates the laser beam with
It is also possible to make the light incident on . In that case, surface 3
Another lens may be provided between the polarizing beam splitter 46 and the condenser lens 22.58 so that the laser light reflected by the condenser lens 22. For example, a two-split optical sensor 14.50 may be placed in the area.

また、前記実施例では対物レンズとして二重焦点レンズ
42が用いられているが、偏波面の向きに応じて屈折作
用を為す複数のレンズを組み合わせて用いることもでき
る。
Further, although the bifocal lens 42 is used as the objective lens in the above embodiment, a combination of a plurality of lenses that perform a refractive action depending on the direction of the plane of polarization can also be used.

また、焦点距離が異なる複数の二重焦点レンズを回転式
のレボルバ等に取り付け、二重焦点レンズを交換するこ
とによって測定倍率を変化させたり、二重焦点レンズと
被測定物28との間に別の対物レンズを入れてそれ等の
組合せにより表面30上に大小のスポットを形成したり
、レーザ発振器18と無偏光ビームスプリッタ40との
間に光アイソレータを入れたりすることもできる。
In addition, by attaching multiple bifocal lenses with different focal lengths to a rotary revolver, etc., and changing the measurement magnification by replacing the bifocal lenses, it is possible to It is also possible to insert another objective lens and use a combination thereof to form large and small spots on the surface 30, or to insert an optical isolator between the laser oscillator 18 and the non-polarizing beam splitter 40.

また、前記実施例においては、測定用光学素子および参
照用光学素子としてナイフェツジ12と集光レンズ22
、およびナイフェツジ48と集光レンズ58が用いられ
ていたが、凹面鏡などの他の光学部品を利用して測定用
光学素子や参照用光学素子を構成することもできる。
Further, in the embodiment, the knife 12 and the condenser lens 22 are used as the measuring optical element and the reference optical element.
, a knife 48, and a condenser lens 58 are used, but other optical components such as a concave mirror can also be used to configure the measuring optical element and the reference optical element.

その他−々例示はしないが、本発明は当業者の知識に基
づいて種々の変更、改良を加えた態様で実施することが
できる。
Although other examples are not provided, the present invention can be implemented with various modifications and improvements based on the knowledge of those skilled in the art.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例である光学式表面粗さ測定装
置の構成を説明する骨子図である。第2図はナイフェツ
ジと集光レンズを用いて光の収束発散状態の変化を検出
する原理を説明する図である。第3図はナイフェツジと
集光レンズを利用した従来の光学式表面粗さ測定装置の
一例を説明する骨子図である。 14:2分割光センサ(計測用光センサ)28:被測定
物    30:表面 42:二重焦点レンズ(対物レンズ) 44:光源装置 46:偏光ビームスプリッタ l[1図 50:2分割光センサ(参照用光センサ)54:測定回
路(測定手段)
FIG. 1 is a schematic diagram illustrating the configuration of an optical surface roughness measuring device that is an embodiment of the present invention. FIG. 2 is a diagram illustrating the principle of detecting changes in the convergence/divergence state of light using a knife and a condenser lens. FIG. 3 is a schematic diagram illustrating an example of a conventional optical surface roughness measuring device using a knife and a condensing lens. 14: 2-split optical sensor (measurement optical sensor) 28: Object to be measured 30: Surface 42: Bifocal lens (objective lens) 44: Light source device 46: Polarizing beam splitter l [1 Figure 50: 2-split optical sensor ( Reference optical sensor) 54: Measuring circuit (measuring means)

Claims (1)

【特許請求の範囲】 光軸に対して交差する方向へ相対移動させられる被測定
物の表面にビームウェストが略位置する状態で該表面の
微小範囲に計測光を集光させるとともに、該表面で反射
された該計測光の収束発散状態の変化を検出することに
より、該表面の凹凸による該計測光の反射位置の変位量
を測定する方式の光学式表面粗さ測定装置であって、 光軸が同じで偏波面が互いに直交する2種類の偏光成分
を含む光を出射する光源装置と、前記2種類の偏光成分
をそれぞれ独立に集光し、該2種類の偏光成分の一方を
計測光として、そのビームウェストが前記被測定物の表
面と略一致するように該表面の微小範囲に照射するとと
もに、該2種類の偏光成分の他方を参照光として該被測
定物の表面の比較的広い範囲に照射する対物レンズと、 前記表面で反射され且つ前記対物レンズを通過させられ
た前記計測光および参照光を分離する偏光ビームスプリ
ッタと、 該偏光ビームスプリッタによって分離された前記計測光
を、その光軸と直交する一直線を境として半分を遮光す
るとともに残りの半分を集光することにより、前記表面
における該計測光の反射位置の変位に応じて該計測光の
収束発散状態が変化させられるのに伴って、該光軸と該
一直線とを含む平面を境界とする一方の側および他方の
側における該計測光の光量をそれぞれ相反的に増減させ
る計測用光学素子と、 該計測用光学素子により前記計測光の光量が増減させら
れる前記境界の両側に跨がって配設され、前記一方の側
および他方の側における該計測光の光量をそれぞれ検出
する計測用光センサと、前記偏光ビームスプリッタによ
って分離された前記参照光を、その光軸と直交する一直
線を境として半分を遮光するとともに残りの半分を集光
することにより、前記表面における該参照光の反射位置
の変位に応じて該参照光の収束発散状態が変化させられ
るのに伴って、該光軸と該一直線とを含む平面を境界と
する一方の側および他方の側における該参照光の光量を
それぞれ相反的に増減させる参照用光学素子と、 該参照用光学素子により前記参照光の光量が増減させら
れる前記境界の両側に跨がって配設され、前記一方の側
および他方の側における該参照光の光量をそれぞれ検出
する参照用光センサと、前記計測用光センサから出力さ
れる計測信号の差動をとるとともに、前記参照用光セン
サから出力される参照信号の差動をとり、それ等の差動
信号の差に基づいて前記表面の凹凸を測定する測定手段
と を有することを特徴とする光学式表面粗さ測定装置。
[Claims] The beam waist is approximately located on the surface of the object to be measured, which is relatively moved in a direction intersecting the optical axis, and the measurement light is focused on a minute range of the surface. An optical surface roughness measurement device that measures the amount of displacement of the reflection position of the measurement light due to the unevenness of the surface by detecting a change in the convergence/divergence state of the reflected measurement light, the optical axis a light source device that emits light containing two types of polarized light components whose polarization planes are the same and whose planes of polarization are orthogonal to each other; and a light source device that emits light containing two types of polarized light components whose planes of polarization are the same and whose planes of polarization are orthogonal to each other; , irradiates a minute range of the surface of the object to be measured so that its beam waist substantially coincides with the surface of the object to be measured, and uses the other of the two types of polarized light components as a reference beam to irradiate a relatively wide area of the surface of the object to be measured. a polarizing beam splitter that separates the measurement light and reference light that have been reflected by the surface and passed through the objective lens; By blocking half of the light and condensing the remaining half with a straight line orthogonal to the axis as the boundary, the convergence/divergence state of the measurement light can be changed in accordance with the displacement of the reflection position of the measurement light on the surface. Accordingly, a measurement optical element that reciprocally increases or decreases the amount of the measurement light on one side and the other side of the plane including the optical axis and the straight line; a measurement optical sensor disposed across both sides of the boundary where the amount of measurement light is increased or decreased, and detects the amount of measurement light on one side and the other side, respectively; and the polarization beam splitter. By blocking half of the separated reference light along a straight line orthogonal to the optical axis and condensing the other half, the reference light is adjusted according to the displacement of the reflection position of the reference light on the surface. reference optics that reciprocally increases or decreases the light intensity of the reference light on one side and the other side bounded by a plane including the optical axis and the straight line as the convergence/divergence state of the reference light is changed; a reference element, which is disposed straddling both sides of the boundary where the light intensity of the reference light is increased or decreased by the reference optical element, and detects the light intensity of the reference light on the one side and the other side, respectively. Calculate the difference between the measurement signals output from the measurement optical sensor and the measurement optical sensor, and also calculate the difference between the reference signal output from the reference optical sensor, and based on the difference between these differential signals. an optical surface roughness measuring device, comprising a measuring means for measuring the unevenness of the surface.
JP17777490A 1990-07-05 1990-07-05 Optical surface roughness measuring instrument Pending JPH0465614A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17777490A JPH0465614A (en) 1990-07-05 1990-07-05 Optical surface roughness measuring instrument

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17777490A JPH0465614A (en) 1990-07-05 1990-07-05 Optical surface roughness measuring instrument

Publications (1)

Publication Number Publication Date
JPH0465614A true JPH0465614A (en) 1992-03-02

Family

ID=16036883

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17777490A Pending JPH0465614A (en) 1990-07-05 1990-07-05 Optical surface roughness measuring instrument

Country Status (1)

Country Link
JP (1) JPH0465614A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008309532A (en) * 2007-06-13 2008-12-25 Lasertec Corp Three-dimensional measuring device and inspection device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008309532A (en) * 2007-06-13 2008-12-25 Lasertec Corp Three-dimensional measuring device and inspection device

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