JPH0466120A - Venting method for vacuum vessel - Google Patents

Venting method for vacuum vessel

Info

Publication number
JPH0466120A
JPH0466120A JP17856890A JP17856890A JPH0466120A JP H0466120 A JPH0466120 A JP H0466120A JP 17856890 A JP17856890 A JP 17856890A JP 17856890 A JP17856890 A JP 17856890A JP H0466120 A JPH0466120 A JP H0466120A
Authority
JP
Japan
Prior art keywords
pressure
gas
vacuum container
vacuum
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17856890A
Other languages
Japanese (ja)
Inventor
Kouji Hanakuri
孝次 花栗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP17856890A priority Critical patent/JPH0466120A/en
Publication of JPH0466120A publication Critical patent/JPH0466120A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To make a treatment cycle shorter and improve productivity by adjusting the pressure of gas to a pressure lower than specific pressure when the pressure in a vacuum vessel is low and the flow of gas from a vent pipe into the vessel is non-viscous at the initial stage, and on the other hand adjusting said pressure to a pressure higher than the specific pressure at the latter stage. CONSTITUTION:When gas is introduced via a vent pipe 4 and a vent valve 5 into a vacuum vessel 1 and when the pressure in the vessel 1 is low and the flow of the gas into the vessel is non-viscous, that is, at the initial stage of venting, the pressure of gas on the side of a gas source for the valve 5 is adjusted to a pressure lower than 760Torr, whereas, at the latter stage, that is, when the flow of gas becomes viscous, said pressure is adjusted to a pressure higher than 760Torr. In this manner, degradation of surface quality of articles to be treated due to attachment of dusts can be avoided and cycle of vacuum treatment is made shorter, resulting in improved productivity.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、真空容器のベント方法に関し、詳細には、真
空蒸着、スパッタリング、イオンブレーティング等の処
理(以降、真空処理という)の際に、真空容器内に処理
物体をローディングし、真空容器内を真空にして処理物
体を処理した後、処理物体をアンローディングする前に
、真空容器内に気体を導入して真空容器内の圧力を大気
圧に復元させる真空容器のベントの方法に関する。
Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a method for venting a vacuum container, and more particularly, to a method for venting a vacuum container, and more specifically, for a method for venting a vacuum container. After loading the object to be processed into a vacuum container, evacuating the inside of the vacuum container, and processing the object, before unloading the object, gas is introduced into the vacuum container to increase the pressure inside the vacuum container. This invention relates to a method for venting a vacuum container to restore atmospheric pressure.

(従来の技術〉 バッチ式の真空処理装置により真空処理する際には、第
2図の真空処理サイクルに示す如く、処理物体を装入(
ローディング)し、真空容器内を真空にして真空蒸着等
の真空処理をした後、処理物体を取出しくアンローディ
ング)するため、アンローディングする前に、真空容器
内に気体を導入して真空容器内の圧力を大気圧に復元さ
せる真空容器のベント操作が必要である。
(Prior art) When performing vacuum processing using a batch-type vacuum processing apparatus, as shown in the vacuum processing cycle in Figure 2, the object to be processed is charged (
Loading), evacuate the vacuum container and perform vacuum processing such as vacuum evaporation, and then take out the processed object (unloading). Before unloading, gas is introduced into the vacuum container. It is necessary to vent the vacuum container to restore the pressure to atmospheric pressure.

従来、上記真空容器のベントは、真空容器に管接続され
たベントバルブを開き、真空容器内に大気、あるいは一
定圧力の乾燥N2(窒素)ガス等を導入する方法により
行われる。
Conventionally, venting of the vacuum container is performed by opening a vent valve connected to the vacuum container and introducing atmospheric air or dry N2 (nitrogen) gas at a constant pressure into the vacuum container.

例えば、第3図の真空処理装置に示す如く、真空容器(
1)にベント管(4)により一端か接続され、大気に開
放している管に他端か接続されたベントバルブ(5)を
開にし、真空容器(1)内に大気を導入する方法により
、真空容器のベントか行われる。尚、第3図において、
(2)は排気口バルブ、(3)は真空排気システムを示
すものである。
For example, as shown in the vacuum processing apparatus in Figure 3, a vacuum container (
1) by a vent pipe (4) at one end and a vent valve (5) connected at the other end to a pipe that is open to the atmosphere, by opening the vent valve (5) and introducing the atmosphere into the vacuum container (1). , the vacuum container is vented. In addition, in Figure 3,
(2) shows an exhaust port valve, and (3) shows a vacuum exhaust system.

即ち、真空容器(1)の開口部(図示していない)から
容器(1)内に処理物体をローディングし、ベントバル
ブ(5)を閉じ、排気口バルブ(2)を開いて真空排気
システム(3)を作動させ、真空排気→真空処理の操作
を行う。該処理か終了すると、排気口バルブ(2)を閉
じ、ベントバルブ(5)を開いて大気を導入しベントを
行う。ベント終了後、処理物体をアシロ−ディングして
真空処理サイクルを終了する。
That is, the object to be treated is loaded into the container (1) through the opening (not shown) of the vacuum container (1), the vent valve (5) is closed, the exhaust port valve (2) is opened, and the vacuum exhaust system ( 3), and perform the operation of vacuum evacuation → vacuum treatment. When the process is completed, the exhaust port valve (2) is closed and the vent valve (5) is opened to introduce atmospheric air and perform venting. After venting, the object to be processed is asyloded to complete the vacuum processing cycle.

尚、上記処理中の容器(1)内の圧力は、通常10−’
〜1O−7Torr、大気を導入するベント初期の圧力
差は約760 Torrある。ベント管(4)の内径は
、一般にφ5〜φ10mm程度である。
The pressure inside the container (1) during the above treatment is usually 10-'
~1O-7 Torr, and the pressure difference at the initial stage of venting when atmospheric air is introduced is about 760 Torr. The inner diameter of the vent pipe (4) is generally about φ5 to φ10 mm.

(発明か解決しようとする課題) 気体か導管を通して該気体の圧力より低圧の空間に噴出
するとき、空間の圧力か高い場合には、導管内の流れは
ポアジエユの流れであり、気体分子は熱運動の他に全体
としての集団運動を行い、これか流れとなる。該流れは
、導管の出口より広い空間に放出された後もそのまま持
続するか、周囲の静止している気体との間に働く粘性力
によって次第に流れは減衰し、気体分子の方向分布か前
方で横方向に拡かる流れ(粘性流)になり、そのため流
れは遠方まで届かない。
(Invention or Problem to be Solved) When gas is ejected through a conduit into a space whose pressure is lower than that of the gas, if the pressure of the space is high, the flow within the conduit is a Poisieux flow, and the gas molecules are heated. In addition to exercise, we also perform collective movements as a whole, creating a flow. The flow either continues as it is after being released into a space wider than the outlet of the conduit, or it gradually attenuates due to the viscous force acting between it and the surrounding stationary gas, and the directional distribution of gas molecules changes in front. The flow spreads laterally (viscous flow), so the flow does not reach far.

これに対し、気体を真空中に導入するベントの初期段階
の場合の如く、気体が導管を通して圧力が極めて低い空
間に噴出する場合には、導管内での気体の分子条件が成
立し、気体分子は各々が自由分子となり、空間への噴出
後の減衰が小さいので、上記粘性流に比して気体分子の
方向分布か前方に鋭く絞られる流れ(非粘性流)となり
、そのため流れは遠方にまで到達する。この到達距離は
上記気体の圧力と空間の圧力との差か大きい程、大きく
なる。尚、気体の流れの状態は、粘性流中間領域流1分
子流の3種類に分けられる。非粘性流とは、上記3種類
の中の中間領域流又は/及び分子流の流れ、即ち粘性流
以外の流れ(以降、非粘性流という)を指すものである
。
On the other hand, when gas is ejected through a conduit into a space where the pressure is extremely low, as in the initial stage of venting when gas is introduced into a vacuum, the molecular conditions for the gas within the conduit are established, and the gas molecules Each becomes a free molecule, and the attenuation after being ejected into space is small, so compared to the viscous flow mentioned above, the directional distribution of gas molecules becomes a flow that is sharply constricted forward (inviscid flow), and therefore the flow extends over a long distance. reach. This distance increases as the difference between the pressure of the gas and the pressure of the space increases. Note that the gas flow state is divided into three types: viscous flow, intermediate region flow, and single molecule flow. The inviscid flow refers to an intermediate region flow and/or a molecular flow among the above three types, that is, a flow other than a viscous flow (hereinafter referred to as an inviscid flow).

前記従来の真空容器のベント方法においては、ベントバ
ルブを開いて直接大気、或いは一定圧力の窒素ガス等を
導入しているので、非粘性流となるベント初期には真空
容器内へ導入する気体(大気あるいは窒素ガス等)の圧
力P、(大気圧あるいは窒素ガス圧等)と真空容器内の
圧力P2との差ΔPが760Toor或いはそれ以上と
大きい。故に、ベント管から真空容器内への気体の流れ
が遠方にまで到達し、この到達距離は大きくなる。その
ため、該気体の流れが、処理工程中に発生して容器の底
や壁面に堆積しているダストや異物等を舞上がらせ、そ
れらが処理物体の表面に付着して処理面に悪影響を及ぼ
すという問題点がある。
In the conventional method for venting a vacuum container, the vent valve is opened to directly introduce atmospheric air or nitrogen gas at a constant pressure, so that the gas introduced into the vacuum container ( The difference ΔP between the pressure P (atmospheric pressure, nitrogen gas, etc.) (atmospheric pressure, nitrogen gas pressure, etc.) and the pressure P2 inside the vacuum container is as large as 760 Toor or more. Therefore, the gas flow from the vent pipe into the vacuum container reaches a long distance, and this reaching distance becomes large. Therefore, the flow of gas blows up dust and foreign matter that is generated during the processing process and accumulates on the bottom and walls of the container, and these adhere to the surface of the object to be processed and have a negative impact on the processing surface. There is a problem.

真空容器内への大気あるいは窒素ガス等の導入により真
空容器内の圧力P2が上昇し、ベント管から真空容器内
への気体の流れが粘性流となるベント後期には、上記の
如きダスト等の舞上がりは生じなくなる。しかし、真空
容器内の圧力P、か大気圧に近づくにつれ、圧力差ΔP
が小さくなり、気体の流入量か次第に減少して来るので
、容器内の圧力P2を大気圧まで復元させるのに長時間
を要するという問題点かある。これは、処理サイクルに
長時間を要し、生産性の低下という問題点に繋がる。
In the late stage of venting, when air or nitrogen gas is introduced into the vacuum vessel, the pressure inside the vacuum vessel rises, and the gas flow from the vent pipe into the vacuum vessel becomes a viscous flow. Soaring will no longer occur. However, as the pressure P inside the vacuum container approaches atmospheric pressure, the pressure difference ΔP
becomes small and the amount of gas flowing in gradually decreases, which poses a problem in that it takes a long time to restore the pressure P2 inside the container to atmospheric pressure. This leads to the problem that the processing cycle takes a long time and productivity decreases.

本発明はこの様な事情に着目してなされたものであって
、その目的は従来のものかもつ以上のような問題点を解
消し、ベント初期における真空容器底や壁面のダストや
異物等の舞上がりの程度を減少し、ベント後期における
真空容器内の大気圧への復元時間を短縮し得る真空容器
のベント方法を提供しようとするものである。
The present invention has been made in view of these circumstances, and its purpose is to solve the above-mentioned problems of the conventional ones, and to eliminate dust and foreign matter on the bottom and walls of the vacuum vessel during the initial stage of venting. It is an object of the present invention to provide a method for venting a vacuum container, which can reduce the degree of soaring and shorten the time required for the inside of the vacuum container to return to atmospheric pressure in the latter stage of venting.

(課題を解決するための手段) 上記の目的を達成するために、本発明は次のような構成
の真空容器のベント方法としている。
(Means for Solving the Problems) In order to achieve the above object, the present invention provides a method for venting a vacuum container having the following configuration.

即ち、本発明に係る真空容器のベント方法は、真空容器
内に処理物体をローディングし、真空容器内を真空にし
て処理物体を処理した後、処理物体をアンローディング
する前に、真空容器にベント管及びベントバルブを介し
て管接続された気体供給源より真空容器内に気体を導入
して真空容器内の圧力を大気圧に復元させる真空容器の
ベント方法において、上記ベントバルブの気体供給源側
の気体圧力を、真空容器内の圧力が小さくてベント管か
ら真空容器内への気体の流れか非粘性流となるベント初
期には760Torrより低く調整し、ベント管から真
空容器内への気体の流れが粘性流となるベント後期には
760Torr以上に調整して、前記真空容器内への気
体の導入を行うことを特徴とする真空容器のベント方法
である。
That is, the method for venting a vacuum container according to the present invention involves loading a processing object into a vacuum container, evacuating the inside of the vacuum container, processing the processing object, and then venting the vacuum container before unloading the processing object. In a method for venting a vacuum container, in which the pressure in the vacuum container is restored to atmospheric pressure by introducing gas into the vacuum container from a gas supply source connected via a pipe and a vent valve, the gas supply source side of the vent valve is The gas pressure is adjusted to be lower than 760 Torr at the beginning of venting, when the pressure inside the vacuum vessel is small and the gas flows from the vent pipe into the vacuum vessel or becomes an inviscid flow. This venting method for a vacuum container is characterized in that in the latter stage of venting when the flow becomes a viscous flow, gas is introduced into the vacuum container by adjusting the pressure to 760 Torr or higher.

(作用) 本発明に係る真空容器のベント方法は、以上説明したよ
うに、真空容器にベント管及びベントバルブを介して管
接続された気体供給源より真空容器内に気体を導入する
に際し、真空容器内の圧力が小さくてベント管から真空
容器内への気体の流れか非粘性流となるベント初期には
、上記ベントバルブの気体供給源側の気体圧力を760
Torrより低く調整するようにしているので、真空容
器内へ導入する気体の、圧力P1と真空容器内の圧力P
2との差ΔPか760Toorより低くなる。そのため
、ベント管から真空容器内への気体の流れの到達距離を
小さくし得る。即ち、気体かベントバルブの小さい管径
を通って広い真空容器内に流入しても、通常の粘性流の
場合に似た状態になり、気体分子の方向分布が円形に近
くなり、気体の流れか真空容器の底まて強く吹きつける
ことなく、真空容器内の圧力P2を上昇させ得る。従っ
て、ベント初期における真空容器底や壁面のダストや異
物等の舞上がりの程度を減少し得るようになる。尚、こ
の減少程度は、前記圧力差ΔPを小さくする程、小さ(
し得る。
(Function) As explained above, the method for venting a vacuum container according to the present invention is to At the beginning of venting, when the pressure inside the container is low and the gas flows from the vent pipe into the vacuum container or becomes an inviscid flow, the gas pressure on the gas supply source side of the vent valve is set to 760°C.
Since it is adjusted to be lower than Torr, the pressure P1 of the gas introduced into the vacuum container and the pressure P inside the vacuum container are
The difference ΔP from 2 is lower than 760Toor. Therefore, the distance that gas flows from the vent pipe into the vacuum container can be reduced. In other words, even if gas flows into a wide vacuum vessel through a small pipe diameter of a vent valve, the state will be similar to that of normal viscous flow, and the directional distribution of gas molecules will be close to circular, causing the gas flow to The pressure P2 inside the vacuum container can be increased without strongly blowing to the bottom of the vacuum container. Therefore, it is possible to reduce the extent to which dust, foreign matter, etc., fly up from the bottom or wall of the vacuum container at the initial stage of venting. Note that the degree of this decrease becomes smaller as the pressure difference ΔP is made smaller (
It is possible.

真空容器内の圧力か少し上昇し、例えばl Torr程
度の圧力になると、ベント管から真空容器内への気体の
流れは粘性流となるので、真空容器底のダストや異物等
の舞上がりは生じなくなる。かかる粘性流となるベント
後期には、前記ベントバルブの気体供給源側の気体圧力
を760TOrr以上に調整して、真空容器内への気体
の導入を行うようにしているので、前記従来法の場合に
比し、真空容器内へ導入する気体の圧力PIと真空容器
内の圧力P、との差ΔPを大きくし得、そのため気体の
流入量を大幅に増大し得る。故に、真空容器底や壁面の
ダストや異物等の舞上がりを生じることなく、ベント後
期における真空容器内の大気圧への復元時間を短縮し得
るようになる。その結果、処理サイクルの所要時間の短
縮化、生産性の向上か図れるようになる。
When the pressure inside the vacuum container rises a little, for example to about 1 Torr, the gas flow from the vent pipe into the vacuum container becomes a viscous flow, so dust and foreign matter at the bottom of the vacuum container no longer fly up. . In the latter stage of venting, when such a viscous flow occurs, the gas pressure on the gas supply source side of the vent valve is adjusted to 760 TOrr or more to introduce gas into the vacuum container, so that in the case of the conventional method described above, Compared to this, the difference ΔP between the pressure PI of the gas introduced into the vacuum container and the pressure P inside the vacuum container can be increased, and therefore the amount of gas flowing in can be significantly increased. Therefore, the time required for the inside of the vacuum container to return to atmospheric pressure in the latter stage of venting can be shortened without causing dust or foreign matter on the bottom or wall of the vacuum container to fly up. As a result, the time required for the processing cycle can be shortened and productivity can be improved.

(実施例) 本発明の実施例を、第1図の真空処理装置に基づいて以
下に説明する。
(Example) An example of the present invention will be described below based on the vacuum processing apparatus shown in FIG.

真空容器(1)に排気ロバルプ(2)を介して真空排気
システム(3)を取り付け、又、真空容器(1)の壁に
ベント管(4)を介してベントバルブ(5)を取り付け
ている。ベントバルブ(5)の−次側にはT継手を介し
て2つの真空バルブ(6)(9)を接続し、真空バルブ
(6)の−次側には圧力調節弁(7)を介して圧縮空気
や窒素ガス等の気体供給源(8)(圧カニ 4〜6 k
gf/an 2G)を接続し、真空バルブ(9)の−次
側には真空排気システムα0)を接続する。
A vacuum exhaust system (3) is attached to the vacuum container (1) via an exhaust valve (2), and a vent valve (5) is attached to the wall of the vacuum container (1) via a vent pipe (4). . Two vacuum valves (6) and (9) are connected to the next side of the vent valve (5) via a T-joint, and the next side of the vacuum valve (6) is connected via a pressure control valve (7). Gas supply source (8) such as compressed air or nitrogen gas (pressure crab 4 to 6 k
gf/an 2G) is connected, and a vacuum exhaust system α0) is connected to the negative side of the vacuum valve (9).

圧力測定ゲージとして、真空容器Tl)には760〜1
0−’Torrの圧力を測定する熱線真空計等の高圧力
測定ゲージαD、及び、10−”Torr以下の圧力(
真空度)を測定する電離真空計等の低圧力測定ゲージα
2を接続し、ベントバルブ(5)の−次側T継手部には
760Torr以上の圧力を測定するブルドン管等の高
圧力測定ゲージα3、及び、760−10”Torrの
圧力を測定する熱線真空計等の低圧力測定ゲージ側を接
続する。4つの圧力測定ゲージはそれぞれ電気出力信号
に変換され、該信号を2つづつ組み合わせて3つの減算
器α5αθα力に加え、その出力を3つの比較器08 
Q9)■に加えてそれぞれの設定値と比較し、その出力
を切換器(21)を介して制御器(22)に加え、その
出力で圧力調節弁(7)のバネ圧を調節する。
As a pressure measurement gauge, the vacuum container Tl) has a pressure measuring gauge of 760~1.
A high pressure measurement gauge αD such as a hot wire vacuum gauge that measures pressure at 0-'Torr, and a pressure at or below 10-'Torr (
Low pressure measurement gauge α such as an ionization vacuum gauge that measures the degree of vacuum)
2, and a high pressure measuring gauge α3 such as a Bourdon tube that measures pressures of 760 Torr or more and a hot wire vacuum that measures pressures of 760-10” Torr are connected to the T-joint on the downstream side of the vent valve (5). The four pressure measuring gauges are each converted to an electrical output signal, and the signals are combined two by two and added to the three subtractors α5αθα, and the outputs are sent to the three comparators. 08
Q9) In addition to ■, compare with each set value, and apply the output to the controller (22) via the switch (21), and use the output to adjust the spring pressure of the pressure regulating valve (7).

以上の構成機器の動作を、第2図の真空排気→処理→ベ
ントの工程について述べる。真空排気の工程においては
、ベントバルブ(5)を閉じ排気口バルブ(2)を開い
て、真空排気システム(3)を作動させ、真空容器(1
1内を高真空(例えば10−’ 〜10−”Torr以
下)まで排気する。このとき、同時に真空バルブ(6)
を閉じ真空バルブ(9)を開いて、ベントバルブ(5)
の−次側T継手部を低真空(例えばI Torr)まで
真空排気システムα0)で排気する。真空容器(1)内
が所定の真空に到達すれば、真空容器(1)内に予めロ
ーディングされた処理物体の表面に蒸着などの処理を行
う。該処理が終了すれば、真空容器(1)内を大気圧に
ベントする工程に移る。
The operation of the above-mentioned components will be described with reference to the evacuation→processing→venting process shown in FIG. In the evacuation process, the vent valve (5) is closed, the exhaust port valve (2) is opened, the evacuation system (3) is activated, and the vacuum container (1) is activated.
1 is evacuated to a high vacuum (e.g., below 10-' to 10-'' Torr). At the same time, the vacuum valve (6)
Close the vacuum valve (9) and open the vent valve (5).
The T-joint on the next side is evacuated to a low vacuum (for example, I Torr) using a vacuum evacuation system α0). When the inside of the vacuum container (1) reaches a predetermined vacuum, a process such as vapor deposition is performed on the surface of the processing object loaded in advance into the vacuum container (1). When the process is completed, the process moves to the step of venting the inside of the vacuum container (1) to atmospheric pressure.

ベント工程では、先ず、排気口バルブ(2)及び真空バ
ルブ(9)を閉じ、ベントバルブ(5)及び真空バルブ
(6)を開いて、圧力調節弁(7)によりベントバルブ
(5)の−次側圧力PIを100Torr程度に調整し
た状態で、気体供給源(8)の気体を真空容器(1)内
に導入する。尚、前述の如くベントバルブ(5)の−次
側T継手部を真空排気システムα0)で低真空に排気し
ているため、圧力l1m弁(7)が正常に作動するまで
の間に過渡的な高圧力の気体が真空容器fll内に流入
するのを確実に防止できる。
In the venting process, first, the exhaust port valve (2) and the vacuum valve (9) are closed, the vent valve (5) and the vacuum valve (6) are opened, and the pressure control valve (7) is used to close the vent valve (5). With the next side pressure PI adjusted to about 100 Torr, gas from the gas supply source (8) is introduced into the vacuum container (1). As mentioned above, since the T-joint on the next side of the vent valve (5) is evacuated to a low vacuum using the vacuum exhaust system α0), there will be a transient period until the pressure l1m valve (7) operates normally. It is possible to reliably prevent high-pressure gas from flowing into the vacuum container full.

上記気体の導入により真空容器(1)内の圧力P2が上
昇してくる。ベント管から真空容器内への気体の流れが
非粘性流となっているベント初期の間、即ち、真空容器
(11内の圧力か圧力ptになる迄の間は、前記圧力P
、を100Torr程度に調整した状態で気体の導入を
続ける。更に、上記圧力調整の状態で真空容器(1)内
の圧力がPtよりも少し高い圧力Pvになるまて気体の
導入を続ける。尚、上記圧力Pt−Pvの間ではベント
管から真空容器内への気体の流れか粘性流となっている
。
Due to the introduction of the gas, the pressure P2 inside the vacuum container (1) increases. During the initial stage of venting when the gas flow from the vent pipe into the vacuum container is an inviscid flow, that is, until the pressure inside the vacuum container (11 reaches the pressure pt), the pressure P
The gas is continued to be introduced with the pressure adjusted to about 100 Torr. Further, in the above-mentioned pressure adjustment state, the introduction of gas is continued until the pressure inside the vacuum container (1) reaches a pressure Pv slightly higher than Pt. Note that between the pressures Pt and Pv, the gas flows from the vent pipe into the vacuum container, or is a viscous flow.

ここで、粘性流となるのは、管内の気体の平均自由行路
lと管の直径dの比か一定値以下の場合である。この比
が一定値以上の場合には、粘性力による流れの減衰がな
く、自由分子流(非粘性流)となる。実施例の装置では
ベントバルブ(5)の配管(4)の直径dが5〜1OI
lunであり、差圧ΔPか100Torr程度であるの
で、非粘性流から粘性流になる圧力ptは0.I To
rrぐらいとなる。従って、前記圧力P 、 : 10
0Torr調整は、差圧ΔPを100Torr程度に制
御していることに等しい。
Here, a viscous flow occurs when the ratio of the mean free path l of the gas in the pipe to the diameter d of the pipe is less than a certain value. When this ratio is above a certain value, the flow is not attenuated by viscous force and becomes a free molecular flow (inviscid flow). In the device of the example, the diameter d of the pipe (4) of the vent valve (5) is 5 to 1 OI.
lun and the differential pressure ΔP is about 100 Torr, so the pressure pt at which the inviscid flow changes from viscous flow is 0. I To
It will be about rr. Therefore, the pressure P: 10
Adjusting to 0 Torr is equivalent to controlling the differential pressure ΔP to about 100 Torr.

上記ベント初期での圧力測定はP 2 < 10−’T
orrのとき圧力測定ゲージαz(14を用い、PV 
>P2 >1O−3Torrのとき圧力測定ゲージαD
α4を用いる。
The pressure measurement at the initial stage of venting is P 2 <10-'T
When orr, use pressure measuring gauge αz (14, PV
>P2 When >1O-3Torr, pressure measuring gauge αD
α4 is used.

P、 <1o−2Torrにおいては、圧力測定ゲージ
αZ(14)の出力信号P Ll、PLIIの出力から
減算器αηて差圧ΔPLを求め、差圧ΔPの目標100
Torrに相当する指令値ΔPLCと比較器(イ)て比
較し、その偏差eLか切換器(2I)を介して制御器(
22)に入力信号として送られ、差圧ΔPを目標の10
0Torrに制御するよう圧力調整器(7)の開度を制
御する。
When P, <1o-2 Torr, the differential pressure ΔPL is obtained by using the subtractor αη from the output signals P Ll and PLII of the pressure measuring gauge αZ (14), and the target 100 of the differential pressure ΔP is calculated.
The command value ΔPLC corresponding to Torr is compared with the comparator (A), and the deviation eL is sent to the controller (2I) via the switch (2I).
22) as an input signal to set the differential pressure ΔP to the target 10
The opening degree of the pressure regulator (7) is controlled to control the pressure to 0 Torr.

Pv >P2 >10−’Torrにおいても、圧力測
定ゲージaυα4の出力信号P Ll、P□2の出力か
ら減算器αeて差圧ΔPIlを求め、差圧ΔPを目標1
00Torrに圧力調整器(7)の開度を制御する。
Even when Pv > P2 >10-'Torr, the differential pressure ΔPIl is obtained by using the subtractor αe from the output signal P Ll of the pressure measuring gauge aυα4 and the output of P□2, and the differential pressure ΔP is set to the target 1.
The opening degree of the pressure regulator (7) is controlled to 00 Torr.

前記気体の導入CP’、がPvになるまでの気体導入)
後はベント後期に相当し、真空容器(1)内、ベント管
(4)内とも、気体の流れか充分粘性流状態になるので
、真空容器(11内の圧力P、が大気圧になるまで差圧
ΔPを大きくして、気体の導入速度を上げても、気体分
子の方向分布は分子流の状態はと鋭くなく、真空容器(
11底や壁面のダストなとを群上からせることもない。
(Introduction of gas until CP' becomes Pv)
The latter stage corresponds to the latter stage of venting, and since both the vacuum container (1) and the vent pipe (4) are in a gas flow or sufficiently viscous flow state, until the pressure P in the vacuum container (11) reaches atmospheric pressure. Even if the differential pressure ΔP is increased and the gas introduction speed is increased, the directional distribution of gas molecules is not as sharp as the state of molecular flow, and the vacuum vessel (
11 There is no dust from the bottom or walls coming from above.

そこで、ベントバルブ(5)の−次側圧力P1を760
TOrr以上に調整した状態で、気体供給源(8)の気
体を真空容器(1)内に導入する。このとき、圧力測定
ゲージαυα3の出力信号P M!及びP□2の出力か
ら減算器α9て差圧ΔP。
Therefore, the pressure P1 on the negative side of the vent valve (5) was set to 760
The gas from the gas supply source (8) is introduced into the vacuum container (1) in a state where it is adjusted to be at or above TOrr. At this time, the output signal of the pressure measuring gauge αυα3 is P M! And the differential pressure ΔP is obtained by subtractor α9 from the output of P□2.

を求め、圧力調整器(7)の開度を制御し、差圧ΔPを
500Torrに制御した。
was determined, and the opening degree of the pressure regulator (7) was controlled to control the differential pressure ΔP to 500 Torr.

その結果、真空容器底や壁面のダストや異物等の群上が
りを生じることなくベントし得、又、従来法の場合に比
し、ベント時間を大幅に短縮し得た。
As a result, it was possible to vent the vacuum container without causing dust or foreign matter to clump up on the bottom or wall of the vacuum container, and the venting time could be significantly shortened compared to the conventional method.

(発明の効果) 本発明に係る真空容器のベント方法によれば、ベント初
期における真空容器底や壁面のダストや異物等の群上が
りの程度を減少し得、又、ベント後期における真空容器
内の大気圧への復元時間を短縮し得るようになる。その
ため、上記ダスト等の付着による処理物体の表面品質低
下を生じなくし得、又、真空処理サイクル時間の短縮化
、生産性の向上か図れるようになる。
(Effects of the Invention) According to the method for venting a vacuum vessel according to the present invention, it is possible to reduce the degree of clumping of dust, foreign matter, etc. on the bottom and wall of the vacuum vessel in the early stage of venting, and to reduce the amount of dust and foreign matter in the vacuum vessel in the late stage of venting. This makes it possible to shorten the time required to restore atmospheric pressure. Therefore, it is possible to prevent deterioration of the surface quality of the object to be processed due to the adhesion of the dust, etc., and it is also possible to shorten the vacuum processing cycle time and improve productivity.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、実施例に係る真空処理装置の概要を示す図、
第2図は、真空処理サイクルのフローを示す図、第3図
は、従来の真空処理装置の概要を示す図である。 m−一真空容器     (21−真空排気口バルブ(
3)αα−真空排気システム (4)−ベント管(51
−−ベントパルプ    (6)(91−真空バルブ(
7)−一圧力調節器     +81−ベント用気体源
αD〜α4−・−圧力測定ゲージ αS〜αη−減算器
αε〜■−・比較器     (21)−切換器(22
)−・−制御器 特許出願人 株式会社 神戸製鋼所 代 理 人 弁理士  金丸 章− 第1図
FIG. 1 is a diagram showing an outline of a vacuum processing apparatus according to an embodiment;
FIG. 2 is a diagram showing a flow of a vacuum processing cycle, and FIG. 3 is a diagram showing an outline of a conventional vacuum processing apparatus. m-1 vacuum container (21- vacuum exhaust port valve (
3) αα - Vacuum exhaust system (4) - Vent pipe (51
--Bent pulp (6) (91-Vacuum valve (
7) - Pressure regulator +81 - Vent gas source αD ~ α4 - Pressure measurement gauge αS ~ αη - Subtractor αε ~ ■ - Comparator (21) - Switcher (22
) - - Controller patent applicant Kobe Steel, Ltd. Agent Akira Kanemaru Patent attorney Fig. 1

Claims (1)

【特許請求の範囲】[Claims] (1)真空容器内に処理物体をローディングし、真空容
器内を真空にして処理物体を処理した後、処理物体をア
ンローディングする前に、真空容器にベント管及びベン
トバルブを介して管接続された気体供給源より真空容器
内に気体を導入して真空容器内の圧力を大気圧に復元さ
せる真空容器のベント方法において、上記ベントバルブ
の気体供給源側の気体圧力を、真空容器内の圧力が小さ
くてベント管から真空容器内への気体の流れが非粘性流
となるベント初期には760Torrより低く調整し、
ベント管から真空容器内への気体の流れが粘性流となる
ベント後期には760Torr以上に調整して、前記真
空容器内への気体の導入を行うことを特徴とする真空容
器のベント方法。
(1) After loading the object to be processed into the vacuum container, evacuating the inside of the vacuum container, and processing the object, before unloading the object, connect the pipe to the vacuum container via a vent pipe and a vent valve. In a method for venting a vacuum container in which the pressure inside the vacuum container is restored to atmospheric pressure by introducing gas into the vacuum container from a gas supply source, the gas pressure on the gas supply source side of the vent valve is set to the pressure inside the vacuum container. In the early stages of venting, when the pressure is small and the gas flow from the vent pipe into the vacuum container becomes an inviscid flow, adjust it to a value lower than 760 Torr.
A method for venting a vacuum container, characterized in that the gas is introduced into the vacuum container by adjusting the pressure to 760 Torr or higher in the latter stage of venting, when the flow of gas from the vent pipe into the vacuum container becomes a viscous flow.
JP17856890A 1990-07-05 1990-07-05 Venting method for vacuum vessel Pending JPH0466120A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17856890A JPH0466120A (en) 1990-07-05 1990-07-05 Venting method for vacuum vessel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17856890A JPH0466120A (en) 1990-07-05 1990-07-05 Venting method for vacuum vessel

Publications (1)

Publication Number Publication Date
JPH0466120A true JPH0466120A (en) 1992-03-02

Family

ID=16050758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17856890A Pending JPH0466120A (en) 1990-07-05 1990-07-05 Venting method for vacuum vessel

Country Status (1)

Country Link
JP (1) JPH0466120A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6030577A (en) * 1995-09-01 2000-02-29 Erbsloh Aktiengesellschaft Process for manufacturing thin pipes
JP2003083987A (en) * 2001-09-12 2003-03-19 Olympus Optical Co Ltd Part-supplying apparatus
JP2015168853A (en) * 2014-03-07 2015-09-28 セイコーエプソン株式会社 Vacuum device venting method, electronic component, and vacuum device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6030577A (en) * 1995-09-01 2000-02-29 Erbsloh Aktiengesellschaft Process for manufacturing thin pipes
JP2003083987A (en) * 2001-09-12 2003-03-19 Olympus Optical Co Ltd Part-supplying apparatus
JP2015168853A (en) * 2014-03-07 2015-09-28 セイコーエプソン株式会社 Vacuum device venting method, electronic component, and vacuum device

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