JPH0469745B2 - - Google Patents
Info
- Publication number
- JPH0469745B2 JPH0469745B2 JP796985A JP796985A JPH0469745B2 JP H0469745 B2 JPH0469745 B2 JP H0469745B2 JP 796985 A JP796985 A JP 796985A JP 796985 A JP796985 A JP 796985A JP H0469745 B2 JPH0469745 B2 JP H0469745B2
- Authority
- JP
- Japan
- Prior art keywords
- gauge
- crack
- slit
- stress
- rosette
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012806 monitoring device Methods 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 238000005259 measurement Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002123 temporal effect Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/02—Details
- G01N3/06—Special adaptations of indicating or recording means
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Strength Of Materials By Application Of Mechanical Stress (AREA)
Description
(産業上の利用分野)
本発明は複雑な構造物において、亀裂成長速度
を支配するパラメータである応力拡大係数を直接
求める構造物の亀裂成長監視装置に係る。
(従来の技術)
橋梁、其他の複雑な構造物においては車両其他
重量物通過による変動荷重を受けるため、疲労に
よる損傷を受け、亀裂を生ずることがある。これ
らの亀裂は何れは補修されなければならないが、
少くとも補修されるまでの間は安全でなければな
らず、破壊してはならない。そのためには、現在
の亀裂の成長速度を監視するとともに、将来の成
長量および、進展方向を推定するためのデータを
集録する監視装置が必要である。従来、構造物の
実働応力を計測する装置は実用されているが、複
雑な構造物において亀裂成長速度に支配的な応力
拡大係数を求める装置はなかつた。
(発明が解決しようとする問題点)
このため特殊な形状のひずみゲージおよび演算
装置からなる自動監視装置を開発して応力拡大係
数を求めることが問題点である。
(問題点を解決するための手段)
第1図に示すように、中央部にスリツト6aを
有する薄膜状基盤3aに、スリツト6aの一端を
中心とする円周上に等間隔(不等間隔でもよい)
に分散して複数枚の3軸ロゼツトゲージ(文献2
参照)を貼り付ける。1〜13は3軸ロゼツトゲ
ージであり、スリツト6aの反対側に1枚のクラ
ツクゲージ15を貼り付ける。これらはコネクタ
16を経て演算装置7aに導かれる。演算装置7
aはコンパクトに製作されて構造物の近くに置か
れる。演算装置7aは応力拡大係数を算出、記
憶、記録するために動ひずみ計、極値検出回路な
らびにその演算回路と、タイマーと応力拡大係数
ならびにクラツクゲージ出力の記憶装置とから構
成され、クラツク周辺のひずみゲージのデータか
ら応力拡大係数を計算するもので、この監視装置
の構成することにより問題点を解決するための手
段と成つている。
(作用)
3軸ロゼツトゲージをスリツトの一端を中心と
ト部付近の応力を求めるには次の如くする。
今第3図、または第4図において、X方向(
方向)、Y方向(方向)およびそれらの2等分
線方向(方向)のp番目の3軸ロセツトゲージ
の出力を夫夫ε〓ε〓ε〓とし、
測定点の中の任意の
p点の引張応力をσx,σy、剪断応力をτxyとすれ
ば式が成立する。
σx=(E/1−υ2)・(εI+υε〓)……(A)
σy=(E/1−υ2)・(ε〓+υε〓) ……(B)
τxy=−1/2(σ1−σ2)sin2θ ……(C)
ここに、
σ1={E/(1−υ2)}(ε1+υε2)
σ2={E/(1−υ2)}(ε2+υε1)
ε1=(ε〓+ε〓)/2
+√{(〓+〓)2-〓}2+{(〓-〓
)2}2
ε2=(ε〓+ε〓)/2
−√{(〓+〓)2-〓}2+{(〓-〓
)2}2
θ=0.5tan-1{(ε〓+ε〓−2ε〓)/(ε〓−ε
〓)}
ここにυはポアツソン比である。
以下、ひずみゲージ3a1の読みから応力拡大
係数を算出する過程を述べる。(文献1参照)第
5図aにおいて、対象物にPiおよびUiの力がか
かり図の如く亀裂が生じたとする。亀裂の一端を
Sの如く円または正方形で囲み周上に3軸ロゼツ
トゲージを配置する。円周S上の3点ロゼツトゲ
ージの配置要領を第5図bにて説明する。
Γは半径Rの円の境界で円周上にn個の3軸ロ
ゼツトゲージ1,2,3,……p,p+1……n
を図の如く配置する。その中p番目から、p+1
番目の測定点が原点Oに対してなす角、およびp
番目から、p+2番目までの測定点が原点Oに対
してなす角度を夫夫
γ γ0とし、x、yを境界に作用する表面力の
x、y成分とすると、測定点pでの表面力は
{}p={x/y}p=lxσx+lyτxy
lxτxy+lyσyp (1)
ただし(lx,ly)はSの境界Γ上で外向きに引
いた法線の方向余弦である。Γ上のn個の測定点
間の任意の点での表面力Tは二次式で近似すると
{(i}={}={x/y}=[M]{Q}……(
2)
となる。ここに
[M]=a1
0 0
a4 a2
0 0
a5 a3
0 0
a6 ……(3)
{Q}T=[TxpTypTx p+1 Ty p+1 Tx p+2 Ty p+2 ] ……(4)
a=(1−γ/γ0)(1−2γ/γ0)
a2=4(γ/γ0)(1−γ/γ0)
a3=(γ/γ0)(2γ/γ0−1)
a4=(1−γ/γ0)(1−2γ/γ0)
a5=4(γ/γ0)(1−γ/γ0)
a6=(γ/γ0)(2γ/γ0−1)
式(4)の{Q}Tの添字Tは転置行列を示す。以上
の各測定点pの応力成分σx,σy,τxyはひずみゲ
ージ3a1より前記式(A)、(B)、(C)により求められ
る。
次に亀裂部分の応力は応力拡大係数K、K
(モードをK、モードをKとする。):
K
K=√2[Hα]{Q} ……(5)
より求められるから亀裂部の応力も求められる。
ここに[Hα]は形状固有の常数を行列で表した
もので円周の上の12等分点上にひずみゲーしたも
ので円周の上の12等分点上に3軸ロゼツトゲージ
を配置した場合は次の如くなる。
(Industrial Application Field) The present invention relates to a crack growth monitoring device for a complex structure that directly determines the stress intensity factor, which is a parameter governing the crack growth rate. (Prior Art) Bridges and other complex structures receive varying loads due to the passing of vehicles and other heavy objects, which can result in damage due to fatigue and cracks. These cracks will have to be repaired eventually, but
It must be safe and must not be destroyed, at least until repaired. To this end, a monitoring device is required that not only monitors the current crack growth rate but also collects data for estimating the future growth amount and direction of growth. Conventionally, devices have been used to measure the actual stress of structures, but there has been no device that can determine the stress intensity factor that governs the crack growth rate in complex structures. (Problems to be Solved by the Invention) Therefore, the problem is to develop an automatic monitoring device consisting of a specially shaped strain gauge and an arithmetic device to determine the stress intensity factor. (Means for Solving the Problem) As shown in FIG. 1, a thin film base 3a having a slit 6a in the center is provided with slits 6a arranged at equal intervals (or irregular intervals) on a circumference centered at one end of the slit 6a. good)
Multiple 3-axis rosette gauges distributed in
paste). 1 to 13 are three-axis rosette gauges, and one crack gauge 15 is pasted on the opposite side of the slit 6a. These are led to the arithmetic unit 7a via the connector 16. Arithmetic device 7
a is made compact and placed near the structure. The arithmetic unit 7a is composed of a dynamic strain meter, an extreme value detection circuit, and its arithmetic circuit for calculating, storing, and recording stress intensity coefficients, a timer, and a storage device for stress intensity coefficients and crack gauge outputs, and is used to calculate and record the stress intensity coefficients and crack gauge outputs. The stress intensity factor is calculated from the gauge data, and the configuration of this monitoring device serves as a means to solve the problem. (Function) To determine the stress near the tip of the 3-axis rosette gauge with one end of the slit as the center, proceed as follows. Now in Figure 3 or 4, in the X direction (
Let the output of the p-th three-axis rosette gauge in the Y direction (direction), the Y direction (direction), and their bisector direction (direction) be ε〓ε〓ε〓, and the tension at any p point among the measurement points is The equation holds true if the stresses are σ x and σ y and the shear stress is τ xy . σ x = (E/1−υ 2 )・(ε I +υε〓)……(A) σ y = (E/1−υ 2 )・(ε〓+υε〓)……(B) τ xy =− 1/2 (σ 1 −σ 2 ) sin2θ ...(C) Here, σ 1 = {E/(1−υ 2 )}(ε 1 +υε 2 ) σ 2 = {E/(1−υ 2 ) }(ε 2 +υε 1 ) ε 1 = (ε〓+ε〓)/2 +√{(〓+〓)2-〓} 2 +{(〓-〓
)2} 2 ε 2 = (ε〓+ε〓)/2 −√{(〓+〓)2-〓} 2 +{(〓-〓
)2} 2 θ=0.5tan -1 {(ε〓+ε〓−2ε〓)/(ε〓−ε
〓)} Here υ is Poitson's ratio. The process of calculating the stress intensity factor from the reading of the strain gauge 3a1 will be described below. (See Document 1) In Fig. 5a, it is assumed that forces Pi and Ui are applied to the object and a crack occurs as shown in the figure. One end of the crack is surrounded by a circle or square like S, and a 3-axis rosette gauge is placed around the circumference. The arrangement of the three-point rosette gauge on the circumference S will be explained with reference to FIG. 5b. Γ is the boundary of a circle with radius R, and n three-axis rosette gauges 1, 2, 3, ... p, p+1 ... n are arranged on the circumference of the circle.
Arrange as shown in the figure. From the pth among them, p+1
The angle that the th measurement point makes with the origin O, and p
Let γ γ 0 be the angle that measurement points from th to p+2th measurement points make with the origin O, and let x and y be the x and y components of the surface force acting on the boundary, then the surface force at measurement point p is is {} p = { x / y } p = l x σ x + l y τ xy l x τ xy + l y σ y p (1) However, (l x , l y ) are directed outward on the boundary Γ of S. It is the direction cosine of the drawn normal. The surface force T at any point between n measurement points on Γ is approximated by a quadratic formula: {( i }={}={ x / y }=[M] {Q}...(
2) becomes. Here, [M] = a 1 0 0 a 4 a 2 0 0 a 5 a 3 0 0 a 6 ......(3) {Q} T = [T xp T yp T x p+1 T y p+1 T x p+2 T y p+2 ] ...(4) a=(1-γ/γ 0 )(1-2γ/γ 0 ) a 2 =4(γ/γ 0 )(1-γ/γ 0 ) a 3 = (γ/γ 0 ) (2γ/γ 0 −1) a 4 = (1−γ/γ 0 ) (1−2γ/γ 0 ) a 5 =4(γ/γ 0 )(1− γ/γ 0 ) a 6 =(γ/γ 0 )(2γ/γ 0 −1) The subscript T of {Q} T in equation (4) indicates a transposed matrix. The stress components σ x , σ y , and τ xy at each measurement point p are determined from the strain gauge 3a1 using the equations (A), (B), and (C). Next, the stress in the crack is the stress intensity factor K, K
(Let the mode be K and the mode be K.): K K=√2[Hα] {Q} ... (5) Since it can be found from (5), the stress in the crack can also be found.
Here, [Hα] is a constant constant specific to the shape expressed as a matrix, and is a strain gauge placed on the 12 equally divided points on the circumference, and a 3-axis rosette gauge is placed on the 12 equally divided points on the circumference. The case is as follows.
【表】
・・・・・・・・・・・(6)
[Q]T=[Tx1Ty1…TxpTyp…Tx13Ty13]……(7)
ただし、[HαT]は[Hα]の転置行列を示す。
12等分された3軸ロゼツトゲージの測定値を
[Q]に与えれば、(5)式によりK、Kが求め
られ亀裂部分の応力拡大係数が求められる。(文
献1参照)
また、クラツクゲージ15は亀裂が成長するに
つれて順次グリツドが切断して信号が出力される
が、第2図においてその信号は動ひずみ計13で
増幅され、その切断時刻はタイマ14によつて計
測し、亀裂の成長量とその時刻を記憶装置12a
で記憶しておけば亀裂の成長が自動的に記録でき
る。
以上の2つの記録(応力拡大係数の時系列デー
タおよび、亀裂成長量とその時刻)はカセツトテ
ープまたはデイスケツト等の記憶媒体により工場
に持帰りプリントして以後の解析に利用できる。
(実施例)
第1図bにて本発明の構造物の成長亀裂監視装
置に使用する。ひずみゲージ3a1の構成を説明
する。薄膜状基盤3aはひずみゲージ中心点5a
を中心とする円形の薄膜で、スリツト6aが中心
より半径方向に外方に切つてある。適当な半径R
の円周上に3軸ロゼツトゲージ1〜13が配置さ
れている。第1図では等間隔で12等分した場合を
示したが、その中1,13はスリツトの直上直下
に設けた。本実施例ではロゼツトゲージの等分数
を12としたが、等分数は12以外の配列可能な数で
あればよい。15はクラツクゲージで中心点5a
に接してスリツト6aの反対側に配置してある。
個々の3軸ロゼツトゲージを一度にセツトする
にはフオトレジスト法を用いると生産性がよい。
このひずみゲージ3a1を構造物にセツトする
には次の如くする。
即ち第3図に示すように、試験しようとする対
象物に発生した亀裂の先端と、ひずみゲージ3a
1の中心点5aの一端とを合せながら、対象物の
亀裂の他端およびひずみゲージ3a1のスリツト
6aの開口側を同一方向に向けて、瞬間接着剤等
によりひずみゲージ3a1と対象物とを接着す
る。
第1a図には本発明のひずみゲージ3a1(ロ
ゼツトゲージとクラツクゲージ)を対象物に取付
た所を示す。
K、K求めるには本実施例では次の如くし
た。
ひずみゲージ3a1の出力は1個のロゼツトゲ
ージから3つの出力があり、13個のロゼツトゲー
ジがあるので計39個の出力がある。これらの入力
を受けて動ひずみ計9aは39個の応力
[〓x 〓y 〓xy]p p=1〜13
を求め、これらを次の極値探索および記憶回路1
0aに入力する。即ち、動ひずみ計9aは式(A)(B)
(C)の計算を行い、その結果を次の極値探索および
記憶回路10aに出力する。第4図はひずみゲー
ジ3a1から得られた各応力値
σx、σy、τxy
の時間変化を示す。
同図において左より極値にi=1,2,3……
の番号をつけてある。極値i毎に応力値
[〓 x〓 y〓xy]p p=1〜13
を求め、(5)式を用いてi毎の(K、K)iを求
めこれよりK、Kの時間的変化を得る。以上
の演算装置をブロツク線図で示したものが第2図
である。
極値探索および記憶回路10aは各応力および
剪断応力より(5)式によりK、Kを算出しその
時間的変化を次の記憶装置12に入力する。
(発明の効果)
(1) 構造物に発生した亀裂の先端と、ひずみゲー
ジ一端を合せながら、構造物の亀裂とひずみゲ
ージのスリツトとを同一方向に向けて、瞬間接
着剤等により接着できるので作業が著しく簡単
になつた。
(2) 境界条件の不明確な構造物に発生した亀裂に
各種の応力が作用した場合の亀裂に作用する応
力拡大係数K(モード)、K(モード)
の時間的変化が分離して計測できるので、K
から将来の亀裂成長量を、K/Kから亀裂
の進展方向を予測するためのデータ取ることが
できる。
(3) クラツクゲージがあるので、亀裂の成長過程
を無人で監視できる。[Table] ・・・・・・・・・・・・(6)
[Q] T = [T x1 T y1 ...T xp T yp ...T x13 T y13 ]...(7) However, [Hα T ] indicates the transposed matrix of [Hα].
If the measured values of the triaxial rosette gauge divided into 12 equal parts are given to [Q], K and K are determined by equation (5), and the stress intensity factor of the cracked portion is determined. (Refer to Document 1) In addition, as the crack grows, the grid of the crack gauge 15 is sequentially cut and a signal is output. In FIG. The amount of growth of the crack and its time are stored in the storage device 12a.
If you memorize this, the crack growth can be automatically recorded. The above two records (time series data of the stress intensity factor and the amount and time of crack growth) can be taken back to the factory and printed on a storage medium such as a cassette tape or diskette and used for subsequent analysis. (Example) FIG. 1b shows a device for monitoring growth cracks in a structure according to the present invention. The configuration of the strain gauge 3a1 will be explained. The thin film base 3a is located at the center point 5a of the strain gauge.
It is a circular thin film with the center at , and a slit 6a is cut outward in the radial direction from the center. Appropriate radius R
3-axis rosette gauges 1 to 13 are arranged on the circumference. Figure 1 shows the case where it is divided into 12 equal parts, of which 1 and 13 are placed directly above and below the slit. In this embodiment, the equal number of the rosette gauge is 12, but any number other than 12 that can be arranged may be used as the equal number. 15 is the center point 5a of the crack gauge
It is arranged on the opposite side of the slit 6a in contact with the slit 6a. To set the individual three-axis rosette gauges at once, it is highly productive to use the photoresist method. The strain gauge 3a1 is set in a structure as follows. That is, as shown in FIG. 3, the tip of the crack that has occurred in the object to be tested and the strain gauge 3a
While aligning one end of the center point 5a of the strain gauge 3a1 with one end of the center point 5a of the strain gauge 1, the other end of the crack in the target object and the opening side of the slit 6a of the strain gauge 3a1 face the same direction, and glue the strain gauge 3a1 and the target object using instant adhesive or the like. do. FIG. 1a shows a strain gauge 3a1 (a rosette gauge and a crack gauge) of the present invention attached to an object. In this embodiment, K and K were determined as follows. The strain gauge 3a1 has three outputs from one rosette gauge, and since there are 13 rosette gauges, there are a total of 39 outputs. Upon receiving these inputs, the dynamic strain meter 9a calculates 39 stresses [〓 x 〓 y 〓 xy ] p p = 1 to 13, and sends these to the next extreme value search and storage circuit 1.
Enter in 0a. That is, the dynamic strain meter 9a is expressed by formulas (A) and (B)
Calculation (C) is performed and the result is output to the next extreme value search and storage circuit 10a. FIG. 4 shows temporal changes in stress values σ x , σ y , and τ xy obtained from the strain gauge 3a1. In the figure, from the left to the extreme values i = 1 , 2 , 3 ...
It is numbered. Find the stress value [〓 x 〓 y 〓 xy ] p p = 1 to 13 for each extreme value i, use equation (5) to find (K, K) i for each i, and from this calculate the time Get a change. FIG. 2 is a block diagram showing the above arithmetic device. The extreme value search and storage circuit 10a calculates K and K using equation (5) from each stress and shear stress, and inputs the temporal change to the next storage device 12. (Effects of the invention) (1) While aligning the tip of a crack that has occurred in the structure with one end of the strain gauge, the crack in the structure and the slit in the strain gauge can be glued together with instant adhesive, etc., facing the same direction. Work has become significantly easier. (2) Stress intensity factor K (mode) and K (mode) that act on a crack when various stresses act on a crack that occurs in a structure with unclear boundary conditions
Since the temporal changes in can be measured separately, K
Data for predicting the amount of future crack growth can be obtained from K/K, and data for predicting the direction of crack growth can be obtained from K/K. (3) Since there is a crack gauge, the crack growth process can be monitored unattended.
第1a図は亀裂成長自動監視装置の全体図、b
は本発明のひずみゲージの構成図、第2図は演算
装置のブロツク図、第3図は3軸ロゼツトゲージ
による測定点の番号図、第4図は各ロゼツトゲー
ジに生じる変動応力の例示図、第5図は亀裂パネ
ルのロゼツトゲージ位置の番号および符号の説明
図である。
1a……構造物、2a……亀裂、3a……薄膜
基盤、3a1……ひずみゲージ、6a……スリツ
ト、7a……演算装置、9a……動ひずみ(39チ
ヤンネル)、10a……極値探索および記憶回路、
11a……K、Kの演算回路、12a……記
憶回路、13a……動ひずみ(1チヤンネル)。
Figure 1a is an overall view of the automatic crack growth monitoring device, b
2 is a block diagram of a calculation device, FIG. 3 is a numbered diagram of measurement points by a 3-axis rosette gauge, FIG. 4 is an illustration of fluctuating stress generated in each rosette gauge, and FIG. The figure is an explanatory diagram of the numbers and symbols of the rosette gauge positions on the crack panel. 1a...Structure, 2a...Crack, 3a...Thin film base, 3a1...Strain gauge, 6a...Slit, 7a...Arithmetic device, 9a...Dynamic strain (39 channels), 10a...Extreme value search and memory circuit,
11a...K, K arithmetic circuit, 12a...memory circuit, 13a...dynamic strain (1 channel).
Claims (1)
有する薄膜状基盤と該スリツトの末端を中心とす
る薄膜状基盤の円周上に分散して貼り付けられた
複数枚の3軸ロゼツトゲージとスリツトの反対側
に貼り付けられたクラツクゲージとよりなるひず
みゲージならびに、前記3軸ロゼツトゲージの出
力より応力成分を算出し該応力成分の極値および
その時刻を求め該極値における応力拡大係数を演
算しその時系列を記憶する記憶装置と前記クラツ
クゲージ出力およびその時刻を記憶する記憶装置
とより構成されることを特徴とする構造物の亀裂
成長監視装置。1. A thin film base having a slit opened from the periphery toward the center, and a plurality of triaxial rosette gauges distributed and pasted on the circumference of the thin film base centered on the end of the slit, and the opposite side of the slit. The stress component is calculated from the output of the strain gauge consisting of a crack gauge attached to the side and the three-axis rosette gauge, the extreme value of the stress component and its time are calculated, the stress intensity factor at the extreme value is calculated, and the time series is calculated. 1. A crack growth monitoring device for a structure, comprising a storage device for storing the crack gauge output and its time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP796985A JPS61167835A (en) | 1985-01-18 | 1985-01-18 | Monitoring device for cracking growth in structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP796985A JPS61167835A (en) | 1985-01-18 | 1985-01-18 | Monitoring device for cracking growth in structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61167835A JPS61167835A (en) | 1986-07-29 |
| JPH0469745B2 true JPH0469745B2 (en) | 1992-11-09 |
Family
ID=11680291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP796985A Granted JPS61167835A (en) | 1985-01-18 | 1985-01-18 | Monitoring device for cracking growth in structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61167835A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63168834U (en) * | 1987-04-24 | 1988-11-02 | ||
| JP3342467B2 (en) * | 2000-03-30 | 2002-11-11 | 川崎重工業株式会社 | Crack-type fatigue detecting element, method of manufacturing the same, and damage estimation method using crack-type fatigue detecting element |
| JP6222772B2 (en) * | 2014-01-24 | 2017-11-01 | 株式会社共和電業 | Strain gauge for stress intensity factor measurement and stress intensity factor calculation method |
| JP6866070B2 (en) * | 2016-03-16 | 2021-04-28 | 住友重機械工業株式会社 | Excavator |
-
1985
- 1985-01-18 JP JP796985A patent/JPS61167835A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61167835A (en) | 1986-07-29 |
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