JPH047653U - - Google Patents
Info
- Publication number
- JPH047653U JPH047653U JP4633890U JP4633890U JPH047653U JP H047653 U JPH047653 U JP H047653U JP 4633890 U JP4633890 U JP 4633890U JP 4633890 U JP4633890 U JP 4633890U JP H047653 U JPH047653 U JP H047653U
- Authority
- JP
- Japan
- Prior art keywords
- liner
- target chamber
- covers
- faraday cage
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Description
第１図はこの考案の一実施例の縦断面図、第２
図はその横断面図、第３図は従来例の縦断面図で
ある。
１……ターゲツトチヤンバ、３……サプレツサ
電極、４……フアラデーケージ、４０……プラテ
ン、１４，１４ａ，１４ｂ，１４ｃ……ライナ。
Figure 1 is a vertical sectional view of one embodiment of this invention, Figure 2
The figure is a cross-sectional view thereof, and FIG. 3 is a longitudinal cross-sectional view of a conventional example. 1... Target chamber, 3... Suppressor electrode, 4... Faraday cage, 40... Platen, 14, 14a, 14b, 14c... Liner.
Claims (1)
内壁に沿うライナを前記ターゲツトチヤンバに着
脱自在に設けたイオン注入装置。 An ion implantation device comprising: a liner that extends along the inner wall of a target chamber that covers a Faraday cage; and a liner that is detachably attached to the target chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990046338U JP2527666Y2 (en) | 1990-04-27 | 1990-04-27 | Ion implanter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990046338U JP2527666Y2 (en) | 1990-04-27 | 1990-04-27 | Ion implanter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH047653U true JPH047653U (en) | 1992-01-23 |
| JP2527666Y2 JP2527666Y2 (en) | 1997-03-05 |
Family
ID=31561335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990046338U Expired - Lifetime JP2527666Y2 (en) | 1990-04-27 | 1990-04-27 | Ion implanter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2527666Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55158890A (en) * | 1979-05-28 | 1980-12-10 | Daihen Corp | Electric-charged particle beam processing device |
| JPS5826441A (en) * | 1981-08-10 | 1983-02-16 | Nippon Telegr & Teleph Corp <Ntt> | Ion implanting device |
-
1990
- 1990-04-27 JP JP1990046338U patent/JP2527666Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55158890A (en) * | 1979-05-28 | 1980-12-10 | Daihen Corp | Electric-charged particle beam processing device |
| JPS5826441A (en) * | 1981-08-10 | 1983-02-16 | Nippon Telegr & Teleph Corp <Ntt> | Ion implanting device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2527666Y2 (en) | 1997-03-05 |