JPH0478335B2 - - Google Patents
Info
- Publication number
- JPH0478335B2 JPH0478335B2 JP1209843A JP20984389A JPH0478335B2 JP H0478335 B2 JPH0478335 B2 JP H0478335B2 JP 1209843 A JP1209843 A JP 1209843A JP 20984389 A JP20984389 A JP 20984389A JP H0478335 B2 JPH0478335 B2 JP H0478335B2
- Authority
- JP
- Japan
- Prior art keywords
- boron nitride
- cbn
- pressure
- rbn
- rhombohedral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 40
- 229910052582 BN Inorganic materials 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000002994 raw material Substances 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 239000013078 crystal Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 3
- -1 ammonium halide Chemical class 0.000 claims description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims 1
- 229910010277 boron hydride Inorganic materials 0.000 claims 1
- 239000003054 catalyst Substances 0.000 description 11
- 239000007858 starting material Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
- B01J3/062—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies characterised by the composition of the materials to be processed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2203/00—Processes utilising sub- or super atmospheric pressure
- B01J2203/06—High pressure synthesis
- B01J2203/0605—Composition of the material to be processed
- B01J2203/0645—Boronitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2203/00—Processes utilising sub- or super atmospheric pressure
- B01J2203/06—High pressure synthesis
- B01J2203/065—Composition of the material produced
- B01J2203/066—Boronitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2203/00—Processes utilising sub- or super atmospheric pressure
- B01J2203/06—High pressure synthesis
- B01J2203/0675—Structural or physico-chemical features of the materials processed
- B01J2203/068—Crystal growth
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Products (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は立方晶窒化ほう素(cBN)の製造法
に係り、より詳しくは、菱面体晶窒化ほう素
(rBN)に高圧を加えて立方晶窒化ほう素を製造
する方法に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a method for producing cubic boron nitride (cBN), and more specifically, to produce cubic boron nitride (rBN) by applying high pressure to it. The present invention relates to a method for producing crystalline boron nitride.
(従来の技術)
窒化ほう素(BN)の高圧相である立方晶窒化
ほう素(cBN)は、ダイヤモンドに次いで高い
硬度、熱伝導度をもち、熱的、化学的にも極めて
安定な物質である。特に高温の鉄族元素に対する
耐食性がダイヤモンドに優るため、鉄系素材の高
精度、高能率の研磨、切削工具用材料として用い
られてきたが、近年、その焼結体は、高集積度、
大出力化の著しい電子素子の高性能放熱基板とし
て実用化の期待が高まつている。(Prior technology) Cubic boron nitride (cBN), which is the high-pressure phase of boron nitride (BN), has the second highest hardness and thermal conductivity after diamond, and is an extremely stable material both thermally and chemically. be. In particular, its corrosion resistance against high-temperature iron group elements is superior to that of diamond, so it has been used for high-precision, high-efficiency polishing of iron-based materials and as a material for cutting tools.
There are growing expectations for its practical use as a high-performance heat dissipation substrate for electronic devices with significantly increased output.
ところで、立方晶窒化ほう素(cBN)は、通
常、BNの低圧相である六方晶BN(hBN)を高温
高圧処理することにより得られるが、そのままで
は極めて高い温度圧力条件を必要とするため、工
業的には、条件を緩和するため、触媒が用いられ
ている。このような触媒を用いて工業的にも得ら
れる立方晶窒化ほう素(cBN)は比較的大粒の
結晶粒であるので、そのまま砥粒として、或いは
焼結して切削工具として用いられるが、後者の場
合、cBNは単独では焼結し難いので、金属、セ
ラミツクス等を結合剤として用いる必要がある。 By the way, cubic boron nitride (cBN) is usually obtained by treating hexagonal BN (hBN), which is the low-pressure phase of BN, at high temperature and high pressure. Industrially, catalysts are used to ease the conditions. Cubic boron nitride (cBN), which can be obtained industrially using such catalysts, has relatively large crystal grains, so it can be used as abrasive grains or sintered to make cutting tools. In this case, cBN is difficult to sinter by itself, so it is necessary to use metal, ceramics, etc. as a binder.
従来、このようにして製造される立方晶窒化ほ
う素(cBN)には、触媒の取り込みがあり、ま
た焼結体には結合剤が存在するため、cBN本来
の硬度、強度、熱伝導度等の優れた性能が充分発
揮できないという問題があつた。 Conventionally, cubic boron nitride (cBN) produced in this way has a catalyst incorporated therein, and a binder is present in the sintered body, so cBN's original hardness, strength, thermal conductivity, etc. There was a problem in that the excellent performance of the system could not be fully demonstrated.
そこで、本発明者等は、先に、極微量のほう窒
化物触媒を含浸した六方晶BN(hBN)を高温高
圧処理する反応焼結法により、cBN粒間の直接
結合によるほぼ純粋なcBN焼結体を得る方法を
開発し(特許第1294809号、1303678号)、結合剤
の存在の問題を解決した。しかし、なお微量残存
する触媒の影響の問題があつた。 Therefore, the present inventors first used a reaction sintering method in which hexagonal BN (hBN) impregnated with a very small amount of boronitride catalyst was treated at high temperature and high pressure, resulting in almost pure cBN sintering through direct bonding between cBN grains. We developed a method to obtain aggregates (Patent Nos. 1294809 and 1303678) and solved the problem of the presence of binders. However, there was still the problem of the influence of a small amount of catalyst remaining.
このような事情から、六方晶BN(hBN)の無
触媒直接転換、特に、転換と同時にcBN焼結体
を得る反応焼結の試みがなされてきた。しかし、
この場合、前記のように市販のhBNをそのまま
用いて無触媒でcBNに転換するには、極めて高
い温度圧力を必要とし、強固な焼結体が得にくい
等の困難性がある。そこで、原料のhBNに減圧
焼成等の予備処理を施して活性化したり(特開昭
55−167110号参照)、気相法で特殊な条件下で特
殊なhBNを合成して用いる等により、転換の温
度圧力条件を緩和する試みがなされている。 Under these circumstances, attempts have been made to directly convert hexagonal BN (hBN) without a catalyst, and in particular, to perform reactive sintering to obtain a cBN sintered body simultaneously with the conversion. but,
In this case, as mentioned above, converting commercially available hBN as it is to cBN without a catalyst requires extremely high temperature and pressure, and there are difficulties such as difficulty in obtaining a strong sintered body. Therefore, the raw material hBN is activated by pre-treatment such as reduced pressure firing (Japanese Patent Application Laid-open No.
55-167110), attempts have been made to ease the temperature and pressure conditions for conversion by synthesizing and using a special hBN under special conditions using a gas phase method.
(発明が解決しようとする課題)
一方、本発明者は、先に、窒化ほう素(BN)
のもう1つの低圧相である菱面体晶窒化ほう素
(rBN)が立方晶窒化ほう素(cBN)と結晶構造
上の対応関係にあることに着目し、rBNに衝撃
圧を加えることにより、直接cBNに転換するこ
とに成功した(特許第1290649号)。しかし、この
方法は、rBNに多量の圧力媒体を混合するため、
金属の汚染があり、更には衝撃圧は接続時間がマ
イクロ秒程度と極めて短いため、微粒子のcBN
しか得られない等の問題があつた。(Problems to be Solved by the Invention) On the other hand, the present inventor has previously discovered that boron nitride (BN)
We focused on the fact that rhombohedral boron nitride (rBN), another low-pressure phase, has a crystal structure correspondence with cubic boron nitride (cBN). Successfully converted to cBN (Patent No. 1290649). However, this method mixes a large amount of pressure medium with rBN, so
There is metal contamination, and furthermore, the contact time of impact pressure is extremely short, on the order of microseconds, so fine particle cBN
There were some problems, such as not being able to get much.
本発明は、上述の菱面体晶窒化ほう素(rBN)
の高圧下での転換による立方晶窒化ほう素
(cBN)の製造法における問題点を解決し、無触
媒で高純度のcBN粉末又は高密度焼結体を得る
方法を提供することを目的とするものである。 The present invention relates to the above-mentioned rhombohedral boron nitride (rBN).
The purpose of the present invention is to solve the problems in the production method of cubic boron nitride (cBN) by converting it under high pressure, and to provide a method for obtaining high-purity cBN powder or high-density sintered body without a catalyst. It is something.
(課題を解決するための手段)
前記問題点に鑑みて、本発明者は、高温下で長
時間加圧することによつて解決する方策について
研究した結果、実験に必要なrBNの合成法を確
立でき、これに基づいてcBNへの転換実験を重
ねた結果、静的高温高圧下でrBNを処理するこ
とにより、無触媒でcBNに転換できる条件を見
い出し、ここに本発明を完成したものである。(Means for Solving the Problems) In view of the above-mentioned problems, the present inventor conducted research on a solution to the problem by applying pressure at high temperatures for a long period of time, and as a result, established a method for synthesizing rBN necessary for experiments. Based on this, as a result of repeated conversion experiments to cBN, we found conditions under which rBN could be converted to cBN without a catalyst by processing it under static high temperature and high pressure conditions, thus completing the present invention. .
すなわち、本発明は、菱面体晶窒化ほう素に高
圧を加えて立方晶窒化ほう素に転換するに際し、
圧力が5GPa以上の静的高圧であり、加圧時の温
度が1500℃以上の高温である条件にて処理するこ
とを特徴とする立方晶窒化ほう素の製造法を要旨
とするものである。 That is, in the present invention, when converting rhombohedral boron nitride into cubic boron nitride by applying high pressure,
The gist of the present invention is a method for producing cubic boron nitride, which is characterized by processing under static high pressure conditions of 5 GPa or higher and high temperature conditions of 1500° C. or higher during pressurization.
以下に本発明を更に詳細に説明する。 The present invention will be explained in more detail below.
(作用)
本発明法は、菱面体晶窒化ほう素(rBN)と
立方晶窒化ほう素(cBN)とが結晶構造上の対
応関係にあることを利用して、rBNに静的高温
高圧力を加えることにより、容易にcBNに転換
するcBNの合成法である。(Operation) The method of the present invention uses the fact that rhombohedral boron nitride (rBN) and cubic boron nitride (cBN) have a corresponding relationship in their crystal structures, and statically applies high temperature and high pressure to rBN. This is a cBN synthesis method that easily converts to cBN by adding
特に、原料に特殊な前処理を施す等の煩雑な工
程がなく、例えば、固体原料を常圧下で加熱す
る、といつたような簡易な方法で得られるrBN
を原料とし、例えば1800℃、6Gpaといつた通常
のcBN合成に用いる高温高圧条件で、無触媒で
cBNを合成でき、cBNの高純度粉末及び高密度
焼結体を得ることができる。 In particular, rBN can be obtained by a simple method such as heating a solid raw material under normal pressure, without requiring complicated processes such as special pre-treatment of the raw material.
is used as a raw material, and is processed without a catalyst under the high-temperature, high-pressure conditions used for conventional cBN synthesis, such as 1800℃ and 6Gpa.
cBN can be synthesized, and high-purity cBN powder and high-density sintered bodies can be obtained.
原料の菱面体晶窒化ほう素(rBN)としては、
できるだけ純粋で結晶性のよいものが好ましく、
例えば、以下の方法で得られるものを用いる。 The raw material rhombohedral boron nitride (rBN) is
Preferably, it is as pure as possible and has good crystallinity.
For example, one obtained by the following method is used.
ほう水素化ナトリウム等のほう水素化物と塩
化アンモニウム等のアンモニウム塩とを加熱
し、又は反応途中でシアン化物を加えて加熱す
る方法(特願昭59−190967号、「無機材質研究
所研究報告」第46号第11章参照)。 A method of heating a borohydride such as sodium borohydride and an ammonium salt such as ammonium chloride, or adding cyanide during the reaction and heating (Patent Application No. 1989-190967, "Inorganic Materials Research Institute Research Report") (See No. 46, Chapter 11).
ほう素酸化物を加熱気化し、シアンを含むガ
スで還元する方法(特許第1290648号)。 A method of heating and vaporizing boron oxide and reducing it with a gas containing cyanide (Patent No. 1290648).
酸化ほう素、ほう酸又はほう酸塩をシアン化
合物で還元する方法。 A method of reducing boron oxide, boric acid or borate with cyanide.
原料のrBNはrBNの含有率、BNとしての純度
が高く、結晶性の良いものほど、cBNへの転換
率が高く、高品質のcBN焼結体が得られる。こ
の点、前記の方法によると、BNとしての純度
が99%以上で、rBNの含有率が90%以上、平均
結晶粒径数百ナノメータのものが容易に得られ、
また、通常のhBNが幅と厚みの比が10対1以上
の薄板状の結晶子からなるのに対し、このrBN
の結晶子は、例えばその比が3対1と小さいた
め、充填し易く配向性がないなどの点で優れてい
る。前記の方法はホイスカーとしてrBNの含
有率の高い原料が得られるが収量が少ない。この
点、前記の方法で得られるものは多量のhBN
との混合物であるが、合成法が簡便である点で優
れている。 The raw material rBN has a higher rBN content and purity as BN, and the better the crystallinity, the higher the conversion rate to cBN, and the higher the quality of the cBN sintered body. In this regard, according to the above method, BN with a purity of 99% or more, an rBN content of 90% or more, and an average crystal grain size of several hundred nanometers can be easily obtained.
Also, while normal hBN consists of thin plate-like crystallites with a width to thickness ratio of 10:1 or more, this rBN
The crystallites have a small ratio of 3:1, for example, and are therefore excellent in that they are easy to fill and have no orientation. Although the above method provides a raw material with a high content of rBN as whiskers, the yield is low. In this respect, what can be obtained by the above method is a large amount of hBN.
Although it is a mixture of
合成した菱面体晶窒化ほう素(rBN)は、そ
のままでは出発物質の残存や水洗時の水和等があ
る場合があるので、窒素ガス中で2100℃に加熱す
る等、高純度化処理して用いるのが好ましく、特
に、高品質のcBNの焼結体を得ようとする場合
には必要である。 Synthesized rhombohedral boron nitride (rBN) may have residual starting materials or hydration during washing, so it is purified by high purification treatment such as heating to 2100℃ in nitrogen gas. It is preferable to use it, and it is especially necessary when trying to obtain a high quality cBN sintered body.
菱面体晶窒化ほう素(rBN)に対する高温高
圧処理の条件は、1500℃以上、5GPa以上のcBN
の熱力学的安定域の温度と圧力が必要であり、好
ましくは5.5GPa以上、1600℃以上、更に好まし
くは6.0GPa以上、1800℃以上であり、圧力、温
度が高いほどcBNへの転換率が高く、また高密
度の焼結体が得られる。 The conditions for high-temperature, high-pressure treatment of rhombohedral boron nitride (rBN) are cBN of 1500°C or higher and 5GPa or higher.
The temperature and pressure are required to be in the thermodynamic stability range, preferably 5.5GPa or higher and 1600℃ or higher, more preferably 6.0GPa or higher and 1800℃ or higher.The higher the pressure and temperature, the higher the conversion rate to cBN. A high-density sintered body can be obtained.
なお、高圧装置は、上記の温度圧力を発生でき
るものであればよく、例えば、黒鉛発熱体を備え
たベルト型装置が使用できる。rBN原料の高圧
装置への充填は、粉末のままでもよいが、冷間成
型又は焼結した方が、潰れ代が少なく、また、発
熱体や圧力媒体からの汚染があるので、rBN原
料をタンタルフオイル等で被つて充填するのが好
ましい。 Note that the high-pressure device may be any device that can generate the above-mentioned temperature and pressure, and for example, a belt-type device equipped with a graphite heating element can be used. The rBN raw material can be filled into a high-pressure device as a powder, but it is better to cold-form or sinter it, since there is less crushing allowance and there is contamination from the heating element and pressure medium. It is preferable to cover and fill with foil or the like.
高温高圧処理は、通常の手順に従つて、加圧昇
温し保持した後、温度圧力の順に下げて試料を取
り出す。 In the high-temperature and high-pressure treatment, according to the usual procedure, the pressure and temperature are raised and held, and then the temperature and pressure are lowered in order and the sample is taken out.
かくして得られる加圧試料は、白色或いは淡褐
色の粉末若しくは焼結体、又は透光性の高密度焼
結体であり、X線回析法によれば、100%cBN又
は一部非晶質化した原料とcBNとの混合物であ
る。 The pressurized sample thus obtained is a white or light brown powder or sintered body, or a translucent high-density sintered body, and according to X-ray diffraction, it is 100% cBN or partially amorphous. It is a mixture of cBN and cBN.
(実施例) 次に本発明に実施例を示す。(Example) Next, examples of the present invention will be shown.
実施例 1
ほう窒化ナトリウムと塩化アンモニウムとを混
合し、窒素気流中で600℃に加熱した後、一旦冷
却してシアン化カリウムを加え、再び1030℃に24
時間加熱して冷却、水洗することにより、平均結
晶粒径250nmのrBNを主成分とする粉末を得、
更にこれを窒素気流中でモリブデン発熱体を用い
て2100℃に3時間加熱して、rBNの含有率95%
以上で分析精度内で100%のBNからなる出発物
質を得た(第1図、第2図参照)。Example 1 Sodium boronitride and ammonium chloride were mixed, heated to 600°C in a nitrogen stream, cooled once, potassium cyanide was added, and heated again to 1030°C for 24 hours.
By heating for a period of time, cooling, and washing with water, a powder mainly composed of rBN with an average crystal grain size of 250 nm was obtained.
This was then heated to 2100°C for 3 hours using a molybdenum heating element in a nitrogen stream, resulting in an rBN content of 95%.
In this way, a starting material consisting of 100% BN was obtained within the analytical precision (see Figures 1 and 2).
次いで、これを冷間プレスして直径6mm、厚さ
2mmの円盤状に成型し、タンタルフオイルで囲つ
て高圧装置に充填し、1800℃、6GPaの温度圧力
で30分間保持した後、冷却減圧して試料を取り出
した。 Next, this was cold pressed into a disk shape with a diameter of 6 mm and a thickness of 2 mm, surrounded by tantalf oil and filled into a high-pressure device, held at a temperature and pressure of 1800°C and 6 GPa for 30 minutes, and then cooled and decompressed. The sample was taken out.
得られた試料は、乳白色透光性の焼結体であ
り、X線回析の結果、100%cBNであることが確
認され(第3図参照)、またアルキメデス法によ
る測定の結果、ほぼ理論密度(3.48)をもち、硬
度測定の結果、6000Kg/mm2以上の高い値をもつこ
とが確認された。 The obtained sample was a milky-white translucent sintered body, and as a result of X-ray diffraction, it was confirmed that it was 100% cBN (see Figure 3), and as a result of measurement using the Archimedes method, it was confirmed that it was almost the same as the theory. It has a density (3.48), and hardness measurements confirmed that it has a high value of 6000Kg/mm 2 or more.
実施例 2
実施例1と同様のシステムで6.0GPa、1800℃
で処理したところ、淡褐色を帯びた100%cBNの
焼結体を得た。Example 2 6.0GPa, 1800℃ using the same system as Example 1
When treated with , a 100% cBN sintered body with a light brown color was obtained.
実施例 3
実施例1と同様のシステムで5.5GPa、1600℃
で処理したところ、一部非晶質化した原料と
cBNが混在するBN塊を得た。Example 3 5.5GPa, 1600℃ using the same system as Example 1
When treated with
A BN mass containing cBN was obtained.
(発明の効果)
以上詳述したように、本発明によれば、菱面体
晶窒化ほう素(rBN)と立方晶窒化ほう素
(cBN)の結晶構造上の対応関係を利用するた
め、六方晶BN(hBN)を用いる場合のような特
殊な前処理を施すことなく、無触媒でcBNに転
換でき、高純度cBNが得られるばかりでなく、
cBN緻密焼結体が得られる。したがつて、例え
ば、半導体の放熱基板に好適である。(Effects of the Invention) As detailed above, according to the present invention, since the correspondence relationship in the crystal structure of rhombohedral boron nitride (rBN) and cubic boron nitride (cBN) is utilized, hexagonal boron nitride It can be converted to cBN without a catalyst without any special pre-treatment like when using BN (hBN), and not only can high-purity cBN be obtained.
A dense cBN sintered body is obtained. Therefore, it is suitable for use as a heat dissipation substrate for semiconductors, for example.
また、出発原料のrBNは常圧下での反応で合
成できるので、従来法に比べて、原料の合成、制
御が容易となる。 Furthermore, since the starting material rBN can be synthesized by reaction under normal pressure, the synthesis and control of the starting material is easier than with conventional methods.
第1図は実施例で用いた出発原料rBNのX線
回析図、第2図は実施例で用いた出発原料rBN
の粒子構造についてのSEM像を示す図、第3図
は実施例で得られたcBN焼結体のX線回析図で
ある。
Figure 1 is an X-ray diffraction diagram of the starting material rBN used in the examples, and Figure 2 is the starting material rBN used in the examples.
Figure 3 is an X-ray diffraction diagram of the cBN sintered body obtained in the example.
Claims (1)
化ほう素に転換するに際し、圧力が5GPa以上の
静的高圧であり、加圧時の温度が1500℃以上の高
温である条件にて処理することを特徴とする立方
晶窒化ほう素の製造法。 2 得られる立方晶窒化ほう素の形態が緻密焼結
体である請求項1に記載の方法。 3 菱面体晶窒化ほう素原料が、菱面体晶窒化ほ
う素を90%以上含有し、その平均結晶粒径が10n
m以上のものである請求項1又は2に記載の方
法。 4 菱面体晶窒化ほう素原料が、ほう水素化物と
ハロゲン化アンモニウムとを加熱反応させて得ら
れたもの、又はこれにシアン化物を作用させて得
られたもののいずれかである請求項3に記載の方
法。[Claims] 1. When high pressure is applied to rhombohedral boron nitride to convert it into cubic boron nitride, the pressure is a static high pressure of 5GPa or more, and the temperature at the time of pressurization is a high temperature of 1500°C or more. A method for producing cubic boron nitride, characterized by processing under certain conditions. 2. The method according to claim 1, wherein the cubic boron nitride obtained is in the form of a dense sintered body. 3 The rhombohedral boron nitride raw material contains 90% or more of rhombohedral boron nitride, and the average crystal grain size is 10n.
The method according to claim 1 or 2, wherein the method is at least m. 4. According to claim 3, the rhombohedral boron nitride raw material is either one obtained by subjecting a boron hydride to a heating reaction with ammonium halide, or one obtained by reacting this with cyanide. the method of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1209843A JPH0372940A (en) | 1989-08-14 | 1989-08-14 | Manufacturing method of cubic boron nitride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1209843A JPH0372940A (en) | 1989-08-14 | 1989-08-14 | Manufacturing method of cubic boron nitride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0372940A JPH0372940A (en) | 1991-03-28 |
| JPH0478335B2 true JPH0478335B2 (en) | 1992-12-10 |
Family
ID=16579541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1209843A Granted JPH0372940A (en) | 1989-08-14 | 1989-08-14 | Manufacturing method of cubic boron nitride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0372940A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2725733B2 (en) * | 1991-12-07 | 1998-03-11 | 科学技術庁無機材質研究所長 | Manufacturing method of sphalerite type boron nitride sintered compact varistor |
| JPH11322310A (en) * | 1998-05-11 | 1999-11-24 | Sumitomo Electric Ind Ltd | Cubic boron nitride polycrystalline abrasive and method for producing the same |
| WO2001036081A1 (en) * | 1999-11-19 | 2001-05-25 | De Beers Industrial Diamonds (Proprietary) Limited | Cubic boron nitride clusters |
| KR100903910B1 (en) * | 2003-02-03 | 2009-06-19 | 쇼와 덴코 가부시키가이샤 | Cubic Boron Nitride and Grinding Stones Using the Same |
| GB201105381D0 (en) * | 2011-03-30 | 2011-05-11 | Element Six Ltd | Cubic boron nitride grit and tools comprising same |
| JP7066169B2 (en) * | 2018-02-01 | 2022-05-13 | 国立研究開発法人物質・材料研究機構 | Method for Producing Cubic or Hexagonal Boron Nitride |
| CN109503174A (en) * | 2018-11-29 | 2019-03-22 | 盐城师范学院 | A kind of preparation method of ultra-thin cubic boron nitride film |
-
1989
- 1989-08-14 JP JP1209843A patent/JPH0372940A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0372940A (en) | 1991-03-28 |
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