JPH0481504B2 - - Google Patents
Info
- Publication number
- JPH0481504B2 JPH0481504B2 JP59222565A JP22256584A JPH0481504B2 JP H0481504 B2 JPH0481504 B2 JP H0481504B2 JP 59222565 A JP59222565 A JP 59222565A JP 22256584 A JP22256584 A JP 22256584A JP H0481504 B2 JPH0481504 B2 JP H0481504B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- nonwoven fabric
- aramid
- printed wiring
- manufactured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920005989 resin Polymers 0.000 claims description 58
- 239000011347 resin Substances 0.000 claims description 58
- 239000004760 aramid Substances 0.000 claims description 56
- 229920003235 aromatic polyamide Polymers 0.000 claims description 55
- 239000004745 nonwoven fabric Substances 0.000 claims description 46
- 239000003822 epoxy resin Substances 0.000 claims description 22
- 229920000647 polyepoxide Polymers 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 12
- 229920001971 elastomer Polymers 0.000 claims description 9
- 239000005060 rubber Substances 0.000 claims description 9
- 239000011342 resin composition Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 25
- 238000000034 method Methods 0.000 description 21
- 239000011889 copper foil Substances 0.000 description 19
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 239000010410 layer Substances 0.000 description 17
- 239000004593 Epoxy Substances 0.000 description 12
- 239000011230 binding agent Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 8
- 238000010292 electrical insulation Methods 0.000 description 8
- 239000011888 foil Substances 0.000 description 8
- -1 polyethylene terephthalate Polymers 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 239000000835 fiber Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 238000003475 lamination Methods 0.000 description 5
- 229920006267 polyester film Polymers 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 150000001879 copper Chemical class 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000006082 mold release agent Substances 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229920002681 hypalon Polymers 0.000 description 3
- 238000005470 impregnation Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 229920000784 Nomex Polymers 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000012787 coverlay film Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004763 nomex Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- GRWFFFOEIHGUBG-UHFFFAOYSA-N 3,4-Epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclo-hexanecarboxylate Chemical class C1C2OC2CC(C)C1C(=O)OCC1CC2OC2CC1C GRWFFFOEIHGUBG-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000005997 Calcium carbide Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- SIWFRAYSJGYECR-UHFFFAOYSA-N cyclopentadiene dioxide Chemical class C1C2OC2C2OC12 SIWFRAYSJGYECR-UHFFFAOYSA-N 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920005558 epichlorohydrin rubber Polymers 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- QZUPTXGVPYNUIT-UHFFFAOYSA-N isophthalamide Chemical compound NC(=O)C1=CC=CC(C(N)=O)=C1 QZUPTXGVPYNUIT-UHFFFAOYSA-N 0.000 description 1
- 229920003049 isoprene rubber Polymers 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002755 poly(epichlorohydrin) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- CLZWAWBPWVRRGI-UHFFFAOYSA-N tert-butyl 2-[2-[2-[2-[bis[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]amino]-5-bromophenoxy]ethoxy]-4-methyl-n-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]anilino]acetate Chemical compound CC1=CC=C(N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)C(OCCOC=2C(=CC=C(Br)C=2)N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)=C1 CLZWAWBPWVRRGI-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/281—Applying non-metallic protective coatings by means of a preformed insulating foil
Landscapes
- Laminated Bodies (AREA)
- Reinforced Plastic Materials (AREA)
Description
(産業上の利用分野)
本発明は耐熱寸法安定性、耐ハンダ性、電気絶
縁性、機械的性質の優れたフレキシブルプリント
配線板に関する。
(従来技術)
近年、フレキシブルプリント配線板(以後フラ
ツトケーブル、集積回路チツプキヤリアーテープ
を含め広義に用いる)は、電子機器の小型化、軽
量化、薄物化、高密度化の流れの中で、その需要
が増大している。
フレキシブルプリント配線板に使用される基材
やそのカバーレイフイルムとして使用されている
のは主としてポリエチレンテレフタレートフイル
ムとポリイミドフイルムであり、その他に僅かに
ガラスクロス強化エポキシ樹脂シートやアラミツ
ド紙が使われている。
(発明が解決しようとする問題点)
ポリエステルフイルムは優れた機械的性質、電
気的性質、耐薬品性などを有しているが、耐熱性
は充分とはいえず、ハンダ付け工程で200〜230℃
の様な温度に加熱されても収縮率が大きく使用が
著しく制限されている。ポリイミドフイルムは優
れた機械的性質、耐熱性を有しているが耐水性が
悪く、カバーレイの積層工程やハンダ工程で充分
な水分の管理が必要なほか吸湿による電気特性の
低下も問題である。又価格も高い点も、問題の一
つである。ガラスクロス強化エポキシ樹脂シート
は電気絶縁性や耐薬品性、耐湿性などでは優れて
いるがフレキシブルプリント配線板に要求される
可撓性が非常に悪い点が致命的である。アラミツ
ド紙(デユポン社製ノーメツクス
ペーパー)を
フイルムの代りとして使用している例もあるが、
耐水性、耐寸法変化、カーリングなど実用上問題
が多い。
以上の様に現在のフレキシブルプリント配線板
は、各々、問題をかゝえている。
(問題点を解決するための手段)
本発明はこれらの問題点を解決した新しいタイ
プのフレキシブルプリント配線板を提供するもの
である。
すなわち本発明は芳香族ポリアミドを主成分と
する不織布に、エポキシ樹脂およびゴム系樹脂か
らなる樹脂組成物を含浸させた電気絶縁層を基材
および/又はカバーレイに使用したことを特徴と
するフレキシブルプリント配線板である。
本発明に用いる芳香族ポリアミドを主成分とす
る不織布に於いて、芳香族ポリアミド(以下アラ
ミツドと称す)の種類は特に限定はないが、通常
次の構造単位から成る。
式1:−HN−R1−NHOCR2CO−
式2:−HNR3CO−
(式中、R1,R2,R3は置換されたもしくは置換
されない芳香環であつて、
(Industrial Application Field) The present invention relates to a flexible printed wiring board having excellent heat-resistant dimensional stability, solder resistance, electrical insulation, and mechanical properties. (Prior art) In recent years, flexible printed wiring boards (hereinafter broadly used to include flat cables and integrated circuit chip carrier tapes) have become increasingly popular as electronic devices become smaller, lighter, thinner, and more dense. , the demand for it is increasing. The base materials used for flexible printed wiring boards and their coverlay films are mainly polyethylene terephthalate film and polyimide film, with a small amount of glass cloth reinforced epoxy resin sheets and aramid paper also being used. . (Problems to be solved by the invention) Although polyester film has excellent mechanical properties, electrical properties, and chemical resistance, its heat resistance is not sufficient, and it ℃
Even when heated to such temperatures, the shrinkage rate is large and its use is severely restricted. Although polyimide film has excellent mechanical properties and heat resistance, it has poor water resistance, and requires sufficient moisture control during the coverlay lamination process and soldering process, as well as deterioration of electrical properties due to moisture absorption. . Another problem is that it is expensive. Although glass cloth-reinforced epoxy resin sheets have excellent electrical insulation, chemical resistance, and moisture resistance, they suffer from extremely poor flexibility, which is required for flexible printed wiring boards. In some cases, aramid paper (Nomex Paper manufactured by Dupont) is used in place of film.
There are many practical problems such as water resistance, dimensional change resistance, and curling. As described above, current flexible printed wiring boards each have their own problems. (Means for Solving the Problems) The present invention provides a new type of flexible printed wiring board that solves these problems. That is, the present invention provides a flexible material in which an electrically insulating layer made by impregnating a nonwoven fabric mainly composed of aromatic polyamide with a resin composition consisting of an epoxy resin and a rubber resin is used as a base material and/or a coverlay. It is a printed wiring board. In the nonwoven fabric mainly composed of aromatic polyamide used in the present invention, the type of aromatic polyamide (hereinafter referred to as aramid) is not particularly limited, but it usually consists of the following structural units. Formula 1: -HN-R 1 -NHOCR 2 CO- Formula 2: -HNR 3 CO- (wherein R 1 , R 2 , R 3 are substituted or unsubstituted aromatic rings,
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】 (但しXは−O−、−S−、【formula】 (However, X is -O-, -S-,
【式】−CH2−、[Formula] −CH 2 −,
【式】等である。R1,R2,R3の芳香環への
置換基として炭素原子数1〜3のアルキル基、塩
素原子、臭素原子、フエニル基がある。)本発明
におけるアラミツドとしては、上記式1又は/お
よび式2で示される構造単位を有する芳香族ポリ
アミド重合体(共重合体を含む)があり、好まし
くはポリメタフエニレンイソフタルアミドあるい
はポリパラフエニレンテレフタルアミドである。
アラミツド不織布(本発明に於いては云わゆる
紙も含める)の製造は、乾式法、湿式法いずれの
方法も可能である。乾式法にはカード方式(ウー
レンカード、ガーネツトなどを用いるウエブ形
成)と気流方式(ランドウエブ、プロクタウエ
ブ、ハンタウエブ)があり、湿式法は通常の抄紙
機を用いる方法である。本発明のアラミツド不織
布は乾式法では気流方式、あるいは湿式法で形成
したものが特に望ましい。それは不織布の繊維の
配向に方向性があると、フレキシブルプリント配
線板の機械的性質、寸法変化率などに方向性が現
われて、都合が悪いからである。不織布中の芳香
族ポリアミド繊維間の結合は、機械的な接合、あ
るいは/および結合剤による接合のいずれでもよ
いが、本発明に用いる不織布は結合材による接合
が好ましい(この方が厚みの薄い不織布が得られ
る)。
結合材として好ましく使用されるものは、アラ
ミツド繊維状結合材、あるいは熱可塑性耐熱性ポ
リマーの繊維状結合材(ポリエチレンテレフタレ
ートなどのポリエステル、6,6−ナイロンなど
のポリアミド、ポリスルホン、ポリフエニレンス
ルフイドなど)がある。勿論通常の合成繊維不織
布や紙に用いられる水溶性あるいは水分散性の結
合材あるいは粉末状の結合材、溶剖可溶性の結合
材も使用可能である。
本発明の芳香族ポリアミドを主成分とする不織
布は、アラミツド成分を60重量%、好ましくは70
重量%、特に好ましくは90重量%以上含有する。
アラミツド成分としては、アラミツド短繊維、結
合材たとえばアラミツド繊維状結合材(通常アラ
ミツドフイブリツド)がある。不織布中のアラミ
ツド以外の成分は主として先に挙げたアラミツド
以外の結合材や他の合成樹脂短繊維やガラス短繊
維、セラミツク短繊維等である。
アラミツド短繊維は通常1.5〜10デニール、カ
ツト長5〜100mm、好ましくは5〜80mmである。
本発明に用いるアラミツド不織布の厚さは20μ
〜150μ、好ましくは30μ〜60μであり、米坪量と
しては10g/m2〜50g/m2、好ましくは15g/m2〜
50g/m2である。
本発明のフレキシブルプリント配線板に於ける
一つの特徴はアラミツド不織布に樹脂を含浸させ
た電気絶縁層を用いる点であり、不織布の内部お
よび両表面層に樹脂が存在する。この為、従来ア
ラミツド紙を貼り合わせたタイプのフレキシブル
プリント配線板が()カーリング、()耐水
性が悪い、()絶縁層(アラミツド不織布の組
織)の中への薬液の侵入による劣化、()ボイ
ドによる貫層耐電圧が低いなどの欠点を有してい
たのに対し、本発明のフレキシブルプリント配線
板ではこれらの欠点を解消できる。
アラミツド不織布中に樹脂を完全に含浸させる
為に、本発明に用いるアラミツド不織布の見掛け
密度は0.15g/cm3〜0.5g/cm3が好ましく、その為
本発明のアラミツド不織布は結合材以外の短繊維
成分を全体の60重量%以上含むことが好ましい。
又アラミツド紙と樹脂との接着性を高める目的
で種々の表面処理を施してもよい。
本発明の絶縁層を構成する樹脂はエポキシ樹
脂/ゴム系樹脂=20/80〜70/30(重量比)の範
囲にある。エポキシ樹脂とは分子中に1個以上好
ましくは2個以上のエポキシ環を含有する化合物
であり、エポキシ化合物の硬化剤、硬化触媒など
は、エポキシ樹脂の重量には含ませない。エポキ
シ樹脂/ゴム系樹脂の比が20/80より小さいと、
耐ハンダ性、耐薬品性、耐熱老化性が悪くなり、
不都合である。又、70/30より大きいと、可撓性
が悪くなり、不都合である。
エポキシ化合物として、ビスフエノールにエピ
クロルヒドリンを反応させて得られるビスフエノ
ール型エポキシ化合物、ノボラツク型のフエノー
ル樹脂やクレゾール樹脂にエピクロルヒドリンを
反応させて得られるノボラツク型エポキシ化合
物、その他グリセロール系エポキシ化合物(グリ
セロールジグリシジルエーテル等)、環状脂肪族
系エポキシ化合物(シクロペンタジエンダイオキ
サイド、3,4−エポキシ−6−メチルシクロヘ
キシルメチル−3,4−エポキシ−6−メチルシ
クロヘキサンカルボキシレート、ポリブタジエン
から誘導されるエポキシ化合物等)、含窒素エポ
キシ化合物又これらのエポキシ化合物の水素原子
の1ケ以上が臭素化されているハロゲン化エポキ
シ化合物が挙げられる。通常エポキシ当量180〜
1000くらいものが好ましい。
硬化剤としてアミン(エチレンジアミン、ジエ
チレントリアミン、トリエチレンテトラミン、メ
タフエニレンジアミン、p,p′−ジアミノジフエ
ニルメタン、ナフチレンジアミン、ジシアンジア
ミド、ジフエニルジアミノスルホン、イミダゾー
ル誘導体等)、カルボン酸又は/およびカルボン
酸無水物(無水コハク酸、無水フタル酸、無水ト
リメリツト酸、無水ピロメリツト酸、3,3′,
4,4′−ベンゾフエノンテトラカルボン酸無水物
など)、ポリアミド樹脂、ポリサルフアイド樹脂、
フエノールホルマリン樹脂、メラミン樹脂、アニ
リン樹脂などを挙げることができる。
触媒としてはルイス酸(三弗化硼素など)、三
級アミン(ジメチルベンジルアミンなど)、四級
アンモニウム塩などが挙げられる。
本発明の絶縁層を構成する樹脂成分のうち、エ
ポキシ樹脂は電気絶縁性、機械的性質、耐水性、
耐溶剤性、耐熱性などが優れた樹脂であり、この
樹脂成分がプリント配線板に上記性能を賦与する
のに効果がある。一方、エポキシ樹脂は通常硬
く、脆い為、フレキシブルプリント配線板用とし
ては可撓性や強靭性を賦与する必要があり、可撓
性や強靭性を賦与する樹脂成分として、ゴム系樹
脂成分を添加する。この成分はエポキシ樹脂と化
学的に結合するものが好ましいが、単に混合され
たものであつてもよいし、一部分が結合し、一部
分が混合しているものであつてもよい。
この様な可撓性や強靭性を賦与するゴム系樹脂
成分(あるいは/および樹脂成分を形成する単量
体やオリゴマーであつてもよい)として、イソプ
レンゴム、クロロプレンゴム、ニトリル/ブタジ
エンゴム、アクリルゴム、エピクロルヒドリンゴ
ム、クロルスルホン化ポリエチレン、シリコーン
ゴム、弗素系ゴム、ポリウレタン(ポリエステル
ウレタン、ポリエーテルウレタンなど)、共重合
ポリエステル、共重合ポリアミドなどの熱可塑性
エラストマーなどを例示することができる。
なお本発明の樹脂中には、本発明の性能を損わ
ない範囲内で滑剤(シリカ、タルク、シリコーン
など)、難燃剤(ハロゲン化物、リン化合物、水
酸化アルミニウム、三酸化アンチモン等)、安定
剤(酸化防止剤、紫外線吸収剤、重合禁止剤等)、
離型剤(シリコーン系、弗素系、無機系)、その
他無機、有機充填剤(タルク、酸化チタン、弗素
系ポリマー微粒子、顔料、染料、炭化カルシウム
など)を添加してもよい。
本発明に特有の電気絶縁層をカバーレイ又は/
および基材に用いたフレキシブル配線板とは、
(1) 本発明に特有な電気絶縁層を基材にし、その
少くとも片面に導電体のパターンを形成したも
のである。導電体パターンの形成法としては、
アデイテイブ法、サブトラクテイブ法(エツチ
ドフオイル法)の通常の技術が用いられる。サ
ブトラクテイブ法の場合、予め基材と金属箔
(銅箔、アルミニウム箔など)が積層されたシ
ートを製造する。金属箔と基材を接着剤を界し
て積層してもよいし、接着性を有する状態の基
材を接着剤を用いることなく積層することも出
来る。
(2) 本発明に特有な電気絶縁層をフレキシブルプ
リント配線板のカバーレイに用いる場合であ
る。アラミツド不織布を内部に含む樹脂シート
を予め作り、これに接着剤をコーテイングした
通常のカバーレイフイルムと同様な形態として
用いる場合アラミツド不織布を内部に含有する
樹脂層自体が接着性を有する場合は更に接着剤
をコーテイングすることなくカバーレイとして
用いることが出来る。
本発明に特有の電気絶縁層を上記(1)のフレキシ
ブルプリント配線板の基材のみに用いてもよい
し、上記(2)のカバーレイにのみ用いてもよいし、
又上記(1),(2)共同時に用いてもよい。基材又は/
およびカバーレイとして本発明の電気絶縁層が用
いられていると、フレキシブルプリント配線板に
要求される耐熱寸法安定性、配線板全体としての
腰の強さ(これは部品実装時やその他の加工時あ
るいは取扱う際の作業性を向上させるのに役に立
つ)を賦与する。又、同時にこの電気絶縁層は電
気絶縁性、耐ハンダ性、耐薬品性、引き裂き性、
可撓性などに優れている。
本発明に特有な芳香族ポリアミドを主成分とす
る不織布に樹脂を含浸させた電気絶縁層を形成す
る方法について述べる。先に記した不織布にエポ
キシ樹脂溶液を含浸し、要すれば溶媒を乾燥後、
硬化させればよい。但し、接着剤を用いずに金属
箔を貼り合わせたり、配線板にカバーレイとして
貼り合わす場合は、熱接着性を未だ有している間
に加熱・加圧により貼り合わせた後、硬化を行
い、所望の性能を有する電気絶縁層を形成する。
アラミツド不織布に樹脂溶液を含浸させる代り
に予め、固形の樹脂シートを形成しておき、アラ
ミツド不織布を間にははさんで加熱、加圧するこ
とにより、アラミツド不織布に樹脂を含浸させた
電気絶縁層を形成させることも可能である。
アラミツド不織布への樹脂溶液の含浸は通常用
いられている水平式、あるいは/および垂直式の
含浸機を用いることが出来、1回あるいは複数回
の含浸を行うことも出来る。又アラミツド不織布
の片面からコーテイング(塗工)することも出
来、次いで要すれば反対面からコーテイングす
る、云わゆるコーテイグ法も採用できる。
含浸あるいは/およびコーテイング後の乾燥も
特別のものを必要としない。乾燥後の含浸シート
に粘着性があれば、適当な工程で随意、離型シー
トを使えばよい。離型シートは通常のセルロース
系の紙やフイルムに離型剤をコーテイングしたも
のや、ポリプロピレンフイルム、ポリビニルアル
コールフイルム等をそのまゝ用いることも出来
る。
(発明の効果)
以上述べて来た様に本発明のプリント配線板は
()アラミツド不織布を補強材として用いてお
り、熱寸法安定性に優れ、又、可撓性があり、同
時に腰も強く、作業性に優れる、()アラミツ
ド不織布が樹脂層の内部に存在する構造になつて
おり、このことにより(イ)フレキシブルプリント配
線板のカーリングが起こらない、(ロ)アラミツド紙
の欠点である耐水性の悪い点が、樹脂で充分被覆
されることにより、緩和される、(ハ)不織布中への
薬液の侵入がない、(ニ)ボイドが少い、()エポ
キシ樹脂の優れた電気絶縁性、耐水性、機械的性
質を残しつつ、変性による可撓性、強靭性が賦与
されている等の特徴を有し、フレキシブルプリン
ト配線板としてバランスのとれた性能を示すこと
が出来るのである。
(実施例)
次に実施例により本発明を更に詳しく説明す
る。実施例で用いた測定法は次の通りである。
(1) 回路形成は次の手順で行う。
() 銅張りシートの銅面に東洋紡(株)製紫外線
硬化型エツチングレジストインキUER110(青
色)を300メツシユポリエステル繊維張りスク
リーンを用い回路パターン状に印刷。
() 高圧水銀灯で、700mJ/cm2照射し、同レ
ジストを硬化させる。
() 38〜40°ボーメの塩化第2鉄溶液を用い、
40℃,100秒でエツチング。
() 4重量%苛性ソーダ水溶液でエツチング
レジストを剥離。
() 水洗、乾燥により所望の回路が形成され
る。
(2) 電気絶縁抵抗
(1)の回路形成法により回路幅1.0mm、回路間距
離1.0mm、回路長25mmで、電極接続用ランド(直
径5mmの円状)を設けた試験パターンを形成。両
端に直流500Vを1分間印加後の電気抵抗を測定。
測定器:横河ヒユーレツトパツカード社高絶縁
抵抗計4329A
(3) 電気絶縁破壊電圧
(2)の電気絶縁抵抗の測定と同じパターンを用
い、交流0.2〓流し、絶縁が破壊する電圧を読む。
測定器:国洋電機工業(株)耐圧絶縁自動試験器
MODEL MS−5
(4) 銅箔引き剥し強さ
(1)の回路形成法により幅1mm、長さ100mmの銅
箔パターンを作りIPC FC241により90°剥離。引
張り速度50mm/〓、
測定機:東洋精機(株)テンシロンUTM−型
(5) 耐折強度
(1)の回路形成法により幅15mmの基板の中央に2
mmの銅箔パターンをつくりMIT法(JIS P8115)
により測定、荷重500gR=1.0mm導通の切れるま
での回数を求めた。
(6) 熱収縮率(寸法変化率)
IPC FC241 C法により150℃×30分処理前後
の熱収縮率を求める。
(7) 耐ハンダ性
JIS C6481により膨れ、色の変化を観察する。
ポストフラツクスは田村化学研究所製ソルダーラ
イトMH820Vを使用。[Formula] etc. Substituents for the aromatic ring of R 1 , R 2 and R 3 include an alkyl group having 1 to 3 carbon atoms, a chlorine atom, a bromine atom, and a phenyl group. ) The aramid in the present invention includes aromatic polyamide polymers (including copolymers) having structural units represented by the above formula 1 and/or formula 2, preferably polymethaphenylene isophthalamide or polyparaphenylene isophthalamide. It is nylenterephthalamide. Aramid nonwoven fabric (including so-called paper in the present invention) can be produced by either a dry method or a wet method. The dry method includes a card method (web formation using woolen card, garnet, etc.) and an air flow method (land web, proctor web, hunter web), and the wet method uses an ordinary paper machine. The aramid nonwoven fabric of the present invention is particularly preferably formed by a dry method, an airflow method, or a wet method. This is because if the fiber orientation of the nonwoven fabric is directional, the mechanical properties, dimensional change rate, etc. of the flexible printed wiring board will be directional, which is not convenient. The bonding between the aromatic polyamide fibers in the nonwoven fabric may be mechanical bonding or/and bonding using a binder, but bonding using a binder is preferable for the nonwoven fabric used in the present invention (this is preferable for thin nonwoven fabrics). can get). Preferably used binders include aramid fibrous binders or thermoplastic heat-resistant polymer fibrous binders (polyesters such as polyethylene terephthalate, polyamides such as 6,6-nylon, polysulfone, polyphenylene sulfide). and so on. Of course, it is also possible to use water-soluble or water-dispersible binders, powdered binders, or dissected-soluble binders used for ordinary synthetic fiber nonwoven fabrics and paper. The nonwoven fabric mainly composed of aromatic polyamide of the present invention has an aramid component of 60% by weight, preferably 70% by weight.
It is contained in an amount of 90% by weight or more, particularly preferably 90% by weight or more.
The aramid component includes short aramid fibers and binders such as aramid fibrous binders (usually aramid fibrids). Components other than aramid in the nonwoven fabric are mainly binders other than aramid mentioned above, other short synthetic resin fibers, short glass fibers, short ceramic fibers, and the like. Aramid short fibers usually have a denier of 1.5 to 10 and a cut length of 5 to 100 mm, preferably 5 to 80 mm. The thickness of the aramid nonwoven fabric used in the present invention is 20μ
-150μ, preferably 30μ-60μ, and the basis weight is 10g/m 2 -50g/m 2 , preferably 15g/m 2 -
It is 50g/ m2 . One feature of the flexible printed wiring board of the present invention is that it uses an electrical insulating layer made of an aramid nonwoven fabric impregnated with resin, and the resin is present inside the nonwoven fabric and on both surface layers. For this reason, conventional flexible printed circuit boards with aramid paper laminated together suffer from () curling, () poor water resistance, () deterioration due to penetration of chemicals into the insulating layer (structure of the aramid nonwoven fabric), and () While the flexible printed wiring board of the present invention has drawbacks such as a low translayer withstand voltage due to voids, these drawbacks can be overcome with the flexible printed wiring board of the present invention. In order to completely impregnate the resin into the aramid nonwoven fabric, the apparent density of the aramid nonwoven fabric used in the present invention is preferably 0.15 g/cm 3 to 0.5 g/cm 3 . It is preferable that the fiber component is contained in an amount of 60% by weight or more of the total weight. Furthermore, various surface treatments may be applied to improve the adhesion between the aramid paper and the resin. The resin constituting the insulating layer of the present invention has an epoxy resin/rubber resin ratio in the range of 20/80 to 70/30 (weight ratio). An epoxy resin is a compound containing one or more, preferably two or more epoxy rings in its molecule, and the curing agent, curing catalyst, etc. of the epoxy compound are not included in the weight of the epoxy resin. If the ratio of epoxy resin/rubber resin is less than 20/80,
Solder resistance, chemical resistance, and heat aging resistance deteriorate,
It's inconvenient. Moreover, if it is larger than 70/30, the flexibility will be poor, which is inconvenient. Epoxy compounds include bisphenol-type epoxy compounds obtained by reacting bisphenol with epichlorohydrin, novolak-type epoxy compounds obtained by reacting epichlorohydrin with novolak-type phenolic resins and cresol resins, and other glycerol-based epoxy compounds (glycerol diglycidyl). ether, etc.), cycloaliphatic epoxy compounds (cyclopentadiene dioxide, 3,4-epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclohexanecarboxylate, epoxy compounds derived from polybutadiene, etc.) , nitrogen-containing epoxy compounds, and halogenated epoxy compounds in which one or more hydrogen atoms of these epoxy compounds are brominated. Usually epoxy equivalent: 180~
Something around 1000 is preferable. As curing agents, amines (ethylenediamine, diethylenetriamine, triethylenetetramine, metaphenylenediamine, p, p'-diaminodiphenylmethane, naphthylenediamine, dicyandiamide, diphenyldiaminosulfone, imidazole derivatives, etc.), carboxylic acids or/and carboxylic Acid anhydrides (succinic anhydride, phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, 3,3',
4,4′-benzophenonetetracarboxylic anhydride, etc.), polyamide resin, polysulfide resin,
Examples include phenol-formalin resin, melamine resin, and aniline resin. Examples of the catalyst include Lewis acids (such as boron trifluoride), tertiary amines (such as dimethylbenzylamine), and quaternary ammonium salts. Among the resin components constituting the insulating layer of the present invention, epoxy resin has electrical insulation, mechanical properties, water resistance,
It is a resin with excellent solvent resistance, heat resistance, etc., and this resin component is effective in imparting the above-mentioned performance to printed wiring boards. On the other hand, since epoxy resin is usually hard and brittle, it is necessary to impart flexibility and toughness for use in flexible printed wiring boards, and a rubber-based resin component is added as a resin component that imparts flexibility and toughness. do. This component is preferably one that chemically bonds with the epoxy resin, but it may be simply mixed, or one part may be bonded and the other part may be mixed. Rubber resin components (or/and monomers or oligomers forming the resin component) that provide such flexibility and toughness include isoprene rubber, chloroprene rubber, nitrile/butadiene rubber, and acrylic. Examples include thermoplastic elastomers such as rubber, epichlorohydrin rubber, chlorosulfonated polyethylene, silicone rubber, fluorine rubber, polyurethane (polyester urethane, polyether urethane, etc.), copolymer polyester, copolymer polyamide, and the like. The resin of the present invention may contain lubricants (silica, talc, silicone, etc.), flame retardants (halides, phosphorus compounds, aluminum hydroxide, antimony trioxide, etc.), and stabilizers within the range that does not impair the performance of the present invention. agents (antioxidants, ultraviolet absorbers, polymerization inhibitors, etc.),
A mold release agent (silicone type, fluorine type, inorganic type) and other inorganic or organic fillers (talc, titanium oxide, fluorine type polymer fine particles, pigment, dye, calcium carbide, etc.) may be added. Coverlay or/and electrically insulating layer specific to the present invention
And the flexible wiring board used as the base material is: (1) The base material is an electrically insulating layer unique to the present invention, and a conductor pattern is formed on at least one side of the base material. As a method for forming a conductor pattern,
Conventional techniques such as additive and subtractive methods (etched oil method) are used. In the case of the subtractive method, a sheet is produced in which a base material and metal foil (copper foil, aluminum foil, etc.) are laminated in advance. The metal foil and the base material may be laminated with an adhesive between them, or the base materials having adhesive properties may be laminated without using an adhesive. (2) This is a case where the electrical insulating layer unique to the present invention is used for a coverlay of a flexible printed wiring board. When using a resin sheet containing aramid nonwoven fabric in advance and coating it with adhesive in the same form as a normal coverlay film, if the resin layer itself containing aramid nonwoven fabric has adhesive properties, it may be necessary to use adhesive. It can be used as a coverlay without coating. The electrical insulating layer unique to the present invention may be used only in the base material of the flexible printed wiring board in (1) above, or may be used only in the coverlay in (2) above,
It may also be used in conjunction with (1) and (2) above. Base material or/
When the electrical insulating layer of the present invention is used as a coverlay, the heat resistance and dimensional stability required for a flexible printed wiring board and the stiffness of the wiring board as a whole (this is difficult to achieve during component mounting and other processing). or provide useful tools to improve workability during handling. At the same time, this electrical insulating layer has electrical insulation, solder resistance, chemical resistance, tear resistance,
It has excellent flexibility. A method for forming an electrically insulating layer in which a nonwoven fabric mainly composed of aromatic polyamide, which is unique to the present invention, is impregnated with resin will be described. The nonwoven fabric described above is impregnated with an epoxy resin solution, and if necessary, after drying the solvent,
Just let it harden. However, when bonding metal foils together without using an adhesive or bonding them to a wiring board as a coverlay, it is necessary to bond them together using heat and pressure while they still have thermal adhesive properties, and then cure them. , forming an electrically insulating layer with desired performance. Instead of impregnating the aramid nonwoven fabric with a resin solution, a solid resin sheet is formed in advance, and the aramid nonwoven fabric is sandwiched between them and heated and pressurized to form an electrically insulating layer of the aramid nonwoven fabric impregnated with resin. It is also possible to form. A commonly used horizontal and/or vertical impregnation machine can be used to impregnate the aramid nonwoven fabric with the resin solution, and impregnation can be performed once or multiple times. Furthermore, it is also possible to apply coating from one side of the aramid nonwoven fabric, and then, if necessary, to coat from the opposite side, a so-called coating method. No special drying is required after impregnation and/or coating. If the impregnated sheet after drying is sticky, a release sheet may be optionally used in an appropriate step. As the release sheet, ordinary cellulose paper or film coated with a release agent, polypropylene film, polyvinyl alcohol film, etc. can also be used as they are. (Effects of the Invention) As described above, the printed wiring board of the present invention () uses aramid nonwoven fabric as a reinforcing material, has excellent thermal dimensional stability, is flexible, and is strong at the same time. , has excellent workability, () has a structure in which the aramid nonwoven fabric exists inside the resin layer, which (a) prevents curling of flexible printed circuit boards; and (b) improves water resistance, which is a disadvantage of aramid paper. (3) There is no penetration of chemicals into the nonwoven fabric, (d) Few voids, and () Excellent electrical insulation properties of epoxy resin. It has characteristics such as being endowed with flexibility and toughness through modification while retaining water resistance and mechanical properties, and can exhibit well-balanced performance as a flexible printed wiring board. (Example) Next, the present invention will be explained in more detail with reference to Examples. The measurement method used in the examples is as follows. (1) Perform circuit formation using the following steps. () Print a circuit pattern on the copper surface of the copper-clad sheet with UV-curable etching resist ink UER110 (blue) manufactured by Toyobo Co., Ltd. using a 300-mesh polyester fiber-covered screen. () Irradiate 700mJ/ cm2 with a high-pressure mercury lamp to harden the resist. () Using a 38-40° Baume ferric chloride solution,
Etched at 40℃ for 100 seconds. () Peel off the etching resist with a 4% by weight aqueous caustic soda solution. () A desired circuit is formed by washing with water and drying. (2) Electrical insulation resistance Using the circuit formation method in (1), a test pattern was formed with a circuit width of 1.0 mm, distance between circuits of 1.0 mm, circuit length of 25 mm, and a land for electrode connection (circular shape with a diameter of 5 mm). Measure the electrical resistance after applying 500V DC to both ends for 1 minute. Measuring instrument: Yokogawa Heuretsu Packard High Insulation Resistance Meter 4329A (3) Electrical breakdown voltage Using the same pattern as for measuring electrical insulation resistance in (2), apply 0.2 AC and read the voltage at which the insulation breaks down. . Measuring instrument: Kokuyo Electric Industry Co., Ltd. Voltage-proof insulation automatic tester
MODEL MS-5 (4) Copper foil peel strength A copper foil pattern with a width of 1 mm and a length of 100 mm was made using the circuit formation method described in (1) and peeled off at 90° using IPC FC241. Tensile speed: 50 mm/〓, Measuring device: Toyo Seiki Co., Ltd. Tensilon UTM-type (5) Folding strength: 2 at the center of a 15 mm wide board using the circuit formation method described in (1).
Create a mm copper foil pattern using the MIT method (JIS P8115)
The number of times it took to break the conduction was determined using a load of 500gR = 1.0mm. (6) Heat shrinkage rate (dimensional change rate) Determine the heat shrinkage rate before and after treatment at 150°C for 30 minutes using IPC FC241 C method. (7) Solder resistance Observe swelling and color change according to JIS C6481.
Post flux uses solder light MH820V manufactured by Tamura Chemical Research Institute.
【表】【table】
【表】
実施例 1
ビスフエノールA型エポキシ樹脂エピコート
828(シエル石油(株))60g、アクリロニトリル/ブ
タジエン共重合体ニポール1001B(日本ゼオン(株)
製)40g、硬化触媒、キユアゾール2E4MZ:2−
エチル−4−メチルイミダゾール(四国化成(株)
製)2gをメチルエチルケトン150gに溶解し、樹
脂溶液を調製した。
第1表のアラミツド系不織布ANW−1に上記
溶液を含浸し、60℃で2分、100℃で2分乾燥し、
樹脂附着量70g/m2の樹脂含浸アラミツド不織布
シートを製造した。
一方上記樹脂溶液を35μ電解銅箔(日本鉱業(株)
JTC箔)塗布、乾燥し、樹脂コート(15g/m2
DRY)銅箔を製造し、銅箔と上記樹脂含浸シー
トを100℃,11.8Kg/cmでロールラミネーシヨン
後、更に150℃,10Kg/cmでロール間プレスを行
つた後、130℃で16時間硬化させ、アラミツド系
不織布で補強された樹脂シート銅張板(120μ)
を製造した。この銅張板から製造したフレキシブ
ルプリント配線板の性能を第2表に示す。
実施例 2
ノボラツク型エポキシ樹脂エピコート154(シエ
ル石油(株))60g、ポリエピクロルヒドリン
HERCLOR100H(日本ゼオン(株))40g、硬化触媒
キユアゾール2E4MZ(四国化成(株))2gをメチルエ
チルケトン150gに溶解し、樹脂溶液を調整した。
第1表のアラミツド不織布(ANW−2)に上
記溶液を含浸し、60℃で2分、100℃で2分乾燥
し、樹脂附着量80g/m2の樹脂含浸アラミツド不
織布シートを製造した。
一方、上記樹脂溶液を35μ電解銅箔(古河サー
キツトフオイル(株)TSTO−HD箔)に塗布乾燥
し、樹脂コート(15g/m2DRY)銅箔を製造し
た。銅箔と上記樹脂含浸シートを100℃,12Kg/
cmでロールラミネーシヨン後、更に150℃,10
Kg/cmでロール間プレスを行つた後、130℃で16
時間硬化させ、アラミツド系不織布で補強された
樹脂シート銅張板(130μ)を製造した。この銅
張板から製造したフレキシブルプリント配線板の
性能を第2表に示す。
実施例 3
臭素化ノボラツク型エポキシ樹脂ブレンS(日
本化薬(株)製)60g、クロルスルホン化ポリエチレ
ンハイパロン20(デユポン(株)製)40g、硬化触媒
キユアゾール2E4MZ(四国化成(株))2gをメチルエ
チルケトン40gおよびトルエン160gに溶解し、樹
脂溶液を調整した。
第1表のアラミツド不織布(ANW−3)に上
記溶液を含浸し、60℃で2分、100℃で2分乾燥
し、樹脂附着量70g/m2の樹脂含浸アラミツド不
織布シートを製造した。
一方、上記樹脂溶液を35μ電解銅箔(古河サー
キツトフオイル(株)TSTO−HD箔)に塗布、乾燥
し、樹脂コート(15g/m2DRY)銅箔を製造し
た。銅箔と上記樹脂含浸シートを150℃,12Kg/
cmでロールラミネーシヨン後、更に130℃で16時
間硬化させ、アラミツド系不織布で補強された樹
脂シート銅張板(110μ)を製造した。この銅張
板から製造したフレキシブルプリント配線板の性
能を第2表に示す。
実施例 4
ノボラツク型エポキシ樹脂エピコート154(シエ
ル石油(株))17g、臭素化ノボラツク型エポキシ樹
脂ブレンS(日本化薬(株))43g、アクリル系共重
合ポリマー(アクリルラバー)ニポールAR31
(日本ゼオン(株))40g、硬化触媒キユアゾール
2E4MZ(四国化成(株))2gをメチルエチルケトン
150gに溶解し、樹脂溶液を調整した。第1表の
アラミツド不織布(ANW−4)に上記溶液を含
浸し、樹脂附着量70g/m2の樹脂含浸アラミツド
不織布シートを製造した。
一方上記樹脂溶液を35μ電解銅箔(古河サーキ
ツトフオイル(株)TSTO−HD箔)に塗布、乾燥
し、樹脂コート(15g/m2DRY)銅箔を製造し
た。銅箔と上記樹脂含浸シートを150℃,12Kg/
cmでロールラミネーシヨン後、更に130℃で16時
間硬化させ、アラミツド系不織布で補強された樹
脂シート銅張板(120μ)を製造した。この銅張
板から製造したフレキシブルプリント配線板の性
能を第2表に示す。
実施例 5
実施例1で用いた樹脂溶液を第1表記載のアラ
ミツド不織布ANW−4に含浸し、60℃で2分、
100℃で2分乾燥後、25μの離型剤コートポリエ
ステルフイルムと125μの離型剤コートポリエス
テルフイルムの離型剤コート面の間にはさみ、
150℃、プレス圧15Kg/cmで積層した(含浸量
50g/m2)。
25μの離型剤コートポリエステルフイルム(こ
の方が離型性が良い)を剥し、アラミツド含浸シ
ート面をポリイミド基材のフレキシブルプリント
配線板(ニツカン工業(株)ニカフレツクスF−
30T25C11より製造)の回路面に積層した。次い
で150℃でプレス後、100℃で16時間ポストキユア
ーを行つた。積層後、125μのポリエステルフイ
ルムを剥し、アラミツド不織布補強のカバーレイ
層を形成した。貼り合わせ物の性能を第2表に記
す。
比較例 1
Du Pont社のアラミツド不織布、ノーメツクス
ペーパーを接着剤(エポキシ樹脂)を用いて銅箔
に貼り合わせたタイプのフレキシブルプリント配
線板(ニツカン工業(株)製ニカレツクスF−
20VC150C11より製造)の性能を第3表に示す
が、このフレキシブルプリント配線板はエツチン
グ後のカーリングが大きく、作業性の点で非常に
悪いものであつた。
比較例 2,3
次の樹脂組成物溶液を用いた以外、実施例1と
全く同様にして、フレキシブル銅張板フレキシブ
ルプリント配線板を製造した。
比較例2に用いた樹脂溶液組成
ビスフエノールA型エポキシ樹脂
(シエル石油(株)製エピコート828)15g
アクリロニトル/ブタジエン共重合体
(日本ゼオン(株)製ニポール1001B)85g
硬化触媒2−エチル−4−メチルイミダゾール
(四国化成(株)製キユアゾール2E4MZ)2g
メチルエチルケトン 150g
比較例3に用いた樹脂溶液組成
ビスフエノールA型エポキシ樹脂
(シエル石油(株)製エピコート828)80g
アクリロニトル/ブタジエン共重合体
(日本ゼオン(株)製ニポール1001B)20g
硬化触媒2−エチル−4−メチルイミダゾール
(四国化成(株)製キユアゾール2E4MZ)2g
メチルエチルケトン 150g
比較例 4
芳香族ポリアミド不織布ANW−1の代りにガ
ラスペーパー(坪量30g/m2,100μ)を用いた以
外、実施例1と全く同様にして銅張板およびプリ
ント配線板を製造した。性能を第3表に示す。[Table] Example 1 Bisphenol A type epoxy resin Epicoat
828 (Ciel Sekiyu Co., Ltd.) 60g, acrylonitrile/butadiene copolymer Nipol 1001B (Nippon Zeon Co., Ltd.)
) 40g, curing catalyst, Kyuazol 2E4MZ: 2-
Ethyl-4-methylimidazole (Shikoku Kasei Co., Ltd.)
A resin solution was prepared by dissolving 2g of the product (manufactured by the company) in 150g of methyl ethyl ketone. Aramid nonwoven fabric ANW-1 shown in Table 1 was impregnated with the above solution, dried at 60°C for 2 minutes and at 100°C for 2 minutes,
A resin-impregnated aramid nonwoven fabric sheet with a resin adhesion amount of 70 g/m 2 was produced. On the other hand, apply the above resin solution to 35μ electrolytic copper foil (Nippon Mining Co., Ltd.).
JTC foil) applied, dried, and resin coated (15g/m2 )
DRY) Copper foil was manufactured, and the copper foil and the resin-impregnated sheet were roll laminated at 100℃ and 11.8Kg/cm, and then pressed between rolls at 150℃ and 10Kg/cm, and then at 130℃ for 16 hours. Resin sheet copper clad board (120μ) cured and reinforced with aramid nonwoven fabric
was manufactured. Table 2 shows the performance of the flexible printed wiring board manufactured from this copper clad board. Example 2 Novolac type epoxy resin Epicoat 154 (Ciel Sekiyu Co., Ltd.) 60g, polyepichlorohydrin
A resin solution was prepared by dissolving 40 g of HERCLOR 100H (Nippon Zeon Co., Ltd.) and 2 g of curing catalyst Kyuazol 2E4MZ (Shikoku Kasei Co., Ltd.) in 150 g of methyl ethyl ketone. The aramid nonwoven fabric (ANW-2) shown in Table 1 was impregnated with the above solution and dried at 60°C for 2 minutes and at 100°C for 2 minutes to produce a resin-impregnated aramid nonwoven fabric sheet with a resin adhesion amount of 80 g/m 2 . On the other hand, the resin solution was applied to a 35μ electrolytic copper foil (TSTO-HD foil manufactured by Furukawa Circuit Oil Co., Ltd.) and dried to produce a resin-coated (15 g/m 2 DRY) copper foil. Copper foil and the above resin impregnated sheet at 100℃, 12Kg/
After roll lamination at cm, further 150℃, 10
After pressing between rolls at Kg/cm, 16 at 130℃
A resin sheet copper clad plate (130μ) was manufactured by curing for a period of time and reinforced with aramid nonwoven fabric. Table 2 shows the performance of the flexible printed wiring board manufactured from this copper clad board. Example 3 60 g of brominated novolac type epoxy resin Blen S (manufactured by Nippon Kayaku Co., Ltd.), 40 g of chlorosulfonated polyethylene Hypalon 20 (manufactured by Dupont Co., Ltd.), and 2 g of curing catalyst Kyuazol 2E4MZ (manufactured by Shikoku Kasei Co., Ltd.). A resin solution was prepared by dissolving in 40 g of methyl ethyl ketone and 160 g of toluene. The aramid nonwoven fabric (ANW-3) shown in Table 1 was impregnated with the above solution and dried at 60°C for 2 minutes and at 100°C for 2 minutes to produce a resin-impregnated aramid nonwoven fabric sheet with a resin adhesion amount of 70 g/m 2 . On the other hand, the resin solution was applied to a 35μ electrolytic copper foil (TSTO-HD foil manufactured by Furukawa Circuit Oil Co., Ltd.) and dried to produce a resin-coated (15 g/m 2 DRY) copper foil. Copper foil and the above resin impregnated sheet at 150℃, 12Kg/
After roll lamination at cm, the resin sheet was further cured at 130°C for 16 hours to produce a resin sheet copper clad board (110μ) reinforced with aramid nonwoven fabric. Table 2 shows the performance of the flexible printed wiring board manufactured from this copper clad board. Example 4 Novolac type epoxy resin Epicoat 154 (Ciel Sekiyu Co., Ltd.) 17 g, brominated novolac type epoxy resin Blen S (Nippon Kayaku Co., Ltd.) 43 g, acrylic copolymer (acrylic rubber) Nipole AR31
(Nippon Zeon Co., Ltd.) 40g, curing catalyst Kyuazol
2E4MZ (Shikoku Kasei Co., Ltd.) 2g to methyl ethyl ketone
150g to prepare a resin solution. The aramid nonwoven fabric (ANW-4) shown in Table 1 was impregnated with the above solution to produce a resin-impregnated aramid nonwoven fabric sheet with a resin adhesion amount of 70 g/m 2 . On the other hand, the above resin solution was applied to a 35μ electrolytic copper foil (TSTO-HD foil manufactured by Furukawa Circuit Oil Co., Ltd.) and dried to produce a resin-coated (15 g/m 2 DRY) copper foil. Copper foil and the above resin impregnated sheet at 150℃, 12Kg/
After roll lamination at cm, the resin sheet was further cured at 130°C for 16 hours to produce a resin sheet copper-clad board (120μ) reinforced with aramid nonwoven fabric. Table 2 shows the performance of the flexible printed wiring board manufactured from this copper clad board. Example 5 The aramid nonwoven fabric ANW-4 listed in Table 1 was impregnated with the resin solution used in Example 1, and heated at 60°C for 2 minutes.
After drying at 100℃ for 2 minutes, sandwich it between the release agent coated sides of a 25μ mold release agent coated polyester film and a 125μ mold release agent coated polyester film.
Laminated at 150℃ and press pressure 15Kg/cm (impregnated amount
50g/ m2 ). Peel off the 25μ mold release agent-coated polyester film (this has better mold release properties) and attach the aramid-impregnated sheet surface to a polyimide-based flexible printed wiring board (Nitsukan Kogyo Co., Ltd. Nikaflex F-).
(manufactured from 30T25C11) was laminated on the circuit surface. Next, after pressing at 150°C, post-curing was performed at 100°C for 16 hours. After lamination, the 125μ polyester film was peeled off to form a coverlay layer reinforced with aramid nonwoven fabric. The performance of the laminate is shown in Table 2. Comparative Example 1 A flexible printed wiring board (Nicalex F- manufactured by Nikkan Kogyo Co., Ltd.) in which Du Pont's aramid nonwoven fabric and Nomex paper are bonded to copper foil using an adhesive (epoxy resin).
Table 3 shows the performance of the flexible printed wiring board (manufactured from 20VC150C11), which showed significant curling after etching and was very poor in terms of workability. Comparative Examples 2 and 3 A flexible copper-clad flexible printed wiring board was manufactured in exactly the same manner as in Example 1 except that the following resin composition solution was used. Resin solution composition used in Comparative Example 2 Bisphenol A type epoxy resin (Epicote 828 manufactured by Ciel Sekiyu Co., Ltd.) 15 g Acrylonitrile/butadiene copolymer (Nipole 1001B manufactured by Nippon Zeon Co., Ltd.) 85 g Curing catalyst 2-ethyl-4 -Methylimidazole (Kyuazole 2E4MZ manufactured by Shikoku Kasei Co., Ltd.) 2g Methyl ethyl ketone 150g Resin solution composition used in Comparative Example 3 Bisphenol A type epoxy resin (Epicote 828 manufactured by Ciel Sekiyu Co., Ltd.) 80g Acrylonitrile/butadiene copolymer (Japan) Nipole 1001B (manufactured by Zeon Co., Ltd.) 20 g Curing catalyst 2-ethyl-4-methylimidazole (Kyuazol 2E4MZ, manufactured by Shikoku Kasei Co., Ltd.) 2 g Methyl ethyl ketone 150 g Comparative example 4 Glass paper (basis weight) instead of aromatic polyamide nonwoven fabric ANW-1 A copper clad board and a printed wiring board were manufactured in exactly the same manner as in Example 1, except that a copper clad plate (30 g/m 2 , 100 μm) was used. The performance is shown in Table 3.
【表】
銅箔引き剥し強さは機械方向に平行に引き剥し
て測定した。[Table] Copper foil peel strength was measured by peeling parallel to the machine direction.
【表】【table】
【表】
第2表および第3表から明らかなように、本発
明のフレキシブルプリント配線板は、電気絶縁、
銅箔引き剥し、耐折強度、熱収縮率、耐ハンダ性
およびエツチング後のカーリングがないなどの性
能に優れる。エポキシ樹脂とゴム系樹脂の割合が
本発明の範囲外であると、耐ハンダ性、耐熱老化
性が悪くなるか、又は可撓性が悪くなる。[Table] As is clear from Tables 2 and 3, the flexible printed wiring board of the present invention has electrical insulation,
Excellent performance in copper foil peeling, bending strength, heat shrinkage rate, solder resistance, and no curling after etching. If the ratio of the epoxy resin to the rubber resin is outside the range of the present invention, the solder resistance and heat aging resistance will be poor, or the flexibility will be poor.
Claims (1)
エポキシ樹脂およびゴム系樹脂からなる樹脂組成
物を含浸させた電気絶縁層を基材および/又はカ
バーレイに使用したことを特徴とするフレキシブ
ルプリント配線板。1 A nonwoven fabric whose main component is aromatic polyamide,
A flexible printed wiring board characterized in that an electrically insulating layer impregnated with a resin composition consisting of an epoxy resin and a rubber-based resin is used as a base material and/or a coverlay.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22256584A JPS61100446A (en) | 1984-10-22 | 1984-10-22 | Flexible printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22256584A JPS61100446A (en) | 1984-10-22 | 1984-10-22 | Flexible printed wiring board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61100446A JPS61100446A (en) | 1986-05-19 |
| JPH0481504B2 true JPH0481504B2 (en) | 1992-12-24 |
Family
ID=16784449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22256584A Granted JPS61100446A (en) | 1984-10-22 | 1984-10-22 | Flexible printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61100446A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6367143A (en) * | 1986-09-09 | 1988-03-25 | 東洋紡績株式会社 | Thermosetting resin film laminate |
| JP2923566B2 (en) * | 1989-12-06 | 1999-07-26 | 鐘淵化学工業株式会社 | Sheet-like base material for flexible wiring boards |
| US5677045A (en) * | 1993-09-14 | 1997-10-14 | Hitachi, Ltd. | Laminate and multilayer printed circuit board |
| JPH07290623A (en) * | 1994-04-26 | 1995-11-07 | Shin Kobe Electric Mach Co Ltd | Laminated board and manufacturing method thereof |
| WO2018117188A1 (en) | 2016-12-22 | 2018-06-28 | 東レ株式会社 | Structure body |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51151781A (en) * | 1975-06-20 | 1976-12-27 | Matsushita Electric Works Ltd | Process for manufacturing laminated boards for chemical plating |
| JPS59125689A (en) * | 1983-01-06 | 1984-07-20 | 松下電工株式会社 | Electric laminated board |
-
1984
- 1984-10-22 JP JP22256584A patent/JPS61100446A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61100446A (en) | 1986-05-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |