JPH0483791A - Growing method for liquid phase epitaxial crystal - Google Patents
Growing method for liquid phase epitaxial crystalInfo
- Publication number
- JPH0483791A JPH0483791A JP19505990A JP19505990A JPH0483791A JP H0483791 A JPH0483791 A JP H0483791A JP 19505990 A JP19505990 A JP 19505990A JP 19505990 A JP19505990 A JP 19505990A JP H0483791 A JPH0483791 A JP H0483791A
- Authority
- JP
- Japan
- Prior art keywords
- mother liquor
- substrate
- crystal
- thin film
- growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は液相エピタキシャル法によって化合物半導体の
薄膜結晶を基板上に育成する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for growing thin film crystals of compound semiconductors on a substrate by liquid phase epitaxial method.
[従来の技術]
従来より、液相エピタキシャル(LPE)法によって化
合物半導体の薄膜結晶を育成する際に用いられる容器は
、石英ガラス、炭素、窒化硼素などが単体構成で使用さ
れてきた。つまり石英ガラスなら石英カラスだけで容器
の全ての部品を作製し、容器全体を構成している。どの
材料を用いるかは高純度性、工作のしやすさなどを基準
にして選ばれる。例えば、石英ガラスは高純度性には優
れているが、スライドボートのような複雑な構造をもつ
ものは工作性か悪いので使われない。この場合は炭素が
使われることが殆どである。[Prior Art] Conventionally, containers used when growing thin film crystals of compound semiconductors by liquid phase epitaxial (LPE) methods have been made of quartz glass, carbon, boron nitride, or the like in a single-piece construction. In other words, with quartz glass, all the parts of the container are made from quartz glass, making up the entire container. The materials used are selected based on criteria such as high purity and ease of workability. For example, quartz glass has excellent purity, but it is not used in products with complex structures such as slide boats because they are difficult to work with. In most cases, carbon is used.
[発明か解決しようとする課題]
LPE法で薄膜結晶を育成する際の最も大きい問題の一
つは、結晶が成長したあと母液を基板上から分離させる
時、第2図に示すように、母液の一部が成長した薄膜結
晶1の上にしずく2状に1〜3個残ることである。この
しずくは、この薄膜結晶を用いてデバイスを作製する際
にあってはならないもので、技術者はしずくを発生させ
ない(または残さない)ために色々工夫をしている。[Problem to be solved by the invention] One of the biggest problems when growing thin film crystals using the LPE method is that when the mother liquor is separated from the substrate after the crystal has grown, as shown in Figure 2, the mother liquor 1 to 3 droplets remain on the grown thin film crystal 1. These droplets must not be present when manufacturing devices using this thin film crystal, and engineers are devising various ways to prevent them from occurring (or leaving them behind).
しかしながら、これと言って優れた方法はなく、せいぜ
い発生率を少なくする程度であった。However, there is no superior method, and at most it can only reduce the incidence.
本発明はこのような従来の問題点を解決するためになさ
れたもので、液相エピタキシャル法によって薄膜結晶を
育成する際に、母液の一部をしすくとして結晶上に残す
ことかなく、平滑平坦な結晶面を得ることのできる液相
エピタキシャル結晶育成法を提供することを目的とする
。The present invention was made to solve these conventional problems, and when growing thin film crystals by liquid phase epitaxial method, it is possible to smooth and smooth the crystal without leaving a part of the mother liquor on the crystal. The purpose of the present invention is to provide a liquid phase epitaxial crystal growth method that can obtain flat crystal planes.
[課題を解決するための手段]
本発明は、容器内で育成母液を基板に接触させ、基板上
に結晶を析出させて薄膜結晶を育成する液相エピタキシ
ャル結晶育成法において、容器内における基板の対向面
は育成母液との親和性の強い材料で形成され、その他の
育成母液の基板からの分離時における育成母液のwi説
部は該育成母液との親和性の弱い材料で形成された容器
を用いて結晶育成することを特徴とする液相エピタキシ
ャル結晶育成法である。[Means for Solving the Problems] The present invention relates to a liquid phase epitaxial crystal growth method in which a growth mother liquor is brought into contact with a substrate in a container to precipitate crystals on the substrate to grow a thin film crystal. The opposing surface is formed of a material that has a strong affinity with the growth mother liquor, and the other part of the growth mother liquor when the growth mother liquor is separated from the substrate is formed of a container made of a material that has a weak affinity with the growth mother liquor. This is a liquid phase epitaxial crystal growth method characterized by growing crystals using
[作用] 本発明の作用について図面を用いて説明する。[Effect] The operation of the present invention will be explained using the drawings.
まず、成長した結晶上にしずくか残る原因は次のように
考えられる。第3図(a)は結晶が成長し終った直後の
様子でおり、母液5は、下部は容器の底部4に、上部は
成長した結晶1および基板ホルダ6に接している。第3
図(b)および(C)は、結晶1から母液5を分離させ
る工程の様子を示したもので、基板ホールダ6ごと結晶
1を矢印の方向に移動させる。この時、母液5の親和性
か容器底部4に対するより結晶1や基板ホールダ6に対
する方か大きいかまたは等しければ、(b)のごとく結
晶1に対して粘着性が強くなって母液の一部をしずく2
として残すことになる。一方、(C)はその逆の場合を
示したもので、母液5の親和性か容器底部4に対する方
か大きいので、結晶1ヤ基板ホールダ6に対して粘着性
が弱く、しずくを残さないで分離する。First, the reason why the droplets remain on the grown crystal is thought to be as follows. FIG. 3(a) shows the situation immediately after the crystal has finished growing, and the mother liquid 5 is in contact with the bottom 4 of the container at the lower part and the grown crystal 1 and the substrate holder 6 at the upper part. Third
Figures (b) and (C) show the process of separating the mother liquor 5 from the crystal 1, in which the crystal 1 together with the substrate holder 6 is moved in the direction of the arrow. At this time, if the affinity of the mother liquid 5 for the crystal 1 and the substrate holder 6 is greater than or equal to that for the container bottom 4, the adhesiveness becomes stronger for the crystal 1 as shown in (b), and a part of the mother liquid is removed. Drop 2
It will be left as. On the other hand, (C) shows the opposite case, in which the affinity of the mother liquid 5 for the container bottom 4 is greater, so the adhesion to the crystal 1 and the substrate holder 6 is weak, and no droplets are left. To separate.
以上のことから、容器の底部の如く成長した結晶と対向
していて、そのため同時に母液に接する部分には親和性
の強い材質のものを用いるのが良いことになる。一方、
基板ホールダや基板ホールダを支持する部品、ざらには
容器底部に接する容器の壁などの育成母液からの離脱部
は、親和性か弱いかまたは反撥性のめる材質のものを用
いるへきである。From the above, it is better to use a material with strong affinity for the bottom of the container, which faces the grown crystals and is in contact with the mother liquor at the same time. on the other hand,
The substrate holder, parts that support the substrate holder, and parts that are separated from the growth mother liquor, such as the wall of the container in contact with the bottom of the container, should be made of a material that has weak affinity or is repellent.
即ち、本発明においては、第3図(C)のような作用を
生じさせることによって、しずくを残さないで薄膜結晶
を得ることができる。That is, in the present invention, by producing the effect as shown in FIG. 3(C), a thin film crystal can be obtained without leaving any droplets.
[実施例] 次に本発明の実施例について説明する。[Example] Next, examples of the present invention will be described.
本実施例では、化合物半導体の一つであるテルル化水銀
カドミウムの薄膜結晶をLPE法でテルル化カドミウム
からなる基板上に成長させた場合を例にとって説明する
。In this example, a case will be explained in which a thin film crystal of mercury cadmium telluride, which is one of the compound semiconductors, is grown on a substrate made of cadmium telluride by the LPE method.
第1図(a)は本発明の方法に用いられる結晶育成用容
器の一例の断面図である。容器は容易に入手できる材料
のうちで最もテルル化水銀カドミウムの育成母材(テル
ル成分を多めにしたテルル化水銀カドミウム)との親和
性の大きかったグラツシーカーボン(ガラス質炭素)か
らなる底部4と、親和性の小さい窒化硼素からなる側壁
7、基板ホルダ6、蓋8とから構成されている。FIG. 1(a) is a cross-sectional view of an example of a crystal growth container used in the method of the present invention. The bottom part 4 of the container is made of glassy carbon, which has the highest affinity with the growth base material for mercury cadmium telluride (mercury cadmium telluride with a high tellurium content) among easily available materials. , a side wall 7 made of boron nitride, which has low affinity, a substrate holder 6, and a lid 8.
この容器にテルル化カドミウム単結晶からなる基板3と
育成母材5とを収容した後、通常の通り、容器全体を石
英製アンプル(図示せず〉に真空封入し、専用の電気炉
に入れてテルル化水銀カドミウムの薄膜結晶1を基板3
上に育成した。育成法はLPE法の中でもテルル化水銀
カドミウムに適した密閉式の傾斜法でおる。After accommodating the substrate 3 made of cadmium telluride single crystal and the growth base material 5 in this container, as usual, the entire container is vacuum sealed in a quartz ampoule (not shown) and placed in a special electric furnace. A thin film crystal 1 of mercury cadmium telluride is placed on a substrate 3.
Raised above. The growth method is a closed tilting method which is suitable for mercury cadmium telluride among the LPE methods.
育成工程終了後の母液5の分離工程は、容器を横から見
た図である第1図(b)の如く、容器を電気炉ごと傾斜
させることによって行った。6回の結晶育成において、
しずくの残った例は一例もなかった。側壁7を底部4と
同様にグラッシーカーボンを用いて構成した場合は、側
壁7と基板3との間のすき間9に母液か毛管現象的に侵
入し、結晶取り出し時は固化しているので両者か密着し
てしまった。このため取り出しかできず、基板とその上
に成長した結晶を破壊しなければならなかった。The step of separating the mother liquor 5 after the growth step was carried out by tilting the container along with the electric furnace, as shown in FIG. 1(b), which is a side view of the container. In the 6th crystal growth,
Not a single drop remained. If the side wall 7 is made of glassy carbon like the bottom part 4, the mother liquor will enter the gap 9 between the side wall 7 and the substrate 3 by capillary action, and when the crystal is taken out, the mother liquor will be solidified, so that both will be mixed. I got close. Therefore, the only way to remove it was to destroy the substrate and the crystal grown on it.
[発明の効果]
以上詳述したように、本発明の方法によれば液相法で基
板上に薄膜結晶を育成した際に、母液の一部をしずくと
して結晶上に残すことかなくなり、平滑・平坦な結晶面
を得ることかできる。[Effects of the Invention] As detailed above, according to the method of the present invention, when a thin film crystal is grown on a substrate by a liquid phase method, a part of the mother liquor does not remain on the crystal as droplets, and a smooth surface is formed.・It is possible to obtain a flat crystal surface.
第1図は本発明の方法における結晶育成用容器の一例の
断面図、第2図は従来例による結晶育成を行った時の薄
膜結晶の斜視図、第3図は結晶育成終了後の薄膜結晶、
母液および容器底部の状態を説明するための説明図であ
る。
1・・・薄膜結晶 2・・・しずく3・・・
基板 4・・・底部5・・・母液(母材
) 6・・・基板ホールダ7・・・側壁
8・・・蓋9・・・基板と側壁との隙間Fig. 1 is a cross-sectional view of an example of a crystal growth container in the method of the present invention, Fig. 2 is a perspective view of a thin film crystal when crystal growth is performed according to a conventional method, and Fig. 3 is a thin film crystal after crystal growth is completed. ,
FIG. 3 is an explanatory diagram for explaining the state of the mother liquor and the bottom of the container. 1...Thin film crystal 2...Drop 3...
Substrate 4... Bottom 5... Mother liquid (base material) 6... Substrate holder 7... Side wall
8...Lid 9...Gap between the board and the side wall
Claims (1)
晶を析出させて薄膜結晶を育成する液相エピタキシャル
結晶育成法において、容器内における基板の対向面は育
成母液との親和性の強い材料で形成され、その他の育成
母液の基板からの分離時における育成母液の離脱部は該
育成母液との親和性の弱い材料で形成された容器を用い
て結晶育成することを特徴とする液相エピタキシャル結
晶育成法。(1) In the liquid phase epitaxial crystal growth method in which a growth mother liquor is brought into contact with a substrate in a container and crystals are deposited on the substrate to grow a thin film crystal, the facing surface of the substrate in the container has a high affinity with the growth mother liquor. A solution characterized in that crystal growth is performed using a container made of a strong material, and a separation part of the growth mother liquor when the other growth mother liquor is separated from the substrate is made of a material having a weak affinity with the growth mother liquor. Phase epitaxial crystal growth method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19505990A JPH0483791A (en) | 1990-07-25 | 1990-07-25 | Growing method for liquid phase epitaxial crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19505990A JPH0483791A (en) | 1990-07-25 | 1990-07-25 | Growing method for liquid phase epitaxial crystal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0483791A true JPH0483791A (en) | 1992-03-17 |
Family
ID=16334874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19505990A Pending JPH0483791A (en) | 1990-07-25 | 1990-07-25 | Growing method for liquid phase epitaxial crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0483791A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582293A (en) * | 1981-06-29 | 1983-01-07 | Fujitsu Ltd | Liquid phase epitaxial growing apparatus |
| JPS58145696A (en) * | 1982-02-23 | 1983-08-30 | Fujitsu Ltd | Liquid-phase epitaxial growth method |
-
1990
- 1990-07-25 JP JP19505990A patent/JPH0483791A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582293A (en) * | 1981-06-29 | 1983-01-07 | Fujitsu Ltd | Liquid phase epitaxial growing apparatus |
| JPS58145696A (en) * | 1982-02-23 | 1983-08-30 | Fujitsu Ltd | Liquid-phase epitaxial growth method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2754765B2 (en) | Method for manufacturing compound semiconductor crystal | |
| JPH0483791A (en) | Growing method for liquid phase epitaxial crystal | |
| US4338877A (en) | Apparatus for making semiconductor devices | |
| JPH03273617A (en) | Crystal growing method | |
| JPH043101B2 (en) | ||
| JPS61261293A (en) | Boat for liquid-phase epitaxial growth | |
| JPH042689A (en) | Method for hetero-epitaxial liquid phase growth | |
| JPH02102191A (en) | Growth of semiconductor crystal | |
| JP2556159B2 (en) | Method for manufacturing semiconductor crystal | |
| JPH0523585Y2 (en) | ||
| JPS60215600A (en) | Production of hg1-xcdxte crystal | |
| JPH0419196B2 (en) | ||
| JPH03183691A (en) | Growing method for single crystal | |
| JPH0264090A (en) | Container for liquid phase epitaxial growth | |
| JPS60218851A (en) | Manufacture of semiconductor device | |
| JPH02312225A (en) | Semiconductor crystal growing device | |
| JPH0571558B2 (en) | ||
| JPS62265195A (en) | Device for growing crystal | |
| JPH0348431A (en) | Liquid epitaxial crystal deposition device | |
| JPS55100299A (en) | Production of silicon carbide crystal layer | |
| JPS6217095A (en) | Growth method of compound semiconductor single crystal and quartz ampule used therefor | |
| JPH0763058B2 (en) | Melt baking method and liquid phase epitaxial growth method | |
| JPH0247435B2 (en) | GAASEKISOEPITAKISHARUSEICHOHO | |
| ERSTFELD | Method for the preparation of epitaxial films of mercury cadmium telluride[Patent] | |
| JPH0551963U (en) | Substrate holder for liquid phase epitaxial growth |