JPH0488045U - - Google Patents
Info
- Publication number
- JPH0488045U JPH0488045U JP40083490U JP40083490U JPH0488045U JP H0488045 U JPH0488045 U JP H0488045U JP 40083490 U JP40083490 U JP 40083490U JP 40083490 U JP40083490 U JP 40083490U JP H0488045 U JPH0488045 U JP H0488045U
- Authority
- JP
- Japan
- Prior art keywords
- actuating device
- pressure ring
- engine
- ring
- inertia ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005540 biological transmission Effects 0.000 description 1
Description
図面は本考案の要部断面図である。
１……エンジン、２……フライホイール、３…
…クラツチ、４……変速機、５……プロペラシヤ
フト、６……慣性リング、７……進退作動装置、
８……プレツシヤプレート、９……スラストベア
リング、１０……回転センサ、１１……ギヤ位置
センサ、１２……コントローラ。
The drawing is a sectional view of the main part of the present invention. 1...Engine, 2...Flywheel, 3...
...Clutch, 4...Transmission, 5...Propeller shaft, 6...Inertia ring, 7...Advance/retreat actuator,
8...Pressure plate, 9...Thrust bearing, 10...Rotation sensor, 11...Gear position sensor, 12...Controller.
Claims (1)
動可能に設置し、この慣性リングの後端にスラス
トベアリングを介してプレツシヤリングを設け、
このプレツシヤリングの後方に進退作動装置を配
置し、前記進退作動装置をエンジンのアイドリン
グ時に前進作動制御するコントローラを備えたこ
とを特徴とするエンジンの回転変動低減装置。 An inertia ring is installed near the flywheel so that it can move forward and backward, and a pressure ring is provided at the rear end of this inertia ring via a thrust bearing.
An engine rotational fluctuation reduction device characterized in that an advancement/retraction actuating device is disposed behind the pressure ring, and a controller is provided to control forward movement of the advancing/retracting actuating device when the engine is idling.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP40083490U JPH0488045U (en) | 1990-12-18 | 1990-12-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP40083490U JPH0488045U (en) | 1990-12-18 | 1990-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0488045U true JPH0488045U (en) | 1992-07-30 |
Family
ID=31879016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP40083490U Pending JPH0488045U (en) | 1990-12-18 | 1990-12-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0488045U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002057209A (en) * | 2000-06-01 | 2002-02-22 | Tokyo Electron Ltd | Single wafer processing apparatus and single wafer processing method |
| JP2013102126A (en) * | 2011-10-14 | 2013-05-23 | Fuji Electric Co Ltd | Manufacturing method of semiconductor device and manufacturing apparatus of semiconductor device |
| WO2025234340A1 (en) * | 2024-05-10 | 2025-11-13 | 筑波精工株式会社 | Electrostatic attraction tool and method for processing surface of object |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6099538A (en) * | 1983-11-01 | 1985-06-03 | 横河・ヒュ−レット・パッカ−ド株式会社 | pinch yak |
| JPS60184218A (en) * | 1984-03-01 | 1985-09-19 | Fujikura Ltd | Optical fiber core |
| JPS6245378A (en) * | 1985-08-23 | 1987-02-27 | Hitachi Ltd | Coating apparatus |
| JPS6261152A (en) * | 1985-09-12 | 1987-03-17 | Fujitsu Ltd | Format control system for plural media |
| JPS6393536A (en) * | 1986-10-08 | 1988-04-23 | Nikon Corp | Substrate holding device |
| JPH02290013A (en) * | 1989-04-28 | 1990-11-29 | Tokyo Electron Ltd | Temperature processing method |
-
1990
- 1990-12-18 JP JP40083490U patent/JPH0488045U/ja active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6099538A (en) * | 1983-11-01 | 1985-06-03 | 横河・ヒュ−レット・パッカ−ド株式会社 | pinch yak |
| JPS60184218A (en) * | 1984-03-01 | 1985-09-19 | Fujikura Ltd | Optical fiber core |
| JPS6245378A (en) * | 1985-08-23 | 1987-02-27 | Hitachi Ltd | Coating apparatus |
| JPS6261152A (en) * | 1985-09-12 | 1987-03-17 | Fujitsu Ltd | Format control system for plural media |
| JPS6393536A (en) * | 1986-10-08 | 1988-04-23 | Nikon Corp | Substrate holding device |
| JPH02290013A (en) * | 1989-04-28 | 1990-11-29 | Tokyo Electron Ltd | Temperature processing method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002057209A (en) * | 2000-06-01 | 2002-02-22 | Tokyo Electron Ltd | Single wafer processing apparatus and single wafer processing method |
| JP2013102126A (en) * | 2011-10-14 | 2013-05-23 | Fuji Electric Co Ltd | Manufacturing method of semiconductor device and manufacturing apparatus of semiconductor device |
| US9711383B2 (en) | 2011-10-14 | 2017-07-18 | Fuji Electric Co., Ltd. | Fabrication method of semiconductor devices and fabrication system of semiconductor devices |
| WO2025234340A1 (en) * | 2024-05-10 | 2025-11-13 | 筑波精工株式会社 | Electrostatic attraction tool and method for processing surface of object |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19970805 |