JPH049578B2 - - Google Patents
Info
- Publication number
- JPH049578B2 JPH049578B2 JP58222113A JP22211383A JPH049578B2 JP H049578 B2 JPH049578 B2 JP H049578B2 JP 58222113 A JP58222113 A JP 58222113A JP 22211383 A JP22211383 A JP 22211383A JP H049578 B2 JPH049578 B2 JP H049578B2
- Authority
- JP
- Japan
- Prior art keywords
- rhodium
- catalyst
- compound
- reaction
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003054 catalyst Substances 0.000 claims description 55
- 239000010948 rhodium Substances 0.000 claims description 33
- 229910052703 rhodium Inorganic materials 0.000 claims description 31
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 29
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 27
- 238000010438 heat treatment Methods 0.000 claims description 21
- 238000006243 chemical reaction Methods 0.000 claims description 20
- 150000003464 sulfur compounds Chemical class 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- 150000003284 rhodium compounds Chemical class 0.000 claims description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 11
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 15
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 11
- 229910052748 manganese Inorganic materials 0.000 description 11
- 239000011572 manganese Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- -1 inorganic acid salts Chemical class 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 239000011593 sulfur Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910002096 lithium permanganate Inorganic materials 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000002574 poison Substances 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910021604 Rhodium(III) chloride Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910001437 manganese ion Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- QNEIVTNMGMUAEX-UHFFFAOYSA-H oxalate rhodium(3+) Chemical compound [Rh+3].[Rh+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O QNEIVTNMGMUAEX-UHFFFAOYSA-H 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 150000002927 oxygen compounds Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- DPLVEEXVKBWGHE-UHFFFAOYSA-N potassium sulfide Chemical compound [S-2].[K+].[K+] DPLVEEXVKBWGHE-UHFFFAOYSA-N 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- SVOOVMQUISJERI-UHFFFAOYSA-K rhodium(3+);triacetate Chemical compound [Rh+3].CC([O-])=O.CC([O-])=O.CC([O-])=O SVOOVMQUISJERI-UHFFFAOYSA-K 0.000 description 1
- MMRXYMKDBFSWJR-UHFFFAOYSA-K rhodium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Rh+3] MMRXYMKDBFSWJR-UHFFFAOYSA-K 0.000 description 1
- QRRFFHBDASQYFJ-UHFFFAOYSA-K rhodium(3+);triformate Chemical compound [Rh+3].[O-]C=O.[O-]C=O.[O-]C=O QRRFFHBDASQYFJ-UHFFFAOYSA-K 0.000 description 1
- KXAHUXSHRWNTOD-UHFFFAOYSA-K rhodium(3+);triiodide Chemical compound [Rh+3].[I-].[I-].[I-] KXAHUXSHRWNTOD-UHFFFAOYSA-K 0.000 description 1
- VXNYVYJABGOSBX-UHFFFAOYSA-N rhodium(3+);trinitrate Chemical compound [Rh+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VXNYVYJABGOSBX-UHFFFAOYSA-N 0.000 description 1
- YWFDDXXMOPZFFM-UHFFFAOYSA-H rhodium(3+);trisulfate Chemical compound [Rh+3].[Rh+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O YWFDDXXMOPZFFM-UHFFFAOYSA-H 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 1
- 229910003452 thorium oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- TYLYVJBCMQFRCB-UHFFFAOYSA-K trichlororhodium;trihydrate Chemical compound O.O.O.[Cl-].[Cl-].[Cl-].[Rh+3] TYLYVJBCMQFRCB-UHFFFAOYSA-K 0.000 description 1
- 150000004684 trihydrates Chemical class 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
この発明は合成ガスから、酢酸など含酸素有機
化合物を製造する反応に用いられる触媒に関する
ものである。特に高められた選択率をもつてC2
含酸素化合物を得ることのできるイオウ含有ロジ
ウム触媒に関するものである。
一酸化炭素と水素とから炭素数2個のものを主
とする含酸素有機化合物、特に酢酸、アセトアル
デヒド、エタノールを成分とする含酸素化合物を
製造する方法は、公知である。この反応には、実
質上金属ロジウムよりなる不均一系触媒が用いら
れ(特公昭54−41568)、また、触媒としてロジウ
ムおよびマンガンを組合せて含む固形微粒子を使
用することにより成る、含酸素化合物を合成する
触媒の活性を増大した改良方法(特公昭55−
43453)がなされている。
更に、リチウム、カリウム、セシウムおよびル
ビジウムなどを組合せてメタンの生成を抑制する
方法も知られている(特開昭56−8334)。
このように、ロジウム、マンガン、およびアル
カリ金属を組合せた触媒王の存在下、一酸化炭素
と水素の混合ガス(以下混合ガスという)を反応
させてC2含酸素化合物を製造する方法は、公知
であり、その具体例は前記特開昭56−8334号公報
に表としてまとめられている。この技術は、生
成されるC2化合物の分布を酢酸側に移動させる
ように作用する(同公報p.2右下9〜10行)もの
であるが、表のデータ中C2含酸素化合物への
選択率は、8例中最高のもの(G)において約63%で
あり、炭化水素が36%以上も生成している。
本発明は、このような先行技術をふまえて、合
成ガスからC2含酸素化合物を製造する反応に用
いられるロジウム含有触媒において、炭化水素の
生成を抑制し更に高められた選択率でC2含酸素
化合物を得ることのできる改良触媒を提供するこ
とを目的とする。
担体上におけるロジウム化合物の加熱処理によ
り活性化されたロジムウ触媒において該加熱処理
がイオウ化合物の存在下に行なわれる場合に、炭
化水素の生成が抑制され合成ガスの反応に際し著
しく選択率が高められたC2含酸素化合物を与え
る触媒となることが見出された。
即ち本発明は一酸化炭素と水素とを反応させ
て、酢酸、アセトアルデヒド、エタノールを成分
とする含酸素化合物を製造する反応に用いられる
ロジウム含有触媒において、イオウ化合物と共に
担体上に担持されたロジウム化合物の加熱処理に
より形成される活性なロジウムを含有することを
特徴とするロジウム触媒である。
一般にイオウ化合物は金属と表面結合を作りや
すく従つて触媒中に活性成分と反応して触媒を失
活に導く触媒毒と考えられている。(例えば
Elsevier Sci.Pub.Co.“Catalyst Deactivatiot”
p.179(1980))
この触媒毒と考えられているイオウ化合物がロ
ジウム含有触媒のC2含酸素化合物への選択率を
向上させるべく作用したことは意外であつた。
このようなイオウ含有ロジウム触媒の反応条件
下における動的な状態での真の活性種は必ずしも
明らかではないが、実施例に示すように本発明の
触媒を用いれば公知のロジウム含有触媒を用いた
場合より高いC2含酸素化合物選択率が得られる
ことから、担体上におけるロジムウと特定の酸化
性化合物との反応により新規な活性型のロジウム
が形成されたものと考えられる。
本発明の触媒はマンガン成分と組合せて用いる
ことができる。例えばマンガン成分としてマンガ
ンイオン又は過マンガン酸イオンを用いこれをロ
ジウム化合物及びイオウ化合物と共に担体上に担
持させればよい。過マンガン酸イオンの使用は酢
酸の選択率向上に役立ち本発明と共に用いればよ
りよい結果が得られる。
以下本発明の触媒とその調製法につき更に詳細
に説明する。
触媒調製上使用されるロジウム化合物として
は、例えば塩化ロジウム、臭化ロジウム、ヨウ化
ロジウム、硝酸ロジウム、硫酸ロジウム等の無機
酸塩、酢酸ロジウム、ギ酸ロジウム、シユウ酸ロ
ジウムなどの有機酸塩、酸化ロジウム、あるいは
アンミン錯塩、クラスター、ロジウムカルボニ
ル、及びロジウムカルボニルアセチルアセトナー
トなどの通常の貴金属触媒調製に用いられる化合
物がいずれも使用できるが、取り扱いの容易さか
ら塩化物が特に推奨される。これらのロジウム化
合物は、加熱処理前は活性(一酸化炭素と水素と
から酢酸等の含酸素有機化合物の合成活性をさ
す。以下同じ)状態にはない。
これらのロジウム成分をイオウ化合物と共に担
持するための担持としては、比表面積1〜1000
m2/gを有するものが好ましく、シリカ、アルミ
ナ、シリカアルミニナ、酸化チタン、酸化ジルコ
ニウム、酸化トリウム、酸化マグネシウム、活性
炭、ゼオライト等が用いうるが特にシリカ系担体
が好ましい。これらの担体は粉末状、ペレツト状
等あらゆる形状のものについて適用可能である。
ロジウム化合物から活性触媒をつくる加熱処理
段階で作用すると考えられるイオウ化合物として
は、硫酸、各種金属の硫酸塩、硫化物を用いるこ
とができる。
本発明の触媒と組合せて用いることのできるマ
ンガン成分としては、過マンガン酸塩、ハロゲン
化物、硝酸塩、硫酸塩、炭酸塩等のマンガンの無
機酸塩、酢酸塩、ギ酸塩、シユウ酸塩等のマンガ
ンの有機酸塩を挙げることができる。過マンガン
酸はそれ自体でも、またその金属塩例えばリチウ
ム、ナトリウムなどのアルカリ金属塩でも用いら
れる。
これら触媒調製に用いられる成分は、担体上へ
の担持を容易ならしめるため、水など適当な溶媒
に可溶性の化合物が好ましく用いられる。
本発明の触媒はイオウ化合物を用いて調製され
る点に特徴あるものの、触媒の調製方法において
用いられる一般的技術としては、貴金属触媒調製
における常法が適用できる。たとえば、含浸法、
浸せき法、イオン交換法、共沈法、混練法等が用
いられる。更に詳しくは、上記触媒成分を水また
はn−ヘキサン、アルコール等の有機溶媒に溶解
し、この溶液に多孔質無機担体を加え担持させた
後、還元加熱処理することにより触媒を得ること
ができる。担体上への触媒成分の担持方法は、す
べての触媒成分を同時に担持してもよく、また各
成分ごとに逐時的に担体に担持する方法、あるい
は、各成分を必要に応じて還元加熱処理等の処理
を行いながら、逐時的、段階的に担持す方法など
の各手法を用いることができる。
含浸法を一例として更に説明すれば、熱分解性
無機ロジウム化合物(およびマンガン成分)及び
イオウ化合物を担体の吸水率に応じた水量により
水溶液とし、その溶液中に担体を加え、撹拌混合
後、加熱乾燥して担持させる。このようなロジウ
ム(およびマンガン)及びイオウ化合物とを担持
した固体は、更に加熱処理により、微細に分散し
たロジウム(およびマンガン)を担持した活性な
触媒になる。
加熱処理は、イオウ化合物と共に担体上に担持
されたロジウム化合物を150゜C以上の温度に、通
常は還元条件下で加熱することにより行なわれ、
この加熱処理により、ロジウム化合物は活性なロ
ジウム触媒になる。例えばイオウ化合物と共に担
持された塩化ロジウムは、水素気流中で加熱処理
されて金属またはそれに近い低い原子価状態に変
わり、活性を呈する。
先行技術に開示されたロジウム系触媒も、担持
されたロジウム化合物を還元条件下で加熱するこ
とにより得られ、沈着させたロジウムは代表的に
は金属の形のものであると記載されており、本発
明で用いる触媒を得るにあたつてはイオウ化合物
の存在下である点を除けば先行技術と同様の加熱
処理を適用可能である。
活性はロジウム化合物は金属ないし、わずかに
正電荷を有する形が主体であると考えられるの
で、原子価の高いロジウム塩を担持させた場合は
加熱処理は還元伴うことになる。しかしロジウム
カルボニルなど低原子価のロジウム化合物を担持
させた場合は還元を伴わない加熱処理でよい。
ロジウム化合物を活性状態に変える加熱処理
は、反応条件下すなわち反応系に原料として供給
される一酸化炭素と水素との混合ガス中の水素の
存在下における反応温度への加熱であつてもよい
が、反応に用いる以前に水素気流中で還元を伴う
加熱処理を行うことによつて活性化することが望
ましい。
還元処理は水素ガスまたは一酸化炭素と水素の
混合ガスの存在下に行うことができる。場合によ
つては窒素、ヘリウム、アルゴン等の不活性ガス
で一部希釈して行なつてもよい。還元処理温度と
しては、100〜600℃好ましくは150〜500℃の温度
において行う。この際触媒の各成分の活性状態を
最適な状態に保つ目的で、低温より徐々にあるい
は段階的に昇温しながら還元処理を行つてもよ
い。またメタノール、ヒドラジン、ホルマリン等
の還元剤を用いて化学的に還元を行うこともでき
る。
各触媒成分の使用量についてはかならずしも厳
密な制限はないが、担体の表面積(1〜1000m2/
g)を考慮して定める。通常、担持触媒中のロジ
ウムの含有量は0.01〜15重量%、好ましくは0.1
〜10重量%、マンガンの含有量は0.001〜10重量
%、好ましくは0.01〜5重量%である。触媒調製
に用いるイオウとロジウムの比率は原子比で
0.001〜2、好ましくは0.01〜1の範囲である。
上記のような触媒を用いて、合成ガス即ち一酸
化炭素と水素の混合ガスを酢酸に富んだC2含酸
素化合物に転化させる。
反応は通常気相で行われ、例えば触媒を充填し
た固定床式反応器に一酸化炭素と水素を含む原料
ガスを導通させる。この場合原料ガスには一酸化
炭素と水素以外に、例えば二酸化炭素、窒素、ア
ルゴン、ヘリウム、メタン、水蒸気等の他の成分
を含んでいてもよい。また触媒反応器は固定床式
に限らず、移動床式や流動床式等他の形式であつ
ても良い。また、場合によつては触媒を適当な溶
媒中に懸濁して原料ガスを導通して反応させる液
相反応でも実施することができる。
反応条件は広い範囲で変えることができるが、
好適な範囲として一酸化炭素と水素のモル比は
20:1から1:5、好ましくは10:1から1:
2、反応温度は200〜400℃、好ましくは220〜350
℃、圧力は1から300気圧、好ましくは20から200
気圧、空間速度は標準状態換算(0℃、1気圧)
で102から106Hr-1、好ましくは103から5×
104Hr-1である。
本発明の触媒を具体例により説明する。イオウ
化合物をロジウムおよびマンガン成分と共に担体
に担持させ加熱還元処理して得た触媒はこれを用
いて合成ガスを反応させたとき炭化水素の生成が
少なく約75%から80%に及ぶ高選択率でC2含酸
素化合物を与える。これらの具体例における反応
の結果は第1表にまとめて示した。選択率(%)
は次の式で定義される。
特定の生成物へ変換されたCOのモル数×100/消費され
たCOのモル数
エステル類はそれぞれ酸とアルコールにふりわ
けて計算した。
The present invention relates to a catalyst used in a reaction for producing oxygen-containing organic compounds such as acetic acid from synthesis gas. C 2 with particularly increased selectivity
This invention relates to a sulfur-containing rhodium catalyst capable of producing oxygen-containing compounds. BACKGROUND ART A method for producing an oxygen-containing organic compound containing mainly two carbon atoms from carbon monoxide and hydrogen, particularly an oxygen-containing compound containing acetic acid, acetaldehyde, and ethanol as components, is known. In this reaction, a heterogeneous catalyst consisting essentially of metal rhodium is used (Japanese Patent Publication No. 54-41568), and an oxygen-containing compound consisting of solid fine particles containing a combination of rhodium and manganese is used as a catalyst. Improved method for increasing the activity of the catalyst to be synthesized
43453) has been done. Furthermore, a method of suppressing the production of methane by combining lithium, potassium, cesium, rubidium, etc. is also known (Japanese Patent Application Laid-Open No. 8334-1983). As described above, there is a known method for producing a C2 oxygen-containing compound by reacting a mixed gas of carbon monoxide and hydrogen (hereinafter referred to as mixed gas) in the presence of a catalyst containing a combination of rhodium, manganese, and an alkali metal. Specific examples thereof are summarized in the form of a table in the above-mentioned Japanese Patent Application Laid-Open No. 56-8334. This technology works to shift the distribution of C 2 compounds produced toward the acetic acid side (lines 9 to 10 at the bottom right of p. 2 of the same publication), but in the data in the table, the distribution of C 2 compounds is shifted toward the acetic acid side. The selectivity was about 63% in the highest of the eight cases (G), and more than 36% of hydrocarbons were produced. Based on such prior art, the present invention suppresses the production of hydrocarbons and converts C2 - containing compounds with increased selectivity in a rhodium-containing catalyst used in the reaction for producing C2 -oxygenated compounds from synthesis gas. The object is to provide an improved catalyst capable of obtaining oxygen compounds. In a rhodium catalyst activated by heat treatment of a rhodium compound on a support, when the heat treatment is performed in the presence of a sulfur compound, the generation of hydrocarbons is suppressed and the selectivity in the reaction of synthesis gas is significantly increased. It was found to be a catalyst that provides C 2 oxygenated compounds. That is, the present invention relates to a rhodium-containing catalyst used in the reaction of reacting carbon monoxide and hydrogen to produce an oxygen-containing compound containing acetic acid, acetaldehyde, and ethanol as components, in which a rhodium compound supported on a carrier together with a sulfur compound is used. This is a rhodium catalyst characterized by containing active rhodium formed by heat treatment. Generally, sulfur compounds tend to form surface bonds with metals and are therefore considered to be catalyst poisons that react with active components in the catalyst and lead to deactivation of the catalyst. (for example
Elsevier Sci.Pub.Co.“Catalyst Deactivatiot”
(p. 179 (1980)) It was surprising that this sulfur compound, which is considered to be a catalyst poison, acted to improve the selectivity of the rhodium-containing catalyst to C 2 oxygen-containing compounds. The true active species in a dynamic state under the reaction conditions of such a sulfur-containing rhodium catalyst is not necessarily clear, but as shown in the examples, when the catalyst of the present invention is used, it is possible to use a known rhodium-containing catalyst. Since a higher C 2 oxygen-containing selectivity was obtained than in the case of the present invention, it is thought that a new active form of rhodium was formed by the reaction of rhodium on the carrier with a specific oxidizing compound. The catalyst of the present invention can be used in combination with a manganese component. For example, manganese ions or permanganate ions may be used as the manganese component and supported on the carrier together with a rhodium compound and a sulfur compound. The use of permanganate ions helps to improve the selectivity of acetic acid and provides better results when used in conjunction with the present invention. The catalyst of the present invention and its preparation method will be explained in more detail below. Examples of rhodium compounds used in catalyst preparation include inorganic acid salts such as rhodium chloride, rhodium bromide, rhodium iodide, rhodium nitrate, and rhodium sulfate; organic acid salts such as rhodium acetate, rhodium formate, and rhodium oxalate; Any compound commonly used for the preparation of noble metal catalysts, such as rhodium or ammine complex salts, clusters, rhodium carbonyl, and rhodium carbonyl acetylacetonate, can be used, but chloride is particularly recommended for ease of handling. These rhodium compounds are not in an active state (referring to the activity of synthesizing an oxygen-containing organic compound such as acetic acid from carbon monoxide and hydrogen; the same applies hereinafter) before heat treatment. The support for supporting these rhodium components together with the sulfur compound has a specific surface area of 1 to 1000.
m 2 /g is preferred, and silica, alumina, silica alumina, titanium oxide, zirconium oxide, thorium oxide, magnesium oxide, activated carbon, zeolite, etc. can be used, but silica-based carriers are particularly preferred. These carriers can be used in any form such as powder or pellets. Sulfuric acid, sulfates of various metals, and sulfides can be used as sulfur compounds that are thought to act in the heat treatment step for producing an active catalyst from a rhodium compound. Manganese components that can be used in combination with the catalyst of the present invention include inorganic acid salts of manganese such as permanganates, halides, nitrates, sulfates, carbonates, acetates, formates, oxalates, etc. Mention may be made of organic acid salts of manganese. Permanganic acid can be used as such or in its metal salts, such as alkali metal salts such as lithium, sodium, etc. These components used in the preparation of the catalyst are preferably compounds that are soluble in a suitable solvent such as water, in order to facilitate loading on the carrier. Although the catalyst of the present invention is characterized in that it is prepared using a sulfur compound, as a general technique used in the catalyst preparation method, a conventional method for preparing a noble metal catalyst can be applied. For example, impregnation method,
A dipping method, an ion exchange method, a coprecipitation method, a kneading method, etc. are used. More specifically, the catalyst can be obtained by dissolving the above catalyst component in water or an organic solvent such as n-hexane or alcohol, adding a porous inorganic carrier to this solution to support the solution, and then subjecting the solution to a reductive heat treatment. The catalyst components may be supported on the carrier by simultaneously supporting all the catalyst components, by sequentially supporting each component, or by subjecting each component to reduction heat treatment as necessary. It is possible to use various methods such as a method of carrying the data sequentially or in stages while carrying out processing such as the following. To further explain the impregnation method as an example, a thermally decomposable inorganic rhodium compound (and manganese component) and a sulfur compound are made into an aqueous solution in an amount of water depending on the water absorption rate of the carrier, the carrier is added to the solution, and after stirring and mixing, heating is performed. Dry and support. Such a solid supporting rhodium (and manganese) and a sulfur compound is further heat-treated to become an active catalyst supporting finely dispersed rhodium (and manganese). The heat treatment is carried out by heating the rhodium compound supported on the carrier together with the sulfur compound to a temperature of 150°C or higher, usually under reducing conditions.
This heat treatment turns the rhodium compound into an active rhodium catalyst. For example, rhodium chloride supported together with a sulfur compound is heated in a hydrogen stream to become a metal or a low valence state close to it, and becomes active. The rhodium-based catalysts disclosed in the prior art are also described as being obtained by heating a supported rhodium compound under reducing conditions, and that the rhodium deposited is typically in the metallic form; To obtain the catalyst used in the present invention, the same heat treatment as in the prior art can be applied, except that the catalyst is in the presence of a sulfur compound. Since rhodium compounds are thought to be active mainly in the form of metals or slightly positively charged, if a rhodium salt with a high valence is supported, the heat treatment will involve reduction. However, when a low valence rhodium compound such as rhodium carbonyl is supported, heat treatment without reduction may be sufficient. The heat treatment for converting the rhodium compound into an active state may be heating to the reaction temperature under reaction conditions, that is, in the presence of hydrogen in a mixed gas of carbon monoxide and hydrogen supplied as a raw material to the reaction system. , it is desirable to activate it by carrying out a heat treatment accompanied by reduction in a hydrogen stream before using it in the reaction. The reduction treatment can be performed in the presence of hydrogen gas or a mixed gas of carbon monoxide and hydrogen. Depending on the case, it may be partially diluted with an inert gas such as nitrogen, helium, or argon. The reduction treatment temperature is 100 to 600°C, preferably 150 to 500°C. At this time, in order to maintain the activation state of each component of the catalyst in an optimal state, the reduction treatment may be performed while raising the temperature gradually or stepwise from a low temperature. Further, the reduction can also be carried out chemically using a reducing agent such as methanol, hydrazine, or formalin. There is no strict limit on the amount of each catalyst component used, but the surface area of the carrier (1 to 1000 m 2 /
g). Usually the content of rhodium in the supported catalyst is 0.01-15% by weight, preferably 0.1
-10% by weight, the content of manganese is 0.001-10% by weight, preferably 0.01-5% by weight. The atomic ratio of sulfur and rhodium used in catalyst preparation is
It ranges from 0.001 to 2, preferably from 0.01 to 1. Catalysts such as those described above are used to convert synthesis gas, a mixture of carbon monoxide and hydrogen, into acetic acid-rich C 2 oxygenates. The reaction is usually carried out in the gas phase, for example, a raw material gas containing carbon monoxide and hydrogen is passed through a fixed bed reactor packed with a catalyst. In this case, the raw material gas may contain other components other than carbon monoxide and hydrogen, such as carbon dioxide, nitrogen, argon, helium, methane, and water vapor. Further, the catalytic reactor is not limited to a fixed bed type, but may be of other types such as a moving bed type or a fluidized bed type. In some cases, a liquid phase reaction may also be carried out, in which the catalyst is suspended in a suitable solvent and a raw material gas is introduced therethrough. Although reaction conditions can be varied within a wide range,
The preferred range is the molar ratio of carbon monoxide and hydrogen.
20:1 to 1:5, preferably 10:1 to 1:
2. Reaction temperature is 200-400℃, preferably 220-350℃
°C, pressure 1 to 300 atm, preferably 20 to 200
Atmospheric pressure and space velocity are converted to standard conditions (0°C, 1 atm)
at 10 2 to 10 6 Hr -1 , preferably 10 3 to 5×
10 4 Hr -1 . The catalyst of the present invention will be explained using specific examples. A catalyst obtained by supporting a sulfur compound together with rhodium and manganese components on a carrier and undergoing thermal reduction treatment produces less hydrocarbons when reacting with synthesis gas and has a high selectivity of about 75% to 80%. Gives C2 oxygenates. The reaction results in these specific examples are summarized in Table 1. Selection rate (%)
is defined by the following formula. Number of moles of CO converted to a specific product x 100/number of moles of CO consumed Esters were calculated by dividing them into acids and alcohols, respectively.
【表】
三塩化ロジウム三水塩1.9182gと、過マンガン
酸リチウム三水塩0.4372gを蒸溜水50mlに完全に
溶解させてから、硫酸水溶液5ml(1mlでS/
Rh=1/100になるように調製した液)を加えて
均一に撹拌したシリカゲル(富士デビソン化学社
製ID型シリカゲル、以下同じ)30gに含浸し、
一夜間風乾した。
送風乾燥器で110℃、4時間乾燥させた後、石
英ガラス製還元管に充填し、水素気流中(20/
時)350℃、2時間保持し加熱処理した後、直ち
に窒素気流に切り換え放冷した。
この触媒5mlをシリカゲル5mlで希釈して
SUS−316製U字型反応管に充填し、圧力100
Kg/cm2G、温度300℃の条件で原料ガス(CO:
H2=2:1)を100N/時の速度で送入し反応
を行ない、C2含酸素化合物を選択率77.54%で得
た。なお分析は反応ガスを直接ガスクロマトグラ
フに導入して行なつた。
例 2
硫酸水溶液の代りに硫酸カリウム0.0508gの水
溶液(Rhに対するイオウの原子比1/25)を用
いた他は例1と同様にして得た触媒である。
触媒の反応試験も例1と同様の方法で行つた。
(例3以下も同様である。)
例 3
例1と同様硫酸水溶液(Rhに対するイオウの
原子比1/20)を用いている他ロジウムの1/10
モル倍のKClO30.0896gも担持させ加熱還元した
触媒である。
例4、例5
例1と同様であるがイオウ化合物の担持量を変
えた。
例 6
イオウ化合物として硫化カリウムを用いた。
例 7
イオウ化合物を用いずに三塩化ロジムウと過マ
ンガン酸リチウムを担持加熱還元して得た比較例
の触媒である。メタンとC2以上の炭化水素の生
成が例1〜6よりも多い。[Table] Completely dissolve 1.9182 g of rhodium trichloride trihydrate and 0.4372 g of lithium permanganate trihydrate in 50 ml of distilled water, then add 5 ml of sulfuric acid aqueous solution (1 ml of S/
Add 30 g of silica gel (ID type silica gel manufactured by Fuji Davison Chemical Co., Ltd., the same applies hereinafter) and stir it uniformly.
Air dried overnight. After drying in a blow dryer at 110℃ for 4 hours, it was filled into a quartz glass reduction tube and heated in a hydrogen stream (20/20℃).
After heat treatment at 350°C for 2 hours, the temperature was immediately changed to a nitrogen stream and allowed to cool. Dilute 5ml of this catalyst with 5ml of silica gel.
Filled in a U-shaped reaction tube made of SUS-316, with a pressure of 100
The raw material gas (CO:
H 2 =2:1) was fed at a rate of 100 N/hour to carry out the reaction, and a C 2 oxygen-containing compound was obtained with a selectivity of 77.54%. The analysis was conducted by directly introducing the reaction gas into a gas chromatograph. Example 2 A catalyst was obtained in the same manner as in Example 1, except that an aqueous solution of 0.0508 g of potassium sulfate (atomic ratio of sulfur to Rh: 1/25) was used instead of the sulfuric acid aqueous solution. The catalyst reaction test was also conducted in the same manner as in Example 1.
(The same applies to Example 3 and subsequent examples.) Example 3 Similar to Example 1, an aqueous sulfuric acid solution (atomic ratio of sulfur to Rh of 1/20) is used, and 1/10 of rhodium is used.
It is a catalyst that is heated and reduced by supporting 0.0896 g of KClO 3 which is twice the mole amount. Examples 4 and 5 Same as Example 1, but the amount of sulfur compound supported was changed. Example 6 Potassium sulfide was used as the sulfur compound. Example 7 This is a comparative catalyst obtained by supporting and heating reducing rhodium trichloride and lithium permanganate without using a sulfur compound. The production of methane and C2 and higher hydrocarbons is higher than in Examples 1-6.
Claims (1)
セトアルデヒド、エタノールを成分とする含酸素
化合物を製造する反応に用いられるロジウム含有
触媒において、イオウ化合物と共に担体上に担持
されたロジウム化合物の加熱処理により形成され
る活性なロジウムを含有することを特徴とするロ
ジウム触媒。1 Heat treatment of a rhodium compound supported on a carrier together with a sulfur compound in a rhodium-containing catalyst used in the reaction of reacting carbon monoxide and hydrogen to produce an oxygen-containing compound containing acetic acid, acetaldehyde, and ethanol. A rhodium catalyst characterized by containing active rhodium formed by.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58222113A JPS60114342A (en) | 1983-11-28 | 1983-11-28 | Sulfur-containing rhodium catalyst |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58222113A JPS60114342A (en) | 1983-11-28 | 1983-11-28 | Sulfur-containing rhodium catalyst |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60114342A JPS60114342A (en) | 1985-06-20 |
| JPH049578B2 true JPH049578B2 (en) | 1992-02-20 |
Family
ID=16777347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58222113A Granted JPS60114342A (en) | 1983-11-28 | 1983-11-28 | Sulfur-containing rhodium catalyst |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60114342A (en) |
-
1983
- 1983-11-28 JP JP58222113A patent/JPS60114342A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60114342A (en) | 1985-06-20 |
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