JPH0499609A - Method of forming polymer film - Google Patents
Method of forming polymer filmInfo
- Publication number
- JPH0499609A JPH0499609A JP7948190A JP7948190A JPH0499609A JP H0499609 A JPH0499609 A JP H0499609A JP 7948190 A JP7948190 A JP 7948190A JP 7948190 A JP7948190 A JP 7948190A JP H0499609 A JPH0499609 A JP H0499609A
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- JP
- Japan
- Prior art keywords
- thin film
- vacuum
- film
- sample
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は、例えばピコ秒、フェムト秒もしくはこれよ
り短い時間巾を有するパルス光の入射に対して応答性を
示し、入射光とは異なる光の放出を伴う高分子薄膜の形
成方法の改良に関する6(従来の技術)
種々の光機能を有する無機及び有機化合物を、高分子化
合物中に固溶して薄膜化する方法は。Detailed Description of the Invention (Industrial Application Field) The present invention is responsive to the incidence of pulsed light having a duration of, for example, picoseconds, femtoseconds or shorter, and which is different from the incident light. 6 (Prior Art) Regarding Improvement of Method for Forming Thin Polymer Films Accompanied by Release of Polymers 6 (Prior Art) A method of forming a thin film by dissolving inorganic and organic compounds having various optical functions in a polymer compound.
種々の光機能を有する高分子薄膜の製造方法として、従
来より広く用いられてきた方法である。This method has been widely used in the past as a method for manufacturing thin polymer films with various optical functions.
この方法は、第3図に示すように溶媒高分子化合物7及
び溶質化合物8の双方を、一種類もしくは二種類以上の
有機もしくは無機溶剤9に溶解し均一に分散させた後、
これをガラスもしくは他の先学的に透明な基板lO上に
滴下し、溶剤のみを蒸発させて溶質化合物1を高分子化
合物2に保持させて薄膜を形成するものである。In this method, as shown in FIG. 3, both the solvent polymer compound 7 and the solute compound 8 are dissolved and uniformly dispersed in one or more organic or inorganic solvents 9, and then
This is dropped onto a glass or other transparent substrate 1O, and only the solvent is evaporated to hold the solute compound 1 in the polymer compound 2 to form a thin film.
(発明が解決しようとする問題点)
ところが、第3図に示す方法では溶剤を用いるため、薄
膜試料を乾燥等により脱溶剤させるようにしているが、
このような操作を行なっても試料内に溶剤が残留したり
、或いは溶剤を除去した後に気泡が生成し、試料の白濁
化現象を生ずる。また、この白濁化現象を避けるために
、乾燥速度を遍くする等の試みがなされているが、これ
でも試科内に数ミクロン程度の気泡もしくは空孔が生成
したり、試料内に溶剤が残留したりして、これが試料の
光学的性質を著しく低下させているのが現状である。(Problems to be Solved by the Invention) However, since the method shown in FIG. 3 uses a solvent, the thin film sample is removed from the solvent by drying, etc.
Even if such an operation is performed, the solvent remains in the sample, or bubbles are generated after the solvent is removed, resulting in a cloudy sample. In addition, attempts have been made to make the drying speed uniform in order to avoid this clouding phenomenon, but even with this, air bubbles or pores of several microns are generated within the sample, and solvent remains within the sample. At present, this significantly deteriorates the optical properties of the sample.
更に、光パルスは1フ工ムト秒の間に300ナノメート
ルしか伝播せず、フェムト秒程度の巾を持つパルス光の
伝播に際しては、マイクロメートル程度の光路調整及び
試料の均一性が要求され、したがって薄膜試料内の不均
一性はパルス時間巾の伝播距離以下に抑える必要が生ず
る。Furthermore, a light pulse propagates only 300 nanometers in one femtosecond, and propagation of pulsed light with a width of about femtoseconds requires optical path adjustment and sample uniformity on the order of micrometers. Therefore, it is necessary to suppress the non-uniformity within the thin film sample to less than the propagation distance of the pulse duration.
そこで、この発明の第1の目的は上記薄膜試料中に存在
する空孔等の不均質部分の大きさ、試料表面の凹凸をマ
イクロメートル以下にすることにより、フェムト秒程度
の巾を持つパルス光の伝播に対して良質の媒体となる高
分子薄膜の形成法を提供することにある。Therefore, the first object of the present invention is to reduce the size of inhomogeneous parts such as pores existing in the thin film sample and the unevenness of the sample surface to below micrometers, thereby producing pulsed light with a width of approximately femtoseconds. An object of the present invention is to provide a method for forming a thin polymer film that serves as a high-quality medium for the propagation of.
一方、上述のようにして成形された薄膜試料の機械的強
度を増加させる目的で膜面内の一方向に引張応力を加え
ることにより、保持材料である高分子化合物そのもの、
或いは固溶された有機化合物の配列を制御する方法が薄
膜延伸法として広く知られているが、この方法には以下
のような欠点がある。On the other hand, in order to increase the mechanical strength of the thin film sample formed as described above, by applying tensile stress in one direction within the film surface, the polymer compound itself, which is the holding material,
Alternatively, a method of controlling the arrangement of organic compounds dissolved in solid solution is widely known as a thin film stretching method, but this method has the following drawbacks.
即ち、上述のように高分子化合物に保持される有機化合
物は一分子については多種多様の性質を示すことが知ら
れているが、上述のような薄膜試料に引張応力を加える
場合、有機化合物の配向性は保持材料である高分子化合
物そのもの、或いは化合物自身の物性により大きな制限
を受け、引張応力を加えてもこれに応じて延伸配向可能
な有機化合物分子は限られている。In other words, as mentioned above, it is known that a single molecule of an organic compound held in a polymer compound exhibits a wide variety of properties, but when applying tensile stress to a thin film sample as described above, the organic compound The orientation is greatly restricted by the polymer compound itself that is the holding material or the physical properties of the compound itself, and even if tensile stress is applied, the number of organic compound molecules that can be stretched and oriented is limited accordingly.
+=
そこで、薄膜延伸法によって機械的もしくは光−あり、
このため一般に結晶もしくは薄膜全体としての性質は有
機化合物−分子あたりで示す量よりも小さくなることが
知られている。+= Then, mechanically or optically by thin film stretching method,
For this reason, it is generally known that the properties of the crystal or thin film as a whole are smaller than the amount shown per molecule of the organic compound.
そこで、この発明の第2の目的は有機化合物の一分子が
持つ性質を薄膜全体にわたる性質として引出し、フェム
ト秒程度の巾を持つパルス光の伝播に対して良質の媒体
となる高分子薄膜の成形法を提供することにある。Therefore, the second purpose of this invention is to bring out the properties of a single molecule of an organic compound as properties that extend over the entire thin film, and to form a thin polymer film that becomes a high-quality medium for the propagation of pulsed light with a width of approximately femtoseconds. It is about providing law.
c問題点を解決するための手段)
以上の問題点を解決するため、この発明では種々の光機
能を有する溶質化合物を溶媒高分子化合物中に均一に分
散させてN4膜化する高分子薄膜形成方法において、基
板上に上記溶質化合物を、上記溶媒高分子化合物中に均
一に分数させてなる薄膜を形成した後、該薄膜を熱間圧
延処理する方法を提供するものである。c) In order to solve the above problems, this invention involves the formation of a thin polymer film in which solute compounds having various optical functions are uniformly dispersed in a solvent polymer compound to form an N4 film. The present invention provides a method in which a thin film is formed on a substrate by a uniform fraction of the solute compound in the solvent polymer compound, and then the thin film is hot-rolled.
更に、この発明においては上記熱間圧延工程において薄
膜に一方向のすり応力を加えながら熱間圧延を行なう方
法を提供するものである。Furthermore, the present invention provides a method of hot rolling while applying unidirectional shear stress to the thin film in the hot rolling step.
ここで、溶媒高分子化合物としてはポリメチルメタアク
リレ−1−(PMMA)等を使用することができる。Here, as the solvent polymer compound, polymethylmethacrylate-1-(PMMA) or the like can be used.
また、溶質化合物としては種々の光機能を有する有機乃
至無機化合物を使用することができ、具体的には有機化
合物としては2−メチル−4−二トロアニリン(MNA
)等を使用することができ、また基板上に薄膜を形成す
る方法としては、従来の方法を採用することができる。Furthermore, as the solute compound, organic or inorganic compounds having various optical functions can be used. Specifically, the organic compound is 2-methyl-4-nitroaniline (MNA).
), etc., and conventional methods can be used to form the thin film on the substrate.
例えば、第3図に示すように溶質化合物と溶媒高分子化
合物を瀉剤中に加え、得られた濡液を基板上に滴下し、
更に高速回転された円盤に基板を載架して瀉剤を遠心分
離し、更に静置して室温下で予備乾燥を行ない、また残
留する溶剤は加熱真空処理等により除去して基板上に薄
膜を形成することができる。For example, as shown in Fig. 3, a solute compound and a solvent polymer compound are added to a purifying agent, and the resulting wet liquid is dropped onto a substrate.
Furthermore, the substrate is mounted on a disk that is rotated at high speed, the diaphragm is centrifuged, and the solvent is left to stand still for preliminary drying at room temperature.The remaining solvent is removed by heating and vacuum treatment to form a thin film on the substrate. can be formed.
このうち、高速回転された円盤に載架された基板により
薄膜形成を行なう手順を省略して、静置した基板上で薄
膜形成を行なうようにしてもよく、このように上記従来
法の手順の省略、順序の入れ換え等により薄膜を形成す
るようにしてもよい。Of these, the step of forming a thin film on a substrate mounted on a high-speed rotating disk may be omitted, and the thin film may be formed on a stationary substrate. A thin film may be formed by omitting or changing the order.
また、溶質化合物と溶媒高分子化合物を一定割合で混合
し、充分に粉砕、混合を行ない、これを基板間に挟んで
薄膜を形成するようにしてもよい。Alternatively, a solute compound and a solvent polymer compound may be mixed at a fixed ratio, sufficiently pulverized and mixed, and then sandwiched between substrates to form a thin film.
一方、薄膜の熱間圧延処理は例えば150℃程度に加熱
して薄膜試料に50kg/平方cmの静水圧をlO分間
程度加えて行なわれる。On the other hand, hot rolling of a thin film is performed by heating the thin film sample to, for example, about 150° C. and applying a hydrostatic pressure of 50 kg/cm2 to the thin film sample for about 10 minutes.
なお、これらの熱間圧延処理は真空熱間圧延処理の使用
が好適である。Note that it is preferable to use vacuum hot rolling treatment for these hot rolling treatments.
(作用)
以上のように、この発明によれば従来法により得られた
薄膜を熱間圧延処理することにより、薄膜内の空孔等を
除去でき、更に薄膜表面を平滑にすることができる。(Function) As described above, according to the present invention, by hot rolling a thin film obtained by a conventional method, pores and the like in the thin film can be removed and the surface of the thin film can be made smooth.
したがって、この発明によれば薄膜中に存在する不均質
部分の大きさ、薄膜表面の凹凸をマイクロメートル以下
にすることによりピコ秒、フェムト秒もしくはこれより
短い時間巾を有するパルス光の入射に対して応答性を示
し、入射光とは異なる光の放出を伴う材料を提供するこ
とができる。Therefore, according to the present invention, by reducing the size of the inhomogeneous portion existing in the thin film and the unevenness of the thin film surface to less than micrometers, it is possible to prevent the incidence of pulsed light having a duration of picoseconds, femtoseconds, or shorter. It is possible to provide a material that is responsive to light and emits light that is different from the incident light.
また、この発明によれば種々の高分子薄膜中に溶質化合
物を均一に分散させることができるため、紫外、可視、
赤外光領域で光学的に透明で散乱損失の少ない材料を提
供することができる。In addition, according to the present invention, solute compounds can be uniformly dispersed in various polymer thin films, so that they can be dispersed in ultraviolet, visible, and
It is possible to provide a material that is optically transparent in the infrared light region and has low scattering loss.
更に、この発明によれば熱間圧延処理工程中に薄膜に一
方向のすり応力を加えることにより、高分子薄膜中に分
散された有機化合物の分子配向が促進され、したがって
有機化合物の一分子が持つ性質を薄膜全体にわたる性質
として引出すことができる。Furthermore, according to the present invention, by applying unidirectional sliding stress to the thin film during the hot rolling process, the molecular orientation of the organic compound dispersed in the polymer thin film is promoted, so that one molecule of the organic compound is This property can be extracted as a property that covers the entire thin film.
(実施例)
以下、この発明の実施例を示すが、この実施例で説明し
た溶質有機化合物、溶媒高分子化合物の組み合せ、混合
の割合、形成温度等は説明のための一例であり、この発
明の適用範囲を制限するものではない。(Example) Examples of the present invention will be shown below, but the combination of solute organic compound and solvent polymer compound, mixing ratio, formation temperature, etc. explained in this example are examples for explanation, and the invention does not limit the scope of application.
実施例 l
溶質化合物と溶媒高分子化合物を溶剤中に加え、得られ
た溶液をガラス基板上に滴下し、更にこのガラス基板を
高速回転された円盤に載架して薄膜試料を形成する。Example 1 A solute compound and a solvent polymer compound are added to a solvent, the resulting solution is dropped onto a glass substrate, and the glass substrate is placed on a disk that is rotated at high speed to form a thin film sample.
形成された薄膜試料は室温下で3日間静置により予備乾
燥を行ない、更に真空下において100℃で2時間処理
され、試料中の残留溶剤の除去を行なった。この乾燥過
程で生じた試料中の空孔は、上記と同質のもう一枚の基
板で挟み、第1図に示される真空熱間圧延装置により処
理される。The formed thin film sample was pre-dried by standing at room temperature for 3 days, and was further treated under vacuum at 100° C. for 2 hours to remove residual solvent in the sample. The pores in the sample generated during this drying process are sandwiched between another substrate of the same quality as above, and processed by a vacuum hot rolling apparatus shown in FIG.
真空熱間圧延装置は図示するように、内部に真空容器1
が設けられ、この真空容器1は上下に設けられた加熱装
置2.2で加熱されるとともに。As shown in the figure, the vacuum hot rolling equipment has a vacuum container 1 inside.
The vacuum container 1 is heated by heating devices 2.2 provided above and below.
断熱材3.3を介して上下より油圧プレス本体4で加圧
されることができるように構成される。更に、真空容器
1には真空排気装置5にバルブを介して接続される。It is constructed so that it can be pressurized by the hydraulic press main body 4 from above and below via the heat insulating material 3.3. Further, the vacuum container 1 is connected to a vacuum exhaust device 5 via a valve.
薄膜試料6は図示するように真空容器l内に装填され、
室温下で30分間真空排気後、50℃/分の割合で加熱
され、100℃に達したところで真空排気を停止し真空
状態を保持して更に加熱し、150℃に達したところで
50kg/平方c111の静水圧を加え、この状態で1
0分間保持した後、 100℃/時間の割合で冷却した
。The thin film sample 6 is loaded into a vacuum container l as shown,
After evacuation at room temperature for 30 minutes, it was heated at a rate of 50°C/min, and when it reached 100°C, evacuation was stopped and the vacuum state was maintained and further heated, and when it reached 150°C, it was heated at a rate of 50 kg/sq. Add a hydrostatic pressure of 1 and in this state
After holding for 0 minutes, it was cooled at a rate of 100°C/hour.
この処理により試料中の空孔は除去され、試料中に存在
する不均質部分の大きさ及び試料表面の凹凸はマイクロ
メートル以下に制御された。Through this treatment, the pores in the sample were removed, and the size of the heterogeneous portions present in the sample and the unevenness of the sample surface were controlled to below micrometers.
形成された薄膜試料は、厚さ150μm程度の2枚のガ
ラス基板に挟まれており、試料の厚さは約30μmであ
った。The formed thin film sample was sandwiched between two glass substrates each having a thickness of about 150 μm, and the thickness of the sample was about 30 μm.
実施例2
通常の化学的手法により充分に精製されたMNA及びP
MMAを、MNA/152mg 、PMMA/100m
gの割合で混合し、乳ばちにより充分に粉砕し、混合を
行い、厚さ150LLm程度の2枚のガラス基板の間に
挟んで、真空熱間圧延装置に装填し、実施例1と同様の
処理を行い、薄膜試料を形成した。形成された薄膜試料
の厚さは約30LLmであった。Example 2 MNA and P sufficiently purified by conventional chemical methods
MMA, MNA/152mg, PMMA/100m
g, thoroughly pulverized with a mortar, mixed, sandwiched between two glass substrates with a thickness of about 150 LLm, and loaded into a vacuum hot rolling machine, as in Example 1. A thin film sample was formed. The thickness of the thin film sample formed was approximately 30 LLm.
実施例3
実施例1及び2で作成された薄膜試料をCPMレーザー
の共振器内に、互いに共焦点をなすように設置された2
枚の凹面鏡の共焦点に設置した。Example 3 The thin film samples prepared in Examples 1 and 2 were placed in the resonator of a CPM laser so as to be confocal with each other.
It was placed at the confocal point of two concave mirrors.
共焦点におけ−るレーザー光束の直径は約lOμmであ
る。発振されたレーザー共振器から出力された光パルス
の時間巾をSHG自己相関器により測定すると、第2図
fal に示される50フ工ムト秒の時間巾を持つ光パ
ルスが得られ、第2図fbl に示される薄膜試料を設
置しない場合の光パルス巾である73フ工ムト秒に比べ
、得られた光パルスの時間巾は短かくなっていることが
観測され、この発明により形成された薄膜試料が優れた
フェムト秒光パルス応答性を示すことが判明した。The diameter of the laser beam at the confocal point is about 10 μm. When the time width of the optical pulse output from the oscillated laser resonator is measured using an SHG autocorrelator, an optical pulse with a time width of 50 fm seconds shown in Fig. 2 is obtained, and as shown in Fig. 2. It was observed that the time width of the obtained light pulse was shorter than 73 fmsec, which is the light pulse width when no thin film sample was installed, as shown in FIG. It was found that the sample exhibited excellent femtosecond optical pulse responsiveness.
(発明の効果)
以上要するに、この発明によればフェムト秒程度の巾を
持つパルス光の伝播に対して、良質の媒体を提供するこ
とができる。(Effects of the Invention) In summary, according to the present invention, a high-quality medium can be provided for the propagation of pulsed light having a width of approximately femtoseconds.
また、この発明によれば有機化合物の分子配向ができる
ので、有機化合物の一分子が持つ性質を薄膜全体にわた
る性質として引出すことができる。Further, according to the present invention, since the molecules of the organic compound can be oriented, the properties of one molecule of the organic compound can be brought out as the properties of the entire thin film.
更に、この発明による薄膜形成方法は有機系の化合物を
f!密形成するのに適しており、特に入射する光の波長
程度まで均質であることが要求される先学用の媒質の形
成に最適である。Furthermore, the thin film forming method according to the present invention uses an organic compound as f! It is suitable for dense formation, and is particularly suitable for forming a medium for advanced applications that requires homogeneity down to the wavelength of the incident light.
第1図は、この発明の実施例に使用する真空熱間圧延装
置の概略図、第2図falはこの発明により形成された
薄膜試料を、CPMレーザ共振器に設置した時に得られ
た50フ工ムト秒の時間巾を持つ光パルス、第2図fb
l は薄膜試料を設置しない場合の73フ工ムト秒光パ
ル又、第3図は溶剤を用いる従来の高分子化合物の薄膜
形成方法の説明図。
図中1は真空容器、2は加熱装置、3は断熱材、4は油
圧プレス本体、5は真空排気装置。
第1図
第2図
TimeDplay (fsec)
手続補正書(昼)
平成3年10月3Q日FIG. 1 is a schematic diagram of a vacuum hot rolling apparatus used in an embodiment of the present invention, and FIG. Light pulse with time width of milliseconds, Fig. 2 fb
Figure 3 is an explanatory diagram of a conventional method for forming a thin film of a polymer compound using a solvent. In the figure, 1 is a vacuum container, 2 is a heating device, 3 is a heat insulator, 4 is a hydraulic press body, and 5 is a vacuum exhaust device. Figure 1 Figure 2 TimeDplay (fsec) Procedural amendment (daytime) October 3Q, 1991
Claims (2)
化合物の中に均一に分散させて薄膜化する高分子薄膜形
成方法において、 基板状に上記溶質化合物を、上記溶媒高分子化合物中に
均一に分散させてなる薄膜を形成した後、該薄膜を熱間
圧延処理することを特徴とする高分子薄膜形成方法。(1) In a method for forming a thin polymer film in which solute compounds having various optical functions are uniformly dispersed in a solvent polymer compound to form a thin film, the solute compounds are dispersed in the form of a substrate into the solvent polymer compound. A method for forming a thin polymer film, which comprises forming a thin film by uniformly dispersing it, and then subjecting the thin film to a hot rolling treatment.
なうことを特徴とする特許請求の範囲第1項記載の高分
子薄膜形成方法。(2) The method for forming a thin polymer film according to claim 1, wherein the hot rolling treatment is performed while applying shear stress in one direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7948190A JPH0620763B2 (en) | 1990-03-28 | 1990-03-28 | Polymer thin film formation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7948190A JPH0620763B2 (en) | 1990-03-28 | 1990-03-28 | Polymer thin film formation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0499609A true JPH0499609A (en) | 1992-03-31 |
| JPH0620763B2 JPH0620763B2 (en) | 1994-03-23 |
Family
ID=13691087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7948190A Expired - Lifetime JPH0620763B2 (en) | 1990-03-28 | 1990-03-28 | Polymer thin film formation method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0620763B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6319321B1 (en) | 1997-01-20 | 2001-11-20 | Agency Of Industrial Science & Technology Ministry Of International Trade & Industry | Thin-film fabrication method and apparatus |
| US7215491B2 (en) | 2002-09-20 | 2007-05-08 | National Institute Of Advanced Industrial Science And Technology | Optical path switching device and method |
| US7792398B2 (en) | 2004-03-16 | 2010-09-07 | Dainichiseika Color & Chemicals Mfg. Co., Ltd. | Optically controlled optical-path-switching-type data distribution apparatus and distribution method |
-
1990
- 1990-03-28 JP JP7948190A patent/JPH0620763B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6319321B1 (en) | 1997-01-20 | 2001-11-20 | Agency Of Industrial Science & Technology Ministry Of International Trade & Industry | Thin-film fabrication method and apparatus |
| US7215491B2 (en) | 2002-09-20 | 2007-05-08 | National Institute Of Advanced Industrial Science And Technology | Optical path switching device and method |
| US7792398B2 (en) | 2004-03-16 | 2010-09-07 | Dainichiseika Color & Chemicals Mfg. Co., Ltd. | Optically controlled optical-path-switching-type data distribution apparatus and distribution method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0620763B2 (en) | 1994-03-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |